JP3126686B2 - Method for producing phenol aralkyl resin - Google Patents

Method for producing phenol aralkyl resin

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Publication number
JP3126686B2
JP3126686B2 JP09159395A JP15939597A JP3126686B2 JP 3126686 B2 JP3126686 B2 JP 3126686B2 JP 09159395 A JP09159395 A JP 09159395A JP 15939597 A JP15939597 A JP 15939597A JP 3126686 B2 JP3126686 B2 JP 3126686B2
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JP
Japan
Prior art keywords
phenol
acid
aralkyl resin
phenol aralkyl
compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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JP09159395A
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Japanese (ja)
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JPH115831A (en
Inventor
正人 大平
嘉久 曽根
Original Assignee
住金ケミカル株式会社
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Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、低コストでかつ保
存安定性に優れたフェノールアラルキル樹脂の製造方法
に関する。更に詳しくは、半導体封止材用のエポキシ樹
脂硬化剤として用いる場合に硬化性の経時低下の少ない
高純度のフェノールアラルキル樹脂の製造方法に関す
る。
[0001] The present invention relates to a method for producing a phenol aralkyl resin which is inexpensive and has excellent storage stability. More specifically, the present invention relates to a method for producing a high-purity phenol aralkyl resin that hardly deteriorates with time when used as an epoxy resin curing agent for semiconductor encapsulants.

【0002】[0002]

【従来の技術】フェノールアラルキル樹脂は、半導体封
止材用エポキシ樹脂の硬化剤や、接着剤、成形材料とし
て有用な化合物であり、その製法は原料化合物として、 ジクロロ−p−キシレンのような芳香族ビスハロゲノ
メチル化合物 または ジメトキシ−p−キシレンのような芳香族ビスアルコ
キシメチル化合物を用い、これらとフェノール類とから
縮合反応により製造するのが一般的である。
2. Description of the Related Art Phenol aralkyl resins are useful compounds as curing agents, adhesives and molding materials for epoxy resins for semiconductor encapsulants. Their production method is to use aromatic compounds such as dichloro-p-xylene as raw material compounds. Generally, an aromatic bisalkoxymethyl compound such as an aromatic bishalogenomethyl compound or dimethoxy-p-xylene is used, and a compound is produced from these and a phenol by a condensation reaction.

【0003】フェノールアラルキル樹脂の重要な用途は
半導体封止材用エポキシ樹脂の硬化剤であるが、この用
途に用いる場合、重合金属成分や酸性物質等のイオン性
不純物混入をできるだけ少なくする必要があり、そのよ
うな高純度フェノールアラルキル樹脂の製造方法とし
て、例えば上記の芳香族ビスハロゲノメチル化合物と
フェノール化合物を無触媒で反応させる方法が提案され
ている(特開平6−10667号公報)。
An important use of a phenol aralkyl resin is as a curing agent for an epoxy resin for a semiconductor encapsulant, but when used for this purpose, it is necessary to minimize the incorporation of ionic impurities such as polymerized metal components and acidic substances. As a method for producing such a high-purity phenol aralkyl resin, for example, a method of reacting the above aromatic bishalogenomethyl compound with a phenol compound without a catalyst has been proposed (Japanese Patent Application Laid-Open No. 6-10667).

【0004】しかしながらこの無触媒で反応させて得ら
れるフェノールアラルキル樹脂は、高純度品ではある
が、保管中に酸化され、エポキシ樹脂硬化剤として用い
た場合に経時的に硬化性が低下する問題がある。特にこ
の経時劣化は、半導体封止材用途で最も一般的な硬化促
進剤であるトリフェニルホスフィン(TPP)を用いた
場合に、起こりやすい。
[0004] However, although the phenol aralkyl resin obtained by the reaction without a catalyst is a high-purity product, it has a problem that it is oxidized during storage and its curability decreases with time when used as an epoxy resin curing agent. is there. In particular, this deterioration with time is likely to occur when triphenylphosphine (TPP), which is the most common curing accelerator for semiconductor encapsulant applications, is used.

【0005】一方キシリレン化合物としてハロゲンを含
有しない上記の芳香族ビスアルコキシメチル化合物を
用いて、酸性化合物を触媒として合成すればこのような
経時変化の問題は起こらない。この方法においては触媒
として、硫酸、硫酸ジエチル、パラトルエンスルホン酸
およびフリーデルクラフツ型触媒である塩化第二錫、塩
化亜鉛、塩化第二鉄等が用いられる。しかしながらこの
方法は原料として高価なキシリレン化合物を使用するこ
とになるので、コスト的に不利である。また酸触媒から
由来するイオン性不純物を多く含む点も問題となる可能
性がある。
[0005] On the other hand, if the above-mentioned aromatic bisalkoxymethyl compound containing no halogen is used as a xylylene compound and synthesized using an acidic compound as a catalyst, such a problem of a change with time does not occur. In this method, as a catalyst, sulfuric acid, diethyl sulfate, p-toluenesulfonic acid, and a Friedel-Crafts type catalyst such as stannic chloride, zinc chloride, and ferric chloride are used. However, this method is disadvantageous in cost because an expensive xylylene compound is used as a raw material. In addition, there is also a possibility that a large amount of ionic impurities derived from the acid catalyst may be problematic.

【0006】[0006]

【発明が解決しようとする課題】本発明者らはこの問題
を解決するために鋭意検討した結果、TPP硬化促進剤
を用いた場合の硬化性の経時的低下は、樹脂の一部が保
管中に酸化されて、パーオキサイドを生成し、これによ
り硬化促進剤であるTPPが酸化されて失活することに
より起こることを知り、さらに検討を進めた結果、TP
Pの酸化による失活は樹脂中に微量の酸、酸と有機塩基
からなる塩、あるいは有機塩基を存在させることにより
防止できることを見いだし本発明を完成するに至った。
SUMMARY OF THE INVENTION The present inventors have conducted intensive studies to solve this problem. As a result, it has been found that the curability over time when a TPP curing accelerator is used is partially reduced during storage. Was found to be oxidized to form a peroxide, which caused the TPP as a curing accelerator to be oxidized and deactivated.
The inventors have found that deactivation by oxidation of P can be prevented by the presence of a trace amount of an acid, a salt comprising an acid and an organic base, or an organic base in the resin, and have completed the present invention.

【0007】したがって本発明の目的は、上記問題点を
解決し、安価な芳香族ビスハロゲノメチル化合物を原料
とし、低コストでかつ保存安定性に優れた高純度のフェ
ノールアラルキル樹脂の製造方法を提供することにあ
る。
Accordingly, an object of the present invention is to solve the above problems and provide a method for producing a high-purity phenol aralkyl resin which is inexpensive and has excellent storage stability by using an inexpensive aromatic bishalogenomethyl compound as a raw material. Is to do.

【0008】[0008]

【課題を解決するための手段】本発明は、一般式(1) R−(CH2 X)2 (1) (式中、Rは、フェニル基、アルキル置換フェニル基、
ビフェニル基、二価のジフェニルエーテル残基、または
ナフチル基を示し、Xはハロゲン原子を示す)で表され
る芳香族ビスハロゲノメチル化合物とフェノール化合物
を触媒物質を添加せずに反応させた後、酸、酸と有機塩
基からなる塩、または有機塩基を20〜200ppm添
加することを特徴とする保存安定性に優れたフェノール
アラルキル樹脂の製造方法である。
The present invention provides a compound represented by the following general formula (1): R- (CH 2 X) 2 (1) wherein R is a phenyl group, an alkyl-substituted phenyl group,
X represents a biphenyl group, a divalent diphenyl ether residue, or a naphthyl group, and X represents a halogen atom), and a phenol compound is reacted with a phenol compound without adding a catalyst substance. And a salt comprising an acid and an organic base or an organic base in an amount of from 20 to 200 ppm.

【0009】[0009]

【発明の実施の形態】 以下、本発明について詳述す
る。本発明のフェノールアラルキル樹脂は、上記一般式
(1)で表される芳香族ビスハロゲノメチル化合物とフ
ェノール化合物とを、触媒物質を添加せずに反応させた
後、酸、有機塩基、あるいは両者からなる塩を添加する
ことにより製造することができる。
Hereinafter, the present invention will be described in detail. The phenol aralkyl resin of the present invention is obtained by reacting an aromatic bishalogenomethyl compound represented by the above general formula (1) with a phenol compound without adding a catalyst substance, and then reacting with an acid, an organic base, or both. Can be produced by adding the following salt.

【0010】本発明方法の原料である芳香族ビスハロゲ
ノメチル化合物としては下記一般式(1)で表されるも
のである。 R−(CH2 X)2 (1) ここでRは前記説明と同じ芳香族炭化水素基であり、X
は塩素、臭素、弗素等のハロゲン原子であるが、特に塩
素が好ましい。
The aromatic bishalogenomethyl compound which is a raw material of the method of the present invention is represented by the following general formula (1). R- (CH 2 X) 2 (1) where R is the same aromatic hydrocarbon group as described above,
Is a halogen atom such as chlorine, bromine or fluorine, and chlorine is particularly preferable.

【0011】このような原料化合物はRがフェニル基で
ある場合の例として、1,2−ジ(クロロメチル)ベン
ゼン、1,2−ジ(ブロモメチル)ベンゼン、1,3−
ジ(クロロメチル)ベンゼン、1,3−ジ(フルオロメ
チル)ベンゼン、1,4−ジ(クロロメチル)ベンゼ
ン、1,4−ジ(ブロモメチル)ベンゼン、1,4−ジ
(フルオロメチル)ベンゼン等、Rがアルキル置換フェ
ニル基である場合の例として、1,4−ジ(クロロメチ
ル)2,5−ジメチルベンゼン、1,3−ジ(クロロメ
チル)−4,6−ジメチルベンゼン、1,3−ジ(クロ
ロメチル)−2,4−ジメチルベンゼン、Rがビフェニ
ル基である場合の例として、4,4′−ビス(クロロメ
チル)ビフェニル、4,4′−ビス(ブロモメチル)ビ
フェニル、Rがビフェニルエーテル残基である場合の例
として4,4′−ビス(クロロメチル)ジフェニルエー
テル、Rがナフチル基である場合の例として2,7−ジ
(クロロメチル)ナフタレン等を挙げることができる。
Examples of such a raw material compound are those in which R is a phenyl group, such as 1,2-di (chloromethyl) benzene, 1,2-di (bromomethyl) benzene,
Di (chloromethyl) benzene, 1,3-di (fluoromethyl) benzene, 1,4-di (chloromethyl) benzene, 1,4-di (bromomethyl) benzene, 1,4-di (fluoromethyl) benzene, etc. , R is an alkyl-substituted phenyl group, for example, 1,4-di (chloromethyl) 2,5-dimethylbenzene, 1,3-di (chloromethyl) -4,6-dimethylbenzene, 1,3 -Di (chloromethyl) -2,4-dimethylbenzene, examples of the case where R is a biphenyl group include 4,4'-bis (chloromethyl) biphenyl, 4,4'-bis (bromomethyl) biphenyl, and R is 4,4'-bis (chloromethyl) diphenyl ether as an example when it is a biphenyl ether residue, and 2,7-di (chloromethyl) na as an example when R is a naphthyl group And the like can be given the array type.

【0012】これらの芳香族ビスハロゲノメチル化合物
のうち1,4−ジ(クロロメチル)ベンゼンが原料とし
て最も入手しやすく一般的である。
Of these aromatic bishalogenomethyl compounds, 1,4-di (chloromethyl) benzene is the most readily available and common raw material.

【0013】本発明の製造方法でもう一方の原料として
用いられるフェノール化合物としては、フェノール、
(o−,m−,p−)クレゾール、キシレノール、(o
−,p−)エチルフェノール、ブチルフェノール、ハロ
ゲン化フェノール、カテコール、レゾルシンなどの単環
型フェノール化合物、あるいはビフェノール、ビスフェ
ノールA、ビスフェノールS、ビスフェノールF、α−
ナフトール、β−ナフトールなどの多環型フェノール化
合物が挙げられ、これらを1種もしくは2種以上使用す
ることができるが特にフェノールが好ましい。
The phenol compound used as the other raw material in the production method of the present invention includes phenol,
(O-, m-, p-) cresol, xylenol, (o
-, P-) Monocyclic phenol compounds such as ethylphenol, butylphenol, halogenated phenol, catechol, resorcin, or biphenol, bisphenol A, bisphenol S, bisphenol F, α-
Examples thereof include polycyclic phenol compounds such as naphthol and β-naphthol. One or more of these can be used, but phenol is particularly preferred.

【0014】本発明においてはフェノールアラルキル樹
脂の製造は触媒物質を添加せずに行われ、縮合反応で得
られた反応生成物から、未反応モノマーを除去したもの
に、酸、酸と有機塩基からなる塩、または有機塩基を後
添加する。
In the present invention, the production of the phenol aralkyl resin is carried out without adding a catalytic substance, and the reaction product obtained by the condensation reaction is obtained by removing the unreacted monomer from the reaction product. Or an organic base is added later.

【0015】本発明では縮合反応において、酸触媒のよ
うな触媒物質は添加しない。これは原料中に含まれる水
分が芳香族ビスハロゲノメチル化合物と加水分解を起こ
すことによって、ハロゲン化水素を発生し、このハロゲ
ン化水素の一部が酸触媒として作用し、反応を引き起こ
すからである。それゆえ、反応を促進するために、外部
から水を添加してもよい。水を添加する場合、その添加
量は原料の合計量に対して0.005〜1、好ましくは
0.005〜0.5重量%の範囲内で添加すればよい。
水の添加量をこれ以上多くしても添加効果の向上が認め
られない。
In the present invention, no catalyst substance such as an acid catalyst is added in the condensation reaction. This is because the water contained in the raw material hydrolyzes with the aromatic bishalogenomethyl compound to generate hydrogen halide, and a part of the hydrogen halide acts as an acid catalyst to cause a reaction. . Therefore, water may be added from outside to promote the reaction. When water is added, it may be added in an amount of 0.005 to 1, preferably 0.005 to 0.5% by weight based on the total amount of the raw materials.
Even if the added amount of water is further increased, no improvement in the added effect is observed.

【0016】縮合反応物から未反応モノマーを除去した
後に添加する酸類としては、シュウ酸、ベンゼンスルホ
ン酸、トルエンスルホン酸、メタンスルホン酸、トリフ
ルオロメタンスルホン酸、ジエチル硫酸等の有機酸、硫
酸、リン酸、硝酸等の無機酸などが挙げられる。
Acids added after removing unreacted monomers from the condensation reaction product include organic acids such as oxalic acid, benzenesulfonic acid, toluenesulfonic acid, methanesulfonic acid, trifluoromethanesulfonic acid, and diethylsulfuric acid, sulfuric acid, phosphorus acid, and the like. And inorganic acids such as acid and nitric acid.

【0017】また有機塩基としては、2−メチルイミダ
ゾール、2,4−ジメチルイミダゾール、2−エチル−
4−メチルイミダゾールなどのイミダゾール化合物、ト
リエチルアミン、トリエチレンジアミン、1,8−ジア
ザビシクロ(5,4,0)ウンデセン−7などの3級ア
ミン、トリフェニルホスフィン、トリメチルホスフィ
ン、トリエチルホスフィンなどの有機ホスフィン化合物
等が挙げられる。
Examples of the organic base include 2-methylimidazole, 2,4-dimethylimidazole, and 2-ethyl-imidazole.
Imidazole compounds such as 4-methylimidazole, tertiary amines such as triethylamine, triethylenediamine, 1,8-diazabicyclo (5,4,0) undecene-7, and organic phosphine compounds such as triphenylphosphine, trimethylphosphine and triethylphosphine. Is mentioned.

【0018】更に、酸と有機塩基からなる塩を添加する
こともできる。塩を形成させるための酸と有機塩基は、
添加剤として挙げた上記の酸と有機塩基を用いることが
できる。本発明においては特にトリフルオロメタンスル
ホン酸と1,8−ジアザビシクロ(5,4,0)ウンデ
セン−7からなる塩を添加するのが好ましい。
Further, a salt comprising an acid and an organic base can be added. Acids and organic bases to form salts are
The above-mentioned acids and organic bases mentioned as additives can be used. In the present invention, it is particularly preferable to add a salt composed of trifluoromethanesulfonic acid and 1,8-diazabicyclo (5,4,0) undecene-7.

【0019】後添加する酸、酸と有機塩基からなる塩、
または有機塩基の添加量は、20〜200ppm、より
好ましくは30〜150ppmである。添加量が20p
pm以下になると保存安定性に劣り、200ppm以上
になるとイオン性不純物が多くなりすぎて、抽出水の電
気伝導度が高くなり、本発明のフェノールアラルキル樹
脂の特徴である高純度の点が失われてしまう。
An acid to be added later, a salt comprising an acid and an organic base,
Alternatively, the added amount of the organic base is 20 to 200 ppm, more preferably 30 to 150 ppm. 20p added
pm or less, the storage stability is inferior, and when it is 200 ppm or more, ionic impurities become too large, the electric conductivity of the extraction water becomes high, and the high purity point characteristic of the phenol aralkyl resin of the present invention is lost. Would.

【0020】本発明における反応後の添加剤としては、
酸、有機塩基あるいは両者からなる塩のいずれでも、保
存安定性向上の効果は得られるが、樹脂抽出水の電気伝
導度の上昇を抑えるという観点から、酸および有機塩基
からなる塩を存在させるのが最も好ましい。
The additives after the reaction in the present invention include:
An acid, an organic base or a salt composed of both can provide an effect of improving storage stability.However, from the viewpoint of suppressing an increase in electric conductivity of resin extraction water, a salt composed of an acid and an organic base is present. Is most preferred.

【0021】本発明における芳香族ビスハロゲノメチル
化合物とフェノール化合物との反応は公知の方法により
実施することができる。原料の反応割合は、フェノール
化合物1モルに対して、ビスハロゲノメチル化合物0.
1〜0.8モル、特に0.2〜0.6モルの範囲内が好
ましい。ビスハロゲノメチル化合物が0.1モル未満で
は未反応フェノールが多くなり収率が下がるので好まし
くない。また分子量が小さくなり、軟化点が下がりコー
ルドフローを引き起こしやすくなる。一方、ビスハロゲ
ノメチル化合物が0.8モルを越えると分子量が増大
し、溶融粘度が上昇するため成形時の流動性の低下を招
きやすくなる。
The reaction between the aromatic bishalogenomethyl compound and the phenol compound in the present invention can be carried out by a known method. The reaction ratio of the raw material is such that the bishalogenomethyl compound is added to the phenol compound in an amount of 1 mole per mole.
It is preferably in the range of 1 to 0.8 mol, particularly 0.2 to 0.6 mol. If the amount of the bishalogenomethyl compound is less than 0.1 mol, unreacted phenol increases and the yield decreases, which is not preferable. Further, the molecular weight is reduced, the softening point is lowered, and cold flow is easily caused. On the other hand, when the amount of the bishalogenomethyl compound exceeds 0.8 mol, the molecular weight increases and the melt viscosity increases, so that the fluidity at the time of molding tends to decrease.

【0022】反応は、通常80〜180℃の範囲で、1
〜10時間程度行われる。反応は全原料を一括装入して
昇温しながら行ってもよく、フェノール化合物を予め一
定の温度に保った状態で芳香族ビスハロゲノメチル化合
物を逐次添加して行ってもよい。また、反応は無溶媒で
も実施できるが、反応に直接関与しない有機化合物
(例、トルエン、キシレン、モノクロルベンゼン、ジク
ロルベンゼンなど)を溶媒として共存させてもよい。溶
媒の共存により、原料成分を溶解させて均質化すること
ができ、反応生成物の分離・回収も容易になる。
The reaction is usually carried out at 80 to 180 ° C. for 1 hour.
This is performed for about 10 hours. The reaction may be performed while all the raw materials are charged at once and the temperature is raised, or may be performed by sequentially adding an aromatic bishalogenomethyl compound while keeping the phenol compound at a constant temperature in advance. The reaction can be carried out without a solvent, but an organic compound that does not directly participate in the reaction (eg, toluene, xylene, monochlorobenzene, dichlorobenzene, etc.) may coexist as a solvent. By the coexistence of the solvent, the raw material components can be dissolved and homogenized, and the separation and recovery of the reaction product become easy.

【0023】本発明の反応では、反応の進行に伴ってハ
ロゲン化水素ガスが発生し、一部は反応のための酸触媒
として作用するが、このハロゲン化水素ガスは窒素ガス
等の不活性ガスを通気させて系外へ除去するか、減圧状
態にして除去する方法が取られる。反応後、未反応のフ
ェノール化合物や溶媒等を減圧下の留去する等の方法で
除去し、酸、酸と有機塩基からなる塩、または有機塩基
を添加することにより、本発明のフェノールアラルキル
樹脂を得る。
In the reaction of the present invention, hydrogen halide gas is generated as the reaction proceeds, and a part thereof acts as an acid catalyst for the reaction. This hydrogen halide gas is an inert gas such as nitrogen gas. May be removed from the system by aeration, or may be removed under reduced pressure. After the reaction, the unreacted phenol compound and the solvent are removed by a method such as distillation under reduced pressure, and the acid, a salt composed of an acid and an organic base, or an organic base is added, whereby the phenol aralkyl resin of the present invention is added. Get.

【0024】反応で副生するハロゲン化水素は、反応中
不活性ガスを吹き込むことにより大部分が除去でき、さ
らにまた未反応フェノール化合物を留去する際に減圧下
で行うことにより実用上問題のないレベルまで除去でき
る。
Most of the hydrogen halide by-produced in the reaction can be removed by blowing an inert gas during the reaction, and furthermore, if the unreacted phenol compound is distilled off under reduced pressure, there is a practical problem. It can be removed to an unacceptable level.

【0025】[0025]

【実施例】以下、実施例により本発明を具体的に説明す
る。実施例中、部および%は特に指定しない限り重量部
および重量%である。また実施例及び比較例で得られた
フェノールアラルキル樹脂の物性評価方法は下記のとお
りである。
The present invention will be described below in detail with reference to examples. In the examples, parts and% are parts by weight and% by weight unless otherwise specified. The methods for evaluating the physical properties of the phenol aralkyl resins obtained in Examples and Comparative Examples are as follows.

【0026】(1)ゲルタイムの測定 実施例および比較例で製造された直後の樹脂をコーヒー
ミルを用いて粉砕したもの、及びこれの約10gをアル
ミパックに密封し、25℃の恒温槽中に14日間放置し
たものについて、それぞれ、樹脂にビフェニル型エポキ
シ樹脂を当量比1:1で混合し、さらに硬化促進剤とし
てトリフェニルホスフィンを1phr混合して、初期及
び25℃、14日間放置後のゲルタイムを測定した。ゲ
ルタイムの測定は160℃の熱板上でストロークキュア
法で行った。
(1) Measurement of Gel Time The resin immediately after production in Examples and Comparative Examples was pulverized using a coffee mill, and about 10 g of the resin was sealed in an aluminum pack and placed in a thermostat at 25 ° C. After leaving for 14 days, each resin was mixed with a biphenyl-type epoxy resin at an equivalent ratio of 1: 1 and triphenylphosphine as a curing accelerator was further mixed with 1 phr, and the gel time was initially and after standing at 25 ° C. for 14 days. Was measured. The gel time was measured by a stroke cure method on a hot plate at 160 ° C.

【0027】(2)電気伝導度の測定 樹脂8gを80gの純水で95℃で20時間抽出を行
い、得られた抽出水を、HORIBA製、電気伝導度測
定計”DS−12”を用いて行った。
(2) Measurement of Electric Conductivity 8 g of the resin was extracted with 80 g of pure water at 95 ° C. for 20 hours, and the extracted water was used with an electric conductivity meter “DS-12” manufactured by HORIBA. I went.

【0028】[実施例1]撹拌機、温度計、コンデンサ
ー、および窒素ガス導入管を備えた四つ口フラスコに、
原料として1,4−ジ(クロロメチル)ベンゼン175
部(1モル)、0.02重量%の水分を含むフェノール
188部(2モル)を装入し、窒素気流下で撹拌しなが
ら昇温して内温を120℃に上げ2時間保持した。その
後温度を150℃に上げさらに2時間保持した。この時
発生する塩化水素は水酸化ナトリウム水溶液でトラップ
除去した。
Example 1 A four-necked flask equipped with a stirrer, a thermometer, a condenser, and a nitrogen gas inlet tube was prepared as follows:
1,4-di (chloromethyl) benzene 175 as raw material
Parts (1 mol) and 188 parts (2 mol) of phenol containing 0.02% by weight of water were charged, and the temperature was increased while stirring under a nitrogen stream to raise the internal temperature to 120 ° C. and maintained for 2 hours. Thereafter, the temperature was raised to 150 ° C. and maintained for another 2 hours. The hydrogen chloride generated at this time was removed by trapping with an aqueous sodium hydroxide solution.

【0029】次に系内の未反応フェノールを減圧蒸留に
より留去して、縮合反応物を得た。次いでこの縮合反応
物に、トリフルオロメタンスルホン酸(TFMS)と
1,8−ジアザビシクロ(5,4,0)ウンデセン−7
(DBU)をモル比で1/1になるように調製した10
%混合水溶液を、縮合反応物に対して900ppmにな
るように添加(TFMS/DBUの添加量90ppm)
して、150℃で30分撹拌して均一に混合した。
Next, unreacted phenol in the system was distilled off under reduced pressure to obtain a condensation reaction product. Next, trifluoromethanesulfonic acid (TFMS) and 1,8-diazabicyclo (5,4,0) undecene-7 were added to the condensation reaction product.
(DBU) was prepared to have a molar ratio of 1/1.
% Mixed aqueous solution was added so as to be 900 ppm with respect to the condensation reaction product (TFMS / DBU added amount 90 ppm)
Then, the mixture was stirred at 150 ° C. for 30 minutes and uniformly mixed.

【0030】縮合反応物であるフェノールアラルキル樹
脂は、軟化点が82℃、150℃での溶融粘度が310
cps、水酸基当量は170g/eqであった。得られ
た樹脂についてゲルタイム及び電気伝導度を測定した。
結果を表1に示す。
The phenol aralkyl resin, which is a condensation reaction product, has a softening point of 82 ° C. and a melt viscosity at 150 ° C. of 310.
The cps and the hydroxyl equivalent were 170 g / eq. Gel time and electric conductivity of the obtained resin were measured.
Table 1 shows the results.

【0031】[実施例2]実施例1と同様に縮合反応お
よび未反応フェノールの留去を行い、縮合反応物を得
た。この縮合反応物に硫酸ジエチル10%メタノール溶
液を、縮合反応物に対して500ppmになるように添
加(硫酸ジエチル添加量50ppm)して、150℃で
30分撹拌して均一に混ぜた。
Example 2 A condensation reaction and unreacted phenol were distilled off in the same manner as in Example 1 to obtain a condensation reaction product. To this condensation reaction product, a 10% methanol solution of diethyl sulfate was added so as to be 500 ppm with respect to the condensation reaction product (the addition amount of diethyl sulfate was 50 ppm), and the mixture was stirred at 150 ° C. for 30 minutes and uniformly mixed.

【0032】縮合反応物のフェノールアラルキル樹脂
は、軟化点が83℃、150℃での溶融粘度が320c
ps、水酸基当量は172g/eqであった。得られた
樹脂についてゲルタイム及び電気伝導度を測定した。結
果を表1に示す。
The phenol aralkyl resin of the condensation reaction product has a softening point of 83 ° C. and a melt viscosity at 150 ° C. of 320 c.
ps and the hydroxyl equivalent were 172 g / eq. Gel time and electric conductivity of the obtained resin were measured. Table 1 shows the results.

【0033】[実施例3]実施例1と同様に縮合反応お
よび未反応フェノールの留去を行い、縮合反応物を得
た。この縮合反応物に1,8−ジアザビシクロ(5,
4,0)ウンデセン−7(DBU)の10%水溶液を、
縮合反応物に対して900ppmになるように添加(D
BU添加量90ppm)して、150℃で30分撹拌し
て均一に混合した。
Example 3 The condensation reaction and unreacted phenol were distilled off in the same manner as in Example 1 to obtain a condensation reaction product. 1,8-diazabicyclo (5,5
(4,0) 10% aqueous solution of undecene-7 (DBU)
Add to 900 ppm based on the condensation reaction product (D
The amount of BU added was 90 ppm), and the mixture was stirred at 150 ° C. for 30 minutes and uniformly mixed.

【0034】縮合反応物のフェノールアラルキル樹脂
は、軟化点が80℃、150℃での溶融粘度が300c
ps、水酸基当量は175g/eqであった。得られた
樹脂についてゲルタイム及び電気伝導度を測定した。結
果を表1に示す。
The condensation reaction product phenol aralkyl resin has a softening point of 80 ° C. and a melt viscosity at 150 ° C. of 300 c.
ps and hydroxyl equivalent were 175 g / eq. Gel time and electric conductivity of the obtained resin were measured. Table 1 shows the results.

【0035】[実施例4]実施例1において、原料に水
0.1部を添加した以外は実施例1と同様に縮合反応お
よび未反応フェノールの留去を行い、縮合反応物を得
た。次いでこの縮合反応物に、実施例1と同様にTFM
S/DBU混合水溶液を、縮合反応物に対して900p
pmになるように添加して、均一に混合した。
Example 4 The condensation reaction and unreacted phenol were distilled off in the same manner as in Example 1 except that 0.1 part of water was added to the raw materials to obtain a condensation reaction product. Then, TFM was added to the condensation reaction product in the same manner as in Example 1.
S / DBU mixed aqueous solution is 900p
pm and uniformly mixed.

【0036】縮合反応物であるフェノールアラルキル樹
脂は、軟化点が80℃、150℃での溶融粘度が290
cps、水酸基当量は170g/eqであった。得られ
た樹脂についてゲルタイム及び電気伝導度を測定した。
結果を表1に示す。
The phenol aralkyl resin which is a condensation reaction product has a softening point of 80 ° C. and a melt viscosity at 150 ° C. of 290.
The cps and the hydroxyl equivalent were 170 g / eq. Gel time and electric conductivity of the obtained resin were measured.
Table 1 shows the results.

【0037】[比較例1]実施例1と同様に縮合反応お
よび未反応フェノールの留去を行い、フェノールの留去
後、酸、有機塩基あるいはこれらの塩を添加せず、縮合
反応物を得た。
[Comparative Example 1] The condensation reaction and unreacted phenol were distilled off in the same manner as in Example 1. After the phenol was distilled off, a condensation reaction product was obtained without adding an acid, an organic base or a salt thereof. Was.

【0038】この縮合反応物のフェノールアラルキル樹
脂は、軟化点が83℃、150℃での溶融粘度が320
cps、水酸基当量は173g/eqであった。得られ
た樹脂についてゲルタイム及び電気伝導度を測定した。
結果を表1に示す。
The phenol aralkyl resin of the condensation reaction product has a softening point of 83 ° C. and a melt viscosity at 150 ° C. of 320.
The cps and hydroxyl equivalent were 173 g / eq. Gel time and electric conductivity of the obtained resin were measured.
Table 1 shows the results.

【0039】[比較例2]実施例1と同様の装置を用い
て原料として1,4−ジ(クロロメチル)ベンゼン17
5部(1モル)、フェノール188部(2モル)を装入
し、さらに触媒として硫酸ジエチル0.13重量部を添
加し、窒素気流下で撹拌しながら昇温して内温を120
℃に上げ2時間保持した。その後温度を150℃に上げ
さらに2時間保持した。この時発生する塩化水素は水酸
化ナトリウム水溶液でトラップ除去した。次に系内の未
反応フェノールを減圧蒸留により留去して、縮合反応物
を得た。
Comparative Example 2 Using the same apparatus as in Example 1, 1,4-di (chloromethyl) benzene 17 was used as a raw material.
5 parts (1 mol) and 188 parts (2 mol) of phenol were added, and 0.13 part by weight of diethyl sulfate was further added as a catalyst.
C. and kept for 2 hours. Thereafter, the temperature was raised to 150 ° C. and maintained for another 2 hours. The hydrogen chloride generated at this time was removed by trapping with an aqueous sodium hydroxide solution. Next, unreacted phenol in the system was distilled off by distillation under reduced pressure to obtain a condensation reaction product.

【0040】この縮合反応物のフェノールアラルキル樹
脂は、軟化点が80℃で、150℃での溶融粘度が30
0cps、水酸基当量は172g/eqであった。得ら
れた樹脂についてゲルタイム及び電気伝導度を測定し
た。結果を表1に示す。
The phenol aralkyl resin of this condensation reaction product has a softening point of 80 ° C. and a melt viscosity at 150 ° C. of 30.
0 cps and the hydroxyl equivalent was 172 g / eq. Gel time and electric conductivity of the obtained resin were measured. Table 1 shows the results.

【0041】[0041]

【表1】 [Table 1]

【0042】表1の結果から明らかなように、触媒物質
を添加せず、反応後に有機酸、有機塩基あるいはこれら
の塩を添加した本発明方法(実施例1〜4)に従えば、
保存安定性がよく、かつ比較的高純度のフェノールアラ
ルキル樹脂が得られる。一方、比較例1の従来方法で
は、触媒物質を添加せずに反応させることにより高純度
のフェノールアラルキル樹脂が得られるものの、保存安
定性が劣っていた。また比較例2の従来方法で得られた
樹脂は、保存安定性は良いものの電気伝導度が高いもの
であった。
As is clear from the results shown in Table 1, according to the method of the present invention (Examples 1 to 4) in which an organic acid, an organic base or a salt thereof was added after the reaction without adding a catalytic substance,
A phenol aralkyl resin having good storage stability and relatively high purity can be obtained. On the other hand, in the conventional method of Comparative Example 1, although a high-purity phenol aralkyl resin was obtained by reacting without adding a catalytic substance, the storage stability was poor. The resin obtained by the conventional method of Comparative Example 2 had good storage stability but high electrical conductivity.

【0043】[0043]

【発明の効果】本発明の方法により、硬化性の経時低下
が少なく、保存安定性に優れかつ、電気伝導度が低く、
比較的高純度のフェノールアラルキル樹脂を製造するこ
とができる。このような樹脂は半導体封止材用途を始め
電子材料分野や接着剤分野に幅広く適用できる。
According to the method of the present invention, the curability hardly deteriorates with time, the storage stability is excellent, and the electric conductivity is low.
A relatively high purity phenol aralkyl resin can be produced. Such a resin can be widely used in the field of electronic materials and adhesives, including semiconductor sealing materials.

───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.7,DB名) C08G 61/00 - 61/12 ──────────────────────────────────────────────────続 き Continued on front page (58) Field surveyed (Int. Cl. 7 , DB name) C08G 61/00-61/12

Claims (3)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 一般式(1) R−(CH2 X)2 (1) (式中、Rは、フェニル基、アルキル置換フェニル基、
ビフェニル基、二価のジフェニルエーテル残基、または
ナフチル基を示し、Xはハロゲン原子を示す)で表され
る芳香族ビスハロゲノメチル化合物とフェノール化合物
を触媒物質を添加せずに反応させた後、酸、酸と有機塩
基からなる塩、または有機塩基を20〜200ppm添
加することを特徴とする保存安定性に優れたフェノール
アラルキル樹脂の製造方法。
(1) R- (CH 2 X) 2 (1) wherein R is a phenyl group, an alkyl-substituted phenyl group,
X represents a biphenyl group, a divalent diphenyl ether residue, or a naphthyl group, and X represents a halogen atom), and a phenol compound is reacted with a phenol compound without adding a catalyst substance. And a salt comprising an acid and an organic base or an organic base in an amount of from 20 to 200 ppm.
【請求項2】 水を反応原料合計量に対し、0.005
〜1重量%添加して反応させることを特徴とする請求項
1記載のフェノールアラルキル樹脂の製造方法。
2. Water is added in an amount of 0.005 to the total amount of the reaction raw materials.
The method for producing a phenol aralkyl resin according to claim 1, wherein the reaction is carried out by adding 1 to 1% by weight.
【請求項3】 酸と有機塩基からなる塩が、トリフルオ
ロメタンスルホン酸と1,8−ジアザビシクロ(5,
4,0)ウンデセン−7からなる塩であることを特徴と
する請求項1記載のフェノールアラルキル樹脂の製造方
法。
3. A salt comprising an acid and an organic base, wherein trifluoromethanesulfonic acid and 1,8-diazabicyclo (5,
The method for producing a phenol aralkyl resin according to claim 1, which is a salt comprising (4, 0) undecene-7.
JP09159395A 1997-06-17 1997-06-17 Method for producing phenol aralkyl resin Expired - Fee Related JP3126686B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP09159395A JP3126686B2 (en) 1997-06-17 1997-06-17 Method for producing phenol aralkyl resin

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP09159395A JP3126686B2 (en) 1997-06-17 1997-06-17 Method for producing phenol aralkyl resin

Publications (2)

Publication Number Publication Date
JPH115831A JPH115831A (en) 1999-01-12
JP3126686B2 true JP3126686B2 (en) 2001-01-22

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ID=15692853

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Country Link
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003048952A (en) * 2001-08-09 2003-02-21 Nippon Kayaku Co Ltd Method for producing modified epoxy resin
JP4997818B2 (en) * 2006-04-25 2012-08-08 宇部興産株式会社 Aromatic dimethylene-phenol resin and method for producing the same
JP5139914B2 (en) * 2008-08-04 2013-02-06 新日鉄住金化学株式会社 Polyvalent hydroxy resin, epoxy resin, production method thereof, epoxy resin composition and cured product using them
JP6605828B2 (en) * 2015-03-30 2019-11-13 日鉄ケミカル&マテリアル株式会社 Polyvalent hydroxy resin, epoxy resin, production method thereof, epoxy resin composition and cured product thereof

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