JP3254697B2 - Indium oxide powder and method for producing the same - Google Patents

Indium oxide powder and method for producing the same

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Publication number
JP3254697B2
JP3254697B2 JP24642691A JP24642691A JP3254697B2 JP 3254697 B2 JP3254697 B2 JP 3254697B2 JP 24642691 A JP24642691 A JP 24642691A JP 24642691 A JP24642691 A JP 24642691A JP 3254697 B2 JP3254697 B2 JP 3254697B2
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JP
Japan
Prior art keywords
indium
powder
sulfuric acid
hydroxide
oxide powder
Prior art date
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JP24642691A
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Japanese (ja)
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JPH0558627A (en
Inventor
公貴 隈
展弘 小川
隆 毛利
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Tosoh Corp
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Tosoh Corp
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Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、酸化インジウム粉末及
びその製造方法に関するものである。更に詳しくは、高
度に配向した(222)結晶配向をもつ板状の酸化イン
ジウム粉末及びその製造方法に関する。
The present invention relates to an indium oxide powder and a method for producing the same. More specifically, the present invention relates to a plate-like indium oxide powder having a highly oriented (222) crystal orientation and a method for producing the same.

【0002】本発明の板状酸化インジウム粉末を焼結体
原料として用いることにより、結晶配向焼結体の製造が
可能である。また、キャリア電子を与える錫等を固溶さ
せて導電性粉末を製造することにより、導電フィラ−等
への応用が可能である。
By using the plate-like indium oxide powder of the present invention as a raw material for a sintered body, it is possible to produce a crystal oriented sintered body. Further, by producing a conductive powder by dissolving tin or the like that gives carrier electrons, the present invention can be applied to a conductive filler or the like.

【0003】[0003]

【従来の技術】機能性セラミックス(焼結体)は、酸化
物粉末を成型、焼結して製造される。焼結体の特性は、
用いる酸化物粉末の特性に起因することが多く、例えば
導電性等の電気的特性、破壊強度等の機械的特性、緻密
性、結晶配向等の焼結体特性は、用いる酸化物粉末の形
状、粒径、分散性、結晶配向等の特性に大きく依存して
変化する。
2. Description of the Related Art Functional ceramics (sintered bodies) are manufactured by molding and sintering oxide powder. The characteristics of the sintered body
Often attributed to the properties of the oxide powder used, for example, electrical properties such as conductivity, mechanical properties such as breaking strength, denseness, sintered body properties such as crystal orientation, the shape of the oxide powder used, It changes greatly depending on characteristics such as particle size, dispersibility, and crystal orientation.

【0004】例えば、結晶配向焼結体は、粉末形状に異
方性を持つ結晶配向粉末を用いることにより、加圧成型
時に粉末を整列させ、粉末が整列した成型体を焼結する
ことによって製造可能である。
For example, a crystallographically oriented sintered body is manufactured by using a crystallographically oriented powder having anisotropic powder shape, aligning the powder during pressure molding, and sintering the molded body with the powder aligned. It is possible.

【0005】従来、酸化インジウム粉末の製造は、イン
ジウム金属等のインジウム源を硝酸、硫酸、塩酸等の酸
で溶解させ、アルカリ等の沈殿剤を添加して水酸化イン
ジウムを形成後、仮焼する方法で行われている。このよ
うにして製造された酸化インジウム粉末は、X線回折パ
タ−ンにおいて、(222)面回折強度/(400)面
回折強度の比はほぼ3であり、粉末形状に異方性はなか
った。
Conventionally, in the production of indium oxide powder, an indium source such as indium metal is dissolved with an acid such as nitric acid, sulfuric acid or hydrochloric acid, a precipitant such as an alkali is added to form indium hydroxide, and then calcined. Is done in a way. In the thus produced indium oxide powder, the ratio of (222) plane diffraction intensity / (400) plane diffraction intensity in the X-ray diffraction pattern was almost 3, and the powder shape did not have anisotropy. .

【0006】[0006]

【発明が解決しようとする課題】本発明の目的は、高度
に配向した(222)結晶配向酸化インジウム粉末及び
それを簡単な方法かつ容易に製造し得る方法を提供する
ことにある。
SUMMARY OF THE INVENTION It is an object of the present invention to provide a highly oriented (222) crystallized indium oxide powder and a method for producing it in a simple and easy manner.

【0007】[0007]

【課題を解決するための手段】本発明者等は、上述のよ
うな酸化インジウム粉末及びその製造方法に関して鋭意
検討を重ねた結果、硫酸イオン/インジウム(モル比)
が1.5から10であるインジウムの硫酸水溶液を濃縮
した後、過剰の硫酸を添加して得られる板状含硫酸水酸
化インジウムをろ過、乾燥後、仮焼することによって、
X線回折による(222)面回折強度/(400)面回
折強度比が5以上であり、平均粒径が0.1μm〜10
0μm、粉末形状が板状の酸化インジウム粉末を得られ
ることを見出し、本発明を完成するに至った。
The present inventors have made intensive studies on the above-mentioned indium oxide powder and the method for producing the same, and as a result, have found that sulfate ion / indium (molar ratio).
After concentrating the aqueous solution of indium sulfuric acid having a value of 1.5 to 10, the plate-like indium sulfate hydroxide obtained by adding excess sulfuric acid is filtered, dried, and calcined,
The ratio of (222) plane diffraction intensity / (400) plane diffraction intensity by X-ray diffraction is 5 or more, and the average particle size is 0.1 μm to 10 μm.
It has been found that a powder of indium oxide having a plate shape of 0 μm can be obtained, and the present invention has been completed.

【0008】以下、本発明を詳細に説明する。Hereinafter, the present invention will be described in detail.

【0009】本発明の酸化インジウム粉末は、X線回折
による(222)面回折強度/(400)面回折強度比
が5以上であり、0.1μm〜100μmの平均粒径を
もち、かつ、板状の形状を示すものである。(222)
面の回折は2Θ=30度付近に、(400)面の回折は
2Θ=35度付近に現れる。
The indium oxide powder of the present invention has a ratio of (222) plane diffraction intensity / (400) plane diffraction intensity by X-ray diffraction of 5 or more, has an average particle size of 0.1 μm to 100 μm, and has a plate shape. FIG. (222)
The diffraction of the plane appears around 2Θ = 30 degrees, and the diffraction of the (400) plane appears around 2Θ = 35 degrees.

【0010】本発明でいう回折強度比とは、酸化インジ
ウム粉末のX線回折パタ−ンにおいて、(222)面の
回折ピ−クの積分強度と(400)面の回折ピ−クの積
分強度の比のことである。
The diffraction intensity ratio referred to in the present invention means the integrated intensity of the diffraction peak on the (222) plane and the integrated intensity of the diffraction peak on the (400) plane in the X-ray diffraction pattern of indium oxide powder. Is the ratio of

【0011】本発明の粉末の回折強度比は、(222)
面回折強度/(400)面回折強度比が5以上で、特に
好ましくは10以上である。これは、従来の酸化インジ
ウム粉末の回折強度比の3よりも大きく、より(22
2)面に強く配向を示す新規な粉末である。
The diffraction intensity ratio of the powder of the present invention is (222)
The ratio of the plane diffraction intensity / (400) plane diffraction intensity is 5 or more, particularly preferably 10 or more. This is larger than the diffraction intensity ratio of 3 of the conventional indium oxide powder,
2) It is a new powder that shows a strong orientation on the surface.

【0012】本発明の粉末の平均粒径は0.1μm〜1
00μmである。粉末粒径が0.1μm未満の場合、粉
末は凝集し(222)結晶配向酸化インジウム粉末が得
られないために好ましくない。また、粉末粒径が100
μmを越えるものは、粉末の分散性が悪くなるなるため
に好ましくない。
The average particle size of the powder of the present invention is 0.1 μm to 1 μm.
00 μm. When the particle size of the powder is less than 0.1 μm, the powder is not preferable because the powder is agglomerated and the (222) crystal oriented indium oxide powder cannot be obtained. Further, when the powder particle size is 100
A particle size exceeding μm is not preferred because the dispersibility of the powder becomes poor.

【0013】次に、本発明の酸化インジウム粉末の製造
方法について説明する。
Next, a method for producing the indium oxide powder of the present invention will be described.

【0014】本発明の酸化インジウム粉末は、例えば含
硫酸水酸化インジウム([H][In(HO)
(SO])を用いて製造することが可能であ
る。含硫酸水酸化インジウムはC軸方向に層を形成し、
C軸配向、特に(002)結晶配向を示す層状化合物
で、板状の粉末形状を示す。すなわち、このC軸配向性
板状含硫酸水酸化インジウムを熱分解して酸化インジウ
ムを製造することにより、酸化インジウムの(400)
面方向の結晶成長を抑制し、従来粉末よりもより(22
2)面の結晶配向に富む板状酸化インジウム粉末の製造
が可能となり、又、板状の粉末を用いることにより、熱
分解後も板状を維持することを可能にする。
The indium oxide powder of the present invention may be, for example, an indium sulfate hydroxide ([H 5 O 2 ] [In (H 2 O)
2 (SO 4 ) 2 ]). Indium hydroxide hydroxide containing sulfur forms a layer in the C-axis direction,
A layered compound exhibiting C-axis orientation, especially (002) crystal orientation, and exhibiting a plate-like powder shape. That is, the C-axis-oriented plate-like indium sulfate hydroxide is thermally decomposed to produce indium oxide.
The crystal growth in the in-plane direction is suppressed, and the
2) It is possible to produce a plate-like indium oxide powder rich in the crystal orientation of the plane, and by using the plate-like powder, it is possible to maintain the plate-like shape even after thermal decomposition.

【0015】含硫酸水酸化インジウム粉末の製造方法に
ついて説明する。
A method for producing the indium sulfate hydroxide-containing powder will be described.

【0016】含硫酸水酸化インジウム粉末は、硫酸イオ
ン/インジウム(モル比)が1.5から10であるイン
ジウムの硫酸水溶液を濃縮した後、過剰の硫酸を添加
し、ろ過、乾燥して得られる。
Sulfur-containing indium hydroxide powder is obtained by concentrating an aqueous solution of indium sulfuric acid having a sulfate ion / indium (molar ratio) of 1.5 to 10, adding excess sulfuric acid, filtering and drying. .

【0017】含硫酸水酸化インジウム粉末は、インジウ
ムと硫酸インジウムの溶液を濃縮することによって製造
可能であるが(Acta Crystallogr.,
Sec.B.,35,1580(1979))、インジ
ウムの硫酸水溶液中の硫酸イオンとインジウムの組成を
含硫酸水酸化インジウムの量論比とした溶液を濃縮して
も含硫酸水酸化インジウムが晶析するまでに多くの時間
を要する。しかし、インジウムの硫酸水溶液を濃縮後、
過剰の硫酸を添加すると硫酸の添加と同時に含硫酸水酸
化インジウムが晶析し、晶析時間を大幅に短縮できるこ
とを見出した。インジウムの硫酸水溶液の濃縮後、過剰
の硫酸を添加することが本発明の特徴である。
The indium sulfate hydroxide containing powder can be produced by concentrating a solution of indium and indium sulfate (Acta Crystallogr.,
Sec. B. , 35, 1580 (1979)). Even if the solution in which the composition of the sulfate ion and the indium in the aqueous solution of indium sulfate was adjusted to the stoichiometric ratio of the indium sulfate hydroxide was concentrated, the indium sulfate hydroxide was crystallized. Takes a lot of time. However, after concentrating the aqueous solution of indium sulfuric acid,
It has been found that when an excessive amount of sulfuric acid is added, indium hydroxide sulfate containing water is crystallized simultaneously with the addition of sulfuric acid, and the crystallization time can be greatly reduced. It is a feature of the present invention that after the aqueous solution of indium sulfuric acid is concentrated, excess sulfuric acid is added.

【0018】更に詳しく含硫酸水酸化インジウム粉末の
製造方法を説明する。
The method for producing the indium sulfate hydroxide-containing powder will be described in more detail.

【0019】インジウムの硫酸水溶液の硫酸イオン/イ
ンジウム(モル比)は、1.5から10であることが好
ましく、特に好ましくは2以上8以下である。硫酸イオ
ン/インジウム(モル比)が1.5よりも小さいとイン
ジウムは硫酸に全て溶けないために好ましくない。ま
た、硫酸イオン/インジウム(モル比)が10を越えて
硫酸が多く存在しても何ら効果は表れず、経済的に好ま
しくない。
The sulfate ion / indium (molar ratio) of the aqueous solution of indium in sulfuric acid is preferably 1.5 to 10, particularly preferably 2 or more and 8 or less. If the ratio of sulfate ion / indium (molar ratio) is smaller than 1.5, indium is not preferable because it is not completely soluble in sulfuric acid. Further, even if the ratio of sulfate ion / indium (molar ratio) exceeds 10 and a large amount of sulfuric acid is present, no effect is exhibited, which is not economically preferable.

【0020】インジウムの硫酸水溶液を製造する際に用
いるインジウム源としては、溶液中に硫酸イオン以外の
負イオンを共存させないものであれば特に限定されるこ
となく用いることができ、インジウム金属、酸化インジ
ウム、水酸化インジウム、硫酸インジウム等が適応可能
である。また、硫酸源としては、特に限定させることな
く用いることができ、硫酸インジウム、濃硫酸等を用い
ればよい。
The source of indium used for producing the aqueous solution of indium sulfuric acid is not particularly limited as long as it does not contain any negative ions other than sulfate ions in the solution. Indium metal, indium oxide and the like can be used. , Indium hydroxide, indium sulfate and the like are applicable. The source of sulfuric acid can be used without any particular limitation, and indium sulfate, concentrated sulfuric acid and the like may be used.

【0021】インジウムの硫酸水溶液の製造は、上述の
インジウム源と硫酸源を混合して行われる。混合方法は
特に限定されず、インジウム源に硫酸源を加えても、硫
酸源にインジウム源を加えてもよい。また、必要に応じ
て蒸留水の共存下で混合を行ってもよい。
The production of an aqueous solution of indium sulfuric acid is carried out by mixing the above-mentioned indium source and sulfuric acid source. The mixing method is not particularly limited, and a sulfuric acid source may be added to the indium source, or an indium source may be added to the sulfuric acid source. Further, if necessary, the mixing may be carried out in the presence of distilled water.

【0022】混合時の温度は特に限定されず室温等で行
えばよい。また、インジウム源の溶解を速めるために加
温中で行ってもよい。
The temperature at the time of mixing is not particularly limited and may be at room temperature or the like. In addition, the heating may be performed while heating to accelerate the dissolution of the indium source.

【0023】また、必要に応じて撹拌しながら混合して
もよい。この際、撹拌速度は特に限定されない。
Further, if necessary, mixing may be carried out with stirring. At this time, the stirring speed is not particularly limited.

【0024】次に、インジウム硫酸水溶液を濃縮する。
濃縮とは溶液中の水分を蒸発させることをいう。濃縮方
法としては、エバポレ−タを用いて減圧中で行なう方
法、常圧中で加熱して行なう方法等が挙げられるが、常
圧中で加熱して行なう場合、液温が120℃を越えると
含硫酸水酸化インジウムは白煙を上げて分解するため好
ましくない。
Next, the indium sulfate aqueous solution is concentrated.
Concentration refers to evaporating the water in the solution. Examples of the concentration method include a method of performing the treatment under reduced pressure using an evaporator, and a method of performing the treatment by heating under normal pressure. Indium hydroxide hydroxide containing sulfuric acid is not preferable because it emits white smoke and decomposes.

【0025】含硫酸水酸化インジウムの晶析時間を短縮
するため、濃縮後、過剰の硫酸を添加する。硫酸の添加
量は、仕込みのインジウムのモル数に対して0.1−1
00倍量で、特に好ましくは1−10倍量である。硫酸
の添加量が0.1倍量よりも少ない場合、含硫酸水酸化
インジウムの晶析時間を短縮するという効果が表われな
いために好ましくない。また、100倍量を越える量の
硫酸を添加しても含硫酸水酸化インジウムの晶析時間の
短縮の効果は飽和し、経済的にも好ましくない。
To reduce the crystallization time of the indium sulfate hydroxide, after concentration, excess sulfuric acid is added. The amount of sulfuric acid added was 0.1-1 based on the number of moles of indium charged.
The amount is 00 times, particularly preferably 1-10 times. If the amount of sulfuric acid is less than 0.1 times the amount, the effect of shortening the crystallization time of indium sulfate hydroxide is not exhibited. Further, even if sulfuric acid is added in an amount exceeding 100 times the amount, the effect of shortening the crystallization time of indium sulfate hydroxide is saturated, which is not economically preferable.

【0026】得られた含硫酸水酸化インジウムは過剰の
硫酸と分離した後、必要に応じて洗浄を行なってもよ
い。洗浄に用いる溶媒は、含硫酸水酸化インジウムが水
に可溶であるため、不溶性のアセトン、エタノ−ル、メ
タノ−ル、ジメチルスルホキシド等の有機溶媒で行えば
よい。
After the obtained indium sulfate-containing indium hydroxide is separated from excess sulfuric acid, washing may be carried out if necessary. The solvent used for washing may be an organic solvent such as insoluble acetone, ethanol, methanol, dimethyl sulfoxide, etc. since indium sulfate hydroxide is soluble in water.

【0027】次に、粉末の乾燥を行なうが、乾燥温度は
150℃以下で、特に好ましくは120℃以下である。
150℃を越える温度で乾燥を行なうと含硫酸水酸化イ
ンジウム中の結晶水が脱離し、一部分解を起こすために
好ましくない。
Next, the powder is dried. The drying temperature is 150 ° C. or lower, particularly preferably 120 ° C. or lower.
Drying at a temperature exceeding 150 ° C. is not preferable because water of crystallization in indium sulfate hydroxide is eliminated and partial decomposition occurs.

【0028】上述の方法により含硫酸水酸化インジウム
粉末が得られ、次に、本発明の酸化インジウム粉末の製
造方法について説明する。
The indium hydroxide sulfate-containing powder is obtained by the above-mentioned method. Next, the method for producing the indium oxide powder of the present invention will be described.

【0029】本発明の酸化インジウム粉末は含硫酸水酸
化インジウム粉末を仮焼して製造する。仮焼温度は20
0℃〜700℃で、特に好ましくは300℃〜600℃
の範囲である。仮焼温度が200℃よりも低いと、含硫
酸水酸化インジウムの熱分解は不十分であり、また70
0℃を越える温度では、酸化インジウムの結晶成長が進
み、本発明の粉末の結晶配向、すなわち(222)面回
折強度/(400)面回折強度比が5以上である粉末が
得られない場合がある。
The indium oxide powder of the present invention is produced by calcining indium sulfate hydroxide-containing powder. Calcination temperature is 20
0 ° C to 700 ° C, particularly preferably 300 ° C to 600 ° C
Range. If the calcination temperature is lower than 200 ° C., the thermal decomposition of indium sulfate hydroxide is insufficient, and
At a temperature exceeding 0 ° C., crystal growth of indium oxide proceeds, and a powder having a crystal orientation of the powder of the present invention, that is, a powder having a (222) plane diffraction intensity / (400) plane diffraction intensity ratio of 5 or more may not be obtained. is there.

【0030】上述仮焼時間は30分〜10時間で、特に
好ましくは1時間〜5時間である。仮焼時間が30分未
満の場合、含硫酸水酸化インジウムの分解は不十分であ
り、また、必要以上に長くしても粉末の粒径、結晶配向
性等は変化せず、経済的に好ましくない。
The calcination time is 30 minutes to 10 hours, particularly preferably 1 hour to 5 hours. If the calcination time is less than 30 minutes, the decomposition of indium sulfate hydroxide containing water is insufficient, and even if it is longer than necessary, the particle size of the powder, the crystal orientation, etc. do not change, and it is economically preferable. Absent.

【0031】仮焼時の雰囲気は特に限定されず、大気中
等で行えばよい。
The atmosphere during calcination is not particularly limited, and may be performed in the air or the like.

【0032】[0032]

【実施例】以下、実施例により本発明を更に具体的に説
明するが、本発明はこれに限定されるものではない。
EXAMPLES The present invention will be described in more detail with reference to the following Examples, but it should not be construed that the present invention is limited thereto.

【0033】実施例1 硫酸インジウム9水和物9.51gを100mlの蒸留
水に溶かし、97%の濃硫酸1.49gを加え、硫酸/
インジウムのモル比が2のインジウム硫酸水溶液を製造
した。インジウムの硫酸水溶液をエバポレ−タで減圧蒸
発させた後、インジウムの硫酸溶液にインジウムのモル
数に対して3倍量の濃硫酸を過剰に添加したところ、硫
酸添加と共に含硫酸水酸化インジウムは晶析した。得ら
れた晶析物をろ過した後、エタノ−ルで洗浄し、含硫酸
水酸化インジウム粉末を得た。
Example 1 9.51 g of indium sulfate nonahydrate was dissolved in 100 ml of distilled water, and 1.49 g of 97% concentrated sulfuric acid was added.
An indium sulfate aqueous solution having an indium molar ratio of 2 was produced. After evaporating the aqueous solution of indium sulfuric acid under reduced pressure using an evaporator, an excessive amount of concentrated sulfuric acid three times the number of moles of indium was added to the solution of indium sulfuric acid. Was analyzed. The obtained crystallized product was filtered and washed with ethanol to obtain a powder of indium sulfate hydroxide.

【0034】含硫酸水酸化インジウム粉末の粉末X線回
折スペクトル及びその結晶構造を示す図をそれぞれ図1
及び図2に示す。
FIG. 1 shows the powder X-ray diffraction spectrum and the crystal structure of the indium sulfate hydroxide-containing powder.
And FIG.

【0035】上述の方法で得られた含硫酸水酸化インジ
ウムを大気中、300℃で仮焼し酸化インジウム粉末を
得た。
The indium hydroxide hydroxide containing sulfur obtained by the above method was calcined at 300 ° C. in the air to obtain indium oxide powder.

【0036】得られた酸化インジウム粉末の粉末X線回
折スペクトル及びその結晶構造を示す図をそれぞれ図3
及び図4に示す。粉末形状は板状、平均粒径は50μm
であり、(222)面回折強度/(400)面回折強度
比が19で(222)結晶配向性に富む粉末が得られ
た。
FIG. 3 shows the powder X-ray diffraction spectrum and the crystal structure of the obtained indium oxide powder, respectively.
And FIG. Powder shape is plate, average particle size is 50μm
A powder having a (222) plane diffraction intensity / (400) plane diffraction intensity ratio of 19 and having a high (222) crystal orientation was obtained.

【0037】実施例2 水酸化インジウム165.8gを300mlの蒸留水に
加え、撹拌して水酸化インジウムスラリ−を調製し、こ
のスラリ−に97%濃硫酸を202.1g添加し、硫酸
/インジウムのモル比が2のインジウムの硫酸水溶液を
得た。得られた水溶液を実施例1と同様の方法で減圧蒸
発し、更にインジウムのモル数に対して2倍量の硫酸を
添加し含硫酸水酸化インジウムを晶析させた。得られた
晶析物を実施例1と同様の方法で洗浄し含硫酸水酸化イ
ンジウムを得た。
Example 2 165.8 g of indium hydroxide was added to 300 ml of distilled water and stirred to prepare an indium hydroxide slurry, and 202.1 g of 97% concentrated sulfuric acid was added to the slurry, and sulfuric acid / indium was added. Was obtained at a molar ratio of 2. The obtained aqueous solution was evaporated under reduced pressure in the same manner as in Example 1, and sulfuric acid in an amount twice as much as the mole number of indium was added to crystallize indium sulfate hydroxide. The obtained crystallization product was washed in the same manner as in Example 1 to obtain indium sulfate hydroxide.

【0038】上述の方法で得られた含硫酸水酸化インジ
ウムを大気中、500℃で仮焼し酸化インジウム粉末を
得た。
The indium hydroxide hydroxide containing sulfur obtained by the above method was calcined at 500 ° C. in the air to obtain indium oxide powder.

【0039】得られた酸化インジウム粉末の粉末X線回
折スペクトルを図5に示したが、(222)面回折強度
/(400)面回折強度比が5.5であり、(222)
結晶配向性に富む粉末が得られた。平均粒径は70μm
であった。
FIG. 5 shows the powder X-ray diffraction spectrum of the obtained indium oxide powder. The ratio of (222) plane diffraction intensity / (400) plane diffraction intensity was 5.5, and (222)
A powder having a high crystal orientation was obtained. Average particle size is 70 μm
Met.

【0040】実施例3 インジウム金属229.8gを97%の濃硫酸500g
で溶解させて、硫酸/インジウムのモル比が2.5のイ
ンジウムの硫酸溶液を製造した。この溶液を実施例1と
同様の方法で減圧蒸発した後、インジウムのモル数に対
して10倍量の濃硫酸を添加して含硫酸水酸化インジウ
ムを晶析させた。得られた晶析物を実施例1と同様の方
法で洗浄し含硫酸水酸化インジウムを得た。
Example 3 229.8 g of indium metal was added to 500 g of 97% concentrated sulfuric acid.
To produce an indium sulfuric acid solution having a sulfuric acid / indium molar ratio of 2.5. After evaporating this solution under reduced pressure in the same manner as in Example 1, 10 times the amount of concentrated sulfuric acid with respect to the mole number of indium was added to crystallize indium sulfate hydroxide. The obtained crystallization product was washed in the same manner as in Example 1 to obtain indium sulfate hydroxide.

【0041】上述の方法で得られた含硫酸水酸化インジ
ウムを、実施例2と同様の方法で仮焼し、酸化インジウ
ム粉末を得た。
The indium hydroxide hydroxide containing sulfur obtained by the above method was calcined in the same manner as in Example 2 to obtain an indium oxide powder.

【0042】得られた酸化インジウム粉末の(222)
面回折強度/(400)面回折強度比が5.6であり、
(222)結晶配向性に富む粉末が得られた。平均粒径
は、65μmであった。
The resulting indium oxide powder (222)
The ratio of plane diffraction intensity / (400) plane diffraction intensity is 5.6,
(222) A powder having a high crystal orientation was obtained. The average particle size was 65 μm.

【0043】比較例1 市販の硫酸インジウムを900℃の温度で加熱し、酸化
インジウムを得た。得られた粉末のXRDパタ−ンを図
4に示したが、(222)面回折強度/(400)面回
折強度比は3.2で従来の酸化インジウムの結晶配向比
と同じであった。
Comparative Example 1 Commercially available indium sulfate was heated at a temperature of 900 ° C. to obtain indium oxide. FIG. 4 shows the XRD pattern of the obtained powder. The ratio of (222) plane diffraction intensity / (400) plane diffraction intensity was 3.2, which was the same as the crystal orientation ratio of the conventional indium oxide.

【0044】[0044]

【発明の効果】本発明の酸化インジウム粉末は、(22
2)面の結晶配向性に富み、この粉末を用いることによ
って、結晶配向を制御した焼結体の製造が可能である。
また、本発明の粉末に錫等のド−パントを固溶させるこ
とより導電性粉末を製造し、導電フィラ−等への応用も
可能である。
As described above, the indium oxide powder of the present invention comprises (22)
2) The crystal orientation of the surface is rich, and by using this powder, it is possible to produce a sintered body with controlled crystal orientation.
Further, a conductive powder is produced by dissolving a dopant such as tin in the powder of the present invention, and application to a conductive filler or the like is also possible.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 実施例1で得られた含硫酸水酸化インジウム
粉末の粉末X線回折スペクトルを示す図である。
FIG. 1 is a diagram showing a powder X-ray diffraction spectrum of the indium sulfate hydroxide powder obtained in Example 1.

【図2】 実施例1で得られた含硫酸水酸化インジウム
粉末の結晶構造を示す図である。
FIG. 2 is a view showing the crystal structure of the indium sulfate hydroxide-containing powder obtained in Example 1.

【図3】 実施例1で得られた酸化インジウム粉末の粉
末X線回折スペクトルを示す図である。
FIG. 3 is a view showing a powder X-ray diffraction spectrum of the indium oxide powder obtained in Example 1.

【図4】 実施例1で得られた酸化インジウム粉末の結
晶構造を示す図である。
FIG. 4 is a view showing a crystal structure of the indium oxide powder obtained in Example 1.

【図5】 実施例2で得られた酸化インジウム粉末の粉
末X線回折スペクトルを示す図である。
FIG. 5 is a view showing a powder X-ray diffraction spectrum of the indium oxide powder obtained in Example 2.

───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.7,DB名) C01G 15/00 CA(STN)──────────────────────────────────────────────────続 き Continued on front page (58) Field surveyed (Int. Cl. 7 , DB name) C01G 15/00 CA (STN)

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 X線回折による(222)面回折強度/
(400)面回折強度比が5以上であり、平均粒径が
0.1μm〜100μm、粉末形状が板状である酸化イ
ンジウム粉末。
1. The (222) plane diffraction intensity by X-ray diffraction /
(400) An indium oxide powder having a plane diffraction intensity ratio of 5 or more, an average particle size of 0.1 μm to 100 μm, and a powder shape of a plate.
【請求項2】 硫酸イオン/インジウム(モル比)が
1.5から10であるインジウムの硫酸水溶液を濃縮し
た後、過剰の硫酸を添加して得られる板状含硫酸水酸化
インジウムをろ過、乾燥後、仮焼することを特徴とす
る、X線回折による(222)面回折強度/(400)
面回折強度比が5以上であり、平均粒径が0.1μm〜
100μm、粉末形状が板状である酸化インジウム粉末
の製造方法。
2. An indium sulfuric acid aqueous solution having a sulfate ion / indium (molar ratio) of 1.5 to 10 is concentrated, and an excess of sulfuric acid is added to obtain a plate-like indium sulfate-containing indium hydroxide, which is filtered and dried. Then, calcined, characterized by (222) plane diffraction intensity / (400) by X-ray diffraction.
The plane diffraction intensity ratio is 5 or more, and the average particle size is 0.1 μm or more.
A method for producing an indium oxide powder having a plate shape of 100 μm.
JP24642691A 1991-09-02 1991-09-02 Indium oxide powder and method for producing the same Expired - Fee Related JP3254697B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
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Application Number Priority Date Filing Date Title
JP24642691A JP3254697B2 (en) 1991-09-02 1991-09-02 Indium oxide powder and method for producing the same

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JP3254697B2 true JP3254697B2 (en) 2002-02-12

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006306670A (en) * 2005-04-28 2006-11-09 Mitsui Mining & Smelting Co Ltd Indium oxide powder

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2398561B (en) * 2001-11-16 2005-11-09 Hitachi Maxell Tin-containing indium oxide particles, method for producing the same and electrically conductive sheet comprising the same
GB0411945D0 (en) * 2004-05-28 2004-06-30 Ici Plc Mixed metal oxides
JP5786994B1 (en) * 2014-03-11 2015-09-30 住友金属鉱山株式会社 Indium hydroxide powder and indium oxide powder
CN111362298B (en) * 2020-03-06 2022-11-22 郑州大学 Preparation method of indium oxide spherical powder with controllable particle shape

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006306670A (en) * 2005-04-28 2006-11-09 Mitsui Mining & Smelting Co Ltd Indium oxide powder

Also Published As

Publication number Publication date
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