JP3246984B2 - Tertiary butoxyphenethyl chloride and process for producing the same - Google Patents
Tertiary butoxyphenethyl chloride and process for producing the sameInfo
- Publication number
- JP3246984B2 JP3246984B2 JP20016993A JP20016993A JP3246984B2 JP 3246984 B2 JP3246984 B2 JP 3246984B2 JP 20016993 A JP20016993 A JP 20016993A JP 20016993 A JP20016993 A JP 20016993A JP 3246984 B2 JP3246984 B2 JP 3246984B2
- Authority
- JP
- Japan
- Prior art keywords
- chloride
- butoxyphenethyl
- tertiary
- producing
- mol
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は新規な第三級ブトキシフ
ェネチルクロライドおよびその製造法に関する。本発明
の化合物は、ヒドロキシフェニル基を有する医薬、農薬
および液晶の合成中間体である、ヒドロキシフェネチル
クロライドの合成原料として有用である。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a novel tertiary butoxyphenethyl chloride and a method for producing the same. The compound of the present invention is useful as a raw material for synthesizing hydroxyphenethyl chloride, which is an intermediate for synthesizing drugs, agricultural chemicals and liquid crystals having a hydroxyphenyl group.
【0002】[0002]
【従来技術】従来、フェネチルクロライドはフェネチル
アルコールのクロル化反応により得られることが知られ
ている。しかしながら、本発明の化合物に関しては文献
未記載であり、本発明の化合物は知られていない。2. Description of the Related Art It is conventionally known that phenethyl chloride is obtained by a chlorination reaction of phenethyl alcohol. However, the compound of the present invention has not been described in the literature, and the compound of the present invention is not known.
【0003】[0003]
【発明が解決しようとする課題】これまで本発明の第三
級ブトキシフェネチルクロライドに近似化学構造を有す
る化合物としてメトキシフェネチルクロライド、n−ブ
トキシフェネチルクロライドなどが知られている。しか
しながら、これらのメトキシフェネチルクロライドなど
の脂肪族アルコキシフェネチルクロライドはこれを脱ア
ルキル基化させてヒドロキシフェネチルクロライドを得
るには、臭化水素酸、ヨウ化水素酸あるいはトリフルオ
ロ酢酸などを用いて強い酸性条件の処理を必要とし、収
率や純度も低い。特にn−ブトキシフェネチルクロライ
ドの脱ブチル基反応は、後記参考試験例に示すとおり極
めて困難である。したがって、ヒドロキシフェネチルク
ロライドを容易に製造できる原料と製造方法の開発が望
まれている。本発明の目的は、ヒドロキシフェネチルク
ロライドを収率よく得るための前駆体として有用な第三
級ブトキシフェネチルクロライドを提供することにあ
る。The compounds having a chemical structure similar to that of the tertiary butoxyphenethyl chloride of the present invention include methoxyphenethyl chloride and n-butoxyphenethyl chloride. However, in order to obtain hydroxyphenethyl chloride by dealkylating the aliphatic alkoxyphenethyl chloride such as methoxyphenethyl chloride, it is necessary to use a strong acid such as hydrobromic acid, hydroiodic acid or trifluoroacetic acid. Requires treatment under conditions, and yield and purity are low. In particular, the debutylation reaction of n-butoxyphenethyl chloride is extremely difficult, as shown in Reference Test Examples below. Therefore, development of a raw material and a production method capable of easily producing hydroxyphenethyl chloride is desired. An object of the present invention is to provide tertiary butoxyphenethyl chloride which is useful as a precursor for obtaining hydroxyphenethyl chloride in good yield.
【0004】[0004]
【課題を解決するための手段】本発明者らは、上記の課
題を解決するために鋭意検討した。その結果、ヒドロキ
シド基の保護基として第三級ブチル基を有する第三級ブ
トキシフェネチルクロライドが、ヒドロキシフェネチル
クロライドを製造する原料として有用であることを見出
した。Means for Solving the Problems The present inventors have made intensive studies to solve the above problems. As a result, they have found that tertiary butoxyphenethyl chloride having a tertiary butyl group as a protecting group for a hydroxide group is useful as a raw material for producing hydroxyphenethyl chloride.
【0005】すなわち、第1の本発明の要旨とするとこ
ろは、式That is, the gist of the first invention is that the formula
【化2】 で表わされる第三級ブトキシフェネチルクロライドに関
する。また、第2の本発明の要旨とするところは、第三
級ブトキシフェネチルクロライド(II)を塩基の存在
下、塩化チオニルと反応させることを特徴とする第三級
ブトキシフェネチルクロライド(I)の製造法に関す
る。Embedded image Tert-butoxyphenethyl chloride represented by the formula: A second aspect of the present invention is to produce tertiary butoxyphenethyl chloride (I), which comprises reacting tertiary butoxyphenethyl chloride (II) with thionyl chloride in the presence of a base. About the law.
【0006】本発明の第三級ブトキシフェネチルクロラ
イド(I)の製造法を反応式で示せば次のとおりであ
る。The method for producing the tertiary butoxyphenethyl chloride (I) of the present invention can be represented by the following reaction formula.
【化3】 Embedded image
【0007】本発明の化合物の製造法を以下に説明す
る。本発明の式(I)化合物は、塩基の存在下、塩化チ
オニルと反応させることにより得られる。式(II)化合
物は、例えば第三級ブトキシフェニルハライドを金属マ
グネシウムと反応させ、第三級ブトキシフェニルマグネ
シウムハライドとし、これにエチレンオキサイドを反応
させる製法(特開平1−156939号公報)などによ
り得られる。このようにして得た式(II)化合物を塩化
チオニルとの反応に用いればよい。塩化チオニルの使用
量は、第三級ブトキシフェネチルアルコールの1.0〜
1.2倍モル、好ましくは1.2倍モルがよい。溶媒とし
てはジクロロメタン、ジクロロエタンなどのハロゲン化
炭化水素系の溶媒がよい。塩基としてはトリメチルアミ
ン、トリエチルアミンおよびピリジンなどが挙げられ
る。この添加量は第三級ブトキシフェネチルアルコール
に対して1.5倍モルがよい。反応温度は50〜60
℃、好ましくは55〜60℃である。この温度範囲とす
ることにより式(I)化合物の収率が高まる。The method for producing the compound of the present invention will be described below. The compound of formula (I) of the present invention can be obtained by reacting with thionyl chloride in the presence of a base. The compound of formula (II) can be obtained, for example, by reacting tertiary butoxyphenyl halide with metal magnesium to form tertiary butoxyphenyl magnesium halide, and reacting it with ethylene oxide (JP-A-1-156939). Can be The compound of formula (II) thus obtained may be used for the reaction with thionyl chloride. The amount of thionyl chloride used is 1.0 to 1.0 of tertiary butoxyphenethyl alcohol.
The molar amount is 1.2 times, preferably 1.2 times. As the solvent, halogenated hydrocarbon solvents such as dichloromethane and dichloroethane are preferable. Examples of the base include trimethylamine, triethylamine and pyridine. This addition amount is preferably 1.5 times the mol of the tertiary butoxyphenethyl alcohol. Reaction temperature is 50-60
° C, preferably 55 to 60 ° C. By setting the temperature in this range, the yield of the compound of the formula (I) is increased.
【0008】[0008]
【実施例】次に実施例および参考例を示して本発明をさ
らに具体的に説明する。 実施例1 (p−第三級ブトキシフェネチルクロライド
の合成) 撹拌機および還流コンデンサーを取り付け、窒素置換し
た2リットル容量の4頸フラスコにp−第三級ブトキシ
フェネチルアルコール388.5g(2.0モル)、ピリ
ジン237.3g(3.0モル)、塩化メチレン400ml
を加える。これをマントルヒータで60℃に加温して還
流させながら、ジクロロメタン200mlで希釈した塩化
チオニル285.6g(2.4モル)を3時間かけて滴下
する。さらに同温度で6時間撹拌を続ける。次いで反応
液を冷却しながら反応液中に水800mlを滴下して撹拌
し、混合した後、有機溶媒層を分液する。これに5%炭
酸ソーダ水溶液800mlを加えて中和する。これを無水
芒硝で脱水して溶媒を留去し、減圧条件で蒸留して沸点
150℃/20mmHgの留分として液体361.6g(収
率 85.0%)を得た。Next, the present invention will be described more specifically with reference to examples and reference examples. Example 1 (Synthesis of p-tert-butoxyphenethyl chloride) A stirrer and a reflux condenser were attached, and 388.5 g (2.0 mol) of p-tert-butoxyphenethyl alcohol was placed in a 2-liter 4-neck flask purged with nitrogen. ), 237.3 g (3.0 mol) of pyridine, 400 ml of methylene chloride
Add. While the mixture was heated to 60 ° C. with a mantle heater and refluxed, 285.6 g (2.4 mol) of thionyl chloride diluted with 200 ml of dichloromethane was added dropwise over 3 hours. Stirring is continued at the same temperature for 6 hours. Next, 800 ml of water is dropped into the reaction solution while cooling the reaction solution, and the mixture is stirred. After mixing, the organic solvent layer is separated. This is neutralized by adding 800 ml of a 5% aqueous sodium carbonate solution. This was dehydrated with anhydrous sodium sulfate, and the solvent was distilled off. The residue was distilled under reduced pressure to obtain 361.6 g (yield: 85.0%) of a liquid having a boiling point of 150 ° C./20 mmHg.
【0009】このもののガスクロマトグラフィーによる
分析純度、元素分析値およびNMRスペクトルは以下の
とおりであった。 (1) ガスクロマトグラフィーによる分析純度は99.
1%であった。 (2) 元素分析値 計算値 C 67.8% H 8.1% 分析値 C 67.5% H 8.0% (3) NMRスペクトルThe analytical purity, elemental analysis value and NMR spectrum of this product by gas chromatography were as follows. (1) The analytical purity by gas chromatography is 99.
1%. (2) Elemental analysis value Calculated value C 67.8% H 8.1% Analysis value C 67.5% H 8.0% (3) NMR spectrum
【化4】 δ 1.33 (9H, S, Ha) δ 3.00 (2H, T, Hc) δ 3.67 (2H, T, Hd) δ 6.85〜7.19 (4H, m, Hb) 以上によりこのものはp−第三級ブトキシフェネチルク
ロライドと確認された。Embedded image δ 1.33 (9H, S, H a ) δ 3.00 (2H, T, H c ) δ 3.67 (2H, T, H d ) δ 6.85 to 7.19 (4H, m, H b ) It was identified as tertiary butoxyphenethyl chloride.
【0010】実施例2 (p−第三級ブトキシフェネチ
ルクロライドの合成) 撹拌機および還流コンデンサーを取り付け、窒素置換し
た2リットル容量の4頸フラスコにp−第三級ブトキシ
フェネチルアルコール388.5g(2.0モル)、トリ
エチルアミン303.6g(3.0モル)、ジクロロメタ
ン400mlを加える。これをマントルヒータで55℃に
加温して還流させながら、塩化メチレン200mlで希釈
した塩化チオニル285.6g(2.4モル)を3時間か
けて滴下する。さらに同温度で6時間撹拌を続ける。次
いで反応液を冷却しながら反応液中に水800mlを滴下
して撹拌し、混合した後、有機溶媒層を分液する。これ
に5%炭酸ソーダ水溶液800mlを加えて中和する。こ
れを無水芒硝で脱水して溶媒を留去し、減圧条件で蒸留
して沸点150℃/20mmHgの留分として液体358.
2g(収率 84.2%)を得た。このもののガスクロマ
トグラフィーによる分析純度、元素分析値およびNMR
スペクトルは実施例1の値に一致した。EXAMPLE 2 (Synthesis of p-tert-butoxyphenethyl chloride) A 2-liter 4-neck flask equipped with a stirrer and a reflux condenser and purged with nitrogen was charged with 388.5 g of p-tert-butoxyphenethyl alcohol (2 3.0 mol), 303.6 g (3.0 mol) of triethylamine and 400 ml of dichloromethane. This was heated to 55 ° C. with a mantle heater and refluxed, and 285.6 g (2.4 mol) of thionyl chloride diluted with 200 ml of methylene chloride was added dropwise over 3 hours. Stirring is continued at the same temperature for 6 hours. Next, 800 ml of water is dropped into the reaction solution while cooling the reaction solution, and the mixture is stirred. After mixing, the organic solvent layer is separated. This is neutralized by adding 800 ml of a 5% aqueous sodium carbonate solution. This was dehydrated with anhydrous sodium sulfate, and the solvent was distilled off. The residue was distilled under reduced pressure to give a liquid fraction of 358.
2 g (84.2% yield) were obtained. Analytical purity of this product by gas chromatography, elemental analysis value and NMR
The spectrum was consistent with the values of Example 1.
【0011】実施例3 (m−第三級ブトキシフェネチ
ルクロライドの合成) 撹拌機および還流コンデンサーを取り付け、窒素置換し
た2リットル容量の4頸フラスコにm−第三級ブトキシ
フェネチルアルコール388.5g(2.0モル)、ピリ
ジン237.3g(3.0モル)、塩化メチレン400ml
を加える。これをマントルヒータで60℃に加温して還
流させながら、ジクロロメタン200mlで希釈した塩化
チオニル285.6g(2.4モル)を3時間かけて滴下
する。さらに同温度で6時間撹拌を続ける。次いで反応
液を冷却しながら反応液中に水800mlを滴下して撹拌
し、混合した後、有機溶媒層を分液する。これに5%炭
酸ソーダ水溶液800mlを加えて中和する。これを無水
芒硝で脱水して溶媒を留去し、減圧条件で蒸留して沸点
146℃/19mmHgの留分として液体350.1g(収
率 82.3%)を得た。Example 3 (Synthesis of m-tert-butoxyphenethyl chloride) A stirrer and a reflux condenser were installed, and 388.5 g of m-tert-butoxyphenethyl alcohol (28.5 g) was placed in a 2-liter 4-neck flask purged with nitrogen. 2.0 mol), pyridine 237.3 g (3.0 mol), methylene chloride 400 ml
Add. While the mixture was heated to 60 ° C. with a mantle heater and refluxed, 285.6 g (2.4 mol) of thionyl chloride diluted with 200 ml of dichloromethane was added dropwise over 3 hours. Stirring is continued at the same temperature for 6 hours. Next, 800 ml of water is dropped into the reaction solution while cooling the reaction solution, and the mixture is stirred. After mixing, the organic solvent layer is separated. This is neutralized by adding 800 ml of a 5% aqueous sodium carbonate solution. This was dehydrated with anhydrous sodium sulfate and the solvent was distilled off, and distilled under reduced pressure to obtain 350.1 g (yield: 82.3%) of a liquid as a fraction having a boiling point of 146 ° C./19 mmHg.
【0012】このもののガスクロマトグラフィーによる
分析純度、元素分析値およびNMRスペクトルは以下の
とおりであった。 (1) ガスクロマトグラフィーによる分析純度は99.
1%であった。 (2) 元素分析値 計算値 C 67.8% H 8.1% 分析値 C 67.5% H 8.0% (3) NMRスペクトルThe analytical purity, elemental analysis value and NMR spectrum of this product by gas chromatography were as follows. (1) The analytical purity by gas chromatography is 99.
1%. (2) Elemental analysis value Calculated value C 67.8% H 8.1% Analysis value C 67.5% H 8.0% (3) NMR spectrum
【化5】 δ 1.33 (9H, S, Ha) δ 3.01 (2H, T, Hc) δ 3.67 (2H, T, Hd) δ 6.61〜7.20 (4H, m, Hb) 以上によりこのものはm−第三級ブトキシフェネチルク
ロライドと確認された。Embedded image δ 1.33 (9H, S, H a ) δ 3.01 (2H, T, H c ) δ 3.67 (2H, T, H d ) δ 6.61 to 7.20 (4H, m, H b ) It was identified as tertiary butoxyphenethyl chloride.
【0013】〔参考製造例〕撹拌機のついた300ml容
量のフラスコにp−第三級ブトキシフェネチルクロライ
ド106.4g(0.5モル)を入れ、20〜30℃で濃
塩酸150gを滴下して2時間撹拌を続ける。反応後、
これに5%炭酸ソーダ水溶液で中和し、300mlの塩化
メチレンで抽出後、溶媒留去してp−ヒドロキシフェネ
チルクロライドの粗結晶を得る。次いで減圧条件で蒸留
して沸点160℃/10mmHgの留分99.5g(ガスク
ロマトグラフィー純度 99.3%、収率 93.6%)を
得た。目的物の融点は56〜57℃で、赤外吸収スペク
トルは標品のp−ヒドロキシフェネチルクロライドと完
全に一致した。[Reference Production Example] In a 300 ml flask equipped with a stirrer, 106.4 g (0.5 mol) of p-tert-butoxyphenethyl chloride was added, and 150 g of concentrated hydrochloric acid was added dropwise at 20 to 30 ° C. Continue stirring for 2 hours. After the reaction,
This was neutralized with a 5% aqueous sodium carbonate solution, extracted with 300 ml of methylene chloride, and the solvent was distilled off to obtain crude crystals of p-hydroxyphenethyl chloride. Then, distillation was carried out under reduced pressure conditions to obtain 99.5 g of a fraction having a boiling point of 160 ° C./10 mmHg (gas chromatography purity: 99.3%, yield: 93.6%). The melting point of the target product was 56 to 57 ° C, and the infrared absorption spectrum was completely identical to that of the standard p-hydroxyphenethyl chloride.
【0014】一方、p−n−ブトキシフェネチルクロラ
イド21.3g(0.1モル)および濃塩酸30g(0.
3モル)を100mlフラスコに入れ、25〜30℃で2
時間撹拌を続けたが、全く変化は認められなかった。さ
らに還流温度で5時間撹拌を続けても変化はなかった。
同様に濃臭化水素酸30gを加えて還流温度で5時間撹
拌を続けたが、全く変化は認められなかった。On the other hand, 21.3 g (0.1 mol) of pn-butoxyphenethyl chloride and 30 g of concentrated hydrochloric acid (0.1 mol) were used.
3 mol) in a 100 ml flask
Stirring was continued for hours, but no change was observed. There was no change even if stirring was continued at the reflux temperature for 5 hours.
Similarly, 30 g of concentrated hydrobromic acid was added, and stirring was continued at the reflux temperature for 5 hours, but no change was observed.
【0015】[0015]
【発明の効果】本発明の化合物は、穏やかな酸性条件下
で本発明化合物の第三級ブチル基が容易に脱離するた
め、ヒドロキシル基を有する医薬、農薬、液晶の合成中
間体であるm−又はp−ヒドロキシフェネチルクロライ
ドの製造原料として有用である。また、本発明化合物
は、第三級ブトキシフェネチルアルコールを出発原料と
して高収率で製造することができる。Industrial Applicability The compound of the present invention is an intermediate for synthesizing a drug, a pesticide and a liquid crystal having a hydroxyl group, since the tertiary butyl group of the compound of the present invention is easily removed under mild acidic conditions. -Or useful as a raw material for producing p-hydroxyphenethyl chloride. Further, the compound of the present invention can be produced in high yield using tertiary butoxyphenethyl alcohol as a starting material.
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 平4−173756(JP,A) 特開 平2−117681(JP,A) 特開 平1−156939(JP,A) 特開 昭60−149540(JP,A) 特開 平5−271226(JP,A) 特開 平5−287022(JP,A) 特開 昭57−181050(JP,A) 特開 昭63−233974(JP,A) 特開 昭63−233975(JP,A) 特開 平2−134377(JP,A) (58)調査した分野(Int.Cl.7,DB名) C07C 43/225 C07C 41/22 REGISTRY(STN) CA(STN)──────────────────────────────────────────────────続 き Continuation of the front page (56) References JP-A-4-173756 (JP, A) JP-A-2-117681 (JP, A) JP-A-1-156939 (JP, A) JP-A-60-1985 149540 (JP, A) JP-A-5-271226 (JP, A) JP-A-5-287022 (JP, A) JP-A-57-181050 (JP, A) JP-A-63-233974 (JP, A) JP-A-63-233975 (JP, A) JP-A-2-134377 (JP, A) (58) Fields investigated (Int. Cl. 7 , DB name) C07C 43/225 C07C 41/22 REGISTRY (STN) CA (STN)
Claims (2)
塩基の存在下、塩化チオニルと反応させることを特徴と
する第三級ブトキシフェネチルクロライドの製造法。2. A process for producing tert-butoxyphenethyl chloride, which comprises reacting tert-butoxyphenethyl alcohol with thionyl chloride in the presence of a base.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20016993A JP3246984B2 (en) | 1993-07-21 | 1993-07-21 | Tertiary butoxyphenethyl chloride and process for producing the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20016993A JP3246984B2 (en) | 1993-07-21 | 1993-07-21 | Tertiary butoxyphenethyl chloride and process for producing the same |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0733701A JPH0733701A (en) | 1995-02-03 |
JP3246984B2 true JP3246984B2 (en) | 2002-01-15 |
Family
ID=16419946
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP20016993A Expired - Fee Related JP3246984B2 (en) | 1993-07-21 | 1993-07-21 | Tertiary butoxyphenethyl chloride and process for producing the same |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3246984B2 (en) |
-
1993
- 1993-07-21 JP JP20016993A patent/JP3246984B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPH0733701A (en) | 1995-02-03 |
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