JP3207476B2 - Bilayer film fabrication substrate - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a bilayer film forming substrate.

[0002]

2. Description of the Related Art To date, transistors, ICs, LSIs, ultra-L
The development of SI has laid the foundation for today's electronics. On the other hand, with the elucidation of life or biological phenomena, expectations for the development of materials and devices based on new ideas are increasing. This is based on the idea that materials and elements based on different principles in information processing, recognition, storage, and the like imitate biological phenomena and play a new electronic technology.

[0003] Biological membranes serve as a place where biological functions are expressed.
It plays various important roles such as recognition of information from outside and transmission into the membrane, conversion of substances, and transport. For this reason,
The development of artificial membranes is extremely important for the production of materials and devices that mimic biological systems. Various artificial membranes such as a polymer cast membrane and a Langmuir-Blodgett (LB) membrane have been considered as such artificial membranes. As a biological membrane model, a bilayer membrane system is the form closest to the biological system. . This bilayer film is an ultrathin film in which bilayers are arranged in water by forming amphipathic molecules such as phospholipids into the pores formed in the substrate with the alkyl chains of the hydrophobic part facing each other. is there.

By the way, when measuring the electrical characteristics of a bilayer membrane and when electrically perturbing the bilayer membrane, it is necessary to install electrodes on both sides of the membrane in water. Conventionally, this electrode has been installed in water separately from the substrate on which the bilayer film is formed, and there is a limit in reducing the cell volume. This has been a major obstacle in developing an integrated device using a bimolecular film.

[0005]

SUMMARY OF THE INVENTION An object of the present invention is to provide a bilayer film forming substrate capable of reducing the cell volume and developing an integrated device using a bilayer film.

[0006]

The bilayer film-forming substrate of the present invention is characterized in that electrodes are formed on a thin film substrate having small holes penetrated and having a hydrophobic surface.

In the present invention, the material of the substrate is from several μm to
There is no particular limitation as long as a small hole having a diameter of several mm can be formed and an electrode can be formed on the surface thereof. For example, Teflon, polyimide, polyethylene,
Polymers such as polystyrene and polyvinylidene chloride can be used. Also, iron, nickel, copper, platinum, gold,
Pure metals such as silver and titanium, alloys such as stainless steel, and semiconductors such as silicon can also be used. The thickness of the substrate is sufficient if it can maintain the strength as a plate, for example, several μm to several mm.

In the present invention, various methods are used to form small holes in the substrate. For the polymer sheet, a method of punching out the sheet by high-pressure discharge may be used. For a metal substrate, a thermal method using a laser or the like and a method using etching can be used. further,
In order to obtain more controlled size and shape pores,
A method by microlithography using a resist, a method of depositing a metal substrate having small holes patterned by an electrolytic deposition method, and the like can also be used. For semiconductor substrates,
An etching method may be used.

When a metal or semiconductor is used as the substrate, before forming an electrode, an insulating oxide film of its own is formed on the surface thereof, or the surface is covered with an insulating polymer such as Teflon. As a method for forming the oxide film, a method usually used for each material such as thermal oxidation can be used. Examples of the method of insulating coating with a polymer or the like include spin coating and dipping coating. When a polymer such as Teflon is used, the substrate surface can be made hydrophobic at the same time.

There are various methods for hydrophobizing the surface of the substrate depending on the substrate used. However, the method is not particularly limited as long as the lipid film forming the bilayer membrane can be formed.
For example, surface treatment with monoalkyltrichlorosilanes such as hexadecyltrichlorosilane, dialkyldichlorosilanes, trialkylmonochlorosilanes, hexamethyldisilazane, etc., molecular film such as cadmium stearate on a substrate by LB method And the like.

In the present invention, the electrodes are not particularly limited as long as they are stably held on the substrate. For example, metal electrodes such as gold, platinum, silver, copper, and nickel can be used. In addition, in order to record a stable potential, a silver / silver chloride electrode,
Metal-poorly soluble salt electrodes such as calomel electrodes are preferred. The shape of the electrode is not particularly limited, but is preferably formed in a ring shape so as to surround the periphery of the small hole. Various methods are conceivable for selectively forming electrodes on the substrate surface, depending on the substrate used and the material of the electrodes. For example, methods such as adhesion, electrolytic deposition, and vapor deposition can be used. As a method for producing a bilayer film on the substrate having the above structure, any of a well-known laminating method (Montal method) and a brush coating method can be used.

[0012]

In the substrate for producing a bilayer film according to the present invention, since the electrodes are formed integrally on the substrate, the cell volume can be reduced and the cell structure can be simplified, so that it can be easily integrated.

[0013]

Embodiments of the present invention will be described below with reference to the drawings. Example 1

FIG. 1 is a plan view of a substrate in this embodiment, and FIG. 2 is a cross-sectional view. On a 50 μm thick Teflon substrate 1,
Small holes 2 having a diameter of 600 μm were formed by high-pressure discharge. After silver is adhered to the substrate surface using a silver paste, silver chloride is deposited on the silver surface, and a ring-shaped silver / silver chloride electrode 3 is formed so as to surround the perimeter of the small hole 2 to form a bilayer film. A substrate was used.

This substrate was fixed to a Teflon electrochemical cell so that the two chambers were electrically insulated. The cell contains
A 0.1 M KCl aqueous solution was filled. A solution of monoolein / n-decane (50 mg / ml) was sprayed onto the small holes of the substrate by a syringe to produce a bilayer film 4. A triangular wave (40 Hz, 20 Hz) is applied through the electrode 3 formed on the substrate.
mV _pp ) and the displacement current was measured. as a result,
The same results as those obtained when the electrodes were placed in water and measured were obtained. Therefore, it was confirmed that the bilayer film was formed, and that the electrical characteristics of the bilayer film 4 could be normally measured by the electrode 3 formed on the substrate. Further, when a DC voltage of 80 mV was applied via the electrode 3, the thick portion formed near the side wall of the small hole was reduced and the area of the bilayer film was increased. From this, the electrode 3
It was also confirmed that perturbation was given to the film 4 by the method. Example 2

A bilayer film forming substrate was prepared in the same manner as in Example 1, and fixed to an electrochemical cell. 0.1M KCl in aqueous phase
A soybean lecithin bilayer was prepared by laminating in a small hole of a substrate by using. Electrical measurements were made via electrodes on the substrate. As a result, it was confirmed that a film was formed and stable electric measurement was possible. Example 3

FIG. 3 is a sectional view of the substrate in this embodiment. A nickel substrate 11 having a thickness of 10 μm and a small hole 12 having a diameter of 600 μm was prepared by an electrolytic deposition method. After the surface was coated with a Teflon layer 13 by a spin coating method, a silver / silver chloride electrode 14 was formed on the surface in the same manner as in Example 1 to obtain a bilayer film forming substrate.

The substrate was fixed in a Teflon electrochemical cell so that the two chambers were electrically insulated. The cell contains
A 0.1 M KCl aqueous solution was filled. In the small hole of this substrate,
4'-octylazobenzene-4-oxybutyric acid (AZ) / monoolein / n-decane (1: 1 by weight)
0: 100) was sprayed with a syringe to form a bilayer film 15. A sine wave (1 kHz, 10 mV _pp ) was introduced through the electrode 14 formed on the substrate, and the film resistance and the film capacitance were measured by the synchronous rectification method. As a result, it was confirmed that the film 15 was formed.

Next, a wavelength 36
Light of 0 nm and 450 nm was alternately irradiated, and reversible changes in membrane conductivity and membrane capacity were observed. As a result, it was confirmed that crosstalk between the change in the film conductivity and the change in the film capacitance was small, and good electrical measurement could be performed. This is considered to be because the resistance component between the electrode and the bilayer film can be reduced as compared with the case where the electrode is provided in water. Example 4

FIG. 4 is a sectional view of the substrate in this embodiment. A small hole 22 having a diameter of 300 μm was formed in a silicon substrate 21 having a thickness of 50 μm by etching. A silicon oxide film 23 was formed on the surface of the substrate 21 by thermal oxidation. The silicon oxide film 23 on the substrate surface was hydrophobized by a gas phase treatment using hexamethyldisilazane. Next, a gold electrode 24 was formed by vapor deposition to obtain a bilayer film forming substrate.

The substrate was fixed in a Teflon electrochemical cell so that the two chambers were electrically insulated. The cell contains
A 0.1 M KCl aqueous solution was filled. A solution of monoolein / n-decane (50 mg / ml) was sprayed onto the small holes of the substrate by a syringe to form a bilayer film 25. A triangular wave (40 Hz, 40 Hz) is applied through an electrode 24 formed on the substrate.
20 mV _pp ) and the displacement current was measured. As a result, it was confirmed that the film was formed and good electrical measurement could be performed.

[0022]

As described in detail above, in the bilayer film forming substrate of the present invention, the electrodes and the bilayer film are installed in one substrate, so that the cell volume can be made compact and Element integration becomes easy.

[Brief description of the drawings]

FIG. 1 is a plan view of a substrate according to a first embodiment of the present invention.

FIG. 2 is a sectional view of a substrate according to the first embodiment of the present invention.

FIG. 3 is a sectional view of a substrate according to a third embodiment of the present invention.

FIG. 4 is a sectional view of a substrate according to a fourth embodiment of the present invention.

[Explanation of symbols]

DESCRIPTION OF SYMBOLS 1 ... Teflon substrate, 2 ... Small hole, 3 ... Silver / silver chloride electrode, 4
... bilayer film, 11 ... nickel substrate, 12 ... small hole, 13 ...
Teflon layer, 14 silver / silver chloride electrode, 21 silicon substrate, 22 small hole, 23 silicon oxide film, 24 gold electrode, 25 bilayer film.

Continuation of the front page (58) Field surveyed (Int.Cl. ⁷ , DB name) H01L 49/00 B01J 19/00 H01L 29/43 C08J 5/00 B05B 1/00 H01L 29/28

Claims (1)

(57) [Claims] 1. A bilayer film forming substrate, wherein electrodes are formed on a thin film substrate having small holes penetrated and having a hydrophobic surface.