JP3149630B2 - Solid-state imaging device and manufacturing method thereof - Google Patents

Solid-state imaging device and manufacturing method thereof

Info

Publication number
JP3149630B2
JP3149630B2 JP15668393A JP15668393A JP3149630B2 JP 3149630 B2 JP3149630 B2 JP 3149630B2 JP 15668393 A JP15668393 A JP 15668393A JP 15668393 A JP15668393 A JP 15668393A JP 3149630 B2 JP3149630 B2 JP 3149630B2
Authority
JP
Japan
Prior art keywords
resin
solid
imaging device
state imaging
bumps
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP15668393A
Other languages
Japanese (ja)
Other versions
JPH0738072A (en
Inventor
稔 平野
孝尚 鈴木
達樹 塚田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Corp
Panasonic Holdings Corp
Original Assignee
Panasonic Corp
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Panasonic Corp, Matsushita Electric Industrial Co Ltd filed Critical Panasonic Corp
Priority to JP15668393A priority Critical patent/JP3149630B2/en
Publication of JPH0738072A publication Critical patent/JPH0738072A/en
Application granted granted Critical
Publication of JP3149630B2 publication Critical patent/JP3149630B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は固体撮像素子を使用した
固体撮像装置に関するもので、オンチップレンズ機能付
き固体撮像素子を備える固体撮像装置の小型化、小径化
に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a solid-state imaging device using a solid-state imaging device, and more particularly, to a reduction in the size and diameter of a solid-state imaging device having a solid-state imaging device with an on-chip lens function.

【0002】[0002]

【従来の技術】図4はオンチップレンズの機能を備える
固体撮像装置に関する従来例を示すものである。以下図
面に基づいて説明する。
2. Description of the Related Art FIG. 4 shows a conventional example of a solid-state imaging device having an on-chip lens function. This will be described below with reference to the drawings.

【0003】リードフレーム6上に搭載され且つボンデ
ィングワイヤー8にて配線された固体撮像素子1と、こ
の固体撮像素子1の上面に設けられたオンチップスレン
ズ9とを一体封止した透明樹脂5とから成る固体撮像装
置であって、リードフレーム6上の固体撮像素子1を囲
む状態で支持枠2を設け、この支持枠2の上面に光透過
用ガラス4を装着することで、オンチップレンズ9と前
記光透過用ガラス4との間に空間7を形成し、オンチッ
プレンズ9の機能を損なわないようにした固体撮像装置
である。
A transparent resin 5 integrally mounted on a solid-state image sensor 1 mounted on a lead frame 6 and wired by bonding wires 8 and an on-chip lens 9 provided on the upper surface of the solid-state image sensor 1 A supporting frame 2 is provided so as to surround the solid-state imaging device 1 on a lead frame 6, and a light transmitting glass 4 is mounted on an upper surface of the supporting frame 2, whereby an on-chip lens 9 is formed. This is a solid-state imaging device in which a space 7 is formed between the light transmitting glass 4 and the light transmitting glass 4 so as not to impair the function of the on-chip lens 9.

【0004】図5は小型化、小径化した固体撮像装置に
関する従来例を示すものである。以下図面に基づいて説
明する。
FIG. 5 shows a conventional example of a solid-state imaging device having a small size and a small diameter. This will be described below with reference to the drawings.

【0005】オンチップレンズ9付き固体撮像素子1の
電極部6aに、フイルムキャリア2のインナーリード3
を接合し、オンチップレンズ9付き固体撮像素子1に光
透過用ガラス4が接着層5を介して装着され、オンチッ
プレンズ9付き固体撮像素子1に接着された駆動回路ブ
ロック6の電極部6aにフイルムキャリア2のアウター
リード7をはんだ接合し、外装シャーシ8に収納、密封
した小型化、小径化された固体撮像装置である。
[0005] The inner lead 3 of the film carrier 2 is attached to the electrode 6a of the solid-state imaging device 1 with the on-chip lens 9.
Bonding the light transmitting glass 4 is mounted via the adhesive layer 5 to the on-chip pre-lens 9 with the solid-state imaging device 1, on-
Soldered outer leads 7 of the film carrier 2 to the electrode portion 6a of the drive circuit block 6 adhered to the pre-lens 9 with the solid-state imaging device 1, and housed in the exterior chassis 8, sealed compact, small diameter solid imaging Device.

【0006】これらの固体撮像装置は例えば特開平5−
13738号公報に開示されたものがある。
These solid-state imaging devices are disclosed in, for example,
No. 13738.

【0007】[0007]

【発明が解決しようとする課題】しかしながら、図4の
従来例では固体撮像素子1と光透過用ガラス4とのギァ
ップは数10ミクロンであって、オンチップレンズ9の
機能は損なわれていないが、空間7を形成するための支
持枠2が固体撮像素子1の外側にあるため、装置全体を
小型化することができない。また支持枠2が積層された
セラミックスで形成されたものもあるが、高価であって
実用的でない。さらに、この支持枠2は固体撮像素子1
と光透過用ガラス4とのギャップを決めるスペーサとし
ての機能を有するためその厚み制御が必要であって、さ
らに固体撮像素子1をシーリングするシーリング材の役
割も兼ねているため、隙間がないように相当の幅をもっ
て、しかも平板形状に形成することが必要であった。そ
のため、固体撮像素子1と光透過用ガラス4とのギャッ
プ制御が難しく、支持枠2の占有面積も大きいという課
題を有していた。
In the prior art shown in FIG. 4, however, the gap between the solid-state imaging device 1 and the light transmitting glass 4 is several tens of microns, and the function of the on-chip lens 9 is not impaired. Since the support frame 2 for forming the space 7 is outside the solid-state imaging device 1, the entire device cannot be downsized. There is also a case where the support frame 2 is formed of laminated ceramics, but it is expensive and not practical. Further, the support frame 2 is used for the solid-state imaging device 1.
As a spacer to determine the gap between the light transmitting glass 4
It is necessary to control its thickness because it has all the functions.
Further, the role of a sealing material for sealing the solid-state imaging device 1
It also has a considerable width so that there is no gap
In addition, it was necessary to form it in a flat plate shape. So
Therefore, the gap between the solid-state imaging device 1 and the light transmitting glass 4
Control is difficult and the area occupied by the support frame 2 is large.
Had the title.

【0008】また、図5の従来例ではフイルムキャリア
2のアウターリード7を固体撮像素子1の近傍で概略9
0°に折り曲げた後、駆動回路ブロック6の電極部6a
にはんだ接合する構造になっているので、小型化、小径
化はされるがオンチップレンズ9付き固体撮像素子1と
光透過用ガラス4との間に接着層5が介在するので、接
着層5がオンチップレンズ9を覆ってしまうため、オン
チップレンズ9の機能が損なわれてしまうなどに問題点
を有していた。
In the conventional example shown in FIG. 5, the outer lead 7 of the film carrier 2 is moved approximately 9 near the solid-state image pickup device 1.
After bending to 0 °, the electrode portion 6a of the drive circuit block 6
Although the size is reduced and the diameter is reduced because the structure is such that the bonding layer 5 is interposed between the solid-state imaging device 1 with the on-chip lens 9 and the light transmitting glass 4, the bonding layer 5 is formed. However, this has a problem in that the function of the on-chip lens 9 is impaired because it covers the on-chip lens 9.

【0009】本発明の一の目的とするところは、オンチ
ップレンズの機能を損なうことなく小型化、小径化され
た光透過用部材を備える固体撮像装置を提供することに
ある。
An object of the present invention is to provide a solid-state imaging device having a light transmitting member that is reduced in size and diameter without impairing the function of the on-chip lens.

【0010】本発明の他の目的とするところは、オンチ
ップレンズの機能を損なうことがない光透過用部材を備
える固体撮像装置の製造方法を提供することにある。
Another object of the present invention is to provide a method of manufacturing a solid-state imaging device having a light transmitting member that does not impair the function of an on-chip lens.

【0011】[0011]

【課題を解決するための手段】この一の目的を達成する
ために本発明の固体撮像装置は、上面にオンチップレン
ズを設けた固体撮像素子の上方に、前記固体撮像素子の
面上で、かつ受光領域外に設けられた複数の樹脂バンプ
を介して光透過用部材を設けることにより前記光透過用
部材と前記固体撮像素子との間に空間を形成し、さらに
前記複数の樹脂バンプの側面全周を樹脂でシーリング
たことを特徴とする。
In order to achieve this object, a solid-state imaging device according to the present invention comprises a solid-state imaging device having an on-chip lens provided on an upper surface thereof .
On the surface, and a space is formed between said light transmissive member a solid-state imaging device by providing a light transmitting member through a plurality of resin bumps provided outside the light receiving area, further
The entire periphery of the side surfaces of the plurality of resin bumps is sealed with resin .

【0012】また他の目的を達成するために本発明の固
体撮像装置の製造方法は、上面にオンチップレンズを設
けた固体撮像素子の受光領域外の面上に光硬化樹脂を滴
下し、前記光硬化樹脂に光透過用部材を接合し、前記
硬化樹脂を硬化して複数の樹脂バンプを形成するととも
に、前記複数の樹脂バンプを介して前記固体撮像素子と
前記光透過用部材とを接合し、さらに前記複数の樹脂バ
ンプの側面全周を樹脂でシーリングするようにしたこと
を特徴とする。
According to another aspect of the present invention, there is provided a method for manufacturing a solid-state imaging device, comprising: dropping a photocurable resin on a surface outside a light receiving region of a solid-state imaging device provided with an on-chip lens on an upper surface; bonding the light transmitting member in the light-curing resin, thereby forming a plurality of resin bumps by curing the photocurable resin, bonding the members for optical transmission and the solid-state imaging device via a plurality of resin bumps And the plurality of resin buses.
The entire periphery of the pump is sealed with resin .

【0013】また、より好ましい本発明の固体撮像装置
の製造方法は、上面にオンチップレンズを設けた固体撮
像素子の受光領域外の面上に光硬化樹脂を滴下し、一旦
前記光硬化樹脂を硬化して一段目となる複数の樹脂バン
プを形成した後、さらに前記複数の樹脂バンプ上に光硬
化樹脂を滴下して、前記光硬化樹脂に光透過用部材を接
合し、前記光硬化樹脂を硬化して前記複数の樹脂バンプ
を多段に形成するとともに、前記複数の樹脂バンプを介
して固体撮像素子と光透過用部材とを接合し、さらに前
記複数の樹脂バンプの側面全周を樹脂でシーリングする
ようにしたことを特徴とする。
Further , a more preferred solid-state imaging device of the present invention
The solid-state imaging method with an on-chip lens on the top
Drop the photocurable resin on the surface outside the light receiving area of the image element, and once
A plurality of resin vans, which are obtained by curing the photocurable resin to form a first stage.
After forming the bumps, light hardening is further performed on the plurality of resin bumps.
A light transmitting member is contacted with the photocurable resin by dropping a curing resin.
And curing the photo-curable resin to form the plurality of resin bumps.
Are formed in multiple stages, and through the plurality of resin bumps.
To join the solid-state imaging device and the light transmitting member,
Seal all sides of multiple resin bumps with resin
It is characterized by doing so.

【0014】[0014]

【作用】この構成によって、複数の樹脂バンプは、光透
過用部材を支えて、光透過用部材と固体撮像素子との間
のギャップを保つスペーサとして作用する。樹脂バンプ
からなるスペーサは、平板形状のスペーサに比べてその
塗布量が少なくてすむために、所定のギャップをもって
固体撮像素子上に光透過用部材を接合しても樹脂バンプ
の広がりは小さく、ギャップの制御は容易になる。ま
た、樹脂バンプの占有面積が小さくなることから、限ら
れた固体撮像素子面を有効利用できる。また、光透過用
部材と固体撮像素子を接合する複数の樹脂バンプの側面
全周をシーリングする樹脂は、すでに樹脂バンプにより
適度なギャップが確保された後に形成することができる
ので、固体撮像素子と光透過部材との距離を決定するス
ペーサとして作用させる必要がなく、その樹脂厚みは制
御不要で、塗布面積は小さくでき、シーリング材の形成
は容易で、オンチップレンズの機能性能を損なうことな
く小型化、小径化された、オンチップレンズ付き固体撮
像装置の実現が可能となる。
According to this structure, the plurality of resin bumps can be made transparent.
Support the excess member, and between the light transmission member and the solid-state image sensor.
Act as a spacer to keep the gap of Resin bump
The spacer consisting of
With a predetermined gap, a small amount of coating is required.
Even if a light transmitting member is joined to the solid-state image sensor, resin bumps
The spread of the gap is small, and the gap can be easily controlled. Ma
In addition, since the area occupied by the resin bumps is reduced,
The used solid-state imaging device surface can be used effectively. Also for light transmission
Side surfaces of multiple resin bumps joining the member and the solid-state image sensor
The resin that seals the entire circumference has already been
Can be formed after an appropriate gap is secured
Therefore, the distance between the solid-state imaging device and the light transmitting member is determined.
There is no need to act as a pacer, and the resin thickness is controlled.
No need for control, application area can be reduced, and sealing material is formed
Thus, a solid-state imaging device with an on-chip lens having a small size and a small diameter can be realized without deteriorating the functional performance of the on-chip lens.

【0015】また、この製造方法によって、複数の樹脂
バンプが光透過用部材を支えて、固体撮像素子と光透過
用部材とが一定の距離を保って接合されるとともに、ス
ペーサの占有面積が小さく形成でき、限られた固体撮像
素子面を有効利用できる。また、この製造方法では、光
透過用部材と固体撮像素子を接合する樹脂バンプの側面
全周をシーリングする樹脂には、スペーサとしての役割
が必要ないため、その樹脂厚みの制御は不要で、塗布面
積は小さくでき、シーリング材の形成が容易でオンチッ
プレンズの機能性能を損なうことがない。
Further , according to this manufacturing method, the plurality of resin bumps support the light transmitting member, and the solid-state image pickup device and the light transmitting member are joined while maintaining a fixed distance.
Limited occupation area of the pacer and limited solid-state imaging
The element surface can be used effectively. Also, in this manufacturing method, light
Side surface of the resin bump that joins the transmission member and the solid-state image sensor
Resin that seals the entire circumference serves as a spacer
No need to control the thickness of the resin,
The product can be made small, the sealing material can be easily formed , and the functional performance of the on-chip lens is not impaired.

【0016】[0016]

【実施例】(実施例1) 以下本発明の第一の実施例について、図面を参照しなが
ら説明する。
(Embodiment 1) Hereinafter, a first embodiment of the present invention will be described with reference to the drawings.

【0017】図1は、本発明の第一の実施例におけるフ
イルムキャリア実装のオンチップレンズ付き固体撮像装
置の概略断面図である。図において1は固体撮像素子、
4は光透過用部材である光透過用ガラス、10は複数形
成された樹脂バンプ、15は空間である。
FIG. 1 is a schematic sectional view of a solid-state imaging device with an on-chip lens mounted on a film carrier according to a first embodiment of the present invention. In the figure, 1 is a solid-state imaging device,
4 is a light transmitting glass which is a light transmitting member, and 10 is a plural form.
The formed resin bumps 15 are spaces.

【0018】上面にオンチップレンズ9を設けた固体撮
像素子1には、駆動回路ブロック6が接着されており、
この駆動回路ブロック6の電極部6aにフイルムキャリ
ア2のインナーリード3が接合されている。またこの電
極部6aにはフイルムキャリア2のアウターリード7が
はんだ接合されて、外装シャーシ8に収納、密封されて
いる。
A drive circuit block 6 is adhered to the solid-state imaging device 1 having an on-chip lens 9 provided on the upper surface.
The inner leads 3 of the film carrier 2 are joined to the electrode portions 6a of the drive circuit block 6. The outer leads 7 of the film carrier 2 are soldered to the electrode portions 6a, and are housed and sealed in the exterior chassis 8.

【0019】固体撮像素子1の受光領域を除いた固体撮
像素子1面上には、複数の樹脂バンプ10が形成されて
おり、これらの樹脂バンプ10を介して固体撮像素子1
に光透過用ガラス4が装着され、固体撮像素子1面上に
空間15が形成されている。
The solid-state imaging device 1 of the light-receiving region excluding solid-state imaging device 1 on the surfaces of the plurality of resin bumps 10 are formed, the solid-state imaging device 1 via these resin bump 10
A glass 15 for light transmission is mounted on the solid-state imaging device 1, and a space 15 is formed on the surface of the solid-state imaging device 1.

【0020】次に、上記の固体撮像装置の製造工程を模
式的に示す図2を用いて本発明の製造方法を説明する。
Next, a manufacturing method of the present invention will be described with reference to FIG.

【0021】まず固体撮像素子1の電極6aに接合した
フイルムキャリア2のインナーリード3の上面に選択的
光硬化樹脂10を滴下する。この時滴下領域は固体撮
像素子1の受光領域を除いた固体撮像素子1面上になっ
ている(図2(a))。
First, the upper surface of the inner lead 3 of the film carrier 2 joined to the electrode 6a of the solid-state imaging device 1 is selectively
The photocurable resin 10 is dropped. At this time, the drop region is on the surface of the solid-state imaging device 1 excluding the light-receiving region of the solid-state imaging device 1 (FIG. 2A).

【0022】次に光透過用ガラス4をオンチップレンズ
9からの距離が一定になるまで、例えば200〜300
ミクロンまで下降させ、光硬化樹脂10と光透過用ガラ
ス4とを接触させる(図2(b))。
Next, the light transmission glass 4 is moved until the distance from the on-chip lens 9 becomes constant, for example, 200 to 300.
Then, the light-curing resin 10 is brought into contact with the glass for light transmission 4 (FIG. 2B).

【0023】次に光照射をして光硬化樹脂10を硬化さ
せることにより、複数の樹脂バンプ10が形成されると
ともに、光透過用ガラス4と固定撮像素子1が接合され
て固体撮像素子1面上に空間15が形成される(図2
(c))。
Next, a plurality of resin bumps 10 are formed by irradiating light to cure the photo-curable resin 10, and the light transmitting glass 4 and the fixed image pickup device 1 are joined to form a solid image pickup device 1 surface. A space 15 is formed above (FIG. 2
(C)).

【0024】さらに、複数の樹脂バンプ10の隙間から
ごみの侵入を防ぐために、光透過用ガラス4付き固体撮
像素子1の側面全周を樹脂11で覆い前記隙間をシーリ
ングする(図2(d))。
Further, in order to prevent dust from entering through gaps between the plurality of resin bumps 10, the entire periphery of the side surface of the solid-state imaging device 1 with the glass for light transmission 4 is covered with resin 11 and the gap is sealed (FIG. 2D). ).

【0025】次に固体撮像素子1と駆動ブロック6を接
合し、フイルムキャリア2のアウターリード7と駆動ブ
ロック6の電極部6aとをはんだ接合する(図2
(e))。
Next, the solid-state imaging device 1 and the drive block 6 are joined, and the outer leads 7 of the film carrier 2 and the electrode portions 6a of the drive block 6 are joined by soldering (FIG. 2).
(E)).

【0026】以上により撮像ユニットAが完成し、次に
この撮像ユニットAを外装シャーシ8に収納し、両開口
部を光学ガラス12と封止板13でと樹脂封止して(図
2(f))、図1に示した固体撮像装置を得る。
The imaging unit A is completed as described above. Next, the imaging unit A is housed in the exterior chassis 8, and both openings are resin-sealed with the optical glass 12 and the sealing plate 13 (FIG. 2 (f)). )) To obtain the solid-state imaging device shown in FIG.

【0027】尚、光透過用ガラス4の代わりに光透過用
樹脂を用いてもよく、光学ガラス12は光学フィルター
でもよい。
The light transmitting resin may be used instead of the light transmitting glass 4, and the optical glass 12 may be an optical filter.

【0028】このように第一の実施例によれば、固体撮
像素子1の受光領域外の固体撮像素子1面上と光透過用
ガラス4との間に複数の樹脂バンプ10が介在し、空間
15が形成されており、さらに複数の樹脂バンプの隙間
を埋めるように樹脂バンプの側面全周がシーリングされ
いるため、オンチップレンズ9の機能を損なうことな
く小型化、小径化された、オンチップレンズ9付き固体
撮像装置の実現が可能となる。
As described above, according to the first embodiment, the plurality of resin bumps 10 are interposed between the surface of the solid-state imaging device 1 outside the light receiving region of the solid-state imaging device 1 and the glass 4 for light transmission. 15 are formed , and a gap between a plurality of resin bumps is further formed.
The entire side of the resin bump is sealed to fill
And for which, compact without impairing the function of the on-chip lens 9, which is smaller in diameter, it is possible to realize the on-chip lens 9 with the solid-state imaging device.

【0029】(実施例2) 光透過部材を有する固体撮像装置は、光透過用部材の下
面(固体撮像素子側に近い面)にきず或いはごみ等が付
着した場合、光透過用部材の下面と固体撮像素子との距
離を十分長く保つことにより、きず、ごみの像が固体撮
像素子面上で焦点を結ばず、従ってきず、ごみが目立ち
にくくなり、不良率が大幅に下がる。そのためには高い
バンプを形成すればよく、一例として二段バンプの実施
例について説明する。
(Embodiment 2) In the solid-state imaging device having a light transmitting member, when a flaw or dust adheres to the lower surface of the light transmitting member (surface close to the solid-state image sensor side), the lower surface of the light transmitting member is removed. By keeping the distance from the solid-state image sensor sufficiently long, the image of the flaws and dust does not focus on the surface of the solid-state image sensor, so that the flaws and dust are less noticeable, and the defect rate is greatly reduced. For this purpose, a high bump may be formed, and an example of a two-stage bump will be described as an example.

【0030】図3は樹脂バンプを二段にする場合の製造
工程を模式的に示したものである。先ず、一段目のバン
プを形成するために固体撮像素子1の電極に接合したイ
ンナーリード3の上面に選択的に光硬化樹脂10を滴下
する。この時、滴下領域は固体撮像素子1の受光領域を
除いた固体撮像素子1面上になっている(図3
(a))。
FIG. 3 schematically shows a manufacturing process when the resin bumps are formed in two stages. First, a photo-curing resin 10 is selectively dropped on the upper surface of the inner lead 3 joined to the electrode of the solid-state imaging device 1 to form the first-stage bump. At this time, the drop region is on the surface of the solid-state imaging device 1 excluding the light-receiving region of the solid-state imaging device 1 (FIG. 3).
(A)).

【0031】次に光照射をして光硬化樹脂10を硬化さ
せることにより一段目の樹脂バンプ10を複数形成する
(図3(b))。
[0031] Next, the light irradiation for forming a plurality of resin bumps 10 of the first stage by curing the photocurable resin 10 (Figure 3 (b)).

【0032】次に、一段目の樹脂バンプ10の上に二段
目の樹脂バンプ14を形成するために、一段目と同じ光
硬化樹脂14を一段目のバンプの上に選択的に滴下す
る。(図3(c))。
Next, in order to form the second-stage resin bump 14 on the first-stage resin bump 10, the same photo-curing resin 14 as the first-stage resin bump is selectively dropped on the first-stage bump . (FIG. 3 (c)).

【0033】以下は、第一の実施例で示した(図2
(b))以降と同じ製造方法によって、二段の樹脂バン
プ10、14に光透過用ガラス4をオンチップレンズ9
との距離を例えば500ミクロンに保つようにして接着
し、光硬化樹脂14を硬化する(図3(d))。
The following is shown in the first embodiment (FIG. 2)
(B)) The light transmitting glass 4 is placed on the two-stage resin bumps 10 and 14 by the same manufacturing method as that described below.
Is adhered so as to keep the distance to, for example, 500 microns, and the photocurable resin 14 is cured (FIG. 3D).

【0034】このように第二の実施例によれば固体撮像
素子1と光透過用ガラス4との距離を十分に長くとるこ
とができて、前述した通り光透過用ガラス4の下面にき
ず或いはごみが付着した場合でも目立ちにくくなり、ご
み、きずの不良率が大幅に下がる。
As described above, according to the second embodiment, the distance between the solid-state image pickup device 1 and the light transmitting glass 4 can be made sufficiently long. Even if dust adheres, it becomes less noticeable, and the defective rate of dust and flaws is greatly reduced.

【0035】[0035]

【発明の効果】本発明によれば、複数の樹脂バンプが光
透過用部材を支えるために、固体撮像素子の面上に厚み
の均一なスペーサを平面形状に形成する必要がなくな
り、光透過用部材と固体撮像素子との間に一定の距離を
保つことが容易となるとともに、スペーサとして作用す
る樹脂バンプの占有面積は小さくできるので、限られた
固体撮像素子面を有効利用できる。また、複数の樹脂バ
ンプの側面全周をシーリングする樹脂は、固体撮像素子
と光透過部材との距離を決定するスペーサとして作用さ
せる必要がないため、その樹脂厚みは制御不要で、塗布
面積は小さくでき、シーリング材の形成は容易にでき
て、オンチップレンズの機能性能を損なうことなく小型
化、小径化された、オンチップレンズ付き固体撮像装置
の実現が可能となる。
According to the present invention, a plurality of resin bumps are
To support the transmission member, the thickness on the surface of the solid-state
It is no longer necessary to form uniform spacers in a planar shape.
Distance between the light transmission member and the solid-state image sensor.
It is easy to keep and acts as a spacer
The area occupied by the resin bumps can be reduced,
The solid-state imaging device surface can be used effectively. In addition, multiple resin
The resin that seals the entire periphery of the pump
Acts as a spacer to determine the distance between the
It is not necessary to control the thickness of the resin.
The area can be made small and the sealing material can be easily formed
As a result, it is possible to realize a solid-state imaging device with an on-chip lens that is reduced in size and diameter without impairing the functional performance of the on-chip lens.

【0036】さらにこの複数の樹脂バンプを数段積み重
ね固体撮像素子面と光透過用部材との距離を十分長くと
ることにより、光透過用部材の下面にきず或いはごみが
付着した場合でも目立ちにくくなり、ごみ、きずの不良
率が大幅に下がる。
Further, by stacking the plurality of resin bumps in several stages and making the distance between the solid-state imaging device surface and the light transmitting member sufficiently long, even if a flaw or dust adheres to the lower surface of the light transmitting member, it becomes less noticeable. The defective rate of garbage and flaws is greatly reduced.

【0037】また本発明の固体撮像装置の製造方法は、
複数の樹脂バンプが固体撮像素子の面上の受光領域外に
選択的に滴下され、所定の位置にスペーサを形成できる
ため、スペーサとして作用する樹脂バンプの占有面積は
小さくなり、限られた固体撮像素子面を有効利用できる
固体撮像素子の製造方法となる。また、複数の樹脂バ
プの側面全周をシーリングする際には、すでに樹脂バン
プが硬化されており、ギャップが制御された空間が形成
されているために、その樹脂厚みの制御は不要で、塗布
面積は小さくでき、シーリング材の形成が容易になる。
The method of manufacturing a solid-state imaging device according to the present invention
Multiple resin bumps outside the light receiving area on the surface of the solid-state image sensor
Can be selectively dropped and form spacers in place
Therefore, the area occupied by the resin bump acting as a spacer is
It is small and can effectively use a limited solid-state image sensor surface
This is a method for manufacturing a solid-state imaging device. In addition, a plurality of resin bus emissions
When sealing the entire circumference of the side of the
Is hardened to form a space with a controlled gap
It is not necessary to control the resin thickness
The area can be reduced, and the formation of the sealing material is facilitated.

【0038】 また本発明の別の固体撮像装置の製造方法
は、複数の多段に形成された樹脂バンプを形成すること
により、光透過用部材と固体撮像素子とを十分に長い距
離を保って接合することができるとともに、複数の樹脂
バンプが固体撮像素子の面上の受光領域外に選択的に滴
下され、所定の位置にスペーサを形成できるため、スペ
ーサとして作用する樹脂バンプの占有面積は小さくな
り、限られた固体撮像素子面を有効利用できる固体撮像
素子の製造方法となる。また、複数の多段に形成された
樹脂バンプの側面全周をシーリングする際には、すでに
樹脂バンプが硬化されており、ギャップが制御された空
間が形成されているために、その樹脂厚みの制御は不要
で、塗布面積は小さくでき、シーリング材の形成が容易
になる。
Further another method for manufacturing a solid-state imaging device of the present invention is to form a resin bump formed in a plurality of multistage
Distance between the light transmitting member and the solid-state imaging device
It is possible to join with keeping the separation
Bumps selectively drop outside the light receiving area on the surface of the solid-state image sensor
Space, and a spacer can be formed at a predetermined position.
The area occupied by the resin bumps acting as
Solid-state imaging that can effectively use the limited solid-state imaging device surface
This is a method for manufacturing an element. In addition, a plurality of multi-stage formed
When sealing the entire side of the resin bump,
Resin bumps are cured and the gap is controlled
No need to control the resin thickness because the gap is formed
The coating area can be reduced, and the sealing material can be easily formed.
become.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施例1における固体撮像素子の概略
断面図
FIG. 1 is a schematic sectional view of a solid-state imaging device according to a first embodiment of the present invention.

【図2】図1に示す固体撮像装置の製造工程を示す概略
断面図
FIG. 2 is a schematic sectional view showing a manufacturing process of the solid-state imaging device shown in FIG.

【図3】本発明の実施例2における固体撮像装置の製造
工程を示す概略断面図
FIG. 3 is a schematic cross-sectional view illustrating a manufacturing process of the solid-state imaging device according to the second embodiment of the present invention.

【図4】従来の固体撮像素子の概略断面図FIG. 4 is a schematic sectional view of a conventional solid-state imaging device.

【図5】従来の小型、小径化した固体撮像装置の概略断
面図
FIG. 5 is a schematic sectional view of a conventional solid-state imaging device having a small size and a small diameter.

【符号の説明】[Explanation of symbols]

1 固体撮像素子 4 光透過用ガラス(光透過用部材) 9 オンチップレンズ 10 複数の樹脂バンプ 15 空間REFERENCE SIGNS LIST 1 solid-state imaging device 4 glass for light transmission (member for light transmission) 9 on-chip lens 10 plural resin bumps 15 space

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭63−213373(JP,A) 特開 平1−300572(JP,A) 特開 平4−258165(JP,A) 特開 平5−13738(JP,A) 特開 平5−115435(JP,A) (58)調査した分野(Int.Cl.7,DB名) H01L 27/14 H04N 5/335 ──────────────────────────────────────────────────続 き Continuation of the front page (56) References JP-A-63-213373 (JP, A) JP-A-1-300572 (JP, A) JP-A-4-258165 (JP, A) JP-A-5-213 13738 (JP, A) JP-A-5-115435 (JP, A) (58) Fields investigated (Int. Cl. 7 , DB name) H01L 27/14 H04N 5/335

Claims (3)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 上面にオンチップレンズを設けた固体撮
像素子の上方に、前記固体撮像素子の面上で、かつ受光
領域外に設けられた複数の樹脂バンプを介して光透過用
部材を設けることにより前記光透過用部材と前記固体撮
像素子との間に空間を形成し、さらに前記複数の樹脂バ
ンプの側面全周を樹脂でシーリングしたことを特徴とす
る固体撮像装置。
An optical transmission member is provided above a solid-state imaging device having an on-chip lens provided on an upper surface thereof, via a plurality of resin bumps provided on the surface of the solid-state imaging device and outside a light receiving region. a space is formed between the solid-state imaging device and the light transmissive member by further plurality of resin Ba
A solid-state imaging device characterized in that the entire periphery of the side surface of the pump is sealed with resin .
【請求項2】 上面にオンチップレンズを設けた固体撮
像素子の受光領域外の面上に光硬化樹脂を滴下し、前記
光硬化樹脂に光透過用部材を接合し、前記光硬化樹脂を
硬化して複数の樹脂バンプを形成するとともに、前記複
数の樹脂バンプを介して前記固体撮像素子と前記光透過
用部材とを接合し、さらに前記複数の樹脂バンプの側面
全周を樹脂でシーリングするようにしたことを特徴とす
る固体撮像装置の製造方法。
2. A dropping a photocurable resin on the surface outside the light receiving region of the solid-state imaging device provided with an on-chip lens on the upper surface, bonding the light transmitting member to the <br/> photocurable resin, the light thereby forming a plurality of resin bumps by curing the curable resin, the double
Through the number of resin bumps bonding the light transmitting member and the solid-state imaging device, further aspects of the plurality of resin bumps
A method for manufacturing a solid-state imaging device, wherein the entire periphery is sealed with resin .
【請求項3】 上面にオンチップレンズを設けた固体撮
像素子の受光領域外の面上に光硬化樹脂を滴下し、一旦
前記光硬化樹脂を硬化して一段目となる複数の樹脂バン
プを形成した後、さらに前記複数の樹脂バンプ上に光硬
化樹脂を滴下して、前記光硬化樹脂に光透過用部材を接
合し、前記光硬化樹脂を硬化して前記複数の樹脂バンプ
を多段に形成するとともに、前記複数の樹脂バンプを介
して固体撮像素子と光透過用部材とを接合し、さらに前
記複数の樹脂バンプの側面全周を樹脂でシーリングする
ようにしたことを特徴とする固体撮像装置の製造方法。
3. A solid-state imaging device having an on-chip lens on its upper surface.
Drop the photocurable resin on the surface outside the light receiving area of the image element, and once
A plurality of resin vans, which are obtained by curing the photocurable resin to form a first stage.
After forming the bumps, light hardening is further performed on the plurality of resin bumps.
A light transmitting member is contacted with the photocurable resin by dropping a curing resin.
And curing the photo-curable resin to form the plurality of resin bumps.
Are formed in multiple stages, and through the plurality of resin bumps.
To join the solid-state imaging device and the light transmitting member,
Seal all sides of multiple resin bumps with resin
A method for manufacturing a solid-state imaging device, characterized in that:
JP15668393A 1993-06-28 1993-06-28 Solid-state imaging device and manufacturing method thereof Expired - Fee Related JP3149630B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15668393A JP3149630B2 (en) 1993-06-28 1993-06-28 Solid-state imaging device and manufacturing method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15668393A JP3149630B2 (en) 1993-06-28 1993-06-28 Solid-state imaging device and manufacturing method thereof

Publications (2)

Publication Number Publication Date
JPH0738072A JPH0738072A (en) 1995-02-07
JP3149630B2 true JP3149630B2 (en) 2001-03-26

Family

ID=15633049

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15668393A Expired - Fee Related JP3149630B2 (en) 1993-06-28 1993-06-28 Solid-state imaging device and manufacturing method thereof

Country Status (1)

Country Link
JP (1) JP3149630B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4838501B2 (en) 2004-06-15 2011-12-14 富士通セミコンダクター株式会社 Imaging apparatus and manufacturing method thereof

Also Published As

Publication number Publication date
JPH0738072A (en) 1995-02-07

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