JP3306521B2 - Exhaust gas purification method and apparatus - Google Patents

Exhaust gas purification method and apparatus

Info

Publication number
JP3306521B2
JP3306521B2 JP29132092A JP29132092A JP3306521B2 JP 3306521 B2 JP3306521 B2 JP 3306521B2 JP 29132092 A JP29132092 A JP 29132092A JP 29132092 A JP29132092 A JP 29132092A JP 3306521 B2 JP3306521 B2 JP 3306521B2
Authority
JP
Japan
Prior art keywords
exhaust gas
water
acid mist
wastewater
pure water
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP29132092A
Other languages
Japanese (ja)
Other versions
JPH06134236A (en
Inventor
良夫 石原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Taiyo Nippon Sanso Corp
Original Assignee
Taiyo Nippon Sanso Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taiyo Nippon Sanso Corp filed Critical Taiyo Nippon Sanso Corp
Priority to JP29132092A priority Critical patent/JP3306521B2/en
Publication of JPH06134236A publication Critical patent/JPH06134236A/en
Application granted granted Critical
Publication of JP3306521B2 publication Critical patent/JP3306521B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Treating Waste Gases (AREA)
  • Separation Of Particles Using Liquids (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、排ガスの浄化方法及び
装置に関し、詳しくは、半導体製造工場等から排出され
る酸ミストを含む排ガスの浄化方法及び装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method and a device for purifying exhaust gas, and more particularly to a method and a device for purifying exhaust gas containing acid mist discharged from a semiconductor manufacturing plant or the like.

【0002】[0002]

【従来の技術】半導体製造工場等から排出される有害成
分を含む排ガスは、所定の浄化処理を行ってから排出さ
れるが、酸ミストを含む排ガスの場合には、該排ガスを
水に接触させ、酸ミストを水に溶解させて排ガスから分
離するようにしている。通常、この、酸ミストを除去す
るために用いる処理水としては、一般の工業用水等が用
いられており、酸ミストを水和物として溶解捕集した処
理水は、排水処理設備に送られて無害化処理された後、
循環使用あるいは排出されている。
2. Description of the Related Art Exhaust gas containing harmful components discharged from a semiconductor manufacturing plant or the like is discharged after a predetermined purification treatment. In the case of an exhaust gas containing an acid mist, the exhaust gas is brought into contact with water. The acid mist is dissolved in water to separate it from exhaust gas. Normally, as the treated water used for removing the acid mist, general industrial water or the like is used, and the treated water obtained by dissolving and collecting the acid mist as a hydrate is sent to a wastewater treatment facility. After being detoxified,
Recycled or discharged.

【0003】[0003]

【発明が解決しようとする課題】上記のように、水との
接触により排ガス中の酸ミストを除去し、かつ、酸ミス
トの再飛散を防止しながら排ガスを完全に浄化するため
には、できるだけ多量の水で処理することが望ましい
が、水を多量に用いると、使用水量の増大による運転コ
ストの増大だけでなく、排ガス浄化設備や後工程の排水
処理設備が大掛かりになり、設備コストも増大するとい
う問題がある。
As described above, in order to remove acid mist in exhaust gas by contact with water and to completely purify exhaust gas while preventing re-scattering of the acid mist, It is desirable to treat with a large amount of water. There is a problem of doing.

【0004】また、使用水量を低減するために、排ガス
と接触させる処理水のpHを調整する方法もあるが、p
H調整用の機構を付加しなければならないなど、排ガス
浄化装置が複雑化するため、設備コスト,運転コスト,
保守コストの増大が避けられない。
In order to reduce the amount of water used, there is a method of adjusting the pH of treated water to be brought into contact with exhaust gas.
Since the exhaust gas purification device becomes complicated, for example, a mechanism for adjusting H must be added, equipment costs, operation costs,
An increase in maintenance costs is inevitable.

【0005】一方、半導体製造工場等では、純水を用い
る工程が多いため、純水製造装置が設置されているのが
普通である。この純水製造装置は、イオン交換や逆浸透
等を利用して水中の不純物を除去するものであるが、逆
浸透等で不純物が濃縮された排水は、通常はそのまま排
出されている。
On the other hand, in a semiconductor manufacturing plant or the like, since there are many steps using pure water, a pure water producing apparatus is usually installed. This pure water production apparatus removes impurities in water by using ion exchange, reverse osmosis, or the like. However, wastewater in which impurities are concentrated by reverse osmosis or the like is usually discharged as it is.

【0006】そこで本発明は、上記排ガス浄化設備にお
いて、装置構成を複雑化することなく使用水量の低減を
図れるとともに、従来は、そのまま排出されていた純水
製造装置からの排水の有効利用を図れる排ガスの浄化方
法及び装置を提供することを目的としている。
Accordingly, the present invention can reduce the amount of water used in the above-mentioned exhaust gas purifying facility without complicating the structure of the apparatus, and can effectively utilize the wastewater from the pure water producing apparatus which has been conventionally discharged as it is. It is an object of the present invention to provide a method and an apparatus for purifying exhaust gas.

【0007】[0007]

【課題を解決するための手段】上記した目的を達成する
ため、本発明の排ガスの浄化方法は、酸ミストを含む排
ガスを、純水製造装置からのシリカや鉄などの各種金属
イオンを含む排水と向流接触させて、酸ミストと金属イ
オンとの反応結合により水和物を形成し、該水和物を除
去することにより排水を浄化することを特徴としてい
る。
In order to achieve the above-mentioned object, a method for purifying exhaust gas according to the present invention provides a method for purifying exhaust gas containing acid mist.
The gas is converted to various metals such as silica and iron from pure water production equipment.
Counter-current contact with wastewater containing ions, acid mist and metal
A hydrate is formed by a reaction bond with on and the hydrate is removed.
It is characterized by purifying wastewater by removing.

【0008】また、本発明の排ガスの浄化装置は、水中
の不純物を除去して純水とシリカや鉄などの各種金属イ
オンを含む排水とに分離する純水製造装置と、酸ミスト
を含む排ガスを処理水と向流接触させて前記酸ミストを
除去処理する水洗塔と、前記排水を純水製造装置から前
記水洗塔へ処理水として供給する処理水供給系統とを設
け、前記向流接触による酸ミストと金属イオンとの反応
結合により形成した水和物を除去して排水を浄化する
とを特徴としている。
Further, the exhaust gas purifying apparatus of the present invention can be used in underwater.
Impurities and remove pure water and various metals such as silica and iron.
Pure water production equipment that separates wastewater containing ON and acid mist
The acid mist by contacting the exhaust gas containing
A washing tower for removal treatment, and the wastewater is discharged from a pure water production apparatus.
A treated water supply system for supplying treated water to the washing tower was established.
Reaction between acid mist and metal ions by the countercurrent contact
Hydrate formed by coupling removed are characterized and this <br/> to purify waste water.

【0009】[0009]

【作 用】上記純水製造装置から排出される排水は硬水
であり、シリカ,鉄等の各種金属イオンを多量に含んで
いるので、この排水と酸ミストを含む排ガスとを接触さ
せると、排ガス中の酸ミストは、排水中に多量に含まれ
ている各種イオンと速やかに反応し、水和物を形成して
水中に捕集される。したがって、通常の水に比べて酸ミ
ストの除去効率が向上し、使用水量の低減が図れるとと
もに、捕集した酸ミストは水和物として固定されるの
で、酸ミストの再飛散もほとんど生じない。
[Operation] The waste water discharged from the above-mentioned pure water production equipment is hard water and contains a large amount of various metal ions such as silica and iron. The acid mist therein quickly reacts with various ions contained in a large amount in the wastewater to form a hydrate and is collected in the water. Therefore, the removal efficiency of acid mist is improved as compared with ordinary water, the amount of water used can be reduced, and the collected acid mist is fixed as a hydrate, so that the acid mist hardly re-scatters.

【0010】[0010]

【実施例】以下、本発明を、図面に基づいて、さらに詳
細に説明する。図1は、本発明の排ガス浄化装置の一実
施例を示すもので、この排ガス浄化装置は、排ガスを処
理水と接触させて浄化する水洗塔1と、純水を製造する
純水製造装置2とを組み合わせたもので、純水製造装置
2の逆浸透膜装置から排出される排水を水洗塔1の処理
水として供給するように構成されている。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below in more detail with reference to the drawings. FIG. 1 shows an embodiment of an exhaust gas purifying apparatus according to the present invention. The exhaust gas purifying apparatus includes a washing tower 1 for purifying exhaust gas by contacting it with treated water, and a pure water producing apparatus 2 for producing pure water. The wastewater discharged from the reverse osmosis membrane device of the pure water producing apparatus 2 is supplied as the treated water of the washing tower 1.

【0011】上記水洗塔1は、その下部に設けた排ガス
導入口3から酸ミストを含む排ガスを導入するととも
に、上部の処理水導入口4からスプレーノズル5を介し
て処理水を導入し、排ガスと処理水とを中央部の充填層
6で向流接触させて排ガス中の酸ミスト等を処理水中に
捕集し、これによって排ガスの浄化を行うものである。
The washing tower 1 introduces an exhaust gas containing an acid mist from an exhaust gas inlet 3 provided at a lower portion thereof, and introduces treated water from an upper treated water inlet 4 through a spray nozzle 5 so as to form an exhaust gas. And the treated water are brought into countercurrent contact with each other at the central packed bed 6 to collect acid mist and the like in the exhaust gas in the treated water, thereby purifying the exhaust gas.

【0012】また、水洗塔1の浄化ガス排気口7の下部
には、ミストコレクター8が設けられており、底部には
処理水タンク9が設けられている。この処理水タンク9
には、前記処理水導入口4に処理水を送るためのポンプ
10を有する送水管11と、前記純水製造装置2からの
排水を受入れる受水管12と、処理水の一部を図示しな
い後工程の排水処理設備に送る排水管13とが設けられ
ている。さらに、排ガス導入口3部分には、排ガス導入
量を調節するためのダンパー14が設けられている。
A mist collector 8 is provided below the purified gas exhaust port 7 of the washing tower 1, and a treated water tank 9 is provided at the bottom. This treated water tank 9
A water pipe 11 having a pump 10 for sending treated water to the treated water inlet 4, a water receiving pipe 12 for receiving drainage from the pure water producing apparatus 2, and a part of the treated water not shown. A drain pipe 13 for sending to a waste water treatment facility in the process is provided. Further, a damper 14 for adjusting the amount of introduced exhaust gas is provided at the exhaust gas inlet 3.

【0013】一方、純水製造装置2と上記水洗塔1との
間には、排水タンク15,ポンプ16及び前記受水管1
2からなる処理水供給系統17が設けられており、純水
製造装置2からの排水は、この処理水供給系統17を介
して水洗塔1における排ガス浄化用の処理水として前記
水洗塔1底部の処理水タンク9に供給される。
On the other hand, a drainage tank 15, a pump 16 and the water receiving pipe 1 are provided between the pure water producing apparatus 2 and the washing tower 1.
A wastewater from the pure water production system 2 is provided as a treated water for purifying exhaust gas in the washing tower 1 through the treated water supply system 17 at the bottom of the washing tower 1. It is supplied to the treated water tank 9.

【0014】このように排ガス浄化装置を構成し、純水
製造装置2で原水を処理して純水を製造する際に排出さ
れる水を、排ガス中の酸ミストを除去する水洗塔1の処
理水として用いることにより、排ガス中の酸ミストが処
理水中に含まれる多量の各種イオンと速やかに反応結合
して水和物となり、処理水中に固定されるので、少ない
処理水量で効率よく酸ミストを除去できるとともに、酸
ミストの再飛散もほとんど生じることなく排ガスの浄化
を行うことができる。
The exhaust gas purifying apparatus is constituted as described above, and the water discharged when the pure water is produced by treating the raw water in the pure water producing apparatus 2 is treated in the washing tower 1 for removing acid mist in the exhaust gas. By using it as water, the acid mist in the exhaust gas quickly reacts and bonds with a large amount of various ions contained in the treated water to form a hydrate, and is fixed in the treated water. Exhaust gas can be purified with almost no re-scattering of acid mist while being removed.

【0015】すなわち、従来は、そのまま排出されてい
た純水製造装置2からの排水を有効に利用して水洗塔1
からクリーンな浄化ガスを排出できるだけでなく、処理
水の量の低減が図れることから水洗塔1の小型化や排水
処理設備の小型化,簡略化も図れ、排ガス浄化装置全体
の設備コストや運転コストを大幅に低減することが可能
になる。
In other words, the washing tower 1 can be effectively used by effectively using the waste water from the pure water producing apparatus 2 which has been discharged as it is.
Not only can clean exhaust gas be discharged from the system, but also the amount of treated water can be reduced, so that the washing tower 1 and the wastewater treatment equipment can be reduced in size and simplified, and the equipment costs and operating costs of the entire exhaust gas purification device Can be greatly reduced.

【0016】例えば、一般の純水製造装置2からの排水
中の金属イオン濃度は、通常の水に比べて約2倍になっ
ている。したがって、この排水の酸ミストの処理能力
は、通常の水に比較すると約2倍になる。すなわち、ポ
ンプ10による循環水量を一定とした場合、この純水製
造装置2からの排水を使用すると、約2倍の酸ミスト保
有力能力を持つことになる。このことから、水洗塔1か
ら排水処理設備に排出する排水量を約半分にでき、その
分、排水処理設備を小型化できる。
For example, the concentration of metal ions in the waste water from a general pure water producing apparatus 2 is about twice that of ordinary water. Therefore, the treatment capacity of the acid mist of this wastewater is about twice as large as that of ordinary water. That is, when the amount of circulating water by the pump 10 is constant, the drainage from the pure water producing apparatus 2 has about twice the capacity of holding acid mist. Accordingly, the amount of wastewater discharged from the washing tower 1 to the wastewater treatment facility can be reduced to about half, and the wastewater treatment facility can be reduced in size accordingly.

【0017】なお、本発明においては、水洗塔や純水製
造装置の構成は任意であり、また、排ガス量が多く処理
水量が不足する場合には、通常の水と混合して用いれば
よく、適宜な装置構成で実施することが可能である。
In the present invention, the construction of the washing tower and the pure water producing apparatus is optional. If the amount of exhaust gas is large and the amount of treated water is insufficient, it may be mixed with ordinary water. It can be carried out with an appropriate device configuration.

【0018】[0018]

【発明の効果】以上説明したように、本発明は、純水製
造装置からの排水を、酸ミストを含む排ガスに接触させ
るから、金属イオン濃度が通常の水の約2倍である純水
製造装置からの排水を有効に利用して酸ミストを効率よ
く除去することができ、排ガス浄化装置を大型化,複雑
化することなく低コストで排ガス中の酸ミストを除去す
ることができる。
As described above, according to the present invention, since the waste water from the pure water producing apparatus is brought into contact with the exhaust gas containing the acid mist, the pure water producing method in which the metal ion concentration is about twice that of ordinary water is used. The acid mist can be efficiently removed by effectively using the wastewater from the device , and the acid mist in the exhaust gas can be removed at low cost without increasing the size and complexity of the exhaust gas purifying device.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の装置構成の一実施例を示す系統図であ
る。
FIG. 1 is a system diagram showing one embodiment of an apparatus configuration of the present invention.

【符号の説明】[Explanation of symbols]

1…水洗塔、2…純水製造装置、3…排ガス導入口、4
…処理水導入口、9…処理水タンク、17…処理水供給
系統
DESCRIPTION OF SYMBOLS 1 ... Rinse tower, 2 ... Pure water production apparatus, 3 ... Exhaust gas inlet, 4
... treated water inlet, 9 ... treated water tank, 17 ... treated water supply system

───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.7,DB名) B01D 47/00 B01D 53/34 B01D 53/40 B01D 53/77 B01J 49/00 ──────────────────────────────────────────────────続 き Continuation of the front page (58) Field surveyed (Int. Cl. 7 , DB name) B01D 47/00 B01D 53/34 B01D 53/40 B01D 53/77 B01J 49/00

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 酸ミストを含む排ガスを、純水製造装置
からのシリカや鉄などの各種金属イオンを含む排水と向
流接触させて、酸ミストと金属イオンとの反応結合によ
り水和物を形成し、該水和物を除去することにより排水
を浄化することを特徴とする排ガスの浄化方法。
An exhaust gas containing an acid mist is supplied to a pure water production apparatus.
From wastewater containing various metal ions such as silica and iron
Flow contact to form a reaction bond between the acid mist and metal ions.
To form a hydrate and remove the hydrate to drain water.
A method for purifying exhaust gas, comprising purifying wastewater.
【請求項2】 水中の不純物を除去して純水とシリカや
鉄などの各種金属イオンを含む排水とに分離する純水製
造装置と、酸ミストを含む排ガスを処理水と向流接触さ
せて前記酸ミストを除去処理する水洗塔と、前記排水を
純水製造装置から前記水洗塔へ処理水として供給する処
理水供給系統とを設け、前記向流接触による酸ミストと
金属イオンとの反応結合により形成した水和物を除去し
て排水を浄化することを特徴とする排ガスの浄化装置。
2. The method according to claim 2 , wherein impurities in the water are removed to remove pure water and silica.
Made of pure water that separates into wastewater containing various metal ions such as iron
Equipment and exhaust gas containing acid mist are brought into countercurrent contact with treated water.
A washing tower for removing the acid mist and treating the wastewater.
A process for supplying treated water from the pure water production device to the washing tower
A water supply system, and an acid mist by the countercurrent contact.
Removes hydrates formed by reaction bonding with metal ions
An exhaust gas purifying device characterized by purifying wastewater by heating .
JP29132092A 1992-10-29 1992-10-29 Exhaust gas purification method and apparatus Expired - Fee Related JP3306521B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP29132092A JP3306521B2 (en) 1992-10-29 1992-10-29 Exhaust gas purification method and apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP29132092A JP3306521B2 (en) 1992-10-29 1992-10-29 Exhaust gas purification method and apparatus

Publications (2)

Publication Number Publication Date
JPH06134236A JPH06134236A (en) 1994-05-17
JP3306521B2 true JP3306521B2 (en) 2002-07-24

Family

ID=17767384

Family Applications (1)

Application Number Title Priority Date Filing Date
JP29132092A Expired - Fee Related JP3306521B2 (en) 1992-10-29 1992-10-29 Exhaust gas purification method and apparatus

Country Status (1)

Country Link
JP (1) JP3306521B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110922327A (en) * 2019-12-09 2020-03-27 邱洪 Gallic acid acidizing device

Also Published As

Publication number Publication date
JPH06134236A (en) 1994-05-17

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