JP3345666B2 - Coating equipment - Google Patents
Coating equipmentInfo
- Publication number
- JP3345666B2 JP3345666B2 JP2000100426A JP2000100426A JP3345666B2 JP 3345666 B2 JP3345666 B2 JP 3345666B2 JP 2000100426 A JP2000100426 A JP 2000100426A JP 2000100426 A JP2000100426 A JP 2000100426A JP 3345666 B2 JP3345666 B2 JP 3345666B2
- Authority
- JP
- Japan
- Prior art keywords
- coating
- roll
- base material
- substrate
- coating liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Coating Apparatus (AREA)
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、連続走行するプラ
スチックフィルム、金属箔又は紙等のシート状の基材の
両面に塗膜を形成するための塗工装置の改良に関するも
のである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an improvement in a coating apparatus for forming a coating film on both surfaces of a sheet-like base material such as a plastic film, metal foil or paper running continuously.
【０００２】[0002]
【従来の技術】従来、塗工装置には、特開平９−２７１
７０４号公報に掲載されたものがある。この塗工装置１
は、図６に示す如く、連続走行する帯状磁性基材Ｗの両
面側にそれぞれ配置された第１の塗工装置２と第２の塗
工装置３とからなり、各塗工装置２，３が上記基材Ｗと
接触しつつ回転する塗工ロール２ａ，３ａと、上記接触
領域Ａ１，Ａ２の回転方向上流側で塗工ロール２ａ，３
ａに対向してその外周面に塗液層Ｂ１，Ｂ２を形成する
スロットダイ２ｂ，３ｂとを備えると共に、上記塗工ロ
ール２ａ，３ａの内側に上記接触領域Ａ１，Ａ２に対向
するマグネット２ｃ，３ｃを設けている。塗工装置１で
は、第１の塗工装置２のスロットダイ２ｂによって塗工
ロール２ａの外周面に均一厚みの塗液層Ｂ１が形成され
る。この塗液層Ｂ１は、塗工ロール２ａの回転に従って
帯状磁性基材Ｗとの接触領域Ａ１に移動し、基材Ｗの一
方の片面に塗工され塗膜Ｃ１となる。この際、帯状磁性
基材Ｗは、塗工ロール２ａの内側のマグネット２ｃの磁
力によって引き付けられ、塗工ロール２ａに対する接触
圧力が大きくなる。これにより塗工ロール２ａ及び帯状
磁性基材Ｗのいずれもが金属性の場合でも、互いに密着
性がよくなって隙間が形成され難くなり、基材Ｗの表面
に気泡欠陥や厚みむらの少ない塗膜が形成される。同様
にして、第２の塗工装置３により基材Ｗの他方の片面に
も塗工され塗膜Ｃ２となる。2. Description of the Related Art Conventionally, a coating apparatus has been disclosed in Japanese Patent Application Laid-Open No. 9-271.
No. 704 is disclosed. This coating device 1
Consists of a first coating device 2 and a second coating device 3 respectively arranged on both sides of a continuously running strip-shaped magnetic base material W as shown in FIG. Coating rolls 2a, 3a rotating while contacting with the base material W, and coating rolls 2a, 3a in the rotation direction upstream of the contact areas A1, A2.
and slot dies 2b and 3b that form coating liquid layers B1 and B2 on the outer peripheral surface thereof facing the first and second coating rolls 2a and 3a. 3c is provided. In the coating device 1, a coating liquid layer B1 having a uniform thickness is formed on the outer peripheral surface of the coating roll 2a by the slot die 2b of the first coating device 2. The coating liquid layer B1 moves to the contact area A1 with the belt-shaped magnetic base material W according to the rotation of the coating roll 2a, and is coated on one side of the base material W to form a coating film C1. At this time, the strip-shaped magnetic base material W is attracted by the magnetic force of the magnet 2c inside the coating roll 2a, and the contact pressure on the coating roll 2a increases. Thereby, even when both the coating roll 2a and the strip-shaped magnetic base material W are metallic, they have good adhesiveness to each other, making it difficult to form a gap, and coating the surface of the base material W with less bubble defects and uneven thickness. A film is formed. Similarly, the other side of the substrate W is coated by the second coating device 3 to form a coating film C2.
【０００３】[0003]
【発明が解決しようとする課題】しかし、従来の塗工装
置１には、次のような問題点がある。 （１）塗工装置１は、強制駆動させる二個の塗工ロール
２ａ，３ａを必要とするため、構造的に複雑且つ大型化
し、コスト及びメンテナンスの面で不利である。 （２）塗工ロール２ａ，３ａは、その内側にマグネット
２ｃ，３ｃを設けているため構造的に複雑となり、外周
面の真円度や円筒度等の精度確保が難しく、高精度の塗
工が得られ難い。 （３）基材が非磁性のプラスチックフイルム，紙または
銅箔等の場合には、マグネット２ｃ，３ｃの磁力による
引き付けが無いため、塗工ロール２ａ，３ａに対する基
材の接触圧力も小さく、基材の表面に気泡欠陥や厚みむ
らの少ない塗膜が形成され難い。 （４）基材Ｗは、その走行方向と逆方向へ回転する二個
の塗工ロール２ａ，３ａの接触領域Ａ１，Ａ２に接触さ
せるため、塗工装置１の出側で高張力となる。そのた
め、塗工装置１は、低張力の基材に適用できない。However, the conventional coating apparatus 1 has the following problems. (1) Since the coating device 1 requires two coating rolls 2a and 3a to be forcibly driven, it is structurally complicated and large, and disadvantageous in cost and maintenance. (2) Since the coating rolls 2a and 3a are provided with the magnets 2c and 3c inside thereof, they are structurally complicated, and it is difficult to ensure accuracy such as roundness and cylindricity of the outer peripheral surface, and high-precision coating is performed. Is difficult to obtain. (3) When the base material is a non-magnetic plastic film, paper or copper foil, the contact pressure of the base material with respect to the coating rolls 2a, 3a is small because there is no attraction due to the magnetic force of the magnets 2c, 3c. It is difficult to form a coating film with few bubble defects and uneven thickness on the surface of the material. (4) Since the base material W is brought into contact with the contact areas A1 and A2 of the two coating rolls 2a and 3a rotating in the direction opposite to the running direction, the tension is high at the exit side of the coating apparatus 1. Therefore, the coating device 1 cannot be applied to a low-tension substrate.
【０００４】本発明は、上記問題を解決するために、一
個の塗工ロールを用いて両面塗工ができると共に、非磁
性の基材や低張力の基材であっても塗工ロールに対する
接触圧力を確保できる塗工装置の提供を目的とするもの
である。According to the present invention, in order to solve the above-mentioned problem, both sides can be coated by using one coating roll, and even if a non-magnetic base material or a low-tensile base material is contacted with the coating roll. An object of the present invention is to provide a coating apparatus capable of securing pressure.
【０００５】上記目的達成のために請求項１記載の本発
明が採用した手段は、強制回転するロール外周面に、該
ロール外周面の回転方向と逆方向へ走行する基材が巻き
掛け接触する基材接触領域と該基材が接触しない基材非
接触領域とを形成した塗工ロールと、該塗工ロールの基
材非接触領域に対向して設けられて塗工ロール外周面に
塗液層を形成する塗液層形成装置とを備えた塗工装置に
おいて、前記塗工ロールの基材接触領域に対向して設け
られて前記基材との間で計量用間隙を形成する計量面
と、該計量面より基材上流側に設けられて前記基材へ塗
液を供給する塗液供給部とを有する塗膜形成装置を備え
たことを特徴とする塗工装置である。In order to achieve the above object, a means adopted by the present invention according to the first aspect of the present invention is that a base material running in a direction opposite to the rotation direction of the roll outer peripheral surface is wound around the forced outer peripheral surface of the roll. A coating roll formed with a base material contact area and a base material non-contact area where the base material does not contact, and a coating liquid provided on the outer peripheral surface of the coating roll provided opposite to the base material non-contact area of the coating roll In a coating apparatus having a coating liquid layer forming apparatus for forming a layer, a measuring surface that is provided to face a substrate contact area of the coating roll and forms a measuring gap between the substrate and And a coating liquid supply unit provided on the upstream side of the substrate from the measurement surface and supplying a coating liquid to the substrate.
【０００６】請求項１記載の本発明にあっては、塗工ロ
ールの外周面の基材非接触領域では、塗液層形成装置で
形成した塗液層が基材接触領域に向かって移動し、塗工
ロールの外周面の基材接触領域では、走行中の基材の他
方の表面に対して塗膜形成装置の塗液供給部から供給さ
れた塗液が、基材の走行に伴って計量用間隙へ浸入して
液圧を高めることにより、塗工ロールの外周面に向かっ
て基材を計量面で押し付けて接触圧力を確保させること
から、基材の一方の表面に上記塗工液層を確実に転写さ
せて塗膜を形成すると共に、基材の他方の表面に計量面
で塗膜を形成することができる。According to the first aspect of the present invention, the coating liquid layer formed by the coating liquid layer forming apparatus moves toward the substrate contact area in the substrate non-contact area on the outer peripheral surface of the coating roll. In the base material contact area on the outer peripheral surface of the coating roll, the coating liquid supplied from the coating liquid supply unit of the coating film forming apparatus to the other surface of the running base material along with the running of the base material By infiltrating into the measuring gap and increasing the liquid pressure, the base material is pressed against the outer peripheral surface of the coating roll on the measuring surface to secure the contact pressure, so that the coating liquid is applied to one surface of the base material. The layer can be surely transferred to form a coating film, and the coating film can be formed on the other surface of the substrate with a measuring surface.
【０００７】上記目的達成のために請求項２記載の本発
明が採用した手段は、強制回転するロール外周面に、該
ロール外周面の回転方向と逆方向へ走行する基材が巻き
掛け接触する基材接触領域と該基材が接触しない基材非
接触領域とを形成した塗工ロールと、該塗工ロールの基
材非接触領域に対向して設けられて塗工ロール外周面に
塗液層を形成する塗液層形成装置とを備えた塗工装置に
おいて、前記塗工ロールの基材接触領域内に位置する前
記基材へ向かって塗液を噴出する噴出口を有する塗膜形
成装置を備えたことを特徴とする塗工装置である。In order to achieve the above object, a means adopted by the present invention according to claim 2 is that a base material running in the direction opposite to the rotation direction of the roll outer peripheral surface is wound around the roll outer peripheral surface which is forcibly rotated and makes contact. A coating roll formed with a base material contact area and a base material non-contact area where the base material does not contact, and a coating liquid provided on the outer peripheral surface of the coating roll provided opposite to the base material non-contact area of the coating roll A coating liquid forming apparatus for forming a layer, comprising: a coating liquid forming apparatus having a jet port for jetting a coating liquid toward the base material located in a base material contact area of the coating roll. A coating apparatus comprising:
【０００８】請求項２記載の本発明にあっては、塗工ロ
ールの外周面の基材非接触領域では、塗液層形成装置で
形成した塗液層が基材接触領域に向かって移動し、塗工
ロールの外周面の基材接触領域では、走行中の基材に向
かって塗膜形成装置の噴出口から噴出する塗液で、基材
の他方の表面に塗膜を形成しつつ、塗工ロールの外周面
に向かって基材を押し付けて接触圧力を確保するため、
基材の一方の表面に上記塗工液層を確実に転写させて塗
膜を形成することができる。According to the second aspect of the present invention, the coating liquid layer formed by the coating liquid layer forming apparatus moves toward the substrate contact area in the substrate non-contact area on the outer peripheral surface of the coating roll. In the substrate contact area on the outer peripheral surface of the coating roll, the coating liquid is ejected from the ejection port of the coating film forming apparatus toward the moving substrate, while forming a coating film on the other surface of the substrate, To secure the contact pressure by pressing the substrate toward the outer peripheral surface of the coating roll,
The coating film can be formed by reliably transferring the coating liquid layer to one surface of the substrate.
【０００９】塗工ロールの基材接触領域の長さと、塗工
ロールの外周面に基材を押し付ける位置とを調節できる
ようにするために請求項３記載の本発明が採用した手段
は、前記塗膜形成装置を塗工ロールの周方向に沿って移
動可能に設け、前記塗工ロールの外側であって前記塗膜
形成装置より基材上流側に、移動することで前記基材接
触領域の長さを調節するガイドロールを設けた請求項１
又は２記載の塗工装置である。In order to adjust the length of the substrate contact area of the coating roll and the position where the substrate is pressed against the outer peripheral surface of the coating roll, the means adopted by the present invention according to claim 3 is characterized in that: The coating film forming apparatus is provided so as to be movable along the circumferential direction of the coating roll, and is located outside the coating roll and upstream from the coating film forming apparatus to the base material, thereby moving the base material contact area. 2. The apparatus according to claim 1, further comprising a guide roll for adjusting the length.
Or the coating device according to 2.
【００１０】請求項３記載の本発明にあっては、塗工ロ
ールの周方向に沿って塗膜形成装置を移動させること
で、塗工ロールの外周面に基材を押し付ける位置を調節
することができ、更にガイドロールを移動させること
で、基材接触領域の長さを調節することができる。According to the third aspect of the present invention, the position where the base material is pressed against the outer peripheral surface of the coating roll is adjusted by moving the coating film forming apparatus along the circumferential direction of the coating roll. By moving the guide roll, the length of the substrate contact area can be adjusted.
【００１１】[0011]
【発明の実施の形態】以下、本発明に係る塗工装置を図
面に示す実施の形態に基づいて説明する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, a coating apparatus according to the present invention will be described based on an embodiment shown in the drawings.
【００１２】（第１の実施の形態）図１乃至図３は本発
明の第１の実施の形態を示すものであり、図１は塗工装
置の概略側面図、図２は図１のＤ−Ｄ線で断面した平面
図、図３は要部の拡大側面図である。(First Embodiment) FIGS. 1 to 3 show a first embodiment of the present invention. FIG. 1 is a schematic side view of a coating apparatus, and FIG. FIG. 3 is an enlarged side view of a main part of a cross section taken along line -D.
【００１３】本実施形態の塗工装置１１は、ロール外周
面１２ａに、基材走行路Ｒをロール外周面１２ａの回転
方向（矢符Ｈ方向）と逆方向（矢符Ｎ方向）へ連続走行
する帯状の基材Ｓが巻き掛け接触する基材接触領域Ｅ１
と基材Ｓが接触しない基材非接触領域Ｅ２とを形成した
塗工ロール１２と、ロール外周面１２ａの基材非接触領
域Ｅ２に対向するように配設した塗液層形成装置１３
と、塗工ロール１２の基材接触領域Ｅ１に対向するよう
に配設した塗膜形成装置１４とを備えている。該塗工ロ
ール１２は、左右両側のフレーム１５，１５に軸支さ
れ、駆動装置１６で強制駆動されて外周面１２ａが矢符
Ｈ方向へ回転するようになっている。The coating apparatus 11 of the present embodiment continuously travels on the roll outer circumferential surface 12a in the direction (arrow N direction) opposite to the rotation direction (arrow H direction) of the roll outer circumferential surface 12a. Contact area E1 where the strip-shaped base material S is wound around and contacts
And a coating liquid layer forming apparatus 13 disposed so as to face the substrate non-contact area E2 of the roll outer peripheral surface 12a.
And a coating film forming apparatus 14 disposed so as to face the substrate contact area E1 of the coating roll 12. The coating roll 12 is rotatably supported by the left and right frames 15, 15, and is forcibly driven by a driving device 16 so that the outer peripheral surface 12 a rotates in the arrow H direction.
【００１４】前記塗液層形成装置１３は、塗工ロール１
２の回転中心線１２ｂに沿う左右方向（矢符Ｊ方向）に
延びており、その本体１８の内部に、左右方向に延びる
マニホールド１９及びスロットノズル（塗液供給部）２
０とが形成され、マニホールド１９から延設したスロッ
トノズル２０が、左右方向に延びる剛性の大きな先端リ
ップ部２１の脇に開口したダイコーター形式である。塗
液層形成装置１３は、左右の支持台１７，１７に、左右
の位置調整機構（図示略）を介して支持されており、こ
の位置調整機構の調整により、先端リップ部２１と塗工
ロール１２の外周面１２ａとの間の間隙寸法を塗工条件
に応じて最適値に設定できるようになっている。塗液層
形成装置１３は、塗液供給装置（図示略）に配管接合さ
れ、塗液供給装置から供給された塗液Ｌをマニホールド
１９で左右方向へ拡散させた後にスロットノズル２０の
先端開口部から左右方向全域に亘って均一に吐出させ、
回転中の塗工ロール１２の外周面１２ａに供給すると共
に、ロール外周面１２ａと先端リップ部２１との間の計
量用隙間に浸入した塗工液を先端リップ部２１で計量す
ることで、ロール外周面１２ａに塗液層Ｋを形成するよ
うになっている。The coating liquid layer forming apparatus 13 includes a coating roll 1
2, a manifold 19 and a slot nozzle (coating liquid supply unit) 2 extending in the left-right direction and extending in the left-right direction (the direction of the arrow J) along the rotation center line 12b.
0 is formed, and the slot nozzle 20 extending from the manifold 19 is of a die coater type opened to the side of a highly rigid tip lip portion 21 extending in the left-right direction. The coating liquid layer forming apparatus 13 is supported by left and right support bases 17 via right and left position adjusting mechanisms (not shown). By adjusting the position adjusting mechanisms, the tip lip portion 21 and the coating roll are adjusted. The gap between the outer peripheral surface 12a and the outer peripheral surface 12a can be set to an optimum value according to the coating conditions. The coating liquid layer forming device 13 is connected to a coating liquid supply device (not shown) by a pipe, and after diffusing the coating liquid L supplied from the coating liquid supply device in the left-right direction by the manifold 19, the opening of the tip end of the slot nozzle 20. From the entire area in the left-right direction,
The supply liquid is supplied to the outer peripheral surface 12a of the rotating coating roll 12 and the coating liquid that has entered the measuring gap between the outer peripheral surface 12a of the roll and the distal lip portion 21 is measured by the distal lip portion 21 so that the roll is measured. The coating liquid layer K is formed on the outer peripheral surface 12a.
【００１５】前記塗膜形成装置１４は、上述した塗液層
形成装置１３と前後対称構造となる同様の構成を備えて
いる。すなわち、塗液層形成装置１４は、塗工ロール１
２の回転中心線１２ｂに沿う左右方向（矢符Ｊ方向）に
延びており、その本体２８の内部に、左右方向に延びる
マニホールド２９及びスロットノズル（塗液供給部）３
０とが形成され、マニホールド２９から延設したスロッ
トノズル３０が、左右方向に延びる剛性の大きい先端リ
ップ部３１の脇に開口している。塗膜形成装置１４は、
左右の支持台２７，２７に、左右の位置調整機構（図示
略）を介して支持されており、この位置調整機構の調整
により、先端リップ部３１と基材Ｓとの間の計量用間隙
Ｔ（図３参照）の寸法を塗工条件に応じて最適値に設定
できるようになっている。先端リップ部３１は、基材Ｓ
との間で計量用間隙Ｔを形成する計量面３１ａが、塗工
ロール外周面１２ａに対面するように形成されている。
計量面３１ａは、剛性の大きな先端リップ部３１に形成
されているため、撓んで変形することはない。塗液層形
成装置１４は、塗液供給装置（図示略）に配管接合さ
れ、塗液供給装置から供給された塗液Ｌをマニホールド
２９で左右方向へ拡散させた後にスロットノズル３０の
先端開口部から左右方向全域に亘って均一に吐出させ、
基材走行路Ｒを走行中の基材Ｓの一方の表面Ｓａに供給
すると共に、基材Ｓと先端リップ部３１との間の計量用
間隙Ｔ（図３参照）に浸入した塗液Ｌを先端リップ部３
１の計量面３１ａで計量することで、基材表面Ｓａに塗
膜Ｍ２を形成するようになっている。The coating film forming apparatus 14 has the same structure as the above-described coating liquid layer forming apparatus 13 and has a symmetric structure in the front-rear direction. That is, the coating liquid layer forming device 14
2, a manifold 29 and a slot nozzle (coating liquid supply unit) 3 extending in the left-right direction (the direction of the arrow J) along the rotation center line 12b and extending in the left-right direction.
0 is formed, and a slot nozzle 30 extending from the manifold 29 is opened to the side of a highly rigid tip lip portion 31 extending in the left-right direction. The coating film forming apparatus 14
The right and left support bases 27 are supported via left and right position adjusting mechanisms (not shown). By adjusting the position adjusting mechanisms, the measuring gap T between the tip lip portion 31 and the substrate S is adjusted. The dimensions (see FIG. 3) can be set to optimum values according to the coating conditions. The tip lip portion 31 is
Is formed so as to face the coating roll outer peripheral surface 12a.
Since the measuring surface 31a is formed on the tip lip portion 31 having a large rigidity, the measuring surface 31a does not bend and deform. The coating liquid layer forming device 14 is connected to a coating liquid supply device (not shown) by piping, and after diffusing the coating liquid L supplied from the coating liquid supply device in the left-right direction by the manifold 29, the opening of the tip end of the slot nozzle 30. From the entire area in the left-right direction,
While supplying the substrate traveling path R to one surface Sa of the traveling substrate S, the coating liquid L that has penetrated into the measuring gap T (see FIG. 3) between the substrate S and the tip lip portion 31 is supplied. Tip lip 3
By measuring on the first measuring surface 31a, a coating film M2 is formed on the substrate surface Sa.
【００１６】前記塗膜形成装置１４の先端リップ部３１
は、図３に示す如く、ロール外周面１２ａと対面する計
量面３１ａを、左右方向に延びる一直線で交差する二つ
の平面で形成する以外に、図示は省略したが、基材Ｓの
走行方向（矢符Ｎ方向）に向かって行く程にロール外周
面１２ａに接近する平坦面、または凸状湾曲面等の任意
形状で形成し、塗工条件の変更に応じて最適形状を選択
することもある。The tip lip 31 of the coating film forming apparatus 14
As shown in FIG. 3, although not shown, except that the measuring surface 31a facing the roll outer peripheral surface 12a is formed by two planes intersecting with a straight line extending in the left-right direction, the running direction of the base material S ( It may be formed in an arbitrary shape such as a flat surface or a convex curved surface approaching the roll outer peripheral surface 12a as going toward the arrow N direction), and an optimum shape may be selected according to a change in coating conditions. .
【００１７】塗工装置１１は、図１に示す如く、前記塗
工ロール１２の回転方向に沿って基材接触領域Ｅ１の端
部Ｅ１ｂから塗液層形成装置対向部に至るまでの間のロ
ール外周面側に、ロール外周面１２ａを清掃するための
清掃装置２３を配設してある。清掃装置２３は、ロール
外周面１２ａの左右幅全域に当接するドクターブレード
２３ａと、受皿２３ｂとを備え、ロール外周面１２ａに
付着している塗液の残りを除去するようにしてある。清
掃装置２３は、ドクターブレード２３ａよりロール回転
方向（矢符Ｈ方向）の上流側に、塗液の溶媒を含んだス
ポンジロール（図示略）等の溶媒塗工具を配設すること
もある。As shown in FIG. 1, the coating device 11 is a roll extending from the end E1b of the substrate contact area E1 to the coating liquid layer forming device facing portion along the rotation direction of the coating roll 12. A cleaning device 23 for cleaning the roll outer peripheral surface 12a is provided on the outer peripheral surface side. The cleaning device 23 includes a doctor blade 23a that comes into contact with the entire left and right widths of the roll outer peripheral surface 12a, and a tray 23b, and is configured to remove the remaining coating liquid that has adhered to the roll outer peripheral surface 12a. The cleaning device 23 may be provided with a solvent coating tool such as a sponge roll (not shown) containing a solvent for the coating liquid on the upstream side of the doctor blade 23a in the roll rotation direction (arrow H direction).
【００１８】前記基材走行路Ｒの塗工ロール１２より上
流側には、塗工ロール１２と平行に移動するガイドロー
ル２４が配設されている。ガイドロール２４は、その位
置を変更することにより、塗工ロール１２の基材接触領
域Ｅ１の周方向長さを調節することができるようになっ
ている。更に、前記塗膜形成装置１４は、左右の支持台
２７，２７が塗工ロール１２の周方向（ロール回転方
向）に沿って移動調節可能となっており、塗工ロール１
２の基材接触領域Ｅ１内に配置される塗膜形成装置１４
の先端リップ部３１の位置を調節できるようにしてあ
る。塗工装置１１は、塗液Ｌ及び基材Ｓの種類並びに塗
工量（塗膜Ｍ１，Ｍ２の厚み）等の塗工条件の変更に伴
い、塗工ロール１２の周方向に沿って塗膜形成装置１４
を移動させることで、塗工ロール１２の外周面１２ａに
基材Ｓを押し付ける位置を調節することができ、更にガ
イドロール２４を移動させることで、基材接触領域Ｅ１
の長さを調節することができ、最適な塗工状態を得るこ
とができる。A guide roll 24 that moves in parallel with the coating roll 12 is disposed upstream of the coating roll 12 on the substrate running path R. By changing the position of the guide roll 24, the circumferential length of the substrate contact region E1 of the coating roll 12 can be adjusted. Further, in the coating film forming apparatus 14, the left and right support bases 27, 27 can be moved and adjusted along the circumferential direction of the coating roll 12 (roll rotation direction).
2 coating film forming apparatus 14 arranged in the substrate contact area E1
The position of the tip lip portion 31 can be adjusted. The coating device 11 changes the coating conditions along the circumferential direction of the coating roll 12 with changes in coating conditions such as the type of the coating liquid L and the base material S and the coating amount (thickness of the coating films M1 and M2). Forming device 14
Is moved, the position at which the base material S is pressed against the outer peripheral surface 12a of the coating roll 12 can be adjusted. By further moving the guide roll 24, the base material contact area E1 can be adjusted.
Can be adjusted, and an optimal coating state can be obtained.
【００１９】次に、前記塗工装置１１による両面塗工方
法を説明する。両面塗工方法は、図１に示すように塗液
層形成装置１３で塗液層Ｋを付着させながら矢符Ｈ方向
へ回転する塗工ロール１２の外周面１２ａに、塗工ロー
ル１２の回転方向と逆方向（矢符Ｎ方向）へ走行する基
材Ｓを巻き掛け接触させることにより、基材Ｗの一方の
表面Ｓｂに塗液層Ｋの塗液を転写して塗膜Ｍ１を形成
し、塗工ロール１２の基材接触領域Ｅ１に接触する基材
Ｓの他方の表面Ｓａに、塗膜形成装置１４のスロットノ
ズル３０から吐出する塗液Ｌを供給すると共に、図３に
示すように走行する基材Ｓに同伴して基材Ｓと先端リッ
プ部３１との間の計量用間隙Ｔ（図３参照）へ浸入した
塗液Ｌを、先端リップ部３１の計量面３１ａで計量する
ことで塗膜Ｍ２を形成する。このように基材Ｓに同伴し
て計量用間隙Ｔに押し込まれるように浸入した塗液Ｌ
は、液圧が高められるため、基材Ｓを塗工ロール１２の
外周面１２ａへ押し付けるようにしながら塗工され、塗
膜Ｍ２を形成することになる。塗液Ｌで押し付けられる
基材Ｓは、塗工ロール１２の外周面１２ａに対する接触
圧力を確保することにより、その一方の表面Ｓｂに、塗
工ロール１２ａの外周面１２ａに付着している塗工液層
Ｋを確実に転写させて塗膜Ｍ１を形成することができ
る。Next, a double-side coating method using the coating apparatus 11 will be described. As shown in FIG. 1, the double-side coating method includes rotating the coating roll 12 on the outer peripheral surface 12a of the coating roll 12 which rotates in the direction of arrow H while applying the coating liquid layer K by the coating liquid layer forming device 13. The coating liquid of the coating liquid layer K is transferred onto one surface Sb of the base material W by winding and contacting the base material S traveling in the opposite direction (the direction of the arrow N) to form the coating film M1. The coating liquid L discharged from the slot nozzle 30 of the coating film forming apparatus 14 is supplied to the other surface Sa of the base material S that comes into contact with the base material contact area E1 of the coating roll 12, and as shown in FIG. The coating liquid L that has entered the measuring gap T (see FIG. 3) between the base material S and the tip lip portion 31 accompanying the running base material S is measured by the measuring surface 31a of the tip lip portion 31. To form a coating film M2. The coating liquid L thus penetrated so as to be pushed into the measuring gap T accompanying the base material S.
Is applied while the base material S is pressed against the outer peripheral surface 12a of the coating roll 12 to form a coating film M2. The base material S pressed by the coating liquid L secures the contact pressure to the outer peripheral surface 12a of the coating roll 12 so that one surface Sb of the substrate S adheres to the outer peripheral surface 12a of the coating roll 12a. The coating layer M1 can be formed by reliably transferring the liquid layer K.
【００２０】両面に塗膜Ｍ１，Ｍ２を形成した基材Ｓ
は、図１に示すように浮揚式の乾燥機３３を通過する間
に乾燥させられる。熱風式の乾燥機３３を通過するとき
に受けた熱風で基材Ｓが振動するときには、図３に示す
如く、前記塗膜形成装置１４の先端リップ部３１は、前
記塗工ロール１２の外周面１２ａに形成された基材接触
領域Ｅ１の基材走行路Ｒ下流側となる端部Ｅ１ａを除く
内側位置（両端部Ｅ１ａとＥ１ｂとの間）に配設するの
が好ましい。これにより、基材Ｓは、先端リップ部３１
を離れても、基材接触領域Ｅ１の一部で積極的に接触し
た後に塗工ロール１２から離れるため、乾燥機３３で受
けた振動を基材接触領域Ｅ１の一部で遮断することによ
り、計量用間隙Ｔで振動することなく精度の高い塗膜Ｍ
２が得られる。Substrate S having coating films M1 and M2 formed on both sides
Is dried while passing through a floating dryer 33 as shown in FIG. When the substrate S vibrates due to the hot air received when passing through the hot air dryer 33, the tip lip portion 31 of the coating film forming apparatus 14 is attached to the outer peripheral surface of the coating roll 12 as shown in FIG. It is preferable to dispose it at an inner position (between both ends E1a and E1b) excluding an end E1a on the base material traveling path R downstream of the base material contact area E1 formed at 12a. As a result, the base material S becomes
Even after leaving, since it is separated from the coating roll 12 after being positively contacted in a part of the base material contact area E1, by interrupting the vibration received by the dryer 33 in a part of the base material contact area E1, Highly accurate coating film M without vibration in the measuring gap T
2 is obtained.
【００２１】前記塗工装置１１は、次の如き優れた効果
を有する。すなわち、一個の塗工ロール１２で両面塗工
ができるため、二個の塗工ロールを必要とする従来の装
置（図６）に比べて構造的に簡単且つ小型化が可能とな
り、コスト及びメンテナンスの面で有利となる。また、
塗工ロール１２の内側にマグネットを設ける必要がない
ため、塗工ロール１２の構造的に簡単となり、ロール外
周面の真円度や円筒度等の精度確保が容易となり、高精
度の塗膜が得られる。更に、塗工ロール１２の外周面１
２ａに基材Ｓを塗液の液圧で押し付けて接触圧力を確保
するため、非磁性体の基材の表面にも気泡欠陥や厚みむ
らの少ない塗膜を形成することができる。一個の塗工ロ
ール１２の外周面１２ａに基材Ｓを接触させるため、塗
工装置１１の出側における基材Ｓの張力を従来に比べ低
くすることができ、低張力の基材Ｓに適用することがで
きる。The coating apparatus 11 has the following excellent effects. That is, since two-sided coating can be performed with one coating roll 12, structurally simpler and smaller in size can be achieved as compared with a conventional apparatus requiring two coating rolls (FIG. 6), and cost and maintenance are possible. It becomes advantageous in terms of. Also,
Since there is no need to provide a magnet inside the coating roll 12, the structure of the coating roll 12 is simplified, accuracy of roundness and cylindricity of the outer peripheral surface of the roll is easily secured, and a high-precision coating film is formed. can get. Further, the outer peripheral surface 1 of the coating roll 12
Since the contact pressure is ensured by pressing the substrate S against the liquid pressure of the coating liquid, the coating film with less bubble defects and uneven thickness can be formed on the surface of the non-magnetic substrate. Since the base material S is brought into contact with the outer peripheral surface 12a of one coating roll 12, the tension of the base material S at the output side of the coating device 11 can be made lower than before, and the present invention is applied to the low-tensile base material S. can do.
【００２２】（第２の実施の形態）図４は本発明の第２
の実施の形態の要部の拡大側面図である。本実施の形態
に係る塗工装置４１が前記塗工装置１１（図１乃至図
３）と相違する点は、塗工ロール１２の基材接触領域Ｅ
１に対向するように配設した塗膜形成装置４４に、基材
走行路Ｒを走行する基材Ｓに向かって塗液を噴出する噴
出口４５を設け、噴出口４５から噴出する塗液Ｌで、基
材Ｓの他方の表面Ｓａに塗膜Ｍ２を形成しつつ、基材Ｓ
を塗工ロール１２に押し付けて接触圧力を確保するよう
にしたことである。この相違点以外の構成は、前記塗工
装置１１と実質的に同一である。(Second Embodiment) FIG. 4 shows a second embodiment of the present invention.
It is an expanded side view of the principal part of embodiment. The coating apparatus 41 according to the present embodiment is different from the coating apparatus 11 (FIGS. 1 to 3) in that the base material contact area E of the coating roll 12 is different.
1 is provided with a spray port 45 for spraying a coating liquid toward the base material S traveling on the base material travel path R, and the coating liquid L sprayed from the spray port 45 is provided in the coating film forming apparatus 44 disposed so as to face the coating liquid L. Then, while forming the coating film M2 on the other surface Sa of the base material S, the base material S
Is pressed against the coating roll 12 to secure the contact pressure. The configuration other than this difference is substantially the same as that of the coating apparatus 11.
【００２３】該塗液層形成装置４４は、塗工ロール１２
の回転中心線に沿う左右方向に延びており、その本体４
６の内部に、左右方向に延びるマニホールド４７及びス
ロットノズル４８とが形成され、マニホールド４７から
延設したスロットノズル４８の先端に噴出口４５を形成
してある。塗膜形成装置４４は、左右の支持台２７，２
７に、左右の位置調整機構（図示略）を介して支持され
ており、この位置調整機構の調整により、噴出口４５と
基材走行路Ｒとの間の間隙寸法を塗工条件に応じて最適
値に設定できるようになっている。更に、前記塗膜形成
装置４４は、左右の支持台２７，２７が塗工ロール１２
の周方向（ロール回転方向）に沿って移動調節可能とな
っており、塗工ロール１２の基材接触領域Ｅ１内に配置
される塗膜形成装置４４の噴出口４５の位置を調節でき
るようにしてある。The coating liquid layer forming device 44 includes a coating roll 12
The main body 4 extends in the left-right direction along the rotation center line of
6, a manifold 47 and a slot nozzle 48 extending in the left-right direction are formed, and a jet port 45 is formed at the tip of the slot nozzle 48 extending from the manifold 47. The coating film forming device 44 includes left and right support bases 27 and 2.
7 is supported via left and right position adjustment mechanisms (not shown), and by adjusting the position adjustment mechanisms, the gap size between the ejection port 45 and the substrate traveling path R is adjusted according to the coating conditions. It can be set to the optimal value. Further, the coating film forming apparatus 44 is configured such that the left and right support bases 27, 27
In the circumferential direction (roll rotation direction) of the coating roll 12, so that the position of the jet port 45 of the coating film forming apparatus 44 arranged in the base material contact area E1 of the coating roll 12 can be adjusted. It is.
【００２４】次に、前記塗工装置４１による両面塗工方
法を説明する。基材Ｗの一方の表面Ｓｂに塗液層Ｋの塗
液を転写して塗膜Ｍ１を形成することは、前記第１の実
施の形態と同様である。すなわち、図１に示す塗液層形
成装置１３で塗液層Ｋを付着させながら矢符Ｈ方向へ回
転する塗工ロール１２の外周面１２ａに、塗工ロール１
２の回転方向と逆方向（矢符Ｎ方向）へ走行する基材Ｓ
を巻き掛け接触させることにより、基材Ｗの一方の表面
Ｓｂに塗液層Ｋの塗液を転写して塗膜Ｍ１を形成する。
図４に示す塗工ロール１２の外周面１２ａの基材接触領
域Ｅ１では、塗工ロール１２の基材接触領域Ｅ１に接触
する基材Ｓの他方の表面Ｓａに、走行中の基材Ｓに向か
って塗膜形成装置４４の噴出口４５から噴出する塗液Ｌ
で塗膜Ｍ２を形成する。このとき、塗膜形成装置４４の
噴出口４５から噴出する塗液Ｌは、基材Ｓの他方の表面
Ｓａに塗膜Ｍ２を形成しつつ、塗工ロール１２の外周面
１２ａに向かって基材Ｓを押し付けて接触圧力を確保す
るため、基材Ｓの一方の表面Ｓｂに上記塗工液層Ｋを確
実に転写させて塗膜Ｍ１を形成することができる。Next, a double-side coating method using the coating device 41 will be described. Transferring the coating liquid of the coating liquid layer K to one surface Sb of the base material W to form the coating film M1 is the same as in the first embodiment. That is, the coating roll 1 is applied to the outer peripheral surface 12a of the coating roll 12 which rotates in the direction of the arrow H while applying the coating liquid layer K by the coating liquid layer forming apparatus 13 shown in FIG.
Substrate S traveling in the opposite direction (the direction of the arrow N) to the rotation direction 2
Are wound around and contact with each other to transfer the coating liquid of the coating liquid layer K to one surface Sb of the base material W to form the coating film M1.
In the base material contact area E1 of the outer peripheral surface 12a of the coating roll 12 shown in FIG. 4, the other surface Sa of the base material S in contact with the base material contact area E1 of the coating roll 12, Coating liquid L ejected from the ejection port 45 of the coating film forming apparatus 44
To form a coating film M2. At this time, the coating liquid L spouted from the spout 45 of the coating film forming device 44 forms the coating film M2 on the other surface Sa of the base material S and moves the base material toward the outer peripheral surface 12a of the coating roll 12. In order to secure the contact pressure by pressing S, the coating liquid layer K can be reliably transferred to one surface Sb of the base material S to form the coating film M1.
【００２５】（第３の実施の形態）図５は本発明の第３
の実施の形態の要部の拡大側面図である。本実施の形態
に係る塗工装置５１が前記塗工装置１１（図１乃至図
３）や前記塗工装置４１（図４）と相違する点は、ロー
ル外周面１２ａの基材非接触領域Ｅ２に対向するように
配設した塗液層形成装置５３をロールコーター方式とし
たことである。この相違点以外の構成は、前記塗工装置
１１，４１と実質的に同一である。(Third Embodiment) FIG. 5 shows a third embodiment of the present invention.
It is an expanded side view of the principal part of embodiment. The coating device 51 according to the present embodiment is different from the coating device 11 (FIGS. 1 to 3) and the coating device 41 (FIG. 4) in that the base material non-contact area E2 of the roll outer peripheral surface 12a is provided. Is that the coating liquid layer forming device 53 disposed so as to be opposed to is a roll coater type. The configuration other than this difference is substantially the same as the coating apparatuses 11 and 41.
【００２６】該塗液層形成装置５３は、塗工ロール１２
の回転方向と逆方向へ強制駆動回転するアプリケーショ
ンロール５４と、塗工ロール１２の回転方向と同方向へ
強制駆動回転する計量ロール５５と、アプリケーション
ロール５４の下半部が沈み込む塗液用パン５６とを備
え、塗液用パン５６を通過する間にアプリケーションロ
ール５４の外周面に付着した塗液層を計量ロール５５で
所定層厚みに計量し、計量された塗液層Ｐを塗工ロール
１２の外周面１２ａに転写して塗液層Ｋを形成するよう
にしてある。The coating liquid layer forming device 53 includes a coating roll 12
The application roll 54 is forcibly driven and rotated in the opposite direction to the rotation direction of the application roll 12, the measuring roll 55 is forcibly driven and rotated in the same direction as the rotation direction of the coating roll 12, and the coating liquid pan into which the lower half of the application roll 54 sinks. A coating liquid layer adhering to the outer peripheral surface of the application roll 54 while passing through the coating liquid pan 56 is measured to a predetermined layer thickness by a measuring roll 55, and the measured coating liquid layer P is applied to the coating roll. The coating liquid layer K is formed by being transferred to the outer peripheral surface 12a of the substrate 12.
【００２７】（その他の実施の形態）前記塗工装置１
１，４１，５１は、基材Ｓの出口側を垂直に立ち上げる
ように引き出す方式以外に、水平方向や傾斜方向へ引き
出すように、塗液層形成装置１３や塗膜形成装置１４
（４４）の配設位置を、図１等に示す位置から塗工ロー
ル１２の周方向に沿って移動させることも可能である。(Other Embodiments) The Coating Apparatus 1
The coating liquid layer forming device 13 and the coating film forming device 14 are provided so that the outlet side of the base material S is drawn up in a horizontal direction or an inclined direction, in addition to the method of drawing out the outlet side of the base material S vertically.
The arrangement position of (44) can be moved along the circumferential direction of the coating roll 12 from the position shown in FIG.
【００２８】[0028]
【発明の効果】請求項１及び２記載の本発明は、精度確
保が容易な一個の塗工ロールを用いて両面塗工ができる
と共に、非磁性の基材や低張力の基材であっても塗工ロ
ールに対する接触圧力を確保できるため、塗工装置を構
造的に簡略且つ小型化することが可能となり、塗工装置
の製造コストの低減及びメンテナンスを容易にできる。According to the first and second aspects of the present invention, a non-magnetic substrate or a low-tension substrate can be used for both-side coating using a single coating roll that can easily ensure accuracy. Also, since the contact pressure with the coating roll can be ensured, the coating device can be structurally simplified and downsized, and the manufacturing cost and maintenance of the coating device can be reduced easily.
【００２９】請求項１記載の本発明は、基材の走行に伴
って計量用間隙へ浸入した塗液の液圧を高めることがで
きるため、大きな接触圧力で基材を塗工ロールに押し付
けることが可能となり、より確実な両面塗工ができる。According to the first aspect of the present invention, since the liquid pressure of the coating liquid that has entered the measuring gap as the substrate travels can be increased, the substrate is pressed against the coating roll with a large contact pressure. Is possible, and more reliable double-sided coating can be performed.
【００３０】請求項２記載の本発明は、塗膜形成装置の
噴出口から噴出する塗液により、塗工ロールに基材を押
し付ける接触圧力を確保することができるため、塗膜形
成装置を構造的に簡略することが可能となり、塗工装置
の製造コストの低減及びメンテナンスを容易にできる。According to the second aspect of the present invention, the contact pressure for pressing the substrate against the coating roll can be ensured by the coating liquid jetted from the jet port of the coating film forming apparatus. This makes it possible to reduce the manufacturing cost of the coating apparatus and facilitate maintenance.
【００３１】請求項３記載の本発明は、基材や塗液の仕
様に応じて、塗工ロールの基材接触領域の長さと、塗工
ロールの外周面に基材を押し付ける位置とを調節できる
ため、最適な両面塗工ができる。According to the third aspect of the present invention, the length of the substrate contact area of the coating roll and the position of pressing the substrate against the outer peripheral surface of the coating roll are adjusted according to the specifications of the substrate and the coating liquid. Because of this, optimal double-sided coating can be performed.
【図１】本発明の第１の実施の形態を示すものであり、
塗工装置の概略側面図である。FIG. 1 shows a first embodiment of the present invention;
It is a schematic side view of a coating device.
【図２】図１のＤ−Ｄ線で断面した平面図である。FIG. 2 is a plan view taken along a line DD in FIG. 1;
【図３】第１の実施の形態の要部の拡大側面図である。FIG. 3 is an enlarged side view of a main part of the first embodiment.
【図４】本発明の第２の実施の形態の要部の拡大側面図
である。FIG. 4 is an enlarged side view of a main part according to a second embodiment of the present invention.
【図５】本発明の第３の実施の形態を示すものであり、
塗工装置の概略側面図である。FIG. 5 shows a third embodiment of the present invention;
It is a schematic side view of a coating device.
【図６】従来の塗工装置の概略側面図である。FIG. 6 is a schematic side view of a conventional coating apparatus.
１２…塗工ロール、１２ａ…ロール外周面、１３…塗液
層形成装置、１４，４４…塗膜形成装置、３０…塗液供
給部（スロットノズル）、３１ａ…計量面、４５…噴出
口、Ｒ…基材走行路，Ｅ１…基材接触領域、Ｅ２…基材
非接触領域、Ｓ…基材、Ｔ…計量用間隙12: Coating roll, 12a: Roll outer peripheral surface, 13: Coating liquid layer forming device, 14, 44: Coating film forming device, 30: Coating liquid supply unit (slot nozzle), 31a: Measuring surface, 45: Spout port, R: substrate traveling path, E1: substrate contact area, E2: substrate non-contact area, S: substrate, T: measuring gap
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 平10−216587（ＪＰ，Ａ) 特開 平１−101151（ＪＰ，Ａ) 特開 昭63−194766（ＪＰ，Ａ) 特公 平１−50464（ＪＰ，Ｂ２) 特公 昭60−44985（ＪＰ，Ｂ１) (58)調査した分野(Int.Cl.7，ＤＢ名) B05C 9/04 B05C 1/12 B05C 5/02 ──────────────────────────────────────────────────続 き Continuation of the front page (56) References JP-A-10-216587 (JP, A) JP-A-1-101151 (JP, A) JP-A-63-194766 (JP, A) 50464 (JP, B2) JP-B-60-44985 (JP, B1) (58) Fields investigated (Int. Cl. 7 , DB name) B05C 9/04 B05C 1/12 B05C 5/02
Claims (3)
周面の回転方向と逆方向へ走行する基材が巻き掛け接触
する基材接触領域と該基材が接触しない基材非接触領域
とを形成した塗工ロールと、該塗工ロールの基材非接触
領域に対向して設けられて塗工ロール外周面に塗液層を
形成する塗液層形成装置とを備えた塗工装置において、
前記塗工ロールの基材接触領域に対向して設けられて前
記基材との間で計量用間隙を形成する計量面と、該計量
面より基材上流側に設けられて前記基材へ塗液を供給す
る塗液供給部とを有する塗膜形成装置を備えたことを特
徴とする塗工装置。1. A base material contact region where a base material traveling in a direction opposite to the rotation direction of the roll outer circumferential surface is forcibly wound around the roll outer circumferential surface forcibly rotating and a base material non-contact region where the base material does not contact. And a coating liquid forming apparatus that is provided to face the substrate non-contact area of the coating roll and forms a coating liquid layer on the outer peripheral surface of the coating roll. ,
A measuring surface provided opposite to the substrate contact area of the coating roll to form a measuring gap with the substrate, and a measuring surface provided on the upstream side of the measuring surface to coat the substrate; A coating apparatus, comprising: a coating film forming apparatus having a coating liquid supply unit for supplying a liquid.
周面の回転方向と逆方向へ走行する基材が巻き掛け接触
する基材接触領域と該基材が接触しない基材非接触領域
とを形成した塗工ロールと、該塗工ロールの基材非接触
領域に対向して設けられて塗工ロール外周面に塗液層を
形成する塗液層形成装置とを備えた塗工装置において、
前記塗工ロールの基材接触領域内に位置する前記基材へ
向かって塗液を噴出する噴出口を有する塗膜形成装置を
備えたことを特徴とする塗工装置。2. A base material contact region where a base material traveling in a direction opposite to the rotation direction of the roll outer circumferential surface is in contact with a base material contacting region where the base material is not in contact with the base material which does not contact the base material. And a coating liquid forming apparatus that is provided to face the substrate non-contact area of the coating roll and forms a coating liquid layer on the outer peripheral surface of the coating roll. ,
A coating apparatus, comprising: a coating film forming apparatus having a jet port for jetting a coating liquid toward the substrate located in a substrate contact area of the coating roll.
沿って移動可能に設け、前記塗工ロールの外側であって
前記塗膜形成装置より基材上流側に、移動することで前
記基材接触領域の長さを調節するガイドロールを設けた
請求項１又は２記載の塗工装置。3. The apparatus according to claim 1, wherein the coating film forming device is provided so as to be movable in a circumferential direction of the coating roll, and is moved outside the coating roll and upstream of the substrate from the coating film forming device. The coating apparatus according to claim 1, further comprising a guide roll for adjusting a length of the substrate contact area.
Priority Applications (1)
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|---|---|---|---|
| JP2000100426A JP3345666B2 (en) | 2000-04-03 | 2000-04-03 | Coating equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000100426A JP3345666B2 (en) | 2000-04-03 | 2000-04-03 | Coating equipment |
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|---|---|
| JP2001276711A JP2001276711A (en) | 2001-10-09 |
| JP3345666B2 true JP3345666B2 (en) | 2002-11-18 |
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