JP3153278B2 - Burner device for quartz glass synthesis - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

[Object of the invention]

[0002]

The present invention relates to a hydrogen gas nozzle for discharging hydrogen gas toward a target in a combustion space,
An oxygen gas nozzle arranged inside the hydrogen gas nozzle to discharge oxygen gas toward the target in the combustion space, and a hydrogen gas nozzle arranged together with the oxygen gas nozzle to discharge source gas toward the target in the combustion space In particular, the present invention relates to a quartz glass synthesizing burner apparatus having a raw material gas nozzle for performing a process, and in particular, an oxygen gas nozzle and a raw material gas nozzle are divided into a plurality of sets in the radial direction of a target, and the flow rates of the oxygen gas and the raw material gas are adjusted for each set. The present invention relates to a quartz glass synthesizing burner device which is made possible.

[0003]

2. Description of the Related Art Conventionally, as a burner device for synthesizing this type of quartz glass, a plurality of oxygen gas nozzles are opened inside a hydrogen gas nozzle so as to surround a source gas nozzle opened inside a hydrogen gas nozzle. Had been proposed.

[0004]

[Problems to be Solved] Accordingly, in the conventional burner for synthesizing quartz glass, only a plurality of oxygen gas nozzles are opened so as to surround the source gas nozzle inside the hydrogen gas nozzle. There is a disadvantage that the raw material gas (for example, SiCl ₄ ) is supplied to the hydrogen gas in a lump, and (ii) the raw material gas is difficult to be uniformly mixed with the hydrogen gas and the oxygen gas.
As a result, (iii) OH groups or Cl
There is a disadvantage that the groups are unevenly distributed and optical characteristics are impaired.

Therefore, in order to eliminate these disadvantages, the present invention divides the oxygen gas nozzle and the source gas nozzle into a plurality of sets in the radial direction of the target, and can control the flow rates of the oxygen gas and the source gas for each set. And a quartz glass synthesis burner apparatus.

[0006]

Configuration of the Invention

[0007]

[MEANS FOR SOLVING THE PROBLEMS] A solution of the present invention is to provide a hydrogen gas nozzle for discharging hydrogen gas toward a target in a combustion space, and a hydrogen gas nozzle disposed inside the hydrogen gas nozzle and directing a target between the combustion chambers. In a burner apparatus for synthesizing quartz glass, comprising an oxygen gas nozzle for discharging oxygen gas, and a source gas nozzle arranged together with the oxygen gas nozzle inside the hydrogen gas nozzle and discharging a source gas toward a target in the combustion space. , Oxygen gas nozzles (11a-11d) and source gas nozzles (12a-1)
2d) is divided into a plurality of sets in the radial direction of the target , and a plurality of cylinders are adjusted while the flow rate of each gas is adjusted from a supply source.
After being supplied to the internal space of the member and diffused,
This is a burner device for synthesizing quartz glass, which is supplied to each nozzle .

[0008]

The burner apparatus for synthesizing quartz glass according to the present invention emits hydrogen gas toward a target in a combustion space.
Gas nozzle and the inside of the hydrogen gas nozzle
And release oxygen gas toward the target between the combustion chambers.
Oxygen gas nozzle for discharge and inside of hydrogen gas nozzle
Located with the oxygen gas nozzle in the combustion space
Source gas to discharge the source gas toward the target
In a burner device for synthesizing quartz glass with a chirping,
Oxygen gas nozzle (11a-11d) and source gas nozzle
(12a to 12d) are duplicated in the radial direction of the target.
Each gas is divided into several sets, and each gas is
One, it is supplied to the internal space of multiple cylindrical members and
A stone characterized by being supplied to a plurality of sets of nozzles
Since it is a British glass synthesis burner, it has the function of (i) supplying the raw material gas and oxygen gas uniformly to the hydrogen gas while controlling the flow rate, and (ii) the OH group and C1 group in the synthetic quartz glass. (Iii) acts to improve the optical characteristics of the synthetic quartz glass as a result.

[0009]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, a preferred embodiment of a burner apparatus for synthesizing quartz glass according to the present invention will be described in detail with reference to the accompanying drawings.

However, the embodiments described below are:
It is described for the purpose of facilitating or facilitating the understanding of the present invention and is not described for limiting the present invention.

In other words, each element disclosed in the embodiments described below includes all design changes and equivalent replacements that fall within the spirit and scope of the present invention.

(Description of the accompanying drawings)

FIG. 1 is a longitudinal sectional view taken along the line II for showing one embodiment of a burner apparatus for synthesizing quartz glass according to the present invention.

FIG. 2 is a longitudinal sectional view taken along the line II-II of the embodiment shown in FIG. 1, and the source gas nozzles 12a to 12d are omitted.

FIG. 3 is a sectional view of the embodiment shown in FIG.
FIG. 3 is a vertical and horizontal cross-sectional view taken along a line, showing oxygen gas nozzles 11a to
11d has been omitted.

FIG. 4 is a cross-sectional view of the embodiment shown in FIG. 1 along the line IV-IV.

FIG. 5 is an end view of the embodiment shown in FIG. 1 along the line VV.

FIGS. 6 and 7 are graphs for explaining the operation and effect of the embodiment shown in FIG.

(Configuration of Example)

First, the configuration of an embodiment of a quartz glass synthesizing burner according to the present invention will be described in detail with reference to FIGS.

Reference numeral 10 denotes a burner device for synthesizing quartz glass according to the present invention, and an appropriate oxygen gas supply source (not shown)
After supplying oxygen gas to a plurality of sets (for example, four sets; hereinafter, this case will be described) of the oxygen gas cylinder members 14A to 14D, radially uniform targets (not shown) arranged in the combustion space are supplied. A plurality of (here, four) oxygen gas supply pipes 11A to 11D for discharging from a plurality of oxygen gas nozzles 11a to 11d arranged in the combustion space toward a target (not shown) arranged in the combustion space; After supplying a raw material gas (for example, a silicon compound such as SiCl ₄ or SiH ₄ ) from a raw gas supply source (not shown) to a plurality of sets (here, four sets) of the raw gas cylinder members 15A to 15D, a combustion space is provided. A plurality of source gas supply pipes 12A to 12A for discharging toward a target from a plurality of source gas nozzles 12a to 12d evenly arranged in the radial direction of the target
D.

The oxygen gas nozzles 11a to 11d are respectively
Since it is arranged for the oxygen gas cylinder members 14A to 14D,
It can be treated as being substantially divided into a plurality of sets (here, four sets) in the radial direction of the target. For this reason,
The flow rate of the oxygen gas discharged from the oxygen gas nozzles 11a to 11d can be adjusted for each of the oxygen gas nozzles 11a to 11d (that is, for each set along the radial direction of the target).

The source gas nozzles 12a to 12d are respectively
Since the target gas cylinder members 15A to 15D are provided, the target gas is substantially divided into a plurality of sets (here, four sets) in the radial direction of the target. For this reason, the flow rate of the source gas discharged from the source gas nozzles 12a to 12d can be adjusted for each of the source gas nozzles 12a to 12d (that is, for each set along the radial direction of the target). Incidentally, it is preferable that the number of divided groups of the source gas nozzles 12a to 12d is the same as the number of divided groups of the oxygen gas nozzles 11a to 11d. In other words, the raw material gas nozzle
It is preferable that at least one oxygen gas nozzle 11a to 11d is assigned to each set of 12a to 12d.

The burner apparatus 10 for synthesizing quartz glass according to the present invention further supplies a plurality of oxygen gas nozzles 11a after supplying hydrogen gas from an appropriate hydrogen gas supply source (not shown) to the internal space of the hydrogen gas cylinder member 16. To 11d and a plurality of source gas nozzles 12a to 12d. Two hydrogen gas supply pipes 13A and 13B for discharging from a hydrogen gas nozzle 13a to a target (not shown) in a combustion space are provided. One of the hydrogen gas supply pipes 13A and 13B may be removed.

(Operation of Embodiment)

The operation of a burner apparatus for synthesizing quartz glass according to an embodiment of the present invention will be described in detail with reference to FIGS.

In the quartz glass synthesizing burner apparatus 10 according to the present invention, first, oxygen gas is supplied to a plurality of oxygen gas cylinders through a plurality of oxygen gas supply pipes 11A to 11D while controlling the flow rate from an oxygen gas supply source. It is supplied to the internal space of the members 14A to 14D. The oxygen gas supplied to the internal space of the plurality of oxygen gas cylinder members 14A to 14D is diffused and then discharged toward the target in the combustion space via the plurality of sets of oxygen gas nozzles 11a to 11d.

In the quartz glass synthesizing burner apparatus 10 according to the present invention, a plurality of raw material gas cylinder members 15A to 15D are respectively controlled while controlling a flow rate from a raw material gas supply source through a plurality of raw gas supply pipes 12A to 12D. Is supplied to the internal space. Appropriate source gas supplied to the internal space of the plurality of source gas cylinder members 15A to 15D is diffused, and then discharged toward the target in the combustion space via the plurality of sets of source gas nozzles 12a to 12d. . Thereby, the supply amount of the raw material gas can be suitably controlled with respect to the oxygen gas in the combustion space.

In the quartz glass synthesizing burner apparatus 10 according to the present invention, in addition, the hydrogen gas is supplied from the hydrogen gas supply source via at least one hydrogen gas supply pipe 13A, 13B while the flow rate of the hydrogen gas is adjusted from the hydrogen gas supply member 13A. Is supplied to the internal space. The hydrogen gas supplied to the internal space of the hydrogen gas cylinder member 16 is diffused, and then directed to the combustion space through the hydrogen gas nozzle 13a and around the plurality of oxygen gas nozzles 11a to 11d and the plurality of source gas nozzles 12a to 12d. After moving, it is released towards the target in the combustion space. As a result, the hydrogen gas is suitably supplied to the oxygen gas in the combustion space, and is stably burned to achieve a high temperature state.

Therefore, according to the quartz glass synthesizing burner apparatus 10 of the present invention, since the raw material gas is suitably supplied to the oxygen gas and the hydrogen gas, the raw material gas can be sufficiently heated and the synthetic quartz The distribution of OH groups and Cl groups in the glass can be controlled, and its optical characteristics can be improved.

(Specific Example)

In addition, an embodiment of the burner device for synthesizing quartz glass according to the present invention will be described with specific numerical values and the like in order to deepen the understanding. Here, the center of the burner device for synthesizing quartz glass according to the present invention is matched with the rotation center of the target in the combustion space.

The raw material gas (here, SiCl ₄ ) is supplied to the four raw material gas cylinder members arranged in the radial direction of the target together with the carrier gas at a rate of 5 g / min. On the other hand, the material gas was discharged toward the target together with the carrier gas from the two material gas nozzles arranged in the radial direction of the target. At this time, the total release amount of the raw material gas was 20 g / min.

[0034] Oxygen gas, 1 m ³ / time to four oxygen gas cylinder member arranged along the radial direction of the target, 2m ³
/ H, 2m ³ / h and 1m ³ / h each, then 4
Oxygen gas nozzles arranged in four rows of three raw material gas cylinder members each along the radial direction of the target were discharged toward the target. At this time, the total amount of released oxygen gas was 6 m ³ / hour.

The hydrogen gas was discharged from the hydrogen gas nozzle toward the target at a rate of 12 m ³ / hour.

The concentration distribution of OH groups and Cl groups in the quartz glass ingot synthesized with the target in the combustion space was smaller at the center of the target (and thus the ingot) than at the periphery (see FIGS. 6 and 7). . Correspondingly, the refractive index of the synthetic quartz glass was lower at the center of the ingot than at the periphery.

[0037]

As is apparent from the above description, the burner apparatus for synthesizing quartz glass according to the present invention has a target in a combustion space.
Hydrogen gas nozzle for discharging hydrogen gas toward
And is located inside the hydrogen gas nozzle and between the combustion chamber
Oxygen gas for releasing oxygen gas toward the target
The nozzle and the oxygen gas nozzle inside the hydrogen gas nozzle
Raw material for the target in the combustion space
A quartz gas provided with a source gas nozzle for discharging gas;
In the burner device for lath synthesis, the oxygen gas nozzle (11
a to 11d) and the source gas nozzles (12a to 12d)
Divided into multiple sets in the radial direction of the target,
While the flow rate is adjusted from the supply source, the inside of
After being supplied to the space and diffused, it is
Burner device for quartz glass synthesis characterized by being supplied
Because it is location, (i) it has the effect of a raw material gas and oxygen gas to hydrogen gas can be uniformly supplied while controlling the flow rate and thus (ii) control the distribution of OH groups and C1 groups in the synthetic quartz glass At least at the center of the ingot, and consequently (iii) has the effect of improving the optical characteristics of the synthetic quartz glass.

[Brief description of the drawings]

FIG. 1 is a longitudinal sectional view taken along the line II for showing one embodiment of a burner device for synthesizing quartz glass according to the present invention.

FIG. 2 is a longitudinal sectional view taken along the line II-II of the embodiment shown in FIG.

FIG. 3 is a longitudinal sectional view taken along the line III-III of the embodiment shown in FIG. 1;

FIG. 4 is a cross-sectional view taken along the line IV-IV of the embodiment shown in FIG.

FIG. 5 is an end view along the line VV of the embodiment shown in FIG. 1;

FIG. 6 is a graph showing the operation and effect of the embodiment shown in FIG. 1;

FIG. 7 is a graph showing the operation and effect of the embodiment shown in FIG. 1;

[Explanation of Signs] 10 ········································································· ... Oxygen gas nozzles 12A to 12D ... Raw material gas supply pipes 12a to 12d ... Raw gas nozzles 13A and 13B ... ... Hydrogen gas supply pipe 13a ... Hydrogen gas nozzles 14A to 14D ... Oxygen gas cylinder member 15A ~ 15D ・ ・ ・ ・ ・ ・ ・ ・ ・ ・ Material gas cylinder member 16 ・ ・ ・ ・ ・ ・ ・ ・ ・ Hydrogen gas cylinder member

──────────────────────────────────────────────────続 き Continued on the front page (58) Field surveyed (Int. Cl. ⁷ , DB name) C03B 8/00-8/04 C03B 37/00-37/16

Claims (1)

(57) [Claims] 1. A hydrogen gas nozzle for discharging hydrogen gas toward a target in a combustion space, and an oxygen gas nozzle disposed inside the hydrogen gas nozzle for discharging oxygen gas toward a target between the combustion chambers. A quartz gas synthesizing burner device having a source gas nozzle disposed inside the hydrogen gas nozzle together with the oxygen gas nozzle and discharging the source gas toward the target in the combustion space, wherein the oxygen gas nozzle and the source gas nozzle Divided into multiple sets in the radial direction and each gas is supplied
While controlling the flow rate from the source,
After being supplied and diffused, it is supplied to each set of nozzles.
A burner device for synthesizing quartz glass.