JP3187663B2 - Method for producing silica glass processed product - Google Patents
Method for producing silica glass processed productInfo
- Publication number
- JP3187663B2 JP3187663B2 JP21317094A JP21317094A JP3187663B2 JP 3187663 B2 JP3187663 B2 JP 3187663B2 JP 21317094 A JP21317094 A JP 21317094A JP 21317094 A JP21317094 A JP 21317094A JP 3187663 B2 JP3187663 B2 JP 3187663B2
- Authority
- JP
- Japan
- Prior art keywords
- silica glass
- tube
- heated
- axial direction
- processed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B23/00—Re-forming shaped glass
- C03B23/20—Uniting glass pieces by fusing without substantial reshaping
- C03B23/207—Uniting glass rods, glass tubes, or hollow glassware
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Measuring Temperature Or Quantity Of Heat (AREA)
- Glass Melting And Manufacturing (AREA)
- Devices For Use In Laboratory Experiments (AREA)
Description
【０００１】[0001]
【産業上の利用分野】本発明は、帯域加熱により所定寸
法のシリカガラス加工品を容易かつ安価に製造すること
ができる発明に関するものであり、例えば熱電対用絶縁
管，各種センサー用保護管，ガラスバーナーの火口，バ
ブラー管，理化学機器部材，ガス配管を兼ねた熱処理用
治具材，半導体工業用部材等として利用されるシリカガ
ラス加工品を製造する発明に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an invention capable of easily and inexpensively manufacturing a processed silica glass product having a predetermined size by zone heating, for example, a thermocouple insulating tube, a protective tube for various sensors, and the like. The present invention relates to an invention for producing a processed silica glass product used as a heat treatment jig material also serving as a crater of a glass burner, a bubbler tube, a member of a physicochemical device, a gas tube, a member for the semiconductor industry, and the like.
【０００２】[0002]
【従来の技術】従来よりウェハーの熱処理装置内に組込
まれる半導体治具として化学的安定性が高く、耐熱性を
有するシリカガラス製治具を用いており、この種の治具
に用いる材料に対しては高純度で高寸法精度とともに、
ローコストで品質のバラツキのない製造方法が要求され
る。そして、これらの治具を加工するためのバーナ若し
くは酸水素炎加水分解法にて合成石英を製造するための
バーナもシリカガラスで形成されているが、かかるバー
ナーは太径の外管内に各種ガス吹き出し口としての複数
の内管が挿設する構成をなすが、間隔保持部材を介して
前記内管を気密的且つ精度よく外管に溶接するのは中々
困難であった。2. Description of the Related Art Conventionally, a silica glass jig having high chemical stability and heat resistance has been used as a semiconductor jig incorporated in a wafer heat treatment apparatus. With high purity and high dimensional accuracy,
A manufacturing method that is low in cost and free from quality variations is required. Burners for processing these jigs or burners for producing synthetic quartz by the oxyhydrogen flame hydrolysis method are also formed of silica glass, but such burners are provided with various gases in a large-diameter outer tube. Although it has a structure in which a plurality of inner pipes serving as outlets are inserted, it is difficult to hermetically and accurately weld the inner pipe to the outer pipe via a spacing member.
【０００３】一方近年高温雰囲気下で温度やガス濃度等
を検知するセンサーにおいては、絶縁性と耐熱性の向上
を図るために軸方向に多数の軸穴が設定された多穴シリ
カガラスチューブ内に前記センサーを挿設したセンサー
装置が開発されているが、かかるセンサー用多穴シリカ
ガラスチューブにおいては、センサーよりの検出信号の
ノイズ防止の為に不純物の混入のない高純度で且つ高寸
法精度のよいチューブが必要である。On the other hand, in recent years, a sensor for detecting a temperature, a gas concentration, or the like in a high-temperature atmosphere is provided in a multi-hole silica glass tube in which a large number of axial holes are provided in order to improve insulation and heat resistance. A sensor device in which the sensor is inserted has been developed, but in such a multi-hole silica glass tube for a sensor, in order to prevent noise of a detection signal from the sensor, high purity and high dimensional accuracy with no impurities mixed therein. You need a good tube.
【０００４】従来この様な用途の多穴シリカガラスチュ
ーブを製作するためには、数本のチューブを準備した
後、これを溶接して一体化する方法を採用していた。従
って、製造コストが大となっていた。Conventionally, in order to manufacture a multi-hole silica glass tube for such an application, a method of preparing several tubes and then welding them to integrate them has been adopted. Therefore, the manufacturing cost has been high.
【０００５】又シリコンウェハーその他の半導体各種材
料を洗浄する際に用いられるバブリング洗浄装置や、す
す状合成シリカガラスを高純度液体原料から製造する際
に、原料液体をバブリングする為に使用されるバブリン
グ気化装置においては、太径の外管内に小口径の多数の
内管を挿設したものや、シリカガラスのむく棒を機械加
工にて多数の小孔を穿孔したバブラ−管が開発されてい
るが、かかるバブラ−管も前記小孔を溶接若しくは機械
加工で形成せねばならず、前記の様な問題が生じるのを
避けられない。A bubbling cleaning apparatus used for cleaning silicon wafers and other semiconductor materials, and a bubbling apparatus used for bubbling a raw material liquid when manufacturing soot-like synthetic silica glass from a high-purity liquid raw material. As vaporizers, a large number of small-diameter inner tubes inserted into a large-diameter outer tube, and a bubbler tube having a large number of small holes perforated by machining a solid bar of silica glass have been developed. However, in such a bubbler tube, the small holes have to be formed by welding or machining, and the above-mentioned problems cannot be avoided.
【０００６】更に半導体の熱処理装置は、円筒状の炉心
管内にウェハーボートを介してウェハーを挿入して熱処
理をしたり、又搬送治具を介して前記炉心管よりウェハ
ーの送出を繰り返しているが、これらの搬送治具やウェ
ハーボートはいずれも炉心管形状に合せて軸方向に延在
するシリカガラス母材上に種々のシリカガラス部材を溶
着するか若しくは前記母材を切削加工にて構成している
が、前記の様に軸方向に延在する母材上に種々の部材を
溶接若しくは切削加工を行うことは次の様な問題が生じ
る。Further, in the semiconductor heat treatment apparatus, a wafer is inserted into a cylindrical furnace tube through a wafer boat to perform heat treatment, and the wafer is repeatedly sent out from the furnace tube through a transfer jig. Each of these transfer jigs and wafer boats is formed by welding various silica glass members on a silica glass base material extending in the axial direction in accordance with the shape of the furnace tube, or by cutting the base material. However, welding or cutting various members on the base material extending in the axial direction as described above causes the following problems.
【０００７】即ち、所定形状のシリカガラス加工品を溶
接にて製造するには、予め個々のガラス部材を用意し、
その組立時に接合箇所を直接接合するか、あるいは溶接
棒を用いて接合箇所を溶接棒を介して溶接しているが、
溶接自体に非常な熟練を要するのみならず、個々の作業
は手作業であるため非常に能率が悪い。又溶接は局部的
な熱加工である為に局部的な熱歪みが残りやすい。That is, in order to produce a silica glass workpiece having a predetermined shape by welding, individual glass members are prepared in advance,
At the time of the assembly, the joints are directly joined or the joints are welded using welding rods via welding rods.
Not only does the welding itself require a great deal of skill, but the individual operations are manual and very inefficient. In addition, since welding is a local thermal process, local thermal distortion tends to remain.
【０００８】次に機械加工による方法も問題となる。即
ち機械加工は、塊状シリカガラスから切削、レーザー加
工等によりシリカガラス加工品を製造しているが、かか
る方法ではシリカガラスが脆性材料であるために前記切
削による剪断加工による亀裂、破壊等が生じやすいのみ
ならず、切削治具等からの汚染が起こる。更に切削加工
ではドリル長さに限界を有し、特に長尺の多穴シリカガ
ラスを作ることができない。又多穴シリカガラスの場
合、微細穴寸法の多穴シリカガラスを作ることができな
いのみならず、各種寸法、形状の多穴シリカガラスを連
続的に作ることができない。Next, a method of machining is also problematic. That is, in machining, a silica glass workpiece is manufactured by cutting, laser processing, or the like from bulk silica glass, but in such a method, since silica glass is a brittle material, cracks, breakage, and the like due to the shearing processing by the cutting occur. Not only is it easy, but contamination from the cutting jig etc. occurs. Furthermore, the cutting process has a limitation on the drill length, and in particular, a long multi-hole silica glass cannot be produced. In the case of a multi-hole silica glass, not only cannot a multi-hole silica glass having a fine hole size be produced, but also a multi-hole silica glass having various dimensions and shapes cannot be continuously produced.
【０００９】[0009]
【発明が解決しようとする課題】本発明はかかる技術的
課題に鑑み、例えば熱電対用絶縁管，各種センサー用保
護管，ガラスバーナーの火口，バブラー管，理化学機器
部材，ガス配管を兼ねた熱処理用治具材，半導体熱処理
治具用部材等として利用されるシリカガラス加工品を容
易且つ安価に製造することができる製造方法を提供する
事を目的とする。本発明の他の目的は、長尺寸法の多穴
シリカガラス、長さ１ｍの角状又は丸状ロッド、又数１
０ｍ長のファイバーのように、軸方向に延在する形状で
あれば任意のプロフィル形状を任意に生成し得るシリカ
ガラス加工品の製造方法を提供することを目的とする。SUMMARY OF THE INVENTION In view of the above technical problems, the present invention provides, for example, a heat treatment for an insulating tube for a thermocouple, a protective tube for various sensors, a crater of a glass burner, a bubbler tube, a member of a physicochemical apparatus, and a gas pipe. It is an object of the present invention to provide a manufacturing method capable of easily and inexpensively manufacturing a processed silica glass product used as a jig material, a member for a semiconductor heat treatment jig, and the like. Another object of the present invention is to provide a long-sized multi-hole silica glass, a square or round rod having a length of 1 m,
It is an object of the present invention to provide a method for producing a processed silica glass article that can arbitrarily generate an arbitrary profile shape as long as the shape extends in the axial direction, such as a fiber having a length of 0 m.
【００１０】本発明の他の目的は、製造したシリカガラ
ス加工品表面、特に多穴シリカガラス加工品の場合穴内
表面に荒れ、傷等がなく、更には連続的に製造可能なシ
リカガラス加工品の製造方法を提供することを目的とす
る。本発明の他の目的は、製造過程において不純物の汚
染が生じる事なく、原料材と同様に高純度の維持を図っ
たシリカガラス加工品の製造方法を提供することを目的
とする。Another object of the present invention is to provide a processed silica glass product which has no roughness, scratches or the like on the surface of the manufactured silica glass processed product, especially in the case of a multi-hole silica glass processed product, and which can be manufactured continuously. It is an object of the present invention to provide a method for producing the same. Another object of the present invention is to provide a method for producing a processed silica glass product which maintains high purity similarly to the raw material without causing contamination of impurities in the production process.
【００１１】本発明の他の目的は、小口径から大口径の
多穴シリカガラス加工品を容易に且つ任意に作成可能と
するシリカガラス加工品の製造方法を提供することを目
的とする。Another object of the present invention is to provide a method for manufacturing a processed silica glass article which enables easy and arbitrary preparation of a multi-hole silica glass processed article having a small diameter to a large diameter.
【００１２】[0012]
【課題を解決する為の手段】請求項１及び２記載の発明
はチューブ内に一又は複数の小孔径チューブが設定され
ているもの（以下多穴チューブという）、チューブ内に
一又は複数の小口径ロッドが設定されているもののいず
れにも適用されるもので、特に熱電対用絶縁管，センサ
ー用保護管，ヒータ用保護管，ガラスバーナー火口，バ
ブラー管，理化学機器用部材、若しくは半導体熱処理治
具用部材として適用されるシリカガラス加工品におい
て、任意の断面形状が軸方向に延在する中空シリカガラ
ス外管内に、円または多角形の断面形状が軸方向に延在
する棒状または管状シリカガラス内設体を複数本挿入し
て管状被加熱体を作成した後、該管状被加熱体を先端側
より帯域加熱にて軸方向に沿って加熱溶着させて、請求
項１記載の発明においては、前記複数本の内設体の周囲
に前記シリカガラス外管が被膜として固着されている加
工管を得る事を特徴とし、請求項２記載の発明において
は、前記シリカガラス外管の内周に複数本の内設体が軸
方向に沿って接合されている加工管を得る事を特徴とす
る。この場合前記外管と内設体間を減圧または常圧下
に、一方、内設体内を常圧または加圧下に維持した状態
で、前記鉛直方向に配設した管状被加熱体を下端側より
帯域加熱にて軸方向に沿って加熱溶融させて延伸接合す
るのがよい。According to the first and second aspects of the present invention, one or a plurality of small-hole tubes are provided in a tube (hereinafter referred to as a multi-hole tube). Applicable to any of the rods with a set diameter, especially for thermocouple insulation tubes, sensor protection tubes, heater protection tubes, glass burner craters, bubbler tubes, materials for physical and chemical equipment, or semiconductor heat treatment. In a processed silica glass product applied as a component member, a rod-shaped or tubular silica glass having a circular or polygonal cross-section extending in the axial direction is provided in a hollow silica glass outer tube having an arbitrary cross-section extending in the axial direction. The tubular body to be heated is prepared by inserting a plurality of internal bodies, and then the tubular body to be heated and welded along the axial direction by zone heating from the distal end side. Te, the plurality of the silica glass outer tube around the inner設体 of is characterized by obtaining a machining tubes are fixed as a film, in the invention of claim 2, wherein, of the silica glass outer tube It is characterized in that a processing pipe in which a plurality of internal bodies are joined along the axial direction on the periphery is obtained. In this case, while the pressure between the outer pipe and the inner body is reduced or normal pressure, while the inner body is maintained at normal pressure or pressurization, the vertically heated tubular heated body is banded from the lower end side. It is preferable to heat and melt along the axial direction by heating and stretch-join.
【００１４】[0014]
【実施例】以下、本発明の実施例を例示的に詳しく説明
する。ただしこの実施例に記載されている構成部品の、
材質、形状、分析値などは特に特定的な記載がない限り
は、この発明の範囲をそれのみに限定する趣旨ではなく
単なる説明例に過ぎない。DESCRIPTION OF THE PREFERRED EMBODIMENTS The embodiments of the present invention will be illustratively described in detail below. However, of the components described in this embodiment,
The material, shape, analysis values, and the like are not intended to limit the scope of the present invention but to merely illustrative examples unless otherwise specified.
【００１５】〔実施例１〕 まず、中空管状の熱電対用加工管の製造手順を図１乃至
図２に従って説明する。 （１）シリカガラス製の外管、内挿管等の用意 図１（Ａ）に示すように直径４０ｍｍ、肉厚３ｍｍ、長
さ１．２ｍのシリカガラス製外管１及び内部に挿入する
為の直径１０ｍｍ、肉厚３ｍｍ、長さ１ｍのシリカガラ
ス製内挿管２を２本を作成した。Embodiment 1 First, the procedure for manufacturing a hollow tubular thermocouple processing tube will be described with reference to FIGS. (1) Preparation of silica glass outer tube, inner tube, etc. As shown in FIG. 1 (A), a silica glass outer tube 1 having a diameter of 40 mm, a wall thickness of 3 mm, and a length of 1.2 m and for insertion into the inside. Two silica glass intubation tubes 2 having a diameter of 10 mm, a wall thickness of 3 mm, and a length of 1 m were prepared.
【００１６】（２）シリカガラス被加熱体の加工 図１（Ｂ）に示すように、内挿管２を外管１内に設置
し、内挿管２と外管１の接触部分の一方端若しくは両方
端を溶着し、シリカガラス被加熱体の加工を行なった。
尚、接触部分の溶着は、好ましくは一方端が好ましい。 （３）シリカガラス被加熱体の洗浄および熱歪除去処理 前記のように形成した被加熱体１０をヒータ１１にて１
０５０℃で１０ｈｒｓ加熱処理を行い、熱歪除去処理を
行った後、１０ｗｔ％フッ化水素水溶液に前記被加熱体
を１０ｍｉｎ浸し洗浄及びマイクロクラックの除去を行
った後、清浄な雰囲気で乾燥を行った。(2) Processing of Heated Body of Silica Glass As shown in FIG. 1 (B), the inner tube 2 is set in the outer tube 1 and one or both ends of the contact portion between the inner tube 2 and the outer tube 1. The ends were welded, and the heated body of silica glass was processed.
The welding at the contact portion is preferably at one end. (3) Cleaning and Thermal Strain Elimination Processing of the Silica Glass Heated Body The heated body 10 formed as described above is
After performing a heat treatment at 050 ° C. for 10 hrs and performing a heat distortion removing treatment, the object to be heated is immersed in a 10 wt% aqueous solution of hydrogen fluoride for 10 minutes to wash and remove microcracks, and then dried in a clean atmosphere. Was.
【００１７】（４）ヒータを使った溶融固形化 次に図２に示すように、前記内挿管２と外管１とからな
る被加熱体１０をゆっくりヒータ１１の上部より該ヒー
タ１１内に挿入しつつそのヒータ１１内への送り速度お
よび温度を制御して帯域溶融と線引きを行って、中空管
状の加工管１０Ａを得る。このとき、図２に示した加工
管の形状はこれに限定されるものではなく、内挿管２と
外管１内の圧力差や肉厚その他の強度条件により楕円形
状等にする事も可能である。(4) Melt Solidification Using a Heater Next, as shown in FIG. 2, the object to be heated 10 composed of the inner tube 2 and the outer tube 1 is slowly inserted into the heater 11 from above the heater 11. The zone is melted and drawn by controlling the feeding speed and the temperature into the heater 11 while heating to obtain a hollow tubular processing tube 10A. At this time, the shape of the processing pipe shown in FIG. 2 is not limited to this, and it is also possible to make the processing pipe into an elliptical shape or the like depending on the pressure difference between the inner pipe 2 and the outer pipe 1, the wall thickness and other strength conditions. is there.
【００１８】〔実施例２〕 図３乃至図４に従って説明する。 （１）シリカガラス製の外管、内挿ロッドの用意 図３（Ａ）に示すように直径４０ｍｍ、肉厚３ｍｍ、長
さ１．２ｍのシリカガラス製外管１及び内部に挿入する
為の直径８ｍｍ、長さ１ｍのシリカガラス製ロッド２’
を４本を作成した。[Embodiment 2] A description will be given with reference to FIGS. (1) Preparation of silica glass outer tube and insertion rod As shown in FIG. 3A, a silica glass outer tube 1 having a diameter of 40 mm, a wall thickness of 3 mm, and a length of 1.2 m and for insertion into the inside. Rod 8 'made of silica glass with a diameter of 8mm and a length of 1m
Were prepared.
【００１９】（２）シリカガラス被加熱体の加工 図３（Ｂ）に示すように、内挿ロッド２を外管１内に設
置し、接触部分の一方端より僅かに内側によった部分を
溶着１ａし、シリカガラス被加熱体１０の加工を行っ
た。尚、溶接箇所が内側によった部分にした理由は外管
１と内挿ロッド２との固定維持のしやすさによる。 （３）シリカガラス被加熱体の洗浄および熱歪除去処理 前記のように形成した被加熱体１０をヒータ１１にて１
０５０℃で１０ｈｒｓ加熱処理を行い、熱歪除去処理を
行った後、１０ｗｔ％フッ化水素水溶液に前記被加熱体
を１０ｍｉｎ浸し洗浄及びマイクロクラックの除去を行
った後、清浄な雰囲気で乾燥を行った。(2) Processing of Heated Body of Silica Glass As shown in FIG. 3 (B), the insertion rod 2 is set in the outer tube 1 and a portion slightly inside from one end of the contact portion is set. The welding 1a was performed, and the silica glass heated body 10 was processed. The reason why the welded portion is located on the inner side is that the outer tube 1 and the insertion rod 2 are easily fixed and maintained. (3) Cleaning and Thermal Strain Elimination Processing of the Silica Glass Heated Body The heated body 10 formed as described above is
After performing a heat treatment at 050 ° C. for 10 hrs and performing a heat distortion removing treatment, the object to be heated is immersed in a 10 wt% aqueous solution of hydrogen fluoride for 10 minutes to wash and remove microcracks, and then dried in a clean atmosphere. Was.
【００２０】（４）ヒータを使った溶融固形化 次に図４に示すように、前記内挿ロッド２と外管１とか
らなる被加熱体１０をゆっくりヒータ１１の上部より該
ヒータ１１内に挿入しつつそのヒータ１１内への送り速
度を制御して帯域溶融と線引きを行って、中空接合形状
の加工管１０Ｃを得る。(4) Melt Solidification Using a Heater Next, as shown in FIG. 4, the object to be heated 10 composed of the insertion rod 2 and the outer tube 1 is slowly moved from above the heater 11 into the heater 11. While being inserted, the feeding speed into the heater 11 is controlled to perform zone melting and drawing, thereby obtaining a hollow-joined processed pipe 10C.
【００２１】〔実施例３〕 図５乃至図６に従って説明する。 （１）シリカガラス製の外管、内挿管等の用意 図５（Ａ）に示すように直径３９ｍｍ、肉厚１ｍｍ、長
さ１．２ｍのシリカガラス製外管１及び内部に挿入する
為の直径１７ｍｍ、肉厚１ｍｍ、長さ１ｍのシリカガラ
ス製内挿管２を３本を作成した。[Embodiment 3] A description will be given with reference to FIGS. (1) Preparation of silica glass outer tube, intubation tube, etc. As shown in FIG. 5 (A), a silica glass outer tube 1 having a diameter of 39 mm, a wall thickness of 1 mm, and a length of 1.2 m and for insertion into the inside. Three silica glass intubation tubes 2 each having a diameter of 17 mm, a wall thickness of 1 mm, and a length of 1 m were prepared.
【００２２】（２）シリカガラス被加熱体の加工 図５（Ｂ）に示すように、３本の内挿管２の一方端をそ
れぞれ密封２ａし、図５（Ｃ）に示すように外管１内に
挿入した後内挿管２の解放側と外管の一方端をなるべく
隙間が生じないように、言換えれば気密的に溶着２ｂ
し、シリカガラス被加熱体の加工を行なった。 （３）シリカガラス被加熱体の洗浄および熱歪除去処理 前記のように形成した被加熱体１０をヒータ１１にて１
０５０℃で１０ｈｒｓ加熱処理を行い、熱歪除去処理を
行った後、１０ｗｔ％フッ化水素水溶液に前記被加熱体
１０を１０ｍｉｎ浸し洗浄及びマイクロクラックの除去
を行った後、清浄な雰囲気で乾燥を行った。(2) Processing of Heated Body of Silica Glass As shown in FIG. 5 (B), one end of each of three inner tubes 2 is sealed 2a, and as shown in FIG. After the insertion, the open side of the intubation tube 2 and one end of the outer tube are sealed as much as possible, in other words, in a hermetically welded manner 2b.
Then, the silica glass heated body was processed. (3) Cleaning and Thermal Strain Elimination Processing of the Silica Glass Heated Body The heated body 10 formed as described above is
After performing heat treatment at 050 ° C. for 10 hrs to remove heat distortion, the object to be heated 10 is immersed in a 10 wt% aqueous solution of hydrogen fluoride for 10 minutes to wash and remove microcracks, and then dried in a clean atmosphere. went.
【００２３】（４）ヒータを使った溶融固形化 次に図６に示すように、前記内挿管２と外管１とからな
る被加熱体１０を鉛直方向に配設した状態で、ゆっくり
ヒータ１１の上部より該ヒータ１１内に挿入し、同時に
被加熱体１０の前記内挿管２と外管１の間隙を減圧しつ
つ、そのヒータ１１への送り速度、温度及び減圧度を制
御して帯域溶融と線引きを行って、接合形状の加工管１
０Ｂを得る。このとき内挿管２を、自由落下とすること
により外管１との密着性がより良い加工管１０Ｂ、言換
えれば図７（Ｂ）に示すような内挿管２の周囲に外管１
が被膜として固着されている加工管１０Ｂを得ることが
可能となる。(4) Melt Solidification Using a Heater Next, as shown in FIG. 6, the heater 11 slowly comprises a heating object 10 comprising the inner tube 2 and the outer tube 1 arranged vertically. While the space between the inner tube 2 and the outer tube 1 of the object to be heated 10 is simultaneously depressurized, while controlling the feed speed, temperature and degree of depressurization to the heater 11 to achieve zone melting. And the jointed processed pipe 1
Obtain 0B. At this time, by making the inner tube 2 free fall, a processed tube 10B having better adhesion to the outer tube 1, in other words, the outer tube 1 is placed around the inner tube 2 as shown in FIG.
It is possible to obtain a processed pipe 10B to which is fixed as a coating.
【００２４】かかる実施例によれば例えば、図７に示す
ような断面形状をもつ各種加工管の製作も可能である。
例えば（Ａ）及び（Ｂ）は実施例３に基づいて、（Ｄ）
及び（Ｅ）は実施例１に基づいて、（Ｆ）及び（Ｇ）は
実施例２に基づいて製作した。図中（Ａ）は実施例３に
示すように２つの内挿管の周囲に外管を一体的に包被し
て眼鏡状に製作したもの、（Ｅ）は実施例１に示すよう
に、外管の内周に８個の内挿管を溶着して引いたもの、
（Ｆ）は実施例２に示すように、外管の内周に２本の小
ロッドを溶着して引いたものを示す。更に前記線引き速
度を変化させながら引張することにより、テーパー状の
加工管の制作も可能である。又内挿管２内を正圧に維持
しながら帯域溶融加工することにより、（Ｃ）に示すよ
うな角型の加工管１０Ｄの製作も可能である。According to this embodiment, for example, it is possible to produce various processed pipes having a sectional shape as shown in FIG.
For example, (A) and (B) are based on Example 3 and (D)
(E) was manufactured based on Example 1, and (F) and (G) were manufactured based on Example 2. In the figure, (A) shows an example in which an outer tube is integrally wrapped around two intubation tubes as shown in Example 3 to produce eyeglasses, and (E) shows an outer tube as shown in Example 1, 8 intubations welded to the inner circumference of the tube and pulled,
(F) shows the case where two small rods are welded and pulled on the inner periphery of the outer tube as shown in Example 2. Further, by performing the tension while changing the drawing speed, it is possible to produce a tapered processed pipe. In addition, by performing zone melting processing while maintaining the inside of the inner tube 2 at a positive pressure, it is also possible to manufacture a square processing tube 10D as shown in FIG.
【００２６】[0026]
【発明の効果】以上記載のごとく本発明によれば、帯域
溶融によりシリカガラス加工品を作成する為に、欠け、
亀裂がなく高寸法精度のシリカガラス加工品、特に多穴
シリカガラス加工品の場合穴内表面に荒れ、傷等がな
く、更には連続的に製造可能なシリカガラス加工品を得
る事が出来る。本発明によれば、製造過程において不純
物の汚染が生じる事なく、原料材と同様に高純度の維持
を図ったシリカガラス加工品を得る事が出来る。本発明
によれば、長尺寸法の多穴シリカガラス、長さ１ｍのロ
ッド、又数１０ｍ長のファイバーのように、軸方向に延
在する形状であれば任意のプロフィル形状を任意に生成
し得る。本発明によれば、小口径から大口径の多穴シリ
カガラス加工品を容易に且つ任意に作成出来る。本発明
によれば、例えば熱電対用絶縁管，各種センサー用保護
管，ガラスバーナーの火口，バブラー管，理化学機器部
材，ガス配管を兼ねた熱処理用治具材，半導体工業用部
材等として利用されるシリカガラス加工品を容易かつ安
価に得る事が出来る。As described above, according to the present invention, in order to produce a silica glass processed product by zone melting, chipping,
In the case of a processed silica glass product having no cracks and high dimensional accuracy, especially a multi-hole silica glass processed product, a silica glass processed product which has no roughness on the inner surface of the hole, has no scratches, and can be manufactured continuously can be obtained. According to the present invention, it is possible to obtain a processed silica glass product in which high purity is maintained in the same manner as the raw material without causing contamination of impurities in the manufacturing process. According to the present invention, an arbitrary profile shape can be arbitrarily generated as long as the shape extends in the axial direction, such as a long-sized multi-hole silica glass, a rod having a length of 1 m, or a fiber having a length of several tens of meters. obtain. According to the present invention, it is possible to easily and arbitrarily create a multi-hole silica glass product having a small diameter to a large diameter. According to the present invention, for example, it is used as a thermocouple insulating tube, a protective tube for various sensors, a crater of a glass burner, a bubbler tube, a physicochemical device member, a jig material for heat treatment which also serves as a gas pipe, a member for semiconductor industry, and the like. The processed silica glass product can be easily and inexpensively obtained.
【図１】（Ａ）は本発明の第１実施例に係る管状被加熱
体に示す材料を、（Ｂ）は管状被加熱体の仮固定方法を
示す。FIG. 1A shows a material for a tubular body to be heated according to a first embodiment of the present invention, and FIG. 1B shows a method for temporarily fixing the tubular body to be heated.
【図２】ヒータを使った図１の実施例に係る被加熱体製
造工程を示す。FIG. 2 shows a process of manufacturing a heated body according to the embodiment of FIG. 1 using a heater.
【図３】（Ａ）は本発明の第２実施例に係る管状被加熱
体に示す材料を、（Ｂ）は管状被加熱体の仮固定方法を
示す。FIG. 3A shows a material to be used for a tubular body to be heated according to a second embodiment of the present invention, and FIG. 3B shows a method for temporarily fixing the tubular body to be heated.
【図４】ヒータを使った図３の実施例に係る被加熱体製
造工程を示す。FIG. 4 shows a process of manufacturing a heated object according to the embodiment of FIG. 3 using a heater.
【図５】（Ａ）は本発明の第３実施例に係る管状被加熱
体に示す材料を、（Ｂ）は内挿管の片封工程を、（Ｃ）
は管状被加熱体の仮固定方法を示す。5A is a diagram showing a material to be used for a tubular body to be heated according to a third embodiment of the present invention, FIG.
Shows a method of temporarily fixing the tubular body to be heated.
【図６】ヒータを使った図３の実施例に係る被加熱体製
造工程を示す。FIG. 6 shows a step of manufacturing a body to be heated according to the embodiment of FIG. 3 using a heater.
【図７】本発明により製造される加工管の断面形状の各
種例を示す。FIG. 7 shows various examples of the cross-sectional shape of a processed pipe manufactured according to the present invention.
１ 外管 ２ 内挿管 １０ 被加熱体 １０Ａ、１０Ｂ、１０Ｃ 加工管 １１ ヒータ DESCRIPTION OF SYMBOLS 1 Outer tube 2 Inner tube 10 Heated body 10A, 10B, 10C Processing tube 11 Heater
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 ＦＩ // Ｈ０１Ｌ 21/22 ５０１ Ｈ０１Ｌ 21/22 ５０１Ｍ (72)発明者 鈴木 昇 福島県郡山市田村町金屋字川久保88 信 越石英株式会社郡山工場内 (72)発明者 佐藤 忠好 福島県郡山市田村町金屋字川久保88 信 越石英株式会社郡山工場内 (56)参考文献 特開 平３−170340（ＪＰ，Ａ) 特開 平３−252324（ＪＰ，Ａ) 特開 平３−3323（ＪＰ，Ａ) 特開 平３−84922（ＪＰ，Ａ) 特開 平３−87020（ＪＰ，Ａ) 特開 昭59−17242（ＪＰ，Ａ) 特開 昭63−43328（ＪＰ，Ａ) 実開 昭62−14722（ＪＰ，Ｕ) 実開 平６−7238（ＪＰ，Ｕ) (58)調査した分野(Int.Cl.7，ＤＢ名) C03B 20/00 B01L 3/00 C03B 23/207 G01K 1/08 H01L 21/22 501 ──────────────────────────────────────────────────の Continued on the front page (51) Int.Cl. 7 Identification symbol FI // H01L 21/22 501 H01L 21/22 501M (72) Inventor Noboru Suzuki 88 Kawakubo Kanaya, Tamura-cho, Koriyama-shi, Fukushima Pref. Inside the Koriyama Plant (72) Inventor Tadayoshi Sato 88 Kawakubo, Kanaya, Tamura-cho, Koriyama City, Fukushima Prefecture Inside the Koriyama Plant, Shinetsu Quartz Co., Ltd. (56) References JP-A-3-170340 (JP, A) JP-A Heihei JP-A-3-3324 (JP, A) JP-A-3-84922 (JP, A) JP-A-3-87020 (JP, A) JP-A-59-17242 (JP, A) A) JP-A-63-43328 (JP, A) JP-A-62-14722 (JP, U) JP-A-6-7238 (JP, U) (58) Fields investigated (Int. Cl. 7 , DB name) ) C03B 20/00 B01L 3/00 C03B 23/207 G01K 1/08 H01L 21/22 501
Claims (3)
ス配管を兼ねた熱処理用治具材、ランプ管、ヒータ用保
護管，ガラスバーナー火口，バブラー管，理化学機器用
部材、若しくは半導体熱処理治具用部材として適用され
るシリカガラス加工品において、 任意の断面形状が軸方向に延在する中空シリカガラス外
管内に、円または多角形の断面形状が軸方向に延在する
棒状または管状シリカガラス内設体を複数本挿入して管
状被加熱体を作成した後、該管状被加熱体を先端側より
帯域加熱にて軸方向に沿って加熱溶着させて、 前記複数本の内設体の周囲に前記シリカガラス外管が被
膜として固着されている加工管を得る事を特徴とするシ
リカガラス加工品の製造方法。1. Insulation tube for thermocouple, protection tube for sensor, jig material for heat treatment also serving as gas piping, lamp tube, protection tube for heater, glass burner crater, bubbler tube, member for physical and chemical equipment, or semiconductor heat treatment In a processed silica glass product applied as a jig member, a rod-shaped or tubular silica having a circular or polygonal cross-section extending in the axial direction is provided in a hollow silica glass outer tube having an arbitrary cross-section extending in the axial direction. after creating a tubular object to be heated the glass in設体with a plurality of inserts, by heat welding along the axial direction in the band heated from the tip side tubular object to be heated, the plurality of inner設体 of A method for producing a processed silica glass product, comprising obtaining a processed tube around which the silica glass outer tube is fixed as a coating.
ス配管を兼ねた熱処理用治具材、ランプ管、ヒータ用保
護管，ガラスバーナー火口，バブラー管，理化学機器用
部材、若しくは半導体熱処理治具用部材として適用され
るシリカガラス加工品において、 任意の断面形状が軸方向に延在する中空シリカガラス外
管内に、円または多角形の断面形状が軸方向に延在する
棒状または管状シリカガラス内設体を複数本挿入して管
状被加熱体を作成した後、該管状被加熱体を先端側より
帯域加熱にて軸方向に沿って加熱溶着させて、 前記シリカガラス外管の内周に複数本の内設体が軸方向
に沿って接合されている加工管を得る事を特徴とするシ
リカガラス加工品の製造方法。2. An insulating tube for a thermocouple, a protective tube for a sensor, a jig material for a heat treatment also serving as a gas pipe, a lamp tube, a protective tube for a heater, a glass burner crater, a bubbler tube, a member for physical and chemical equipment, or a semiconductor heat treatment. In a processed silica glass product applied as a jig member, a rod-shaped or tubular silica having a circular or polygonal cross-section extending in the axial direction is provided in a hollow silica glass outer tube having an arbitrary cross-section extending in the axial direction. After a plurality of glass inner bodies have been inserted to form a tubular body to be heated, the tubular body to be heated is welded along the axial direction by zone heating from the distal end side, and the inner periphery of the silica glass outer tube is formed. A method for producing a processed silica glass article, characterized by obtaining a processed pipe in which a plurality of internal bodies are joined along an axial direction.
に、一方、内設体内を常圧または加圧下に維持した状態
で、前記鉛直方向に配設した管状被加熱体を下端側より
帯域加熱にて軸方向に沿って加熱溶融させて延伸接合し
てなる事を特徴とする請求項１若しくは２記載のシリカ
ガラス加工品の製造方法。3. The lower end of the tubular body to be disposed in the vertical direction with the space between the outer tube and the inner body kept under reduced pressure or normal pressure, while maintaining the inner body under normal pressure or pressure. 3. The method for producing a processed silica glass product according to claim 1, wherein the material is heated and melted along the axial direction by zone heating from the side and stretch-bonded.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21317094A JP3187663B2 (en) | 1994-08-15 | 1994-08-15 | Method for producing silica glass processed product |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21317094A JP3187663B2 (en) | 1994-08-15 | 1994-08-15 | Method for producing silica glass processed product |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0859260A JPH0859260A (en) | 1996-03-05 |
| JP3187663B2 true JP3187663B2 (en) | 2001-07-11 |
Family
ID=16634719
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP21317094A Expired - Fee Related JP3187663B2 (en) | 1994-08-15 | 1994-08-15 | Method for producing silica glass processed product |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3187663B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102007024725B4 (en) * | 2007-05-25 | 2011-09-29 | Heraeus Quarzglas Gmbh & Co. Kg | Deposition burner and method for its manufacture, its use in a burner assembly and method of making a synthetic quartz glass blank using the burner assembly |
| GB201710813D0 (en) * | 2017-07-05 | 2017-08-16 | Univ Southampton | Method for fabricating an optical fibre preform |
-
1994
- 1994-08-15 JP JP21317094A patent/JP3187663B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0859260A (en) | 1996-03-05 |
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