JP3282040B2 - Ultra high purity oxygen sampling method and apparatus - Google Patents

Ultra high purity oxygen sampling method and apparatus

Info

Publication number
JP3282040B2
JP3282040B2 JP1090592A JP1090592A JP3282040B2 JP 3282040 B2 JP3282040 B2 JP 3282040B2 JP 1090592 A JP1090592 A JP 1090592A JP 1090592 A JP1090592 A JP 1090592A JP 3282040 B2 JP3282040 B2 JP 3282040B2
Authority
JP
Japan
Prior art keywords
oxygen
gas
sub
rectification column
column
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP1090592A
Other languages
Japanese (ja)
Other versions
JPH05203345A (en
Inventor
輝二 金子
雅洋 田村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Taiyo Nippon Sanso Corp
Original Assignee
Taiyo Nippon Sanso Corp
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Filing date
Publication date
Application filed by Taiyo Nippon Sanso Corp filed Critical Taiyo Nippon Sanso Corp
Priority to JP1090592A priority Critical patent/JP3282040B2/en
Publication of JPH05203345A publication Critical patent/JPH05203345A/en
Application granted granted Critical
Publication of JP3282040B2 publication Critical patent/JP3282040B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25JLIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J3/00Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
    • F25J3/02Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream
    • F25J3/04Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air
    • F25J3/044Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air using a single pressure main column system only
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25JLIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J3/00Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
    • F25J3/02Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream
    • F25J3/04Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air
    • F25J3/04436Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air using at least a triple pressure main column system
    • F25J3/04454Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air using at least a triple pressure main column system a main column system not otherwise provided, e.g. serially coupling of columns or more than three pressure levels
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25JLIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J2200/00Processes or apparatus using separation by rectification
    • F25J2200/72Refluxing the column with at least a part of the totally condensed overhead gas
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25JLIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J2205/00Processes or apparatus using other separation and/or other processing means
    • F25J2205/02Processes or apparatus using other separation and/or other processing means using simple phase separation in a vessel or drum
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25JLIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J2215/00Processes characterised by the type or other details of the product stream
    • F25J2215/50Oxygen or special cases, e.g. isotope-mixtures or low purity O2
    • F25J2215/56Ultra high purity oxygen, i.e. generally more than 99,9% O2
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25JLIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J2250/00Details related to the use of reboiler-condensers
    • F25J2250/20Boiler-condenser with multiple exchanger cores in parallel or with multiple re-boiling or condensing streams

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、超高純度酸素採取方法
及び装置に関し、詳しくは、一般に用いられている窒素
製造装置から排出される排ガス、即ち酸素富化空気中に
含まれる酸素を超高純度酸素として採取する方法及び装
置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method and an apparatus for collecting ultrapure oxygen, and more particularly, to a method for removing exhaust gas discharged from a generally used nitrogen production apparatus, that is, oxygen contained in oxygen-enriched air. The present invention relates to a method and an apparatus for collecting high-purity oxygen.

【0002】[0002]

【従来の技術】従来から、図2に示す構成の窒素製造装
置により高純度窒素を製造することが行われている。こ
の窒素製造装置は、周知のように、精留塔1と凝縮器2
とを主構成要素とするものであって、図示しない原料空
気圧縮機,原料空気精製設備及び熱交換器等により圧
縮,精製,冷却された原料空気は、管3から前記精留塔
1に導入され、精留されて塔頂部の高純度窒素ガスと塔
底部の酸素富化液化空気とに分離する。
2. Description of the Related Art Hitherto, high-purity nitrogen has been produced by a nitrogen production apparatus having the structure shown in FIG. As is well known, this nitrogen production apparatus comprises a rectification column 1 and a condenser 2
The raw material air compressed, purified and cooled by a raw material air compressor, a raw material air refining facility, a heat exchanger and the like (not shown) is introduced into the rectification column 1 through a pipe 3. It is rectified and separated into high-purity nitrogen gas at the top of the tower and oxygen-enriched liquefied air at the bottom of the tower.

【0003】上記塔頂部の高純度窒素ガスは、管4に導
出され、その一部が管5により製品の高純度窒素ガスと
して採取されるとともに、残部が前記凝縮器2に導入さ
れて液化し、その一部が管6により液化窒素として採取
され、残部が精留塔1の還流液として精留塔頂部に導入
される。
[0003] The high-purity nitrogen gas at the top of the tower is led out to a pipe 4, a part of which is collected as high-purity nitrogen gas of the product by a pipe 5, and the remainder is introduced into the condenser 2 for liquefaction. A part thereof is collected as liquefied nitrogen by a pipe 6, and the remainder is introduced as a reflux liquid of the rectification column 1 to the top of the rectification column.

【0004】前記塔底部の酸素富化液化空気は、管7に
導出され、膨張弁8で膨張した後、前記凝縮器2で前記
窒素ガスを液化する寒冷源となり、自身は気化して管9
に導出される。この管9の酸素富化空気は、図示しない
膨張タービンで寒冷を発生した後、排ガスとして排出さ
れる。即ち、塔底部の酸素富化液化空気は、精留塔1の
還流液(液化窒素)を生成するための寒冷源及び原料空
気を冷却するための寒冷源として用いられた後、系外に
排出されている。
[0004] The oxygen-enriched liquefied air at the bottom of the tower is led out to a pipe 7, expanded by an expansion valve 8, becomes a cold source for liquefying the nitrogen gas in the condenser 2, and is itself vaporized to a pipe 9.
Is derived. The oxygen-enriched air in the pipe 9 is discharged as exhaust gas after cooling by an expansion turbine (not shown). That is, the oxygen-enriched liquefied air at the bottom of the column is used as a cold source for generating a reflux liquid (liquefied nitrogen) of the rectification column 1 and a cold source for cooling the raw material air, and then discharged out of the system. Have been.

【0005】また、酸素を製造する装置としては、高圧
塔(下部塔)及び低圧塔(上部塔)からなる複精留塔を
用いて空気を液化精留分離して酸素と共に窒素やアルゴ
ンを製造する方法が知られており、製鉄等の酸素を多く
消費する分野で広く用いられている。さらに、超高純度
の酸素を得る方法として、従来から多数の提案がなされ
ているが、そのほとんどは、上記酸素製造装置で得られ
た酸素ガスあるいは液化酸素を原料として不純物成分を
除去するものであった。
As an apparatus for producing oxygen, a double rectification column comprising a high-pressure column (lower column) and a low-pressure column (upper column) is used to liquefy and separate air to produce nitrogen and argon together with oxygen. This method is known, and is widely used in fields such as iron making that consume a large amount of oxygen. Further, a number of proposals have conventionally been made as a method for obtaining ultra-high-purity oxygen, but most of them are methods for removing impurity components using oxygen gas or liquefied oxygen obtained by the oxygen production apparatus as a raw material. there were.

【0006】[0006]

【発明が解決しようとする課題】一方、近年の半導体産
業の分野においては、半導体の高性能化や高品質化に伴
い、高純度工業ガスの需要が増加しているが、主として
高純度窒素が用いられており、高純度酸素の需要は窒素
に比べて極僅かである。
On the other hand, in the field of the semiconductor industry in recent years, demand for high-purity industrial gas has been increasing in accordance with higher performance and higher quality of semiconductors. It is used and the demand for high purity oxygen is negligible compared to nitrogen.

【0007】上述の半導体産業のように、高純度窒素の
需要に比べて高純度酸素の需要が極端に少ない場合、窒
素の需要に応えるために、図2に示したような高純度窒
素製造装置(空気液化分離装置)を設置することは、コ
スト的に十分見合うものであるが、僅かな量の高純度酸
素を得るために、前記複精留塔を用いた酸素製造装置や
酸素精製装置を設置することは、コスト的に見合うもの
ではない。
When the demand for high-purity oxygen is extremely small as compared with the demand for high-purity nitrogen as in the semiconductor industry described above, a high-purity nitrogen production apparatus as shown in FIG. The installation of the (air liquefaction / separation apparatus) is sufficiently cost-effective, but in order to obtain a small amount of high-purity oxygen, an oxygen production apparatus or an oxygen purification apparatus using the double rectification column is required. Installation is not worth the cost.

【0008】そこで本発明は、従来の高純度窒素製造装
置から排ガスとして排出されていた酸素富化空気を原料
として少量の超高純度酸素を採取することができる酸素
採取方法及び装置を提供することを目的としている。
Accordingly, the present invention provides an oxygen collection method and apparatus capable of collecting a small amount of ultra-high-purity oxygen using oxygen-enriched air discharged as exhaust gas from a conventional high-purity nitrogen production apparatus as a raw material. It is an object.

【0009】[0009]

【課題を解決するための手段】上記した目的を達成する
ため、本発明の超高純度酸素採取方法は、原料空気を深
冷液化精留分離法により分離して窒素ガスを製造する窒
素製造装置から排出される酸素富化空気の一部を原料と
して酸素を分離採取する方法であって、前記窒素製造装
置の精留塔底部から導出される酸素富化液化空気の一部
又は該液化空気を気化した酸素富化空気の一部を第1副
精留塔に導入して当該塔内気液比L/Vを0.1から
0.3に調整して精留し、該第1副精留塔底部に高沸点
成分を濃縮して排出するとともに、該第1副精留塔頂部
に分離したガスを液化後に第2副精留塔の頂部に導入し
当該塔内気液比L/Vを略1に調整して精留し、該第
2副精留塔頂部に低沸点成分を濃縮して排出するととも
に、該第2副精留塔底部に分離した酸素をガス及び液で
採取することを特徴としている。
In order to achieve the above object, an ultrapure oxygen sampling method according to the present invention is directed to a nitrogen production apparatus for producing a nitrogen gas by separating raw air by a cryogenic liquefaction rectification separation method. A method for separating and collecting oxygen using a portion of the oxygen-enriched air discharged from the raw material as a raw material, wherein a portion or the liquefied air of the oxygen-enriched liquefied air derived from the bottom of the rectification column of the nitrogen production device is A part of the vaporized oxygen-enriched air is introduced into the first sub-rectification column to increase the gas- liquid ratio L / V in the column from 0.1 to 0.1.
The high-boiling components are concentrated and discharged at the bottom of the first sub-rectification column, and the gas separated at the top of the first sub-rectification column is liquefied and then liquefied to the second sub-rectification column. The fraction is introduced into the top of the distillation column to adjust the gas- liquid ratio L / V in the column to approximately 1, and rectified. The low-boiling component is concentrated and discharged to the top of the second sub-rectification column, and the second sub-rectification column is discharged. The method is characterized in that oxygen separated at the bottom of the sub-rectification column is collected as gas and liquid .

【0010】また、本発明の超高純度酸素採取装置は、
原料空気を深冷液化精留分離法により分離して窒素ガス
を製造する窒素製造装置に付設して酸素を分離採取する
装置であって、前記窒素製造装置の精留塔の底部から導
出される酸素富化液化空気の一部又は該液化空気を気化
した酸素富化空気の一部を塔内気液比L/Vが0.1か
ら0.3の条件下で精留する第1副精留塔と、該第1副
精留塔底部に濃縮する高沸点成分を排出する経路と、該
第1副精留塔頂部に分離したガスを液化する凝縮器と、
該凝縮器で液化したガスを頂部に導入して塔内気液比L
/Vが略1の条件下で精留する第2副精留塔と、該第2
副精留塔頂部に濃縮した低沸点成分を排出する経路と、
該第2副精留塔底部に分離した酸素をガスで採取する経
路と液で採取する経路とを備えたことを特徴としてい
る。
Further, the ultrapure oxygen sampling apparatus of the present invention
An apparatus for separating and collecting oxygen by attaching a raw material air to a nitrogen production apparatus for producing nitrogen gas by separating it by a cryogenic liquefaction rectification separation method, which is derived from the bottom of a rectification column of the nitrogen production apparatus. If a part of the oxygen-enriched liquefied air or a part of the oxygen-enriched air obtained by vaporizing the liquefied air has a gas-liquid ratio L / V of 0.1 in the tower,
A first sub-rectification column for rectifying under the conditions of 0.3 to 0.3, a path for discharging high boiling components concentrated at the bottom of the first sub-rectification column, and a separation at the top of the first sub-rectification column. A condenser for liquefying gas,
The gas liquefied by the condenser is introduced into the top part, and the gas-liquid ratio L
A second sub-rectification column that rectifies under the condition that V / V is approximately 1;
A route for discharging low-boiling components concentrated at the top of the sub-rectification column,
A process of collecting oxygen separated at the bottom of the second sub-rectification column with a gas
It is characterized by having a path and a path for sampling with a liquid .

【0011】[0011]

【作 用】上記構成によれば、窒素製造装置の精留塔底
部から導出した酸素富化液化空気の一部から高純度酸素
ガスを採取することができる。即ち、酸素富化液化空気
あるいは該液化空気を気化した酸素富化空気中に含まれ
る高沸点成分、例えば各種炭化水素,窒素酸化物,フロ
ン類等は、第一副精留塔の塔底部に濃縮して分離され、
一方、窒素等の低沸点成分は、第二副精留塔の塔頂部に
濃縮して分離され、該第二副精留塔の底部には超高純度
の酸素ガス及び液化酸素が分離する。
[Operation] According to the above configuration, high-purity oxygen gas can be collected from a part of the oxygen-enriched liquefied air derived from the bottom of the rectification column of the nitrogen production apparatus. That is, high-boiling components contained in oxygen-enriched liquefied air or oxygen-enriched air obtained by evaporating the liquefied air, such as various hydrocarbons, nitrogen oxides, and fluorocarbons, are deposited at the bottom of the first sub-rectification column. Concentrated and separated,
On the other hand, low boiling components such as nitrogen are concentrated and separated at the top of the second sub-rectification column, and ultra-high purity oxygen gas and liquefied oxygen are separated at the bottom of the second sub-rectification column.

【0012】[0012]

【実施例】以下、本発明を、図1に示す一実施例に基づ
いて、さらに詳細に説明する。なお、前記図2と同一要
素のものには同一符号を付して、その詳細な説明は省略
する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the present invention will be described in more detail based on one embodiment shown in FIG. The same elements as those in FIG. 2 are denoted by the same reference numerals, and detailed description thereof will be omitted.

【0013】本実施例装置は、前記精留塔1及び凝縮器
2からなる窒素製造装置に、精留塔1の底部から管7に
導出され、膨張弁8で降圧し、凝縮器2で気化した酸素
富化空気の一部を上昇ガスとして導入する第1副精留塔
11と、該第1副精留塔11の塔頂部から導出したガス
を液化する副凝縮器12と、該副凝縮器12で液化した
液化ガスの一部を還流液として導入する第2副精留塔1
3と、該第2副精留塔13の底部に設置したリボイラー
14とを主構成要素とするものである。
The apparatus of this embodiment is introduced into a nitrogen production apparatus comprising the rectification column 1 and the condenser 2, which is led out from the bottom of the rectification column 1 to a pipe 7, depressurized by an expansion valve 8, and vaporized by the condenser 2. A first sub-rectification column 11 for introducing a part of the oxygen-enriched air as an ascending gas, a sub-condenser 12 for liquefying a gas derived from the top of the first sub-rectification column 11, Secondary rectification column 1 that introduces a part of the liquefied gas liquefied in reactor 12 as a reflux liquid
3 and a reboiler 14 installed at the bottom of the second sub-rectification column 13 as main components.

【0014】以下、気液の流れに従って超高純度酸素を
採取する手順を説明する。なお、組成は、いずれも体積
%である。
Hereinafter, a procedure for collecting ultrahigh-purity oxygen in accordance with the flow of gas and liquid will be described. In addition, all compositions are volume%.

【0015】まず、管9から管15に分岐して第1副精
留塔11に上昇ガスとして導入された酸素富化空気(例
えば、窒素66.34%,酸素32.23%,アルゴン
1.43%及び微量不純物成分からなるガス)は、該第
1副精留塔11で精留されることにより、塔底部に酸素
より沸点の高い高沸点成分(各種炭化水素,窒素酸化
物,フロン類等)が濃縮され、塔頂部にこれらの高沸点
成分を含まないガス(例えば、窒素71.56%,酸素
27.06%,アルゴン1.38%のガス)が分離す
る。
First, oxygen-enriched air (for example, 66.34% of nitrogen, 32.23% of oxygen, 32.23% of oxygen, and 1.0% of argon) introduced from the pipe 9 to the pipe 15 and introduced into the first sub-rectification column 11 as rising gas. 43% and a small amount of impurity components are rectified in the first sub-rectification column 11, so that high-boiling components (various hydrocarbons, nitrogen oxides, chlorofluorocarbons, etc.) having a boiling point higher than oxygen at the bottom of the column. Are concentrated, and a gas (for example, a gas of 71.56% of nitrogen, 27.06% of oxygen, and 1.38% of argon) that does not contain these high-boiling components is separated at the top of the column.

【0016】上記第1副精留塔11の精留条件は、原料
空気の状態,窒素製造装置の運転条件,採取する超高純
度酸素の組成等、各種条件により異なるが、通常は、分
離すべき高沸点成分が微量であることから、精留段も1
段乃至数段、例えば7段程度で十分であり、還流液量も
少量でよく、塔内気液比L/Vを0.1〜0.3の範囲
にすればよい。
The rectification conditions of the first sub-rectification column 11 vary depending on various conditions such as the condition of the raw material air, the operating conditions of the nitrogen production apparatus, and the composition of the ultra-high purity oxygen to be collected. Since the high boiling point components to be used are very small, the rectification stage is also one.
A stage or several stages, for example, about seven stages, is sufficient, the amount of reflux liquid may be small, and the gas-liquid ratio L / V in the column may be in the range of 0.1 to 0.3.

【0017】第1副精留塔11の底部の高沸点成分を含
む液化ガスは、高沸点成分を排出する経路である管16
に導出され、膨張弁17で膨張して前記副凝縮器12の
寒冷源となって気化した後、管18から排出される。
The liquefied gas containing the high-boiling components at the bottom of the first sub-rectification column 11 is supplied to a pipe 16 as a path for discharging the high-boiling components.
After being expanded by the expansion valve 17 and becoming a cold source of the sub-condenser 12 and vaporized, it is discharged from the pipe 18.

【0018】第1副精留塔11の頂部の高沸点成分を含
まないガスは、管19に導出され、前記副凝縮器12で
液化して液化ガスとなる。この副凝縮器12において、
該高沸点成分を含まないガスを液化するための寒冷源と
しては、上記高沸点成分を含む液化ガスに加えて、前記
精留塔1から管7に導出された酸素富化液化空気の一部
を、管20に分岐して膨張弁21で膨張させて用いてい
る。
The gas containing no high-boiling components at the top of the first sub-rectification column 11 is led to a pipe 19 and liquefied in the sub-condenser 12 to become a liquefied gas. In this sub-condenser 12,
As a cold source for liquefying the gas not containing the high boiling point component, in addition to the liquefied gas containing the high boiling point component, a part of the oxygen-enriched liquefied air led out from the rectification column 1 to the pipe 7 is used. Is used by being branched into a pipe 20 and expanded by an expansion valve 21.

【0019】上記副凝縮器12で液化した液化ガスは、
その一部(前記L/V=0.1〜0.3に対応する量)
が管22を介して第1副精留塔11の頂部に導入されて
還流液となり、残部が管23,膨張弁24を経て前記第
2副精留塔13の頂部に導入される。
The liquefied gas liquefied in the sub-condenser 12 is
Part (the amount corresponding to L / V = 0.1 to 0.3)
Is introduced into the top of the first sub-rectification column 11 through a pipe 22 to form a reflux liquid, and the remainder is introduced into the top of the second sub-rectification column 13 through a pipe 23 and an expansion valve 24.

【0020】上記第2副精留塔13は、低沸点成分であ
る窒素,アルゴン等と酸素との分離効率を向上させるた
めに、0.5〜1.0kg/cm2 Gの低圧で運転され
るもので、上記高沸点成分を含まない液化ガスからなる
還流液と、塔底部に設置された前記リボイラー14で気
化した酸素ガスからなる上昇ガスとで精留が行われ、塔
頂部に低沸点成分が濃縮し、塔底部に超高純度(例え
ば、99.9999%以上)の液化酸素が分離する。
The second sub-rectification column 13 is operated at a low pressure of 0.5 to 1.0 kg / cm 2 G in order to improve the efficiency of separation of oxygen from low boiling components such as nitrogen and argon. The rectification is performed with a reflux liquid composed of a liquefied gas containing no high-boiling components and an ascending gas composed of oxygen gas vaporized in the reboiler 14 installed at the bottom of the column. The components are concentrated, and liquefied oxygen of ultra-high purity (for example, 99.9999% or more) is separated at the bottom of the column.

【0021】上記第2副精留塔13の精留条件は、採取
する超高純度酸素の組成等により異なるが、通常は、分
離すべき窒素ガス等の低沸点成分が大量に存在すること
から、精留段を多くすることが望ましく、例えば50段
程度設けることが好ましく、塔内気液比L/Vも1に近
い値にすることが好ましい。
The rectification conditions of the second sub-rectification column 13 vary depending on the composition of the ultrahigh-purity oxygen to be collected and the like. However, usually, a large amount of low-boiling components such as nitrogen gas to be separated is present. It is desirable to increase the number of rectification stages, for example, it is preferable to provide about 50 stages, and it is also preferable to set the column gas-liquid ratio L / V to a value close to 1.

【0022】第2副精留塔底部の超高純度液化酸素は管
25から採取され、管26からは超高純度酸素ガスが採
取される。なお、超高純度酸素の採取は、需要に応じて
ガス・液のいずれか一方でも良く、両者同時でも良い。
一方、第2副精留塔頂部に濃縮された低沸点成分は、低
沸点成分を排出する経路である管27に導出され、前記
管18の高沸点成分を濃縮したガスと共に原料空気の冷
却源として用いられた後に排出される。
Ultra-high-purity liquefied oxygen at the bottom of the second sub-rectification column is collected from a tube 25, and ultra-high-purity oxygen gas is collected from a tube 26. The ultra-high-purity oxygen may be collected either by gas or liquid depending on demand, or by both.
On the other hand, the low-boiling component concentrated at the top of the second sub-rectification column is led out to a pipe 27 which is a path for discharging the low-boiling component, and is cooled together with the gas in which the high-boiling component is concentrated in the pipe 18 as a cooling source for the raw air. It is discharged after being used as.

【0023】なお、前記リボイラー14に導入される熱
源には、前記精留塔4の頂部から管4に導出された高純
度窒素ガスの一部を管28に分岐して用いており、該リ
ボイラー14で前記超高純度液化酸素を気化させること
により液化した液化窒素は、管29により、前記凝縮器
2で液化した液化窒素と合流させている。
As the heat source introduced into the reboiler 14, a part of the high-purity nitrogen gas led out from the top of the rectification column 4 to the pipe 4 is branched into a pipe 28 and used. The liquefied nitrogen liquefied by vaporizing the ultrahigh-purity liquefied oxygen in 14 is combined with the liquefied nitrogen liquefied in the condenser 2 by a pipe 29.

【0024】このように、従来排出されていた酸素富化
空気の一部を第1精留塔11及び第2副精留塔13で上
述のように精留することにより、極めて高純度の酸素を
採取することができる。この高純度酸素の採取量は、需
要や純度に応じて適宜な量に設定することが可能である
が、通常は、製品の高純度窒素ガスに対して数%程度、
原料空気量に対して1%以下が適当であり、半導体産業
が必要としている高純度窒素と超高純度酸素の十分対応
することができる。
As described above, a part of the oxygen-enriched air which has been discharged in the past is rectified by the first rectification column 11 and the second sub-rectification column 13 as described above, so that an extremely high-purity oxygen is obtained. Can be collected. The amount of the high-purity oxygen that can be collected can be set to an appropriate amount according to the demand and the purity.
1% or less is suitable for the amount of raw material air, and can sufficiently cope with high-purity nitrogen and ultra-high-purity oxygen required by the semiconductor industry.

【0025】また、複精留塔を用いて酸素を製造するも
のに比べて、第1及び第2副精留塔並びに副凝縮器を含
めた系統を大幅に小型化することができ、さらに、通常
の複精留塔よりも極めて高純度の酸素が得られるため、
従来複精留塔に設けられていた酸素精製設備を設ける必
要がなくなり、僅かな設備コストで需要に見合った超高
純度酸素を採取することができる。加えて、採取する超
高純度酸素量が全量に対して僅かであるため、運転コス
トの上昇もほとんどない。
In addition, the system including the first and second sub-rectification towers and the sub-condenser can be significantly reduced in size as compared with the production of oxygen using a double rectification column. Because extremely high-purity oxygen can be obtained compared to a normal double rectification column,
It is no longer necessary to provide an oxygen purification facility conventionally provided in a double rectification column, and ultra-high-purity oxygen that meets demand can be collected at a small facility cost. In addition, since the amount of ultrapure oxygen to be collected is small relative to the total amount, there is almost no increase in operating costs.

【0026】なお、上記実施例では、窒素製造装置の精
留塔から導出した酸素富化液化空気を気化してから第1
副精留塔に上昇ガスとして導入しているが、該液化空気
をそのまま第1副精留塔に導入してもよい。ただし、こ
の場合は、第1副精留塔の底部に酸素富化液化空気を蒸
発させて上昇ガスにするためのリボイラー等を設置する
必要がある。
In the above embodiment, the first oxygen-enriched liquefied air discharged from the rectification column of the nitrogen production apparatus is
Although the liquefied air is introduced as a rising gas into the sub-rectification column, the liquefied air may be directly introduced into the first sub-rectification column. However, in this case, it is necessary to install a reboiler or the like for evaporating the oxygen-enriched liquefied air into a rising gas at the bottom of the first sub-rectification column.

【0027】また、第2副精留塔のリボイラーに導入す
る熱源には、上記窒素ガスの他、例えば原料空気の一部
等も用いることができ、副凝縮器の寒冷源としても他の
ガス,液化ガスを用いることが可能である。
As the heat source to be introduced into the reboiler of the second sub-rectification column, for example, a part of the raw air may be used in addition to the above-mentioned nitrogen gas. , Liquefied gas can be used.

【0028】[0028]

【発明の効果】以上説明したように、本発明によれば、
従来窒素製造装置から排出されていた酸素富化空気の一
部を利用して超高純度の酸素を採取することができ、多
量の高純度窒素と共に少量の超高純度酸素を使用する半
導体産業向けの空気液化分離装置として最適である。
As described above, according to the present invention,
Ultra-high-purity oxygen can be collected using part of the oxygen-enriched air that has been discharged from conventional nitrogen production equipment. For the semiconductor industry, which uses a small amount of ultra-high-purity oxygen together with a large amount of high-purity nitrogen It is most suitable as an air liquefaction separation device.

【0029】また、通常の単精留塔を用いた窒素製造装
置を主装置としてそのまま使用でき、窒素の生産量を落
とすことなく超高純度の酸素を採取できるので、低コス
トで超高純度酸素を得ることができる。
In addition, a nitrogen production apparatus using a normal single rectification column can be used as a main apparatus as it is, and ultra-high purity oxygen can be collected without reducing nitrogen production. Can be obtained.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 本発明の一実施例を示す系統図である。FIG. 1 is a system diagram showing one embodiment of the present invention.

【図2】 従来の窒素製造装置の一例を示す系統図であ
る。
FIG. 2 is a system diagram showing an example of a conventional nitrogen production apparatus.

【符号の説明】[Explanation of symbols]

1…精留塔 2…凝縮器 8,17,21,24…
膨張弁 11…第1副精留塔 12…副凝縮器 13…第
2副精留塔 14…リボイラー
1: rectification tower 2: condenser 8, 17, 21, 24 ...
Expansion valve 11: first sub-rectification column 12: sub-condenser 13: second sub-rectification column 14: reboiler

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭61−190277(JP,A) 特開 昭64−75883(JP,A) 特開 平2−282683(JP,A) 特開 平3−17488(JP,A) (58)調査した分野(Int.Cl.7,DB名) F25J 1/00 - 5/00 ──────────────────────────────────────────────────続 き Continuation of front page (56) References JP-A-61-190277 (JP, A) JP-A-64-75883 (JP, A) JP-A-2-282683 (JP, A) JP-A-3- 17488 (JP, A) (58) Field surveyed (Int. Cl. 7 , DB name) F25J 1/00-5/00

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 原料空気を深冷液化精留分離法により分
離して窒素ガスを製造する窒素製造装置から排出される
酸素富化空気の一部を原料として酸素を分離採取する方
法であって、前記窒素製造装置の精留塔底部から導出さ
れる酸素富化液化空気の一部又は該液化空気を気化した
酸素富化空気の一部を第1副精留塔に導入して当該塔内
気液比L/Vを0.1から0.3に調整して精留し、該
第1副精留塔底部に高沸点成分を濃縮して排出するとと
もに、該第1副精留塔頂部に分離したガスを液化後に第
2副精留塔の頂部に導入して当該塔内気液比L/Vを略
1に調整して精留し、該第2副精留塔頂部に低沸点成分
を濃縮して排出するとともに、該第2副精留塔底部に分
離した酸素をガス及び液で採取することを特徴とする超
高純度酸素採取方法。
1. A method for separating and collecting oxygen from a part of oxygen-enriched air discharged from a nitrogen production apparatus for producing a nitrogen gas by separating a raw air by a cryogenic liquefaction rectification separation method, Introducing a part of the oxygen-enriched liquefied air or a part of the oxygen-enriched air vaporized from the liquefied air into the first sub-rectification column ,
The rectification is performed by adjusting the gas-liquid ratio L / V from 0.1 to 0.3, and the high-boiling components are concentrated and discharged to the bottom of the first sub-rectification column. After the liquefied gas is introduced into the top of the second sub-rectification column, the gas- liquid ratio L / V in the column is substantially reduced.
Rectifying to 1 and concentrating and discharging low boiling components at the top of the second sub-rectification column , and collecting oxygen separated by gas and liquid at the bottom of the second sub-rectification column. Characterized ultra-high purity oxygen sampling method.
【請求項2】 原料空気を深冷液化精留分離法により分
離して窒素ガスを製造する窒素製造装置に付設して酸素
を分離採取する装置であって、前記窒素製造装置の精留
塔の底部から導出される酸素富化液化空気の一部又は該
液化空気を気化した酸素富化空気の一部を塔内気液比L
/Vが0.1から0.3の条件下で精留する第1副精留
塔と、該第1副精留塔底部に濃縮する高沸点成分を排出
する経路と、該第1副精留塔頂部に分離したガスを液化
する凝縮器と、該凝縮器で液化したガスを頂部に導入し
て塔内気液比L/Vが略1の条件下で精留する第2副精
留塔と、該第2副精留塔頂部に濃縮した低沸点成分を排
出する経路と、該第2副精留塔底部に分離した酸素を
スで採取する経路と液で採取する経路とを備えたことを
特徴とする超高純度酸素採取装置。
2. An apparatus for separating and collecting oxygen by attaching a raw material air to a nitrogen production apparatus for producing nitrogen gas by separating the raw air by a cryogenic liquefaction rectification separation method. A part of the oxygen-enriched liquefied air derived from the bottom or a part of the oxygen-enriched air obtained by vaporizing the liquefied air is converted into a gas-liquid ratio L in the column.
/ V rectification under the condition of 0.1 to 0.3, a first sub-rectification column, a path for discharging a high boiling point component concentrated at the bottom of the first sub-rectification column, A condenser for liquefying the gas separated at the top of the distillation column, and introducing the gas liquefied by the condenser to the top.
A second sub-rectification column for rectifying under the condition that the gas-liquid ratio L / V in the column is approximately 1, a path for discharging a low-boiling component concentrated at the top of the second sub-rectification column, gas oxygen separated in the fractionator bottoms
An ultra-high-purity oxygen collecting apparatus, comprising: a path for sampling with a liquid; and a path for sampling with a liquid .
JP1090592A 1992-01-24 1992-01-24 Ultra high purity oxygen sampling method and apparatus Expired - Fee Related JP3282040B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1090592A JP3282040B2 (en) 1992-01-24 1992-01-24 Ultra high purity oxygen sampling method and apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1090592A JP3282040B2 (en) 1992-01-24 1992-01-24 Ultra high purity oxygen sampling method and apparatus

Publications (2)

Publication Number Publication Date
JPH05203345A JPH05203345A (en) 1993-08-10
JP3282040B2 true JP3282040B2 (en) 2002-05-13

Family

ID=11763307

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1090592A Expired - Fee Related JP3282040B2 (en) 1992-01-24 1992-01-24 Ultra high purity oxygen sampling method and apparatus

Country Status (1)

Country Link
JP (1) JP3282040B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5425241A (en) * 1994-05-10 1995-06-20 Air Products And Chemicals, Inc. Process for the cryogenic distillation of an air feed to produce an ultra-high purity oxygen product
US20080216511A1 (en) * 2007-03-09 2008-09-11 Henry Edward Howard Nitrogen production method and apparatus

Also Published As

Publication number Publication date
JPH05203345A (en) 1993-08-10

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