JP3443208B2 - Substrate rotary processing equipment - Google Patents

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION The present invention, like a spin coater or a spin developer, supplies a processing liquid such as a coating liquid or a developing liquid to a substrate surface while holding the substrate in a horizontal position and rotating it about a vertical axis. The present invention relates to a substrate rotation type processing apparatus that performs processing by performing processing.

[0002]

2. Description of the Related Art In a substrate rotary processing apparatus used as a semiconductor manufacturing apparatus, for example, a spin coater (rotary coating apparatus), a coating liquid is supplied to the surface of a substrate and scattered from the substrate to the surroundings as the substrate rotates. A cup for recovering the water is provided, the inside of the cup is exhausted, and the drain collected in the inner bottom portion of the cup is recovered in a drain recovery container such as a plastic tank.

FIG. 2 is a vertical sectional view showing a schematic structure of a conventional spin coater. As shown in the figure, the substrate W is held in a horizontal posture on the spin chuck 10 and is rotated about a vertical axis by a motor 14 connected to a rotation support shaft 12 supporting the spin chuck 10. Substrate W
A cup 16 having an open upper surface is provided around the substrate so that the coating liquid scattered from the substrate W to the periphery is collected in the cup 16. Inside the cup 16, a rectifying plate 1 having a truncated cone shape is provided below the substrate W.
8 is fixedly installed, and the exhaust port 2 is provided below the flow regulating plate 18.
0 is provided. The exhaust port 20 is connected to an exhaust pump (not shown) via an exhaust pipe 22, and a damper 24 is inserted in the exhaust pipe 22. Then, according to the processing sequence, the exhaust pressure of the cup 16 is automatically adjusted by the damper 24.

A drain port 26 is formed on the inner bottom of the cup 16, and a drain pipe 28 is attached to the drain port 26.
Are connected to the flow path. A container storage box 30 is disposed below the spin coater body, and a drain collecting / discharging unit 70 having a container shape is provided inside the container storage box 30.
Is fixedly installed, and the lower end portion of the drain pipe 28 is inserted into the drain collecting / discharging portion 70. Further, a coating liquid inflow portion 32 into which a coating liquid flowing through a pipe from a filter air vent portion of a coating liquid supply piping system (not shown) flows in is provided on the ceiling of the container storage box 30. The outflow pipe 34 is inserted into the drain collecting / discharging portion 70. In the lower part of the drain collecting / discharging portion 70, a cylindrical draining cylinder portion 72 is integrally formed,
The lower end of the drainage cylinder 72 serves as a drain outlet 74.
Then, the drain (coating liquid) flowing from the inner bottom of the cup 16 through the drain pipe 28 into the container body of the drain collecting / discharging unit 70 and the drain collecting / discharging unit from the coating liquid inflow unit 32 through the outflow pipe 34. The drain (coating liquid) that has flowed into the container body of 70 flows into the drainage cylinder 72 and flows down from the drain outlet 74.

A drain collection container 36 is housed in the container storage box 30. When the drain collection container 36 is positioned and fixed at the drain collection position, the drain collection port 38 of the drain collection container 36 is drained. The drain outlet 74 of the portion 72 is opposed to the drain outlet 74.
The drain flowing down from the drain recovery port 36 is recovered from the drain recovery port 38 into the drain recovery container 36. A funnel or the like may be attached to the drain recovery port 38 of the drain recovery container 36 in order to prevent the drain flowing down from the drain outlet 74 of the drainage cylinder 72 from spilling around. The front side of the container storage box 30 is open, and the drain recovery container 36 can be inserted and removed through the front side opening 40. Front side opening 4 of container storage box 30
0 is provided with a door 42, and the door 42 is closed except when the drain collection container 36 is taken in and out. Further, an exhaust pipe 44 is connected to the rear portion of the container storage box 30, and the inside of the closed container storage box 30 is exhausted by an exhaust pump (not shown) connected to the exhaust pipe 44, so that the container storage box 30 Drain collecting and discharging part 70
The atmosphere vapor of the drain collection container 36 and the drain collection container 36 are configured so as not to leak out of the container storage box 30 and diffuse into the surroundings.

[0006]

As described above, in the spin coater, the exhaust pressure of the cup 16 is automatically adjusted according to the processing sequence. However, since the inside of the container storage box 30 is also evacuated, conventionally, the inner peripheral edge of the drain recovery port 38 of the drain recovery container 36 and the outer peripheral edge of the drain outlet 74 of the drainage cylinder 72 of the drain collecting / discharging part 70. The inside of the cup 16 is also exhausted through a path that passes through the drain collecting / discharging portion 70 through the drain pipe 28 from the gap between and. Therefore, the exhaust pipe 2
Even if the exhaust pressure of the cup 16 is sequence-controlled by the damper 24 inserted in 2, the air flow in the cup 16 is disturbed by the exhaust in the container storage box 30, and the processing quality of the substrate is affected. There is a problem such as.

The present invention has been made in view of the above circumstances, and the exhaust pressure in the container storage box in which the drain recovery container and the drain collecting / discharging part are arranged is used for recovering the processing liquid through the drain pipe. An object of the present invention is to provide a substrate rotary processing apparatus which can prevent the deterioration of the processing quality due to the turbulence of the air flow in the cup while preventing it from being applied inside the cup.

[0008]

The invention according to claim 1 is
A process for holding a substrate in a horizontal position and rotating it about a vertical axis, and a process for arranging it around the substrate held by the substrate holding / rotating device so as to surround the substrate and scattering from the substrate to the surroundings. A cup for collecting the liquid, a cup exhaust means for exhausting the inside of the cup, a flow path connected to the inner bottom portion of the cup, a drain pipe for guiding the drain accumulated in the inner bottom portion of the cup downward, and a container shape. The lower end of the drain pipe is inserted into the drain collecting / discharging portion having a drain outlet at the bottom, and the drain collecting container is arranged so that the drain collecting port faces the drain outlet of the drain collecting / discharging portion. A container storage box for arranging and storing
In a substrate rotary processing apparatus provided with a box exhaust means for exhausting the inside of this container storage box, the drain flowing through the drain pipe is once stored inside the drain collecting / discharging part and then overflowed. Provide a liquid reservoir,
It is characterized in that the lower end of the drain pipe is immersed in the drain stored in the liquid reservoir.

According to a second aspect of the present invention, in the substrate rotary processing apparatus according to the first aspect, the upper portion of the drain collecting / discharging portion is covered with a lid plate portion having an opening, and the lid plate portion is provided. A feature is that a space is provided between the container storage box and the ceiling.

[0010]

In the substrate rotary processing apparatus according to the first aspect of the present invention, the processing liquid (drain) scattered from the substrate to the periphery due to the rotation of the substrate, collected in the cup, and collected in the inner bottom portion of the cup is It flows downward through a drain pipe connected to the inner bottom of the cup, flows into a liquid reservoir inside the drain collecting / discharging unit, and once it is stored in the liquid reservoir, Drain from the drain collecting / discharging section through the drain outlet, and is stored in the container storage box so that the drain collection port faces the drain outlet of the drain collecting / discharging section. It is collected in a collection container. At this time, the inside of the container storage box is exhausted by the box exhaust means in order to prevent atmospheric vapor in the drain collecting / discharging section and the drain recovery container from leaking to the outside and deteriorating the working environment. A negative pressure is created inside the drain collecting / discharging part by passing the drain collecting port of the drain collecting container and the drain outlet at the lower part of the drain collecting / discharging part. However, since the lower end of the drain pipe communicating with the cup is immersed in the drain stored in the liquid reservoir, the atmosphere in the drain collecting / discharging unit and the inside of the drain pipe are not flowed by the drain in the liquid reservoir. It will be cut off. Therefore, the exhaust pressure in the container storage box does not reach the cup through the inside of the drain collecting / exhausting portion and the inside of the drain pipe. Therefore, the air flow in the cup is not disturbed by the exhaust in the container storage box, and the exhaust pressure in the cup by the cup exhaust means can be adjusted accurately according to the processing sequence.

In the apparatus according to the second aspect of the present invention, the space between the cover plate portion above the drain collecting / discharging portion and the ceiling portion of the container storage box is exhausted by the box exhausting means, so the drain collecting / discharging portion is exhausted. The solvent vapor that has leaked from the inside into the space through the opening in the lid plate is discharged by the box exhaust means, and the gap between the drain pipe and the wall surface of the ceiling of the container storage box The outside air is sucked into the space and is exhausted by the box exhaust means. Therefore, it is possible to prevent atmospheric vapor in the drain collecting / discharging portion and the drain collecting container from leaking out of the container storage box.

[0012]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT A preferred embodiment of the present invention will be described below with reference to FIG.
Will be described with reference to.

FIG. 1 is a longitudinal sectional view showing a schematic structure of a spin coater according to an embodiment of the present invention. 1, the configuration of the spin coater main body, the configuration of the cup exhaust system, the configuration of the container storage box and its exhaust system, etc. are shown in FIG.
There is no particular difference from the conventional spin coater described in 1 above, and the description of the parts in FIG. 1 given the same reference numerals as those used in FIG. 2 will be omitted.

This spin coater differs from the conventional spin coater only in the construction of the drain collecting / discharging section 46. The drain collecting / discharging portion 46 is in the shape of a container, and a drain drainage tubular portion 48 having a tubular shape is integrally formed in the lower portion thereof, and a lower end of the drainage drainage tubular portion 48 is disposed at a drain recovery position. The configuration itself, which is the drain outlet 50 facing the drain recovery port 38 of the container 36, is the same as the conventional one, but in this spin coater, a part of the drain collecting / discharging portion 46 is surrounded by the weir plate 52, and the drain collecting is performed. The liquid reservoir 54 is provided inside the discharge portion 46. Further, the lower end portion of the drain pipe 28 extending downward through the wall surface of the container storage box 30 and further through the cover plate portion 56 at the upper portion of the drain collecting / discharging portion 46 is inserted into the liquid reservoir portion 54. , Cup 16
The drain that has flowed down through the drain pipe 28 from the drain port 26 at the inner bottom of the tank flows into the liquid reservoir 54. Then, the lower end of the drain pipe 28 is always immersed in the drain 58 stored in the liquid reservoir 54. Further, the cover plate portion 5 of the drain collecting / discharging portion 46
6 and the ceiling of the container storage box 28, a space 6
0 is provided.

In the spin coater shown in FIG. 1, the coating liquid (drain) scattered from the surface of the substrate W to the surroundings as the substrate W rotates hits the inner peripheral wall surface of the cup 16 and the like and hits the inner bottom portion of the cup 16 as in the conventional case. And flows downward from the inner bottom portion of the cup 16 through the drainage port 26 and inside the drain pipe 28. The drain that has flowed down in the drain pipe 28 flows into the liquid reservoir 54 inside the drain collecting / discharging portion 46, is temporarily stored in the liquid reservoir 54, and then crosses the upper edge of the dam plate 52. Overflow from the liquid reservoir 54. The drain overflowing from the liquid reservoir 54 becomes together with the drain flowing into the drain collecting / discharging portion 46 through the outflow pipe 34 of the coating liquid inflow portion 32, and the drain main body of the drain collecting / discharging portion 46 is discharged. The liquid flows down on the inner bottom surface and flows into the drainage cylinder portion 48.
The drain collection container 3 that flows down from the drain outlet 50 at the lower end and is fixed at the drain collection position in the container storage box 30.
Recovered within 6. During this time, the inside of the container storage box 30 is constantly exhausted by the exhaust pump through the exhaust pipe 44, and the inside of the drain collecting / discharging unit 46 is the drain collecting port 38 of the drain collecting container 36 and the drain of the draining cylinder 48. Through the outflow port 50, the cover plate 56 has a gap 62 in the through portion of the drain pipe 28 and a gap 6 in the through portion of the outflow pipe 34.
Negative pressure is obtained by being sucked through 4. However, since the lower end of the drain pipe 28 is immersed in the drain 58 in the liquid reservoir 54, the drain collecting / discharging unit 4
Negative pressure in 6 does not act in the cup 16 through the drain pipe 28. Therefore, the adjustment of the exhaust pressure of the cup 16 performed by the damper 24 inserted in the exhaust pipe 22 in accordance with the processing sequence is not affected by the exhaust in the container storage box 30.

Further, in this spin coater, a space 60 between the cover plate portion 56 of the drain collecting / discharging portion 46 and the ceiling portion of the container storage box 30 is exhausted by the exhaust pump to the exhaust pipe 44.
Exhausted through. Therefore, the container storage box 30
The outside air is sucked into the space 66 in the container storage box 30 through the gap 66 in the penetrating portion of the drain pipe 28 on the ceiling wall surface of the, and passes through the gaps 62 and 64 of the lid plate portion 56 from the drain collecting / discharging portion 46. The solvent vapor that has leaked into the space 66 is discharged together with the outside air sucked into the container storage box 30 through the exhaust pipe 44 through the container storage box 30. Therefore, the solvent vapor leaked from the gaps 62 and 64 of the cover plate portion 56 of the drain collecting / discharging portion 46 does not leak out of the container storage box 30 through the gap 66 of the ceiling wall surface.

[0017]

When the substrate rotary processing apparatus of the invention according to claim 1 is used, the exhaust pressure in the container storage box in which the drain recovery container and the drain collecting / discharging part are arranged is used for recovering the processing liquid through the drain pipe. Since it does not act in the cup, the airflow in the cup is not disturbed by the exhaust in the container storage box unlike the conventional device, and the exhaust pressure in the container storage box changes or the container does not change. Even if the door of the storage box is opened or closed, it does not affect the air flow in the processing liquid recovery cup through the drain pipe, so that the deterioration of the processing quality of the substrate can be prevented.

In the apparatus according to the second aspect of the present invention, the solvent vapor leaking from the drain collecting / discharging portion is prevented from leaking out of the container storage box through the gap between the ceiling wall surfaces of the container storage box, and the working environment is improved. You can keep good.

[Brief description of drawings]

FIG. 1 is a longitudinal sectional view showing a schematic configuration of a spin coater according to an embodiment of the present invention.

FIG. 2 is a vertical sectional view showing a schematic configuration of a conventional spin coater.

[Explanation of symbols]

10 Spin Chuck 12 Rotating Spindle 14 Motor 16 Cup 20 Exhaust Port 22 Exhaust Pipe 26 Drain Port 28 Drain Pipe 30 Container Storage Box 36 Drain Collection Container 38 Drain Collection Container Drain Collection Port 44 Exhaust Pipe 46 Drain Collection / Drain Port 48 Drainage tube 50 Drain outlet 54 Liquid reservoir 56 Drain collecting / discharging upper lid plate 58 Train 60 Drain collecting / discharging lid space W container between the container storage box ceiling

─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. ⁷ Identification code FI H01L 21/30 569C (72) Inventor Hideyuki Taniguchi 322 Hazushi Furukawa-cho, Fushimi-ku, Kyoto City Dai Nippon Screen Mfg. Co., Ltd. Rakusai Plant (56) References JP-A 61-4576 (JP, A) JP-A 1-108724 (JP, A) JP-A 61-160933 (JP, A) Actually developed JP-A 60-13736 (JP, U) (JP 58) Fields surveyed (Int.Cl. ⁷ , DB name) H01L 21/027 G03F 7/16 502 G03F 7/30 502 B05C 11/08 H01L 21/304

Claims (2)

(57) [Claims] 1. A substrate holding / rotating means for holding a substrate in a horizontal posture and rotating it about a vertical axis, and a substrate holding / rotating means arranged so as to surround the periphery of the substrate held by the substrate holding / rotating means. A cup for collecting the processing liquid scattered around, a cup exhaust means for exhausting the inside of the cup, and a drain pipe which is connected to the inner bottom of the cup through a flow path and guides a drain accumulated in the inner bottom of the cup downward. A drain collecting / discharging portion having a drain outlet at the bottom, into which the drain collecting port faces the drain collecting outlet of the drain collecting / discharging portion. As described above, in the substrate rotary processing apparatus including a container storage box for arranging and storing the drain recovery container and a box exhaust unit for exhausting the inside of the container storage box, Provided inside the collecting / discharging part is a liquid storage part for temporarily storing the drain flowing through the drain pipe and then overflowing the drain pipe so that the lower end of the drain pipe is immersed in the stored drain. A substrate rotating type processing apparatus characterized by: 2. The upper part of the drain collecting / discharging part is covered with a cover plate part having an opening, and a space is provided between the cover plate part and the ceiling part of the container storage box. Substrate processing equipment.