JP3167728U - Pollen mask with functional microfilter - Google Patents

Abstract

Provided is a pollen mask using a functional microfilter that achieves both a comfortable air permeability and a sufficient filtering effect against dust and pollen. A pollen mask using a functional microfilter has a mask body. The mask body 12 includes a mask surface layer 16 made of gauze or non-woven fabric, and an ultrathin mask filter 18 disposed on the mounting surface side of the mask surface layer 16. The ultrathin mask filter 18 includes a fluororesin film having a thickness of 0.03 μm. [Selection] Figure 2

Description

  The present invention relates to a pollen mask, and more particularly to a pollen mask using a functional microfilter.

In recent years, the number of people who suffer from hay fever has increased, and especially in the spring, the scenery of people who commute with masks is no longer unusual in the city. In January 2011, according to the monthly regular report of the Ministry of the Environment, about the pollen scattering of cedar and cypress this spring, the amount of scattering in Kanto is larger than usual, and the period in which hay fever is likely to become serious is over a month and a half. It is also announced. According to experts, this is equivalent to 1.5 times as many as usual, and hay fever is severe when the amount of pollen per day is 30 or more per 1 cm ^2. It is said that

  The mask filter is for preventing dust, pollen, bacteria, and the like from entering from the outside while maintaining air permeability, and is configured by appropriately making the mask material double or triple. However, if the thickness is increased to obtain the effect of preventing entry, the air permeability deteriorates and the user feels stuffy.

  Many of the mask filters currently on the market are obtained by applying electrostatic processing to a nonwoven fabric manufactured by a melt blow manufacturing method, and filter dust in the air by the effect of static electricity. Since the effect of static electricity changes according to temperature and humidity, the effect of this type of mask filter may be affected by the temperature and humidity of the external environment.

  As a mask filter, a filter using the adsorption principle of activated carbon is also known. The filtering effect of activated carbon decreases due to the influence of humidity and adsorbate. For this reason, this type of mask filter halves the filtering effect if it is not transported or stored in a vacuum packaged state.

  In any type, most of the mask filters currently used have a mesh size of about 30 to 150 μm. On the other hand, the cedar pollen particles are said to be 30 to 40 [mu] m alone, and the cedar pollen allergen particles are said to be 0.76 to 7.0 [mu]. Moreover, various bacteria are usually smaller than them. For this reason, depending on the conventional mask filter, it is difficult to achieve both a thickness that can ensure comfortable air permeability and a sufficient filtering effect against dust and pollen.

  This invention has been made to solve the above-mentioned problems, and provides a pollen mask using a functional microfilter that can achieve both comfortable ventilation and sufficient filtering effect against dust and pollen. The purpose is to do.

  In order to achieve the above object, this invention is a pollen mask using a functional microfilter, which is a mask surface layer made of gauze or non-woven fabric, and an ultrathin mask filter arranged on the mounting surface side of the mask surface layer The ultrathin mask filter includes a fluororesin film having a thickness of 0.03 μm.

  According to this device, since the ultra-thin mask filter is configured using a fluororesin film having a thickness of 0.03 μm, it is possible to achieve both comfortable air permeability and a sufficient filtering effect against dust and pollen. .

1 is an external view of a pollen mask using a functional microfilter according to a first embodiment of the present invention. It is a figure for demonstrating the structure of the mask main body with which the pollen mask shown in FIG. 1 is provided.

Embodiment 1 FIG.
FIG. 1 shows an appearance of a pollen mask 10 using a functional microfilter according to Embodiment 1 of the present invention. The pollen mask 10 has a mask body 12. The mask main body 12 is formed in a substantially rectangular shape in the initial state, and can be changed into a three-dimensional shape having a convex central portion by the effect of a plurality of pleats cut longitudinally in the longitudinal direction. A strap 14 is attached to each of the two sides of the mask body 12.

  FIG. 2 is a view for explaining the structure of the mask body 12. The mask main body 12 includes a mask surface layer 16 that is exposed to the outside air side when worn. The mask surface layer 16 is made of gauze or non-woven fabric.

  An ultrathin mask filter 18 is disposed on the back surface side of the mask surface layer 16, that is, on the mounting surface side that is the human body side when mounted. The ultra-thin mask filter 18 is configured by thinly stretching a fluororesin film, and its film pressure is 0.03 μm. The ultra-thin mask filter 18 configured in this manner can prevent 99.9% of the passage of dust, pollen, dust, bacteria, and the like existing in the natural world while maintaining sufficient air permeability.

  A mask mounting surface layer 20 is arranged on the mounting surface side of the ultrathin mask filter 18. Similarly to the mask surface layer 16, the mask mounting surface layer 20 is made of gauze or non-woven fabric. That is, in this embodiment, the mask main body 12 has a structure in which the ultrathin mask filter 18 is sandwiched between two pieces of gauze or nonwoven fabric.

  Since the pollen mask 10 using the functional microfilter according to the present embodiment is configured as described above, it exhibits a sufficient filtering effect against dust, pollen, bacteria, etc. while ensuring sufficient air permeability. can do. For this reason, according to the pollen mask 10 of this embodiment, a comfortable wearing feeling and the outstanding air purifying effect can be provided to a user simultaneously.

Embodiment 2. FIG.
Next, a second embodiment of the present invention will be described.
In the first embodiment described above, the ultra-thin mask filter 18 is composed of only a 0.03 μm fluororesin film. On the other hand, the second embodiment is characterized in that the ultra-thin mask filter is composed of the above-described fluororesin filter and two non-woven fabrics sandwiching it. Except for this point, the pollen mask of the present embodiment is the same as the pollen mask 10 of the first embodiment.

  A 0.03 micron fluororesin film alone is not always easy to handle. On the other hand, the filter used in this embodiment, that is, a filter having a configuration in which a 0.03 μ fluororesin film is sandwiched between two nonwoven fabrics is not easily wrinkled and easy to handle with bare hands. . For this reason, according to the structure of the present embodiment, for example, the ultrathin mask filter is transported and stored in a hermetically packaged state, and the user attaches the ultrathin mask filter to the mask surface layer 16 during use. An operation such as disposing between the mask mounting surface layers 20 can be employed without resistance. Thus, according to the pollen mask of the present embodiment, the degree of freedom regarding the handling of the pollen mask can be increased as compared with the case of the first embodiment.

Embodiment 3 FIG.
Next, a third embodiment of the present invention will be described.
In the first and second embodiments described above, the mask main body 12 is formed by sandwiching an ultrathin mask filter between the mask surface layer 16 and the mask mounting surface layer 20. By the way, in Embodiment 2, it is supposed that an ultra-thin mask filter is comprised by inserting | pinching a fluororesin film with two nonwoven fabrics. In this case, when the ultra-thin mask filter is configured, the mounting surface side of the fluororesin film is already covered with the nonwoven fabric.

  That is, when the ultra-thin mask filter has a three-layer structure including two nonwoven fabrics, even if the mask mounting surface layer 20 is omitted, the fluororesin film does not directly touch the user's skin, and the mounting feeling is improved. It will not be damaged. Therefore, in the pollen mask of this embodiment, the mask mounting surface layer 20 used in Embodiments 1 and 2 is omitted, and the mask surface layer 16 and a three-layer ultrathin mask disposed on the mounting surface side are omitted. The mask body is formed only with the filter.

  According to said structure, compared with the case of Embodiment 1 or 2, the structure of a pollen mask can be simplified, As a result, the side effects, such as the consumption of a nonwoven fabric being reduced, can be reduced. Can be obtained.

10 Pollen Mask 12 Mask Body 16 Mask Surface Layer 18 Ultrathin Mask Filter 20 Mask Wearing Surface Layer

Claims (3)

A mask surface layer made of gauze or non-woven fabric,
An ultrathin mask filter disposed on the mounting surface side of the mask surface layer,
The ultra-thin mask filter includes a fluororesin film having a thickness of 0.03 μm, and a pollen mask using a functional microfilter. The ultra-thin mask filter is
The pollen mask using a functional microfilter according to claim 1, further comprising two nonwoven fabric layers sandwiching the fluororesin film from the front and back.   The pollen mask using a functional microfilter according to claim 1 or 2, comprising a mask mounting surface layer made of gauze or non-woven fabric and sandwiching the ultrathin mask filter from the front and back together with the mask surface layer.

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