JP3177899B2 - How to make an optical reference plate - Google Patents
How to make an optical reference plateInfo
- Publication number
- JP3177899B2 JP3177899B2 JP00379692A JP379692A JP3177899B2 JP 3177899 B2 JP3177899 B2 JP 3177899B2 JP 00379692 A JP00379692 A JP 00379692A JP 379692 A JP379692 A JP 379692A JP 3177899 B2 JP3177899 B2 JP 3177899B2
- Authority
- JP
- Japan
- Prior art keywords
- coating film
- substrate
- film
- reflection
- reference plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- Instruments For Measurement Of Length By Optical Means (AREA)
- Optical Elements Other Than Lenses (AREA)
Description
【０００１】[0001]
【産業上の利用分野】本発明は、干渉計などに使用する
高精度平面を有する光学基準板の作成方法に関するもの
である。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing an optical reference plate having a high-precision plane used for an interferometer or the like.
【０００２】[0002]
【従来の技術】従来より、例えば、光学素子、ミラー等
の被検体の表面形状の検査を行う干渉計においては、光
学基準板の高精度平面からの反射光と、被検体の表面か
らの反射光とを干渉させて、両者の平面度のずれに応じ
て発生する干渉縞を測定することが行われている。2. Description of the Related Art Conventionally, in an interferometer for inspecting the surface shape of an object such as an optical element and a mirror, reflected light from a high-precision plane of an optical reference plate and reflected light from the surface of the object are used. Interference with light is measured to measure interference fringes generated in accordance with a deviation in flatness between the two.
【０００３】そして、より精度の高い検査を行うために
は、上記光学基準板の高精度平面の面精度を高めると共
に、基準面での反射率を検査面の反射率と一致させる必
要がある。この基準面の反射率を調整するには、基準面
にさらに所定の反射率を有する反射コート膜を設けるこ
とで行える。また、基準面と反対側には、反射を防止す
るために必要に応じて反射防止コート膜が形成されるも
のである。In order to perform inspection with higher accuracy, it is necessary to increase the surface accuracy of the high-precision plane of the optical reference plate and to match the reflectance on the reference surface with the reflectance on the inspection surface. The reflectance of the reference surface can be adjusted by further providing a reflection coating film having a predetermined reflectance on the reference surface. On the side opposite to the reference plane, an antireflection coating film is formed as necessary to prevent reflection.
【０００４】一方、光学基準板の作成方法としては、基
準面にコート膜を必要としない場合には、反対面に反射
防止コート膜が必要な時にはこの反射防止コート膜を被
覆した後、基準面を所定の面精度範囲内に研磨仕上げを
行うことで得ている。On the other hand, as a method of forming an optical reference plate, when a coating film is not required on the reference surface, when the antireflection coating film is required on the opposite surface, the antireflection coating film is coated, and then the reference surface is formed. Is obtained by performing a polishing finish within a predetermined surface accuracy range.
【０００５】[0005]
【発明が解決しようとする課題】しかして、上記のよう
な基準面に所定の反射率の反射コート膜を被覆した光学
基準板を作成する場合には、基準面の研磨後にこの基準
面に反射コート膜を被覆した際に、反射コート膜の被覆
に伴って基板に変形が発生し、前記基準面を所定の規格
範囲内の面精度に研磨しても被覆後には面精度が規格範
囲外となる問題を有している。However, when an optical reference plate having the above-mentioned reference surface coated with a reflective coating film having a predetermined reflectance is formed, the reference surface is polished after the reference surface is polished. When the coating film is coated, deformation occurs on the substrate with the coating of the reflective coating film, and even after polishing the reference surface to a surface accuracy within a predetermined standard range, the surface accuracy is out of the standard range after coating. Problems.
【０００６】すなわち、基板にコート膜を被覆形成する
と、このコート膜の内部応力により基準板が反るように
変形して面精度が低下するものであり、このコート膜の
内部応力としては引張応力と圧縮応力とがあり、内部応
力が生じる原因としては、成膜過程における膜構造の不
完全さによるもの、また物質の化学結合や物理結合に由
来するもの、そして膜と基板との間の膨張係数の違いな
どが考えられる。That is, when a coating film is formed on a substrate, the reference plate is deformed so as to be warped by the internal stress of the coating film, and the surface accuracy is reduced. The internal stress of the coating film is a tensile stress. Internal stress is caused by imperfections in the film structure during the film formation process, due to chemical or physical bonding of substances, and expansion between the film and the substrate. A difference in the coefficient may be considered.
【０００７】そこで、本発明は上記事情に鑑み、基準面
に反射コート膜を被覆した後においても良好な面精度を
確保するようにした光学基準板の作成方法を提供するこ
とを目的とするものである。SUMMARY OF THE INVENTION In view of the above circumstances, an object of the present invention is to provide a method of manufacturing an optical reference plate which ensures good surface accuracy even after a reference surface is coated with a reflective coating film. It is.
【０００８】[0008]
【課題を解決するための手段】上記目的を達成するため
本発明の光学基準板の作成方法は、基板の片面の基準面
に反射コート膜を、必要に応じて反対面に反射防止コー
ト膜を被覆して光学基準板を作成するについて、同じコ
ート膜構成、成膜工程であれば、内部応力に応じた変形
の発生程度は、一定であることに着目し、上記反射コー
ト膜または反射防止コート膜の被覆に応じた基板の歪み
度合いを求め、該歪み度合いに応じて変形後の基準面が
所定面精度の平面度が得られるような面形状に研磨し、
その後、前記反射コート膜および必要に応じて反射防止
コート膜を被覆することを特徴とするものである。In order to achieve the above object, a method of manufacturing an optical reference plate according to the present invention comprises the steps of: providing a reflection coating film on one reference surface of a substrate and, if necessary, an antireflection coating film on the other surface. With regard to the optical reference plate made by coating, if the same coating film configuration and film forming process are used, it is noted that the degree of deformation according to the internal stress is constant, and the reflection coating film or the antireflection coating is used. The degree of distortion of the substrate according to the coating of the film is obtained, and the reference surface after deformation is polished to a surface shape such that flatness with a predetermined surface accuracy is obtained according to the degree of distortion,
Thereafter, the reflective coating film and, if necessary, the antireflection coating film are coated.
【０００９】[0009]
【作用】上記のような光学基準板の作成方法では、基板
の基準面の研磨を行う際に、この基準面に形成する反射
コート膜または反対面に形成する反射防止コート膜の被
覆に応じた基板の歪み度合いを予め計算もしくは実験な
どにより求め、この歪み度合いに応じて変形後の基準面
が所定範囲内の面精度が得られるような面形状を設定
し、この面形状に研磨仕上げを行い、その後、反射コー
ト膜および必要に応じて反射防止コート膜を被覆するこ
とで、コート膜を被覆した最終の光学基準板では、上記
コート膜の形成に伴う内部応力の発生による基板の変形
により基準面が所定の規格範囲内の面精度となり、所定
の反射率を有する高精度平面を得るようにしている。According to the above-described method for producing an optical reference plate, when the reference surface of the substrate is polished, the reflection coating film formed on the reference surface or the antireflection coating film formed on the opposite surface is coated. The degree of distortion of the substrate is obtained in advance by calculation or experiment, and a surface shape is set such that the reference surface after deformation has a surface accuracy within a predetermined range in accordance with the degree of distortion, and the surface shape is polished. Then, by coating the reflective coating film and, if necessary, the anti-reflection coating film, the final optical reference plate coated with the coating film has a reference due to the deformation of the substrate due to the generation of internal stress accompanying the formation of the coating film. The surface has a surface accuracy within a predetermined standard range, and a high-precision plane having a predetermined reflectance is obtained.
【００１０】[0010]
【実施例】以下、本発明の実施例を説明する。図１に光
学基準板の一例の構造を示している。Embodiments of the present invention will be described below. FIG. 1 shows an example of the structure of the optical reference plate.
【００１１】光学基準板10は、基板11の片面に面精度が
規格範囲内に研磨された基準面11aを有し、この基準面1
1a には所定の反射率を有する反射コート膜12が蒸着等
の成膜処理によって被覆される。また、基準面11a と反
対面11b には、反射防止コート膜13が被覆される。The optical reference plate 10 has a reference surface 11a on one surface of a substrate 11 whose surface accuracy is polished within a specified range.
1a is coated with a reflective coat film 12 having a predetermined reflectance by a film forming process such as vapor deposition. Further, an antireflection coating film 13 is coated on the reference surface 11a and the opposite surface 11b.
【００１２】上記光学基準板10の作成は、まず、基板11
の基準面11a および反対面11b を所定の面形状に研磨す
る。この面研磨においては、基準面11a の研磨面形状を
設定するものであるが、その際、前記反射コート膜12お
よび反射防止コート膜13の被覆に伴う基板11の変形量を
求め、この変形後に基準面11a が所定の規格範囲内の平
面精度を有するように設定した、面形状に研磨するもの
である。また、反対面11b については要求面精度が低い
ことから、それに応じた研磨を施す。First, the optical reference plate 10 is prepared by
The reference surface 11a and the opposite surface 11b are polished into a predetermined surface shape. In this surface polishing, the shape of the polished surface of the reference surface 11a is set. At this time, the amount of deformation of the substrate 11 due to the coating of the reflection coating film 12 and the antireflection coating film 13 is obtained, and after this deformation, The reference surface 11a is polished to a surface shape set so as to have a plane accuracy within a predetermined standard range. In addition, the required accuracy of the opposite surface 11b is low, so the corresponding surface is polished accordingly.
【００１３】上記コート膜12,13 の被覆に伴う基板11の
変形量は、実験的にコート膜を形成した後の変形量を計
測するか、応力の計算によって求めるものである。この
応力の計算による演算では、円形状の基板11でのコート
膜の応力σと変形量ｈ（基板の反り量）との間には、 ｈ＝σ｛３（１−ν）・ｄｆ・Ｄ2 ／４Ｅ0 ・ｄ2 ｝ Ｅ0 ：基板のヤング率 ν ：基板のポアソン比 ｄｆ：コート膜の厚み ｄ ：基板の厚み Ｄ ：基板の直径 の関係がある。The amount of deformation of the substrate 11 due to the coating of the coat films 12 and 13 is obtained by measuring the amount of deformation after forming the coat film experimentally or by calculating stress. In the calculation based on the calculation of the stress, between the stress σ of the coat film on the circular substrate 11 and the deformation amount h (the amount of warpage of the substrate), h = σ ｛3 (1-ν) · df · D 2 / 4E 0 · d 2} E 0: Young's modulus of the substrate [nu: Poisson's ratio of the substrate df: thickness of the coat film d: thickness of the substrate D: relationship of the diameter of the substrate.
【００１４】ここで、反射コート膜12の内部応力σを求
めた例を示す。これは、下記基板11の片面に反射コート
膜12を被覆し、その後の基板11の変形量を測定したもの
で、このときの各数値は、 Ｅ0 ＝7.14×103 （基板のヤング率），ν＝0.17（基板
のポアソン比），ｄｆ＝0.497 ×10-3mm（コート膜の厚
み），ｄ＝14mm（基板の厚み），Ｄ＝65mm（基板の直
径），ｈ＝1.77×10-5mm（基板の反り量） であり、上記式により反射コート膜12の内部応力σは、 σ1 ＝ 1.895×10-2kg となる。Here, an example in which the internal stress σ of the reflection coat film 12 is obtained will be described. This is a measurement in which one surface of the following substrate 11 is coated with a reflective coating film 12 and the amount of deformation of the substrate 11 after that is measured. Each value at this time is: E 0 = 7.14 × 10 3 (Young's modulus of the substrate) , Ν = 0.17 (Poisson's ratio of the substrate), df = 0.497 × 10 −3 mm (thickness of the coating film), d = 14 mm (thickness of the substrate), D = 65 mm (diameter of the substrate), h = 1.77 × 10 − 5 is a mm (the warp amount of the substrate), the internal stress sigma of the reflection coat film 12 by the above formula, the σ 1 = 1.895 × 10 -2 kg .
【００１５】また、同様に反射防止コート膜13の内部応
力σを求めた例を示す。これは、上記と同様の基板11の
片面に反射防止コート膜13を被覆し、その後の基板11の
変形量を測定したもので、このときの各数値は、 ｄｆ＝0.257 ×10-3mm（コート膜の厚み），ｈ＝1.65×
10-5mm（基板の反り量） であり、上記式により反射防止コート膜13の内部応力σ
は、 σ2 ＝ 3.416×10-2kg となる。An example in which the internal stress σ of the anti-reflection coating film 13 is similarly obtained will be described. This is the same as described above, in which one surface of the substrate 11 is coated with the anti-reflection coating film 13 and the subsequent deformation of the substrate 11 is measured. Each value at this time is df = 0.257 × 10 −3 mm ( Thickness of coat film), h = 1.65 ×
10 −5 mm (the amount of warpage of the substrate).
Is σ 2 = 3.416 × 10 -2 kg.
【００１６】一方、上記内部応力σ1 ，σ2 から異なる
大きさの基板11に同様のコート膜12,13 を形成した場合
の変形量ｈを求めることができる。すなわち、前記式
は、Ｋを定数とすると、次のように変形できる。 ｈ＝σ｛３（１−ν）・ｄｆ／４Ｅ0 ｝・（Ｄ2 ／ｄ2 ） ＝Ｋ・（Ｄ／ｄ）2 そして、前記数値に基づいて、反射コート膜12での定数
Ｋ1 と、反射防止コート膜13での定数Ｋ2 は、 Ｋ1 ＝8.22×10-4mm Ｋ2 ＝7.63×10-4mm となる。On the other hand, the deformation amount h when the similar coat films 12 and 13 are formed on the substrates 11 having different sizes can be obtained from the internal stresses σ 1 and σ 2 . That is, the above equation can be modified as follows, where K is a constant. h = σ ｛3 (1−ν) · df / 4E 0 ｝ · (D 2 / d 2 ) = K · (D / d) 2 Based on the above numerical values, the constant K 1 in the reflective coating film 12 is calculated. Then, the constant K 2 in the anti-reflection coating film 13 is K 1 = 8.22 × 10 −4 mm K 2 = 7.63 × 10 −4 mm
【００１７】さらに、上記事項から、異なる大きさの基
板11に対し、その基準面11a に上記反射コート膜12を、
反対面11b に上記反射防止コート膜13を被覆した際の変
形量を求めた結果を示す。なお、変形量ｈ（反り量）
は、基準面11a が凸方向に湾曲するのを正方向としてい
る。また、この変形量ｈを干渉用レーザ光（Ｈｅ−Ｎｅ
レーザ）の波長λとの比に換算した値を併記している。
なお、λ＝0.6328×10-3mmである。すなわち、 (1) 基板の直径 110mm，厚み20mm 反射コート膜のみ ｈ1 ＝−0.0249×10-3mm（−0.0393λ） 反射防止コート膜のみ ｈ2 ＝＋0.0230×10-3mm（＋0.0364λ） 両面コート膜 ｈ0 ＝−0.0018×10-3mm（−0.0028λ） (2) 基板の直径 160mm，厚み30mm 反射コート膜のみ ｈ1 ＝−0.0234×10-3mm（−0.0369λ） 反射防止コート膜のみ ｈ2 ＝＋0.0217×10-3mm（＋0.0343λ） 両面コート膜 ｈ0 ＝−0.0016×10-3mm（−0.0026λ） となる。Further, from the above, the reflection coating film 12 is provided on the reference surface 11a of the substrate 11 having a different size.
The result of calculating the amount of deformation when the opposite surface 11b is coated with the antireflection coating film 13 is shown. The deformation amount h (warpage amount)
Indicates that the reference surface 11a bends in the convex direction in the positive direction. The amount of deformation h is determined by the interference laser light (He-Ne).
The value converted into the ratio to the wavelength λ of the laser is also shown.
Note that λ is 0.6328 × 10 −3 mm. That is, (1) the diameter of the substrate is 110 mm, the thickness is 20 mm, only the reflection coating film is h 1 = −0.0249 × 10 −3 mm (−0.0393λ), only the antireflection coating film is h 2 = + 0.0230 × 10 −3 mm (+0. 0364λ) Double-sided coating film h 0 = -0.0018 × 10 -3 mm (-0.0028λ) (2) Substrate diameter 160 mm, thickness 30 mm Reflection coating film only h 1 = -0.0234 × 10 -3 mm (-0.0369λ) Reflection H 2 = + 0.0217 × 10 −3 mm (+ 0.0343λ) Double-sided coating film h 0 = −0.0016 × 10 −3 mm (−0.0026λ)
【００１８】そして、光学基準板10の基準面11a におけ
る面精度の規格範囲としては、例えば、±λ／20であ
り、上記コート膜12,13 を形成する前の基準面11a の研
磨における規格範囲を、上記コート膜12,13 の形成に伴
う変形によって平坦となるように予め逆方向に反った面
形状となるように設定し、それに基づいて基準面11a を
研磨しておくことで、コート膜12,13 の被覆後において
は所定の平面度が得られるものである。すなわち、上記
例においては、基準面11a の研磨規格範囲Ｈを、 (1) 基板の直径 110mm，厚み20mm 反射コート膜のみ ＋0.0893λ＞Ｈ＞−0.0107λ 反射防止コート膜のみ ＋0.0136λ＞Ｈ＞−0.0864λ 両面コート膜 ＋0.0528λ＞Ｈ＞−0.0472λ (2) 基板の直径 160mm，厚み30mm 反射コート膜のみ ＋0.0869λ＞Ｈ＞−0.0131λ 反射防止コート膜のみ ＋0.0157λ＞Ｈ＞−0.0843λ 両面コート膜 ＋0.0526λ＞Ｈ＞−0.0474λ と設定する。The standard range of the surface accuracy on the reference surface 11a of the optical reference plate 10 is, for example, ± λ / 20, which is the standard range for polishing the reference surface 11a before forming the coating films 12 and 13. Is set in advance so as to have a surface shape that is warped in the opposite direction so as to be flattened by the deformation accompanying the formation of the coat films 12 and 13, and the reference surface 11a is polished based on the surface shape. After the coating of 12,13, a predetermined flatness can be obtained. That is, in the above example, the polishing standard range H of the reference surface 11a is set as follows: (1) The diameter of the substrate is 110 mm and the thickness is 20 mm Only the reflection coating film + 0.0893λ>H> −0.0107λ Only the antireflection coating film + 0.0136λ> H > −0.0864λ Double-sided coating film + 0.0528λ>H> −0.0472λ (2) Diameter of substrate 160mm, thickness 30mm Only reflection coating film + 0.0869λ>H> −0.0131λ Anti-reflection coating film only + 0.0157λ>H> −0.0843λ Double-sided coating film + 0.0526λ>H> −0.0474λ
【００１９】上記のような規格範囲Ｈ内に基準面11a を
研磨し、また、反対面についても所定の研磨を施した
後、反射コート膜12および／または反射防止コート膜13
を被覆することで、このコート膜12,13 の内部応力の作
用で基板11が変形した後における基準面11a の平面度
は、前記±0.05λを満たすことになるものである。After the reference surface 11a is polished within the above-mentioned standard range H and the opposite surface is polished to a predetermined degree, the reflection coating film 12 and / or the anti-reflection coating film 13 are polished.
By coating, the flatness of the reference surface 11a after the substrate 11 is deformed by the action of the internal stress of the coating films 12, 13 satisfies the above-mentioned ± 0.05λ.
【００２０】また、片面の反射コート膜12による歪み量
と他面の反射防止コート膜13による歪み量が逆方向に同
一の値を示すような両コート膜の組成および膜厚の場合
には、その基板11の基準面11a および反対面11b を最終
的な面精度の規格範囲内に研磨仕上げを行った後に、ま
ず、片面に反射防止コート膜13または反射コート膜12を
被覆し、その後に他面に反射コート膜12または反射防止
コート膜13を被覆することで、所定の特性を有する光学
基準板10が作成できるものである。In the case of the composition and film thickness of both coating films such that the amount of distortion due to the reflection coating film 12 on one side and the amount of distortion due to the anti-reflection coating film 13 on the other surface show the same value in the opposite direction, After the reference surface 11a and the opposite surface 11b of the substrate 11 are polished to a final surface accuracy range, first, one surface is coated with an anti-reflection coating film 13 or a reflection coating film 12, and then the other surface is coated. By coating the surface with a reflective coat film 12 or an antireflective coat film 13, an optical reference plate 10 having predetermined characteristics can be produced.
【００２１】[0021]
【発明の効果】上記のような本発明光学基準板の作成方
法によれば、基板の基準面を研磨してから、該基準面に
反射コート膜を、必要に応じて反対面に反射防止コート
膜を被覆するについて、上記反射コート膜または反射防
止コート膜の被覆に応じた基板の歪み度合いを求め、該
歪み度合いに応じて変形後の基準面が所定面精度の平面
度が得られるような面形状に前記基準面を研磨し、その
後、前記反射コート膜および必要に応じて反射防止コー
ト膜を被覆するようにしたことにより、コート膜を被覆
してなる最終の光学基準板では、上記コート膜の形成に
伴う内部応力の発生による基板の変形により基準面が所
定の規格範囲内の面精度となり、所定の反射率を有する
高精度平面を良好に作成することができるものである。According to the method of manufacturing an optical reference plate of the present invention as described above, a reference surface of a substrate is polished, and then a reflection coat film is formed on the reference surface and, if necessary, an antireflection coat is formed on the opposite surface. For coating the film, the degree of distortion of the substrate according to the coating of the reflection coating film or the anti-reflection coating film is obtained, and the reference plane after deformation is obtained in accordance with the degree of distortion so that the flatness of the predetermined surface accuracy is obtained. By polishing the reference surface to a surface shape, and thereafter coating the reflection coating film and, if necessary, the antireflection coating film, in the final optical reference plate coated with the coating film, The reference surface has a surface accuracy within a predetermined standard range due to deformation of the substrate due to generation of internal stress accompanying the formation of the film, and a high-precision plane having a predetermined reflectance can be satisfactorily created.
【図１】本発明方法により作成する光学基準板の一例を
示す構成図FIG. 1 is a configuration diagram showing an example of an optical reference plate prepared by the method of the present invention.
10 光学基準板 11 基板 11a 基準面 11b 反対面 12 反射コート膜 13 反射防止コート膜 10 Optical reference plate 11 Substrate 11a Reference surface 11b Opposite surface 12 Reflection coating 13 Antireflection coating
Claims (1)
面に反射コート膜を、必要に応じて反対面に反射防止コ
ート膜を被覆してなる光学基準板の作成方法であって、
反射コート膜または反射防止コート膜の被覆に応じた基
板の歪み度合いを求め、該歪み度合いに応じて変形後の
基準面が所定面精度の平面度が得られるような面形状に
研磨し、その後、前記反射コート膜および必要に応じて
反射防止コート膜を被覆することを特徴とする光学基準
板の作成方法。1. A method for producing an optical reference plate, wherein one surface of a substrate is formed on a reference surface, and the reference surface is coated with a reflection coating film, and the opposite surface is coated with an antireflection coating film as necessary.
Obtain the degree of distortion of the substrate according to the coating of the reflection coating film or the anti-reflection coating film, and polished to a surface shape such that the reference surface after deformation according to the degree of distortion can obtain a flatness with a predetermined surface accuracy, and then A method of forming an optical reference plate, comprising coating the reflection coating film and, if necessary, an antireflection coating film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP00379692A JP3177899B2 (en) | 1992-01-13 | 1992-01-13 | How to make an optical reference plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP00379692A JP3177899B2 (en) | 1992-01-13 | 1992-01-13 | How to make an optical reference plate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH05187817A JPH05187817A (en) | 1993-07-27 |
| JP3177899B2 true JP3177899B2 (en) | 2001-06-18 |
Family
ID=11567160
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP00379692A Expired - Lifetime JP3177899B2 (en) | 1992-01-13 | 1992-01-13 | How to make an optical reference plate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3177899B2 (en) |
-
1992
- 1992-01-13 JP JP00379692A patent/JP3177899B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH05187817A (en) | 1993-07-27 |
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