JP3109374B2 - Resin sealing method for thermal recording head - Google Patents

Resin sealing method for thermal recording head

Info

Publication number
JP3109374B2
JP3109374B2 JP06071336A JP7133694A JP3109374B2 JP 3109374 B2 JP3109374 B2 JP 3109374B2 JP 06071336 A JP06071336 A JP 06071336A JP 7133694 A JP7133694 A JP 7133694A JP 3109374 B2 JP3109374 B2 JP 3109374B2
Authority
JP
Japan
Prior art keywords
epoxy resin
recording head
thermal recording
resin composition
driving
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP06071336A
Other languages
Japanese (ja)
Other versions
JPH07256914A (en
Inventor
利夫 塩原
浩二 二ッ森
和夫 土橋
孝之 澤田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Priority to JP06071336A priority Critical patent/JP3109374B2/en
Priority to KR1019940014788A priority patent/KR100301609B1/en
Publication of JPH07256914A publication Critical patent/JPH07256914A/en
Application granted granted Critical
Publication of JP3109374B2 publication Critical patent/JP3109374B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/491Disposition
    • H01L2224/49105Connecting at different heights
    • H01L2224/49109Connecting at different heights outside the semiconductor or solid-state body

Landscapes

  • Electronic Switches (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、発熱素子回路を有する
発熱基板と駆動用回路を有する駆動用回路基板とを具備
し、該発熱基板又は駆動用回路基板上に駆動用ICを装
着すると共に、この駆動用ICと上記発熱素子回路及び
駆動用回路とをそれぞれボンディングワイヤー等の配線
部を介してそれぞれ接続した感熱記録ヘッドの上記駆動
用IC及び各配線部を樹脂封止する方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention comprises a heating board having a heating element circuit and a driving circuit board having a driving circuit, wherein a driving IC is mounted on the heating board or the driving circuit board. The present invention also relates to a method of sealing the drive IC of the thermal recording head in which the drive IC is connected to the heating element circuit and the drive circuit via wiring portions such as bonding wires, respectively, and to resin-sealing the wiring portions.

【0002】[0002]

【従来の技術及び発明が解決しようとする課題】感熱式
ファクシミリ等に用いられる感熱記録ヘッドは、一般に
発熱素子回路を有する発熱基板と駆動用回路を有する駆
動用回路基板とをそれらの端部において接合し、該発熱
基板面又は駆動用回路基板面のそれらの接合端部に近接
して駆動用集積回路(IC)を装着し、この集積回路と
上記発熱素子回路及び駆動用回路とをボンディングワイ
ヤー等の配線部を介してそれぞれ導通したものであり、
この場合、ICの実装方法としては、フリップチップボ
ンディング法又はワイヤーボンディング法が一般に知ら
れている。
2. Description of the Related Art A thermal recording head used in a thermal facsimile or the like generally includes a heating substrate having a heating element circuit and a driving circuit substrate having a driving circuit at their ends. A driving integrated circuit (IC) is mounted near the bonding end of the heating substrate surface or the driving circuit substrate surface, and the integrated circuit is bonded to the heating element circuit and the driving circuit with a bonding wire. Etc. are conducted through the wiring parts such as
In this case, a flip chip bonding method or a wire bonding method is generally known as an IC mounting method.

【0003】これらのボンディング後に、発熱基板、駆
動用回路基板の配線材露出面と駆動用ICのボンディン
グ部分に湿気や導電性異物が侵入するのを防止するため
に、シリコーン系の樹脂で保護封止をすることが行われ
ている。更に、保護封止部の機械的保護及びプラテンロ
ーラにより排出される記録紙のガイドを目的にヘッドカ
バーをシリコーン系封止部に取り付けるのが一般的であ
る。特に、ワイヤーボンディング法における実装方法
は、シリコーン系の樹脂で保護封止した後でもボンディ
ングワイヤーの機械的強度が極度に弱いので、製造工程
中の取扱を容易にするためにもヘッドカバーを付ける
か、あるいはヘッドカバーの機能を持つ治具が必要とな
る。また、フリップチップボンディング法においても、
シリコーン系等の樹脂で保護封止した後、駆動用ICの
素子自体を機械的に保護するためにもヘッドカバーが必
要となる。
[0003] After these bondings, in order to prevent moisture and conductive foreign substances from entering the exposed portions of the wiring material of the heat-generating substrate and the driving circuit board and the bonding portion of the driving IC, protective sealing with silicone resin is performed. Stopping is being done. Further, it is common to attach a head cover to the silicone-based sealing portion for the purpose of mechanical protection of the protection sealing portion and guide of the recording paper discharged by the platen roller. In particular, in the mounting method in the wire bonding method, the mechanical strength of the bonding wire is extremely weak even after protection and sealing with a silicone resin, so that a head cover is attached to facilitate handling during the manufacturing process, Alternatively, a jig having a head cover function is required. Also, in the flip chip bonding method,
After protection and sealing with a silicone resin or the like, a head cover is also required to mechanically protect the elements of the driving IC itself.

【0004】従来、このような駆動用ICの保護封止に
用いられる樹脂には上述したようにシリコーン系の樹脂
が主流であり、このシリコーン系樹脂は耐環境性及び電
気的絶縁は十分であるものの、機械的保護の機能は十分
ではなく、このため保護封止部にヘッドカバーを付けな
ければならないので、作業工数が多くしかも材料費が高
いという問題がある。
Conventionally, as described above, a silicone resin is mainly used as a resin used for protective sealing of such a driving IC, and the silicone resin has sufficient environmental resistance and electrical insulation. However, the function of mechanical protection is not sufficient, and a head cover must be attached to the protective sealing portion. Therefore, there is a problem that the number of working steps is large and the material cost is high.

【0005】そのため、駆動用IC、ボンディングワイ
ヤーの機械的保護の機能をヘッドカバーではなく封止樹
脂そのものに持たせるため、これまで一般的に使用され
てきたシリコーン系の樹脂に代わり、硬度が大きなエポ
キシ樹脂組成物により封止する方法が開発されてきてい
る。
For this reason, in order to provide the function of mechanically protecting the driving IC and the bonding wire not in the head cover but in the sealing resin itself, an epoxy having a large hardness is used instead of a silicone resin which has been generally used so far. A method of sealing with a resin composition has been developed.

【0006】しかしながら、エポキシ樹脂組成物により
封止を行う場合、エポキシ樹脂組成物は、シリコーン系
樹脂に比べて消泡性に劣り、このため封止樹脂硬化物表
面にボイドが生じてしまい、このような表面ボイドは感
熱記録紙を傷つけてしまうという問題がある。
However, when sealing is performed with the epoxy resin composition, the epoxy resin composition is inferior in defoaming properties as compared with the silicone resin, and therefore, voids are generated on the surface of the cured sealing resin. Such surface voids have the problem of damaging the thermal recording paper.

【0007】ボイド発生の原因としては、高密度ワイヤ
ー下部の樹脂末充填によるものと、発熱基板と駆動用基
板との接合部における隙間からの発生によるものとが挙
げられる。
[0007] The cause of the void generation is caused by the filling of the resin powder below the high-density wire and the generation of the void from the gap at the joint between the heat generating substrate and the driving substrate.

【0008】このうち、基板接合部の隙間から発生する
ボイドを防ごうとする場合、比較的粘度の大きな樹脂を
用いて隙間から発生するボイドをおさえこむ方法が効果
的であるが、反面、そのような高粘度の樹脂を使用した
場合、高密度ワイヤー下部への樹脂充填性が損なわれ、
ボイドの発生及び信頼性の低下が生じる。
In order to prevent the voids generated from the gaps between the substrate joints, it is effective to use a resin having a relatively high viscosity to suppress the voids generated from the gaps. If such a high-viscosity resin is used, the resin filling property under the high-density wire will be impaired,
Voids are generated and reliability is reduced.

【0009】特に近年、印字精度の向上を目的にこれま
で以上に発熱体が微細化し、それに伴いワイヤー間隔も
狭くなり、より高密度ワイヤー化の傾向にある。このた
め、高密度ワイヤー下部の充填性を維持し、しかも封止
材表面にボイドの発生のないエポキシ樹脂を用いた封止
方法が望まれる。
In particular, in recent years, the heating element has been miniaturized more than ever for the purpose of improving printing accuracy, and accordingly, the distance between the wires has been narrowed, and there has been a trend toward higher density wires. For this reason, a sealing method using an epoxy resin that maintains the filling property of the lower part of the high-density wire and does not generate voids on the surface of the sealing material is desired.

【0010】また、信頼性に注目した場合、上記基板接
合部の隙間はTPH装置の長さ方向全体でみられ、側面
にまで到達していることから、耐湿試験等を行った場
合、封止樹脂でICが覆われていても、樹脂の下部より
吸水し、信頼性の低下が生じる。従って、かかる点から
も表面ボイドを防ぎ、かつ信頼性に優れたTHP装置が
望まれる。
In addition, when attention is paid to reliability, the gap at the substrate bonding portion is seen in the entire lengthwise direction of the TPH device and reaches the side surface. Even if the IC is covered with the resin, water is absorbed from the lower part of the resin, and the reliability is reduced. Therefore, a THP device that prevents surface voids and has excellent reliability is desired from this point of view.

【0011】[0011]

【課題を解決するための手段及び作用】本発明者は、上
記要望に応えるため鋭意検討を行った結果、駆動用回路
基板と発熱素子回路基板との間に通常50〜200μm
の大きな隙間があり、しかも場所によりその隙間に大き
なばらつきがあることに注目し、この隙間を予めアスペ
クト比が0.1以下の流動性を持つエポキシ樹脂組成物
で封止、充填後、この駆動用IC及び各配線部全面をエ
ポキシ樹脂封止材で封止した場合、高密度ワイヤー下部
の充填性を重視した比較的低粘度のエポキシ樹脂封止材
を使用でき、かつ封止材表面にボイドの発生を防げると
共に、基板下部からの吸水を防止でき、より信頼性の向
上したTPH装置を得ることができることを知見し、本
発明をなすに至ったものである。
The inventor of the present invention has conducted intensive studies to meet the above-mentioned demands. As a result, the distance between the driving circuit board and the heating element circuit board is usually 50 to 200 μm.
Note that there is a large gap, and there is a large variation in the gap depending on the location. This gap is previously sealed and filled with an epoxy resin composition having a flowability of an aspect ratio of 0.1 or less. When the entire IC and each wiring section are sealed with epoxy resin sealing material, epoxy resin sealing material with relatively low viscosity that emphasizes the filling property under the high-density wire can be used, and voids on the surface of the sealing material It has been found that it is possible to prevent the occurrence of water vapor from the lower part of the substrate and to obtain a TPH device with further improved reliability, which has led to the present invention.

【0012】従って、本発明は、発熱素子回路を有する
発熱基板と駆動用回路を有する駆動用回路基板とを具備
し、該発熱基板又は駆動用回路基板上に駆動用ICを装
着すると共に、この駆動用ICと上記発熱素子回路及び
駆動用回路とをそれぞれボンディングワイヤー等の配線
部を介してそれぞれ接続した感熱記録ヘッドの上記駆動
用IC及び各配線部をエポキシ樹脂封止材を用いて樹脂
封止するに際し、予め発熱基板と駆動用回路基板との接
合部をアスペクト比0.1以下の第1のエポキシ樹脂組
成物で封止した後、第2のエポキシ樹脂封止材を用いて
上記駆動用IC及び各配線部の樹脂封止を行うことを特
徴とする感熱記録ヘッドの樹脂封止方法を提供する。
Accordingly, the present invention comprises a heating board having a heating element circuit and a driving circuit board having a driving circuit. A driving IC is mounted on the heating board or the driving circuit board. The drive IC and the heating element circuit and the drive circuit are connected to each other via a wiring portion such as a bonding wire, respectively, and the drive IC and each wiring portion of the thermal recording head are resin-sealed using an epoxy resin sealing material. When stopping, the joint between the heat-generating substrate and the driving circuit board is sealed in advance with a first epoxy resin composition having an aspect ratio of 0.1 or less, and then the drive is performed using a second epoxy resin sealing material. The present invention provides a resin sealing method for a thermal recording head, which is characterized by performing resin sealing of an IC for use and each wiring portion.

【0013】以下、本発明について更に詳しく説明する
と、本発明の樹脂封止方法は、図1〜図5に示したよう
に、例えば発熱素子回路(発熱素子)1aを有する発熱
基板1と駆動用回路2aを有する駆動用回路基板2とを
それらの一端部において接合し、該発熱基板1面又は駆
動用回路基板2面のそれらの接合端部に近接して駆動用
IC3をその端子を上記接合方向に沿って搭載し、この
IC3の端子と上記発熱素子回路1a及び駆動用回路2
aとをボンディングワイヤー等の配線部4,5を介して
それぞれ導通してなる感熱記録ヘッドの上記発熱基板1
と駆動用回路基板2との接合部6を予めアスペクト比が
0.1以下のエポキシ樹脂組成物7で封止、充填した
後、上記IC3及び各配線部4,5をそれぞれエポキシ
樹脂封止材8で封止するものである。なお、図中9は放
熱基板である。
Hereinafter, the present invention will be described in more detail. As shown in FIGS. 1 to 5, the resin sealing method of the present invention comprises, for example, a heating substrate 1 having a heating element circuit (heating element) 1a and a driving board 1a. The driving circuit board 2 having the circuit 2a is joined at one end thereof, and the driving IC 3 is joined to the terminal of the driving IC 3 near the joining end of the heating substrate 1 or the driving circuit board 2 surface. Mounted along the direction, the terminals of the IC 3 and the heating element circuit 1a and the driving circuit 2
a through the wiring portions 4 and 5 such as bonding wires.
After sealing and filling the joint 6 between the circuit board 2 and the driving circuit board 2 with the epoxy resin composition 7 having an aspect ratio of 0.1 or less in advance, the IC 3 and the wiring sections 4 and 5 are each filled with an epoxy resin sealing material. The sealing is performed at 8. In addition, 9 in the figure is a heat dissipation substrate.

【0014】このような感熱記録ヘッドは、その発熱基
板1をプラテンローラ10と接触させてこれらの発熱基
板1とプラテンローラ10の間に感熱記録紙11を通す
ものである。
In such a thermal recording head, the heat-generating substrate 1 is brought into contact with a platen roller 10 so that the heat-sensitive recording paper 11 is passed between the heat-generating substrate 1 and the platen roller 10.

【0015】なお、IC3は、図1〜3に示すように駆
動用回路基板2面に装着されたもの、図4,5に示すよ
うに発熱基板1面に装着されたものの両方がある。
The IC 3 is either mounted on the drive circuit board 2 as shown in FIGS. 1 to 3 or mounted on the heat generating board 1 as shown in FIGS.

【0016】本発明においては、このように上記接合部
6の隙間に充填し、接合部6を封止するエポキシ樹脂組
成物として、アスペクト比が0.1以下のもの、より好
ましくは0.08以下の高流動性のものを使用する。ア
スペクト比が0.1を越えるエポキシ樹脂組成物を用い
た場合、接合部6の隙間への樹脂侵入が困難で、本発明
の目的を達成し得ない。
In the present invention, the epoxy resin composition which fills the gaps of the joints 6 and seals the joints 6 has an aspect ratio of 0.1 or less, more preferably 0.08. Use the one with the following high fluidity. When an epoxy resin composition having an aspect ratio of more than 0.1 is used, it is difficult to penetrate the resin into the gap of the joint 6 and the object of the present invention cannot be achieved.

【0017】なお、本発明において、アスペクト比は、
エポキシ樹脂組成物0.1gをガラス板上に滴下して1
20℃熱板上で1時間加熱して得られた硬化物の高さを
その底面の直径で割った値をいう。
In the present invention, the aspect ratio is
0.1 g of the epoxy resin composition was dropped on a glass plate to obtain 1
A value obtained by dividing the height of a cured product obtained by heating on a hot plate at 20 ° C. for 1 hour by the diameter of the bottom surface.

【0018】このようなエポキシ樹脂組成物としては、
室温で液状のものが有効である。この液状エポキシ樹脂
組成物を構成する硬化性エポキシ樹脂としては、1分子
中に2個以上のエポキシ基を有するものが使用でき、後
述するような各種硬化剤によって硬化させ得ることが可
能である限り分子構造、分子量等に特に制限はなく、従
来から知られている種々のものを使用することができ
る。具体的には、例えばエピクロルヒドリンとビスフェ
ノールをはじめとする各種ノボラック樹脂から合成され
るエポキシ樹脂、脂環式エポキシ樹脂或いは塩素や臭素
原子等のハロゲン原子を導入したエポキシ樹脂等を挙げ
ることができるが、常温で液状を呈する低粘度の組成物
を得るためには、これらの中でもビスフェノールA又は
ビスフェノールFのグリシジルエーテル誘導体が好適に
用いられる。なお、上記エポキシ樹脂は、その使用に当
っては必ずしも1種類の使用に限定されるものではな
く、2種類又はそれ以上を混合して使用してもよい。
As such an epoxy resin composition,
Liquid at room temperature is effective. As the curable epoxy resin constituting the liquid epoxy resin composition, a resin having two or more epoxy groups in one molecule can be used, as long as it can be cured by various curing agents as described below. There are no particular restrictions on the molecular structure, molecular weight, and the like, and various conventionally known compounds can be used. Specifically, for example, epoxy resins synthesized from various novolak resins including epichlorohydrin and bisphenol, alicyclic epoxy resins or epoxy resins into which halogen atoms such as chlorine and bromine atoms have been introduced, and the like, Among them, a glycidyl ether derivative of bisphenol A or bisphenol F is preferably used in order to obtain a low-viscosity composition that is liquid at room temperature. In addition, the use of the epoxy resin is not necessarily limited to one type, and two or more types may be mixed and used.

【0019】なお、上記エポキシ樹脂使用に際して、モ
ノエポキシ化合物を適宜併用することは差し支えない。
このモノエポキシ化合物として具体的には、スチレンオ
キシド,シクロヘキセンオキシド,プロピレンオキシ
ド,メチルグリシジルエーテル,エチルグリシジルエー
テル,フェニルグリシジルエーテル,アリルグリシジル
エーテル,オクチレンオキシド,ドデセンオキシド等が
例示される。
When using the above epoxy resin, a monoepoxy compound may be appropriately used in combination.
Specific examples of the monoepoxy compound include styrene oxide, cyclohexene oxide, propylene oxide, methyl glycidyl ether, ethyl glycidyl ether, phenyl glycidyl ether, allyl glycidyl ether, octylene oxide, dodecene oxide and the like.

【0020】また、硬化剤としては、具体的にジアミノ
ジフェニルメタン,ジアミノフェニルスルホン,メタフ
ェニレンジアミン等に代表されるアミン系硬化剤、無水
フタル酸、無水ピロメリット酸,無水ベンゾフェノンテ
トラカルボン酸等の酸無水物系硬化剤、あるいはフェノ
ールノボラック,クレゾールノボラック等の1分子中に
2個以上の水酸基を有するフェノールノボラック硬化剤
が例示される。これらの中では、低粘度で低応力のエポ
キシ樹脂組成物を得るため酸無水物系硬化剤が好ましく
用いられる。
Examples of the curing agent include amine curing agents such as diaminodiphenylmethane, diaminophenylsulfone, and metaphenylenediamine; and acids such as phthalic anhydride, pyromellitic anhydride, and benzophenonetetracarboxylic anhydride. Examples thereof include anhydride-based curing agents and phenol novolac curing agents having two or more hydroxyl groups in one molecule, such as phenol novolak and cresol novolak. Among these, an acid anhydride-based curing agent is preferably used to obtain a low-viscosity, low-stress epoxy resin composition.

【0021】これらの硬化剤の使用量は通常量とするこ
とができるが、エポキシ樹脂のエポキシ基の当量に対し
て50〜150当量%、特に80〜110当量%の範囲
とすることが好ましい。
The amount of the curing agent used can be a usual amount, but is preferably in the range of 50 to 150 equivalent%, particularly preferably 80 to 110 equivalent%, based on the epoxy group equivalent of the epoxy resin.

【0022】更に、エポキシ樹脂組成物においては、上
記硬化剤とエポキシ樹脂との反応を促進させる目的で、
各種硬化促進剤、例えばイミダゾール或いはその誘導
体、三級アミン系誘導体、ホスフィン系誘導体、シクロ
アミジン誘導体等を併用することは何ら差し支えない。
なお、これらの硬化促進剤の配合量も通常の範囲とする
ことができる。
Further, in the epoxy resin composition, for the purpose of accelerating the reaction between the curing agent and the epoxy resin,
Various curing accelerators, for example, imidazole or a derivative thereof, a tertiary amine derivative, a phosphine derivative, a cycloamidine derivative, and the like can be used in combination.
In addition, the compounding quantity of these hardening accelerators can also be made into a normal range.

【0023】また、エポキシ樹脂組成物中には無機質充
填剤を配合することができる。この場合使用する無機質
充填剤の種類、単独使用あるいは複数種の併用等に制限
はなく、適宜選択される。無機質充填剤としては、例え
ば結晶性シリカ、非結晶性シリカ等の天然シリカ、合成
高純度シリカ、合成球状シリカ、タルク、マイカ、窒化
珪素、ボロンナイトライド、アルミナなどから選ばれる
1種又は2種以上を使用することができる。
Further, an inorganic filler can be blended in the epoxy resin composition. In this case, the kind of the inorganic filler to be used, a single use or a combination of a plurality of kinds is not limited, and is appropriately selected. Examples of the inorganic filler include one or two selected from natural silica such as crystalline silica and amorphous silica, synthetic high-purity silica, synthetic spherical silica, talc, mica, silicon nitride, boron nitride, and alumina. The above can be used.

【0024】上記無機質充填剤の配合量は、エポキシ樹
脂組成物のアスペクト比が上述した範囲にあるように適
定される。
The amount of the inorganic filler is determined so that the aspect ratio of the epoxy resin composition is in the above-mentioned range.

【0025】エポキシ樹脂組成物には、更に必要に応じ
低応力化剤、接着向上用炭素官能性シラン、ワックス
類、ステアリン酸等の脂肪酸及びその金属塩等の離型
剤、カーボンブラックなどの顔料、染料、酸化防止剤、
表面処理剤(γ−グリシドキシプロピルトリメトキシシ
ランなど)、各種導電性充填剤、その他添加剤を配合す
ることができる。
The epoxy resin composition may further contain a releasing agent such as a stress reducing agent, a carbon-functional silane for improving adhesion, waxes, fatty acids such as stearic acid and metal salts thereof, and a pigment such as carbon black, if necessary. , Dyes, antioxidants,
A surface treatment agent (such as γ-glycidoxypropyltrimethoxysilane), various conductive fillers, and other additives can be blended.

【0026】エポキシ樹脂組成物は、上述した成分の所
定量を均一に撹拌、混合することにより得ることができ
る(なお、成分の配合順序に特に制限はない)。
The epoxy resin composition can be obtained by uniformly stirring and mixing predetermined amounts of the above-mentioned components (the order of blending the components is not particularly limited).

【0027】上記エポキシ樹脂組成物のアスペクト比
は、エポキシ樹脂及び硬化剤の種類や、充填剤の種類及
び特に配合量を適宜選定することによりコントロールす
ることができる。また、例えばエポキシ樹脂を吐出する
シリンジ又はニードルを加熱したり、基板を塗布前又は
塗布後に加熱したりして隙間への侵入性を向上すること
ができる。
The aspect ratio of the epoxy resin composition can be controlled by appropriately selecting the type of the epoxy resin and the curing agent, the type of the filler, and especially the amount of the filler. Further, for example, a syringe or a needle for discharging the epoxy resin is heated, or a substrate is heated before or after application, so that penetration into a gap can be improved.

【0028】本発明において、上記のようなエポキシ樹
脂組成物を用いて封止を行い、接合部6の隙間を充填す
る方法としては、駆動用基板側のワイヤーボンディング
前に上記エポキシ樹脂組成物7を塗布、充填する方法、
或いは、ワイヤーボンディング後にワイヤー上より塗布
し、充填する方法などが挙げられる。
In the present invention, as a method for sealing using the epoxy resin composition as described above and filling the gap of the joint 6, the epoxy resin composition 7 may be used before the wire bonding on the driving substrate side. Application and filling method,
Alternatively, a method of applying and filling from the wire after wire bonding may be used.

【0029】一方、駆動用IC及び各配線部を樹脂封止
するためのエポキシ樹脂封止材8としては、適宜選定さ
れるが、その硬化物の線膨張係数と上記エポキシ樹脂組
成物7の硬化物の線膨張係数との差が25%以内のもの
が好適に用いられる。また、粘度(BH型ローター7,
20rpm,25℃)が2000ポイズ以下のものを用
いることが推奨される。
On the other hand, the epoxy resin encapsulant 8 for encapsulating the drive IC and each wiring portion with resin is appropriately selected. The linear expansion coefficient of the cured product and the curing of the epoxy resin composition 7 are determined. Those having a difference from the coefficient of linear expansion of the object within 25% are preferably used. In addition, the viscosity (BH type rotor 7,
(20 rpm, 25 ° C.) is recommended to use one having 2000 poise or less.

【0030】即ち、感熱記録ヘッドは、発熱基板側のボ
ンディングワイヤーは駆動用回路基板側のボンディング
ワイヤーに比べて高密度になっており、粘度が高すぎる
と、充填が困難となり、ワイヤー下部に未充填部分が残
存して信頼性を低下したり、硬化時にボイドが上昇して
紙送りガイドとして対応可能な封止表面状態を得にくく
なる。
That is, in the heat-sensitive recording head, the bonding wires on the heat-generating substrate side have a higher density than the bonding wires on the driving circuit board side. The filled portion remains to lower the reliability, and the voids rise during curing, making it difficult to obtain a sealing surface state that can be used as a paper feed guide.

【0031】また、アスペクト比が0.1より低いと、
本来封止する必要がない部分まで封止してしまい、感熱
記録ヘッド装置本来の動作を妨げてしまう場合があり、
一方、アスペクト比が0.25を超えると、硬化後の封
止部の形状が紙送りガイドとして適さないものとなる。
When the aspect ratio is lower than 0.1,
There is a case where the part that does not need to be sealed is sealed, which may hinder the original operation of the thermal recording head device,
On the other hand, if the aspect ratio exceeds 0.25, the shape of the sealing portion after curing becomes unsuitable as a paper feed guide.

【0032】上記エポキシ樹脂封止材8の成分及び配合
量は、上記エポキシ樹脂組成物7の場合と同様である
が、エポキシ樹脂、硬化剤、充填剤の種類や配合量を適
宜選定して上記粘度、アスペクト比になるように調整す
ることが好ましい。この場合、このエポキシ樹脂封止材
8には、チクソ性付与剤として平均粒径5μm以下、特
に2μm以下の微粉球状シリカを配合することができ
る。
The components and the amounts of the epoxy resin encapsulant 8 are the same as those of the epoxy resin composition 7, except that the types and the amounts of the epoxy resin, the curing agent, and the filler are appropriately selected and the amount of the epoxy resin is set. It is preferable to adjust the viscosity and the aspect ratio. In this case, fine powder spherical silica having an average particle size of 5 μm or less, particularly 2 μm or less can be blended into the epoxy resin sealing material 8 as a thixotropy imparting agent.

【0033】このエポキシ樹脂封止材8の塗布方法とし
ては、上記エポキシ樹脂組成物を駆動用ICと発熱素子
回路及び駆動用回路とのそれぞれ配線部を横切って少な
くとも2本の線状に塗布し、次いでこのエポキシ樹脂封
止材の流動により上記線状塗布部を連続一体化させて、
駆動用IC及び各配線部全面をエポキシ樹脂封止材で被
覆し、硬化させる方法が推奨される。
As a method for applying the epoxy resin sealing material 8, at least two lines of the epoxy resin composition are applied across the wiring portions of the driving IC, the heating element circuit and the driving circuit. Then, the linear coating portion is continuously integrated by the flow of the epoxy resin sealing material,
It is recommended to cover the entire surface of the driving IC and each wiring portion with an epoxy resin sealing material and cure the same.

【0034】より具体的には、図1において、発熱基板
1と駆動用回路基板2との接合部6の接合方向に沿って
少なくとも発熱基板側の配線部4及び駆動用回路基板2
側の配線部5をそれぞれ横切る2本の線状塗布部を互に
離間させて塗布するものである。なお、線状塗布部6は
2本以上であればよく、配線部4,5を横切る2本に加
え、IC3上にも線状塗布部6を形成し得る。この場
合、特にIC3上を最後に封止する場合など、両側の2
本の線状塗布部間に更に線状に樹脂を塗布する場合は、
この樹脂としてアスペクト比0.1以下の樹脂を使用す
ることは差し支えない。
More specifically, in FIG. 1, at least the wiring portion 4 on the heat-generating board side and the driving circuit board 2 along the joining direction of the joint portion 6 between the heat-generating substrate 1 and the drive circuit board 2
In this case, two linear coating portions crossing the wiring portion 5 on the side are separately applied to each other. The number of the linear coating portions 6 may be two or more. The linear coating portions 6 may be formed on the IC 3 in addition to the two crossing the wiring portions 4 and 5. In this case, especially when sealing the IC 3 last,
When applying resin linearly between the linear application parts,
It is permissible to use a resin having an aspect ratio of 0.1 or less as this resin.

【0035】このように塗布することにより、各線状塗
布部がそれぞれその幅方向に流動して拡がり、互に一体
化して上記IC及び各配線部全面を覆うものであり、こ
の場合上記粘度及びアスペクト比のエポキシ樹脂封止材
を用いることにより、その硬化前に良好に流動、拡がっ
て一体化し、ボイドの低減化、未充填部分の減少が達成
され、形状制御性が確保されるものである。
By coating as described above, each linear coating portion flows in the width direction and spreads, and is integrated with each other to cover the entire surface of the IC and each wiring portion. By using an epoxy resin encapsulant having a specific ratio, it is possible to flow, expand and integrate well before curing, to reduce voids and reduce unfilled portions, and to secure shape controllability.

【0036】なお、塗布に際して使用される機種、塗布
方法、塗布条件、塗布の順序などに制限はない。
It should be noted that there are no restrictions on the type, application method, application conditions, application sequence, and the like used for application.

【0037】この場合、発熱基板側と駆動側のボンディ
ングワイヤーの配線密度が異なるため、これらを被覆す
るエポキシ樹脂封止材の粘度などを配線密度に応じて異
なったものを使用することも有効であり、また、上述し
たように順序にも制限はなく、充填性を向上させる方法
として、部分的あるいは数本塗布した後、常温もしくは
加熱しながら放置したり、予め硬化し、封止後、残存部
分を塗布封止する等の方法も採用することができる。
In this case, since the wiring densities of the bonding wires on the heat generating substrate side and the driving side are different, it is also effective to use an epoxy resin encapsulant for covering these wires having different viscosities and the like according to the wiring density. There is also no restriction on the order as described above, and as a method for improving the filling property, after partially or several coatings, leaving at room temperature or heating, or pre-curing, sealing, and remaining after sealing A method of coating and sealing a portion can be adopted.

【0038】なお、上記エポキシ樹脂組成物7及びエポ
キシ樹脂封止材8の硬化方法、条件は特に制限されず、
エポキシ樹脂組成物7を予め塗布、硬化後、エポキシ樹
脂封止材8を塗布、硬化させる方法、或いはエポキシ樹
脂組成物7を塗布後、エポキシ樹脂封止材8を塗布し、
次いで両者を同時に硬化させる方法のいずれの方法でも
よい。硬化条件としては60〜100℃で約30〜60
分間初期硬化し、次いで120〜175℃にて2〜5時
間本硬化を行うことが好ましい。
The curing method and conditions for the epoxy resin composition 7 and the epoxy resin sealing material 8 are not particularly limited.
A method in which the epoxy resin composition 7 is applied and cured in advance, and then the epoxy resin encapsulant 8 is applied and cured, or the epoxy resin composition 7 is applied and the epoxy resin encapsulant 8 is applied.
Next, any method of simultaneously curing both may be used. The curing conditions are about 30-60 at 60-100 ° C.
It is preferable to perform an initial curing for 120 minutes and then a full curing at 120 to 175 ° C. for 2 to 5 hours.

【0039】[0039]

【実施例】以下、実施例と比較例を示し、本発明を具体
的に示すが、本発明は下記の実施例に制限されるもので
はない。なお、以下の例において部は重量部を示す。 <エポキシ樹脂組成物の調製>エポキシ樹脂としてビス
フェノール型エポキシ樹脂(エポキシ当量184、25
℃での粘度160ポイズ)、硬化剤として酸無水物(4
−メチルヘキサヒドロ無水フタル酸)、低応力化剤とし
て下記式(1)で示されるシリコーン変性エポキシ樹
脂、硬化促進剤としてイミダゾール系硬化促進剤(商品
名HX3741、旭化成社製)、添加剤としてγ−グリ
シドキシプロピルトリメトキシシラン、チクソ性付与剤
として平均粒径1μm以下の溶融球状シリカ、無機充填
剤として平均粒径15μmの溶融球状シリカを表1に示
す量で配合し、これらを均一に混合してエポキシ樹脂組
成物及びエポキシ樹脂封止材を得た。
EXAMPLES The present invention will be specifically described below with reference to examples and comparative examples, but the present invention is not limited to the following examples. In addition, in the following examples, a part shows a weight part. <Preparation of epoxy resin composition> As an epoxy resin, a bisphenol-type epoxy resin (epoxy equivalent: 184, 25)
C. at 160 ° C.) and acid anhydride (4
-Methylhexahydrophthalic anhydride), a silicone-modified epoxy resin represented by the following formula (1) as a low-stress agent, an imidazole-based curing accelerator (trade name: HX3741, manufactured by Asahi Kasei Corporation) as a curing accelerator, and γ as an additive -Glycidoxypropyltrimethoxysilane, fused spherical silica having an average particle diameter of 1 μm or less as a thixotropy imparting agent, and fused spherical silica having an average particle diameter of 15 μm as an inorganic filler are blended in the amounts shown in Table 1, and these are uniformly mixed. The mixture was mixed to obtain an epoxy resin composition and an epoxy resin sealing material.

【0040】[0040]

【化1】 Embedded image

【0041】次に、表1に示すエポキシ樹脂組成物を用
い、図6に示した感熱記録ヘッドを、同図に示したニー
ドル12位置のうちエポキシ樹脂組成物をに示すニー
ドル位置にて封止し、次いでエポキシ樹脂封止材を同図
に示したニードルの位置のうち及びに示す位置にて
封止した。
Next, using the epoxy resin composition shown in Table 1, the thermal recording head shown in FIG. 6 was sealed at the needle position shown by the epoxy resin composition among the needles 12 shown in FIG. Then, the epoxy resin sealing material was sealed at the positions of the needles shown in FIG.

【0042】この封止の条件は次の通りである。 感熱記録ヘッド:長片長さ5cm、駆動用IC6個搭
載、発熱基板側ワイヤー間隔80μm、チップ間隔10
00μm 樹脂吐出装置の使用機種:オートシューター(岩下エン
ジニヤリング社製) ニードル内径:エポキシ樹脂組成物の場合0.34mm :エポキシ樹脂封止材の場合1.25mm ニードル先端からチップ上部との間隔:500μm 塗布スピード:30mm/sec 硬化条件:150℃の熱板上で2時間 硬化方法A:ワイヤーボンディング後装置について実施
し、エポキシ樹脂組成物7を塗布し、次いでエポキシ樹
脂封止材8を塗布した後、硬化を行った。 硬化方法B:ワイヤーボンディング前装置について実施
し、エポキシ樹脂組成物7を適用し、次いでワイヤーボ
ンディングを行った後、エポキシ樹脂封止材8を封止し
た。
The conditions for this sealing are as follows. Thermal recording head: long piece length 5 cm, 6 driving ICs mounted, heating substrate side wire spacing 80 μm, chip spacing 10
00 μm Model used for resin ejection device: Auto shooter (manufactured by Iwashita Engineering Co., Ltd.) Needle inner diameter: 0.34 mm for epoxy resin composition: 1.25 mm for epoxy resin sealing material Distance from needle tip to chip top: 500 μm Application speed: 30 mm / sec Curing conditions: 2 hours on a hot plate at 150 ° C. Curing method A: Performed on a device after wire bonding, apply epoxy resin composition 7, then apply epoxy resin encapsulant 8, , Cured. Curing method B: Performed on a pre-wire bonding apparatus, applied the epoxy resin composition 7, then performed wire bonding, and then sealed the epoxy resin sealing material 8.

【0043】封止した感熱記録ヘッドについて次のよう
な評価を行った。結果を表2〜3に併記する。 <表面ボイド発生状態>封止剤表面のボイドの発生数
(貫通ボイドも含む)を観察し、下記の基準で評価し
た。 ○:0個 ×:1個以上 <ワイヤー下部ボイド発生状態>封止剤をスライサーに
て切断し、発熱素子側ワイヤー下部の未充填及びボイド
の発生数を観察し、下記基準で評価した。 ○:0個 ×:1個以上 <不良発生状態−耐湿性テスト>80℃,90%RH下
で装置上の全てのワイヤーについて電気特性を観察し、
下記基準で評価した。
The following evaluation was performed on the sealed thermosensitive recording head. The results are shown in Tables 2 and 3. <Surface void generation state> The number of voids generated on the surface of the sealant (including through voids) was observed and evaluated according to the following criteria. :: 0 ×: 1 or more <Void lower part generation state> The sealant was cut with a slicer, the number of unfilled parts and the generation of voids in the lower part of the heating element side wire were observed, and evaluated according to the following criteria. :: 0 pieces ×: 1 piece or more <Defective state-moisture resistance test> Observe the electrical characteristics of all wires on the device at 80 ° C. and 90% RH.
Evaluation was made according to the following criteria.

【0044】○:1000時間まで不良なし ×:1000時間以内に1本以上断線又は接触不良があ
:: No defect until 1000 hours ×: One or more wires disconnected or contact failure within 1000 hours

【0045】[0045]

【表1】 [Table 1]

【0046】[0046]

【表2】 [Table 2]

【0047】[0047]

【表3】 [Table 3]

【0048】実施例、比較例の結果から明らかなよう
に、これまで注目されていなかったが、基板接合部6の
隙間は樹脂封止時のボイドの発生及び信頼性に大きく関
与しており、本発明により接合部6を予めアスペクト比
0.1以下のエポキシ樹脂組成物で充填、封止したこと
によって、高密度ワイヤーへの充填性を重視した低粘度
のエポキシ樹脂封止材による駆動IC及び各配線部への
樹脂封止を行った場合でも表面ボイドの発生はなく、こ
れまで以上の耐湿信頼性を与えることが認められる。
As is clear from the results of the examples and comparative examples, although not noticed so far, the gap between the substrate bonding portions 6 greatly affects the generation of voids and the reliability during resin sealing. According to the present invention, by filling and sealing the joint portion 6 with an epoxy resin composition having an aspect ratio of 0.1 or less in advance, a driving IC using a low-viscosity epoxy resin sealing material that emphasizes the filling property to a high-density wire and Even when resin sealing is performed on each wiring portion, no surface voids are generated, and it is recognized that moisture resistance reliability is further improved.

【0049】[0049]

【発明の効果】本発明の感熱記録ヘッドの樹脂封止方法
によれば、感熱記録ヘッドに装着されている集積回路の
ボンディングワイヤー等の配線部を表面にボイドを生じ
させず、耐湿信頼性をもって封止できる。
According to the resin sealing method for a thermal recording head of the present invention, a wiring portion such as a bonding wire of an integrated circuit mounted on the thermal recording head does not generate voids on the surface and has high moisture resistance reliability. Can be sealed.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の対象となる感熱記録ヘッドの一例を示
す平面図である。
FIG. 1 is a plan view showing an example of a thermal recording head to which the present invention is applied.

【図2】本発明方法の対象となる感熱記録ヘッドの一例
を示す断面図である。
FIG. 2 is a cross-sectional view illustrating an example of a thermal recording head to which the method of the present invention is applied.

【図3】本発明方法の対象となる感熱記録ヘッドの一例
を示す断面図である。
FIG. 3 is a cross-sectional view showing an example of a thermal recording head to which the method of the present invention is applied.

【図4】本発明方法の対象となる感熱記録ヘッドの一例
を示す断面図である。
FIG. 4 is a cross-sectional view showing an example of a thermal recording head to which the method of the present invention is applied.

【図5】本発明方法の対象となる感熱記録ヘッドの一例
を示す断面図である。
FIG. 5 is a sectional view showing an example of a thermal recording head to which the method of the present invention is applied.

【図6】実施例における感熱記録ヘッドとニードル位置
を示す断面図である。
FIG. 6 is a cross-sectional view showing a thermal recording head and needle positions in an example.

【符号の説明】[Explanation of symbols]

1 発熱基板 1a 発熱素子回路 2 駆動用回路基板 2a 駆動用回路 3 駆動用IC 4,5 配線部 6 接合部 7 エポキシ樹脂組成物 8 エポキシ樹脂封止材 9 放熱基板 10 プラテンローラ 11 感熱記録紙 12 ニードル DESCRIPTION OF SYMBOLS 1 Heat generation board 1a Heating element circuit 2 Drive circuit board 2a Drive circuit 3 Drive IC 4,5 Wiring part 6 Joint part 7 Epoxy resin composition 8 Epoxy resin sealing material 9 Heat radiating substrate 10 Platen roller 11 Thermal recording paper 12 needle

───────────────────────────────────────────────────── フロントページの続き (72)発明者 土橋 和夫 群馬県碓氷郡松井田町大字人見1番地10 信越化学工業株式会社 シリコーン電 子材料技術研究所内 (72)発明者 澤田 孝之 群馬県碓氷郡松井田町大字人見1番地10 信越化学工業株式会社 シリコーン電 子材料技術研究所内 (56)参考文献 特開 平4−267162(JP,A) 特開 平6−69259(JP,A) (58)調査した分野(Int.Cl.7,DB名) B41J 2/335 B41J 2/345 H01L 23/29 H01L 23/31 H01L 49/00 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Kazuo Dobashi 1-10 Hitomi, Matsuida-machi, Usui-gun, Gunma Prefecture Inside Silicone Electronics Materials Research Laboratory Shin-Etsu Chemical Co., Ltd. (72) Takayuki Sawada Matsui, Usui-gun, Gunma Prefecture Hitomi Tamachi 1-10 Shin-Etsu Chemical Co., Ltd. Silicone Electronic Materials Research Laboratory (56) References JP-A-4-267162 (JP, A) JP-A-6-69259 (JP, A) (58) Survey Field (Int.Cl. 7 , DB name) B41J 2/335 B41J 2/345 H01L 23/29 H01L 23/31 H01L 49/00

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 発熱素子回路を有する発熱基板と駆動用
回路を有する駆動用回路基板とを具備し、該発熱基板又
は駆動用回路基板上に駆動用ICを装着すると共に、こ
の駆動用ICと上記発熱素子回路及び駆動用回路とをそ
れぞれボンディングワイヤー等の配線部を介してそれぞ
れ接続した感熱記録ヘッドの上記駆動用IC及び各配線
部をエポキシ樹脂封止材を用いて樹脂封止するに際し、
予め発熱基板と駆動用回路基板との接合部をアスペクト
比0.1以下の第1のエポキシ樹脂組成物で封止した
後、第2のエポキシ樹脂封止材を用いて上記駆動用IC
及び各配線部の樹脂封止を行うことを特徴とする感熱記
録ヘッドの樹脂封止方法。
1. A heating board having a heating element circuit and a driving circuit board having a driving circuit. A driving IC is mounted on the heating board or the driving circuit board. At the time of resin-encapsulating the drive IC and each wiring portion of the thermal recording head in which the heating element circuit and the driving circuit are respectively connected via wiring portions such as bonding wires using an epoxy resin sealing material,
After the joint between the heating substrate and the driving circuit board is sealed in advance with a first epoxy resin composition having an aspect ratio of 0.1 or less, the driving IC is sealed using a second epoxy resin sealing material.
And a resin sealing method for the thermal recording head, wherein the resin sealing of each wiring portion is performed.
【請求項2】 第2のエポキシ樹脂封止材が、25℃の
粘度が2000ポイズ以下であり、かつアスペクト比が
0.1〜0.25のものである請求項1記載の方法。
2. The method according to claim 1, wherein the second epoxy resin encapsulant has a viscosity at 25 ° C. of 2000 poise or less and an aspect ratio of 0.1 to 0.25.
JP06071336A 1993-06-28 1994-03-17 Resin sealing method for thermal recording head Expired - Lifetime JP3109374B2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP06071336A JP3109374B2 (en) 1994-03-17 1994-03-17 Resin sealing method for thermal recording head
KR1019940014788A KR100301609B1 (en) 1993-06-28 1994-06-27 Resin Encapsulation Method of Thermal Recording Head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP06071336A JP3109374B2 (en) 1994-03-17 1994-03-17 Resin sealing method for thermal recording head

Publications (2)

Publication Number Publication Date
JPH07256914A JPH07256914A (en) 1995-10-09
JP3109374B2 true JP3109374B2 (en) 2000-11-13

Family

ID=13457578

Family Applications (1)

Application Number Title Priority Date Filing Date
JP06071336A Expired - Lifetime JP3109374B2 (en) 1993-06-28 1994-03-17 Resin sealing method for thermal recording head

Country Status (1)

Country Link
JP (1) JP3109374B2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015029913A1 (en) * 2013-08-26 2015-03-05 京セラ株式会社 Thermal head and thermal printer provided with same
JP2019111752A (en) * 2017-12-25 2019-07-11 東芝ホクト電子株式会社 Thermal print head and thermal printer
JP2019111751A (en) * 2017-12-25 2019-07-11 東芝ホクト電子株式会社 Thermal print head and thermal printer

Also Published As

Publication number Publication date
JPH07256914A (en) 1995-10-09

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