JP3363519B2 - Surface treatment method for copper foil for printed wiring boards - Google Patents
Surface treatment method for copper foil for printed wiring boardsInfo
- Publication number
- JP3363519B2 JP3363519B2 JP14181793A JP14181793A JP3363519B2 JP 3363519 B2 JP3363519 B2 JP 3363519B2 JP 14181793 A JP14181793 A JP 14181793A JP 14181793 A JP14181793 A JP 14181793A JP 3363519 B2 JP3363519 B2 JP 3363519B2
- Authority
- JP
- Japan
- Prior art keywords
- copper foil
- treatment
- printed wiring
- copper
- electrolysis
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Production Of Multi-Layered Print Wiring Board (AREA)
- Manufacturing Of Printed Wiring (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は、プリント配線板、特に
多層プリント配線板の内層回路に用いられる銅箔の表面
粗化処理方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a surface roughening treatment method for a printed wiring board, particularly a copper foil used for an inner layer circuit of a multilayer printed wiring board.
【0002】[0002]
【従来の技術】プリント配線板銅箔積層板は、近年多層
化、ファインパターン化及び高密度化が急速に進み、そ
れに伴い該銅箔の積層板との密着性能も従来より優れた
性能が求められている。特に、内層回路用銅箔として
は、積層後に化学的表面粗化処理を行わずに、密着強
さ、特に引き剥し強さが大きい両面粗化処理銅箔を用い
る必要がある。2. Description of the Related Art Printed wiring board copper foil laminates have recently been rapidly multi-layered, finely patterned and highly densified, and along with this, the adhesion performance of the copper foil laminate to the laminate is required to be better than before. Has been. In particular, as the copper foil for the inner layer circuit, it is necessary to use a double-sided roughened copper foil having a high adhesion strength, especially a large peel strength, without performing a chemical surface roughening treatment after lamination.
【0003】しかしながら、この両面粗化処理銅箔の密
着性能は、内層回路用銅箔として用いるには十分ではな
い。電解銅箔の場合には、光沢面には製箔機の表面形状
が転写されているので、従来の粗化処理を行うと粗化粒
子の付着が不均一であったり、あるいは樹脂状に付着し
たりして回路網のファインパターン化には問題がある。
また、圧延銅箔の場合にも、圧延ロールの表面形状が転
写されているので、電解銅箔の場合と同様の問題があ
る。However, the adhesion performance of this double-sided roughened copper foil is not sufficient for use as a copper foil for inner layer circuits. In the case of electro-deposited copper foil, the surface shape of the foil-making machine is transferred to the glossy surface, so if the conventional roughening treatment is applied, the roughened particles will not adhere uniformly or will adhere to the resin. However, there is a problem in forming a fine pattern in the circuit network.
Also, in the case of rolled copper foil, since the surface shape of the rolling roll is transferred, there is the same problem as in the case of electrolytic copper foil.
【0004】[0004]
【発明が解決しようとする課題】本発明の目的は、プリ
ント配線板用銅箔、特に内層回路用銅箔に用いることの
できる、プリプレグとの密着強度が高く、かつ粗化粒子
を均一に付着させる表面粗化処理方法を提供することで
ある。An object of the present invention is to provide a high adhesion strength with a prepreg, which can be used for a copper foil for a printed wiring board, especially for a copper foil for an inner layer circuit, and to uniformly attach roughening particles. A surface roughening treatment method is provided.
【0005】本発明は、プリント配線板用銅箔の表面粗
化処理方法であって、(1)プリント配線板用銅箔の少
なくとも片面を硫酸及び硫酸銅からなる電解液中で交流
電解処理する工程、及び(2)次いで該処理面上に銅の
粗化粒子を付着させる工程からなることを特徴とする方
法である。The present invention relates to a surface roughening treatment method for a copper foil for a printed wiring board, which comprises (1) subjecting at least one surface of the copper foil for a printed wiring board to an AC electrolytic treatment in an electrolytic solution containing sulfuric acid and copper sulfate. And (2) then depositing roughened copper particles on the treated surface.
【0006】本発明において、第一工程により平滑処理
された面上に、第二工程により銅の粗化粒子を付着させ
るには、該銅箔を硫酸及び硫酸銅からなる電解液中で陰
極電解処理又は陰極パルス電解処理することにより行う
ことができる。この第二工程処理により、該銅箔の光沢
面に銅の微細粒子が均一に付着することはもちろんであ
るが、そのマット面側においても、銅の微細粒子が該銅
箔の素地形状の凹凸の山の部分のみに集中することな
く、谷の部分にも均一に付着し、樹枝状に集中して付着
することはない。In the present invention, in order to deposit the roughened copper particles on the surface smoothed by the first step, the copper foil is subjected to cathodic electrolysis in an electrolytic solution containing sulfuric acid and copper sulfate. Treatment or cathodic pulse electrolytic treatment. By this second step treatment, it goes without saying that fine copper particles are evenly attached to the glossy surface of the copper foil, but also on the matte side of the copper foil, the fine copper particles are uneven in the base shape of the copper foil. It does not concentrate only on the peaks, but also adheres evenly on the valleys, and does not concentrate in dendritic form.
【0007】本発明に用いる銅箔は特に限定されない
が、例えば公知の方法で製造された圧延銅箔又は電解銅
箔を挙げることができる。The copper foil used in the present invention is not particularly limited, but examples thereof include rolled copper foil or electrolytic copper foil manufactured by a known method.
【0008】本発明の第一工程における交流電解処理
は、公知の方法により、公知の電解液中で行うことがで
きる。この交流電解処理は、好適には硫酸50〜150
g/l 及び硫酸銅80〜300g/l からなる電解液中で、
該液浴の温度範囲20〜80℃、交流電解電流密度10
〜40A/dm2 及び処理時間2〜10秒で行われる。40
A/dm2 を超える電流密度では、そのコスト・パーフォー
マンスが顕著に悪くなる。交流電解処理において、処理
銅箔の対極の極板の材質は、特に限定されないが好適に
はカーボングラファイトである。The AC electrolytic treatment in the first step of the present invention can be carried out in a known electrolytic solution by a known method. This AC electrolysis treatment is preferably sulfuric acid 50-150.
In an electrolyte consisting of g / l and 80-300 g / l of copper sulfate,
The temperature range of the liquid bath is 20 to 80 ° C., and the alternating current density is 10
It is carried out at -40 A / dm 2 and a processing time of 2-10 seconds. 40
At current densities above A / dm 2 , their cost performance becomes significantly worse. In the AC electrolytic treatment, the material of the counter electrode of the treated copper foil is not particularly limited, but carbon graphite is preferable.
【0009】本発明の第二工程において、該電解処理液
は、好適には硫酸75〜150g/l及び硫酸銅60〜1
60g/l からなる液であり、液浴の温度範囲は好適には
15〜40℃である。陰極電解処理時の電流密度は、用
いる液浴の濃度及び温度により異なり、限定されるもの
ではないが、通常は、限界電流密度を越えない値であれ
ばよく、好適には25〜35A/dm2 である。電解処理時
間は好適には5〜15秒である。陰極パルス処理時の電
流密度は、平均電流密度として15〜25A/dm2 であ
る。処理時間はオンタイム:10ms(ミリ秒)、オフタ
イム:30〜90msのパルス波形において、好適には5
〜20秒である。In the second step of the present invention, the electrolytically treated liquid is preferably 75 to 150 g / l of sulfuric acid and 60 to 1 of copper sulfate.
It is a liquid consisting of 60 g / l, and the temperature range of the liquid bath is preferably 15 to 40 ° C. The current density at the time of cathodic electrolysis treatment varies depending on the concentration and temperature of the liquid bath used and is not limited, but it is usually a value not exceeding the limiting current density, and preferably 25 to 35 A / dm. Is 2 . The electrolytic treatment time is preferably 5 to 15 seconds. The current density during the cathode pulse treatment is 15 to 25 A / dm 2 as the average current density. The processing time is 10 ms (milliseconds), off-time: 30-90 ms pulse waveform, preferably 5
~ 20 seconds.
【0010】[0010]
【実施例】以下に実施例を示し本発明を更に具体的に説
明する。EXAMPLES The present invention will be described more concretely with reference to the following examples.
【0011】実施例1
第一工程
電解銅箔(厚さ35μm )の光沢面及びマット面に対し
カーボングラファイト板を対極として配置し、下記の液
浴組成及び交流電解条件により表面処理を行った。
液浴組成:H2 SO4 …100g/l 、CuSO4 ・5H
2 O…100g/l ;
電解条件(光沢面処理及びマット面処理において同じ条
件で行った):浴温…25℃;商用交流電解電流密度…
32A/dm2 、処理時間…6秒。Example 1 First Step A carbon graphite plate was placed as a counter electrode on the glossy surface and matte surface of an electrolytic copper foil (thickness: 35 μm), and surface treatment was carried out under the following liquid bath composition and AC electrolysis conditions. Liquid bath composition: H 2 SO 4 ... 100g / l, CuSO 4 · 5H
2 O ... 100 g / l; Electrolysis conditions (the same conditions were applied for glossy surface treatment and matte surface treatment): Bath temperature ... 25 ° C .; Commercial AC electrolytic current density ...
32 A / dm 2 , processing time ... 6 seconds.
【0012】第二工程
次いで、処理面を十分に水洗した後、光沢面及びマット
面に対し酸化イリジュウム被覆チタン板をそれぞれ対極
として配置し、下記の浴組成及び陰極電解条件により銅
の微細粒子を付着形成させた。
浴組成:H2 SO4 …115g/l 、CuSO4 ・5H2
O…95g/l ;
電解条件:浴温…それぞれ27℃、陰極電解平均電流密
度…光沢面処理において30A/dm2 及びマット面処理に
おいて35A/dm2 、処理時間…それぞれ6秒。更に、該
微細銅粒子を強固に固定させるために、下記の液浴組成
及び陰極電解条件により処理した。
液浴組成:H2 SO4 …115g/l 、CuSO4 ・5H
2 O…250g/l ;
電解条件:浴温…それぞれ50℃、陰極平均電解電流密
度…光沢面処理において30A/dm2 及びマット面処理に
おいて24A/dm2 、処理時間…それぞれ15秒。得られ
た両面粗化処理銅箔について、下記項目について評価
し、結果を第1表に示した。Second step Next, after the treated surface is thoroughly washed with water, iridium oxide-coated titanium plates are arranged as counter electrodes on the glossy surface and the matte surface, respectively, and fine copper particles are prepared according to the following bath composition and cathodic electrolysis conditions. Adhered and formed. Bath composition: H 2 SO 4 ... 115g / l, CuSO 4 · 5H 2
O ... 95 g / l; electrolysis conditions: bath temperature ... respectively 27 ℃, 35A / dm 2 at 30A / dm 2 and matte processed in cathodic average current density ... glossy surface treatment, the treatment time ... each 6 seconds. Further, in order to firmly fix the fine copper particles, treatment was carried out with the following liquid bath composition and cathodic electrolysis conditions. Liquid bath composition: H 2 SO 4 ... 115g / l, CuSO 4 · 5H
2 O ... 250g / l; electrolysis conditions: bath temperature ... respectively 50 ℃, 24A / dm 2 at the cathode average current density for electrolysis ... 30A / dm 2 and matte processed in glossy surface treatment, the treatment time ... 15 seconds, respectively. The obtained double-sided roughened copper foil was evaluated for the following items, and the results are shown in Table 1.
【0013】コブ形状の均一性
粗化処理面の微細銅粒子の付着形状を走査型電子顕微鏡
で観察した。光沢面側及びマット面側において、個々の
コブの大きさが均一で整然と付着している場合を○、ほ
ぼ均一である場合を□、やや不均一である場合を△、完
全に不均一である場合を×、とした。Uniformity of Cobb Shape The adhered shape of fine copper particles on the roughened surface was observed with a scanning electron microscope. On the glossy side and matte side, if the size of the individual bumps is uniform and adheres well, it is ○, when it is almost uniform, it is □, when it is slightly non-uniform, it is completely non-uniform. The case was designated as x.
【0014】ガラスエポキシプリプレグに積層した後の
引剥し強さ
粗化処理面を、4枚重ねしたガラスエポキシプリプレグ
(厚さ180μm )に重ね合わせた後に、プレスプレー
トに挟み170℃で120分間、加熱加圧成形した。得
られた銅張り積層板について、JIS C−6481に
規定されている方法により銅箔の引剥し強さを測定し
た。Peeling strength after being laminated on a glass epoxy prepreg Roughened surface is laminated on four glass epoxy prepregs (thickness 180 μm), sandwiched between press plates and heated at 170 ° C. for 120 minutes. It was pressure molded. With respect to the obtained copper-clad laminate, the peel strength of the copper foil was measured by the method specified in JIS C-6481.
【0015】積層板上に銅粒子残留(トランスファー)
の程度
上記により銅箔を引剥した後のガラス基材の表面を、光
学顕微鏡で観察した。単位面積(0.5mm×0.5mm)
当たりの残留銅粒子数を測定し、残留銅粒子数が多い場
合を×、多少残留している場合を△、殆んど残留してい
ない場合を□、全く残留していない場合を○、とした。Residual copper particles on the laminate (transfer)
The surface of the glass substrate after the copper foil was peeled off as described above was observed with an optical microscope. Unit area (0.5mm × 0.5mm)
The number of residual copper particles per measurement is measured, and when the number of residual copper particles is large, it is ×, when there is some residual copper, Δ, when almost no residual copper is □, when there is no residual copper, ○. did.
【0016】表面粗さの測定
粗化処理面の表面荒さの尺度として、JIS B−06
01に規定されている方法でRz値を測定した。Measurement of surface roughness JIS B-06 is used as a measure of the surface roughness of the roughened surface.
The Rz value was measured by the method specified in 01.
【0017】実施例2
圧延銅箔(厚さ35μm )の片面に表面処理を行った以
外は、実施例1と同様に表面処理を行った。得られた片
面粗化処理銅箔について、実施例1と同様に評価し、結
果を第1表に示した。Example 2 A surface treatment was performed in the same manner as in Example 1 except that one surface of the rolled copper foil (thickness: 35 μm) was surface-treated. The obtained single-sided roughened copper foil was evaluated in the same manner as in Example 1, and the results are shown in Table 1.
【0018】実施例3
第一工程
電解銅箔(厚さ35μm )の光沢面及びマット面を実施
例1と同様の条件により交流電解処理した。Example 3 First Step The electrolytic copper foil (thickness: 35 μm) having a glossy surface and a matte surface was subjected to AC electrolytic treatment under the same conditions as in Example 1.
【0019】第二工程
次いで、実施例1と同様な液浴組成及び下記電解条件に
より、陰極パルス電解処理を行った。
電解条件(光沢面及びマット面処理において同じ条件で
行った):浴温…25℃、平均電流密度…20A/dm2 ;
オンタイム…10ms、オフタイム…60ms;
処理時間…5秒。更に該微細銅粒子を強固に固定させる
ための陰極電解処理を、実施例1と同様の条件で光沢面
及びマット面に行った。得られた両面粗化処理銅箔につ
いて、実施例1と同様に評価し、結果を第1表に示し
た。Second Step Next, cathodic pulse electrolysis treatment was carried out under the same liquid bath composition as in Example 1 and the following electrolysis conditions. Electrolysis conditions (the same conditions were applied for glossy surface and matte surface treatment): bath temperature ... 25 ° C., average current density ... 20 A / dm 2 ; on-time ... 10 ms, off-time ... 60 ms; treatment time ... 5 seconds. Further, a cathodic electrolysis treatment for firmly fixing the fine copper particles was performed on the glossy surface and the matte surface under the same conditions as in Example 1. The obtained double-sided roughened copper foil was evaluated in the same manner as in Example 1, and the results are shown in Table 1.
【0020】実施例4
圧延銅箔(厚さ35μm )の片面に表面処理を行った以
外は、実施例3と同様に表面処理を行った。得られた片
面粗化処理銅箔について、実施例1と同様に評価し、結
果を第1表に示した。Example 4 A surface treatment was carried out in the same manner as in Example 3 except that one surface of the rolled copper foil (thickness: 35 μm) was surface-treated. The obtained single-sided roughened copper foil was evaluated in the same manner as in Example 1, and the results are shown in Table 1.
【0021】比較例1
電解銅箔(厚さ35μm )の光沢面を交流電解処理しな
かった以外は、実施例1と同様に陰極電解処理を行っ
た。得られた両面粗化処理銅箔について、実施例1と同
様に評価し、結果を第1表に示した。Comparative Example 1 Cathodic electrolysis was performed in the same manner as in Example 1 except that the glossy surface of the electrolytic copper foil (thickness: 35 μm) was not subjected to AC electrolysis. The obtained double-sided roughened copper foil was evaluated in the same manner as in Example 1, and the results are shown in Table 1.
【0022】比較例2
圧延銅箔(厚さ35μm )の片面に交流電解処理をしな
かった以外は、実施例1と同様に陰極電解処理を行っ
た。得られた片面粗化処理銅箔について、実施例1と同
様に評価し、結果を第1表に示した。Comparative Example 2 Cathodic electrolysis was performed in the same manner as in Example 1 except that one side of the rolled copper foil (thickness 35 μm) was not subjected to AC electrolysis. The obtained single-sided roughened copper foil was evaluated in the same manner as in Example 1, and the results are shown in Table 1.
【0023】比較例3
電解銅箔(厚さ35μm )の光沢面を交流電解処理しな
かった以外は、実施例3と同様に処理を行った。得られ
た両面粗化処理銅箔について、実施例1と同様に評価
し、結果を第1表に示した。Comparative Example 3 The same treatment as in Example 3 was performed except that the glossy surface of the electrolytic copper foil (thickness: 35 μm) was not subjected to AC electrolytic treatment. The obtained double-sided roughened copper foil was evaluated in the same manner as in Example 1, and the results are shown in Table 1.
【0024】比較例4
圧延銅箔(厚さ35μm )の片面に交流電解処理をしな
かった以外は、実施例3と同様に陰極電解処理を行っ
た。得られた片面粗化処理銅箔について、実施例1と同
様に評価し、結果を第1表に示した。Comparative Example 4 Cathodic electrolysis was performed in the same manner as in Example 3 except that one side of the rolled copper foil (thickness 35 μm) was not subjected to AC electrolysis. The obtained single-sided roughened copper foil was evaluated in the same manner as in Example 1, and the results are shown in Table 1.
【0025】[0025]
【表1】 [Table 1]
【0026】[0026]
【発明の効果】本発明の方法より得たプリント配線板用
表面粗化処理銅箔は、銅の微細粒子が該銅箔に均一に付
着しており、また素地形状に凹凸を有する銅箔において
も銅の微細粒子が山の部分のみに集中することなく、谷
の部分にも均一に付着しているので、プレプリグとの密
着性が大きく、特に内層回路用銅箔として優れている。The surface-roughened copper foil for a printed wiring board obtained by the method of the present invention is a copper foil in which fine copper particles are evenly attached to the copper foil and which has irregularities in the base shape. In addition, since the fine copper particles do not concentrate only on the peaks but also uniformly adhere to the valleys, the adhesion to the prepreg is large, and it is particularly excellent as a copper foil for inner layer circuits.
フロントページの続き (56)参考文献 特開 平3−202500(JP,A) 特開 平3−276739(JP,A) (58)調査した分野(Int.Cl.7,DB名) H05K 3/38 H05K 3/46 Front page continuation (56) Reference JP-A-3-202500 (JP, A) JP-A-3-276739 (JP, A) (58) Fields investigated (Int.Cl. 7 , DB name) H05K 3 / 38 H05K 3/46
Claims (2)
法であって、 (1)プリント配線板用銅箔の少なくとも片面を、硫酸
50〜150g/l 及び硫酸銅80〜300g/lからなる
電解液中で、交流電解電流密度10〜40A/dm2で交流
電解処理する工程、及び(2)次いで該処理面上に銅の
粗化粒子を付着させる工程からなることを特徴とする方
法。1. A method for roughening a surface of a copper foil for a printed wiring board, comprising: (1) at least one surface of the copper foil for a printed wiring board from 50 to 150 g / l of sulfuric acid and 80 to 300 g / l of copper sulfate. In an electrolytic solution containing AC electrolysis current density of 10 to 40 A / dm 2 , and (2) then depositing roughened copper particles on the treated surface. .
及び硫酸銅からなる電解液中で陰極電解処理又は陰極パ
ルス電解処理からなる請求項1記載の方法。2. The method according to claim 1, wherein the step of depositing the roughened copper particles comprises cathodic electrolysis or cathodic pulse electrolysis in an electrolytic solution containing sulfuric acid and copper sulfate.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14181793A JP3363519B2 (en) | 1993-06-14 | 1993-06-14 | Surface treatment method for copper foil for printed wiring boards |
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Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14181793A JP3363519B2 (en) | 1993-06-14 | 1993-06-14 | Surface treatment method for copper foil for printed wiring boards |
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Publication Number | Publication Date |
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JPH06350248A JPH06350248A (en) | 1994-12-22 |
JP3363519B2 true JP3363519B2 (en) | 2003-01-08 |
Family
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JP4497952B2 (en) * | 2004-02-23 | 2010-07-07 | クローバー電子工業株式会社 | Multilayer wiring board |
-
1993
- 1993-06-14 JP JP14181793A patent/JP3363519B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
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JPH06350248A (en) | 1994-12-22 |
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