JP3249730B2 - Manufacturing method of lighting reflector - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a reflector for lighting equipment, and more particularly to a reflector for lighting used for a device requiring a high reflectance.
The present invention relates to a method for manufacturing a mirror .

[0002]

2. Description of the Related Art Among various lighting fixtures, lighting fixtures using high-intensity lamps such as outdoor sports lighting, plaza lighting, road lighting, and factory lighting, and lighting requiring high efficiency such as spotlights and downlights. In equipment, high reflection performance of a reflector is required. Further, heat resistance to the radiation heat of the lamp and durability from the use environment are required. For this purpose, as a general configuration, as shown in FIG. 21, a base layer 1 made of a resin for applying smoothness is applied to a base material 1 formed into a predetermined shape and baked. The glittering metal film 3 is formed to increase the reflectance, and then the transparent protective film 4 is formed on the glittering metal film 4 to improve durability. The underlayer 2 is formed from a monomer or polymer such as vinyltrimethoxysilane by a dry method such as a vacuum evaporation polymerization method. The bright metal film 3 is made of Al,
Ag, Cr, Ni, etc. The protective film 4 is made of SiO ₂ , Ti
O ₂ , Al ₂ O _{3 and the} like.

[0003]

There are various types of lighting fixtures according to their applications. In recent years, however, the required specifications of high reflection, high heat resistance, and high durability reflectors have been further increased. Therefore, it is desired to reduce the size of the reflecting mirror itself and increase the efficiency. If a high reflectance is required, it is necessary to use a high-brightness, high-output lamp, and to have a shape that efficiently reflects a portion covering the lamp. Therefore, it is necessary to make the surface of the reflection surface smooth and to reduce the diffuse reflection component as much as possible.

Conventionally, lighting equipment which does not require such a high reflectance has been subjected to untreated or simple combined use of chemical polishing, electrolytic polishing or buffing after molding. By itself, a smooth surface having a sufficient specular gloss cannot be obtained.

[0005] Therefore, in a lighting fixture requiring higher reflection, a resin layer is further applied as a base layer 2 on a base material, and smoothness is obtained by utilizing wettability due to the surface tension. I have. However, the resin layer is made of a metal substrate 1 such as Al.
The heat resistance temperature is lower than that of, and it is generally 300 ° C or less even when a high heat-resistant resin is used, which is enough to cope with the temperature rise of the reflector due to the high brightness and high output of lamps and the miniaturization of fixtures. Can not. The resin layer is generally formed by coating,
For example, problems such as loss of smoothness due to dripping or entrapment of foreign matter may occur, or a baking process may be required.
There is also a disadvantage in terms of productivity.

In Japanese Patent Application Laid-Open No. 3-245101,
As a method for forming the resin layer, a dry polymerization film forming method is adopted instead of a general coating method. However, a resin is used as a constitution, and the heat-resistant temperature is determined by the resin layer. Further, when forming the brilliant metal film 3 as a reflection film, it is not possible to stably form the resin layer as the base layer 2, so that a sufficient adhesive force is obtained between the metal layer and the resin layer. Not work, and there is a problem in durability.
In addition, even if the heat resistance temperature of the resin layer itself is sufficient, if a temperature cycle is applied due to a difference in linear expansion coefficient between the metal part and the resin part, cracks may occur in each layer including the protective film 4. is there.

The present invention has been made in view of the above description, and does not require a resin underlayer as a reflecting mirror for the purpose of smoothing, and has a surface smoothness which sufficiently reflects light. The task is to obtain a mirror.

[0008]

Before describing the means for solving the above problems, the surface roughness and the optical mirror gloss will be described. First, the surface shape showing the mirror surface is one of the wavelengths of the light.
/ 8 or less. As a general lighting fixture, it suffices to reflect the wavelength of visible light, and the unevenness of the surface exhibiting the specularity at that time is 0.05 to 0.1 μm. The unevenness is a numerical value when a certain minute range smaller than the wavelength is viewed, and indicates the depth level of the unevenness in the range, and corresponds to the maximum roughness Rmax in surface roughness display.
However, Rmax may be determined by a partially or accidentally present deep scratch or convex portion. Therefore, the maximum roughness Rm
In addition to the indication by ax, it is necessary to show the specular gloss by using together with the center line average roughness Ra indicating the average roughness in the measurement section. According to "Surface polishing and finishing technology compilation" (Nikkei Technical Book / edited by Takaya Takazawa),
As an optical element indicating the gloss, it is stated that the relative gloss representing the ratio between the specular reflection component and the diffuse reflection component has a correlation with Ra, Rmax, etc., and the specular gloss of a mirror-finished reflector is described. It is appropriate to adopt Ra and Rmax as a method of indicating. Ra, Rma indicating surface roughness
Since the value of x falls within the minimum category according to the JIS standard and the shape of the base material is a curved surface due to the characteristics of the reflecting mirror, the cutoff value is 0. 0 in the minimum section so that the influence of the curved surface is minimized.
08 mm.

In order to solve the above problems, a first feature of the present invention is described .
The manufacturing method of the reflecting mirror for lighting is a concave curved surface processing step of forming a base material into a concave curved surface shape, a center line average roughness Ra ≦ 0.03 μm, and a maximum roughness Rmax of an inner surface of the base material. ≤
A primary mirror finishing step of mirror finishing to 0.3 μm (cutoff value: 0.08 mm), and mechanical polishing by abrasive grains and chemical polishing by a reaction solution on the primary mirror finished surface simultaneously and continuously. And a second mirror finishing step to be performed. By performing concave curved surface processing, primary mirror surface processing, and secondary mirror surface processing on the base material, a smooth reflecting mirror having high reflectance can be formed. At this time, the roughness of the inner surface of the base material before entering the second mirror finishing is determined by the center line average roughness Ra ≦
Since 0.03 μm and the maximum roughness Rmax ≦ 0.3 μm, the time for the secondary mirror finishing can be shortened.

In a second aspect of the present invention, there is provided a method of manufacturing a reflecting mirror for illumination, comprising the steps of: forming a concave-curved surface on a substrate, forming a concave surface on the inner surface of the substrate; Ra ≦
A primary mirror finishing step of mirror finishing to 0.03 μm and a maximum roughness Rmax ≦ 0.3 μm, and a mechanical polishing by abrasive grains and a chemical polishing by a reaction liquid on the primary mirror finished surface are simultaneously and continuously performed. The method is characterized by including a secondary mirror finishing step to be performed and a step of forming a glittering metal film and a protective film on the mirror-finished surface. In this case, in addition to the function of the first feature, a reflective mirror having a high reflectance can be obtained by forming the glittering metal film, and the reflectance of the glittering metal film deteriorates by forming the protective film. There can be no reflector. Moreover, by forming the glittering metal film directly on the metal substrate, the adhesion at the interface can be improved, and the durability at the time of temperature rise can be improved.

Further, in the method for manufacturing a lighting reflector according to the third aspect of the present invention, in the first and second aspects, the entire substrate is pressed by pressing the substrate against a surface-finished tool. Simultaneously performing the concave curved surface processing step and the first mirror surface processing step by plastically deforming the base layer into a concave curved shape and plastically deforming the surface layer of the base material to crush the convex portions of the surface layer to fill the concave portions. It is characterized by. In this case, the forming of the concave curved surface shape of the base material and the first mirror finishing can be performed simultaneously, and the productivity can be improved.

[0012] In a fourth aspect of the present invention, there is provided a method of manufacturing an illumination reflecting mirror according to the first or second aspect, wherein the step of performing the secondary mirror surface processing using the abrasive and the reaction liquid immediately before the end of the process. The polishing is performed only with the reaction liquid. In this case, since the attachment of the abrasive grains is removed by a chemical polishing action, the abrasive grains can be effectively removed, and since the polishing is performed at the same time, the mirror gloss can be further improved. In addition, since cleaning after polishing is also performed, the cleaning process can be shortened (for example, only water washing is required).

[0013] In a fifth aspect of the present invention, there is provided a method of manufacturing a reflector for illumination according to the first or second aspect, wherein the second mirror comprises a first processing liquid having abrasive grains and a reaction liquid. And the supply distribution of the first working fluid and the second working fluid is adjusted according to the degree of mirror finishing. In this case, the supply ratio of the first processing liquid having abrasive grains and the second processing liquid composed of the reaction liquid can be controlled by the unevenness of the surface (mirror polishing state), and the effect of mechanical / chemical polishing can be distributed. Can be. for that reason,
Mirror finishing can be performed more efficiently in a short time.

According to a sixth aspect of the present invention, there is provided a method of manufacturing a reflector for illumination according to the first or second aspect, wherein the processing tool for polishing a workpiece is impregnated with abrasive grains or a reaction liquid. It is characterized in that a polishing operation is performed by bringing a processing tool into contact with a workpiece using an elastic body that is easily formed. In this case, mechanical polishing and chemical polishing can be performed efficiently and continuously, the processing time can be shortened, and the mirror finish can be improved.

According to a seventh aspect of the present invention, in the method for manufacturing an illumination reflecting mirror according to the sixth aspect, a contact portion between the working tool and the workpiece is detected by a detecting portion, and the contact pressure is determined according to the contact pressure. To control the working force. In this case, the processing tool can adjust the constant pressure or the applied pressure to the base material as the workpiece, and can adjust the mechanical and chemical processing amount by the shape, the processing speed, the surface unevenness, and the like. .

According to the eighth aspect of the present invention, there is provided a method of manufacturing an illumination reflecting mirror according to the first or second aspect, wherein the workpiece and the processing tool are interposed between abrasive grains and a reaction liquid. The polishing operation is performed by applying an electric field. In this case, chemical polishing can be controlled by applying an electric field.

According to a ninth aspect of the present invention, there is provided a method of manufacturing an illumination reflector according to the first or second aspect, wherein a magnetic substance is put in a reaction solution containing abrasive grains, and the magnetic substance is rotated from the outside. The polishing is performed by applying a magnetic field.
In this case, mechanical polishing can be promoted by moving indirectly by a magnetic field around the base material without using a large tool as a processing tool. By using a magnetic material having a small or small particle size as a tool, a secondary mirror surface processing can be performed on a substrate having a three-dimensional shape such as a reflecting mirror, regardless of the shape.

A method of manufacturing a reflector for illumination, which is a tenth feature of the present invention, is characterized in that, in the first and second features, the same material as the protective film is used as abrasive grains. . Since the same material as the protective film exists as a nucleus on the surface of the base material, the adhesion between the base material and the protective film can be improved through the nucleus when the protective film is formed.

Further, in the method of manufacturing an illumination reflector according to the eleventh aspect of the present invention, in the second aspect, the oxide of the base material is protected by oxidizing the second mirror-finished base material. It is characterized in that it is a film. In this case, the formation of the protective film can be most easily performed, and the adhesion between the base material and the protective film can be improved.

[0020]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS First, the features of an illumination reflector will be described.

As shown in FIG. 1, an example of an illumination reflecting mirror A is formed by forming a substrate 1 of Al or Al alloy into a concave curved surface shape.
The surface on the inner surface side of the substrate 1 having a concave curved surface shape has a surface roughness of
Center line average roughness Ra ≦ 0.02 μm, maximum roughness Rmax
The inner surface has a smooth surface 5 of ≦ 0.15 μm (cutoff value: 0.08 mm), and reflects light from a light source 6 arranged near the center of the inner surface. FIG.
In (b), 7 is the outer surface of the substrate 1. Center line average roughness Ra
Is 0.02 μm or less, preferably 0.005 to
It is 0.01 μm. The maximum roughness Rmax is 0.15
μm or less, but preferably 0.05 to 0.1 μm.

By the way, Al or Al alloy substrate 1
Is generally used as a reflector plate because of its good moldability, but the surface after molding has large irregularities and cannot be used as a high-reflection mirror. Al is subjected to electrolytic polishing or chemical polishing to remove or fill in irregularities, and the surface roughness is 0.05 μm in Ra.
As described above, the Rmax is 0.3 μm or more, and it is hard to say that it is a high-reflection mirror, and the appearance has undulation and roughness. Therefore, in the present invention, the roughness of the surface on the inner surface side of the base material 1 is reduced to a center line average roughness Ra ≦ 0.03 μm and a maximum roughness Rmax ≦
0.3 μm, and then the surface roughness of the inner smooth surface 5 is made to be the center line average roughness Ra ≦ by the secondary mirror finishing in which the mechanical polishing by the abrasive grains and the chemical polishing by the reaction solution are simultaneously and continuously performed.
0.02 μm and the maximum roughness Rmax ≦ 0.15 μm.

As described above, the surface roughness of the inner smooth surface 5 of the concave curved inner surface is determined by determining the center line average roughness Ra ≦ 0.02 μm (preferably 0.005 to 0.01 μm) and the maximum roughness Rmax.
By setting ≦ 0.15 μm (preferably 0.05 to 0.1 μm), a reflective mirror having a glossy appearance and a high specular reflectance with a mirror surface can be obtained. In addition, by using the surface of the Al or Al alloy substrate 1 itself as a reflecting surface, the heat resistance temperature of the reflector can be increased to the recrystallization temperature of Al or the Al alloy. Applications such as use and miniaturization of instruments can be expanded.

In another example of the illumination reflector A, a stainless steel substrate 1 is formed into a concave curved surface, and the inner surface of the concave curved substrate 1 has a surface roughness of the center. Line average roughness R
a ≦ 0.02 μm, maximum roughness Rmax ≦ 0.15 μm
(Cut-off value: 0.08 mm) is used as the inner smooth surface 5, which reflects light from the light source 6 disposed near the center of the inner surface. The center line average roughness Ra is 0.02 μm or less, preferably 0.005 to
It is 0.01 μm. The maximum roughness Rmax is 0.15
μm or less, but preferably 0.05 to 0.1 μm.

As described above, in the case of the reflecting mirror A for illumination using the stainless steel as the base material 1, the inner surface of the base material 1 is centered on the roughness of the inner surface side of the base material 1 by the first mirror processing such as buffing. Line average roughness Ra ≦ 0.03 μm, maximum roughness Rmax ≦
0.3 μm, and then the surface roughness of the inner smooth surface 5 is made to be the center line average roughness Ra ≦ by the secondary mirror finishing in which the mechanical polishing by the abrasive grains and the chemical polishing by the reaction solution are simultaneously and continuously performed.
0.02 μm and the maximum roughness Rmax ≦ 0.15 μm.

As described above, the surface roughness of the inner smooth surface 5 of the concavely curved inner surface of the stainless steel substrate 1 is calculated by calculating the center line average roughness R
a ≦ 0.02 μm (preferably 0.005 to 0.01 μm
m), and the maximum roughness Rmax ≦ 0.15 μm (preferably 0.05 to 0.1 μm) makes the reflective mirror glossy in appearance and having a high specular reflectance.
In addition, it is necessary to select conditions such as composition ratio and tempering for the base material 1 made of stainless steel depending on the formability and the use environment. It is possible to expand applications such as use of high wattage lamps and downsizing of appliances.

In another example, the surface on the inner surface side of the substrate 1 of Al or Al alloy or stainless steel is mirror-finished so that the surface roughness is center line average roughness Ra ≦ 0.02 μm and maximum roughness Rmax. ≦ 0.15 μm (cut-off value: 0.08 m
m), an inner smooth surface 5 is formed, and the inner smooth surface 5 shown in FIG.
The protective film 4 is formed as shown in FIG. The protective film 4 includes SiO ₂ , Al ₂ O ₃ , TiO ₂ , MgF ₂ , Zr
There are inorganic films such as O ₂ and organic films such as acrylic and silicon.

By the way, immediately after the mirror finishing, the inner smooth surface 5 of the substrate 1 is in an active state, so that a stable film is formed with time. However, depending on the environment where the film is placed and the composition of the substrate 1, However, there is a problem in durability because adverse effects such as white turbidity are exerted on the reflection characteristics. However, in the case of the present invention, since the inner smooth surface 5 is covered with the protective film 4, the mirror-finished substrate 1 is formed.
Metallic luster and over a long time can be maintained, it can be the structure of the reflective surface of the simplest structure by a specular gloss surface and the reflecting surface (that do not require other surface treatment.

In another example, the surface on the inner surface side of the substrate 1 of Al or Al alloy or stainless steel is mirror-finished to have a center line average roughness Ra ≦ 0.02 μm and a maximum roughness Rmax. ≦ 0.15 μm (cut-off value: 0.08 m
m), an inner smooth surface 5 is formed, a glittering metal film 3 is formed on the inner smooth surface 5 as shown in FIG. 3, and a protective film 4 is further formed on the glittering metal film 3. This brilliant metal film 4
Al, Ag, Cr, N
There are i, Pd, Pt, Au, etc., but Al or Ag is desirable from the viewpoint of cost and reflectance. Also, the brilliant metal film 3
Is formed by a PVD method such as a vacuum evaporation method. Protective film 4
Include SiO ₂ , Al ₂ O ₃ , TiO ₂ , MgF ₂ , Z
There are inorganic films such as rO ₂ and organic films such as acrylic and silicon.

By forming the brilliant metal film 3 as described above, a high-purity film can be obtained, and a higher reflectance than that of the mirror-finished substrate 1 alone can be obtained. Further, by selecting a material for forming the glittering metal film 3, a reflecting mirror having reflection characteristics in an arbitrary wavelength range can be obtained. P such as vacuum evaporation method
Since the thin film formed by the VD method is formed along the surface of the substrate 1, there is no fear that the specular glossiness in appearance is hindered. Further, by forming the protective film 4, the reflectivity of the glittering metal film 3 does not deteriorate .

Next, an embodiment corresponding to the first feature of the present invention will be described.

As shown in FIG. 4, a concave curved surface processing step of forming the substrate 1 into a concave curved surface shape, a first mirror surface processing step of mirror processing the inner surface of the substrate 1, and a primary mirror surface processing The reflecting mirror A for illumination is manufactured through a secondary mirror finishing step of mirror finishing the formed surface and a protective film forming step. In the concave curved surface processing step and the first mirror surface processing step, the base material 1 is formed into a concave curved surface, and the first mirror surface processing is performed to reduce the surface roughness to a center line average roughness Ra ≦ 0.03 μm and a maximum roughness Rm.
ax ≦ 0.3 μm. The concave curved surface processing step and the primary mirror surface processing step may be performed simultaneously as in the sixth feature or the second embodiment described later, or may be performed separately as in the first embodiment described later (forming into a concave curved surface shape). After that, the first mirror surface is processed by buffing or the like). In the second mirror finishing step, mechanical polishing with abrasive grains and chemical polishing with a reaction solution are simultaneously and continuously performed to obtain mirror gloss. The abrasive grains used at this time include Al ₂ O ₃ , SiO ₂ , MgO, Ce ₂ O
₃ , Cr ₂ O ₃ , Fe ₂ O ₃ , SiC, SnO _2, etc., and the reaction solution is HNO ₃ , H ₂ SO ₄ , H ₃ P
_{O 4, Al (NO 3)} 3 · 9H 2 O, Al 2 (SO 4)
₃ , HFNaOH, alkaline aqueous solution and the like. By performing the secondary mirror finishing in this manner, the surface roughness is such that the center line average roughness Ra ≦ 0.02 μm and the maximum roughness Rmax ≦ 0.
15 μm. The transparent protective film 4 is made of SiO ₂ , A
l ₂ O ₃ , TiO ₂ , MgF ₂ , ZrO ₂ , In ₂ O ₃
And organic films such as acryl and silicon.

By the mechanical polishing alone, even if the abrasive grain size is small, the surface of the abrasive grain remains fine due to the contact locus, and even if the average roughness is small, a large uneven portion is formed. So the maximum roughness is large,
As a result, sufficient specular gloss cannot be obtained. On the other hand, only by chemical polishing, sharp irregularities are rounded, but gentle irregularities remain, the average roughness is not reduced, and as a result, sufficient specular gloss cannot be obtained. Therefore, in the present invention, by performing both the mechanical polishing and the chemical polishing simultaneously and continuously in the secondary mirror finishing, the unevenness can be smoothed as a whole. Further, in the present invention, the surface state before the second mirror finishing step is performed, the center line average roughness Ra ≦ 0.03 μm,
Due to the maximum roughness Rmax ≦ 0.3 μm, the second
It is possible to shorten the time required for the mirror surface glossing in the next mirror processing step (production feasible level), and conversely, it is possible to increase the mirror processing level in short processing. Also, by forming the protective film 4,
The surface of the polished and activated substrate 1 such as Al can be protected from the external environment, and the durability can be improved. In addition, this first
The feature of will be described in more detail in Examples 1 and 2 described later.

Next, an embodiment of the second aspect of the present invention will be described.

As shown in FIG. 5, a concave curved surface processing step of forming the substrate 1 into a concave curved surface shape, a first mirror surface processing step of mirror processing the inner surface of the substrate 1, and a primary mirror surface processing The reflecting mirror A for illumination is manufactured through a secondary mirror finishing step of mirror finishing the formed surface, a glittering metal film forming step, and a protective film forming step. In the concave curved surface processing step and the first mirror surface processing step, the base material 1 is formed into a concave curved surface and the first mirror surface processing is performed to reduce the surface roughness to a center line average roughness Ra ≦ 0.
03 μm, and the maximum roughness Rmax ≦ 0.3 μm. The concave curved surface processing step and the primary mirror surface processing step may be performed simultaneously or separately. In the second mirror finishing step, mechanical polishing with abrasive grains and chemical polishing with a reaction solution are simultaneously and continuously performed to obtain mirror gloss. The abrasive grains used at this time include Al ₂ O ₃ , SiO ₂ , MgO, Ce
_{There are 2} O ₃ , Cr ₂ O ₃ , Fe ₂ O ₃ , SiC, SnO _{2 and the} like, and the reaction solution is HNO ₃ , H ₂ SO ₄ , H _{2
3 PO 4, Al (NO 3} ) 3 · 9H 2 O, Al 2 (SO 4
) ₃ , HFNaOH, alkaline aqueous solution and the like. By performing the secondary mirror finishing in this way, the surface roughness is such that the center line average roughness Ra ≦ 0.02 μm and the maximum roughness Rmax ≦
0.15 μm. Also, as the glittering metal forming the glittering metal film 3, Al, Ag, Cr, Ni, Pd, P
t and Au are used. This brilliant metal is desirably Al or Ag from the viewpoint of cost and reflectivity, but a material having a reflectivity higher than the reflectivity of the base material 1 or a material having characteristics of reflection spectral characteristics in a wavelength range required as a lighting fixture. You just have to select The glittering metal film 3 is formed by a PVD method such as a vacuum evaporation method, ion plating, and sputtering.
SiO ₂ , Al ₂ O ₃ , TiO ₂ ,
There are inorganic films such as MgF ₂ , ZrO ₂ and In ₂ O ₃ and organic films such as acrylic and silicon.

By the way, an illumination reflector having a glittering metal film as a reflecting surface has been conventionally used. However, the structure of the reflector is made of resin or glass as a base material. There is a coating film, the compatibility with the glittering metal film is not good, and the problem of insufficient adhesion occurs. The resin layer itself has a low heat-resistant temperature, and has a different linear expansion coefficient from the metal film or the protective film thereon, so that the resin layer has low durability against temperature rise.
However, in the present invention, by forming the glittering metal film directly on the metal substrate 1 as described above, the adhesion at the interface can be improved, and the durability at the time of temperature rise can be improved. The second feature will be specifically described in a third embodiment described later.

Next, an embodiment of the third aspect of the present invention will be described.

In this embodiment, a concave curved surface processing step of forming the base material 1 into a concave curved surface shape and a first mirror surface processing step of performing mirror finishing of the inner surface of the base material 1 are simultaneously performed.
That is, by pressing the substrate 1 against the surface-finished tool, the entire substrate 1 is plastically deformed into a concave curved surface shape, and the surface layer of the substrate 1 is plastically deformed to crush the convex portions of the surface layer to form the concave portions. The concave surface processing step and the first mirror surface processing step are performed at the same time.

FIG. 6 shows a specific example of the above processing. A convex mirror mold 8 made of carbon steel or the like and having a mirror-finished surface is provided on a mold holding table 9 so that the convex mirror mold 8 is rotated around a central axis as necessary. is there. Then, the substrate 1 is pressed against the convex mirror mold 8 using a roller 10 formed of resin, fiber, or the like (pressed at a constant pressure along the mold).
The substrate 1 is formed into a concave curved shape along the convex mirror-surface mold 8 and, at the same time, the surface irregularities are smoothed to the first mirror surface level. At this time, the center line average roughness Ra ≦ 0.03 μm and the maximum roughness Rmax were set as mirroring levels for the first mirror finishing.
Mirror to ≦ 0.3 μm.

FIG. 7 shows another specific example of the above processing. In the case of this example, a concave mold 11 is disposed on the mold holding base 9, and the concave mold 11 is driven to rotate about a central axis as necessary. Then, the surface of the roller 12 having a smooth surface such as diamond or cemented carbide is pressed against the surface of the substrate 1 (this may be formed from the flat substrate 1 at this time, or the substrate already formed into a concave curved surface shape). Only the surface of the material 1 may be processed) to form a concave curved surface shape along the concave mold 11 and at the same time smooth the surface irregularities up to the first mirror level. At this time,
The center line average roughness R is used as the level of mirror finishing for the primary mirror finishing.
Mirror-finish to a ≦ 0.03 μm and maximum roughness Rmax ≦ 0.3 μm. As described above, the productivity can be improved by simultaneously performing the forming of the concave curved surface shape of the base material 1 and the first mirror finishing step. The third feature will be specifically described in a third embodiment described later.

Next, an embodiment of the fourth aspect of the present invention will be described.

In the case of the present embodiment, in the above-described second mirror polishing step, just before the end of the second mirror polishing step using the abrasive and the reaction liquid, polishing using only the reaction liquid is performed. In other words, as shown in FIG. 8, in the second mirror polishing step, the supply of the abrasive grains for the mechanical polishing and the supply of the reaction liquid for the chemical polishing are adjusted as follows during the processing step. I do.

Initial: reaction liquid + abrasive grains (chemical polishing and mechanical polishing) Mirror finishing: supply of abrasive grains stopped, supply of only reaction liquid (polishing of chemical action center) Finishing: supply of reaction liquid stopped The abrasive grains to be processed include Al ₂ O ₃ , SiO ₂ ,
MgO, Ce ₂ O ₃ , Cr ₂ O ₃ , Fe ₂ O ₃ , Si
C, SnO _{2 and the} like, and the reaction solution is HNO
_{3, H 2 SO 4, H} 3 PO 4, Al (NO 3) 3 · 9H
_{There are 2} O, Al ₂ (SO ₄ ) ₃ , HFNaOH, an alkaline aqueous solution and the like.

By the way, in the polishing using the abrasive grains, the abrasive grains remain on the surface of the substrate 1 even after the polishing and cannot be completely removed by various cleanings. The residual abrasive grains directly affect the quality of the processed product and, when a surface treatment is further performed as a subsequent step, adversely affect the adhesion of foreign matter. However, in the present invention, since the attachment of the abrasive grains is removed by a chemical polishing action,
More effective removal and polishing are performed at the same time, so that the specular gloss can be further improved. In addition, cleaning after polishing is also performed, so that the cleaning process can be shortened (for example, only water washing can be performed). The fourth feature will be specifically described in a first embodiment described later.

Next, an embodiment of the fifth feature of the present invention will be described.

In the second mirror processing step, the supply path of the first processing liquid 13 having abrasive grains and the supply path of the second processing liquid 14 composed of the reaction liquid are separated, and the first processing is performed according to the degree of mirror processing finish. The distribution of the supply of the liquid 13 and the second processing liquid 14 is adjusted. In FIG. 9, 15 is a power source, 16 is a control unit, 17 is a rotation drive unit, 18 is a vertical movement drive unit, 19 is a vertical movement pressure detection unit, 20 is a processing tool, 21 is a substrate rotation drive unit, and 22 is a flow rate. It is an adjustment valve. The power supply 15 supplies power to the driving units 17 and 18 and the control unit 16.
The control unit 16 controls the number of rotations / torque of the rotation drive unit 17, controls the movement of the vertical movement drive unit 18 based on a signal from the vertical movement pressure detection unit 19, and further controls the first working fluid 13 and the second Control is performed to adjust the flow rate of the working fluid 14. The rotation drive unit 17 drives the machining tool 20 to rotate, and the vertical movement drive unit 18 drives the machining tool 20 up and down. Vertical pressure detector 1
Reference numeral 9 denotes a pressure between the processing tool (tool operating portion) 20 and the base material 1. The processing tool 20 is for mirror-finishing the base material 1 via the first and second processing liquids 13 and 14, and is made of urethane foam, sponge, chemical fiber,
It is an elastic body such as artificial leather. The shape of the processing tool 20 may be any structure as long as it can contact the substrate 1. The substrate rotation driving unit 21 drives the substrate 1 to rotate. The flow rate adjusting valve 22 is provided with the first machining fluid 13 supplied through another path.
And the second working fluid 14 is arbitrarily adjusted in flow rate.

Then, the substrate 1 is driven to rotate by the substrate rotating drive unit 21, the processing tool 20 is driven to rotate by the rotation driving unit 17, and the processing tool 20 is moved up and down by the vertical movement driving unit 18. The second processing liquid 13 and the second processing liquid 14 are polished and supplied to the second mirror surface by appropriately adjusting the flow rates and supplying them through different paths. During this polishing, in order to distribute the effect of mechanical polishing or chemical polishing according to the mirror finishing, the supply amount of the first processing liquid 13 having abrasive grains and the second processing liquid 14 composed of the reaction liquid is controlled. adjust. The adjustment by the mirror finish is performed by adjusting the polishing time or by actual measurement (for example, optical measurement). As described above, in the present invention, the supply ratio of the first processing liquid 13 having abrasive grains and the second processing liquid 14 made of the reaction liquid can be controlled by the unevenness of the surface (mirror-finished processing state). Effect can be distributed. Therefore, mirror processing can be performed more efficiently in a short time. The fifth feature will also be specifically described in a first embodiment described later.

Next, an embodiment of the sixth aspect of the present invention will be described.

In the second mirror processing step, a processing tool 20 for polishing the substrate 1 as a workpiece is formed of an elastic material which easily contains abrasive grains or a reaction liquid. 1 is brought into contact with the polishing work. The overall structure of the apparatus is the same as that shown in FIG. 9 described above, and the machining tool 2 is attached to the tip of the drive shaft 23 driven by the rotary drive unit 17 and the vertical drive unit 18 as shown in FIG.
0 is attached. 24 is a first supply pipe for supplying the first working liquid 13 having abrasive grains, and 25 is a second supply pipe made of a reaction liquid.
And a second supply pipe for supplying the processing liquid 14 of FIG. In the case of the present embodiment, an elastic body that easily contains abrasive grains and a reaction liquid is used as the processing tool 20 and is brought into contact with the base material 1 by applying a force such as rotation to polish through the abrasive grains and the reaction liquid. do. Examples of the elastic body constituting the working tool 20 include urethane foam, sponge, chemical fiber, artificial leather, and the like. Processing tool 20
May be any shape as long as it comes into contact with the base material 1 and conforms to the base material 1 or a shape that partially contacts the base material 1. When the polishing is performed as described above, mechanical polishing and chemical polishing can be efficiently and continuously performed, the processing time can be reduced, and the mirror finish can be improved. The sixth feature will also be specifically described in a first embodiment described later.

Next, an embodiment of the seventh aspect of the present invention will be described.

In the second mirror finishing step, the machining tool 2
The detection unit detects the contact pressure between 0 and the substrate 1 which is the workpiece, and controls the working force in accordance with the contact pressure. In this case, the overall structure is the same as that shown in FIG. 9, and the main part is configured as shown in FIG. In the second mirror processing step, a detection unit such as a pressure sensor 26 or a torque detection unit is provided so as to detect a contact pressure at which the processing tool 20 comes into contact with the base material 1, and a pressurizing action pressure is determined by a signal therefrom. Control. The pressure sensor 26 detects the contact pressure between the processing tool 20 and the base material 1 and controls the vertical movement of the processing tool 20 with respect to the base material 1 based on the contact pressure. The torque detector detects the rotational resistance of the processing tool 20 and the like, and detects the processing tool 2
The number of rotations and the torque with respect to the 0 substrate 1 are controlled. By performing the processing as described above, the processing tool 20 can adjust the constant pressure or the applied pressure to the base material 1 as the workpiece, and the shape, the processing speed,
The amount of mechanical and chemical processing can be adjusted by surface irregularities and the like. The seventh feature will be specifically described in a first embodiment described later.

Next, an eighth embodiment of the present invention will be described.

In the second mirror finishing step, the polishing operation is performed by applying an electric field to the base material 1 and the processing tool 20 via the abrasive grains and the reaction liquid. In this case, as shown in FIG. 12, a DC voltage can be applied from the DC power supply 27 between the processing tool 20 and the substrate 1. A processing liquid 33 composed of abrasive grains and a reaction liquid can be supplied from the processing liquid supply pipe 28. Processing tool 2
0 is formed of an electrode material made of a conductor such as a metal. In this case, the surface of the working tool 20 may be covered with the above-described elastic body. The shape of the processing tool 20 is preferably as close to the shape of the substrate 1 as possible. Further, the processing tool 20 may be driven to rotate or driven up and down. The working fluid is composed of abrasive grains and a working fluid (electrolyte solution).
₂ O ₃ , SiO ₂ , MgO, Ce ₂ O ₃ , Cr ₂ O ₃ ,
There are Fe ₂ O ₃ , SiC, SnO _{2 and the} like, and the reaction solution is HNO ₃ , H ₂ SO ₄ , H ₃ PO ₄ , Al (N
_{O 3) 3 · 9H 2 O} , Al 2 (SO 4) 3, HFNaO
H, an alkaline aqueous solution and the like. Thus, an electric field is applied between the substrate 1 and the processing tool 20 to electrolyze the processing liquid, and the elution of the substrate 1 is promoted by an electrochemical reaction, whereby polishing can be performed. Further, mechanical polishing by abrasive grains is performed by mechanically moving the processing tool 20. In this manner, chemical polishing can be controlled efficiently by applying an electric field, and mechanical polishing can be controlled efficiently and simultaneously by rotation or vertical movement of the processing tool 20. It has excellent controllability and is effective. The eighth feature will be specifically described in a third embodiment described later.

Next, an embodiment of the ninth aspect of the present invention will be described.

In the second mirror polishing step, a magnetic substance is put in a reaction solution containing abrasive grains, and polishing is performed by applying a rotating magnetic field from the outside. In this case, a magnetic material is contained in the processing liquid supplied to the base material 1 from the processing liquid supply pipe 28. That is, the working liquid is an abrasive, a reaction liquid and a magnetic material. As a method of including a magnetic substance in the reaction liquid, whether the abrasive grains are magnetic substances, or abrasive grains containing a magnetic substance,
Alternatively, a magnetic solid processing tool 29 may be inserted separately from the processing liquid. Thus, the magnet 30 disposed around the substrate 1 is rotated while supplying the processing liquid to the substrate 1 shown in FIG. Polishing. In this case, mechanical polishing can be promoted by moving indirectly by a magnetic field around the base material 1 without using a large tool as a processing tool. By using a magnetic substance having a small or small particle size as a tool, a secondary mirror surface processing can be performed on the base material 1 having a three-dimensional shape such as a reflecting mirror without being affected by the shape. It should be noted that this first
The feature of No. 9 will also be specifically described in a second embodiment described later.

Next, an embodiment of the tenth aspect of the present invention will be described.

In the first or second mirror finishing step, the same material as the protective film 4 is used as the abrasive grains 31 used for polishing. For example, when Al ₂ O ₃ abrasive grains are used as the abrasive grains 31 as shown in FIG.
An Al ₂ O ₃ film is formed as shown in FIG.
When iO ₂ abrasive grains are used, a SiO ₂ film is formed as the protective film 4. After the mirror finishing step, cleaning is performed in a cleaning step until the protective film 4 is formed. However, the abrasive grains 31 are not completely cleaned, and only those firmly adhered remain. If the same material is used, the remaining abrasive grains 3
1 does not cause any adverse effect, and the protective film 4
Adhesion is improved. In this case, not only when the protective film 4 is formed directly on the base material 1, but also when the protective film 4 is formed after the glitter metal film 3 is formed, the glitter metal film 3 is formed.
Since the thickness is smaller than the diameter of the abrasive grains 31, the same effect can be obtained. Since the same material as the protective film 4 exists as a nucleus on the surface of the base material 1 by processing as described above, when the protective film 4 is formed, the base material 1 and the protective film 4 are interposed via the nucleus. And the adhesion to the surface can be improved. The tenth feature will be specifically described in a third embodiment described later.

Next, an embodiment of the eleventh feature of the present invention will be described.

By oxidizing the second mirror-finished substrate 1, the oxide of the substrate 1 is used as the protective film 4. In the step of forming the protective film after the second mirror-finished surface of the substrate 1, the inner surface 5 of the mirror-finished mirror surface is forcibly oxidized by exposing it to an oxidizing atmosphere 32 as shown in FIG. Thus, a protective film 4 is formed. At this time, the oxidation treatment includes oxygen plasma treatment, thermal oxidation treatment, chemical oxidation treatment, anodic oxidation treatment, and the like. The oxidizing atmosphere 32 is, for example, O ₂ plasma, and the condition for this is, for example, O ₂ : 5.
0 sccm, plasma power: 300 W, irradiation time: 2
There is 0 min. When the protective film 4 is formed as described above,
The protective film 4 can be formed most easily (a thin film forming apparatus, a paint applying apparatus, and the like are not required), and the adhesion between the base material 1 and the protective film 4 can be improved. The eleventh feature will be specifically described in a second embodiment described later.

[0060]

The present invention will be described below in more detail with reference to examples and comparative examples.

(Example 1) In Example 1, processing was performed in the steps shown in FIG. First, an Al base material having a purity of 99.7% was prepared as a base material,
This was formed into a concave curved reflecting mirror shape by hydraulic forming by molding. The surface roughness of the inner surface after molding is Ra is 0.05.
Rmax was about 0.1 to 1 μm at 0.2 μm. Next, the inner surface is mirror-finished in the primary mirror-polishing process.
This was performed by polishing the inner surface with a buff. The buff polishing uses a hard buff material and coarse abrasive grains depending on the surface roughness or waviness after the hydroforming, but hemp buff and abrasive grains with a particle size of about 3 μm are used initially, followed by a cotton buff and a grain. Polishing was performed with abrasive grains having a diameter of about 1 μm. After polishing, the surface was finished so that the surface roughness was 0.03 μm in Ra and 0.3 μm in Rmax. Thereafter, the substrate was subjected to ultrasonic cleaning with pure water (residual abrasive particles were removed by buffing). Next, in the second mirror finishing step, mirror finishing was performed under the following conditions. As the working fluid, Al ₂ O ₃ particles having an average particle diameter of 0.06 μm were used as abrasive grains, and an aqueous solution of aluminum nitrate was used as a reaction liquid. As a processing tool for polishing, a tool covered with urethane foam was used and moved up and down while rotating. And thereby, the base material and the tool were brought into contact with each other via the working fluid to smooth the inner surface of the base material. At this time, in order to maintain a constant contact pressure between the base material and the processing tool to be polished and to evenly smooth the reflection surface of the base material, the processing tool is provided with a pressure sensor, and is vertically moved and rotated. Pressure control was performed. In the first half of the second mirror finishing step, the abrasive and the reaction liquid are simultaneously supplied as an abrasive to perform smoothing. When the target surface roughness is reached, only the supply of the abrasive is stopped and the reaction liquid is stopped. Only supplied. The operation of the working tool to be polished was subsequently performed. As a result, the surface roughness of the inner surface of the reflector became 0.01 μm in Ra and 0.08 μm in Rmax. After polishing, a protective film of SiO ₂ was formed on the surface of the base material of the reflector by vapor deposition (A after polishing).
(1) The surface of the base material is in an active state, and a natural oxide film is formed with time, but in some cases, a protective film is formed because the film becomes cloudy and causes a decrease in reflectance.)

Example 2 In Example 2, processing was performed in the steps shown in FIG. First, an Al base material having a purity of 99.7% was prepared as a base material,
This was spat-drawn by molding to form a concave curved reflecting mirror shape. The surface roughness of the inner surface after the molding was such that Ra was about 0.08 to 0.3 μm and Rmax was about 0.1 to 1 μm. This was mirror-finished by chemical polishing in a first mirror-polishing step. At this time, chemical polishing was performed using a mixed aqueous solution of phosphoric acid and nitric acid. After this processing, the surface was finished so that the surface roughness was Ra 0.03 μm and Rmax 0.3 μm. Next, in the second mirror finishing step, mirror finishing was performed under the following conditions. As a working fluid, the abrasive grains have an average grain size of 0.03μ
m ₂ of SiO ₂ particles and a magnetic material having a particle size of 0.1 μm.
05 μm Fe powder was used, and an aqueous solution of aluminum nitrate was used as a reaction solution. In addition, a magnet was arranged around the substrate, and the magnetic field was rotated so as to follow the surface of the substrate having a concave curved surface. Then, by supplying the processing liquid to the base material, the abrasive grains were moved together with the magnetic material in the processing liquid to perform polishing.
At this time, the surface roughness of the inner surface of the reflecting mirror is 0.01 μm in Ra.
m and Rmax were 0.1 μm. After polishing, the surface of the base material of the reflecting mirror was irradiated with O ₂ plasma for 20 minutes. As a result, an oxide layer was formed on the surface of the base material to form a protective film.

Example 3 In Example 3, processing was performed in the steps shown in FIG. First, SUS304 was prepared as a base material, and was formed into a concave curved reflecting mirror shape by hydraulic forming in a forming process. As for the surface roughness of the inner surface after molding, Ra is 0.05 to 0.5.
At 18 μm, Rmax was about 0.1 to 0.9 μm. Next, in a first mirror finishing step, the base material was fitted into an outer mold, and the inner surface was pressed with a roller. As a roller, a carbide or diamond tool having a smooth surface was used, and an appropriate load was pressed against a mold to plastically process the surface. The surface roughness after processing is Ra 0.03 μm,
Finished up to 0.3 μm in Rmax. Next, in the second mirror finishing step, mirror finishing was performed under the following conditions. As a working liquid, the abrasive grains are SiO6 having an average grain size of 0.06 μm.
_Two particles were used, and aluminum nitrate was used as a reaction solution. As a processing tool to be polished, an electrode having a shape along the concave curved surface shape of the base material was used, and was rotated during polishing. A DC power supply is connected between the base material and the processing tool so that the base material side becomes the anode, a voltage is applied via the working fluid, and the current value at that time is controlled to perform electrochemical polishing. While doing
The processing tool was rotated to perform mechanical polishing with abrasive grains.
Thereby, the surface roughness of the inner surface of the reflecting mirror is 0.008 in Ra.
μm and Rmax were 0.07 μm. Next, an Al film having a thickness of 0.3 μm was formed on the mirror-finished surface of the base material by a sputtering method. After polishing, Si
An O ₂ protective film was formed by a CVD method so as to have a thickness of 1.0 μm.

(Comparative Example 1) In Comparative Example 1, processing was carried out as shown in FIG. An Al base material having a purity of 99.7% was prepared as a base material, and this was formed into a reflecting mirror having a concave curved surface by a spatula forming process. The surface roughness of the inner surface after molding is Ra from 0.05 to
At 0.18 μm, Rmax was about 0.2 to 0.9 μm. This was undercoated with a paint as a primary mirror finish. As this undercoat, an acrylic paint was applied to a thickness of about 20 μm and baked and dried.
Next, about 0.3 μm of Al was applied to the undercoated surface.
The film was formed to a thickness of m by a vacuum evaporation method. And Si on it
O ₂ was formed by a vacuum evaporation method so as to have a thickness of about 1.0 μm. In addition, the surface roughness Ra of Table 1 described later: 0.00
8 μm and Rmax: 0.06 μm are data of the surface roughness of the undercoated surface.

(Comparative Example 2) In Comparative Example 2, processing was carried out as shown in FIG. An Al base material having a purity of 99.7% was prepared as a base material, and this was formed into a reflecting mirror having a concave curved surface by a spatula forming process. The surface roughness of the inner surface after molding is Ra from 0.05 to
At 0.18 μm, Rmax was about 0.2 to 0.9 μm. This was chemically polished as a primary mirror finish. Chemical polishing was performed using a phosphoric acid-nitric acid solution. The surface roughness after polishing was 0.029 μm for Ra and 0.19 μm for Rmax. After polishing, a film of SiO ₂ was formed to a thickness of about 1.0 μm by a vacuum evaporation method.

Examples 1 to 3 and Comparative Examples 1 and 2 as described above.
When the optical characteristics, surface roughness and heat resistance of the sample were measured, the results shown in Table 1 were obtained. As can be seen from Table 1, Comparative Example 1
In Comparative Example 2, the surface roughness and the specular gloss were inferior in properties.

[0067]

[Table 1]

From the above results, all of Examples 1 to 3 exhibited the same specular gloss as Comparative Example 1 which could not be obtained by the production method of Comparative Example 2, and a sufficient light distribution as a lighting fixture was obtained.
The heat resistance was also normal at 300 ° C. in any of the configurations and manufacturing methods of Examples 1 to 3, and showed higher heat resistance than Comparative Example 1 in which the resin was undercoated.

[0069]

According to the first aspect of the present invention, there is provided a method for manufacturing a lighting reflector.
The method includes a concave curved surface processing step of forming the substrate into a concave curved surface shape, and a method of forming a center line average roughness Ra ≦ 0.0 on the inner surface of the substrate.
A first mirror polishing step of mirror polishing to 3 μm and a maximum roughness Rmax ≦ 0.3 μm, and a mechanical polishing with abrasive grains and a chemical polishing with a reaction solution on the first mirror-finished surface simultaneously and continuously. Since the secondary mirror processing step is provided, a concave mirror processing, a primary mirror processing, and a secondary mirror processing can be performed on the base material to form a smooth and high-reflectance reflecting mirror. In addition, the roughness of the inner surface of the base material before the second mirror processing is performed has a center line average roughness Ra ≦ 0.03 μm.
m, and the maximum roughness Rmax ≦ 0.3 μm, it is possible to shorten the time for the secondary mirror finishing.

Further, in the method of manufacturing an illumination reflecting mirror according to claim 2 of the present invention, a concave curved surface processing step of forming a substrate into a concave curved surface, and a step of forming a center line average roughness Ra ≦ 0.0
A first mirror polishing step of mirror polishing to 3 μm and a maximum roughness Rmax ≦ 0.3 μm, and a mechanical polishing with abrasive grains and a chemical polishing with a reaction solution on the first mirror-finished surface simultaneously and continuously. Since the method includes a secondary mirror finishing step and a step of forming a glittering metal film and a protective film on the mirror-finished surface, in addition to the effect of the above-mentioned claim 1 , by forming a glittering metal film, high reflection is achieved. A reflective mirror having a high reflectivity can be obtained, and a reflective mirror having no deterioration in the reflectivity of the brilliant metal film can be obtained by forming a protective film, and the brilliant metal film can be directly formed on a metal substrate. By forming
The adhesive strength at the interface can be improved, and the durability at the time of temperature rise can be improved.

According to a third aspect of the present invention, there is provided a method for manufacturing a lighting reflector according to the first or second aspect, wherein the entire substrate is formed into a concave curved shape by pressing the substrate against a surface-finished tool. Since the surface layer of the base material is plastically deformed and deformed so as to crush the convex portions of the surface layer and fill the concave portions, the concave curved surface processing step and the first mirror surface processing step are performed simultaneously. The molding of the curved surface shape and the primary mirror finishing can be performed at the same time, and the productivity can be improved.

Further, in the method for manufacturing an illumination reflecting mirror according to claim 4 of the present invention, in the above-mentioned claim 1 or claim 2 , the reaction liquid alone is used immediately before the end of the second mirror surface processing step using abrasive grains and the reaction liquid. In order to remove the adhered abrasive grains by the chemical polishing action, the abrasive grains can be effectively removed, and because the polishing is also performed at the same time, the mirror gloss can be further improved. In addition, since it also serves as cleaning after polishing, the cleaning process can be shortened (for example, only water washing is required).

According to a fifth aspect of the present invention, there is provided a method of manufacturing a lighting reflector according to the first or second aspect, wherein the first processing liquid having abrasive grains and the second processing liquid comprising a reaction liquid are used. Since the supply path is separated and the supply distribution of the first processing liquid and the second processing liquid is adjusted according to the degree of mirror finishing, the first processing liquid having abrasive grains is determined by the surface unevenness (mirror finishing state). And the supply ratio of the second processing liquid comprising the reaction liquid and the reaction liquid can be controlled, and the effects of the mechanical / chemical polishing can be distributed, so that the mirror polishing can be performed more efficiently and in a shorter time.

According to a sixth aspect of the present invention, there is provided a method of manufacturing a lighting reflector according to the first or second aspect, wherein the elastic body which is easily impregnated with abrasive grains or a reaction liquid is used as a processing tool for polishing a workpiece. Since the polishing operation is performed by bringing the processing tool into contact with the workpiece, the mechanical polishing and chemical polishing can be performed efficiently and continuously, the processing time can be reduced, and the mirror finish can be improved. Things.

According to a seventh aspect of the present invention, in the method of manufacturing a lighting reflecting mirror according to the sixth aspect , the contact pressure between the working tool and the workpiece is detected by the detecting portion, and the working action is performed in accordance with the contact pressure. Since the force is controlled, the processing tool can adjust the constant pressure or the applied pressure to the base material as the workpiece, and the mechanical and chemical processing amount can be adjusted according to the shape, processing speed, surface unevenness, etc. Adjustments can be made.

[0076] The method for manufacturing a lighting reflection mirror according to claim 8 of the present invention, in the claim 1 or claim 2, in the working tool and workpiece, applying an electric field through the abrasive and the reaction solution Thus, the polishing operation is performed, so that the chemical polishing can be controlled by applying an electric field.

According to a ninth aspect of the present invention, there is provided a method of manufacturing an illumination reflector according to the first or second aspect , wherein a magnetic material is put into the reaction solution containing abrasive grains, and a rotating magnetic field is applied from the outside. Since polishing is performed by using a large tool as a processing tool, mechanical polishing can be promoted by moving indirectly with a magnetic field around the base material, and as a tool small or small particle size By using a magnetic material, it is possible to perform a secondary mirror surface processing on a substrate having a three-dimensional shape such as a reflecting mirror without being affected by the shape.

Further, in the method of manufacturing an illumination reflector according to claim 10 of the present invention, since the same material as that of the protective film is used as abrasive grains in the above-described claims 1 and 2 , the protective film is formed on the surface of the base material. Since the same material is present as a nucleus, the adhesion between the base material and the protective film can be improved through the nucleus when the protective film is formed.

Further, in the method of manufacturing an illumination reflecting mirror according to claim 11 of the present invention, in the above-described claim 2 , the second mirror-finished base material is oxidized to use the oxide of the base material as a protective film. Therefore, the formation of the protective film can be most easily performed, and the adhesion between the base material and the protective film can be improved.

[Brief description of the drawings]

FIGS. 1A and 1B are diagrams illustrating an example of an illumination reflecting mirror according to the present invention, wherein FIG. 1A is a perspective view illustrating the entire illumination reflecting mirror, and FIG.
FIG. 2 is an enlarged sectional view of a part X in FIG.

FIG. 2 is an enlarged cross-sectional view of a main part explaining another example of the above-mentioned illumination reflecting mirror ;

FIG. 3 is an enlarged cross-sectional view of a main part illustrating another example of the illumination reflecting mirror of the above.

FIG. 4 is a process explanatory view illustrating an embodiment of the first feature of the present invention.

FIG. 5 is a process explanatory view illustrating an embodiment of the second feature of the above.

FIGS. 6A and 6B are diagrams illustrating an example of the third feature of the embodiment, wherein FIG. 6A is a perspective view of a state before the base material is pressed against a mold, and FIG. It is a perspective view in the middle.

FIG. 7 is a perspective view illustrating another example of the third feature of the embodiment.

FIG. 8 is an explanatory diagram of a supply state of abrasive grains and a reaction liquid according to the fourth embodiment of the above.

FIG. 9 is a schematic view of an apparatus used in the fifth embodiment of the above.

FIG. 10 is a perspective view of an apparatus used in the sixth embodiment of the above.

FIG. 11 is a perspective view of an apparatus used in the seventh embodiment of the above.

FIGS. 12A and 12B show an apparatus used in the eighth embodiment of the above, wherein FIG. 12A is a schematic perspective view and FIG. 12B is a schematic sectional view.

FIG. 13 is a perspective view of an apparatus used in the ninth embodiment of the above.

FIGS. 14A and 14B are cross-sectional views illustrating an embodiment of the tenth feature of the above.

FIG. 15 is an explanatory diagram illustrating an eleventh embodiment of the above.

FIG. 16 is an explanatory view of a step in the first embodiment.

FIG. 17 is a process explanatory view of the second embodiment.

FIG. 18 is a process explanatory view of the third embodiment.

19 is an explanatory view of a step in Comparative Example 1. FIG.

FIG. 20 is a process explanatory view of Comparative Example 2.

FIG. 21 is a cross-sectional view illustrating a configuration of a conventional example.

[Explanation of symbols]

 A Reflector for illumination 1 Base material 3 Luminous metal film 4 Protective film 5 Inner smooth surface 8 Convex mold 10 Roller 11 Concave mold 12 Roller 13 First working fluid 14 Second working fluid 16 Control unit 17 Rotary drive unit 18 Vertical drive unit 20 Processing tool 22 Flow rate adjustment valve

──────────────────────────────────────────────────続 き Continuation of the front page (72) Inventor Takahiro Miyano 1048 Kadoma, Kadoma, Osaka Prefecture Matsushita Electric Works, Ltd. (56) References JP-A-52-9544 (JP, A) JP, A) JP-A-62-83497 (JP, A) JP-A-6-17226 (JP, A) JP-A-6-132584 (JP, A) (58) Fields investigated (Int. Cl. ⁷ , DB name) F21V 7/00-7/22 G02B 5/08-5/10

Claims (11)

(57) [Claims] 1. A concave curved surface processing for forming a substrate into a concave curved surface shape.
Process and the center line average roughness Ra ≦
Mirror surface up to 0.03μm, maximum roughness Rmax ≦ 0.3μm
Primary mirror finishing step to be processed and the table of the primary mirror finishing
Mechanical polishing with abrasive grains and chemical polishing with reaction liquid on the surface
And a secondary mirror processing step to be performed simultaneously and continuously.
A method for manufacturing a reflector for lighting. 2. A concave curved surface processing for forming a substrate into a concave curved surface shape.
Process and the center line average roughness Ra ≦
Mirror surface up to 0.03μm, maximum roughness Rmax ≦ 0.3μm
Primary mirror finishing step to be processed and the table of the primary mirror finishing
Mechanical polishing with abrasive grains and chemical polishing with reaction liquid on the surface
A secondary mirror finishing step performed simultaneously and continuously;
Step of forming a brilliant metal film and a protective film on the processed surface
A method for manufacturing a reflector for illumination, comprising: 3. A substrate is pressed against a surface-finished tool.
Plastic deformation of the entire substrate into a concave curved surface
In both cases, the surface layer of the base material is plastically deformed to crush the projections of the surface layer.
Process to fill the concave part, and the concave curved surface processing step and the first
2. The method according to claim 1, wherein the second mirror processing step is performed simultaneously.
A method for manufacturing the lighting reflector according to claim 2. 4. A second mirror finishing process using abrasive grains and a reaction liquid.
Just before the end of the process, polishing with only the reaction solution is performed
The reflector for illumination according to claim 1 or 2,
Construction method. 5. The method according to claim 1, wherein the first working fluid having abrasive grains and the reaction fluid are used.
The second supply path of the working fluid is separated and the mirror finish is
Supply distribution of the first working fluid and the second working fluid depending on the degree of removal
3. The method according to claim 1, wherein
Manufacturing method of the above-mentioned lighting reflector. 6. A grinding tool as a processing tool for polishing a workpiece.
And an elastic body that easily impregnates the reaction solution,
Polishing work by bringing the machining tool into contact with the workpiece
3. The reflecting mirror for illumination according to claim 1 or 2,
Manufacturing method. 7. A detecting unit for detecting a contact pressure between a processing tool and a workpiece.
And control the working force according to the contact pressure
7. The method of manufacturing a lighting reflecting mirror according to claim 6, wherein
Law. 8. An abrasive or a reaction liquid between a workpiece and a processing tool.
That the polishing work is done by applying an electric field through
3. The reflecting mirror for illumination according to claim 1 or 2,
Manufacturing method. 9. A magnetic substance is placed in a reaction solution containing abrasive grains,
The polishing is performed by applying a rotating magnetic field from the part.
3. The lighting reflector according to claim 1 or claim 2,
Production method. 10. The same material as the protective film is used as abrasive grains.
The lighting device according to claim 1 or 2, wherein
Manufacturing method of reflector. 11. The second mirror-finished substrate is oxidized.
By using the oxide of the substrate as a protective film
A method for manufacturing a lighting reflector according to claim 2.