JP3125279B2 - Vacuum deposition for the graphite crucible - Google Patents

Vacuum deposition for the graphite crucible

Info

Publication number
JP3125279B2
JP3125279B2 JP03054067A JP5406791A JP3125279B2 JP 3125279 B2 JP3125279 B2 JP 3125279B2 JP 03054067 A JP03054067 A JP 03054067A JP 5406791 A JP5406791 A JP 5406791A JP 3125279 B2 JP3125279 B2 JP 3125279B2
Authority
JP
Japan
Prior art keywords
crucible
film
graphite crucible
graphite
material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP03054067A
Other languages
Japanese (ja)
Other versions
JPH04272170A (en
Inventor
健志 中島
三智男 宇佐美
栄 池上
公彦 藤里
Original Assignee
三菱重工業株式会社
東海カーボン株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
Application filed by 三菱重工業株式会社, 東海カーボン株式会社 filed Critical 三菱重工業株式会社
Priority to JP03054067A priority Critical patent/JP3125279B2/en
Publication of JPH04272170A publication Critical patent/JPH04272170A/en
Application granted granted Critical
Publication of JP3125279B2 publication Critical patent/JP3125279B2/en
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=12960277&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=JP3125279(B2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Anticipated expiration legal-status Critical
Application status is Expired - Fee Related legal-status Critical

Links

Description

【発明の詳細な説明】 DETAILED DESCRIPTION OF THE INVENTION

【0001】 [0001]

【産業上の利用分野】本発明は、金属を真空蒸着処理する場合に溶融金属の容器として用いられる黒鉛製のルツボに関する。 The present invention relates to a graphite crucible used as a container for molten metal when the vacuum-deposited metal.

【0002】 [0002]

【従来の技術】アルミニウムや銀などの金属溶湯を真空下に蒸発させてプラスチックまたは紙のようなフイルム状物の表面に金属薄膜層として蒸着形成する真空蒸着法においては、金属融解用に黒鉛ルツボが有用されている。 BACKGROUND OF THE INVENTION Vacuum deposition method a molten metal such as aluminum or silver is evaporated under vacuum depositing formed as a metal thin film layer on the surface of the film-like object, such as plastic or paper, graphite crucible for metal melting It has been useful.

【0003】操業時、黒鉛ルツボは連続的に走行するフイルム状物の下部に設置され、誘導加熱によって高温に保持されるが、蒸着はフイルム状物の全体に均質におこなわれねばならない。 [0003] During operation, the graphite crucible is placed in the lower part of the film-like object to be continuously running, but is maintained at a high temperature by induction heating, deposition must be carried out homogeneously throughout the film-like object. このため、従来はフイルム状物の幅に対して十分な金属蒸発面を確保する目的から、図2 Therefore, the purpose of ensuring a sufficient metal evaporating surface with respect to the conventional widths of film-like object, FIG. 2
に示すように走行するフイルム状物1の下部に底付円筒状を呈する丸型形状(典型的なサイズは内径100mm 、外径120mm 、高さ90〜100mm)の黒鉛ルツボ2を走行方向と直角に且つフイルム幅長に相当する個数を並べて設置する方式が採られている。 Round shape exhibiting a bottomed cylindrical shape in the lower part of the film-like object 1 travels as shown in (typical size inside diameter 100 mm, outer diameter 120 mm, height 90~100Mm) graphite crucible 2 running direction at right angles with and method of installation by arranging the number corresponding to the film width length is taken. この場合、均一な蒸着膜を得るためには個々の黒鉛ルツボからの金属蒸発量が均等になるように制御する必要があり、各黒鉛ルツボについて投入電気量の調整がおこなわれる。 In this case, in order to obtain a uniform deposited film must be controlled so that the metal evaporation from the individual graphite crucible is equalized for each graphite crucible adjustment of input electrical quantity is performed.

【0004】 [0004]

【発明が解決しようとする課題】ところが上記の処理方式においては、蒸着対象となるフイルム状物の幅広のケースでは20個程度の丸型黒鉛ルツボを整列させて使用することになる関係で、投入電気量の調整操作が煩雑化すると共に、各黒鉛ルツボ間に不可避的な間隔が介在するためもあって金属蒸発量に位置的なムラが生じ、結果的に均質な蒸着層の形成化が阻害される難点がある。 [SUMMARY OF THE INVENTION However in the above processing method, a wide in case relationship will be used to align the 20 or so round graphite crucible film-like object made of the deposition subject, put with electrical quantity adjustment operation is complicated, partly because the unavoidable gap is interposed between the graphite crucible and cause positional unevenness in metal evaporation, resulting in formation of a homogeneous deposition layer is inhibited there is a drawback to be. そのうえ、一個の黒鉛ルツボにおいて溶融金属が蒸発し切った際には、その時点で処理を終了するバッチ操業とならざるを得ないため、最近、開発された連続式アルミニウム蒸着装置 (フイルム巻出・巻取り装置を真空系外に設置する設備)には適用できない問題点もある。 Moreover, when taken with the molten metal evaporates in one of the graphite crucible, since inevitably a batch operation to terminate the process at that point, recently developed continuous aluminum vapor deposition apparatus (a film unwinding - the winding device in equipment) to be installed outside the vacuum system is able not a problem applicable.

【0005】本発明は上記従来技術の問題点を解消するために開発されたもので、容易に投入電気量の調整ができ、フイルム状物の幅に係わらず常に蒸着ムラのない均一な金属膜を連続的に形成することができる真空蒸着用黒鉛ルツボの提供を目的としている。 [0005] The present invention has been developed to solve the problems of the prior art, easily it can be adjusted turned electric quantity, no uniform metal film having always deposition unevenness regardless of the width of the film-like object it is intended to provide a vacuum deposition graphite crucible which can be continuously formed.

【0006】 [0006]

【課題を解決するための手段】上記の目的を達成するための本発明による真空蒸着用黒鉛ルツボは、連続走行するフィルム状物の下部に設置し、真空下の誘導加熱により溶融金属を前記フィルム状物に蒸着させるためのルツボであって、少なくともフィルム状物の幅と同等以上の長さをもつ長尺ボート形状を備え、電気比抵抗が 700〜 Graphite crucible for vacuum evaporation according to the present invention for achieving the above objects resolving means for the], said film of molten metal is placed in the lower part of the film-like material continuously running, by induction heating under vacuum a crucible for depositing the Jo was provided with elongated boat shape having at least a film-like material the width and length more than equivalent, the electrical resistivity is 700
1000μΩcmで電気比抵抗分布のバラツキが5%以内に収まり、平均気孔径1μm 以下、気体透過度0.02cm 2 /sec Variation in electrical resistivity distribution falls within 5% 1000Myuomegacm, average pore diameter 1μm or less, the gas permeability of 0.02 cm 2 / sec
以下の特性を有し、かつアルミナ処理が施された等方性黒鉛からなることを構成上の特徴とする。 It has the following characteristics, and is characterized in configuration in that it consists of isotropic graphite alumina processing has been performed.

【0007】最も好適な長尺ボート形状は、真空蒸着用黒鉛ルツボを走行するフイルム状物の下部に直角に設置したときにフイルム状物の幅の左右にルツボの両端部が出る程度の長さを有し、長さ方向の溝幅がフイルム状物の幅長範囲において実質的に平行となるように設計することである。 [0007] The most preferred long boat shape, film-like object length that both end portions of the crucible comes into left and right width of when placed at right angles to the bottom of the film-like object traveling graphite crucible for vacuum evaporation It has, is to design so as to be substantially parallel in the width length range of the groove width film-like object in the length direction. この形態を模式的に示すと図1のようになり、フイルム状物1の幅全体が長尺ボート形状の黒鉛ルツボ3における長さ範囲内の上面を走行する。 This form is shown in Figure 1 the illustrated schematically, the entire width of the film-like object 1 travels the upper surface of the length range in the graphite crucible 3 long boat shape.

【0008】本発明の真空蒸着用黒鉛ルツボの材質は等方性黒鉛とすることが好ましく、とくに電気比抵抗が 7 [0008] The material of the vacuum evaporation graphite crucible of the present invention is preferably in the isotropic graphite, in particular electrical resistivity of 7
00〜1000μΩcmで電気比抵抗分布のバラツキが5%以内に収まり、かつ平均気孔径1μm 以下、気体透過度0.02 Variation in electrical resistivity distribution falls within 5% 00~1000Myuomegacm, and an average pore diameter of 1μm or less, the gas permeability 0.02
cm 2 /sec 以下の等方性黒鉛を基材として構成することが望ましい。 It is desirable to configure cm 2 / sec to less isotropic graphite as a base material. 電気比抵抗が 700〜1000μΩcmで電気比抵抗分布のバラツキが5%以内の特性は、誘導加熱時、ルツボ全体に均一な温度分布を付与するために必要で、この設定要件を満たさないと温度分布の変動が大きくなって蒸着ムラの原因となる。 Characteristics of variation within 5% of the electrical resistivity distribution electrical resistivity is in 700~1000μΩcm the time of induction heating, necessary to impart a uniform temperature distribution throughout the crucible, temperature distribution do not adhere to this setting requirement cause of the deposition unevenness fluctuation of increases. また、平均気孔径が1μm を越え、気体透過度が0.02cm 2 /sec を上廻ると黒鉛材組織の緻密度が低下してルツボの耐久寿命が短くなる。 The average pore diameter exceeds the 1 [mu] m, durability of the crucible gas permeability is lowered the density of the Uwamawaru the graphite material tissue 0.02 cm 2 / sec is shortened.

【0009】上記の真空蒸着用黒鉛ルツボを、アルミナ、シリカ等のセラミックス材料で処理すると耐久寿命が一層改善される。 [0009] The vacuum evaporation graphite crucible above, alumina, durable life of treating a ceramic material such as silica is further improved. とくにアルミナ処理を施して黒鉛組織の微細孔にアルミナを充填して材料改質をおこなうと、組織内部への溶融金属の侵入が防止され、材質組織を脆弱化する金属炭化物の生成を効果的に抑制することができる。 Especially when subjected to alumina treatment performed micropores alumina filled material reforming the graphite structure, it is prevented penetration of molten metal to the tissue inside the production of metal carbides weakening the material tissue effectively it can be suppressed. アルミナ処理は、例えばアルミナゾルを黒鉛ルツボに含浸したのち乾燥する方法でおこなうことができる。 Alumina process, for example, alumina sol can be carried out by a method of drying after impregnated into a graphite crucible.

【0010】 [0010]

【作用】本発明に係る真空蒸着用黒鉛ルツボは少なくともフイルム状物の幅と同等以上の長さをもつ長尺ボート形状として形成されているから、、従来数個から数十個単位の丸型黒鉛ルツボを整列させて使用していた方式を1個のルツボ設置で賄うことができる。 [Action] round of the vacuum deposition graphite crucible according to the invention at least the film-like material having a width equal to or greater than the tens units of several conventional ,, from being formed as elongated boat shape having a length the method that was used to align the graphite crucible can be covered by a single crucible installation. このため、誘導加熱時の投入電力量のコントロールが簡単になり、また処理すべきフイルム状物の幅方向における位置ムラのない極めて均等な金属蒸発が発現する。 Therefore, control of the input power amount during the induction heating can be simplified, also very uniform metal evaporating no positional unevenness in the width direction of the film-like object to be processed is expressed.

【0011】とくにるつぼ材質が電気比抵抗 700〜1000 [0011] In particular crucible material is electrical resistivity 700-1000
μΩcmでその分布のバラツキが5%以内にある等方性黒鉛である場合には、ルツボ全体として均一な温度分布が得られる。 In this case the variation of the distribution is isotropic graphite which is within 5% in .mu..OMEGA.cm, uniform temperature distribution as a whole crucible is obtained. したがって、上記の作用と併せて常に均質は金属蒸着被膜の形成が可能となる。 Therefore, always homogeneous in conjunction with the operation of the above it is possible to form a metal deposition film. ルツボ材質として平均気孔径1μm以下、気体透過度0.02cm 2 /sec 以下の等方性黒鉛を適用すると耐久寿命が向上し、更にアルミナ処理を施すと一層の長期安定性が確保される。 The following average pore diameter 1μm as a crucible material, applying the following isotropic graphite gas permeability 0.02 cm 2 / sec improved durability life, greater long-term stability is further subjected to alumina treatment is ensured. なお、本発明の真空蒸着用黒鉛ルツボを使用すれば、溶融金属が減少した段階でルツボ端部から蒸着金属を小塊、フレーク粉末、線材、溶湯など種々の性状形態で補充することができるから、その都度処理を停止することなく連続的に操業を継続することが可能となる。 Incidentally, by using the vacuum deposition graphite crucible of the present invention, the blob the deposited metal from the crucible edge at the stage where the molten metal is reduced, flake powder, wire, because it can be supplemented with a variety of properties forms such as melt , it is possible to continue the continuous operation without stopping each time processing. したがって、処理効率が大幅に改善される。 Thus, processing efficiency is greatly improved.

【0012】 [0012]

【実施例】以下、本発明を実施例に基づいて説明する。 EXAMPLES The following description will explain the present invention in the Examples. 実施例1 嵩比重1.90g/cc、電気比抵抗 900μΩcm、電気比抵抗分布のバラツキ5%、曲げ強さ590kgf/cm 2 、気体透過度0. Example 1 bulk specific gravity 1.90 g / cc, electrical resistivity 900Myuomegacm, variation 5% of the electric resistivity distribution, bending strength 590kgf / cm 2, gas permeability 0.
02cm 2 /sec 、熱膨張係数(RT 〜1000℃)5.0×10 -6 / ℃、 02cm 2 / sec, the coefficient of thermal expansion (RT ~1000 ℃) 5.0 × 10 -6 / ℃,
気孔率10.0 vol%、平均気孔径1.0 μm の特性をもつ等方性黒鉛材を加工して幅140mm 、高さ160mm 、長さ1900 Porosity 10.0 vol%, the width 140mm by processing the isotropic graphite material having the characteristics of the average pore diameter 1.0 [mu] m, height 160 mm, 1900 Length
mmの長尺ボート形状の真空蒸着用黒鉛ルツボを作製した。 It was prepared for vacuum evaporation graphite crucible mm long boat shape. この真空蒸着用ルツボを、周辺を取り巻くように形成された誘導加熱コイル中にセットし、約1KHz の高周波電流によって1500℃に加熱した際の温度分布を測定したところ、20℃未満であることが確認された。 The vacuum evaporation crucible, where set in the induction heating coil formed so as to surround the periphery was measured the temperature distribution when heated to 1500 ° C. by a high frequency current of about 1 KHz, is less than 20 ° C. confirmed.

【0013】上記の真空蒸着用黒鉛ルツボにより、蒸着金属にアルミニウム、被覆対象に膜厚40μm 、幅740mm [0013] The vacuum evaporation graphite crucible above, aluminum vapor deposited metal, thickness 40μm to be coated, width 740mm
のポリ塩化ビニルを用い、真空度5×10 -4 Torr、温度13 Of using a polyvinyl chloride, a vacuum degree of 5 × 10 -4 Torr, the temperature 13
60℃の条件でアルミニウム蒸着膜厚が 400オングストロームになるまで真空蒸着処理をおこなった。 Aluminum deposited layer thickness under the conditions of 60 ° C. was subjected to vacuum deposition process until 400 angstroms. 得られた蒸着膜厚のバラツキは、平均値に対し±5%以内で優れた均質性を備えていることが認められた。 The resulting variation in the deposited film thickness, it has been found that with respect to the mean value and a good homogeneity within 5% ±.

【0014】これに対し、電気比抵抗分布のバラツキが [0014] On the other hand, it is a variation of the electrical resistivity distribution
15%のほかは上記と同等特性の等方性黒鉛材から作製した真空蒸着用黒鉛ルツボでは、温度分布が60℃と大きくなり、形成されたアルミニウム蒸着膜のバラツキも若干拡大する傾向を示した。 The vacuum deposition graphite crucible fabricated from an isotropic graphite material of 15% In addition to the above equivalent properties, increases the temperature distribution and 60 ° C., the variation of the formed aluminum deposited film showed a tendency to slightly enlarge .

【0015】実施例2 平均気孔径および気体透過度が異なる等方性黒鉛を基材として実施例1と同一の長尺ボート形状の真空蒸着用ルツボに加工形成し、これをアルミナゾルに浸漬して含浸処理を施したのち乾燥した。 [0015] Example 2 Example 1 the same processed formed in a vacuum evaporation crucible long boat shape and a mean pore diameter and gas permeability is different isotropic graphite as a base material, which was immersed in alumina sol dried after subjected to impregnation treatment. このようにしてアルミナ処理を施した各真空蒸着用ルツボにつき、実施例1と同一の条件でアルミニウムの真空蒸着をおこなって耐久寿命を試験した。 Thus for each vacuum evaporation crucible subjected to alumina treatment were tested durability life by performing vacuum deposition of aluminum under the same conditions as in Example 1. 耐久寿命の終点は、ルツボ上端面の一部にクラックが発生したときの時間とした。 End point of the service life was the time when a crack occurs in a portion of the crucible upper surface. 各耐久時間をルツボ材料の平均気孔径および気体透過度と対比して表1 Table 1 Each endurance time in comparison with the average pore size and gas permeability of the crucible material
に示した。 It was shown to.

【0016】 [0016]

【0017】表1の結果から、平均気孔径が1μm を越え、また気体透過度が0.02cm 2 /secを上廻ると耐久性が低下することが認められた。 [0017] From the results shown in Table 1, the average pore diameter exceeds the 1 [mu] m, also gas permeability was observed that the 0.02 cm 2 / sec to Uwamawaru the durability is lowered.

【0018】 [0018]

【発明の効果】以上のとおり、本発明により提供される真空蒸着用黒鉛ルツボは従来の丸型黒鉛ルツボと異なる長尺ボート形状の一体化構造を呈するから、被覆対象となるフイルム状物の幅に係わりなく連続操業として常に均質な金属蒸着膜を形成することができる。 As described above, according to the present invention, since the vacuum deposition graphite crucible provided by the present invention exhibits an integrated structure of the different elongated boat shape as a conventional round graphite crucible, the width of the film-like object to be coated target it is possible to form a constantly homogenous metal evaporated film as a continuous operation regardless. とくにルツボ材質を特定の等方性黒鉛材とし、またアルミナ処理を施した場合には形成される蒸着膜のバラツキは一層軽減され、同時に耐久寿命の改善を図ることが可能となるから、実用性能を極めて増大する。 In particular the crucible material and the particular isotropic graphite material, also the variation of the deposited film to be formed when subjected to alumina treatment is further reduced, since it is possible to improve the durability at the same time, practical performance the very increase.

【図面の簡単な説明】 BRIEF DESCRIPTION OF THE DRAWINGS

【図1】従来の丸型黒鉛ルツボを用いた場合の真空蒸着方式を模式的に示した斜視図である。 1 is a perspective view schematically showing a vacuum deposition method when using the conventional round graphite crucible.

【図2】本発明の長尺ボート形状黒鉛ルツボを用いた場合の真空蒸着方式を模式的に示した斜視図である。 2 is a perspective view schematically showing a vacuum deposition method in the case of using a long boat shape graphite crucible of the present invention.

【符号の説明】 DESCRIPTION OF SYMBOLS

1 フイルム状物 2 丸型形状の黒鉛ルツボ 3 長尺ボート形状の黒鉛ルツボ 1 Graphite crucible film-like object 2 round shape of the graphite crucible 3 long boat shape

───────────────────────────────────────────────────── フロントページの続き (72)発明者 宇佐美 三智男 広島県広島市東区戸坂出江1−10−4− 201 (56)参考文献 特開 昭61−187126(JP,A) 特開 昭58−210164(JP,A) 特開 昭64−52674(JP,A) 特公 昭61−51336(JP,B2) 特公 昭58−48629(JP,B2) 特公 昭61−34508(JP,B2) 特公 昭58−51914(JP,B2) (58)調査した分野(Int.Cl. 7 ,DB名) C23C 14/00 - 14/58 F27B 14/10 ────────────────────────────────────────────────── ─── of the front page continued (72) inventor Usami Michiotoko Hiroshima, Hiroshima Prefecture Higashi-ku, Hesakaizue 1-10-4- 201 (56) reference Patent Sho 61-187126 (JP, a) JP Akira 58-210164 (JP, A) JP Akira 64-52674 (JP, A) Tokuoyake Akira 61-51336 (JP, B2) Tokuoyake Akira 58-48629 (JP, B2) Tokuoyake Akira 61-34508 (JP, B2) JP public Akira 58-51914 (JP, B2) (58 ) investigated the field (Int.Cl. 7, DB name) C23C 14/00 - 14/58 F27B 14/10

Claims (1)

    (57)【特許請求の範囲】 (57) [the claims]
  1. 【請求項1】 連続走行するフィルム状物の下部に設置し、真空下の誘導加熱により溶融金属を前記フィルム状物に蒸着させるためのルツボであって、少なくともフィルム状物の幅と同等以上の長さをもつ長尺ボート形状を備え、 電気比抵抗が 700〜1000μΩcmで電気比抵抗分布 1. A installed in the lower portion of the continuous traveling film material, a crucible for depositing the molten metal to the film material by induction heating under vacuum, at least the film-like material width equal to or greater than the It comprises a elongated boat shape with a length, electrical resistivity distribution electrical resistivity of at 700~1000μΩcm
    のバラツキが5%以内に収まり、平均気孔径1μm 以 Variation falls within 5%, an average pore diameter of 1μm or less
    下、気体透過度0.02cm 2 /sec 以下の特性を有し、かつア Lower, it has the following characteristics gas permeability 0.02 cm 2 / sec, Katsua
    ルミナ処理が施された等方性黒鉛からなることを特徴とする真空蒸着用黒鉛ルツボ。 Vacuum evaporation graphite crucible, wherein Rukoto such from isotropic graphite alumina processing has been performed.
JP03054067A 1991-02-25 1991-02-25 Vacuum deposition for the graphite crucible Expired - Fee Related JP3125279B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP03054067A JP3125279B2 (en) 1991-02-25 1991-02-25 Vacuum deposition for the graphite crucible

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP03054067A JP3125279B2 (en) 1991-02-25 1991-02-25 Vacuum deposition for the graphite crucible

Publications (2)

Publication Number Publication Date
JPH04272170A JPH04272170A (en) 1992-09-28
JP3125279B2 true JP3125279B2 (en) 2001-01-15

Family

ID=12960277

Family Applications (1)

Application Number Title Priority Date Filing Date
JP03054067A Expired - Fee Related JP3125279B2 (en) 1991-02-25 1991-02-25 Vacuum deposition for the graphite crucible

Country Status (1)

Country Link
JP (1) JP3125279B2 (en)

Families Citing this family (63)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW490714B (en) 1999-12-27 2002-06-11 Semiconductor Energy Lab Film formation apparatus and method for forming a film
JP4684414B2 (en) * 2000-12-27 2011-05-18 株式会社アドバンテスト Vapor deposition apparatus, the deposition process, the manufacturing method of the electron beam exposure apparatus, a deflection device and a deflection device
TWI472639B (en) 2009-05-22 2015-02-11 Samsung Display Co Ltd Thin film deposition apparatus
JP5623786B2 (en) 2009-05-22 2014-11-12 三星ディスプレイ株式會社Samsung Display Co.,Ltd. Thin film deposition apparatus
US8882920B2 (en) 2009-06-05 2014-11-11 Samsung Display Co., Ltd. Thin film deposition apparatus
US8882921B2 (en) 2009-06-08 2014-11-11 Samsung Display Co., Ltd. Thin film deposition apparatus
US8802200B2 (en) 2009-06-09 2014-08-12 Samsung Display Co., Ltd. Method and apparatus for cleaning organic deposition materials
US9174250B2 (en) 2009-06-09 2015-11-03 Samsung Display Co., Ltd. Method and apparatus for cleaning organic deposition materials
KR101097311B1 (en) 2009-06-24 2011-12-21 삼성모바일디스플레이주식회사 Organic light emitting display apparatus and apparatus for thin layer deposition for manufacturing the same
KR101117720B1 (en) 2009-06-25 2012-03-08 삼성모바일디스플레이주식회사 Apparatus for thin layer deposition and method of manufacturing organic light emitting device using the same
KR20110014442A (en) 2009-08-05 2011-02-11 삼성모바일디스플레이주식회사 Apparatus for thin layer deposition and method for manufacturing of organic light emitting display apparatus using the same
KR101127575B1 (en) 2009-08-10 2012-03-23 삼성모바일디스플레이주식회사 Apparatus for thin film deposition having a deposition blade
JP5676175B2 (en) 2009-08-24 2015-02-25 三星ディスプレイ株式會社Samsung Display Co.,Ltd. Method of manufacturing a thin film deposition apparatus and the organic light emitting display using the same
KR101127578B1 (en) 2009-08-24 2012-03-23 삼성모바일디스플레이주식회사 Apparatus for thin layer deposition, method for manufacturing of organic light emitting display apparatus using the same, and organic light emitting display apparatus manufactured by the method
US8486737B2 (en) 2009-08-25 2013-07-16 Samsung Display Co., Ltd. Thin film deposition apparatus and method of manufacturing organic light-emitting display device by using the same
JP5328726B2 (en) 2009-08-25 2013-10-30 三星ディスプレイ株式會社Samsung Display Co.,Ltd. Method of manufacturing a thin film deposition apparatus and the organic light emitting display device using the same
JP5677785B2 (en) 2009-08-27 2015-02-25 三星ディスプレイ株式會社Samsung Display Co.,Ltd. Method of manufacturing a thin film deposition apparatus and the organic light emitting display using the same
US8696815B2 (en) 2009-09-01 2014-04-15 Samsung Display Co., Ltd. Thin film deposition apparatus
US8876975B2 (en) 2009-10-19 2014-11-04 Samsung Display Co., Ltd. Thin film deposition apparatus
KR101146982B1 (en) 2009-11-20 2012-05-22 삼성모바일디스플레이주식회사 Aapparatus for thin layer deposition and method of manufacturing organic light emitting display apparatus
KR101084184B1 (en) 2010-01-11 2011-11-17 삼성모바일디스플레이주식회사 Apparatus for thin layer deposition
KR101174875B1 (en) 2010-01-14 2012-08-17 삼성디스플레이 주식회사 The film deposition apparatus, a method of manufacturing an organic light emitting display device using the same and therefore the organic light-emitting display device manufactured in accordance
KR101193186B1 (en) 2010-02-01 2012-10-19 삼성디스플레이 주식회사 Apparatus for thin layer deposition, method for manufacturing of organic light emitting display apparatus using the same, and organic light emitting display apparatus manufactured by the method
KR101156441B1 (en) 2010-03-11 2012-06-18 삼성모바일디스플레이주식회사 Apparatus for thin layer deposition
KR101202348B1 (en) 2010-04-06 2012-11-16 삼성디스플레이 주식회사 Apparatus for thin layer deposition and method for manufacturing of organic light emitting display apparatus using the same
US8894458B2 (en) 2010-04-28 2014-11-25 Samsung Display Co., Ltd. Thin film deposition apparatus, method of manufacturing organic light-emitting display device by using the apparatus, and organic light-emitting display device manufactured by using the method
KR101223723B1 (en) 2010-07-07 2013-01-18 삼성디스플레이 주식회사 Apparatus for thin layer deposition, method for manufacturing of organic light emitting display apparatus using the same, and organic light emitting display apparatus manufactured by the method
KR101673017B1 (en) 2010-07-30 2016-11-07 삼성디스플레이 주식회사 Apparatus for thin layer deposition and method for manufacturing of organic light emitting display apparatus using the same
KR101678056B1 (en) 2010-09-16 2016-11-22 삼성디스플레이 주식회사 Apparatus for thin layer deposition, method for manufacturing of organic light emitting display apparatus using the same, and organic light emitting display apparatus manufactured by the method
KR20120029166A (en) 2010-09-16 2012-03-26 삼성모바일디스플레이주식회사 Apparatus for thin layer deposition, method for manufacturing of organic light emitting display apparatus using the same, and organic light emitting display apparatus manufactured by the method
KR101723506B1 (en) 2010-10-22 2017-04-19 삼성디스플레이 주식회사 Apparatus for organic layer deposition and method for manufacturing of organic light emitting display apparatus using the same
KR101738531B1 (en) 2010-10-22 2017-05-23 삼성디스플레이 주식회사 Method for manufacturing of organic light emitting display apparatus, and organic light emitting display apparatus manufactured by the method
KR20120045865A (en) 2010-11-01 2012-05-09 삼성모바일디스플레이주식회사 Apparatus for organic layer deposition
KR20120065789A (en) 2010-12-13 2012-06-21 삼성모바일디스플레이주식회사 Apparatus for organic layer deposition
KR101760897B1 (en) 2011-01-12 2017-07-25 삼성디스플레이 주식회사 Deposition source and apparatus for organic layer deposition having the same
KR101233482B1 (en) * 2011-05-08 2013-02-18 주식회사 야스 Material Injection Angle limited Linear Source
KR101923174B1 (en) 2011-05-11 2018-11-29 삼성디스플레이 주식회사 ESC, apparatus for thin layer deposition therewith, and method for manufacturing of organic light emitting display apparatus using the same
KR101852517B1 (en) 2011-05-25 2018-04-27 삼성디스플레이 주식회사 Apparatus for organic layer deposition and method for manufacturing of organic light emitting display apparatus using the same
KR101840654B1 (en) 2011-05-25 2018-03-22 삼성디스플레이 주식회사 Apparatus for organic layer deposition and method for manufacturing of organic light emitting display apparatus using the same
KR101857992B1 (en) 2011-05-25 2018-05-16 삼성디스플레이 주식회사 Patterning slit sheet assembly, apparatus for organic layer deposition, method for manufacturing organic light emitting display apparatus and organic light emitting display apparatus
KR101857249B1 (en) 2011-05-27 2018-05-14 삼성디스플레이 주식회사 Patterning slit sheet assembly, apparatus for organic layer deposition, method for manufacturing organic light emitting display apparatus and organic light emitting display apparatus
KR20130004830A (en) 2011-07-04 2013-01-14 삼성디스플레이 주식회사 Apparatus for thin layer deposition and method for manufacturing of organic light emitting display apparatus using the same
KR101826068B1 (en) 2011-07-04 2018-02-07 삼성디스플레이 주식회사 Apparatus for thin layer deposition
KR20130010730A (en) 2011-07-19 2013-01-29 삼성디스플레이 주식회사 Deposition source and deposition apparatus with the same
KR20130015144A (en) 2011-08-02 2013-02-13 삼성디스플레이 주식회사 Deposition source, apparatus for organic layer deposition and method for manufacturing of organic light emitting display apparatus using the same
KR20130069037A (en) 2011-12-16 2013-06-26 삼성디스플레이 주식회사 Apparatus for thin layer deposition, method for manufacturing of organic light emitting display apparatus using the same, and organic light emitting display apparatus
KR20140000041A (en) 2012-06-22 2014-01-02 삼성디스플레이 주식회사 Apparatus for organic layer deposition, method for manufacturing of organic light emitting display apparatus using the same, and organic light emitting display apparatus manufactured by the method
US9257649B2 (en) 2012-07-10 2016-02-09 Samsung Display Co., Ltd. Method of manufacturing organic layer on a substrate while fixed to electrostatic chuck and charging carrier using contactless power supply module
KR20140007686A (en) 2012-07-10 2014-01-20 삼성디스플레이 주식회사 Method for manufacturing of organic light emitting display apparatus and organic light emitting display apparatus manufactured by the method
US9461277B2 (en) 2012-07-10 2016-10-04 Samsung Display Co., Ltd. Organic light emitting display apparatus
US9496524B2 (en) 2012-07-10 2016-11-15 Samsung Display Co., Ltd. Organic layer deposition apparatus, method of manufacturing organic light-emitting display apparatus using the same, and organic light-emitting display apparatus manufactured using the method
KR101632298B1 (en) 2012-07-16 2016-06-22 삼성디스플레이 주식회사 Flat panel display device and manufacturing method thereof
KR20140038196A (en) 2012-09-20 2014-03-28 삼성디스플레이 주식회사 Apparatus for thin layer deposition, method for manufacturing of organic light emitting display apparatus using the same, and organic light emitting display apparatus
KR20140039607A (en) 2012-09-24 2014-04-02 삼성디스플레이 주식회사 Apparatus for organic layer deposition, method for manufacturing of organic light emitting display apparatus using the same, and organic light emitting display apparatus manufactured by the method
KR20140050994A (en) 2012-10-22 2014-04-30 삼성디스플레이 주식회사 Organic light emitting display apparatus and method for manufacturing the same
KR20140060171A (en) 2012-11-09 2014-05-19 삼성디스플레이 주식회사 Apparatus for organic layer deposition, method for manufacturing of organic light emitting display apparatus using the same, and organic light emitting display apparatus manufactured by the method
KR20140115162A (en) 2013-03-20 2014-09-30 삼성디스플레이 주식회사 Deposition apparatus for organic layer, method for manufacturing organic light emitting display apparatus using the same, and organic light emitting display apparatus manufactured by the method
KR20140118551A (en) 2013-03-29 2014-10-08 삼성디스플레이 주식회사 Deposition apparatus, method for manufacturing organic light emitting display apparatus and organic light emitting display apparatus
KR20140125184A (en) 2013-04-18 2014-10-28 삼성디스플레이 주식회사 Deposition apparatus, method for manufacturing organic light emitting display apparatus using the same, and organic light emitting display apparatus manufactured by the same
KR20140125180A (en) 2013-04-18 2014-10-28 삼성디스플레이 주식회사 Patterning slit sheet, deposition apparatus comprising the same, method for manufacturing organic light emitting display apparatus using the same, organic light emitting display apparatus manufacture by the method
KR20140146448A (en) 2013-06-17 2014-12-26 삼성디스플레이 주식회사 Apparatus for organic layer deposition, and method for manufacturing of organic light emitting display apparatus using the same
KR101518804B1 (en) 2013-06-24 2015-05-11 삼성전자주식회사 Method and apparatus for managing medical data
KR20150073743A (en) 2013-12-23 2015-07-01 삼성디스플레이 주식회사 Method for manufacturing of organic light emitting display apparatus

Also Published As

Publication number Publication date
JPH04272170A (en) 1992-09-28

Similar Documents

Publication Publication Date Title
US3427185A (en) Composite structural material incorporating metallic filaments in a matrix,and method of manufacture
US5782959A (en) Process for preparing a composite inorganic membrane for hydrogen separation
US3517644A (en) Apparatus for making metal alloy resistors
NL192478C (en) A process for the manufacture of a porous non-evaporable getter device.
US4985313A (en) Wire and cable
CN101087906B (en) Composite fibres and asymmetrical fibres obtained from carbon nanotubes and colloidal particles
RU2224808C2 (en) Metal for electronics and method of production of such metal
JP2637744B2 (en) Ceramic ▲ filtered ▼ filtration membrane and its manufacturing method
US20030178307A1 (en) Production of hollow ceramic membranes by electrophoretic deposition
CA2107830C (en) Method and apparatus for densification of porous billets
US5331134A (en) Double-layered ceramic heater
JP3961025B2 (en) Thin films capacity of using a diamond-like nanocomposite material
US4132828A (en) Assembly of metal-coated carbon fibers, process for production thereof, and method for use thereof
CA1285831C (en) Fibrous material for composite materials, fiber- reinforced metal produced therefrom, and process for producing same
US2772318A (en) Apparatus for vaporization of metals and metalloids
US4115528A (en) Method for fabricating a carbon electrode substrate
EP1293585A2 (en) Apparatus for depositing thin film
JP2005006389A (en) Method of manufacturing insulated coil
US6217732B1 (en) Coated products
US2408910A (en) Electrical condenser
US6086945A (en) Method of forming polycrystalline silicon thin layer
US4591701A (en) Heat radiating sheet body
JP2002517628A (en) Substrate with the photocatalytic coating
US6119626A (en) Vacuum apparatus for forming a thin-film and method for forming thin-film
US2495630A (en) Electrically insulated conductor and process for producing same

Legal Events

Date Code Title Description
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20001010

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20071102

Year of fee payment: 7

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20081102

Year of fee payment: 8

S531 Written request for registration of change of domicile

Free format text: JAPANESE INTERMEDIATE CODE: R313531

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20081102

Year of fee payment: 8

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20081102

Year of fee payment: 8

S111 Request for change of ownership or part of ownership

Free format text: JAPANESE INTERMEDIATE CODE: R313117

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20081102

Year of fee payment: 8

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20091102

Year of fee payment: 9

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20091102

Year of fee payment: 9

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20101102

Year of fee payment: 10

LAPS Cancellation because of no payment of annual fees