JP3319704B2 - Dielectric porcelain composition and porcelain capacitor - Google Patents

Dielectric porcelain composition and porcelain capacitor

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Publication number
JP3319704B2
JP3319704B2 JP08452797A JP8452797A JP3319704B2 JP 3319704 B2 JP3319704 B2 JP 3319704B2 JP 08452797 A JP08452797 A JP 08452797A JP 8452797 A JP8452797 A JP 8452797A JP 3319704 B2 JP3319704 B2 JP 3319704B2
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JP
Japan
Prior art keywords
porcelain
dielectric
sio
component
molar ratio
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP08452797A
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Japanese (ja)
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JPH10259055A (en
Inventor
洋一 水野
康之 猪又
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Taiyo Yuden Co Ltd
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Taiyo Yuden Co Ltd
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Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】この発明は、誘電体磁器組成
物、特に数100MHz〜数GHzの高周波領域で使用
される0.01pF〜30pF程度の低容量の磁器コン
デンサの誘電体層を形成するのに適した誘電体磁器組成
物とこの誘電体磁器組成物を用いた磁器コンデンサに関
するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a dielectric ceramic composition, and more particularly, to a dielectric layer of a low-capacity ceramic capacitor of about 0.01 pF to 30 pF used in a high frequency range of several hundred MHz to several GHz. The present invention relates to a dielectric porcelain composition suitable for a porcelain and a ceramic capacitor using the dielectric porcelain composition.

【0002】[0002]

【従来の技術】従来、高周波領域で使用される低容量の
磁器コンデンサの誘電体層の材料としては、TiO2
材料、CaTiO3 系材料、LaTiO3 系材料、Ca
ZrO3 系材料、MgTiO3 系材料等の低誘電率の誘
電体磁器組成物が用いられていた。
2. Description of the Related Art Hitherto, as a material of a dielectric layer of a low-capacity ceramic capacitor used in a high-frequency region, TiO 2 material, CaTiO 3 material, LaTiO 3 material, CaTiO 3 material,
Low dielectric constant dielectric ceramic compositions such as ZrO 3 -based materials and MgTiO 3 -based materials have been used.

【0003】これらの誘電体磁器組成物は、焼成温度が
1200〜1500℃と高く、低容量の磁器コンデンサ
に使用するためには誘電率がやや大きく、しかも内部電
極材料として純Pdを使用した場合、デラミネーション
を生じさせ易いという欠点を有していた。
[0003] These dielectric porcelain compositions have firing temperatures as high as 1200 to 1500 ° C, have a relatively high dielectric constant for use in low-capacity porcelain capacitors, and use pure Pd as an internal electrode material. Disadvantageously, delamination is easily caused.

【0004】[0004]

【発明が解決しようとする課題】本件出願人は、これら
の欠点を改善するものとして、珪酸マグネシウム・亜鉛
[(Mga Zn(1-a)X SiOX+2 ]、アルミナ[A
23 ]及びチタン酸ストロンチウム[SrTiO
3 ]からなる誘電体磁器組成物を本願に先立って提案し
ている。
Applicant The object of the invention is to solve the above-as to improve these disadvantages, magnesium silicate, zinc [(Mg a Zn (1- a)) X SiO X + 2], alumina [A
l 2 O 3 ] and strontium titanate [SrTiO
3 ] has been proposed prior to the present application.

【0005】この提案に係る誘電体磁器組成物は、11
00℃以下の温度で焼成でき、誘電率εr が15以下と
小さく、内部電極の材料として純Pdを使用してもデラ
ミネーションを生じさせないという優れた特性を有する
材料である。
[0005] The dielectric porcelain composition according to this proposal comprises 11
It is a material which can be fired at a temperature of 00 ° C. or less, has a small dielectric constant ε r of 15 or less, and has excellent characteristics that delamination does not occur even when pure Pd is used as a material of an internal electrode.

【0006】ただ、この提案に係る誘電体磁器組成物
は、磁器コンデンサの誘電体層に使用した場合、リーク
電流がやや多いという問題を有していた。
However, the dielectric ceramic composition according to this proposal has a problem that when used for the dielectric layer of a ceramic capacitor, the leakage current is slightly large.

【0007】この発明は、1100℃以下の温度で焼成
でき、誘電率εr が15以下で、内部電極の材料として
純Pdを使用してもデラミネーションを生じさせず、磁
器コンデンサの誘電体層に使用した場合にリーク電流が
低い(125℃−600Vで1.0μA以下)誘電体磁
器組成物とこの誘電体磁器組成物を用いた磁器コンデン
サを提供することを目的とする。
The present invention can be fired at a temperature of 1100 ° C. or less, has a dielectric constant ε r of 15 or less, does not cause delamination even when pure Pd is used as a material of an internal electrode, and has a dielectric layer of a ceramic capacitor. It is an object of the present invention to provide a dielectric ceramic composition having a low leakage current (1.0 μA or less at 125 ° C.-600 V) when used in a ceramic capacitor and a ceramic capacitor using the dielectric ceramic composition.

【0008】[0008]

【課題を解決するための手段】この発明に係る誘電体磁
器組成物は、一般式 X(Mga Zn(1-a)X SiOX+2 −YAl23
ZSrTiO3 で表される主成分と、Nb,Ta及びWから選択された
1種又は2種以上の元素の化合物からなる添加成分を含
有し、前記主成分を構成する珪酸マグネシウム・亜鉛
[(Mga Zn(1-a)X SiOX+2 ]、アルミナ[A
23 ]及びチタン酸ストロンチウム[SrTi
3]のモル比[%]が、これら3種の化合物のモル比
(X,Y,Z)を示す3成分組成図に於いて、 A(94.9, 0.1, 5.0) B(85.0, 10.0, 5.0) C(65.0, 10.0, 25.0) D(65.0, 0.1, 34.9) で示される各点A〜Dを頂点とする多角形で囲まれた範
囲にあり、前記主成分を表す一般式中のa及びxの値
が、 0.1≦a≦0.80 0.67≦x≦1.50 の範囲にあり、前記添加成分がNbO5/2 ,TaO5/2
又はWO3 に換算して0.01〜0.2モル%含有され
ている
SUMMARY OF THE INVENTION The dielectric ceramic composition according to the invention have the general formula X (Mg a Zn (1- a)) X SiO X + 2 -YAl 2 O 3 -
It contains a main component represented by ZSrTiO 3 and an additional component comprising a compound of one or more elements selected from Nb, Ta and W, and contains magnesium silicate / zinc silicate [(Mg a Zn (1-a) ) X SiO X + 2 ], alumina [A
l 2 O 3 ] and strontium titanate [SrTi
In the three-component composition diagram in which the molar ratio [%] of O 3 ] indicates the molar ratio (X, Y, Z) of these three compounds, A (94.9, 0.1, 5.0) B (85.0, 10.0, 5.0) C (65.0, 10.0, 25.0) D (65.0, 0.1, 34.9) And the values of a and x in the general formula representing the main component are in the range of 0.1 ≦ a ≦ 0.80 0.67 ≦ x ≦ 1.50 Wherein the additional components are NbO 5/2 , TaO 5/2
Or in terms of WO 3 is contained 0.01 to 0.2 mol%

【0009】ここで、MZSのモル比[%]を上記の範
囲としたのは、MZSのモル比[%]が上記の範囲を逸
脱すると、1100℃以下の焼成で緻密な焼結体が得ら
れなくなるか、誘電率εr が15より大きくなり、温度
係数TCCもマイナス側に大きくなり過ぎるからであ
る。
Here, the reason why the molar ratio [%] of MZS falls within the above range is that if the molar ratio [%] of MZS deviates from the above range, a dense sintered body can be obtained by firing at 1100 ° C. or lower. or it is no longer, since the dielectric constant epsilon r is larger than 15, even if the temperature coefficient TCC too large on the negative side.

【0010】また、Al23 のモル比[%]を上記の
範囲としたのは、Al23 のモル比[%]が上記の範
囲を逸脱すると、1100℃以下の焼成で緻密な焼結体
が得られなくなるからである。
Further, the molar ratio of Al 2 O 3 a [%] was set to the above range, the molar ratio of Al 2 O 3 [%] is outside the above range, dense in firing 1100 ° C. or less This is because a sintered body cannot be obtained.

【0011】また、STのモル比[%]を上記の範囲と
したのは、STのモル比[%]が上記の範囲より大きく
なると、誘電率εr が15より大きくなったり、温度係
数TCCがマイナス側に大きくなり過ぎ、また、STの
モル比[%]が上記の範囲より小さくなると、1100
℃以下の焼成で緻密な焼結体が得られなくなるからであ
る。
Further, the molar ratio of ST to [%] was set to the above range, the molar ratio of ST [%] is greater than the above range, or the dielectric constant epsilon r is greater than 15, the temperature coefficient TCC Is too large on the negative side, and when the molar ratio [%] of ST is smaller than the above range, 1100
This is because a dense sintered body cannot be obtained by firing at a temperature of not more than ℃.

【0012】また、aの値を上記の範囲としたのは、a
の値が上記の範囲より大きくなると、1100℃以下の
焼成で緻密な焼結体が得られなくなり、aの値が上記の
範囲より小さくなると、焼結体の内部にポアが多く生成
し、Q値が1000より小さくなるからである。
The reason why the value of a is set in the above range is that a
Is larger than the above range, a dense sintered body cannot be obtained by firing at 1100 ° C. or less, and when the value of a is smaller than the above range, many pores are generated inside the sintered body and Q This is because the value becomes smaller than 1000.

【0013】また、xの値を上記の範囲としたのは、x
の値が上記の範囲より大きくなると、1100℃の焼成
で緻密な焼結体が得られなくなり、xの値が上記の範囲
より小さくなると、焼成の際の適正温度幅が非常に狭く
なって融着し易くなり、焼結体中にポアが多く生成し、
Q値が1000より小さくなるからである。
The reason why the value of x is in the above range is that x
If the value of x is larger than the above range, a dense sintered body cannot be obtained by firing at 1100 ° C, and if the value of x is smaller than the above range, the appropriate temperature range during firing becomes extremely narrow, and Easy to wear, many pores are generated in the sintered body,
This is because the Q value becomes smaller than 1000.

【0014】前記添加成分をNbO5/2 ,TaO5/2
はWO3 に換算して0.01〜0.2モル%としたの
は、0.01モル%より少ないと、リーク電流の改善効
果がなく、0.2モル%を越えると1100℃以下の焼
成で、緻密な焼結体が得られなくなるからである。これ
らの添加成分は単独で添加しても、混合状態で添加して
も同様の効果がある。
The reason why the content of the additive is 0.01 to 0.2 mol% in terms of NbO 5/2 , TaO 5/2 or WO 3 is that when the content is less than 0.01 mol%, the leakage current is improved. This is because there is no effect, and if it exceeds 0.2 mol%, a dense sintered body cannot be obtained by firing at 1100 ° C. or less. The same effect can be obtained by adding these additives alone or in a mixed state.

【0015】MZS,Al23 及びSTからなる混合
物の仮焼は行っても、行わなくても、所望の特性は得ら
れるが、仮焼の有無で電気的特性は変化する。ただし、
仮焼は添加成分と主成分、或いは添加成分同志で反応が
起こり、結晶系が変化し、急激に収縮が生じたり、収縮
率が大きくなる場合に有効である。すなわち、デラミネ
ーション、クラック等の構造欠陥の抑制に有効である。
The desired characteristics can be obtained with or without calcination of the mixture comprising MZS, Al 2 O 3 and ST, but the electrical characteristics change depending on the presence or absence of calcination. However,
The calcination is effective when a reaction occurs between the additive component and the main component or between the additive components, the crystal system changes, and sudden shrinkage occurs or the shrinkage rate increases. That is, it is effective in suppressing structural defects such as delamination and cracks.

【0016】また、この発明に係る磁器コンデンサは、
上記の誘電体磁器組成物を誘電体層として用いたもので
ある。ここで、内部電極の材料としてはPdを使用する
ことができるが、Ag,Ptを用いてもよい。磁器コン
デンサは単層タイプのもの及び積層タイプのもののいず
れにも適用できる。
Further, the porcelain capacitor according to the present invention comprises:
The above dielectric ceramic composition is used as a dielectric layer. Here, Pd can be used as the material of the internal electrode, but Ag and Pt may be used. The porcelain capacitor can be applied to both a single-layer type and a multilayer type.

【0017】また、この発明に係る磁器コンデンサは、
低周波領域でも十分使用できるが、特に、数100MH
z〜数GHzの高周波領域で使用される0.01pF〜
30pF程度の低容量の磁器コンデンサとして用いるの
に好適である。
Further, the porcelain capacitor according to the present invention comprises:
Although it can be used sufficiently even in the low frequency range, especially, several hundred MHz
z to 0.01 pF used in a high frequency range of several GHz
It is suitable for use as a low-capacity porcelain capacitor of about 30 pF.

【0018】[0018]

【発明の実施の形態】まず、MgO,ZnO及びSiO
2 を表1〜表1に示すような比率で秤量し、これら
をボールミルに入れ、湿式で15時間粉砕混合し、これ
らの混合物からなる泥漿を得た。次に、この泥漿を取り
出して濾過し、ケーキの部分を乾燥器に入れ、150℃
で充分に乾燥させ、混合物の粉末を得た。
DESCRIPTION OF THE PREFERRED EMBODIMENTS First, MgO, ZnO and SiO
2 were weighed at the ratios shown in Tables 1 to 1, and were put into a ball mill and pulverized and mixed for 15 hours in a wet system to obtain a slurry composed of these mixtures. Next, the slurry was taken out and filtered.
And dried sufficiently to obtain a powder of the mixture.

【0019】次に、この混合物の粉末を加熱炉に入れ、
900〜1200℃で仮焼し、混合物を構成している化
合物を相互に反応させてMZSを得た。なお、試料N
o.62〜66のものはこの仮焼をしなかった。
Next, the powder of this mixture is placed in a heating furnace,
Calcination was performed at 900 to 1200 ° C., and the compounds constituting the mixture were reacted with each other to obtain MZS. The sample N
o. 62-66 did not calcine.

【0020】次に、このMZSをボールミルに入れ、湿
式で充分に粉砕してMZSの泥漿を得た。次に、この泥
漿を取り出して濾過し、ケーキの部分を乾燥器に入れ、
150℃で充分に乾燥させ、MZSの粉末を得た。
Next, the MZS was put into a ball mill and sufficiently pulverized by a wet method to obtain MZS slurry. Next, take out the slurry, filter it, put the cake part in a dryer,
After sufficiently drying at 150 ° C., powder of MZS was obtained.

【0021】次に、MZS,Al23 ,ST及びNb
25 を表1〜表1に示すような比率で秤量し、こ
れらをボールミルに入れ、湿式で充分に混合し、これら
の混合物からなる泥漿を得た。次に、この泥漿を取り出
して濾過し、ケーキの部分を乾燥器に入れ、150℃で
充分に乾燥させ、混合物の粉末を得た。
Next, MZS, Al 2 O 3 , ST and Nb
2 O 5 was weighed at the ratios shown in Tables 1 to 1, placed in a ball mill, and thoroughly mixed by a wet method to obtain a slurry composed of these mixtures. Next, the slurry was taken out and filtered, and the cake portion was put in a drier and dried sufficiently at 150 ° C. to obtain a powdery mixture.

【0022】次に、この混合物の粉末を加熱炉に入れ、
700〜900℃で2〜4時間仮焼した。なお、試料N
o.1〜21,28〜30,32〜34,36,37,
39〜66のものはこの仮焼をしなかった。
Next, the powder of this mixture is placed in a heating furnace,
Calcination was performed at 700 to 900 ° C. for 2 to 4 hours. The sample N
o. 1-21, 28-30, 32-34, 36, 37,
39-66 did not calcine.

【0023】次に、有機バインダを加えて造粒し、プレ
ス成型して直径約10mm、厚さ約0.5mmの円板状
の試料を作製し、この試料を950〜1100℃で1〜
4時間焼成して焼結させ、Agペーストを塗布し、70
0℃で15分間焼成して外部電極を形成させ、磁器コン
デンサを形成した。
Next, an organic binder is added to the mixture, and the mixture is granulated and press-molded to form a disk-shaped sample having a diameter of about 10 mm and a thickness of about 0.5 mm.
4 hours firing and sintering, applying Ag paste, 70
It was baked at 0 ° C. for 15 minutes to form external electrodes, thereby forming a porcelain capacitor.

【0024】一方、混合物の粉末に有機溶剤、有機バイ
ンダー、可塑剤等を加えて混合し、スラリーとし、該ス
ラリーよりドクターブレード法を用いて厚さ40μmの
セラミックグリーンシートを得、このセラミックグリー
ンシートの表面にPd電極ペーストを所定パターンに印
刷し、これを交互に11枚積層・圧着して10層の積層
体を作成し、得られた積層体を切断して複数のチップ積
層体を得た。
On the other hand, an organic solvent, an organic binder, a plasticizer and the like are added to the powder of the mixture and mixed to form a slurry. From the slurry, a ceramic green sheet having a thickness of 40 μm is obtained by a doctor blade method. A Pd electrode paste was printed in a predetermined pattern on the surface of the sample, and 11 sheets were alternately laminated and pressed to form a 10-layer laminate, and the obtained laminate was cut to obtain a plurality of chip laminates. .

【0025】次に、この試料を脱バインダー処理して、
約950〜1100℃で1〜4時間焼成させ、得られた
焼結体試料の両端部にAgペーストを塗布し、700℃
で15分間焼成して外部電極を形成させ、積層磁器コン
デンサを形成した(試料サイズ:1.0mm×0.5m
m×0.5mm、有効交差面積:0.05mm2 、誘電
体一層当たりの厚み:30μm)
Next, the sample is subjected to a binder removal treatment.
It is fired at about 950 to 1100 ° C for 1 to 4 hours, and an Ag paste is applied to both ends of the obtained sintered body sample.
For 15 minutes to form external electrodes, thereby forming a laminated ceramic capacitor (sample size: 1.0 mm × 0.5 m)
m × 0.5 mm, effective intersection area: 0.05 mm 2 , thickness per dielectric layer: 30 μm)

【0026】[0026]

【表1】[Table 1]

【0027】[0027]

【表1】[Table 1]

【0028】[0028]

【表1】[Table 1]

【0029】次に、円板磁器コンデンサ及び積層磁器コ
ンデンサについて、室温、HP4284A、1MHz、
1Vrms の条件でC,Qを求めた。誘電率、150℃に
おける絶縁抵抗、誘電率の温度係数(20℃を基準とし
て85℃の変化率)は、円板状磁器コンデンサから10
個平均として求めた。その結果は、表2〜表2に示
す通りであった。
Next, for the disk porcelain capacitor and the laminated porcelain capacitor, room temperature, HP4284A, 1 MHz,
C and Q were determined under the condition of 1 V rms . The dielectric constant, the insulation resistance at 150 ° C., and the temperature coefficient of the dielectric constant (change rate of 85 ° C. based on 20 ° C.)
The average was determined. The results were as shown in Tables 2 and 2.

【0030】なお、表2〜表2における絶縁抵抗ρ
の数値、例えば2.10E+07は2.10×107
表す。温度係数TCCは次の数1の式を用いて算出し
た。リーク電流は125℃のオイル中で、試料に600
VのDCを印加し、安定したときの電流値をデジタルマ
ルチメータ(YOKOGAWA7552)を用いて測定
した。
The insulation resistance ρ in Tables 2 and 2
, For example, 2.10E + 07 represents 2.10 × 10 7 . The temperature coefficient TCC was calculated using the following equation (1). The leakage current is 600
V DC was applied, and the current value when stabilized was measured using a digital multimeter (YOKOGAWA7552).

【0031】[0031]

【数1】 (Equation 1)

【0032】[0032]

【表2】[Table 2]

【0033】[0033]

【表2】[Table 2]

【0034】[0034]

【表2】[Table 2]

【0035】表2〜表2に示す結果から、次のこと
がわかる。すなわち、試料No.53,54,55に示
すように、MZSのモル比[%]が65.0モル[%]
より少なくなると、1100℃以下の焼成で緻密な焼結
体が得られなくなるか、誘電率εr が15より大きくな
り、温度係数TCCがマイナス側に大きくなり過ぎる。
From the results shown in Tables 2 and 2, the following can be understood. That is, the sample No. As shown in 53, 54 and 55, the molar ratio [%] of MZS is 65.0 mol [%].
When fewer, or dense sintered bodies by firing 1100 ° C. or less can not be obtained, the dielectric constant epsilon r is larger than 15, the temperature coefficient TCC becomes too large on the negative side.

【0036】また、試料No.11,30に示すよう
に、Al23 のモル比[%]が10.0モル%より多
くなると、1100℃以下の焼成で緻密な焼結体が得ら
れなくなり、試料No.43に示すように、Al23
のモル比[%]が0.1モル%より少なくなると、11
00℃以下の焼成で緻密な焼結体が得られなくなる。
Sample No. As shown in FIGS. 11 and 30, when the molar ratio [%] of Al 2 O 3 is more than 10.0 mol%, a dense sintered body cannot be obtained by firing at 1100 ° C. or less. 43, Al 2 O 3
When the molar ratio [%] is less than 0.1 mol%, 11
If the firing is performed at a temperature of 00 ° C. or less, a dense sintered body cannot be obtained.

【0037】また、試料No.54,55に示すよう
に、STのモル比[%]が34.9モル%より多くなる
と、緻密な焼結体が得られなくなるか、または誘電率が
大きくなって、温度係数がマイナスに大きくなり過ぎ、
試料No.1,11に示すように、STのモル比[%]
が5.0モル%より少なくなると、1100℃の焼成で
緻密な焼結体が得られなくなる。
Sample No. As shown in FIGS. 54 and 55, when the molar ratio [%] of ST is more than 34.9 mol%, a dense sintered body cannot be obtained or the dielectric constant becomes large, and the temperature coefficient becomes negatively large. Too much,
Sample No. As shown in 1, 11, the molar ratio of ST [%]
Is less than 5.0 mol%, a dense sintered body cannot be obtained by firing at 1100 ° C.

【0038】また、試料No.31,32に示すよう
に、aの値が0.8より大きくなると、1100℃の焼
成で緻密な焼結体が得られなくなり、試料No.39に
示すように、aの値が0.1より小さくなると、焼結体
内部にポアが多く存在し、Q値が1000より小さくな
ってしまう。
Sample No. As shown in FIGS. 31 and 32, when the value of a is larger than 0.8, a dense sintered body cannot be obtained by firing at 1100 ° C. As shown in 39, when the value of a is smaller than 0.1, there are many pores inside the sintered body, and the Q value is smaller than 1000.

【0039】また、試料No.59に示すように、xの
値が1.5より大きくなると、1100℃の焼成で緻密
な焼結体が得られなくなり、試料No.61に示すよう
に、xの値が0.67より小さくなると、焼結体が融着
し易くなり、焼成適正温度幅が非常に狭くなり、焼結体
中にポアが多く生成してしまったり、Q値が1000よ
り小さくなってしまう。
The sample No. As shown in FIG. 59, when the value of x is larger than 1.5, a dense sintered body cannot be obtained by firing at 1100 ° C. As shown in 61, when the value of x is smaller than 0.67, the sintered body is easily fused, the appropriate firing temperature range becomes very narrow, and many pores are generated in the sintered body. , Q value is smaller than 1000.

【0040】また、試料No.2,3,13,14に示
すように、NbO5/2 ,TaO5/2,WO3 が0.01
モル%より少なくなるとリーク電流が1.0μA以上と
なり、リーク電流の改善効果がなくなり、試料No.
7,17に示すように、0.2モル%より多くなると1
100℃の焼成で緻密な焼結体が得られなくなる。
The sample No. As shown in 2,3,13,14, NbO 5/2 , TaO 5/2 , WO 3 are 0.01
If it is less than mol%, the leak current becomes 1.0 μA or more, and the effect of improving the leak current is lost.
As shown in FIGS. 7 and 17, when the content exceeds 0.2 mol%, 1
At 100 ° C., a dense sintered body cannot be obtained.

【0041】なお、試料No.4〜6,8,9,10,
12,15,16に示すように、添加成分であるNbO
5/2 ,TaO5/2 ,WO3 を0.01〜0.2モル%の
範囲で添加すると、いずれもリーク電流の改善効果が見
られる。また、試料No.45〜48に示すように、こ
れらの添加成分を混合状態で添加しても同様の効果が見
られる。
The sample No. 4 ~ 6,8,9,10,
As shown in 12, 15, and 16, the additive component NbO
5/2, TaO 5/2, the addition of WO 3 in the range of 0.01 to 0.2 mol%, any effect of improving leakage current is observed. In addition, the sample No. As shown in 45 to 48, the same effect can be obtained by adding these additional components in a mixed state.

【0042】また、MZS,Al23 及びSTからな
る混合物の仮焼は行っても、行わなくても、所望の特性
は得られるが、仮焼の有無で電気的特性は変化する。た
だし、仮焼は添加成分と主成分、或いは添加成分同志で
反応が起こり、結晶系が変化し、急激に収縮が生じた
り、収縮率が大きくなる場合に有効である。すなわち、
デラミネーション、クラック等の構造欠陥の抑制に有効
である。
The desired characteristics can be obtained with or without calcination of the mixture comprising MZS, Al 2 O 3 and ST, but the electrical characteristics change depending on the presence or absence of calcination. However, the calcination is effective when a reaction occurs between the added component and the main component or between the added components, the crystal system changes, and sudden shrinkage occurs or the shrinkage ratio increases. That is,
It is effective in suppressing structural defects such as delamination and cracks.

【0043】この発明に従う誘電体磁器組成物、すなわ
ち表1〜表1中で評価○となっている試料は、11
00℃以下の焼成で焼結でき、誘電率が15以下と低
く、Q値が高く(1MHzで1000以上)、150℃
での抵抗率が高く(1.0×103 MΩcm以上)、容
量の温度係数が小さく、JIS規格の CH特性( −60〜 +60[ppm/℃]) CJ特性(−120〜+120[ppm/℃]) PH特性( −90〜−210[ppm/℃]) RH特性(−160〜−280[ppm/℃]) SH特性(−270〜−390[ppm/℃]) を満足していることがわかる。
The dielectric porcelain composition according to the present invention, that is, the sample evaluated as “good” in Tables 1 to 1, was 11
It can be sintered by firing at 00 ° C or less, has a low dielectric constant of 15 or less, has a high Q value (1000 or more at 1 MHz), and has a dielectric constant of 150 ° C.
High resistivity (1.0 × 10 3 MΩcm or more), low temperature coefficient of capacitance, JIS standard CH characteristics (−60 to +60 [ppm / ° C.]) CJ characteristics (−120 to +120 [ppm / ° C]) PH characteristics (-90 to -210 [ppm / ° C]) RH characteristics (-160 to -280 [ppm / ° C]) SH characteristics (-270 to -390 [ppm / ° C]) You can see that.

【0044】[0044]

【発明の効果】この発明によれば、数100MHz〜数
GHzの高周波領域においてQ値が高く、損失、リーク
電流の小さな低容量(0.01pF〜30pF)の磁器
コンデンサを得ることができるという効果がある。
According to the present invention, it is possible to obtain a low-capacity (0.01 pF to 30 pF) porcelain capacitor having a high Q value in a high-frequency region of several hundred MHz to several GHz and a small loss and leakage current. There is.

【0045】また、この発明によれば、誘電体磁器組成
物の焼結温度を1100℃以下に低下させることができ
るので、デラミネーション等の構造欠陥を抑制でき、磁
器コンデンサ製造の際における焼成のための電力費を低
減でき、コストダウンを図ることができるという効果が
ある。
Further, according to the present invention, the sintering temperature of the dielectric ceramic composition can be lowered to 1100 ° C. or less, so that structural defects such as delamination can be suppressed, and the sintering temperature at the time of manufacturing a ceramic capacitor can be reduced. Power cost can be reduced, and the cost can be reduced.

【0046】また、この発明によれば、内部電極の材料
として純Pdを使用することができるので、信頼性の高
い磁器コンデンサを得るとこができるという効果があ
る。
Further, according to the present invention, since pure Pd can be used as the material of the internal electrode, there is an effect that a highly reliable ceramic capacitor can be obtained.

【図面の簡単な説明】[Brief description of the drawings]

【図1】図1はMZS,Al23 及びSTのモル比
[%]を示す3成分組成図である。
FIG. 1 is a three-component composition diagram showing the molar ratio [%] of MZS, Al 2 O 3 and ST.

【表1○1】 [Table 1 ○ 1]

【表1○2】 [Table 1 ○ 2]

【表1○3】 [Table 1 ○ 3]

【表2○1】 [Table 2 ○ 1]

【表2○2】 [Table 2 ○ 2]

【表2○3】 [Table 2 ○ 3]

フロントページの続き (58)調査した分野(Int.Cl.7,DB名) C04B 35/16 C04B 35/46 Continuation of front page (58) Field surveyed (Int.Cl. 7 , DB name) C04B 35/16 C04B 35/46

Claims (4)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 一般式 X(Mga Zn(1-a)X SiOX+2 −YAl23
ZSrTiO3 で表される主成分と、Nb,Ta及びWから選択された
1種又は2種以上の元素の化合物からなる添加成分を含
有し、 前記主成分を構成する珪酸マグネシウム・亜鉛[(Mg
a Zn(1-a)X SiOX+2 ]、アルミナ[Al2
3 ]及びチタン酸ストロンチウム[SrTiO3]のモ
ル比[%]が、これら3種の化合物のモル比(X,Y,
Z)を示す3成分組成図に於いて、 A(94.9, 0.1, 5.0) B(85.0, 10.0, 5.0) C(65.0, 10.0, 25.0) D(65.0, 0.1, 34.9) で示される各点A〜Dを頂点とする多角形で囲まれた範
囲にあり、 前記主成分を表す一般式中のa及びxの値が、 0.1≦a≦0.80 0.67≦x≦1.50 の範囲にあり、 前記添加成分がNbO5/2 ,TaO5/2 又はWO3 に換
算して0.01〜0.2モル%含有されていることを特
徴とする誘電体磁器組成物。
1. A compound of the general formula X (Mg a Zn (1-a) ) X SiO X + 2 —YAl 2 O 3
It contains a main component represented by ZSrTiO 3 and an additive component composed of a compound of one or more elements selected from Nb, Ta and W, and contains magnesium silicate / zinc silicate [(Mg
a Zn (1-a) ) X SiO X + 2 ], alumina [Al 2 O
3 ] and the molar ratio [%] of strontium titanate [SrTiO 3 ] are the molar ratios of these three compounds (X, Y,
In the three-component composition diagram showing Z), A (94.9, 0.1, 5.0) B (85.0, 10.0, 5.0) C (65.0, 10.0, 25.0) D (65.0, 0.1, 34.9) is within a range surrounded by a polygon having the vertices of each of the points A to D, and a in the general formula representing the main component. And x are in the range of 0.1 ≦ a ≦ 0.80 0.67 ≦ x ≦ 1.50, and the additive component is 0 in terms of NbO 5/2 , TaO 5/2 or WO 3. 0.1 to 0.2 mol%.
【請求項2】 一般式 X(Mga Zn(1-a)X SiOX+2 −YAl23
ZSrTiO3 で表される主成分と、Nb,Ta及びWから選択された
1種又は2種以上の元素の化合物からなる添加成分を含
有し、 前記主成分を構成する珪酸マグネシウム・亜鉛[(Mg
a Zn(1-a)X SiOX+2 ]、アルミナ[Al2
3 ]及びチタン酸ストロンチウム[SrTiO3]のモ
ル比[%]が、これら3種の化合物のモル比(X,Y,
Z)を示す3成分組成図に於いて、 A(94.9, 0.1, 5.0) B(85.0, 10.0, 5.0) C(65.0, 10.0, 25.0) D(65.0, 0.1, 34.9) で示される各点A〜Dを頂点とする多角形で囲まれた範
囲にあり、 上記一般式中のa及びxの値が、 0.1≦a≦0.8 0.67≦x≦1.5 の範囲にあり、 前記添加成分がNbO5/2 ,TaO5/2 又はWO3 に換
算して0.01〜0.2モル%含有されている誘電体磁
器組成物を誘電体層として用いた磁器コンデンサ。
Wherein the general formula X (Mg a Zn (1- a)) X SiO X + 2 -YAl 2 O 3 -
It contains a main component represented by ZSrTiO 3 and an additive component composed of a compound of one or more elements selected from Nb, Ta and W, and contains magnesium silicate / zinc silicate [(Mg
a Zn (1-a) ) X SiO X + 2 ], alumina [Al 2 O
3 ] and the molar ratio [%] of strontium titanate [SrTiO 3 ] are the molar ratios of these three compounds (X, Y,
In the three-component composition diagram showing Z), A (94.9, 0.1, 5.0) B (85.0, 10.0, 5.0) C (65.0, 10.0, 25.0) D (65.0, 0.1, 34.9) is in a range surrounded by a polygon having the vertices of each of the points A to D, and the values of a and x in the above general formula Is in the range of 0.1 ≦ a ≦ 0.8 0.67 ≦ x ≦ 1.5, and the added component is 0.01 to 0 in terms of NbO 5/2 , TaO 5/2 or WO 3. A ceramic capacitor using a dielectric ceramic composition containing 2 mol% as a dielectric layer.
【請求項3】 内部電極の材料として純Pdを使用した
ことを特徴とする請求項2に記載の磁器コンデンサ。
3. The porcelain capacitor according to claim 2, wherein pure Pd is used as a material of the internal electrode.
【請求項4】 誘電体層と内部電極とを交互に積層した
ことを特徴とする請求項2または3に記載の磁器コンデ
ンサ。
4. The porcelain capacitor according to claim 2, wherein dielectric layers and internal electrodes are alternately laminated.
JP08452797A 1997-03-17 1997-03-17 Dielectric porcelain composition and porcelain capacitor Expired - Fee Related JP3319704B2 (en)

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