JP3159428B2 - Liquid sealing resin - Google Patents
Liquid sealing resinInfo
- Publication number
- JP3159428B2 JP3159428B2 JP30278096A JP30278096A JP3159428B2 JP 3159428 B2 JP3159428 B2 JP 3159428B2 JP 30278096 A JP30278096 A JP 30278096A JP 30278096 A JP30278096 A JP 30278096A JP 3159428 B2 JP3159428 B2 JP 3159428B2
- Authority
- JP
- Japan
- Prior art keywords
- liquid
- epoxy resin
- resin
- sealing resin
- formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Description
【0001】[0001]
【発明の属する技術分野】本発明は、低応力性及び接着
性に優れた液状封止樹脂に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid sealing resin excellent in low stress and adhesiveness.
【0002】[0002]
【従来の技術】近年半導体チップの大型化、パッケージ
の多ピン化、多様化に伴い周辺材料である樹脂材料に対
する信頼性の要求は年々厳しいものとなってきている。
従来はリードフレームに半導体チップを接着しモールド
樹脂で封止したパッケージが主流であったが、多ピン化
の限界からボールグリッドアレイ(BGA)の様なパッ
ケージが増えてきている。BGAはモールド樹脂又は液
状樹脂により封止される。更に表面実装法により実装さ
れるため封止材料はいわゆる耐半田クラック性が要求さ
れる。液状樹脂に関し耐半田クラック性に重要な因子は
1)被着体との接着性、その耐湿信頼性、2)封止樹
脂の靱性(低応力性)、その耐湿信頼性である。1)に
関しては,BGAの基板が有機基板、ソルダーレジス
ト、又は金、ニッケル等のメッキ部分から構成されてい
るためそれらに対する接着性が重要である。しかしこれ
らへの接着性を同時に満たす材料は無かった。一方、
2)に関しては、特にこれまでの液状樹脂は湿度処理時
の靱性低下が出来るだけ少ないことが重要である。靱性
低下に対する検討は多くの研究があるが樹脂骨格に対す
る改良、ポリマーアロイでの改質等が行われているが液
状樹脂に応用するためには、ほとんどの場合樹脂粘度の
上昇を伴い実用化には至っていなかった。2. Description of the Related Art In recent years, as semiconductor chips have become larger, packages have more pins, and diversification, the demand for reliability of resin materials as peripheral materials has been stricter year by year.
Conventionally, a package in which a semiconductor chip is bonded to a lead frame and sealed with a mold resin has been mainstream, but a package such as a ball grid array (BGA) has been increasing due to the limit of increasing the number of pins. The BGA is sealed with a mold resin or a liquid resin. Further, since the sealing material is mounted by a surface mounting method, a so-called solder crack resistance is required. Factors that are important for the solder crack resistance of the liquid resin are 1) adhesion to an adherend and its moisture resistance reliability, 2) toughness (low stress) of the sealing resin, and its moisture resistance reliability. Regarding 1), since the BGA substrate is composed of an organic substrate, a solder resist, or a plated portion of gold, nickel, or the like, adhesion to them is important. However, there was no material satisfying the adhesiveness to these at the same time. on the other hand,
Regarding 2), it is particularly important that the conventional liquid resin has a toughness as low as possible during the humidity treatment. Many studies have been conducted on the reduction of toughness, but improvements to the resin skeleton and modifications with polymer alloys have been performed. Was not reached.
【0003】[0003]
【発明が解決しようとする課題】本発明は、これらの問
題を解決するため鋭意検討した結果、低応力性、接着性
に優れた液状封止樹脂を提供するものである。SUMMARY OF THE INVENTION The present invention, as a result of intensive studies to solve these problems, provides a liquid sealing resin excellent in low stress and adhesiveness.
【0004】[0004]
【発明が解決しようとする課題】本発明は、(A)液状
エポキシ樹脂、(B)式(1)で示されるエポキシ樹脂
(a)と液状芳香族ジアミン(b)との当量比が0.01
〜0.1のもと、予備反応してなる反応生成物(C)絶縁
性無機フィラーを必須成分とすることを特徴とする液状
封止樹脂である。SUMMARY OF THE INVENTION The present invention relates to (A) a liquid epoxy resin, and (B) an epoxy resin (a) represented by the formula (1) and a liquid aromatic diamine (b) having an equivalence ratio of 0.01 to 0.01.
A liquid sealing resin characterized by comprising a reaction product (C) insulating inorganic filler obtained by pre-reaction under 0.1 as an essential component.
【0005】[0005]
【化1】 (ここでR1 ,R2 :2価の炭素数1〜5の脂肪族基、
又は炭素数6以上の芳香族から2個の水素を除いた残基
を示し、互いに同じであっても異なってもよい)Embedded image (Wherein R1 and R2 are divalent aliphatic groups having 1 to 5 carbon atoms,
Or a residue obtained by removing two hydrogen atoms from an aromatic having 6 or more carbon atoms, which may be the same or different from each other)
【0006】本発明で用いられているエポキシ樹脂とし
ては、例えばビスフェノール類のジグリシジルエーテ
ル、フェノールノボラックとエピクロルヒドリンとの反
応で得られるグリシジルエーテルで常温で液状のものが
挙げられる。又これらの液状樹脂にジヒドロキシナフタ
レンのジグリシジルエーテル、テトラメチルビフェノー
ルのジグリシジルエーテル等の結晶性のエポキシ樹脂を
混合し、液状したものを使用することもできる。The epoxy resin used in the present invention includes, for example, diglycidyl ether of bisphenols and glycidyl ether obtained by the reaction of phenol novolak with epichlorohydrin, which is liquid at ordinary temperature. A liquid epoxy resin such as a diglycidyl ether of dihydroxynaphthalene and a diglycidyl ether of tetramethylbiphenol may be mixed with these liquid resins and used as a liquid.
【0007】本発明に用いる式(1)のエポキシ樹脂
は、低弾性率、低吸水性の特徴を有する。式中のR1 ,
R2 の2価の脂肪族基は、炭素数6以上のものは工業化
されていない。本発明のR1 ,R2 としてはプロピレン
が好ましい。又、式(1)より長鎖長のシロキサンユニ
ットを含む式(2)のエポキシ樹脂も工業化されてい
る。The epoxy resin of the formula (1) used in the present invention has characteristics of low elastic modulus and low water absorption. R1 in the formula,
As the divalent aliphatic group represented by R2, those having 6 or more carbon atoms have not been industrialized. R1 and R2 in the present invention are preferably propylene. Further, the epoxy resin of the formula (2) containing a siloxane unit having a long chain length from the formula (1) is also industrialized.
【0008】[0008]
【化2】 (式中、mは1以上の整数)Embedded image (Where m is an integer of 1 or more)
【0009】しかし、この長鎖長のエポキシ樹脂、又は
本発明の方法による反応生成物は低応力性に優れている
ものの接着強度、特に熱時強度が低下するので好ましく
ない。又本発明に用いる液状芳香族ジアミンの例として
は、ジアミノジエチルジフェニルメタン、固型ジアミン
の溶融混合物等が挙げられる。式(1)のエポキシ樹脂
と液状芳香族ジアミンビスフェノール類の反応例として
は、式(1)のエポキシ樹脂(a)と液状芳香族ジアミ
ン(b)との当量比[(a)のエポキシ基のモル数/
(b)のアミン活性水素基のモル数]が0.01〜0.
1で、エポキシ樹脂と液状芳香族ビスフェノール類を混
合し、必要により溶媒を加え80℃以上の条件で反応さ
せる。当量比が0.1を超えると反応生成物の粘度が高
すぎ液状封止樹脂としての機能を果たさない。また、
0.01より小さいと接着性、靱性効果が発現できな
い。[0009] However, the epoxy resin having a long chain length or the reaction product obtained by the method of the present invention is not preferred because it has excellent low stress properties, but lowers the adhesive strength, particularly the strength when heated. Examples of the liquid aromatic diamine used in the present invention include diaminodiethyldiphenylmethane, a molten mixture of solid diamine, and the like. As an example of the reaction between the epoxy resin of the formula (1) and the liquid aromatic diamine bisphenol, the equivalent ratio of the epoxy resin (a) of the formula (1) and the liquid aromatic diamine (b) [ Number of moles /
(B) the number of moles of amine active hydrogen groups] is 0.01 to 0.1.
In step 1, the epoxy resin and the liquid aromatic bisphenol are mixed, and a solvent is added if necessary, and the mixture is reacted at 80 ° C. or higher. If the equivalent ratio exceeds 0.1, the viscosity of the reaction product is too high and does not function as a liquid sealing resin. Also,
If it is less than 0.01, the adhesion and toughness effects cannot be exhibited.
【0010】液状エポキシ樹脂に対する反応物の添加量
は液状エポキシ樹脂の当量1に対し有効アミン活性水素
当量(液状芳香族アミン活性水素当量−式(1)のエポ
キシ樹脂当量)0.9〜1.1であることが好ましい。
この範囲を超えると硬化物の物性が低下するためであ
る。The amount of the reactant to be added to the liquid epoxy resin is from 0.9 to 1. the effective amine active hydrogen equivalent (the liquid aromatic amine active hydrogen equivalent—the epoxy resin equivalent of the formula (1)) per 1 equivalent of the liquid epoxy resin. It is preferably 1.
If the amount exceeds this range, the physical properties of the cured product decrease.
【0011】次に本発明の特性を損なわない限り他の硬
化剤を添加することができる、ノボラック型フェノール
樹脂等のポリフェノール類、及びイミダゾール、ジアザ
化合物、ヒドラジッド化合物、ジシアンジアミド等のア
ミン系化合物等が挙げられる。本発明で用いる絶縁性無
機フィラーの例としては、炭酸カルシウム、シリカ、ア
ルミナ、窒化アルミ等が挙げられる。用途によりこれら
を複数混合してもよいが、信頼性の点でシリカが好まし
い。その添加量は特に制限がないが、 封止樹脂として
の特性(耐湿性、作業性等)を保つため液状封止樹脂の
60重量%〜85重量%であることが好ましい。Polyphenols such as novolak-type phenolic resins and amine-based compounds such as imidazole, diaza compounds, hydrazide compounds, dicyandiamide, etc., to which other curing agents can be added as long as the properties of the present invention are not impaired. No. Examples of the insulating inorganic filler used in the present invention include calcium carbonate, silica, alumina, aluminum nitride and the like. A plurality of these may be mixed depending on the application, but silica is preferred from the viewpoint of reliability. The amount of addition is not particularly limited, but is preferably 60% by weight to 85% by weight of the liquid sealing resin in order to maintain the properties (moisture resistance, workability, etc.) as the sealing resin.
【0012】式(1)で示されるエポキシ樹脂は反応性
が遅いため単に添加だけだと未反応成分として残り物性
低下を招く。本発明によると、式(1)で示される低鎖
長シロキサンユニットを含むエポキシ樹脂を液状芳香族
アミンと予め反応させることにより、未反応成分がほと
んどなく低応力、接着性の優れた液状封止樹脂を得るこ
とができる。Since the epoxy resin represented by the formula (1) has a low reactivity, if it is merely added, it remains as an unreacted component and causes deterioration in physical properties. According to the present invention, by pre-reacting an epoxy resin containing a low-chain-length siloxane unit represented by the formula (1) with a liquid aromatic amine, there is almost no unreacted component, low stress, and liquid sealing excellent in adhesiveness. A resin can be obtained.
【0013】本発明の樹脂組成物は、反応生成物、液状
エポキシ樹脂と無機フィラー、必要に応じて他の硬化
剤、顔料、染料、消泡剤等の添加剤を混合し、真空脱泡
することにより製造することができる。The resin composition of the present invention is prepared by mixing a reaction product, a liquid epoxy resin and an inorganic filler, and if necessary, other additives such as a curing agent, a pigment, a dye, and an antifoaming agent, and subjecting the mixture to vacuum defoaming. It can be manufactured by the following.
【0014】反応生成物の製造例1 下記式(3)のエポキシ樹脂(エポキシ当量181)1
0g、ジアミノジエチルフェニルメタン(アミン活性水
素当量64)200g120℃で3時間反応させた。こ
の生成物を反応生成物(1)とする。Production Example 1 of Reaction Product Epoxy resin of the following formula (3) (epoxy equivalent 181) 1
0 g, 200 g of diaminodiethylphenylmethane (amine active hydrogen equivalent: 64) was reacted at 120 ° C. for 3 hours. This product is referred to as a reaction product (1).
【0015】[0015]
【化3】 Embedded image
【0016】反応生成物の製造例2 製造例1のエポキシ樹脂20g、ジアミノジエチルジフ
ェニルメタン200gを120℃で3時間反応させた。
この生成物を反応生成物(2)とする。Production Example 2 of Reaction Product 20 g of the epoxy resin of Production Example 1 and 200 g of diaminodiethyldiphenylmethane were reacted at 120 ° C. for 3 hours.
This product is referred to as reaction product (2).
【0017】反応生成物の製造例3 下記式(4)のエポキシ樹脂(エポキシ当量330)4
0g、ジアミノジエチルジフェニルメタン200g12
0℃で2時間反応させた。この生成物を反応生成物
(3)とする。Production Example 3 of Reaction Product Epoxy resin of the following formula (4) (epoxy equivalent 330) 4
0 g, diaminodiethyldiphenylmethane 200 g 12
The reaction was performed at 0 ° C. for 2 hours. This product is referred to as reaction product (3).
【0018】反応生成物の製造例4 製造例1のエポキシ樹脂60g、ジアミノジエチルジフ
ェニルメタン200gを120℃で3時間反応させた。
この生成物を反応生成物(4)とする。Production Example 4 of Reaction Product 60 g of the epoxy resin of Production Example 1 and 200 g of diaminodiethyldiphenylmethane were reacted at 120 ° C. for 3 hours.
This product is referred to as reaction product (4).
【0019】[0019]
【化4】 Embedded image
【0020】[0020]
【実施例】本発明を実施例で具体的に説明する。 実施例1-2,比較例1-4 表1の処方に従って秤量し、ミキサーにて混練し液状封
止樹脂を作製した。次に樹脂の特性を把握するため以下
の代用特性を評価した。 (1)接着強度−1:有機基板としてビスマレイミド−
トリアジン(BT)レジン製基板上にソルダーレジスト
(太陽インキ社製PSRー4000/CA−40)を形
成した表面に液状封止樹脂を塗布しその上に2×2mm
角のシリコンチップを載置し160℃、180分で硬化
接着させ、常温における接着力をプッシュプルゲージで
測定した。更にPCT(121℃、96時間)処理後の
常温における接着力を測定した。 (2)接着強度−2:金メッキされた銅製基板上に
(1)と同様にサンプルを作製し、接着強度を測定し
た。 (3)弾性率:100mmX8mmX4mmの試験片を注型で作製
し、万能試験機にて曲げ弾性率を測定した。 (4)破壊靱性:90mm×14mm×7mmの試験片
を注型で作製し、中央にノッチを形成し万能試験機にて
測定した。 上記の測定結果を表1に示す。EXAMPLES The present invention will be specifically described with reference to Examples. Example 1-2, Comparative Example 1-4 A liquid sealing resin was prepared by weighing and kneading with a mixer according to the formulation shown in Table 1. Next, the following substitute characteristics were evaluated in order to grasp the characteristics of the resin. (1) Adhesive strength-1: Bismaleimide as organic substrate
A liquid sealing resin is applied to the surface of a substrate made of a triazine (BT) resin on which a solder resist (PSR-4000 / CA-40 manufactured by Taiyo Ink Co., Ltd.) is formed, and 2 × 2 mm is applied thereon.
The silicon chip at the corner was placed and cured and bonded at 160 ° C. for 180 minutes, and the adhesive force at room temperature was measured with a push-pull gauge. Further, the adhesive strength at room temperature after the PCT (121 ° C., 96 hours) treatment was measured. (2) Adhesion strength-2: A sample was prepared on a gold-plated copper substrate in the same manner as in (1), and the adhesion strength was measured. (3) Elastic modulus: A test piece of 100 mm × 8 mm × 4 mm was prepared by casting, and the bending elastic modulus was measured by a universal testing machine. (4) Fracture toughness: A test piece of 90 mm x 14 mm x 7 mm was prepared by casting, a notch was formed at the center, and measured with a universal testing machine. Table 1 shows the measurement results.
【0021】[0021]
【表1】 [Table 1]
【0022】*1 液状エポキシ樹脂:ビスフェノール
Fエポキシ樹脂(エポキシ当量:170) *2 エポキシ樹脂:式(3)のエポキシ樹脂 *3 カップリング剤:γ−グリシジルプロピルトリメ
トキシシラン *4 溶剤:ブチルセロソルブアセテート *5 シリカ:球状シリカ(平均粒径6ミクロン) (注1)PCT125℃、96時間後(常温) (注2)PCT125℃、96時間後(常温) (注3)PCT125℃、96時間後(常温)* 1 Liquid epoxy resin: bisphenol F epoxy resin (epoxy equivalent: 170) * 2 Epoxy resin: epoxy resin of formula (3) * 3 Coupling agent: γ-glycidylpropyltrimethoxysilane * 4 Solvent: butyl cellosolve acetate * 5 Silica: spherical silica (average particle size: 6 microns) (Note 1) PCT 125 ° C, after 96 hours (normal temperature) (Note 2) PCT 125 ° C, after 96 hours (normal temperature) (Note 3) PCT 125 ° C, after 96 hours ( At normal temperature)
【0023】以上表1に示したように、実施例では吸湿
後もいずれも各被着体に対する接着力を維持しつつ、か
つ破壊靱性値からも示すように低応力性に優れているこ
とがわかる。一方、比較例1では変成していない硬化剤
を用いたため耐湿接着力、破壊靱性値とも劣り、比較例
2では変成するシリコーンエポキシ樹脂の分子量が大き
いため接着性が劣り、比較例3では反応物の粘度が高す
ぎ実用的でない。更に比較例4では単純な添加による組
成物のため硬化性が劣り硬化物性の低下が見られる。As shown in Table 1, in the examples, the adhesive strength to each adherend was maintained after moisture absorption, and the low toughness was excellent as indicated by the fracture toughness value. Understand. On the other hand, in Comparative Example 1, the unmodified denaturing curing agent was used, so that the moisture resistance and the fracture toughness were inferior. In Comparative Example 2, the adhesiveness was inferior because of the large molecular weight of the denatured silicone epoxy resin. Is too high to be practical. Further, in Comparative Example 4, the curability was inferior due to the composition by simple addition, and the curable physical properties were reduced.
【0024】[0024]
【発明の効果】本発明の液状封止樹脂は、低応力性、接
着性に優れ、工業的に有用な液状封止樹脂である。Industrial Applicability The liquid sealing resin of the present invention is an industrially useful liquid sealing resin having excellent low stress properties and adhesiveness.
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 平5−109932(JP,A) 特開 平4−103615(JP,A) 特開 昭60−36527(JP,A) 特開 昭64−81848(JP,A) 特開 昭62−101054(JP,A) 特開 平2−151622(JP,A) 特開 平5−78450(JP,A) 特開 昭63−164451(JP,A) (58)調査した分野(Int.Cl.7,DB名) C08G 59/50 - 59/60 C08L 63/00 - 63/10 H01L 23/29 ──────────────────────────────────────────────────続 き Continuation of the front page (56) References JP-A-5-109932 (JP, A) JP-A-4-103615 (JP, A) JP-A-60-36527 (JP, A) JP-A 64-64 81848 (JP, A) JP-A-62-101054 (JP, A) JP-A-2-151622 (JP, A) JP-A-5-78450 (JP, A) JP-A-63-164451 (JP, A) (58) Field surveyed (Int.Cl. 7 , DB name) C08G 59/50-59/60 C08L 63/00-63/10 H01L 23/29
Claims (1)
(1)で示されるエポキシ樹脂(a)と液状芳香族ジア
ミン(b)との当量比が0.01〜0.1のもと、予備反応
してなる反応生成物、(C)絶縁性無機フィラーを必須
成分とすることを特徴とする液状封止樹脂。 【化1】 (ここでR1 ,R2 :2価の炭素数1〜5の脂肪族基、
又は炭素数6以上の芳香族から2個の水素を除いた残基
を示し、互いに同じであっても異なってもよい)(A) a liquid epoxy resin; (B) an epoxy resin (a) represented by the formula (1) and a liquid aromatic diamine (b) in an equivalent ratio of 0.01 to 0.1, A liquid sealing resin comprising a reaction product obtained by a preliminary reaction and (C) an insulating inorganic filler as essential components. Embedded image (Wherein R1 and R2 are divalent aliphatic groups having 1 to 5 carbon atoms,
Or a residue obtained by removing two hydrogen atoms from an aromatic having 6 or more carbon atoms, which may be the same or different from each other)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP30278096A JP3159428B2 (en) | 1996-11-14 | 1996-11-14 | Liquid sealing resin |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP30278096A JP3159428B2 (en) | 1996-11-14 | 1996-11-14 | Liquid sealing resin |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH10139982A JPH10139982A (en) | 1998-05-26 |
JP3159428B2 true JP3159428B2 (en) | 2001-04-23 |
Family
ID=17913035
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP30278096A Expired - Fee Related JP3159428B2 (en) | 1996-11-14 | 1996-11-14 | Liquid sealing resin |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3159428B2 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002217358A (en) * | 2001-01-12 | 2002-08-02 | Kyocera Corp | Semiconductor device |
-
1996
- 1996-11-14 JP JP30278096A patent/JP3159428B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPH10139982A (en) | 1998-05-26 |
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