JP3124882B2 - Silicon nitride sintered body and method for producing the same - Google Patents

Silicon nitride sintered body and method for producing the same

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Publication number
JP3124882B2
JP3124882B2 JP05319540A JP31954093A JP3124882B2 JP 3124882 B2 JP3124882 B2 JP 3124882B2 JP 05319540 A JP05319540 A JP 05319540A JP 31954093 A JP31954093 A JP 31954093A JP 3124882 B2 JP3124882 B2 JP 3124882B2
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JP
Japan
Prior art keywords
sintered body
silicon nitride
grain boundary
impurities
temperature
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JP05319540A
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Japanese (ja)
Other versions
JPH07172927A (en
Inventor
伸一郎 山下
広一 田中
等 松之迫
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Kyocera Corp
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Kyocera Corp
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Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は室温から高温までの強度
特性に優れ、特に、自動車用部品やガスタ−ビンエンジ
ン用部品等に使用される窒化ケイ素質焼結体の製造方法
に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a silicon nitride sintered body having excellent strength characteristics from room temperature to a high temperature and particularly used for parts for automobiles and parts for gas turbine engines.

【0002】[0002]

【従来技術】従来から、窒化ケイ素質焼結体は、耐熱
性、耐熱衝撃性、および耐酸化特性に優れることからエ
ンジニアリングセラミックス、特にタ−ボロ−タ−等の
熱機関用として応用が進められている。この窒化ケイ素
質焼結体は、一般には窒化ケイ素に対してY2 3 、A
2 3 あるいはMgOなどの焼結助剤を添加すること
により高密度で高強度の特性が得られている。このよう
な窒化ケイ素質焼結体に対しては、さらにその使用条件
が高温化するに際して、高温における強度および耐酸化
特性のさらなる改善が求められている。かかる要求に対
して、これまで焼結助剤の検討や焼成条件等を改善する
等各種の改良が試みられている。
2. Description of the Related Art Conventionally, silicon nitride sintered bodies have been applied to engineering ceramics, especially for heat engines such as tarbor heaters because of their excellent heat resistance, thermal shock resistance and oxidation resistance. ing. This silicon nitride-based sintered body is generally made of Y 2 O 3 , A
By adding a sintering aid such as l 2 O 3 or MgO, high density and high strength characteristics are obtained. When such a silicon nitride sintered body is used under higher temperature conditions, further improvement in strength and oxidation resistance at high temperatures is required. In response to such demands, various improvements have been attempted, for example, by studying sintering aids and improving firing conditions.

【0003】その中で、従来より焼結助剤として用いら
れてきたAl2 3 等の低融点酸化物が高温特性を劣化
させるという見地から、窒化ケイ素に対してY2 3
の周期律表第3a族元素(RE)および酸化ケイ素から
なる単純な3元系(Si3 4 −SiO2 −RE
2 3 )の組成からなる焼結体において、その焼結体の
粒界にSi−RE−O−N系組成物からなるYAM相、
アパタイト相や、シリコンオキシナイトライド(Si2
2 O)相、ダイシリケート(RE2 Si2 7 )相等
の結晶相を析出させることにより粒界の高融点化、ある
いは耐酸化性を図ることが提案されている。
Among them, from the viewpoint that low melting point oxides such as Al 2 O 3, which have been conventionally used as a sintering aid, deteriorate the high-temperature characteristics, the periodicity of Y 2 O 3 or the like with respect to silicon nitride is considered. Simple ternary system (Si 3 N 4 —SiO 2 —RE) composed of Group 3a element (RE) and silicon oxide
In the sintered body having a composition of 2 O 3), YAM phase consisting Si-RE-O-N-based composition in the grain boundary of the sintered body,
Apatite phase, silicon oxynitride (Si 2
It has been proposed to increase the melting point of a grain boundary or to achieve oxidation resistance by precipitating a crystal phase such as an N 2 O) phase and a disilicate (RE 2 Si 2 O 7 ) phase.

【0004】[0004]

【発明が解決しようとする問題点】粒界を結晶化させる
ことは、確かに高温特性を向上させる上で効果的である
と考えられるものの、粒界相中には窒化ケイ素、焼結助
剤成分以外に不可避的に混入する金属酸化物が存在する
ことから、粒界を完全に結晶化することができず、逆に
結晶化に寄与しなかった酸化物が低融点物質を形成し高
温特性を劣化させることもあった。
Although crystallization of grain boundaries is considered to be effective in improving high-temperature characteristics, silicon nitride and sintering aid are contained in the grain boundary phase. The presence of metal oxides that are inevitably mixed in other than the components makes it impossible to completely crystallize the grain boundaries, and conversely, oxides that did not contribute to crystallization form low-melting-point substances and have high-temperature properties. Was sometimes deteriorated.

【0005】そこで、用いる原料として不純物量の少な
い高純度の原料を用いることが考えられるが、このよう
な高純度原料は成形性が悪く、しかも原料自体非常に高
価であり、製造コストが高くなるという問題がある。
Therefore, it is conceivable to use a high-purity raw material having a small amount of impurities as a raw material to be used. However, such a high-purity raw material has poor moldability, and is very expensive, and the production cost is high. There is a problem.

【0006】その他、粒界相成分を窒化ケイ素結晶中に
固溶させて粒界相の量を低減した焼結体としてサイアロ
ン焼結体なども存在するが、このような焼結体は破壊靱
性が不十分であり特性上満足すべきものは得られていな
いのが現状である。
[0006] In addition, there is a sialon sintered body or the like as a sintered body in which the grain boundary phase component is dissolved in silicon nitride crystal to reduce the amount of the grain boundary phase. Such a sintered body has a fracture toughness. However, at present, there is no satisfactory product in terms of characteristics.

【0007】[0007]

【問題点を解決するための手段】本発明者らは、不純物
の挙動について着目し検討を重ねた結果、所定の条件下
で焼成することにより粒界を結晶化させると同時に不純
物をその粒界結晶相中に固溶させることができ、これに
より不純物の焼結体特性への影響を低減でき、粒界の結
晶化による本来の効果が発揮できることを見出し、本発
明に至った。
Means for Solving the Problems The inventors of the present invention have focused on the behavior of the impurities and have repeatedly studied them. As a result, the grains are crystallized by firing under predetermined conditions, and at the same time, the impurities are removed from the grain boundaries. The present inventors have found that a solid solution can be formed in the crystal phase, thereby reducing the influence of impurities on the properties of the sintered body, and exhibiting the original effect of crystallization of the grain boundaries, and have reached the present invention.

【0008】即ち、本発明の窒化ケイ素質焼結体は、窒
化ケイ素を主結晶相とし、その粒界に周期律表第3a族
元素を含むアパタイト、YAM、ワラストナイトから選
ばれる少なくとも1種の粒界結晶相を含む焼結体であっ
て、該焼結体中にAl、Fe、CaおよびMgの陽イオ
ン不純物を10〜10000ppm含むとともに、前記
粒界結晶相中に前記陽イオン不純物の一部あるいは全部
が固溶していることを特徴とするものであり、さらにか
かる焼結体の製造方法として、窒化ケイ素を主体とし、
周期律表第3a族元素酸化物(RE2 3 )および酸化
ケイ素(SiO2 )を含み、SiO2 /RE2 3 で表
されるモル比が2以下の割合からなるとともに、Al、
Fe、CaおよびMgの陽イオン不純物を10〜100
00ppm含む成形体を、窒素を含む雰囲気中で170
0〜2000℃の温度で3時間以上焼成した後、さらに
焼成温度から800℃までを15℃/hr以下の速度で
徐冷することを特徴とするものである。
That is, the silicon nitride sintered body of the present invention has at least one selected from apatite, YAM, and wollastonite having silicon nitride as a main crystal phase and containing a Group 3a element of the periodic table at its grain boundary. A sintered body containing 10 to 10,000 ppm of Al, Fe, Ca, and Mg cation impurities in the sintered body, and containing the cation impurity in the grain boundary crystal phase. It is characterized in that a part or the whole is in solid solution, and further, as a method for producing such a sintered body, mainly silicon nitride,
It contains a Group 3a element oxide (RE 2 O 3 ) and silicon oxide (SiO 2 ) in the periodic table and has a molar ratio represented by SiO 2 / RE 2 O 3 of 2 or less.
10 to 100 cationic impurities of Fe, Ca and Mg
A molded body containing 00 ppm was placed in an atmosphere containing nitrogen for 170 minutes.
After firing for 3 hours or more at a temperature of 0 to 2000 ° C., the temperature is gradually cooled from the firing temperature to 800 ° C. at a rate of 15 ° C./hr or less.

【0009】以下、本発明を詳述する。本発明の窒化ケ
イ素質焼結体は、組成上は窒化ケイ素を主成分とするも
ので、これに添加成分として周期律表第3a族元素およ
び過剰酸素を含む。ここで、過剰酸素とは、焼結体中の
全酸素量から焼結体中のSi以外の周期律表第3a族元
素が化学量論的に酸化物を形成した場合にその元素に結
合している酸素を除く残りの酸素量であり、そのほとん
どは窒化ケイ素原料に含まれる酸素、あるいは添加され
る酸化ケイ素として混入するものであり、本発明では全
てSiO2 として存在するものとして考慮する。
Hereinafter, the present invention will be described in detail. The silicon nitride sintered body of the present invention is mainly composed of silicon nitride in composition, and contains, as additional components, a Group 3a element of the periodic table and excess oxygen. Here, the excess oxygen means that when a group 3a element of the periodic table other than Si in the sintered body forms an oxide stoichiometrically from the total amount of oxygen in the sintered body, it binds to the element. This is the amount of oxygen remaining except for the oxygen contained therein, most of which is mixed as oxygen contained in the silicon nitride raw material or added silicon oxide. In the present invention, it is considered that all are present as SiO 2 .

【0010】本発明の窒化ケイ素質焼結体は、組織的に
は窒化ケイ素結晶相を主相とするのであって、そのほと
んどがβ−Si3 4 からなり、およそ1〜10μmの
平均粒径で存在する。また、その粒界には周期律表第3
a族元素および過剰の酸素(酸化ケイ素として存在する
と考えられるが)が少なくとも存在するが、さらにこの
粒界中には不可避不純物としてAl、Fe、Ca、Mg
等の陽イオン不純物を含むものであり、これらの陽イオ
ン不純物は、用いる原料にもよるが10〜10000p
pmの量で含有されるものである。
The silicon nitride-based sintered body of the present invention is structurally mainly composed of a silicon nitride crystal phase, most of which is composed of β-Si 3 N 4 and has an average grain size of about 1 to 10 μm. Exists in diameter. In addition, the grain boundary has
At least a group a element and excess oxygen (which is considered to exist as silicon oxide) are present, but Al, Fe, Ca, Mg as unavoidable impurities are present in the grain boundaries.
And the like, and these cationic impurities may be 10 to 10,000 pP depending on the raw material used.
pm.

【0011】本発明における大きな特徴は、上記陽イオ
ン不純物が粒界相中に存在する上記結晶相中に存在する
点にある。これにより、Al、Fe、Ca、Mg等の粒
界相中のガラス中への含有量が少なくなり、ガラスの高
融点化が進み焼結体の高温特性が改善される。
A major feature of the present invention is that the cationic impurities are present in the crystal phase existing in the grain boundary phase. Thereby, the content of Al, Fe, Ca, Mg, etc. in the glass in the grain boundary phase is reduced, and the melting point of the glass is increased, and the high-temperature characteristics of the sintered body are improved.

【0012】本発明者らの検討によれば、上記のように
陽イオン不純物を固溶しえる結晶相としては、アパタイ
ト、YAM、ワラストナイトに限られるために、これら
の結晶相以外のシリコンオキシナイトライド(Si2
2 O)相、ダイシリケート(RE2 Si2 7 )相には
固溶しないことを確認した。よって、粒界相にはアパタ
イト、YAM、ワラストナイトから選ばれる少なくとも
1種の結晶相が存在することが必要となる。
According to the study of the present inventors, the crystal phases capable of forming a solid solution of cationic impurities as described above are limited to apatite, YAM, and wollastonite. Oxynitride (Si 2 N
2 O) phase, the disilicate (RE 2 Si 2 O 7) phase was confirmed that no solid solution. Therefore, it is necessary that at least one crystal phase selected from apatite, YAM, and wollastonite exists in the grain boundary phase.

【0013】アパタイト、YAM、ワラストナイトなど
の結晶相を粒界に析出させるためには焼結体中の過剰酸
素の酸化ケイ素(SiO2 )換算量の周期律表第3a族
元素の酸化物(RE2 3 )換算量に対するSiO2
RE2 3 で表されるモル比を2以下、特に1.0〜
2.0に組成制御することが必要であり、このモル比が
2を越えると、粒界にSi2 2 OやRE2 Si2 7
等の結晶相が析出し、上記作用がなく、高温特性が改善
されない。
In order to precipitate a crystal phase such as apatite, YAM, wollastonite or the like at the grain boundaries, an oxide of an element of Group 3a of the Periodic Table in the amount of excess oxygen in the sintered body in terms of silicon oxide (SiO 2 ). (RE 2 O 3 ) SiO 2 /
The molar ratio represented by RE 2 O 3 is 2 or less, particularly 1.0 to
It is necessary to control the composition to 2.0, and if this molar ratio exceeds 2 , Si 2 N 2 O or RE 2 Si 2 O 7
And the like, and the high-temperature characteristics are not improved.

【0014】ただし、焼結体中における陽イオン不純物
量が10000ppmを越えると、粒界結晶相中への不
純物成分の固溶が飽和状態となり、粒界ガラス相中への
混入が顕著になるために本発明の効果が期待できない。
従って、本発明ではこれらの陽イオン不純物量は10〜
10000ppm、特に100〜6000ppm以下と
することが望ましい。
However, if the amount of cationic impurities in the sintered body exceeds 10,000 ppm, the solid solution of the impurity component in the grain boundary crystal phase becomes saturated, and the incorporation into the grain boundary glass phase becomes remarkable. The effect of the present invention cannot be expected.
Therefore, in the present invention, the amount of these cationic impurities is 10 to
It is desirable that the content be 10,000 ppm, particularly 100 to 6000 ppm or less.

【0015】なお、本発明に用いられる周期律表第3a
族元素としては、Yやランタノイド元素が挙げられる
が、その中でも特にYb、Er、Dy、Luが望まし
く、これらの中でもLuが最も望ましい。これらの量は
3〜10モル%、特に3〜7モル%の範囲に制御するこ
とが望ましく、3モル%より少ないと緻密化が困難とな
り、10モル%を越えると粒界の絶対量が増加し高温特
性が劣化しやすくなる。
The periodic table 3a used in the present invention
Examples of group elements include Y and lanthanoid elements, and among them, Yb, Er, Dy, and Lu are particularly desirable, and among these, Lu is most desirable. It is desirable to control these amounts in the range of 3 to 10 mol%, particularly 3 to 7 mol%, and if it is less than 3 mol%, it is difficult to densify, and if it exceeds 10 mol%, the absolute amount of grain boundaries increases. And the high-temperature characteristics are likely to deteriorate.

【0016】なお、本発明の窒化ケイ素質焼結体中に
は、粒界における上記挙動を阻害しない成分であれば、
微量添加することも可能であり、例えば周期律表4a、
5a、6a族金属やそれらの炭化物、窒化物、珪化物ま
たはSiCなどは、分散粒子やウイスカーとして適量添
加して複合材料として特性の改善を行うことも当然可能
である。
In the silicon nitride sintered body of the present invention, any component which does not inhibit the above-mentioned behavior at the grain boundary may be used.
It is also possible to add a small amount, for example, periodic table 4a,
It is of course possible to improve the properties as a composite material by adding an appropriate amount of a 5a or 6a group metal or a carbide, nitride, silicide or SiC thereof as dispersed particles or whiskers.

【0017】次に、本発明の窒化ケイ素質焼結体の製造
方法について説明する。本発明によれば、出発原料とし
て窒化ケイ素粉末を主成分とし、添加成分として周期律
表第3a族元素酸化物、場合により酸化ケイ素粉末を添
加してなる。また添加形態として周期律表第3a族元素
酸化物と酸化ケイ素からなる化合物,または窒化ケイ素
と周期律表第3a族元素酸化物と酸化ケイ素の化合物粉
末を用いることもできる。
Next, a method for producing the silicon nitride sintered body of the present invention will be described. According to the present invention, a silicon nitride powder is used as a main component as a starting material, and an oxide of a Group 3a element of the periodic table, optionally a silicon oxide powder is added as an additional component. As an addition form, a compound composed of an oxide of a Group 3a element of the periodic table and silicon oxide, or a compound powder of silicon nitride, an oxide of an element of the Group 3a of the periodic table and silicon oxide can be used.

【0018】用いられる窒化ケイ素粉末は、α型、β型
のいずれでも使用することができ、その粒子径は0.4
〜1.2μmが適当である。
The silicon nitride powder used may be either α-type or β-type, and has a particle diameter of 0.4
1.21.2 μm is appropriate.

【0019】本発明によれば、これらの粉末を用いて、
周期律表第3a族元素酸化物(RE2 3 )と過剰酸素
の酸化ケイ素換算(SiO2 )とのSiO2 /RE2
3 とのモル比が2以下となるように調製する。なお、こ
の時の窒化ケイ素粉末は70〜97モル%、周期律表第
3a族元素酸化物(RE2 3 )は3〜10モル%とす
るのが適当である。ここでの過剰酸素とは、窒化ケイ素
粉末に含まれる不純物酸素をSiO2 換算した量と添加
したSiO2 粉末の合量である。
According to the present invention, using these powders,
SiO 2 / RE 2 O between Group 3a element oxide (RE 2 O 3 ) of the periodic table and excess oxygen in terms of silicon oxide (SiO 2 )
It is prepared so that the molar ratio with 3 is 2 or less. At this time, it is appropriate that the silicon nitride powder is 70 to 97 mol%, and the oxide of a group 3a element of the periodic table (RE 2 O 3 ) is 3 to 10 mol%. Here excess oxygen is the total amount of SiO 2 powder impurities oxygen was added to the amount SiO 2 in terms contained in the silicon nitride powder.

【0020】なお、上記周期律表第3a族元素酸化物量
が3モル%より少ないと焼結性が低下し、10モル%を
越えると粒界成分量が増加し高温強度が低下する傾向に
ある。また上記モル比率が2を越えると前述したように
アパタイト、YAM、ワラストナイトの結晶相の生成が
望めないためである。
If the amount of the Group 3a element oxide in the periodic table is less than 3 mol%, the sinterability tends to decrease, and if it exceeds 10 mol%, the amount of the grain boundary component tends to increase and the high-temperature strength tends to decrease. . On the other hand, if the molar ratio exceeds 2, the formation of the crystalline phases of apatite, YAM and wollastonite cannot be expected as described above.

【0021】上記の割合で混合された混合粉末を所望の
成形手段、例えば、金型プレス、鋳込み成形、押し出し
成形、射出成形、冷間静水圧プレス等により任意の形状
に成形する。この時の成形体中には、各原料中の不純物
に合わせ、工程中に混入する不純物を合わせ、10〜1
0000ppm、特に100〜6000ppmの範囲で
含むものである。
The mixed powder mixed in the above ratio is formed into an arbitrary shape by a desired molding means, for example, a die press, a casting molding, an extrusion molding, an injection molding, a cold isostatic pressing and the like. In the compact at this time, according to the impurities in each raw material and the impurities mixed in the process, 10 to 1
0000 ppm, particularly 100 to 6000 ppm.

【0022】次に、この成形体を窒素を含む1600〜
1950℃の非酸化性雰囲気中で焼成する。具体的に
は、焼成温度に応じ窒素ガスを1.5気圧以上に加圧し
て窒化ケイ素が分解しない条件で行う。従って、焼成方
法としては、常圧焼成、窒素ガス加圧焼成、熱間静水圧
焼成などが使用でき、その他、常圧焼成、窒素ガス加圧
焼成したものを熱間静水圧焼成したり、成形体をガラス
中に埋設あるいは封印し高圧ガス中で熱間静水圧焼成す
ることもできる。
Next, the molded product was heated to 1600
It is fired in a non-oxidizing atmosphere at 1950 ° C. Specifically, nitrogen gas is pressurized to 1.5 atm or more according to the firing temperature, and the conditions are such that silicon nitride is not decomposed. Accordingly, as the firing method, normal pressure firing, nitrogen gas pressure firing, hot isostatic pressure firing, and the like can be used. In addition, normal pressure firing, nitrogen gas pressure firing, hot isostatic pressure firing, or molding The body can also be embedded or sealed in glass and hot isostatically fired in a high pressure gas.

【0023】上記製造方法において、粒界に特定の結晶
相を析出させるとともに、前述したように陽イオン不純
物をその粒界結晶相中に固溶させるためには、窒素を含
む雰囲気中で1700〜2000℃、特に1800〜1
950℃の温度で3時間以上、特に4〜12時間焼成し
た後に、さらに焼成温度から800℃までを15℃/m
in以下、特に12℃/minの速度で徐冷することが
よい。焼成時間を3時間以上、冷却速度を15℃/mi
n以下に限定したのは、これらが上記範囲を逸脱する
と、いずれも粒界結晶相への不純物の固溶が不十分とな
り、本発明における効果が発揮されないためである。
In the above-mentioned production method, in order to precipitate a specific crystal phase at the grain boundary and to dissolve the cation impurity in the grain boundary crystal phase as described above, it is necessary to place the cation impurity in an atmosphere containing nitrogen at 1700 to 1700. 2000 ° C, especially 1800-1
After baking at a temperature of 950 ° C. for 3 hours or more, particularly 4 to 12 hours, the temperature is further increased from the baking temperature to 800 ° C. by 15 ° C./m
It is preferable to gradually cool at a rate of 12 ° C./min or less, particularly at 12 ° C./min. Firing time of 3 hours or more, cooling rate of 15 ° C / mi
The reason for limiting to n or less is that if any of these deviates from the above range, the solid solution of impurities into the grain boundary crystal phase becomes insufficient and the effect of the present invention is not exhibited.

【0024】[0024]

【作用】Al、Fe、CaおよびMg等の金属は、窒化
ケイ素原料等に不可避的に含まれており、焼結体中の粒
界に存在する。粒界を結晶化した場合には、通常これら
の成分が結晶相とは別に結晶化に寄与しないSiO2
周期律表第3a族元素酸化物等の成分とともにガラス相
を形成する。このガラス相はAl、Fe、CaおよびM
gを含むことにより低融点化するため、焼結体の高温特
性を劣化させてしまう。
The metal such as Al, Fe, Ca and Mg is inevitably contained in the silicon nitride raw material and the like, and exists at the grain boundary in the sintered body. When the grain boundary is crystallized, these components usually form a glass phase together with components such as SiO 2 and group 3a element oxides of the periodic table that do not contribute to crystallization separately from the crystal phase. This glass phase is composed of Al, Fe, Ca and M
The inclusion of g lowers the melting point, which degrades the high-temperature characteristics of the sintered body.

【0025】そこで、本発明によれば、粒界中にYA
M、アパタイト、ワラストナイトの結晶を析出させると
ともに、この結晶中にAl、Fe、CaおよびMg等の
陽イオン不純物を固溶させることにより、Al、Fe、
CaおよびMgを固定化しこれらの成分のSiO2 等の
ガラス相への混入を抑制できることから、ガラスの低融
点化を防止することができる。
Therefore, according to the present invention, YA is contained in the grain boundaries.
By precipitating crystals of M, apatite and wollastonite and dissolving cationic impurities such as Al, Fe, Ca and Mg in the crystals, Al, Fe,
Since Ca and Mg are fixed and the mixing of these components into the glass phase such as SiO 2 can be suppressed, it is possible to prevent the melting point of the glass from being lowered.

【0026】これにより粒界相の低融点ガラスの生成が
抑制されるための焼結体の高温特性を改善し、特に高温
強度および耐クリープ特性を改善することができる。
As a result, the high-temperature characteristics of the sintered body for suppressing the formation of the low-melting glass in the grain boundary phase can be improved, and in particular, the high-temperature strength and the creep resistance can be improved.

【0027】[0027]

【実施例】原料粉末として陽イオン不純物量の異なる数
種の窒化ケイ素粉末(BET比表面積7〜15m2
g、α率94〜99%、酸素量0.9〜1.2重量%)
と、各種の周期律表第3a族元素酸化物粉末および酸化
ケイ素粉末を用いて、Si34 、RE2 3 、SiO
2 の量が表1になるように調合し、イソプロピルアルコ
ールを溶媒として窒化ケイ素ボールを用いて72時間振
動ミルで混合粉砕し、スラリーを乾燥後、直径60m
m、厚み10mmの形状に3t/cm2 の圧力でラバー
プレス成形した。得られた成形体に対して陽イオン不純
物量としてAl、Fe、CaおよびMg量をICP発光
分光分析により定量分析しその総量を表1に示した。そ
して、かかる焼結体を表1に示す条件下で焼成した。そ
して、得られた焼結体に対して、X線回折測定によりS
3 4 以外の結晶相を検出し表2に示した。
EXAMPLES Several kinds of silicon nitride powders having different amounts of cationic impurities (BET specific surface area: 7 to 15 m 2 /
g, α ratio 94-99%, oxygen amount 0.9-1.2% by weight)
And various types of oxide powders of the Group 3a element of the periodic table and silicon oxide powders, and Si 3 N 4 , RE 2 O 3 , SiO 2
2 were mixed so as to be as shown in Table 1, and mixed and pulverized with a vibration mill for 72 hours using silicon nitride balls with isopropyl alcohol as a solvent, and after drying the slurry, the diameter was 60 m.
m and a thickness of 10 mm were subjected to rubber press molding under a pressure of 3 t / cm 2 . The amount of Al, Fe, Ca and Mg as the amount of cationic impurities was quantitatively analyzed by ICP emission spectrometry for the obtained molded body, and the total amount is shown in Table 1. The sintered body was fired under the conditions shown in Table 1. Then, the obtained sintered body was subjected to X-ray diffraction measurement to obtain S
Crystal phases other than i 3 N 4 were detected and are shown in Table 2.

【0028】さらに、焼結体をテフロン加圧容器内に入
れ、水:硫酸が5:1(容積比)の溶液中で200℃、
1.5時間加圧分解して焼結体中のアモルファス相(ガ
ラス相)のみを溶出させ、溶出した成分中のAl、F
e、CaおよびMg量を測定し、先に測定した成形体中
のAl、Fe、CaおよびMgの総量から差し引いた量
を粒界結晶中に固溶した不純物量と認定し、その量を表
2に示した。
Further, the sintered body was placed in a Teflon pressurized container, and was placed in a 5: 1 (volume ratio) water: sulfuric acid solution at 200 ° C.
Decompose under pressure for 1.5 hours to elute only the amorphous phase (glass phase) in the sintered body.
e, the amounts of Ca and Mg were measured, and the amount subtracted from the previously measured total amount of Al, Fe, Ca and Mg in the compact was determined as the amount of impurities dissolved in the grain boundary crystals, and the amount was expressed as a table. 2 is shown.

【0029】また、機械的特性として、焼結体を3×4
×40mmのテストピース形状に切断研磨しJIS−R
1601に基づき室温および1400℃での4点曲げ抗
折強度試験を実施した。また、耐クリープ特性として、
上記4点曲げ試験に基づき、1400℃で400MPa
の荷重を負荷した状態で保持し、破断に至るまでの時間
を測定し、最高10時間保持した。その結果を表2に示
した。
As for the mechanical properties, the sintered body is 3 × 4
Cut and polished into a test piece shape of × 40mm, JIS-R
Based on 1601, a four-point bending strength test at room temperature and 1400 ° C. was performed. In addition, as creep resistance properties,
Based on the above four-point bending test, 400 MPa at 1400 ° C
Was held in a state where a load was applied, the time until breakage was measured, and held for a maximum of 10 hours. The results are shown in Table 2.

【0030】[0030]

【表1】 [Table 1]

【0031】[0031]

【表2】 [Table 2]

【0032】表1および表2の試料No.1〜5の結果に
よれば、焼成時間を長くするとともに焼成後徐冷するこ
とにより粒界結晶相中への不純物の固溶が促進されるこ
とがわかる。それに伴い、従来法である試料No.1に比
較して本発明品である試料No.2〜5はいずれも高温強
度に優れるとともに、耐クリープ特性の向上が認められ
た。
According to the results of Samples Nos. 1 to 5 in Tables 1 and 2, the solid solution of impurities in the grain boundary crystal phase is promoted by increasing the firing time and gradually cooling after firing. I understand. Accordingly, all of the samples Nos. 2 to 5 of the present invention were excellent in high-temperature strength and improved in creep resistance as compared with the sample No. 1 of the conventional method.

【0033】試料No.6〜7の結果によれば、成形体中
の不純物量が10000ppmを越える場合には、粒界
結晶相中への不純物の固溶が進行しても十分な特性の向
上が得られず、陽イオン不純物総量が10000ppm
以下とする必要があることがわかった。
According to the results of Samples Nos. 6 and 7, when the amount of impurities in the compact exceeds 10,000 ppm, even if the solid solution of the impurities into the grain boundary crystal phase progresses, the characteristics are sufficiently improved. Is not obtained and the total amount of cationic impurities is 10,000 ppm
It turns out that it is necessary to:

【0034】また、粒界結晶相がシリコンオキシナイト
ライドやダイシリケートからなる試料No.21では粒界
結晶相への固溶は全く認められず、粒界結晶相がアパタ
イト、YAM、ワラストナイトからなることが重要であ
ることがわかる。
In Sample No. 21 in which the grain boundary crystal phase was composed of silicon oxynitride or disilicate, no solid solution was recognized in the grain boundary crystal phase, and the grain boundary crystal phase was apatite, YAM, wollastonite. Is important.

【0035】表1中、陽イオン不純物の粒界結晶相中へ
の多量の固溶が見られた本発明品はいずれも高い高温強
度を有するとともに、耐クリープ特性にも優れるもので
あった。
In Table 1, all of the products of the present invention in which a large amount of cationic impurities were dissolved in the grain boundary crystal phase were found to have high high-temperature strength and excellent creep resistance.

【0036】[0036]

【発明の効果】以上詳述したように、本発明によれば、
Al、Ca、FeおよびMg等の陽イオン不純物による
高温特性の劣化作用を低減し、高温強度および高温耐ク
リープ特性に優れた焼結体を得ることができる。また、
本発明によれば、ある程度の陽イオン不純物を含んだ原
料を用いても不純物の影響を低減できることから高純度
原料を使用する必要がないために安価に製造することが
できる。
As described in detail above, according to the present invention,
The deterioration of high-temperature characteristics due to cationic impurities such as Al, Ca, Fe, and Mg is reduced, and a sintered body excellent in high-temperature strength and high-temperature creep resistance can be obtained. Also,
According to the present invention, even if a raw material containing a certain amount of cationic impurities is used, the influence of the impurities can be reduced, so that it is not necessary to use a high-purity raw material, so that the production can be performed at low cost.

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 平4−243972(JP,A) 特開 平4−65362(JP,A) 特開 平2−97465(JP,A) (58)調査した分野(Int.Cl.7,DB名) C04B 35/584 ────────────────────────────────────────────────── ─── Continuation of front page (56) References JP-A-4-243972 (JP, A) JP-A-4-65362 (JP, A) JP-A-2-97465 (JP, A) (58) Field (Int. Cl. 7 , DB name) C04B 35/584

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】窒化ケイ素を主結晶相とし、その粒界に周
期律表第3a族元素を含むアパタイト、YAM、ワラス
トナイトから選ばれる少なくとも1種の粒界結晶相を含
む焼結体であって、該焼結体中にAl、Fe、Caおよ
びMgの陽イオン不純物を10〜10000ppm含む
とともに、前記粒界結晶相中に前記陽イオン不純物の一
部あるいは全部が固溶していることを特徴とする窒化ケ
イ素質焼結体。
1. A sintered body comprising silicon nitride as a main crystal phase and at least one grain boundary crystal phase selected from apatite, YAM and wollastonite containing a Group 3a element of the periodic table at its grain boundary. In addition, the sintered body contains 10 to 10000 ppm of Al, Fe, Ca and Mg cationic impurities, and some or all of the cationic impurities are dissolved in the grain boundary crystal phase. A silicon nitride based sintered body characterized by the following.
【請求項2】窒化ケイ素を主体とし、周期律表第3a族
元素酸化物(RE2 3 )および酸化ケイ素(Si
2 )を含み、SiO2 /RE2 3 で表されるモル比
が2以下の割合からなるとともに、Al、Fe、Caお
よびMgの陽イオン不純物を10〜10000ppm含
む成形体を、窒素を含む雰囲気中で1700〜2000
℃の温度で3時間以上焼成した後、さらに焼成温度から
800℃までを15℃/hr以下の速度で徐冷すること
を特徴とする窒化ケイ素質焼結体の製造方法。
2. An oxide of a Group 3a element of the periodic table (RE 2 O 3 ) and a silicon oxide (Si) mainly composed of silicon nitride.
O 2) comprises, together with the molar ratio represented by SiO 2 / RE 2 O 3 is made of the ratio of 2 or less, Al, Fe, a shaped body comprising 10~10000ppm cation impurities of Ca and Mg, nitrogen 1700-2000 in an atmosphere containing
A method for producing a silicon nitride-based sintered body, characterized in that after firing at a temperature of 3 ° C. for 3 hours or more, the temperature is gradually cooled from the firing temperature to 800 ° C. at a rate of 15 ° C./hr or less.
JP05319540A 1993-12-20 1993-12-20 Silicon nitride sintered body and method for producing the same Expired - Fee Related JP3124882B2 (en)

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JP3124882B2 true JP3124882B2 (en) 2001-01-15

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