JP3114578B2 - Exhaust gas concentration control system - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an exhaust gas concentration control system, and more particularly to an exhaust gas concentration control system used in an exhaust gas treatment facility for processing a reaction product gas containing a special high-pressure gas used in a semiconductor manufacturing process or the like.

[0002]

2. Description of the Related Art Conventionally, in this type of exhaust gas concentration control system, the concentration of the reaction product gas in a pipe (duct pipe) for discharging the reaction product gas from a production facility is not more than a reduction amount. An inert gas such as Ar or N2 is introduced in advance.

[0003] The reaction product gas discharged through this pipe is subjected to simple detoxification treatment such as dilution or discharge through an adsorption filter. A scrubber process (gas purification process) is performed as a final process on the reaction product gas on which these processes are performed.
Is carried out and then released to the outside.

[0004] Here, the scrubber treatment is an air purification treatment for removing dust and gas contained in gas by spraying fine water droplets.

[0005] Further, an interlock for installing a gas detector before the scrubber treatment and stopping a gas supply valve for controlling the supply of high-pressure gas to the high-pressure gas consuming equipment when the gas detector detects gas. Is provided.

[0006]

The conventional exhaust gas concentration control system described above does not actively control the concentration of the reaction product gas, but only monitors the reaction product gas and issues an alarm. When the concentration of the generated gas reaches the control concentration, the production equipment must be stopped and its cause must be investigated.

Further, even when the simple removal treatment is performed on the reaction product gas, the through component may exceed the voluntary regulation value when the high concentration reaction product gas is discharged. It is conceivable that the reaction product gas is not completely removed by the scrubber treatment.

Accordingly, an object of the present invention is to solve the above-mentioned problems, to actively control the concentration of the reaction product gas, and to remove the reaction product gas to a gas concentration equal to or less than the voluntary regulation value. An object of the present invention is to provide an exhaust gas concentration control system.

It is another object of the present invention to provide an exhaust gas concentration control system capable of performing exhaust gas concentration control corresponding to the type of reaction product gas.

[0010]

SUMMARY OF THE INVENTION An exhaust gas concentration control system according to the present invention comprises an exhaust gas treatment facility including a gas purification means for purifying a reaction product gas discharged from a production facility and discharging the gas to the outside. A control system, comprising: gas adsorbing means for adsorbing the reaction product gas; gas detecting means for detecting a gas concentration of the reaction product gas after a gas adsorption process is performed by the gas adsorption means; A supply unit for selectively supplying the reaction product gas to one of the gas purifying unit and the gas adsorption unit according to a detection result of the unit.

Another exhaust gas concentration control system according to the present invention is an exhaust gas concentration control system for an exhaust gas treatment facility including a gas purifying means for purifying a plurality of types of reaction products discharged from a production facility and discharging the gas to the outside. A system, wherein a plurality of gas adsorbing means for adsorbing each of the plurality of reaction product gases, and types and concentrations of the plurality of reaction product gases after the plurality of gas adsorption means perform a gas adsorption process. And a supply unit for selectively supplying the reaction product gas to one of the gas purification unit and the plurality of gas adsorption units according to a detection result of the gas detection unit. ing.

Another exhaust gas concentration control system according to the present invention is an exhaust gas concentration control system for an exhaust gas treatment facility including a gas purifying means for purifying a plurality of types of reaction product gases discharged from a production facility and discharging the gas to the outside. In the system, a plurality of gas adsorbing means for adsorbing each of the plurality of reaction product gases, and a gas concentration of the plurality of reaction product gases after the gas adsorption process is performed by the plurality of gas adsorption means. Gas detection means for detecting, first supply means for supplying the reaction product gas to the gas purification means when the detection result of the gas detection means is equal to or less than a preset regulation value, and detection result of the gas detection means And a second supply unit for sequentially supplying the reaction product gas to each of the plurality of gas adsorption units when is not less than the regulation value.

[0013]

DESCRIPTION OF THE PREFERRED EMBODIMENTS First, the operation of the present invention will be described below.

When a reaction product gas containing a special high-pressure gas is discharged from a semiconductor manufacturing line or the like using a high-pressure gas consuming equipment, a damper valve is controlled so that the concentration of the reaction product gas is controlled to a voluntary regulation value before the scrubber treatment by the scrubber The reaction product gas is adsorbed by a gas adsorption process using an adsorption tower until the following conditions are satisfied. As a result, the concentration of the reaction product gas can be positively controlled, and the reaction product gas can be removed to a gas concentration equal to or less than the voluntary regulation value.

Before the scrubber treatment by the scrubber, the reaction product gas is adsorbed by the gas adsorption treatment by the adsorption tower corresponding to the type until the concentration of the reaction product gas falls below the voluntary regulation value for each type. This makes it possible to control the exhaust gas concentration corresponding to the type of the reaction product gas.

Next, embodiments of the present invention will be described with reference to the drawings. FIG. 1 is a block diagram showing a system configuration according to an embodiment of the present invention. In the figure, a semiconductor manufacturing system according to one embodiment of the present invention is a high-pressure gas consuming facility 1-i.
(I = 1, 2, 3, 4, 5,...), The simple abatement processing unit 2-i, the duct pipe 3, and the gas detector heads 4, 13
-15, damper valves 5-9, 16-21, adsorption towers 10-12, exhaust blower 22, exhaust fan 23,
It comprises a scrubber 24 and a system controller 25.

FIGS. 2 to 4 are flowcharts showing the control of the concentration of the reaction product gas according to one embodiment of the present invention. The control of the concentration of the reaction product gas according to one embodiment of the present invention will be described with reference to FIGS.

The high-pressure gas consuming equipment 1-i is an apparatus in which a large amount of special high-pressure gas such as silane, phosphine, and arsine is used in a CVD process, a dry etching process, an epi-growth process, and the like in a semiconductor manufacturing line.

The simple detoxification processing unit 2-i dilutes the reaction product gas discharged from the high-pressure gas consuming equipment 1-i with a large amount of inert gas (Ar, N2, etc.) or removes the reaction product gas by an adsorption filter. And the like, the simple harm removal process is performed, and the gas is discharged to the duct pipe 3 as exhaust gas.

A gas detector head 4 is installed in the duct pipe 3. The gas detector head 4 detects the type and concentration of gas in the duct pipe 3, and the detection result is used as a detector controller of the system controller 25. 25a is notified and displayed.

The detector controller 25a has a function of presetting a voluntary regulation value or the like determined in advance according to each type of reaction product gas. The system controller 25 includes a detector controller 25a, an adsorption tower controller 25b, and a valve controller 25c.

Normally, if the detected concentration of the gas detector head 4 is equal to or less than the voluntary regulation value (steps S1 and S2 in FIG. 2), the system controller 25 opens the damper valve 5 and activates the other damper valves 6-9 and 16-21. The closed state is set (step S3 in FIG. 2).

The reaction product gas discharged to the discharge side of the damper valve 5 is taken into the scrubber 24 by the exhaust fan 23 (step S4 in FIG. 2), and the scrubber process (final process) is performed in the scrubber 24 to perform external processing. It is released into the atmosphere (step S5 in FIG. 2).

On the other hand, when the detected concentration of the gas detector head 4 exceeds the voluntary regulation value (steps S1 and S2 in FIG. 2), the system controller 25 first closes the damper valve 5 and opens the damper valve 6 (step S6 in FIG. 2). .

After that, the system controller 25 opens the damper valve 7 (step S7 in FIG. 2), and
Performs a gas adsorption process on the reaction product gas in FIG.
Step S8). Here, the adsorption tower 10 is filled with metal oxide solid particles (adsorption filler) having a certain surface area, and a suction blower (not shown) is provided.

A gas detector head 13 is provided at the subsequent stage of the adsorption tower 10, and the gas detector head 13 detects the gas concentration of the reaction product gas after the gas adsorption process is performed in the adsorption tower 10. (Step S9 in FIG. 2).

The system controller 25 checks whether or not the detection result by the gas detector head 13 has become equal to or less than the self-regulation value (set value) (step S10 in FIG. 2). If the detection result by the gas detector head 13 is equal to or less than the self-regulation value, the system controller 25 opens the damper valve 16 (step S11 in FIG. 2), and removes the reaction product gas subjected to the gas adsorption process in the adsorption tower 10 by the exhaust fan 23. The scrubber is taken into the scrubber 24 (step S12 in FIG. 2), and the scrubber processing is performed in the scrubber 24 and released into the outside atmosphere (step S13 in FIG. 2).

The system controller 25 opens the damper valve 17 if the detection result by the gas detector head 13 does not fall below the voluntary regulation value (step S1 in FIG. 3).
4) A gas adsorption process is performed on the reaction product gas in the adsorption tower 11 (Step S15 in FIG. 3).

The gas detector head 1 is located downstream of the adsorption tower 11.
The gas detector head 14 detects the gas concentration of the reaction product gas after the gas adsorption process is performed in the adsorption tower 11 (step S16 in FIG. 3).

The system controller 25 checks whether or not the detection result by the gas detector head 14 has become equal to or less than the self-regulation value (step S17 in FIG. 3). The system controller 25 opens the damper valve 18 if the detection result by the gas detector head 14 is equal to or less than the voluntary regulation value (step S18 in FIG. 3), and the reaction fan gas subjected to the gas adsorption process in the adsorption tower 11 is exhausted by the exhaust fan 23. Scrubber 24
(Step S19 in FIG. 3), a scrubber process is performed in the scrubber 24, and the scrubber is released into the outside atmosphere (FIG. 3).
Step S20).

The system controller 25 opens the damper valve 19 if the detection result by the gas detector head 14 does not fall below the voluntary regulation value (step S2 in FIG. 4).
1) A gas adsorption process is performed on the reaction product gas in the adsorption tower 12 (Step S22 in FIG. 4).

The gas detector head 1 is located downstream of the adsorption tower 12.
5 is installed, and the gas concentration of the reaction product gas after the gas adsorption process is performed in the adsorption tower 12 is detected by the gas detector head 15 (step S23 in FIG. 4).

The system controller 25 checks whether or not the detection result by the gas detector head 15 has become equal to or less than the self-regulation value (step S24 in FIG. 4). The system controller 25 opens the damper valve 20 if the detection result by the gas detector head 15 is equal to or less than the voluntary regulation value (step S25 in FIG. 4), and the reaction fan gas subjected to the gas adsorption process in the adsorption tower 12 is exhausted by the exhaust fan 23. Scrubber 24
(Step S26 in FIG. 4), a scrubber process is performed in the scrubber 24, and the scrubber is released into the outside atmosphere (FIG. 4).
Step S27).

The system controller 25 opens the damper valve 21 if the detection result by the gas detector head 15 does not fall below the voluntary regulation value (step S2 in FIG. 4).
8) The reaction product gas subjected to the gas adsorption process in the adsorption tower 12 is sucked into the adsorption tower 10 through the damper valve 7 by the exhaust blower 22 (step S29 in FIG. 4).

The processes in steps S7 to S29 are repeatedly executed until the gas concentration of the reaction product gas subjected to the gas adsorption process in the adsorption towers 10 to 12 becomes lower than the voluntary regulation value.

When a large number of high-pressure gas consuming facilities 1-i are connected, when the gas detector head 4 detects a high-concentration gas, the damper valve 6 is opened and the damper valves 7 to 9 are simultaneously operated. By opening, the adsorption towers 10-1
A multistage simultaneous treatment of the gas adsorption treatment by 2 is also possible.

Further, by filling the adsorption towers 10 to 12 with adsorbents corresponding to different types of reaction products, respectively, the adsorption towers 10 to 12 can perform a gas adsorption process for different types of reaction products. .

In this way, when different types of reaction product gases are mixed, the mixed gas is adsorbed to the adsorption tower 10 to 10.
By repeatedly performing the gas adsorption process sequentially at 12, it is possible to remove different types of reaction product gases.

Here, the reaction product gas includes silane, phosphine, and ammonia. The allowable concentration of silane is 5 ppm, the allowable concentration of phosphine is 0.3 ppm, and the allowable concentration of ammonia is 25 ppm.

Therefore, for example, if the self-regulation value of silane is 4 ppm, the self-regulation value of phosphine is 0.2 ppm, and the self-regulation value of ammonia is 24 ppm, the adsorption tower 1
It becomes possible to make the concentration below the permissible concentration before the scrubber treatment by the scrubber 24 by the gas adsorption treatment by 0-12.

FIG. 5 is a block diagram showing the system configuration of another embodiment of the present invention. In the figure, a semiconductor manufacturing system according to another embodiment of the present invention has the same configuration as that of FIG. 1 except that the exhaust blower 22 is removed, and the discharge side of each of the damper valves 17, 19, 21 is connected to the suction side of each of the adsorption towers 10 to 12. The configuration is the same as that of the semiconductor manufacturing system according to the embodiment of the present invention, and the same components are denoted by the same reference numerals.
The operation of the same component is the same as that of the embodiment of the present invention.

However, the gas detector head 4 is a multi-gas head, and can detect the type and concentration of each of a plurality of types of reaction product gases. That is,
The gas detector head 4 is composed of a plurality of detection heads for detecting the reaction product gas for each type. By detecting the reaction product gas with each of the plurality of detection heads, the type and the type of each reaction product gas are detected. The density can be detected.

FIGS. 6 to 9 are flow charts showing the control of the concentration of the reaction product gas according to another embodiment of the present invention. The control of the concentration of the reaction product gas according to another embodiment of the present invention will be described with reference to FIGS.

Normally, if the detected concentration of the gas detector head 4 is equal to or less than the voluntary regulation value (steps S31 and S32 in FIG. 6), the system controller 25 opens the damper valve 5 and activates the other damper valves 6-9 and 16-21. The closed state is set (step S33 in FIG. 2).

The reaction product gas discharged to the discharge side of the damper valve 5 is taken into the scrubber 24 by the exhaust fan 23 (step S34 in FIG. 6), and a scrubber process (final process) is performed in the scrubber 24 to perform an external process. It is released into the atmosphere (step S35 in FIG. 6).

On the other hand, when the detected concentration of the gas detector head 4 exceeds the voluntary regulation value (steps S31 and S32 in FIG. 2), the system controller 25 closes the damper valve 5 and opens the damper valve 6 (step S36 in FIG. 6). .

Thereafter, the system controller 25 determines the type of gas detected by the gas detector head 4 (step S37 in FIG. 6), and according to the type of reaction product gas (gas), respectively, the adsorption towers 10-12. Is controlled so that the gas adsorption process is performed.

When the type of the reaction product gas is determined to be gas, the system controller 25 opens the damper valve 7 (step S38 in FIG. 7) and performs a gas adsorption process on the reaction product gas in the adsorption tower 10 (step S7 in FIG. 7). S3
9). Here, the adsorption tower 10 is filled with an adsorption filler corresponding to the type of gas.

The gas detector head 1 is located downstream of the adsorption tower 10.
The gas detector head 13 detects the gas concentration of the reaction product gas after the gas adsorption process is performed in the adsorption tower 10 (step S40 in FIG. 7).

The system controller 25 checks whether or not the detection result by the gas detector head 13 has become equal to or less than the self-regulation value (step S41 in FIG. 7). The system controller 25 opens the damper valve 16 if the detection result by the gas detector head 13 is equal to or less than the voluntary regulation value (Step S42 in FIG. 7), and the reaction fan gas subjected to the gas adsorption process in the adsorption tower 10 is exhausted by the exhaust fan 23. Scrubber 24
(Step S43 in FIG. 7), a scrubber process is performed in the scrubber 24, and the scrubber is released into the outside atmosphere (FIG. 7).
Step S44).

The system controller 25 opens the damper valve 17 if the detection result by the gas detector head 13 does not fall below the voluntary regulation value (step S4 in FIG. 7).
5) Returning to step S39, the adsorption tower 10 performs a gas adsorption process on the reaction product gas.

The above processing is repeated until the gas concentration of the reaction product gas of the type becomes equal to or less than the voluntary regulation value (steps S39 to S41, S45 in FIG. 7). Before opening the damper valve 17, the system controller 25
Control, the damper valve 7 is closed.

When the type of the reaction product gas is determined to be gas, the system controller 25 opens the damper valve 8 (step S46 in FIG. 8), and performs a gas adsorption process on the reaction product gas in the adsorption tower 11 (step S8 in FIG. 8). S4
7). Here, the adsorption tower 11 is filled with an adsorption filler corresponding to the type of gas.

The gas detector head 1 is located downstream of the adsorption tower 11.
The gas detector head 14 detects the gas concentration of the reaction product gas after the gas adsorption process has been performed in the adsorption tower 11 (step S48 in FIG. 8).

The system controller 25 checks whether or not the detection result by the gas detector head 14 has become equal to or less than the self-regulation value (step S49 in FIG. 8). The system controller 25 opens the damper valve 18 if the detection result by the gas detector head 14 is equal to or less than the voluntary regulation value (Step S50 in FIG. 8), and the reaction fan gas subjected to the gas adsorption process in the adsorption tower 11 is exhausted by the exhaust fan 23. Scrubber 24
(Step S51 in FIG. 8), the scrubber process is performed in the scrubber 24, and the scrubber is released into the outside atmosphere (FIG. 8).
Step S52).

If the detection result by the gas detector head 14 does not fall below the voluntary regulation value, the system controller 25 opens the damper valve 19 (step S5 in FIG. 8).
3) Returning to step S47, the adsorption tower 11 performs a gas adsorption process on the reaction product gas.

The above process is repeated until the gas concentration of the reaction product gas of the type becomes equal to or less than the voluntary regulation value (steps S47 to S49, S53 in FIG. 8). Before opening the damper valve 19, the system controller 25
The damper valve 8 is closed by the control of.

When the type of the reaction product gas is determined to be gas, the system controller 25 opens the damper valve 9 (step S54 in FIG. 9) and performs a gas adsorption process on the reaction product gas in the adsorption tower 12 (step S9 in FIG. 9). S5
5). Here, the adsorption tower 12 is filled with an adsorption filler corresponding to the type of gas.

The gas detector head 1 is located downstream of the adsorption tower 12.
The gas concentration of the reaction product gas after the gas adsorption process is performed in the adsorption tower 12 is detected by the gas detector head 15 (step S56 in FIG. 9).

The system controller 25 checks whether or not the detection result by the gas detector head 15 has become equal to or less than the self-regulation value (step S57 in FIG. 9). If the detection result by the gas detector head 15 is equal to or less than the voluntary regulation value, the system controller 25 opens the damper valve 20 (step S58 in FIG. 9), and the reaction fan gas subjected to the gas adsorption process in the adsorption tower 12 is exhausted by the exhaust fan 23. Scrubber 24
(Step S59 in FIG. 9), the scrubber process is performed in the scrubber 24, and the scrubber is released into the outside atmosphere (FIG. 9).
Step S60).

The system controller 25 opens the damper valve 21 if the detection result by the gas detector head 15 does not fall below the voluntary regulation value (step S6 in FIG. 9).
1) Returning to step S55, the adsorption tower 12 performs a gas adsorption process on the reaction product gas.

The above processing is repeatedly performed until the gas concentration of the reaction product gas of the type becomes equal to or less than the voluntary regulation value (steps S55 to S57, S61 in FIG. 9). Before opening the damper valve 21, the system controller 25
The damper valve 9 is closed by the control of.

If the self-regulation value is set to be equal to or less than the permissible concentration for each type of gas, the concentration of each of the plurality of types of reaction product gas, gas, is controlled by the adsorption towers 10 to 12. Scrubber 24 by gas adsorption
Before the scrubber treatment, the concentration can be reduced to an allowable concentration or less. When a plurality of types of reaction product gases are used, after one gas adsorption process is completed, the adsorber towers 10 to 1 can be installed in front of the scrubber 24 so that the next gas adsorption process can be performed.
What is necessary is just to return to the former stage of 2.

As described above, when the reaction product gas containing the special high-pressure gas is discharged from the semiconductor manufacturing line or the like using the high-pressure gas consuming equipment 1-i, the damper valves 5 to 9, 16 to
21 is controlled, and before the scrubber treatment by the scrubber 24, the reaction product gas is adsorbed by the gas adsorption treatment by the adsorption towers 10 to 12 until the concentration of the reaction product gas becomes the voluntary regulation value or less. Control can be actively performed, and the reaction product gas can be removed to a gas concentration equal to or less than the voluntary regulation value.

Before the scrubber treatment by the scrubber 24, the reaction product gas is adsorbed by the gas adsorption treatment by the adsorption towers 10 to 12 corresponding to the type until the concentration of the reaction product gas falls below the voluntary regulation value for each type. By doing so, it is possible to control the exhaust gas concentration corresponding to the type of the reaction product gas.

The present invention can take the following aspects in connection with the description of the claims.

(1) An exhaust gas concentration control system for an exhaust gas treatment facility including a gas purification means for purifying a plurality of types of reaction product gases discharged from a production facility and releasing the gas to the outside, wherein First gas detection means for detecting the type and concentration of the discharged reaction product gas;
A plurality of gas adsorbing means for adsorbing each of the plurality of reaction product gases; and a plurality of second gas detecting means for detecting the type and concentration of the reaction product gas discharged from each of the plurality of gas adsorbing means.
And a first supply for selectively supplying the reaction product gas to one of the gas purifying means and the plurality of gas adsorbing means in accordance with a detection result of the first gas detecting means. Means, and a plurality of second supply means for selectively supplying the reaction product gas to one of the gas purifying means and the next gas adsorbing means in accordance with the detection result of the second gas detecting means. An exhaust gas concentration control system comprising:

(2) The first supply means includes:
The reaction product gas is supplied to the gas purifying means when the detection result of the gas detection means is equal to or less than a preset regulation value, and the reaction generation gas is supplied when the detection result of the first gas detection means is not less than the regulation value. A gas is supplied to a leading gas adsorbing means of the plurality of gas adsorbing means, and each of the plurality of second supplying means is configured to detect a detection result of the second gas detecting means in a predetermined manner. When the value is equal to or less than the regulation value, the reaction product gas is supplied to the gas purification unit, and when the detection result of the second gas detection unit is not less than the regulation value, the reaction product gas is supplied to the next stage of the plurality of gas adsorption units. The exhaust gas concentration control system according to (1), wherein the exhaust gas concentration control system is configured to supply the exhaust gas concentration to the gas adsorption means.

(3) An exhaust gas concentration control system for an exhaust gas treatment facility including a gas purification means for purifying a plurality of types of reaction product gases discharged from a production facility and discharging the gas to the outside, wherein First gas detection means for detecting the type and concentration of the discharged reaction product gas;
A plurality of gas adsorbing means for adsorbing each of the plurality of reaction product gases; and a plurality of second gas detecting means for detecting the type and concentration of the reaction product gas discharged from each of the plurality of gas adsorbing means.
And a first supply for selectively supplying the reaction product gas to one of the gas purifying means and the plurality of gas adsorbing means in accordance with a detection result of the first gas detecting means. Means for supplying the reaction product gas to one of the gas purifying means and a gas adsorbing means preceding the second gas detecting means in accordance with a detection result of the second gas detecting means. Exhaust gas concentration control system, comprising:

(4) The first supply means includes:
When the detection result of the gas detection means is equal to or less than a preset regulation value, the reaction product gas is supplied to the gas purification means, and the detection result of the first gas detection means is set in advance for each type of the reaction product gas. When the reaction product gas is not less than the set regulation value, the reaction product gas is configured to be supplied to gas adsorbing means corresponding to the reaction product gas that is not less than the regulation value, and each of the plurality of second supply units is the second gas. The reaction product gas is supplied to the gas purification unit when the detection result of the detection unit is equal to or less than a preset regulation value, and the reaction product gas is supplied when the detection result of the second gas detection unit is not less than the regulation value. The exhaust gas concentration control system according to (3), characterized in that the exhaust gas concentration control system is configured to supply the gas to the gas adsorbing means at the preceding stage of the second gas detecting means.

[0071]

As described above, according to the exhaust gas concentration control system of the present invention, when the detection result of the concentration of the reaction product gas discharged from the production facility is equal to or less than a predetermined regulation value, the reaction product gas is controlled. Actively control the concentration of the reaction product gas by performing the gas purification process and performing the gas adsorption process on the reaction product gas when the detection result of the concentration of the reaction product gas is not below the regulation value. Thus, there is an effect that the reaction product gas can be removed to a gas concentration equal to or less than the voluntary regulation value.

Further, according to another exhaust gas concentration control system of the present invention, when the detection result of the concentration of the reaction product gas discharged from the production facility is equal to or less than a preset regulation value, the reaction product gas is controlled by the gas. When the purification process is performed and the detection result of the concentration of the reaction product gas is not less than the regulation value preset for each type of the reaction product gas, the gas adsorption corresponding to the reaction product gas that is not less than the regulation value for the reaction product gas By performing the processing, there is an effect that the exhaust gas concentration control corresponding to the type of the reaction product gas can be performed.

[Brief description of the drawings]

FIG. 1 is a block diagram illustrating a system configuration according to an embodiment of the present invention.

FIG. 2 is a flowchart showing a control of a concentration of a reaction product gas according to an embodiment of the present invention.

FIG. 3 is a flowchart showing a control of a concentration of a reaction product gas according to an embodiment of the present invention.

FIG. 4 is a flowchart showing the control of the concentration of the reaction product gas according to one embodiment of the present invention.

FIG. 5 is a block diagram showing a system configuration according to another embodiment of the present invention.

FIG. 6 is a flowchart showing a control of a concentration of a reaction product gas according to another embodiment of the present invention.

FIG. 7 is a flowchart showing a control of a concentration of a reaction product gas according to another embodiment of the present invention.

FIG. 8 is a flowchart showing the control of the concentration of the reaction product gas according to another embodiment of the present invention.

FIG. 9 is a flowchart showing the control of the concentration of the reaction product gas according to another embodiment of the present invention.

[Explanation of symbols]

 3 Duct piping 4, 13-15 Gas detector head 5-9, 16-21 Damper valve 10-12 Adsorption tower 22 Exhaust blower 23 Exhaust fan 24 Scrubber 25 System controller

Claims (6)

(57) [Claims] 1. An exhaust gas concentration control system for an exhaust gas treatment facility including a gas purification means for purifying a reaction product gas discharged from a production facility and discharging the gas to the outside, wherein the gas for adsorbing the reaction product gas is provided. Adsorption means, and the gas absorption means
The reaction product gas after the gas adsorption process is performed by the attaching means.
Gas detection means for detecting the gas concentration of the gas , and supply means for selectively supplying the reaction product gas to one of the gas purification means and the gas adsorption means according to the detection result of the gas detection means. An exhaust gas concentration control system comprising: 2. When the detection result of said gas detection means is equal to or less than a preset regulation value, said reaction product gas is supplied to said gas purification means, and the detection result of said gas detection means is equal to or less than a preset regulation value. 2. The exhaust gas concentration control system according to claim 1, further comprising means for controlling the supply means so as to supply the reaction product gas to the gas adsorption means when the gas is not being supplied. 3. An exhaust gas concentration control system of an exhaust gas treatment facility including a gas purifying means for purifying a plurality of types of reaction product gases discharged from a production facility and discharging the same to the outside, wherein the plurality of types of reaction gases are removed. a plurality of gas suction means for sucking the product gas, respectively, gas adsorption treatment by the plurality of gas suction means
Of the plurality of reaction product gases after the
Gas detection means for detecting the concentration and concentration, and supply means for selectively supplying the reaction product gas to any one of the gas purification means and the plurality of gas adsorption means according to the detection result of the gas detection means. An exhaust gas concentration control system comprising: 4. When the detection result of said gas detection means is equal to or less than a preset regulation value, said reaction product gas is supplied to said gas purification means, and the detection result of said gas detection means is determined for each type of said reaction product gas. 4. A control means for controlling the supply means so as to supply the reaction product gas to a gas adsorption means corresponding to the reaction product gas which is not less than the regulation value when the regulation product value is not less than the regulation value set in advance.
The described exhaust gas concentration control system. 5. An exhaust gas concentration control system for an exhaust gas treatment facility including a gas purifying means for purifying a plurality of types of reaction product gases discharged from a production facility and discharging the same to the outside, wherein the plurality of types of reaction gases are treated. a plurality of gas suction means for sucking the product gas, respectively, gas adsorption treatment by the plurality of gas suction means
Gas concentration of the plurality of reaction product gases after the
Gas detection means for detecting the degree of reaction, first supply means for supplying the reaction product gas to the gas purification means when the detection result of the gas detection means is equal to or less than a preset regulation value, A second supply means for sequentially supplying the reaction product gas to each of the plurality of gas adsorption means when a detection result is not less than the regulation value. 6. The method according to claim 1, further comprising:
Second gas detecting means for detecting the gas concentration of the reaction gas
And the countermeasure according to the detection result of the second gas detection means.
Reaction gas with the gas purifying means and the gas adsorbing means.
And second supply means for selectively supplying one of them.
An exhaust gas according to any one of claims 1 to 5, wherein
Concentration control system.