JP3274737B2 - Cleaning method and cleaning spray device - Google Patents
Cleaning method and cleaning spray deviceInfo
- Publication number
- JP3274737B2 JP3274737B2 JP10734593A JP10734593A JP3274737B2 JP 3274737 B2 JP3274737 B2 JP 3274737B2 JP 10734593 A JP10734593 A JP 10734593A JP 10734593 A JP10734593 A JP 10734593A JP 3274737 B2 JP3274737 B2 JP 3274737B2
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- cleaning liquid
- liquid
- hexamethyldisiloxane
- spray device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Description
【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION
【０００１】[0001]
【産業上の利用分野】本発明は洗浄液を噴霧することに
よって被洗浄物を簡易に洗浄する方法およびこの洗浄方
法に使用される洗浄スプレー装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for easily cleaning an object to be cleaned by spraying a cleaning liquid, and a cleaning spray device used in the cleaning method.
【０００２】[0002]
【従来の技術】被洗浄物の部分的な洗浄では洗浄液を噴
霧する簡易な操作で行われる。この洗浄に使用する洗浄
液としては、従来よりフロン１１３などのパーハロエタ
ンが知られている。また特開平１−１１１７５号公報お
よび同２−１１７９７８号公報には界面活性剤を主剤と
し、これにシリコンオイルを配合したエマルジョン状態
の組成物を噴霧して洗浄すると共に、組成物中の残留成
分により艶出しを行うことが記載されている。さらに、
洗浄液とリンス液とを別個の容器内に充填し、洗浄液を
噴霧後にリンス液を噴霧して汚れを除去することもなさ
れている（商品名「パインアルファＳＴ−２０００、荒
川化学工業（株）製）。2. Description of the Related Art Partial cleaning of an object to be cleaned is performed by a simple operation of spraying a cleaning liquid. As a cleaning liquid used for this cleaning, perhaloethane such as Freon 113 has been conventionally known. Japanese Patent Application Laid-Open Nos. 1-111175 and 2-117778 disclose an emulsion-type composition containing a surfactant as a main component and a silicone oil blended with the surfactant for washing, and a method for removing residual components in the composition. Is described to perform polishing. further,
The cleaning liquid and the rinsing liquid are filled in separate containers, and the cleaning liquid is sprayed, and then the rinsing liquid is sprayed to remove dirt (trade name "Pine Alpha ST-2000, Arakawa Chemical Industry Co., Ltd."). ).
【０００３】[0003]
【発明が解決しようとする課題】しかしながら、フロン
１１３等のパーハロエタンは科学的に特に安定であるた
め対流圏内での寿命が長く、拡散して成層圏に達し、こ
こで太陽光線により分解して発生するハロゲンラジカル
がオゾンと連鎖反応を起こし、オゾン層を破壊すること
から、使用の削減が求められており、パーハロエタンを
噴霧して洗浄を行うことは、環境保全上好ましくない。
また、特開平１−１１１７５号公報や特開平２−１１７
９７８号公報では組成物を噴霧後に拭き取るが、成分の
一部が残留するため、被洗浄物から汚れを完全に除去す
ることはできない。さらに、洗浄液とリンス液との２液
構成では、液の使い分けをしなければならず、作業上不
便な面がある。本発明は、これらの問題を考慮してなさ
れたものであり、オゾン層を破壊することなく、洗浄液
の残留がなく、１液で洗浄可能な洗浄方法および洗浄ス
プレー装置を提供することを目的とする。However, perhaloethane, such as Freon 113, is particularly stable scientifically and has a long life in the troposphere, diffuses into the stratosphere, where it is generated by decomposition by sunlight. Since halogen radicals cause a chain reaction with ozone and destroy the ozone layer, it is required to reduce the use thereof. Spraying with perhaloethane for washing is not preferable in terms of environmental conservation.
Also, Japanese Patent Application Laid-Open Nos. Hei 11-11175 and Hei 2-117
In Japanese Patent No. 978, the composition is wiped off after spraying. However, since some components remain, dirt cannot be completely removed from the object to be cleaned. Furthermore, in the two-liquid configuration of the cleaning liquid and the rinsing liquid, the liquid must be used separately, which is inconvenient in operation. The present invention has been made in consideration of these problems, and an object of the present invention is to provide a cleaning method and a cleaning spray device that can perform cleaning with one liquid without destroying the ozone layer and without residual cleaning liquid. I do.
【０００４】[0004]
【課題を解決するための手段および作用】本発明の洗浄
方法は、シロキサンと低級アルコールとの混合物により
洗浄液を構成し、この洗浄液を炭酸ガスにより被洗浄物
に噴霧することを特徴とする。また本発明の洗浄スプレ
ー装置は、上述した組成の洗浄液を噴霧用ガスとしての
炭酸ガスと共に、容器内に充填したことを特徴とする。
ここで、シロキサンとしてはヘキサメチルジシロキサ
ン、オクタメチルトリシロキサン、オクタメチルシクロ
テトラシロキサンの中から選ばれた少なくとも１種であ
り、乾燥性のみを考慮するとヘキサメチルジシロキサ
ン、オクタメチルトリシロキサンが好ましい。一方、低
級アルコールは１０〜５０ｗｔ％の割合で使用される。The cleaning method according to the present invention is characterized in that a cleaning liquid is composed of a mixture of siloxane and a lower alcohol, and the cleaning liquid is sprayed on an object to be cleaned with carbon dioxide gas. Further, the cleaning spray device of the present invention is characterized in that the cleaning liquid having the above-mentioned composition is filled in a container together with carbon dioxide gas as a spray gas.
Here, the siloxane is at least one selected from hexamethyldisiloxane, octamethyltrisiloxane, and octamethylcyclotetrasiloxane, and hexamethyldisiloxane and octamethyltrisiloxane are preferable in consideration of only the drying property. . On the other hand, the lower alcohol is used in a ratio of 10 to 50 wt%.
【０００５】本発明においては、洗浄液の成分としてシ
ロキサンと低級アルコールを含んでいるため、切削油な
どの油類や半田付けの際に用いるフラックスに対して溶
解性を有し、良好な洗浄能力を発揮する。成分の内シロ
キサンは、揮発性がよく蒸発潜熱が低いために、送風等
により速やかに乾燥表面を得られ、良好な洗浄効果を得
ることができる。ここでオクタメチルシクロテトラシロ
キサンよりも高沸点のジメチルシロキサンを用いた場合
には、沸点が高いために揮発性が悪く、乾燥面を速やか
に得ることが難しい。シロキサンにおいて、揮発性の観
点からは特にヘキサメチルジシロキサンが好ましい。ま
た、低級アルコールを含有することで、極性系の汚れに
対して溶解性が向上し、広範囲な汚れに対して洗浄力を
発揮することができる。この低級アルコールは、揮発性
を考慮して炭素数４以下のものが好ましく、毒性面を考
慮するとエタノールが好ましい。[0005] In the present invention, since siloxane and a lower alcohol are contained as components of the cleaning liquid, the cleaning liquid has solubility in oils such as cutting oil and a flux used in soldering, and has good cleaning ability. Demonstrate. Among the components, siloxane has a high volatility and a low latent heat of evaporation, so that a dry surface can be quickly obtained by blowing air or the like, and a good cleaning effect can be obtained. Here, when dimethylsiloxane having a higher boiling point than that of octamethylcyclotetrasiloxane is used, its boiling point is high, so that its volatility is poor and it is difficult to quickly obtain a dry surface. Among siloxanes, hexamethyldisiloxane is particularly preferable from the viewpoint of volatility. In addition, by containing a lower alcohol, the solubility to polar stains is improved, and it is possible to exert detergency against a wide range of stains. The lower alcohol is preferably one having 4 or less carbon atoms in consideration of volatility, and is preferably ethanol in consideration of toxicity.
【０００６】本発明においては、洗浄液を噴霧すること
で目的の部粉以外は洗浄液が付着せず、選択的な洗浄が
可能となる。さらに、洗浄液の噴霧用の液化ガスとして
の炭酸ガスは洗浄液に対する溶解性が少ないため、噴霧
の際に安定した噴出性能を示し、被洗浄物へ噴霧した際
に気化熱による被洗浄物への結露が少ない。また、本発
明のシロキサンは、人体に対し毒性が低いため、噴霧し
て洗浄作業を行う際に人体への悪影響が少ない利点があ
る。In the present invention, by spraying the cleaning liquid, the cleaning liquid does not adhere to parts other than the target part powder, and selective cleaning can be performed. Furthermore, carbon dioxide gas as a liquefied gas for spraying the cleaning liquid has a low solubility in the cleaning liquid, so it exhibits a stable jetting performance at the time of spraying, and when it is sprayed on the object to be cleaned, condensation on the object to be cleaned due to heat of vaporization. Less is. Further, since the siloxane of the present invention has low toxicity to the human body, there is an advantage in that when performing the washing operation by spraying, the adverse effect on the human body is small.
【０００７】[0007]
【実施例１】市販されているヘキサメチルジシロキサン
を蒸留精製することにより、オクタメチルシクロテトラ
シロキサンよりも高沸点成分（沸点１７５℃以上）がガ
スクロマトグラフでは検出されない程度の高純度のヘキ
サメチルジシロキサンを得た。このヘキサメチルジシロ
キサンと純度９９．５％のエタノールとを重量混合比で
ヘキサメチルジシロキサン：エタノール＝６３．５：３
６．５に調製した共沸組成物を作製し、洗浄液とした。
これを１００ｃｃのスプレー缶容器に９０ｃｃいれて、
それぞれ炭酸ガス、ＬＰＧ（プロパンガス）、窒素ガス
を圧力５ｋｇ／ｃｍ2 で封入し、洗浄スプレー装置を得
た。Example 1 Commercially available hexamethyldisiloxane was purified by distillation to obtain a high-purity hexamethyldisiloxane having a boiling point higher than that of octamethylcyclotetrasiloxane (boiling point: 175 ° C. or higher), which is not detected by gas chromatography. A siloxane was obtained. The hexamethyldisiloxane and ethanol having a purity of 99.5% were mixed in a weight mixing ratio of hexamethyldisiloxane: ethanol = 63.5: 3.
The azeotropic composition prepared in 6.5 was prepared and used as a cleaning liquid.
90cc in a 100cc spray can
Carbon dioxide gas, LPG (propane gas) and nitrogen gas were respectively sealed at a pressure of 5 kg / cm 2 to obtain a cleaning spray device.
【０００８】次に、これらを用いて、切削油が付着した
銅板にそれぞれの洗浄液を噴霧した後、ワイパーで拭き
取り洗浄した。この結果を表１に示す。どのガスを用い
ても十分な洗浄効果が得られたが、ＬＰＧでは被洗浄物
表面に結露が多く発生し、乾燥が遅くなった。また、窒
素ガスでは使用中にガス圧力の低下が生じ、スプレー缶
内の洗浄液を全て噴出できなかった。炭酸ガスでは、結
露も少なく速やかに乾燥面が得られ、特に良好な洗浄結
果が得られた。Next, using these, the cleaning liquid was sprayed on the copper plate to which the cutting oil had adhered, and then wiped and cleaned with a wiper. Table 1 shows the results. Although a sufficient cleaning effect was obtained using any of the gases, LPG caused much condensation on the surface of the object to be cleaned, resulting in slow drying. Further, with nitrogen gas, the gas pressure was reduced during use, and all the cleaning liquid in the spray can could not be ejected. With carbon dioxide, a dry surface was quickly obtained with little dew condensation, and particularly good cleaning results were obtained.
【０００９】[0009]
【実施例２】実施例１と同様な純度まで蒸留精製したヘ
キサメチルジシロキサン６３．５重量部に純度９９．５
％のエタノール３６．５重量部を混合して共沸組成の洗
浄液を得、この洗浄液を実施例１と同様に炭酸ガスと共
にスプレー缶容器内に封入し、洗浄スプレー装置を得
た。このスプレー缶容器の噴出ノズルをスポットで噴出
するタイプのものに取り換えて、電気基板の半田付け部
分のみに噴出した後、ワイパーで拭き取ってフラックス
を洗浄した。その後同じ洗浄液を噴出し、リンスを行っ
た。この部分を顕微鏡で観察したところ、フラックスの
残渣は観察されず良好な洗浄結果が得られた。EXAMPLE 2 63.5 parts by weight of hexamethyldisiloxane distilled and purified to the same purity as in Example 1 was mixed with 99.5 purity.
% Of ethanol was mixed to obtain a cleaning liquid having an azeotropic composition, and this cleaning liquid was sealed in a spray can container together with carbon dioxide gas in the same manner as in Example 1 to obtain a cleaning spray apparatus. The spray nozzle of the spray can was replaced with a spray nozzle that sprays at a spot. After spraying only the soldered portion of the electric board, the flux was washed by wiping with a wiper. After that, the same cleaning liquid was spouted out and rinsed. When this portion was observed with a microscope, no flux residue was observed, and good cleaning results were obtained.
【００１０】[0010]
【実施例３】オクタメチルシクロテトラシロキサンより
も高沸点成分をガスクロマトグラフが検出できない純度
となるまでオクタメチルトリシロキサンを蒸留精製し
た。このオクタメチルトリシロキサン８０重量部と純度
９９．５％エタノール２０重量部を混合して洗浄液を
得、実施例１と同様に炭酸ガスと共にスプレー容器内に
充填して洗浄スプレー装置を作製した。そしてソルダー
ペーストが付着している印刷マスクに洗浄液を噴霧した
後、ワイパーで拭き取ることにより洗浄を行った。この
洗浄後に、目視観察を行ったところ残留しているソルダ
ーペーストはなく、良好な洗浄結果が得られた。Example 3 Octamethyltrisiloxane was purified by distillation until a component having a higher boiling point than octamethylcyclotetrasiloxane could not be detected by gas chromatography. 80 parts by weight of this octamethyltrisiloxane and 20 parts by weight of ethanol having a purity of 99.5% were mixed to obtain a cleaning solution, and the cleaning solution was filled in a spray container together with carbon dioxide gas in the same manner as in Example 1 to produce a cleaning spray device. After the cleaning liquid was sprayed on the print mask to which the solder paste was attached, cleaning was performed by wiping with a wiper. After this cleaning, visual observation revealed that there was no residual solder paste and good cleaning results were obtained.
【００１１】次に、オクタメチルトリシロキサンに代え
てオクタメチルシクロテトラシロキサンを用いて、同様
に洗浄液および洗浄スプレー装置を作成し、洗浄を行っ
たところ、同様の結果が得られた。Next, a cleaning solution and a cleaning spray device were prepared in the same manner using octamethylcyclotetrasiloxane instead of octamethyltrisiloxane, and cleaning was performed. The same results were obtained.
【００１２】[0012]
【発明の効果】以上のとおり、本発明によれば、オゾン
層を破壊することなく、洗浄液成分を残留させずに優れ
た洗浄効果を発揮することができ、１種類の洗浄液で洗
浄とリンスとが可能で速やかに清浄な乾燥面とすること
ができる。As described above, according to the present invention, an excellent cleaning effect can be exerted without destroying the ozone layer and without leaving any cleaning liquid components, and cleaning and rinsing can be performed with one type of cleaning liquid. And a clean dry surface can be obtained quickly.
【表１】 [Table 1]
Claims (2)
ルトリシロキサンまたはオクタメチルシクロテトラシロ
キサンの中から選ばれた少なくとも１種のシロキサンと
低級アルコールとの混合物からなる洗浄液を炭酸ガスを
噴霧用ガスとして被洗浄物に噴霧することを特徴とする
洗浄方法。1. A cleaning solution comprising a mixture of at least one siloxane selected from hexamethyldisiloxane, octamethyltrisiloxane or octamethylcyclotetrasiloxane and a lower alcohol using carbon dioxide as a spray gas. A cleaning method characterized by spraying an object.
ルトリシロキサンまたはオクタメチルシクロテトラシロ
キサンの中から選ばれた少なくとも１種のシロキサンと
低級アルコールとの混合物からなる洗浄液と、噴霧用ガ
スとしての炭酸ガスとを噴射ノズルを具備した密閉可能
な容器内に充填したことを特徴とする洗浄スプレー装
置。2. A cleaning liquid comprising a mixture of at least one siloxane selected from hexamethyldisiloxane, octamethyltrisiloxane or octamethylcyclotetrasiloxane and a lower alcohol, and carbon dioxide gas as a spray gas. Is filled in a sealable container provided with an injection nozzle.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10734593A JP3274737B2 (en) | 1993-04-09 | 1993-04-09 | Cleaning method and cleaning spray device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10734593A JP3274737B2 (en) | 1993-04-09 | 1993-04-09 | Cleaning method and cleaning spray device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH06292868A JPH06292868A (en) | 1994-10-21 |
| JP3274737B2 true JP3274737B2 (en) | 2002-04-15 |
Family
ID=14456703
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10734593A Expired - Fee Related JP3274737B2 (en) | 1993-04-09 | 1993-04-09 | Cleaning method and cleaning spray device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3274737B2 (en) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05318822A (en) * | 1991-08-23 | 1993-12-03 | Fuji Xerox Co Ltd | Image bar and driving method thereof and electronic type printer |
| DE4221949C2 (en) * | 1992-07-02 | 1996-07-25 | Siemens Ag | Optical print head |
| US5478493A (en) * | 1994-06-15 | 1995-12-26 | Dow Corning Corporation | Hexamethyldisiloxane containing azeotropes |
| US5454970A (en) * | 1994-08-11 | 1995-10-03 | Dow Corning Corporation | Octamethyltrisiloxane containing azeotropes |
| US5456856A (en) * | 1995-01-18 | 1995-10-10 | Dow Corning Corporation | Azeotrope and azeotrope-like compositions of octamethyltrisiloxane |
| US5501811A (en) * | 1995-04-24 | 1996-03-26 | Dow Corning Corporation | Azeotropes of octamethyltrisiloxane and aliphatic or alicyclic alcohols |
| DE102006025994B3 (en) * | 2006-06-02 | 2008-01-03 | Sprügel, Friedrich A. | Cleaning fluid with reduced flammability |
| DE102011119374A1 (en) | 2011-11-25 | 2013-05-29 | Heraeus Quarzglas Gmbh & Co. Kg | Process for the production of synthetic quartz glass |
| DE102011119339A1 (en) | 2011-11-25 | 2013-05-29 | Heraeus Quarzglas Gmbh & Co. Kg | Sputtering process for the production of synthetic quartz glass |
| DE102011119341A1 (en) | 2011-11-25 | 2013-05-29 | Heraeus Quarzglas Gmbh & Co. Kg | Process for the production of synthetic quartz glass using the soot method |
| DE102011119373A1 (en) | 2011-11-25 | 2013-05-29 | Heraeus Quarzglas Gmbh & Co. Kg | Process for the production of synthetic quartz glass |
-
1993
- 1993-04-09 JP JP10734593A patent/JP3274737B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH06292868A (en) | 1994-10-21 |
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