JP3295293B2 - Water quality improvement device in insulator cleaning device - Google Patents

Water quality improvement device in insulator cleaning device

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Publication number
JP3295293B2
JP3295293B2 JP01240796A JP1240796A JP3295293B2 JP 3295293 B2 JP3295293 B2 JP 3295293B2 JP 01240796 A JP01240796 A JP 01240796A JP 1240796 A JP1240796 A JP 1240796A JP 3295293 B2 JP3295293 B2 JP 3295293B2
Authority
JP
Japan
Prior art keywords
water
water quality
storage tank
quality improvement
pipe
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP01240796A
Other languages
Japanese (ja)
Other versions
JPH09204837A (en
Inventor
年明 鈴木
有 長屋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NGK Insulators Ltd
Original Assignee
NGK Insulators Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NGK Insulators Ltd filed Critical NGK Insulators Ltd
Priority to JP01240796A priority Critical patent/JP3295293B2/en
Publication of JPH09204837A publication Critical patent/JPH09204837A/en
Application granted granted Critical
Publication of JP3295293B2 publication Critical patent/JP3295293B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Insulators (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、貯水タンクを備え
た碍子洗浄装置における水質改善装置に関するものであ
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a water quality improvement device for an insulator cleaning device having a water storage tank.

【0002】[0002]

【従来の技術】通常の碍子洗浄装置は、図7に示すよう
に市水、井戸水等の水を貯水タンク21に貯水したうえ、
ポンプ22により区画自動弁23を介して碍子洗浄用のノズ
ル24に供給し、碍子25に注水して洗浄を行うようになっ
ている。ところがこの洗浄水の水質が低下すると、図8
のグラフに示すように洗浄耐電圧が低下し、洗浄中に閃
絡事故を起こす要因となる。
2. Description of the Related Art A conventional insulator cleaning device stores water such as city water and well water in a water storage tank 21 as shown in FIG.
The water is supplied to the insulator cleaning nozzle 24 by the pump 22 through the automatic partitioning valve 23, and the insulator 25 is injected with water to perform cleaning. However, when the quality of the washing water deteriorates, FIG.
As shown in the graph, the withstand voltage of the cleaning is reduced, which causes a flash accident during the cleaning.

【0003】この図8のグラフは、碍子に付着した汚損
量が一般に汚損管理値とされている等価塩分付着密度で
0.03〜0.06mg/cm2の領域での洗浄水水質と洗浄耐電圧と
の関係を示すものである。このグラフに示されるよう
に、洗浄水体積固有抵抗率が5.0kΩ-cm の場合の洗浄耐
電圧を100 %とすると、3.0kΩ-cm を割ると急激に低下
し、洗浄水体積固有抵抗率が1.0kΩ-cm にまで低下する
と碍子洗浄の耐電圧は5.0kΩ-cm に比較し、70%に低下
する。また洗浄耐電圧が低下すると汚損管理限界値が小
さくなり、必要洗浄回数が増加するため洗浄水量が多く
なる。このため、碍子洗浄装置運用時の洗浄水質の下限
値は洗浄耐電圧の低下を見込み、一般的には5.0kΩ-cm
で管理している。
[0003] The graph of FIG. 8 shows that the amount of fouling adhered to the insulator is an equivalent salt deposition density which is generally regarded as a fouling control value.
It shows the relationship between cleaning water quality and cleaning withstand voltage in the region of 0.03 to 0.06 mg / cm 2 . As shown in this graph, if the cleaning withstand voltage is 100% when the volume resistivity of the cleaning water is 5.0 kΩ-cm, the voltage drops sharply when it is less than 3.0 kΩ-cm, and the volume resistivity of the cleaning water becomes lower. When it is reduced to 1.0 kΩ-cm, the withstand voltage of insulator cleaning is reduced to 70% compared to 5.0 kΩ-cm. Further, when the withstand voltage for cleaning decreases, the limit value of the contamination control decreases, and the required number of times of cleaning increases, so that the amount of cleaning water increases. For this reason, the lower limit of the cleaning water quality during the operation of the insulator cleaning device is expected to lower the withstand voltage for cleaning, and is generally 5.0 kΩ-cm.
It is managed by.

【0004】そこで従来から、碍子洗浄装置の貯水タン
ク21に水質計26を設置し、貯水タンク21内の水質が管理
値より低下したときには自動的にポンプ22を停止させる
工夫がなされている。しかし、近年では河川の水質悪化
に伴い市水、井戸水等の水質も低下する傾向にあり、碍
子洗浄が必要な場合にも直ちに碍子洗浄を行えないおそ
れがあった。また、貯水タンク21の水質は夏期に水温が
上昇することによっても低下するため、碍子洗浄装置の
円滑な運用が行えないおそれもあった。
Therefore, conventionally, a device has been devised in which a water quality meter 26 is installed in the water storage tank 21 of the insulator cleaning device, and the pump 22 is automatically stopped when the water quality in the water storage tank 21 falls below a control value. However, in recent years, the water quality of city water, well water, and the like has also tended to deteriorate with the deterioration of river water quality, and there has been a possibility that insulator cleaning may not be performed immediately when insulator cleaning is required. In addition, since the water quality of the water storage tank 21 also decreases due to a rise in water temperature in summer, there is a possibility that the smooth operation of the insulator cleaning device cannot be performed.

【0005】[0005]

【発明が解決しようとする課題】本発明は上記した従来
の問題点を解決し、給水源や貯水タンク内の水質が低下
したときにその水質を自動的に改善することにより、碍
子洗浄の耐電圧を高く維持することができる碍子洗浄装
置における水質改善装置を提供するためになされたもの
である。
SUMMARY OF THE INVENTION The present invention solves the above-mentioned conventional problems, and automatically improves the quality of water in a water supply source or a water storage tank when the quality of the water is reduced. The purpose of the present invention is to provide a water quality improvement device in an insulator cleaning device capable of maintaining a high voltage.

【0006】[0006]

【課題を解決するための手段】上記の課題を解決するた
めになされた本発明の碍子洗浄装置における水質改善装
置は、碍子洗浄装置の貯水タンクと給水源との間に、水
質改善手段を備えた水質改善管路と、水質改善管路のバ
イパス管路とを並列に設けるとともに、貯水タンクから
水を給水源の出口部に返送する返水用管路を設け、貯水
タンクの水質が低下した場合には、貯水タンク内の水の
一部を返水用管路を介して返水して水質改善管路に通し
たうえ貯水タンクに戻し、貯水タンクの水位が低下し貯
水タンクに給水の必要が生じた際、給水源の水質が低下
している場合には、貯水タンクの水質が設定値をクリア
ーしておれば給水源の水を水質改善管路とバイパス管路
とに並列に流し、貯水タンクの水質が設定値をクリアー
していなければ全量を水質改善管路に通して貯水タンク
に給水するようにしたことを特徴とするものである。
A water quality improvement device for an insulator cleaning device according to the present invention, which has been made to solve the above-mentioned problems, includes a water quality improvement device between a water storage tank and a water supply source of the insulator cleaning device. The water quality improvement pipeline and the bypass pipeline of the water quality improvement pipeline were installed in parallel, and a water return pipeline for returning water from the water storage tank to the outlet of the water supply source was installed. In this case, a part of the water in the water storage tank is returned through the water return pipe, passed through the water quality improvement pipe, and returned to the water storage tank.
When the water tank needs to be watered, the water quality of the water supply source decreases
If you are, if I was cleared water quality set value of the water tank of the water supply source water flowing in parallel to the water quality improvement conduit and the bypass conduit, the water quality of the water storage tank is not clear the setting value If not, the whole quantity is passed through a water quality improvement pipeline and supplied to a water storage tank.

【0007】[0007]

【発明の実施の形態】以下に発明の好ましい実施の形態
を、図1〜図6を参照しつつ更に詳細に説明する。図1
は本発明の碍子洗浄装置における水質改善装置の全体図
であり、1は給水源である給水タンク、2は給水ポン
プ、3は貯水タンク、4は碍洗ポンプ、5は区画自動
弁、6は碍子洗浄用のノズル、7は洗浄対象となる碍子
である。
Preferred embodiments of the DETAILED DESCRIPTION OF THE INVENTION Hereinafter the invention will be described in further detail with reference to FIGS. FIG.
1 is an overall view of a water quality improvement device in the insulator cleaning device of the present invention, wherein 1 is a water supply tank as a water supply source, 2 is a water supply pump, 3 is a water storage tank, 4 is an insulator washing pump, 5 is an automatic partitioning valve, and 6 is The insulator cleaning nozzle 7 is an insulator to be cleaned.

【0008】この例では、図示されるように上記の給水
タンク1と貯水タンク3との間に、水質改善手段8と濾
過手段9とを直列に接続した水質改善管路10と、貯水タ
ンク3から水を給水源である給水タンク1の出口部に位
置する給水ポンプ2の吸引側まで返送する返水用管路11
とが並列に設けられている。更に水質改善管路10のバイ
パス管路12もこれらと並列に設けられ、このバイパス管
路12の先端は水質改善管路10の出口と連結され、バイパ
ス管路12を通過した水と水質改善管路10を通過した水と
が混合される構造となっている。
In this example, as shown in the figure, a water quality improvement pipe 10 in which water quality improvement means 8 and filtration means 9 are connected in series between the water supply tank 1 and the water storage tank 3, and a water storage tank 3 From the outlet of the water supply tank 1 which is the water supply source
Return water conduit 11 for returning to the suction side of the water supply pump 2 to location
And are provided in parallel. Further, a bypass pipe 12 of the water quality improvement pipe 10 is also provided in parallel with them, and a tip of the bypass pipe 12 is connected to an outlet of the water quality improvement pipe 10 so that the water passing through the bypass pipe 12 and the water quality improvement pipe are connected. The structure is such that water that has passed through the road 10 is mixed.

【0009】なお、返水用管路11には給水電磁弁V1が、
水質改善管路10には給水電磁弁V2が、バイパス管路12に
は給水電磁弁V3がそれぞれ設けられている。また貯水タ
ンク3には水質計HC1 が、給水タンク1には水質計HC2
がそれぞれ設けられている。
A water supply solenoid valve V1 is provided in the water return pipe 11;
A water supply solenoid valve V2 is provided in the water quality improvement pipe 10, and a water supply solenoid valve V3 is provided in the bypass pipe 12. The water tank 3 has a water quality meter HC1 and the water supply tank 1 has a water quality meter HC2.
Are provided respectively.

【0010】前記の水質改善手段8としては、一般にイ
オン交換樹脂や逆浸透膜が用いられる。イオン交換樹脂
は水中の不純物イオンを樹脂に化学的に吸着させて除去
することにより純水を製造するものであり、体積固有抵
抗率1000k Ω-cm以上(電導度1μs/cm以下)の純水が
得られる。また逆浸透膜は分子レベルで不純物を膜で捕
捉することにより、体積固有抵抗率100kΩ-cm 以上(電
導度10μs/cm以下)の水が得られる。なお、これらの水
質改善手段8が水中の濁質により閉塞されることを防止
するために、濾過手段9を上流側に設けてある。
As the water quality improving means 8, an ion exchange resin or a reverse osmosis membrane is generally used. Ion-exchange resins produce pure water by chemically adsorbing and removing impurity ions in water. Pure water with a volume resistivity of 1000 kΩ-cm or more (conductivity of 1 μs / cm or less) is used. Is obtained. The reverse osmosis membrane captures impurities at the molecular level to obtain water with a volume resistivity of 100 kΩ-cm or more (conductivity of 10 μs / cm or less). In order to prevent these water quality improving means 8 from being blocked by turbidity in the water, a filtering means 9 is provided on the upstream side.

【0011】このような水質改善手段8により得られた
水(純水)は、不純物濃度が極度に低い。このため、そ
のまま碍子洗浄装置に流した場合には、碍子洗浄用のノ
ズル6への配管として使用されている亜鉛メッキ鋼管等
から亜鉛等を析出させて鋼管等を腐食させるおそれがあ
る。このため、本発明は水質改善手段8により得られた
水をそのまま使用するのではなく、返水用管路11を介し
て返水された水又は給水源からの普通の水を水質改善手
段を通過した水と混合し、洗浄水質を設定値(通常5.0k
Ω-cm ) を満足するレベルに留めるようにした。
The water (pure water) obtained by the water quality improving means 8 has an extremely low impurity concentration. For this reason, when flowing directly into the insulator cleaning device, there is a possibility that zinc or the like is precipitated from the galvanized steel pipe or the like used as a pipe to the nozzle 6 for insulator cleaning, and the steel pipe or the like is corroded. For this reason, the present invention does not use the water obtained by the water quality improvement means 8 as it is, but uses the water returned through the water return pipe 11 or the ordinary water from the water supply source as the water quality improvement means. Mix with the passed water and set the cleaning water quality to the set value (normally 5.0k
Ω-cm) to a satisfactory level.

【0012】次に、図2と図3のフローシートにより、
本発明の水質改善方法を説明する。図2は、貯水タンク
3の水質が低下した場合のフローを示す。貯水タンク3
の水質低下を示す信号が水質計HC1 より発信されたとき
には、給水電磁弁V1と給水電磁弁V2とが開かれる。そし
て給水ポンプ2を起動し、貯水タンク3内の水の一部を
返水用管路11を介して返水して水質改善管路10に通し、
水質を改善したうえ、貯水タンク3に戻して貯水タンク
3の水と混合する。これにより貯水タンク3の水質は次
第に改善されるので、水質計HC1 からの信号が設定値
(5.0kΩ-cm )をクリアーしたことを確認したうえで改
善装置を停止して碍子洗浄用のノズル6へ送水し、碍子
洗浄を行う。
Next, according to the flow sheets shown in FIGS. 2 and 3,
The water quality improving method of the present invention will be described. FIG. 2 shows a flow when the water quality of the water storage tank 3 is reduced. Water storage tank 3
When the signal indicating the decrease in water quality is transmitted from the water quality meter HC1, the water supply solenoid valve V1 and the water supply solenoid valve V2 are opened. Then, the water supply pump 2 is started, and a part of the water in the water storage tank 3 is returned through the water return pipe 11 and passed through the water quality improvement pipe 10,
After improving the water quality, the water is returned to the water storage tank 3 and mixed with the water in the water storage tank 3. As a result, the water quality of the water storage tank 3 is gradually improved. After confirming that the signal from the water quality meter HC1 has cleared the set value (5.0 kΩ-cm), the improvement device is stopped and the nozzle 6 for insulator cleaning is stopped. Water to clean the insulator.

【0013】図3は横軸に原水(この場合には貯水タン
ク3内の水質が低下した水)の体積固有抵抗率を取り、
縦軸に設定値(5.0kΩ-cm )をクリアーするに必要な水
質改善水の混合割合を取ったグラフである。例えば、貯
水タンク3内の水質が2.0kΩ-cm まで低下した場合に
は、60%の水を水質改善管路10に循環させれば設定値
(5.0kΩ-cm )をクリアーできることが分かる。このよ
うに、本発明では水質改善管路10により水質を改善した
水をそのまま碍子洗浄用のノズル6へ送水するのではな
く、必ず普通の水と混合したうえで碍子洗浄用のノズル
6へ送水するようにした点に大きな特徴がある。これに
より、碍子洗浄の耐電圧を高く維持できることはもちろ
ん、碍子洗浄用のノズル6への配管等が腐食することを
防止することができる。
FIG. 3 shows the volume specific resistivity of raw water (in this case, water of low water quality in the water storage tank 3) on the horizontal axis.
The vertical axis is a graph showing the mixing ratio of water required for clearing the set value (5.0 kΩ-cm). For example, when the water quality in the water storage tank 3 is reduced to 2.0 kΩ-cm, it can be seen that the set value (5.0 kΩ-cm) can be cleared by circulating 60% of the water through the water quality improvement pipeline 10. As described above, in the present invention, water whose quality has been improved by the water quality improvement pipe 10 is not directly sent to the nozzle 6 for insulator cleaning, but is always mixed with ordinary water and then sent to the nozzle 6 for insulator cleaning. There is a great feature in that it is done. This makes it possible to not only keep the withstand voltage of the insulator cleaning high, but also prevent corrosion of the piping to the nozzle 6 for insulator cleaning.

【0014】図4は、貯水タンク3の水位が低下し貯水
タンク3に給水の必要が生じた際、給水源である給水タ
ンク1の水質が低下している場合のフローを示す。水質
計HC2 より水質低下を示す信号が発信されると、給水電
磁弁V2が開かれ給水ポンプ2が起動される。この結果、
給水タンク1の水は水質改善管路10を通って水質改善さ
れたうえ、貯水タンク3に給水される。そして貯水タン
ク3の水質が設定値をクリアーしているか否かを水質計
HC1 の信号により判断し、もし貯水タンク3の水質が設
定値をクリアーしておれば給水電磁弁V3を開き、給水タ
ンク1の水を水質改善管路10とバイパス管路12とに並列
に流す。この結果、水質改善された水と給水タンク1か
らの水とは混合されて貯水タンク3に給水され、その
後、碍子洗浄用のノズル6へ送水されることとなる。
FIG . 4 shows a flow when the water quality of the water supply tank 1 as a water supply source is reduced when the water level of the water storage tank 3 is lowered and the water storage tank 3 needs to be supplied with water. When a signal indicating a decrease in water quality is transmitted from the water quality meter HC2, the water supply solenoid valve V2 is opened and the water supply pump 2 is started. As a result,
The water in the water supply tank 1 is improved in water quality through a water quality improvement pipeline 10, and then supplied to the water storage tank 3. A water quality meter determines whether the water quality of the water storage tank 3 has cleared the set value.
Judging from the signal of HC1, if the water quality of the water storage tank 3 clears the set value, the water supply solenoid valve V3 is opened, and the water of the water supply tank 1 flows in parallel to the water quality improvement pipe 10 and the bypass pipe 12. . As a result, the water of which the water quality has been improved and the water from the water supply tank 1 are mixed and supplied to the water storage tank 3, and then supplied to the nozzle 6 for insulator cleaning.

【0015】また貯水タンク3の水質が設定値をクリア
ーしていない場合には、バイパス管路13の給水電磁弁V3
を閉じる。すると給水タンク1の水は全量が水質改善管
路10を通って貯水タンク3に給水されるので、貯水タン
ク3の水質は急速に改善される。上記のいずれの場合に
も、水質改善管路10を通過して水質改善された水がその
まま碍子洗浄用のノズル6へ送水されることはなく、必
ず普通の水と混合された状態で使用されるので、碍子洗
浄の耐電圧を高く維持できることはもちろん、碍子洗浄
用のノズル6への配管等が腐食することを防止すること
ができる。なお、上記の例では給水弁に電磁弁を用い、
全開、全閉にて運用すると説明したが、水質計HC1 、HC
2 の水質に応じて水質改善管路10からの水と原水との混
合割合を変化させるため、電磁弁の代わりに電動弁を用
い、開度調整を行ってもよい。
When the water quality of the water storage tank 3 has not cleared the set value, the water supply solenoid valve V3 of the bypass pipe 13
Close. Then, since the entire amount of the water in the water supply tank 1 is supplied to the water storage tank 3 through the water quality improvement pipeline 10, the water quality of the water storage tank 3 is rapidly improved. In any of the above cases, the water whose quality has been improved after passing through the water quality improvement pipe 10 is not directly sent to the nozzle 6 for insulator cleaning, and is always used in a state of being mixed with ordinary water. Therefore, it is possible to keep the withstand voltage of the insulator cleaning high, and it is possible to prevent corrosion of a pipe or the like to the nozzle 6 for insulator cleaning. In the above example, an electromagnetic valve is used for the water supply valve,
Although it was explained that the operation was performed with fully open and fully closed, the water quality meter HC1, HC
In order to change the mixing ratio between the water from the water quality improvement pipeline 10 and the raw water according to the water quality of 2, the electric valve may be used instead of the solenoid valve to adjust the opening.

【0016】図5は参考のために碍子の汚損管理値と洗
浄耐電圧との関係を示したグラフである。このグラフに
示されるように、洗浄水の水質が5.0kΩ-cm の場合には
碍子の汚損量が0.03mg/cm2であっても設計電圧を維持で
きるが、洗浄水の水質が3.0kΩ-cm まで低下した場合に
は破線のように洗浄耐電圧が低下するので、その低下分
を見込んで碍子の汚損管理値を0.02mg/cm2とする必要が
あることが分かる。汚損管理値の低下は必要洗浄回数の
増加、つまり洗浄水量の増加につながることとなる。
FIG. 5 is a graph showing the relationship between the contamination control value of the insulator and the cleaning withstand voltage for reference. As shown in this graph, when the water quality of the cleaning water is 5.0 kΩ-cm, the design voltage can be maintained even if the amount of contamination of the insulator is 0.03 mg / cm 2 , but the water quality of the cleaning water is 3.0 kΩ-cm. Since the cleaning withstand voltage decreases as indicated by the broken line when the temperature decreases to cm, it is understood that the contamination control value of the insulator needs to be 0.02 mg / cm 2 in anticipation of the decrease. A decrease in the fouling control value leads to an increase in the required number of washings, that is, an increase in the amount of washing water.

【0017】図6は図1の装置の変形例を示すもので、
碍洗ポンプ4の吐出側から返水用管路11を分岐させ、碍
洗ポンプ4の吐出圧によって貯水タンク3内の水を水質
改善管路10に通すようにし、図1の給水ポンプ2を省略
したものである。このように碍洗ポンプ4と給水ポンプ
2を兼用すれば、装置のコストダウンを図ることができ
る。
FIG. 6 shows a modification of the apparatus of FIG.
The water return pipe 11 is branched from the discharge side of the porcelain washing pump 4, and the water in the water storage tank 3 is passed through the water quality improvement pipe 10 by the discharge pressure of the porcelain washing pump 4. It is omitted. If the insulator washing pump 4 and the water supply pump 2 are used in this manner, the cost of the apparatus can be reduced.

【0018】[0018]

【0019】[0019]

【発明の効果】以上に説明したように、本発明によれば
給水源や貯水タンク内の水質が低下したときにその水質
を自動的に改善して洗浄耐電圧を高く維持できることは
勿論、水質改善手段により得られた水(純水)を必ず普
通の水と混合して碍子洗浄用のノズルへ送水するように
したので、水質改善装置の小容量化を図れること、配管
の腐食を防止できること等の利点がある。
As described above, according to the present invention, when the water quality in the water supply source or the water storage tank is lowered, the water quality can be automatically improved to maintain the cleaning withstand voltage high. Since the water (pure water) obtained by the improvement means is always mixed with ordinary water and sent to the nozzle for insulator cleaning, the capacity of the water quality improvement device can be reduced, and corrosion of piping can be prevented. There are advantages such as.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の装置の全体図である。FIG. 1 is an overall view of an apparatus of the present invention.

【図2】請求項1の発明のフローシートである。FIG. 2 is a flow sheet according to the invention of claim 1;

【図3】原水の体積固有抵抗率と設定値をクリアーする
に必要な水質改善水の混合割合との関係を示すグラフで
ある。
FIG. 3 is a graph showing the relationship between the volume specific resistivity of raw water and the mixing ratio of water quality improvement water required to clear a set value.

【図4】請求項2の発明のフローシートである。FIG. 4 is a flow sheet according to the invention of claim 2;

【図5】碍子の汚損量と洗浄耐電圧との関係を示すグラ
フである。
FIG. 5 is a graph showing the relationship between the amount of insulator fouling and the withstand voltage of cleaning.

【図6】図1の装置の変形例を示す全体図である。FIG. 6 is an overall view showing a modification of the apparatus of FIG. 1;

【図7】従来例を示す全体図である。 FIG. 7 is an overall view showing a conventional example.

【図8】洗浄水の体積固有抵抗率と洗浄耐電圧の変化率
との関係を示すグラフである。
FIG. 8: Change rate of volume specific resistivity and cleaning withstand voltage of cleaning water
6 is a graph showing a relationship with the graph.

【符号の説明】[Explanation of symbols]

1 給水タンク、2 給水ポンプ、3 貯水タンク、4
碍洗ポンプ、5 区画自動弁、6 碍子洗浄用のノズ
ル、7 洗浄対象となる碍子、8 水質改善手段、9
濾過手段、10 水質改善管路、11 返水用管路、12 バ
イパス管路、21貯水タンク、22 ポンプ、23 区画自動
弁、24 碍子洗浄用のノズル、25 碍子、V1 給水電磁
弁、V2 給水電磁弁、V3 給水電磁弁、HC1 水質計、HC
2 水質計
1 water tank, 2 water pump, 3 water storage tank, 4
Insulator washing pump, 5 compartment automatic valve, 6 Insulator washing nozzle, 7 Insulator to be washed, 8 Water quality improvement means, 9
Filtration means, 10 water quality improvement pipeline, 11 return water pipeline, 12 bypass pipeline, 21 water storage tank, 22 pump, 23 zone automatic valve, 24 insulator cleaning nozzle, 25 insulator, V1 water supply solenoid valve, V2 water supply Solenoid valve, V3 water supply solenoid valve, HC1 water quality meter, HC
2 Water quality meter

フロントページの続き (56)参考文献 特開 昭49−63993(JP,A) 特開 平7−265859(JP,A) 特開 昭54−50475(JP,A) 実開 平6−81691(JP,U) (58)調査した分野(Int.Cl.7,DB名) H01B 17/00 - 17/54 B08B 3/14 C02F 1/00 Continuation of the front page (56) References JP-A-49-63993 (JP, A) JP-A-7-265859 (JP, A) JP-A-54-50475 (JP, A) JP-A-6-81691 (JP) , U) (58) Fields investigated (Int. Cl. 7 , DB name) H01B 17/00-17/54 B08B 3/14 C02F 1/00

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 碍子洗浄装置の貯水タンクと給水源との
間に、水質改善手段を備えた水質改善管路と、水質改善
管路のバイパス管路とを並列に設けるとともに、貯水タ
ンクから水を給水源の出口部に返送する返水用管路を設
け、貯水タンクの水質が低下した場合には、貯水タンク
内の水の一部を返水用管路を介して返水して水質改善管
路に通したうえ貯水タンクに戻し、貯水タンクの水位が
低下し貯水タンクに給水の必要が生じた際、給水源の水
質が低下している場合には、貯水タンクの水質が設定値
をクリアーしておれば給水源の水を水質改善管路とバイ
パス管路とに並列に流し、貯水タンクの水質が設定値を
クリアーしていなければ全量を水質改善管路に通して貯
水タンクに給水するようにしたことを特徴とする碍子洗
浄装置における水質改善装置。
1. A water quality improvement pipe provided with water quality improvement means and a bypass pipe of the water quality improvement pipe are provided in parallel between a water storage tank of an insulator cleaning device and a water supply source. Return line to the outlet of the water supply source, and if the water quality of the water storage tank is reduced, a part of the water in the water storage tank is returned through the water return line to After passing the improvement pipe back to the water storage tank, the water level in the water storage tank
When reduced need for water in the holding tank has occurred, when the water quality of the water supply is decreased, the water supply source of water quality improvement conduit and the bypass if my quality of the water storage tank is to clear the set values A water quality improvement device for an insulator cleaning device characterized by flowing in parallel to a pipe and, if the water quality of the water storage tank has not cleared a set value, passing the entire amount through a water quality improvement pipe and supplying water to the water storage tank. .
JP01240796A 1996-01-29 1996-01-29 Water quality improvement device in insulator cleaning device Expired - Lifetime JP3295293B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP01240796A JP3295293B2 (en) 1996-01-29 1996-01-29 Water quality improvement device in insulator cleaning device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP01240796A JP3295293B2 (en) 1996-01-29 1996-01-29 Water quality improvement device in insulator cleaning device

Publications (2)

Publication Number Publication Date
JPH09204837A JPH09204837A (en) 1997-08-05
JP3295293B2 true JP3295293B2 (en) 2002-06-24

Family

ID=11804416

Family Applications (1)

Application Number Title Priority Date Filing Date
JP01240796A Expired - Lifetime JP3295293B2 (en) 1996-01-29 1996-01-29 Water quality improvement device in insulator cleaning device

Country Status (1)

Country Link
JP (1) JP3295293B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103408081B (en) * 2013-08-29 2015-03-25 浙江省质量检测科学研究院 Continuous water source water quality regulation system for laboratory testing and water supply method
CN104326587A (en) * 2014-10-27 2015-02-04 苏州腾纳环保科技有限公司 Hierarchical central water purifier

Also Published As

Publication number Publication date
JPH09204837A (en) 1997-08-05

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