JP3186865B2 - Cleaning method for one-pass evaporation plate - Google Patents

Cleaning method for one-pass evaporation plate

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Publication number
JP3186865B2
JP3186865B2 JP30992492A JP30992492A JP3186865B2 JP 3186865 B2 JP3186865 B2 JP 3186865B2 JP 30992492 A JP30992492 A JP 30992492A JP 30992492 A JP30992492 A JP 30992492A JP 3186865 B2 JP3186865 B2 JP 3186865B2
Authority
JP
Japan
Prior art keywords
plate
cleaning
liquid
concentrated
pass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP30992492A
Other languages
Japanese (ja)
Other versions
JPH06159988A (en
Inventor
保雄 齊藤
昭仁 足立
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hisaka Works Ltd
Original Assignee
Hisaka Works Ltd
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Publication date
Application filed by Hisaka Works Ltd filed Critical Hisaka Works Ltd
Priority to JP30992492A priority Critical patent/JP3186865B2/en
Publication of JPH06159988A publication Critical patent/JPH06159988A/en
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Publication of JP3186865B2 publication Critical patent/JP3186865B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明はワンパス型蒸発プレート
の洗浄方法に関するものであり、詳しくは、複数枚のワ
ンパス型蒸発プレートと、この蒸発プレートにガスケッ
トを介して1枚置きに積層された加熱プレートからなる
プレート型熱交換器の定置洗浄方法に関するものであ
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for cleaning a one-pass type evaporating plate, and more particularly to a method for cleaning a plurality of one-pass type evaporating plates and a heating plate which is stacked on the evaporating plate by a gasket. The present invention relates to a stationary cleaning method for a plate-type heat exchanger composed of plates.

【0002】[0002]

【従来の技術】被加工液の濃縮装置として、複数枚のワ
ンパス型蒸発プレートと加熱プレートをガスケットを介
して1枚置きに積層してなるプレート型熱交換器が使用
されている。図3にプレート型熱交換器(1)、気液分
離用のセパレータ(2)、凝縮器(3)、真空発生器
(4)、給液ポンプ(5)、取出しポンプ(6)からな
る濃縮装置(10)の全体構造を示す。この濃縮装置(1
0)に使用されているプレート型熱交換器(1)は、図
4に示すようにプレートの下部に被濃縮液の導入口(7
A)と濃縮液の出口(7B)、およびドレーンの排出口
(8)を開口させ、プレートの上部に加熱用蒸気の導入
口(11)と上記被濃縮液の導入口(7A)から上向きに
延びる被濃縮液流路(9)の上端を開口させ、かつ、第
1のガスケット(12)によって上記加熱用蒸気の導入口
(11)およびドレーンの排出口(8)と、被濃縮液の導
入口(7A)および被濃縮液の出口(7B)との間を遮
断したワンパス型蒸発プレート(13)と、上記蒸発プレ
ート(13)側の加熱用蒸気の導入口(11)と連通する第
2の蒸気導入口および上記蒸発プレート(13)側のドレ
ーンの排出口(8)と連通する第2のドレーン排出口を
具えた加熱プレート(図示省略)とを、上記第1のガス
ケット(12)および上記加熱プレート側の第2の蒸気導
入口と第2のドレーン排出口との間を連通させるシール
パターンを具えた第2のガスケット(図示省略)を介し
て1枚置きに積層することによって濃縮手段を構成して
いる。
2. Description of the Related Art As a device for concentrating a liquid to be processed, a plate-type heat exchanger is used in which a plurality of one-pass evaporation plates and heating plates are alternately stacked via a gasket. FIG. 3 shows a plate heat exchanger (1), a separator for gas-liquid separation (2), a condenser (3), a vacuum generator (4), a liquid supply pump (5), and a concentration pump comprising a removal pump (6). 2 shows the overall structure of the device (10). This concentrator (1
The plate heat exchanger (1) used in (0) has an inlet (7) for the liquid to be concentrated at the bottom of the plate as shown in FIG.
A), the outlet for the concentrated liquid (7B), and the outlet for the drain (8) are opened, and the heating vapor inlet (11) and the inlet for the liquid to be concentrated (7A) are directed upward at the top of the plate. The upper end of the extending liquid passage (9) is opened, and the first gasket (12) is used to introduce the heating vapor inlet (11) and the drain outlet (8), and to introduce the liquid to be concentrated. A one-pass type evaporating plate (13), which is shut off between the opening (7A) and the outlet (7B) of the liquid to be concentrated, and a second communicating with the heating vapor inlet (11) on the evaporating plate (13) side. And a heating plate (not shown) having a second drain outlet communicating with the drain inlet (8) on the side of the evaporation plate (13) and the first gasket (12). The second steam inlet and the second drain outlet on the heating plate side Concentrating means is formed by laminating every other via a second gasket (not shown) provided with a seal pattern communicating with the outlet.

【0003】次に本発明方法の背景技術として上記濃縮
装置(10)による濃縮操作を図3によって説明する。
Next, as a background art of the method of the present invention, a concentration operation by the above-mentioned concentration device (10) will be described with reference to FIG.

【0004】セパレータ(2)上部の排気口(2A)を
凝縮器(3)を介して真空発生器(4)に接続する。真
空発生器(4)を起動し、プレート型熱交換器(1)内
に負圧吸引力を発生させた後、給液ポンプ(5)を起動
し、熱交換器(1)の下部の導入口(7A)から所定温
度に加熱された被濃縮液(14)を導入する。熱交換器
(1)内に導入された被濃縮液(14)は流路(9)内を
上向きに流れてその上端開口部から溢れ出し、Uターン
した後、ワンパス型蒸発プレート(13)の伝熱面に沿っ
て薄膜状に分散しながら下向きに流れ、この間に加熱プ
レート側から供給される熱エネルギによって被濃縮液中
の水分を蒸発させる。水分を蒸発させ所定の濃度に濃縮
された被濃縮液(14)は出口(7B)から流出し、セパ
レータ(2)に供給される。セパレータ(2)の遠心分
離作用を利用して被濃縮液(14)中の固形分と気体成分
とを気液分離し、蒸発ベーパを排気口(2A)から排出
する。この蒸発ベーパは凝縮器(3)で冷却することに
よって液化され、系外に排出される。一方、セパレータ
(2)の下部に留った被濃縮液(14)は取出しポンプ
(6)によって濃縮装置(10)外に取出される。
[0004] An exhaust port (2A) above the separator (2) is connected to a vacuum generator (4) via a condenser (3). After starting the vacuum generator (4) and generating a negative pressure suction force in the plate type heat exchanger (1), the liquid supply pump (5) is started and the lower part of the heat exchanger (1) is introduced. The liquid to be concentrated (14) heated to a predetermined temperature is introduced from the port (7A). The liquid to be concentrated (14) introduced into the heat exchanger (1) flows upward in the flow path (9), overflows from the upper end opening thereof, makes a U-turn, and then turns the one-pass evaporation plate (13). It flows downward while dispersing in the form of a thin film along the heat transfer surface, and during this time, the heat energy supplied from the heating plate side evaporates the water in the liquid to be concentrated. The liquid to be concentrated (14) concentrated to a predetermined concentration by evaporating water flows out from the outlet (7B) and is supplied to the separator (2). The solid content and the gas component in the liquid to be concentrated (14) are separated into gas and liquid by utilizing the centrifugal action of the separator (2), and the evaporation vapor is discharged from the exhaust port (2A). The evaporative vapor is liquefied by being cooled in the condenser (3) and discharged out of the system. On the other hand, the liquid to be concentrated (14) remaining at the lower part of the separator (2) is taken out of the concentrator (10) by the take-out pump (6).

【0005】上記の濃縮動作が行なわれている間、プレ
ート型熱交換器(1)の上部に設けられた導入口(11)
から導入された加熱蒸気(15)は、図3に符号(15)で
示すように加熱プレートの表面に沿って下向きに流れ、
蒸発プレート(13)の伝熱面に沿って流下する被濃縮液
(14)を加熱して水分を蒸発させる。熱エネルギを放出
した加熱蒸気(15)は、ドレーンとなって排出口(8)
内に流入し、熱交換器(1)の下部から系外に排出され
る。
[0005] While the above concentration operation is being performed, an inlet (11) provided above the plate heat exchanger (1).
The heating steam (15) introduced from below flows downward along the surface of the heating plate as shown by reference numeral (15) in FIG.
The liquid to be concentrated (14) flowing down along the heat transfer surface of the evaporation plate (13) is heated to evaporate water. The heated steam (15) that has released heat energy becomes drain and discharges (8)
And is discharged out of the system from the lower part of the heat exchanger (1).

【0006】上記の濃縮動作が行われている間、伝熱面
に沿って流れる被濃縮液(14)の温度は、真空発生器
(4)からの負圧吸引、即ち、減圧吸引の影響を受けて
低下する。このため、蒸発プレート(13)上を流れる被
濃縮液(14)は、液体が急激に気化する、所謂、フラッ
シュ蒸発状態に保持され、流路(9)から送り出された
被濃縮液(14)は、蒸発プレート(13)の上部で高さ方
向および幅方向の全域に亘って略均一に分散し、この薄
膜状の分散状態を保持したまま蒸発プレート(13)の伝
熱面に沿って流下する。
During the above-mentioned concentration operation, the temperature of the liquid to be concentrated (14) flowing along the heat transfer surface depends on the negative pressure suction from the vacuum generator (4), that is, the effect of the reduced pressure suction. Receiving drops. For this reason, the liquid to be concentrated (14) flowing on the evaporation plate (13) is maintained in a so-called flash evaporation state in which the liquid evaporates rapidly, and the liquid to be concentrated (14) sent out from the flow path (9). Is distributed almost uniformly over the entire area in the height and width directions above the evaporating plate (13), and flows down along the heat transfer surface of the evaporating plate (13) while maintaining this thin-film dispersion state. I do.

【0007】このようにして被濃縮液(14)が濃縮され
る訳であるが、熱交換器(1)には、所定の運転時間が
経過した時点で、蒸発プレート(13)の伝熱面に付着し
た固形分やスケール等を除去するため洗浄処理を施こす
必要がある。洗浄方式としては分解・洗浄・再組立の方
式もあるが、一般的には、熱交換器(1)の構造が複雑
で分解と組立てに時間と手間が掛かることを考慮し、蒸
発プレート(13)と加熱プレートとの積層構造を分解せ
ずに、組立て状態に置かれたままの熱交換器(1)の内
部に、図4(B)に示すように温水や洗浄用の薬液(2
1)を注入して伝熱面に付着している固形分等を溶解除
去する定置洗浄方式が採用されている。
[0007] The liquid to be concentrated (14) is concentrated in this way. When a predetermined operation time has elapsed, the heat transfer surface of the evaporation plate (13) is added to the heat exchanger (1). It is necessary to perform a washing treatment to remove solids, scale, and the like attached to the surface. As a washing method, there is a disassembly / wash / reassembly method. In general, considering the complicated structure of the heat exchanger (1) and time and labor required for disassembly and assembly, the evaporating plate (13) is used. ) And the heating plate without disassembling, and as shown in FIG. 4B, hot water or a cleaning chemical (2) is placed inside the heat exchanger (1) in an assembled state.
A stationary cleaning method is adopted in which 1) is injected to dissolve and remove solids and the like adhering to the heat transfer surface.

【0008】上記定置洗浄方式においては、所定量の被
濃縮液(14)の濃縮が終了した後、熱交換器(1)内に
導入口(7A)から温水や洗浄用の薬液(21)を導入
し、大気圧下で蒸発プレート(13)の伝熱面を洗浄する
大気圧下の洗浄と、被濃縮液の代りに洗浄薬液を用い濃
縮操作を行ないつつ洗浄する、負圧下の洗浄がある。
In the stationary cleaning method, after the concentration of a predetermined amount of the liquid to be concentrated (14) is completed, hot water or a cleaning chemical (21) is introduced into the heat exchanger (1) through the inlet (7A). There are two types of cleaning: introduction and cleaning under the atmospheric pressure at the heat transfer surface of the evaporating plate (13) under atmospheric pressure, and cleaning under a negative pressure, in which the cleaning operation is performed while using a cleaning solution instead of the liquid to be concentrated. .

【0009】[0009]

【発明が解決しようとする課題】大気圧下の洗浄方式を
採用した場合、熱交換器(1)内が大気圧下に保持され
ているに過ぎないため、温水あるいは洗浄用の薬液はフ
ラッシュ蒸発状態とならず分散が阻害される。このた
め、蒸発プレート(13)の伝熱面全域に温水や洗浄用の
薬液(21)が行き亘らず、図4(B)に示すように乾き
域が発生することによって流路(9)の上端開口部近傍
の伝熱面上部に固形分やスケール(16)が付着したまま
の状態になる。
When the cleaning method under the atmospheric pressure is adopted, since the heat exchanger (1) is only kept at the atmospheric pressure, the hot water or the cleaning chemical is flash-evaporated. A state is not achieved and dispersion is hindered. For this reason, the hot water and the cleaning chemical (21) do not spread over the entire heat transfer surface of the evaporating plate (13), and a dry area is generated as shown in FIG. Solids and scale (16) remain attached to the upper part of the heat transfer surface near the upper end opening.

【0010】負圧下の洗浄操作は洗浄がほぼ完全に行な
えるもので、即ち、真空発生器(4)からの負圧吸引を
利用して、蒸発プレート(13)の伝熱面に沿って流れる
加熱蒸気と温水あるいは洗浄用の薬液の混合物をフラッ
シュ蒸発状態に保持し、これによって分散機能を向上さ
せ、蒸発プレート(13)の上部に付着している固形分や
スケール(16)を除去する。このように負圧下の洗浄
は、負圧発生の動力、加熱スチームのエネルギーを消費
するとともに濃縮運転操作を必要とし、洗浄コストの高
騰という問題が付随する。
In the cleaning operation under a negative pressure, the cleaning can be performed almost completely, that is, it flows along the heat transfer surface of the evaporation plate (13) by utilizing the negative pressure suction from the vacuum generator (4). A mixture of heated steam and hot water or a cleaning chemical is maintained in a flash-evaporated state, thereby improving the dispersion function and removing solids and scale (16) adhering to the top of the evaporating plate (13). As described above, washing under a negative pressure consumes power for generating a negative pressure and energy of heating steam, requires a concentration operation, and is accompanied by a problem of an increase in washing cost.

【0011】[0011]

【課題を解決するための手段】上記課題の解決手段とし
て本発明は、複数枚のワンパス型蒸発プレートと、この
ワンパス型蒸発プレートにガスケットを介して1枚置き
に積層された加熱プレートからなり、上記ワンパス型蒸
発プレートはその上端部にガスケットで囲まれた加熱用
蒸気の導入口を有すると共に該導入口に向けて被濃縮液
流路の上端出口を開口させたプレート型熱交換器の定置
洗浄操作において、上記ワンパス型蒸発プレートの被濃
縮液流路への給液ラインにエアを導入し、洗浄液中に上
記エアを分散させた後、このエアと洗浄液との混合物で
上記蒸発プレートの伝熱面上部に付着している固形分や
スケールを洗浄除去することを特徴とするワンパス型蒸
発プレートの洗浄方法を提供するものである。
The present invention as described above SUMMARY SUMMARY In order to achieve the above, a plurality of one-pass type evaporator plate, Ri Do from laminated heating plate every one via a gasket to the one-pass type evaporator plate , The above one-pass type steam
The heating plate is for heating which is surrounded by a gasket at the upper end.
Having a vapor inlet and a liquid to be concentrated toward the inlet;
In the stationary washing operation of the plate heat exchanger having the upper end outlet of the flow path opened, the concentration of the one-pass evaporating plate is reduced.
After introducing air into the liquid supply line to the contraction liquid flow path and dispersing the air in the cleaning liquid, the mixture of the air and the cleaning liquid may be used to remove solids or the like adhering to the upper surface of the heat transfer surface of the evaporation plate. An object of the present invention is to provide a one-pass type evaporating plate cleaning method characterized by cleaning and removing scale.

【0012】[0012]

【作用】複数枚のワンパス型蒸発プレートと、加熱プレ
ートをガスケットを介して交互に積層してなる熱交換器
に定置洗浄を施こす際に、ワンパス型蒸発プレートの給
液ラインにエアを注入し、蒸発プレートの伝熱面に洗浄
液とエアを同時供給する。真空発生器を使用しないにも
拘らず、エアの注入により乾き域になり易い蒸発プレー
トの上部伝熱面に温水あるいは洗浄液の薬液があたかも
フラッシュ蒸発しているかのように勢よく吹き出し、伝
熱面の全域に亘って分散する。この結果、ワンパス型蒸
発プレートの伝熱面に乾き域が発生せず、洗浄効果が大
幅に向上する。
[Function] When performing stationary cleaning on a heat exchanger in which a plurality of one-pass evaporation plates and heating plates are alternately stacked via a gasket, air is injected into a liquid supply line of the one-pass evaporation plate. The cleaning liquid and air are simultaneously supplied to the heat transfer surface of the evaporation plate. Despite not using a vacuum generator, hot water or cleaning chemicals blow out vigorously on the upper heat transfer surface of the evaporating plate, which tends to dry when air is injected, as if flash evaporation. Are distributed over the entire area. As a result, no dry area is generated on the heat transfer surface of the one-pass type evaporation plate, and the cleaning effect is greatly improved.

【0013】[0013]

【実施例】以下、図1および図2を参照しながら本発明
の一具体例を説明する。尚、以下の記述において、従来
技術を示す図3および図4と同一の構成部材は、同一の
参照番号で表示し、重複する事項に関しては説明を省略
する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to FIGS. In the following description, the same constituent members as those shown in FIGS. 3 and 4 showing the prior art are denoted by the same reference numerals, and the description of the same items will be omitted.

【0014】給液ポンプ(5)と被濃縮液(14)の導入
口(7A)を接続する給液ライン(19)に、分岐状態で
エア導入管(18)を接続する。
An air introduction pipe (18) is connected in a branched state to a liquid supply line (19) connecting the liquid supply pump (5) and the inlet (7A) of the liquid to be concentrated (14).

【0015】定置洗浄時に上記エア導入管(18)から給
液ライン(19)に 0.2〜0.3kg/cm2Gのエアを供給し、
このエア(20)を洗浄用薬液または温水(21)と一緒に
導入口(7A)から熱交換器(1)内に注入する。エア
(20)と洗浄用薬液または温水(21)の混合物は、流路
(9)内を上向きに流れ、その上端開口部からワンパス
型蒸発プレート(13)の上部伝熱面上に吹き出す。蒸発
プレート(13)の上部伝熱面上への洗浄用薬液または温
水(21)の分散状態を目視確認したところ、洗浄用薬液
または温水(21)中にエア(20)が混入しているため、
蒸発プレート(13)の上部にフラッシュ蒸発時のように
勢よく洗浄用薬液や温水(21)が噴出し、図2に示すよ
うに蒸発プレート(13)の伝熱面全域に亘って分散して
いることが判った。フラッシュ蒸発に近似した上記洗浄
用薬液または温水(21)の分散挙動は、給液量を絞り込
んだときにも持続されていることが確認された。一方、
エア(20)の供給を中断した場合には、給液量を増大さ
せたにも拘らず、伝熱面の上部に乾き域が発生すること
が確認された。
At the time of stationary cleaning, air of 0.2 to 0.3 kg / cm 2 G is supplied from the air introduction pipe (18) to the liquid supply line (19).
The air (20) is injected into the heat exchanger (1) through the inlet (7A) together with the cleaning chemical or hot water (21). The mixture of the air (20) and the cleaning chemical or hot water (21) flows upward in the flow path (9) and blows out from the upper end opening onto the upper heat transfer surface of the one-pass evaporation plate (13). The state of dispersion of the cleaning chemical or hot water (21) on the upper heat transfer surface of the evaporating plate (13) was visually checked, and air (20) was mixed in the cleaning chemical or hot water (21). ,
As in the case of flash evaporation, a cleaning chemical or hot water (21) spouts vigorously as in flash evaporation, and is dispersed over the entire heat transfer surface of the evaporation plate (13) as shown in FIG. I found out. It was confirmed that the dispersion behavior of the cleaning chemical or the warm water (21) similar to the flash evaporation was maintained even when the supply amount was narrowed. on the other hand,
When the supply of air (20) was interrupted, it was confirmed that a dry area was generated above the heat transfer surface despite the increase in the amount of liquid supply.

【0016】[0016]

【発明の効果】洗浄用薬液または温水(21)中にエア
(20)を注入して洗浄操作を行うことにより、従来の洗
浄用薬液または温水(21)の単独使用による一次洗浄で
問題とされていた蒸発プレート(13)の伝熱面上部での
乾き域の形成とこれに起因する固形分やスケール(16)
の除去不良が回避される。また、従来、二次洗浄で必要
とされていた加熱蒸気供給下の減圧操作が不要になるた
め、本方法によれば温水洗浄(常圧下)で負圧下洗浄と
同格の効果が得られ、さらに蒸発させるためのエネルギ
ー(スチーム)が不要で昇温させるだけのスチームだけ
でよい。
According to the present invention, by performing the cleaning operation by injecting the air (20) into the cleaning chemical solution or the hot water (21), the conventional primary cleaning using the cleaning chemical solution or the hot water (21) alone becomes a problem. Of dry area above the heat transfer surface of the evaporating plate (13) and the solid content and scale (16) caused by this
Defective removal is avoided. In addition, since the decompression operation under the supply of heated steam, which was conventionally required in the secondary cleaning, becomes unnecessary, according to the present method, the same effect as the negative pressure cleaning can be obtained in the warm water cleaning (under normal pressure). Energy (steam) for evaporating is unnecessary, and only steam for raising the temperature is sufficient.

【0017】又負圧下洗浄では濃縮操作を伴うので操作
温度に限界があり温水洗浄であれば任意の温度に設定出
来ることがメリットとなる。
Further, since the concentration operation is involved in the washing under negative pressure, the operating temperature is limited, and it is advantageous that the washing can be set to an arbitrary temperature in the case of washing with hot water.

【0018】省エネ効果としては装置の構成、容量によ
って異なるがホールドしている洗浄液の昇温だけにスチ
ームを使用するため負圧下洗浄の必要スチーム量は約1
/10以下に出来る。
The energy saving effect varies depending on the configuration and capacity of the apparatus, but the amount of steam required for negative pressure cleaning is about 1 because steam is used only for raising the temperature of the cleaning liquid being held.
/ 10 or less.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明方法に使用される濃縮装置のフローシー
FIG. 1 is a flow sheet of a concentrator used in the method of the present invention.

【図2】ワンパス型蒸発プレートの部分正面図FIG. 2 is a partial front view of a one-pass evaporation plate.

【図3】従来方法に使用されている濃縮装置のフローシ
ート
FIG. 3 is a flow sheet of a concentrator used in a conventional method.

【図4】(A)はワンパス型蒸発プレートの全体構造を
説明する正面図、(B)はその部分正面図
FIG. 4A is a front view illustrating the entire structure of a one-pass evaporation plate, and FIG. 4B is a partial front view thereof.

【符号の説明】[Explanation of symbols]

1 熱交換器 7A 被濃縮液または洗浄用薬液の導入口 7B 被濃縮液または洗浄用薬液の出口 9 流路 13 ワンパス型蒸発プレート 18 エア導入管 19 給液ライン 20 エア 21 洗浄用薬液または温水 Reference Signs List 1 Heat exchanger 7A Inlet for concentrated liquid or cleaning chemical 7B Outlet of concentrated liquid or cleaning chemical 9 Flow path 13 One-pass type evaporation plate 18 Air introduction pipe 19 Supply line 20 Air 21 Cleaning chemical or hot water

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 複数枚のワンパス型蒸発プレートと、こ
のワンパス型蒸発プレートにガスケットを介して1枚置
きに積層された加熱プレートからなり、上記ワンパス型
蒸発プレートはその上端部に前記ガスケットで囲まれた
加熱用蒸気の導入口を有すると共に該導入口に向けた被
濃縮液流路の上端出口を開口させてなるプレート型熱交
換器の定置洗浄操作において、上記ワンパス型蒸発プレ
ートの被濃縮液流路への給液ラインにエアを導入し、洗
浄液中に上記エアを分散させた後、このエアと洗浄液と
の混合物で上記蒸発プレートの伝熱面上部に付着してい
る固形分やスケールを洗浄除去することを特徴とするワ
ンパス型蒸発プレートの洗浄方法。
1. A plurality of sheets of one-pass type evaporator plate, Ri Do from laminated heating plate every one via a gasket to the one-pass type evaporator plate, the one-pass type
The evaporating plate is surrounded by the gasket at its upper end
It has an inlet for steam for heating and has a cover facing the inlet.
In the stationary cleaning operation of the plate-type heat exchanger having the upper end outlet of the concentrated liquid flow path opened , air is introduced into a liquid supply line to the concentrated liquid flow path of the one-pass type evaporation plate , and the air is introduced into the cleaning liquid. A method for cleaning a one-pass evaporating plate, comprising: dispersing and then removing a solid content and scale adhering to an upper portion of the heat transfer surface of the evaporating plate with a mixture of the air and the cleaning liquid.
JP30992492A 1992-11-19 1992-11-19 Cleaning method for one-pass evaporation plate Expired - Fee Related JP3186865B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP30992492A JP3186865B2 (en) 1992-11-19 1992-11-19 Cleaning method for one-pass evaporation plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP30992492A JP3186865B2 (en) 1992-11-19 1992-11-19 Cleaning method for one-pass evaporation plate

Publications (2)

Publication Number Publication Date
JPH06159988A JPH06159988A (en) 1994-06-07
JP3186865B2 true JP3186865B2 (en) 2001-07-11

Family

ID=17998982

Family Applications (1)

Application Number Title Priority Date Filing Date
JP30992492A Expired - Fee Related JP3186865B2 (en) 1992-11-19 1992-11-19 Cleaning method for one-pass evaporation plate

Country Status (1)

Country Link
JP (1) JP3186865B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104315920A (en) * 2014-09-29 2015-01-28 神华集团有限责任公司 Method for cleaning plate heat exchanger and plate heat exchanger adopting method
CN104896724A (en) * 2015-06-18 2015-09-09 长春黄金研究院 Top-inlet and bottom-outlet type pressure liquid heating device

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100778751B1 (en) * 2001-08-31 2007-11-23 주식회사 포스코 Scale Removal Method of Plate Type Heat Exchanger by the Using Chemicals
WO2005115205A1 (en) * 2004-05-26 2005-12-08 Tomoda Selling & Sailing Co., Ltd. Indirect heating/boiling apparatus, indirect heating/cooling apparatus, and enriching apparatus

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104315920A (en) * 2014-09-29 2015-01-28 神华集团有限责任公司 Method for cleaning plate heat exchanger and plate heat exchanger adopting method
CN104896724A (en) * 2015-06-18 2015-09-09 长春黄金研究院 Top-inlet and bottom-outlet type pressure liquid heating device

Also Published As

Publication number Publication date
JPH06159988A (en) 1994-06-07

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