JP3451075B2 - Processing liquid supply device - Google Patents

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a processing liquid supply apparatus for supplying a temperature-controlled processing liquid into a predetermined processing area.

[0002]

2. Description of the Related Art Substrates such as liquid crystal glass substrates, semiconductor (silicon) wafers, glass substrates for photomasks, substrates for optical disks, etc. are manufactured through various processes, and in each process, Various processing liquids are supplied and applied to the substrate, such as application of a developing solution or a resist film, application of a chemical solution for peeling the same, or application of a cleaning solution.

Conventionally, as a device for supplying the processing liquid, a storage tank for storing the processing liquid, a temperature adjusting means arranged in the storage tank for adjusting the temperature of the processing liquid in the storage tank, and the storage A supply pipe connected to the tank, a supply pump connected to the storage tank via the supply pipe to pressurize the processing liquid in the storage tank to supply it into a predetermined processing region, and a supply pump supplied to the processing region. There is known a processing liquid supply device having a structure including a recovery pipe for recovering and refluxing the processing liquid in the storage tank.

According to this processing liquid supply apparatus, the processing liquid whose temperature is adjusted by the temperature adjusting means is supplied from the storage tank into the predetermined processing region by the supply pump and the supply pipe, and the supplied processing liquid is passed through the recovery pipe. Collected in a storage tank.

By the way, for example, when etching the substrate, if the temperature of the etching liquid supplied to the substrate varies, the etching rate also varies, and highly accurate etching processing can be performed. Can not. For this reason, the above-mentioned conventional treatment liquid supply device is provided with a temperature adjusting means, and has a structure in which the temperature of the treatment liquid in the storage tank is adjusted and kept constant by the temperature adjusting means.

However, in the above-mentioned conventional treatment liquid supply apparatus, the end portion of the supply pipe for sucking the treatment liquid from the storage tank is arranged in the vicinity of the end portion of the recovery pipe for returning the treatment liquid into the storage tank. In this case, since the end position of the supply pipe and the end position of the recovery pipe are too close to each other, the treatment liquid whose temperature is not adjusted sufficiently uniformly is sucked out from the supply pipe, and the temperature adjusting means is provided. Despite this, the temperature of the processing liquid supplied varied. Therefore, the above problem has not been solved yet.

The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a processing liquid supply apparatus capable of supplying a processing liquid having a sufficiently uniform temperature.

[0008]

The invention described in claim 1 of the present invention for solving the above-mentioned problems is a storage tank for storing a treatment liquid, and a storage tank disposed in the storage tank. Temperature control means for adjusting the temperature of the processing liquid in the storage tank, a supply pipe connected to the storage tank, and the storage tank via the supply pipe, and pressurizing the processing liquid in the storage tank to a predetermined value. In the processing liquid supply device, which comprises a supply pump for supplying the processing liquid supplied into the processing region and a recovery pipe for collecting and circulating the processing liquid supplied into the processing region into the storage tank,
It is divided into at least two chambers by a plate, and each chamber is
It is formed under the partition plate so as to communicate with each other,
The end of the supply pipe and the temperature control means are arranged in one of the chambers.
And the end of the recovery pipe is disposed in the other chamber.
At the same time, the end of the supply pipe is
Is disposed near the inner wall on one side, and the end of the recovery pipe is
According to the processing liquid supply apparatus, the portion is arranged in the vicinity of the inner wall on the other side .

According to this treatment liquid supply apparatus, the treatment liquid in the storage tank is sucked out by the supply pump through the supply pipe, then pressurized to a predetermined pressure, and then supplied into a predetermined treatment region. The supplied processing liquid is recovered in the storage tank through the recovery pipe. That is, the processing liquid is circulated between the storage tank and the processing region.

The treatment liquid recovered from the recovery pipe arranged near the inner wall of the other side facing the other side in the storage tank is the end of the supply pipe arranged near the inner wall of the one side facing the inner wall. After flowing in the storage tank toward the section, it is sucked out from the supply pipe. Then, while flowing toward the end of the supply pipe, the temperature is adjusted to be constant by the temperature adjusting means. In this way, this processing liquid supply device
For example, the processing liquid recovered from the recovery pipe flows toward the supply pipe.
So that the temperature is controlled by the temperature control means during
The temperature of the processing liquid sucked out from the supply pipe is
The degree can be made sufficiently uniform.

By the way, the processing recovered from the processing area
The liquid can sometimes be in a state of containing bubbles. So
Bubbles remain in the processing liquid that is sucked out of the supply pipe and supplied.
If present, this causes unevenness in the supply amount of the processing liquid,
This causes a decrease in processing accuracy.

In this processing liquid supply apparatus, as described above,
The chamber where the end of the recovery pipe is placed and the end where the end of the supply pipe is placed
Separate the chambers that are to be
Since it is configured to communicate, it was collected from the collection pipe
The processing liquid remains in the room where the recovery pipe is placed.
In the meantime, it is naturally defoamed in the same room.

The treatment liquid defoamed in this way
Flows from the communication part below the partition plate into the chamber where the supply pipe is arranged.
To enter. Therefore, it is sucked from the supply pipe and supplied.
No bubbles remain in the processing liquid, which causes the above problems.
There is no messing.

The invention according to claim 2 of the present invention
Is connected to the storage tank in the treatment liquid supply device.
And a circulation pipe connected to the storage tank through the suction pipe.
A ring pump, one of which is connected to the circulation pump and the other of which is
It and a reflux condenser connected to a storage tank, the suction pipe
The end is located near the end of the supply pipe in the reservoir.
And the end of the reflux pipe is the end of the recovery pipe in the storage tank.
The present invention relates to a processing liquid supply device arranged near the part.

Further, according to the invention described in claim 3 of the present invention, a storage tank for storing the treatment liquid, and the storage tank installed in the storage tank are provided.
Temperature control means for controlling the temperature of the processing liquid in the storage tank
And a supply pipe connected to the storage tank, and via the supply pipe
Connect to the storage tank and pressurize the processing liquid in the storage tank.
Supply pump for supplying into a fixed processing area, and the processing area
Collect the processing liquid supplied into the storage tank and recirculate it.
In the process liquid supply apparatus that includes a that recovery pipe, the supply
Place the end of the pipe near the inner wall on one side in the reservoir
On the other hand, in the vicinity of the inner wall on the other side facing the inner wall on the one side,
A suction pipe connected to the storage tank while arranging an end portion of the recovery pipe, a circulation pump connected to the storage tank via the suction pipe, one connected to the circulation pump, and the other connected to the storage pump. provided a reflux condenser connected to the vessel, the end portion of the suction pipe is arranged near an end of the supply pipe of the storage tank, the end of the recovery pipe of the return pipe ends the storage tank to the The present invention relates to a processing liquid supply device, which is arranged near the portion.

According to these treatment liquid supply devices, the treatment liquid in the storage tank is sucked out through the suction pipe arranged in the vicinity of the end of the supply pipe by the operation of the circulation pump, and then in the recovery pipe. It is made to flow back into the storage tank through a reflux pipe arranged near the end. That is, the treatment liquid in the storage tank is circulated by the circulation system formed by the suction pipe, the circulation pump and the reflux pipe.

As described above, the processing liquid recovered from the recovery pipe into the storage tank flows through the storage tank toward the supply pipe, and the temperature is adjusted by the temperature adjusting means during that time. Then, a part of the processing liquid reaching the vicinity of the supply pipe is sucked out from the supply pipe. On the other hand, the other part is sucked out from the suction pipe of the circulation system, then is made to flow back from the reflux pipe arranged in the vicinity of the recovery pipe, and flows toward the supply pipe again, while the temperature is adjusted by the temperature control means. The temperature is adjusted.

As described above, in this processing liquid supply device, a part of the processing liquid reaching the vicinity of the supply pipe is passed through the circulation system,
Since this is returned to the vicinity of the recovery pipe,
The temperature of the treatment liquid in the storage tank can be made more uniform, and thus the treatment liquid that has been made sufficiently uniform can be supplied to the treatment region. Further, by providing the circulation system, a stronger flow can be generated in the storage tank, whereby the treatment liquid in the storage tank is agitated. Thus, the temperature of the treatment liquid is made uniform by this stirring action.

[0019]

DESCRIPTION OF THE PREFERRED EMBODIMENTS Specific embodiments of the present invention will be described below with reference to the accompanying drawings. Incidentally, FIG. 1 is a front view showing the processing liquid supply apparatus according to the present embodiment,
FIG. 2 is a plan sectional view taken along line I-I in FIG.

As shown in FIG. 1 and FIG. 2, the treatment liquid supply apparatus 1 of this embodiment has a storage tank 2 for storing the treatment liquid and a storage tank 2.
Supplying means 10 for supplying the processing liquid therein to a predetermined processing region (not shown), temperature adjusting means for adjusting the temperature of the processing liquid in the storage tank 2, and circulating the processing liquid in the storage tank 2. It comprises a circulation means 20 and the like.

The storage tank 2 is made of a casing-like member having an opening on the upper surface, and the opening is sealed by a lid 5. The interior of the storage tank 2 is partitioned into two chambers 2a and 2b by a partition plate 3, and an opening 3a formed below the partition plate 3 brings the two chambers 2a and 2b into communication with each other. ing. Further, the partition plate 3 is reinforced and supported by a reinforcing plate 4 arranged in parallel in the chamber 2b at a predetermined interval. The temperature adjusting means 15 comprises a heater 16 and a cooler 17 arranged in the chamber 2a, and the heater 16 and the cooler 17 adjust the temperature of the treatment liquid in the chamber 2a to a predetermined temperature.

The supply means 10 has a first supply pipe 11 having one end arranged in the storage tank 2 and the first supply pipe 1.
1, a supply pump 12 connected to the other end, a second supply pipe 13 having one end connected to the supply pump 12 and the other end arranged in a processing region (not shown); It consists of five recovery pipes 14 for recovering and refluxing the processing liquid supplied into the storage tank 2 (not shown).

The first supply pipe 11 is disposed at the bottom of the storage tank 2 at its one end while penetrating the side wall 2c of the storage tank 2 forming the chamber 2b. This storage tank 2
As shown in FIG. 2, the portion provided inside is bent along the side walls 2c, 2d, 2e, 2f of the storage tank 2, and the tip portion 11a thereof has a side wall 2d facing the side wall 2c. To the vicinity (inside the chamber 2a). In addition, each recovery pipe 14 penetrates the upper surface of the storage tank 2 and has an end portion of the chamber 2.
It is arranged in a state of being positioned in each of the sections divided by the reinforcing plate 4 in b.

The circulation means 20 includes the first supply pipe 11
A suction pipe 21 connected to the side wall 2e of the storage tank 2, a circulation pump 22 connected to the storage tank 2 via the suction pipe 21, and one end connected to the circulation pump 22, The reflux pipe 2 having the other end disposed in the storage tank 2.
3 and 3. The reflux pipe 23 penetrates the upper surface of the storage tank 2 and reaches the inside of the chamber 2a of the storage tank 2, and the portion arranged in the chamber 2a hangs downward from the upper surface of the storage tank 2 and then the bottom surface. Is bent along with the tip end 23a of which is located in the vicinity of the recovery pipe 14.

Thus, according to the treatment liquid supply apparatus 1 of the present embodiment having the above-mentioned configuration, the treatment liquid stored in the chamber 2a in the storage tank 2 is operated by the supply pump 12 to supply the first supply pipe. After being sucked through 11 and then pressurized to a predetermined pressure, it is supplied into a predetermined processing region (not shown), and the processing liquid supplied into the processing region (not shown) is passed through a recovery pipe 14. It is collected in the chamber 2b of the storage tank 2. That is, the processing liquid is circulated between the storage tank 2 and the processing region (not shown).

On the other hand, the processing liquid in the chamber 2a is the circulating pump 2
2 is sucked out through the suction pipe 21, and then is made to flow back into the chamber 2a from the tip portion 23a of the reflux pipe 23. That is, the processing liquid in the chamber 2 a is circulated by the circulation system formed by the suction pipe 21, the circulation pump 22 and the reflux pipe 23.

The processing liquid collected in the chamber 2b of the storage tank 2 is supplied to the chamber 2a through an opening 3a formed below the partition plate 3.
Although it flows into the chamber, if the recovered treatment liquid contains bubbles, while the treatment liquid remains in the chamber 2b,
Natural degassing is performed in the same room 2b.

The treatment liquid flowing from the chamber 2b into the chamber 2a and the treatment liquid recirculated from the tip portion 23a of the reflux pipe 23 are connected to the tip portion 11a of the first supply pipe 11 and the side wall 2e of the suction pipe 21. After flowing in the chamber 2a toward the portion, it is sucked again from the tip portion 11a of the first supply pipe 11 and the suction pipe 21. Then, while flowing toward the tip end portion 11a of the first supply pipe 11 and the connection portion of the suction pipe 21 to the side wall 2e, the temperature of the processing liquid is adjusted by the temperature adjusting means 15 so as to be constant.

As described above, according to the treatment liquid supply apparatus 1 of the present embodiment, the tip ends of the recovery pipe 14 and the reflux pipe 23 are the side walls of the storage tank 2 that are opposite to each other on the side wall 2c side. 23a is provided, and the first supply pipe 11 is provided on the other side wall 2d side.
Since the tip portion 11a and the suction pipe 21 are arranged, the processing liquid in the chamber 2a is exposed to the side wall 2c from the side wall 2c side.
A flow toward the d side is generated, and this flow causes the chamber 2a.
The treatment liquid therein is agitated. The temperature of the treatment liquid is sufficiently homogenized by this stirring action.

Further, if bubbles remain in the processing liquid sucked and supplied from the first supply pipe 11, there arises a problem that the supply amount of the processing liquid becomes uneven or the processing accuracy is lowered. In the present example, the processing liquid is once collected in the chamber 2b, the bubbles in the processing liquid are defoamed in the chamber 2b, and then the bubbles are allowed to flow into the chamber 2a. Therefore, the above problem occurs. Never.

Although one embodiment of the present invention has been described above, needless to say, the specific mode that the present invention can adopt is not limited to the above embodiment.

[Brief description of drawings]

FIG. 1 is a front view showing a processing liquid supply apparatus according to an embodiment of the present invention.

FIG. 2 is a plan sectional view taken along line I-I in FIG.

[Explanation of symbols]

1 Processing liquid supply device 2 storage tanks Room 2a, 2b 2c, 2d, 2e, 2f Side wall 3 partition boards 10 Supplying means 11 First supply pipe 12 Supply pump 13 Second supply pipe 14 Recovery pipe 15 Temperature control means 16 heater 17 Cooler 20 Circulation means 21 Suction pipe 22 Circulation pump 23 Return pipe

─────────────────────────────────────────────────── ─── Continuation of the front page (56) References JP-A-8-323106 (JP, A) JP-A-10-328649 (JP, A) Actual development: 2-37736 (JP, U) (58) Field (Int.Cl. ⁷ , DB name) H01L 21 / 304,21 / 306,21 / 308 B01J 4/00 C02F 1/20 B08B 3/00-3/14

Claims (3)

(57) [Claims] 1. A storage tank storing a treatment liquid, and the inside of the storage tank
Temperature control for controlling the temperature of the processing liquid in the storage tank.
Connecting means, a supply pipe connected to the storage tank, and the supply pipe
Connected to the storage tank via the pressurization of the processing liquid in the storage tank
And a supply pump for supplying it into a predetermined processing area,
Processing liquid supplied into the processing area is collected and returned to the storage tank.
In the processing liquid supply device equipped with a recovery pipeThe storage tank is divided into at least two chambers by a partition plate.
Cut off and each room communicates with each other under the partition plate
Is formed into The end of the supply pipe and the temperature control means are arranged in one of the chambers.
And the end of the recovery pipe is disposed in the other chamber.
With The end portion of the supply pipe is one side of the storage tank which faces the inside of the storage tank.
Is disposed near the inner wall of the pipe, and the end of the recovery pipe is on the other side.
Is located near the inner wall of The treatment liquid is characterized by
Feeder. 2.Suction pipe connected to the storage tank, and the suction pipe
A circulation pump connected to the reservoir via a pipe, and one of
A return connected to the circulation pump and the other connected to the storage tank.
With a flow tube, The end of the suction pipe is close to the end of the supply pipe in the storage tank.
The end portion of the reflux pipe, which is arranged near the
Placed near the end of the collection pipe The processing according to claim 1, wherein
Liquid supply device. 3.A storage tank that stores the treatment liquid and the inside of the storage tank
Temperature control for controlling the temperature of the processing liquid in the storage tank.
Connecting means, a supply pipe connected to the storage tank, and the supply pipe
Connected to the storage tank via the pressurization of the processing liquid in the storage tank
And a supply pump for supplying it into a predetermined processing area,
Processing liquid supplied into the processing area is collected and returned to the storage tank.
In the processing liquid supply device equipped with a recovery pipe Place the end of the supply pipe near the inner wall on one side in the storage tank.
The inner wall on the other side that faces the inner wall on the one side while being arranged
While arranging the end of the recovery pipe in the vicinity, The suction pipe connected to the storage tank, and the suction pipe through the suction pipe
A circulation pump connected to the storage tank and one
Connect the other end with the reflux pipe connected to the reservoir.Provided, End of the suction pipeToNear the end of the supply pipe in the storage tank
Placed byShi, The end of the reflux pipeToThe times in the storage tank
Placed near the end of the collecting pipeCharacterized bySupply of processing liquid
apparatus.