JP3105747B2 - Liquid crystal display device and method of manufacturing the same - Google Patents

Liquid crystal display device and method of manufacturing the same

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Publication number
JP3105747B2
JP3105747B2 JP06234581A JP23458194A JP3105747B2 JP 3105747 B2 JP3105747 B2 JP 3105747B2 JP 06234581 A JP06234581 A JP 06234581A JP 23458194 A JP23458194 A JP 23458194A JP 3105747 B2 JP3105747 B2 JP 3105747B2
Authority
JP
Japan
Prior art keywords
liquid crystal
substrate
composition
crystal display
injection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP06234581A
Other languages
Japanese (ja)
Other versions
JPH0895069A (en
Inventor
潤二 中島
義夫 岩井
一生 井上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Corp
Panasonic Holdings Corp
Original Assignee
Panasonic Corp
Matsushita Electric Industrial Co Ltd
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Filing date
Publication date
Application filed by Panasonic Corp, Matsushita Electric Industrial Co Ltd filed Critical Panasonic Corp
Priority to JP06234581A priority Critical patent/JP3105747B2/en
Publication of JPH0895069A publication Critical patent/JPH0895069A/en
Application granted granted Critical
Publication of JP3105747B2 publication Critical patent/JP3105747B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は液晶表示素子およびその
製造方法に関する。さらに詳しくはディスプレイ、光シ
ャッター等に利用される液晶を用いた液晶表示素子およ
びその製造方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device and a method for manufacturing the same. More specifically, the present invention relates to a liquid crystal display device using a liquid crystal used for a display, an optical shutter, and the like, and a method for manufacturing the same.

【0002】[0002]

【従来の技術】液晶素子の中でも、配向処理を要さない
ため製造が容易なこと、そして、偏光板を要さないため
明るい表示が可能なことを利点とする高分子・液晶複合
体を使った高分子分散型液晶素子が近年、ディスプレイ
として着目されて来ている。
2. Description of the Related Art Among liquid crystal devices, a polymer / liquid crystal composite is used which has an advantage that it can be easily manufactured because no alignment treatment is required and that a bright display is possible because no polarizing plate is required. Recently, polymer-dispersed liquid crystal elements have attracted attention as displays.

【0003】一般に、高分子分散型液晶素子とは液晶を
高分子材料組成物からなるマトリックス中に分散保持さ
れた液晶高分子複合体を一対の電極付基板間に挟み込ん
だものであり、液晶の常光屈折率と高分子マトリックス
の屈折率がほぼ一致するように構成されたものである。
すなわち、電圧無印加の状態で液晶は、前記高分子マト
リックスとの界面付近で、界面に対して略平行に配向し
ている。この状態で基板に垂直な光が入射すると、高分
子マトリックスの屈折率と液晶の屈折率とが異なった状
態となるため、界面にて光が散乱する。基板間に電圧を
印加すると、正の誘電異方性を有するネマティック液晶
の場合、液晶分子が電極面に対して略垂直に整列し、入
射光に対し、高分子マトリックスの屈折率と液晶の常光
屈折率とがほぼ一致することとなるため、光が散乱され
ることなく透過する状態となる。上記性質を利用して光
シャッター機能が可能となっている。
In general, a polymer-dispersed liquid crystal device is a device in which a liquid crystal polymer composite in which liquid crystal is dispersed and held in a matrix made of a polymer material composition is sandwiched between a pair of substrates with electrodes. The structure is such that the ordinary light refractive index and the refractive index of the polymer matrix substantially match.
That is, in the state where no voltage is applied, the liquid crystal is aligned near the interface with the polymer matrix and substantially parallel to the interface. When light perpendicular to the substrate enters in this state, the refractive index of the polymer matrix and the refractive index of the liquid crystal become different, and thus light is scattered at the interface. When a voltage is applied between the substrates, in the case of a nematic liquid crystal having a positive dielectric anisotropy, the liquid crystal molecules are aligned almost perpendicularly to the electrode surface, and the incident light reflects the refractive index of the polymer matrix and the ordinary light of the liquid crystal. Since the refractive index is almost the same, light is transmitted without being scattered. An optical shutter function is possible by utilizing the above properties.

【0004】[0004]

【発明が解決しようとする課題】しかしながら、偏光板
を用いないため、0N-OFF時のコントラストが従来の偏光
板を用いる表示モ−ドに比べ、劣りがちである。尚、こ
こで定義するコントラストとは電界がONの時に受光部
に到達する光量とOFF時に受光部に到達する光量との
比を示しておりコントラストが高いほど良好な画質が得
られる。
However, since no polarizing plate is used, the contrast at the time of 0N-OFF tends to be inferior to a display mode using a conventional polarizing plate. The contrast defined here indicates the ratio of the amount of light reaching the light receiving unit when the electric field is ON and the amount of light reaching the light receiving unit when the electric field is OFF. The higher the contrast, the better the image quality.

【0005】また、この素子の作製は、一般に、揮発性
モノマーを使用するため、偏光板使用モードの作製のよ
うに真空注入等のように気圧変動がしにくい事や常圧注
入でも、素子内の気泡残りのような課題を多く残してい
る。
In addition, since this device is generally manufactured using a volatile monomer, it is difficult to change the atmospheric pressure as in the case of vacuum injection, as in the case of the polarizing plate mode, or even at normal pressure. There are many issues such as remaining air bubbles.

【0006】一般に、揮発性モノマーを注入する組成物
に使用するため、従来有る液晶素子の注入法である真空
注入法では、組成物の揮発により注入は難しいものであ
った。特に、高分子分散型液晶のような、組成物とし
て、少なくとも、液晶材料と高分子樹脂材料の混合物を
注入する場合、モノマーの揮発等の問題より、圧力変動
による作製が難しく、気泡混入や注入ムラが起き易かっ
た。また常圧注入でも、これまでの方法でも、素子内に
気泡が残ることがあるような不安定なものであった。前
記したように、高分子分散型液晶素子の作製、特に注入
にあたっては、多くの課題がある。
[0006] In general, since a volatile monomer is used for a composition to be injected, it is difficult to inject the liquid crystal element by a conventional vacuum injection method due to volatilization of the composition. In particular, when injecting at least a mixture of a liquid crystal material and a polymer resin material as a composition, such as a polymer-dispersed liquid crystal, it is difficult to produce the composition by pressure fluctuation due to problems such as volatilization of the monomer. Unevenness was easy to occur. In addition, both the normal pressure injection and the conventional methods are unstable, with bubbles remaining in the device. As described above, there are many problems in manufacturing a polymer-dispersed liquid crystal element, particularly in injection.

【0007】本発明は、これらの問題点を解決し、均一
な液晶表示素子及びその製造方法を提供することを目的
とする。
An object of the present invention is to solve these problems and to provide a uniform liquid crystal display element and a method for manufacturing the same.

【0008】[0008]

【課題を解決するための手段】前記問題点を解決するた
め、本発明の第1番目の液晶表示素子は、少なくとも一
方が透明である一対の電極付基板を、前記基板の電極側
を対向させてシール材料の樹脂材料でシール部において
貼り合わせ、基板間に形成される空セル内に高分子分散
液晶を存在させた液晶表示素子であって、前記液晶表示
素子の表示面が矩形であり、前記基板の各辺の端部に沿
って形成されたシール部にシール材料のない2個以上の
開口を設けるとともに、前記一対の電極付基板は面積が
広い大基板と狭い小基板とからなり、前記大基板上に、
前記小基板の端から前記大基板の端まで前記小基板の高
よりも高い堰部を2か所設け、前記2か所の堰部の間
または前記2か所の堰部より下面を高分子形成材料と液
晶とを含む組成物の注入口としたことを特徴とする。
In order to solve the above-mentioned problems, a first liquid crystal display device of the present invention comprises a pair of electrode-attached substrates, at least one of which is transparent, in which the electrode sides of the substrates face each other. A liquid crystal display element in which polymer-dispersed liquid crystal is present in empty cells formed between substrates, and a display surface of the liquid crystal display element is rectangular; Along with providing two or more openings without a seal material in a seal portion formed along the end of each side of the substrate, the pair of electrode-containing substrates includes a large substrate having a large area and a small substrate having a small area, On the large substrate,
The height of the small substrate from the edge of the small substrate to the edge of the large substrate
And two lower weirs are provided between the two weirs or below the two weirs as inlets for a composition containing a polymer-forming material and a liquid crystal. Features.

【0009】前記液晶表示においては、素子開口が基板
の4つの角部に形成されていることが好ましい。また前
記液晶表示においては、シール部が注入方向に垂直な2
辺において、それぞれ少なくとも、1カ所以上シール材
料の無い部分により開口が形成されていることが好まし
い。
In the liquid crystal display, it is preferable that the element openings are formed at four corners of the substrate. Further, in the liquid crystal display, the seal portion is perpendicular to the injection direction.
In each of the sides, it is preferable that the opening is formed by at least one portion where no seal material is present.

【0010】また前記液晶表示においては、シール部
が、点線状に樹脂で形成され、開口が形成されているこ
とが好ましい。また前記液晶表示においては、空セルが
前記注入口の設けられている辺の両端に組成物が注入側
から反対側に回り込まないように堰部が設けられてなる
ことが好ましい。
[0010] In the liquid crystal display, the sealing portion is formed by tree fat in dotted, it is preferable that an opening is formed. In the liquid crystal display, it is preferable that empty cells will be dam portion so as not written Ri times on the opposite side is provided from the composition across the injection side edge provided with said injection port.

【0011】また前記液晶表示においては、堰部が注入
部と垂直方向の2辺に対して注入側より上方に位置して
設けられていることが好ましい。また前記液晶表示にお
いては、空セルの1角の開口に注入口が形成され、その
1角に対して隣合う角部の2つに対し、樹脂材料からな
る堰部が設けられていることが好ましい。
In the liquid crystal display, it is preferable that the weir is provided above the injection side with respect to two sides perpendicular to the injection part. In the liquid crystal display is injection port formed in the opening of one corner of an empty cell, to two of the corners adjacent to that one corner, the dam comprising a tree fat material is provided Is preferred.

【0012】また前記液晶表示においては、少なくとも
一方が透明な一対の電極付基板の少なくとも一方の電極
側基板上にガラス転移温度(Tg点)または軟化点が素
子の使用環境温度以下の形状記憶効果を有する熱可塑性
ポリマーが塗膜形成されていることが好ましい。また前
記液晶表示においては、基板が前記電極付基板の少なく
とも一方の電極側基板上にガラス転移温度(Tg点)ま
たは軟化点が素子の使用環境温度以下の形状記憶効果を
有する熱可塑性ポリマーが塗膜形成され、前記熱可塑性
ポリマーのガラス転移温度(Tg点)以上に素子が一定
時間加熱され、前記熱可塑性ポリマーの一軸延伸が解か
れ、非延伸状態とされていることが好ましい。
In the liquid crystal display, at least one of the pair of transparent substrates with electrodes has a shape memory effect in which a glass transition temperature (Tg point) or a softening point is lower than an ambient temperature of use of the element. It is preferable that a thermoplastic polymer having the following is formed. Further, in the liquid crystal display, the substrate has a shape memory effect in which a glass transition temperature (Tg point) or a softening point is lower than the use environment temperature of the element on at least one electrode side substrate of the electrode-attached substrate.
Thermoplastic polymers with is a coating film formed, the heat glass transition temperature (Tg point) of the thermoplastic polymer or the element is heated a predetermined time, uniaxial stretching of the thermoplastic polymer is released, that is the non-stretched state Is preferred.

【0013】次に本発明の第2番目の液晶表示素子は、
少なくとも一方が透明な一対の電極付基板の少なくとも
一方の電極側基板表面に形状記憶効果を有する熱可塑性
ポリマー層が形成され、前記熱可塑性ポリマー層は一軸
延伸され、その表面には組成物の注入されて行く方向に
ラビングが施されたものであり、基板間に組成物が注入
され、注入口が封口樹脂で封口され、その後前記熱可塑
性ポリマーはガラス転移温度(Tg点)以上に一定時間
加熱され、一軸延伸が解かれて非延伸状態となっている
ことを特徴とする。
Next, a second liquid crystal display device according to the present invention comprises:
At least one of which is formed a thermoplastic polymer layer having a shape memory effect in the at least one electrode side substrate surface of the substrate with a pair of transparent electrodes, the injection of the thermoplastic polymer layer is uniaxially stretched, the composition on the surface The composition is injected between the substrates, the injection port is sealed with a sealing resin, and then the thermoplastic polymer is heated to a glass transition temperature (Tg point) or more for a certain time. It is characterized in that the uniaxial stretching is released and the film is in a non-stretched state.

【0014】前記液晶表示素子においては、形状記憶効
果を有する熱可塑性ポリマーのガラス転移温度(Tg
点)が素子の使用環境温度よりも高いことが好ましい。
また前記液晶表示素子においては、形状記憶効果を有す
る熱可塑性ポリマーがポリウレタンであることが好まし
い。前記液晶表示素子においては、空セルに注入される
組成物が液晶材料と高分子材料との混合物より成ること
が好ましい。
In the above liquid crystal display device, the glass transition temperature (Tg) of the thermoplastic polymer having a shape memory effect
(Point) is preferably higher than the use environment temperature of the element.
In the liquid crystal display device, the thermoplastic polymer having a shape memory effect is preferably polyurethane. In the liquid crystal display device, it is preferable that the composition to be injected into the empty cell comprises a mixture of a liquid crystal material and a polymer material.

【0015】次に本発明の第1番目の液晶表示素子の製
造方法は、少なくとも一方が透明である一対の電極付基
板の電極側を対向させてシール材料の樹脂材料で基板間
に空隙を形成して貼り合わせ、シール材料のない部分で
注入口及び排出口の開口を設けて空セルを形成し、前記
基板間に形成される空セル内に高分子形成材料と液晶と
を含む組成物を注入して液晶表示素子を製造する方法で
あって、前記一対の電極付基板は面積が相対的に広い大
基板と相対的に狭い小基板とを用い、前記大基板上に、
前記小基板の端から前記大基板の端まで前記小基板の高
よりも高い堰部を2か所設け、前記2か所の堰部の間
または前記2か所の堰部より下面を注入口とし、前記注
入口から高分子形成材料と液晶とを含む組成物を前記基
板間の空隙に常圧で注入することを特徴とする。
Next, in a first method of manufacturing a liquid crystal display element according to the present invention, a gap is formed between a pair of substrates with electrodes, at least one of which is transparent, with the electrode sides facing each other using a resin material as a sealing material. Then, an opening of an inlet and an outlet is provided in a portion without a sealing material to form an empty cell, and a composition containing a polymer-forming material and a liquid crystal is placed in an empty cell formed between the substrates. A method for manufacturing a liquid crystal display element by injecting, wherein the pair of electrode substrates use a relatively large large substrate and a relatively small small substrate, on the large substrate,
The height of the small substrate from the edge of the small substrate to the edge of the large substrate
Provided two high weir portion than is said the two between the weir portions or the two of the lower surface of the inlet from the weir portion, the composition comprising a liquid crystal polymer forming material from the inlet An object is injected into the gap between the substrates at normal pressure.

【0016】次に本発明の第2番目の液晶表示素子の製
造方法は、少なくとも一方が透明である一対の電極付基
板の電極側を対向させてシール材料の樹脂材料で基板間
に空隙を設けて貼り合わせるとともに、少なくとも注入
口、排出口の開口を設けて空セルを形成し、前記基板間
に形成される空セル内に高分子形成材料と液晶とを含む
組成物を注入して液晶表示素子を製造する方法であっ
て、前記シール部に基板の4つの角部において、開口を
設けて形成するか、注入方向に垂直な2辺において、そ
れぞれ少なくとも1カ所以上シール材料の無い部分によ
り開口を設けるか、または点線状にシール部を樹脂で形
成し、前記一対の電極付基板は面積が相対的に広い大基
板と相対的に狭い小基板とを用い、前記大基板上に、前
記小基板の端から前記大基板の端まで前記小基板の高さ
よりも高い堰部を2か所設け、前記2か所の堰部の間ま
たは前記2か所の堰部より下面を注入口とし、前記注入
口から高分子形成材料と液晶とを含む組成物を前記基板
間の空隙に常圧で注入することを特徴とする。
Next, in a second method for manufacturing a liquid crystal display element according to the present invention, a gap is provided between substrates by using a resin material for a sealing material with the electrode sides of a pair of electrodes-attached substrates at least one of which is transparent. At the same time, at least an opening for an inlet and an outlet are provided to form empty cells, and a composition containing a polymer-forming material and liquid crystal is injected into the empty cells formed between the substrates to display a liquid crystal. A method for manufacturing an element, wherein openings are provided in four corners of a substrate in the seal portion, or openings are formed in two sides perpendicular to an injection direction by at least one or more portions each having no seal material. Or the sealing portion is formed of resin in a dotted line shape, and the pair of substrates with electrodes use a large substrate having a relatively large area and a small substrate having a relatively small area, and the small substrate is provided on the large substrate. From the edge of the board Provided two high weir portion than the height of the small substrate <br/> to the edge of the large substrate, and the two between the weir portions or the two of the lower surface of the inlet from the weir portion, A composition containing a polymer-forming material and a liquid crystal is injected from the injection port into the space between the substrates at normal pressure.

【0017】前記第1〜2番目の方法においては、堰部
を注入部と垂直方向の2辺に対して注入側より上方に位
置させて設け、空セルを液晶材料を含む組成物に漬け
ることによって空セルに注入することが好ましい。
In the first and second methods, the weir portion is provided above the injection side with respect to two sides perpendicular to the injection portion and the empty cell is immersed in a liquid composition containing a liquid crystal material. Therefore, it is preferable to inject into the empty cell.

【0018】また前記第1〜2番目の方法においては、
組成物液面を検知する赤外線センサー、温感センサーも
しくは光学センサーを装備し、前記組成物液面の高さを
空セル内に注入されて行く高さに常に位置するように空
セルの浸漬位置を制御し、堰部を排出口側に近い排出口
の設けられている辺と垂直方向のシール端部に設けて組
成物を注入することが好ましい。
In the first and second methods,
Equipped with an infrared sensor , a thermal sensor or an optical sensor for detecting the liquid level of the composition , and the immersion position of the empty cell so that the height of the liquid level of the composition is always located at the height at which it is injected into the empty cell. It is preferable that the composition is injected by providing a weir portion at the seal end in the direction perpendicular to the side where the outlet is provided near the outlet.

【0019】また前記第1〜2番目の方法においては、
基板の電極の端子部及び基板外表面を保護した後、組成
物を注入することが好ましい。また前記第1〜2番目の
方法においては、空パネルの1角の開口部を注入口と
し、その1角に対して隣合う角部の2つに対し、高分子
樹脂材料からなる堰部を設け、注入側を前記堰部より下
に配し、液晶材料を含む組成物に漬けて注入するこ
とが好ましい。
In the first and second methods,
It is preferable to inject the composition after protecting the terminal portions of the electrodes of the substrate and the outer surface of the substrate. Further, in the first and second methods, an opening at one corner of the empty panel is used as an inlet, and weirs made of a polymer resin material are provided at two corners adjacent to the one corner. provided, the injection side is placed below the dam portion, it is preferable to inject immersed in liquid composition containing a liquid crystal material.

【0020】次に本発明の第3番目の液晶表示素子の製
造方法は、少なくとも一方が透明な一対の電極付基板の
少なくとも一方の電極側基板表面に形状記憶効果を有す
る熱可塑性ポリマー層を形成し、組成物の注入されて行
く方向に、前記熱可塑性ポリマー層にラビングを施し、
前記ポリマー層には、一軸延伸を施し、基板間に注入口
より組成物を注入して素子を形成し、注入が完了した
後、素子から組成物が漏れないように、封口樹脂で封口
し、前記熱可塑性ポリマーのガラス転移温度(Tg点)
以上に素子を一定時間加熱し、前記熱可塑性ポリマーの
一軸延伸を解き、非延伸状態と成った後、温度降下させ
ることにより作製することを特徴とする。前記第3番目
の方法においては、液晶組成物の注入に際して、注入す
る組成物及び基板を一定温度に加温してから注入するこ
とが好ましい。前記第3番目の方法においては、注入
常圧下で行ことが好ましい。
Next, according to a third method of manufacturing a liquid crystal display device of the present invention, a thermoplastic polymer layer having a shape memory effect is formed on at least one electrode-side substrate surface of at least one of a pair of transparent substrates with electrodes. Then, rubbing the thermoplastic polymer layer in the direction in which the composition is injected,
The polymer layer is subjected to uniaxial stretching, a composition is injected from an injection port between the substrates to form an element, and after the injection is completed, so that the composition does not leak from the element, sealing with a sealing resin, Glass transition temperature (Tg point) of the thermoplastic polymer
As described above, the device is manufactured by heating the element for a certain period of time, releasing the uniaxial stretching of the thermoplastic polymer to a non-stretched state, and then lowering the temperature. In the third method, when injecting the liquid crystal composition, it is preferable that the composition and the substrate to be injected are heated to a certain temperature and then injected. Wherein in the third method, it is preferable intends rows <br/> normal pressure injection.

【0021】[0021]

【作用】本発明の液晶表示素子は、液晶表示素子の表示
面が矩形であり、基板の各辺の端部に形成されたシール
部がシール材料が切れた2個以上の開口を有するので、
常圧で注入でき、揮発性のモノマーなどの組成物等の材
料を気泡混入や注入ムラが無く簡単に空セルに注入で
き、均一な素子をえることが可能である。すなわち今ま
でのような減圧操作等圧力変動を利用しない為、組成物
への影響もなく注入でき、均一な表示ができる液晶表示
素子を簡単な作業で、低コストで製造することができ
る。
In the liquid crystal display device of the present invention, the display surface of the liquid crystal display device is rectangular, and the seal formed at the end of each side of the substrate has two or more openings from which the seal material has been cut.
A material such as a composition such as a volatile monomer can be injected at normal pressure, and a material such as a volatile monomer can be easily injected into an empty cell without bubbles and uneven injection, and a uniform element can be obtained. That is, since a pressure change such as a decompression operation as in the past is not used, a liquid crystal display element that can be injected without affecting the composition and can perform uniform display can be manufactured by a simple operation at a low cost.

【0022】前記構成において、開口が基板の4角に設
けられているので、ムラがなく、気泡残りのない、均一
な素子を製造することができる。前記構成において、前
記シール部が注入方向に垂直な2辺において、少なくと
も、1カ所以上シール材料の無い部分により開口が形成
されているので、ムラがなく、気泡残りのない、均一な
素子を製造することができる。前記構成において、シー
ル部が、点線状に高分子樹脂で形成されているので、ム
ラがなく、気泡残りのない、均一な素子を製造すること
ができる。
In the above structure, since the openings are provided at the four corners of the substrate, it is possible to manufacture a uniform element without unevenness and without bubbles. In the above configuration, since the opening is formed at least at one or more portions where no sealing material is provided on two sides perpendicular to the injection direction of the sealing portion, a uniform element having no unevenness and no bubbles is manufactured. can do. In the above configuration, since the sealing portion is formed of a polymer resin in a dotted line, it is possible to manufacture a uniform element without unevenness and without bubbles.

【0023】本発明は、空セルの注入口の設けられてい
る辺の両端に組成物が注入側から反対側に、特に排出口
に回り込まないように堰部を設け、注入口の設けられて
いる部分と堰部(ストッパー)によって囲まれた部分に
液晶材料を含む組成物を溜めるか、または、前記注入口
の設けられている部分と堰部によって囲まれた部分を前
記組成物が保持されている容器内に浸漬し、注入が完了
するまで、組成物がなくならないように連続的に供給す
る。このように構成するので、常圧においても、組成物
等の材料を気泡混入や注入ムラが無く、今までより簡単
に迅速に空セルに注入でき、均一なすぐれた品質の素子
の供給が可能である。即ち今までのような減圧操作等圧
力変動を利用しないため、組成物へ影響を及ぼすことな
く、注入することができるとともに、製造コストを低減
できる。
In the present invention, weirs are provided at both ends of the side of the empty cell where the inlet is provided so as to prevent the composition from flowing from the injection side to the opposite side, particularly to the outlet, and the inlet is provided. The composition containing the liquid crystal material is stored in a portion surrounded by a portion and a weir (stopper), or the composition is held in a portion provided with the inlet and the portion surrounded by the weir. The composition is continuously supplied so that the composition is not lost until the pouring is completed. With this configuration, even at normal pressure, materials such as the composition can be easily and quickly injected into empty cells without bubbles and uneven injection, and uniform high-quality devices can be supplied. It is. That is, since pressure fluctuation such as decompression operation as in the past is not used, the composition can be injected without affecting the composition, and the production cost can be reduced.

【0024】前記素子の構成によれば、空セルが前記注
入口の設けられている辺の両端に組成物が注入側から反
対側に、特に排出口に回り込まないように堰部が設けら
れてなるので、気泡混入や注入ムラがない、均一な品質
の素子を得ることができる。
According to the structure of the device, weirs are provided at both ends of the side where the inlet is provided with the empty cell so as to prevent the composition from flowing from the injection side to the opposite side, particularly to the outlet. Therefore, it is possible to obtain an element of uniform quality without bubbles and uneven injection.

【0025】本発明によれば、注入口の設けられている
辺の両端に組成物が注入側から反対側に、特に排出口に
回り込まないように堰部が設けられて形成され、前記シ
ール部に基板の4つの角(隅)において、開口を設ける
か、注入方向に垂直な2辺において、それぞれ少なくと
も、1カ所以上シール材料の無い部分により開口を設け
て形成するか、点線状に高分子樹脂で形成し液晶材料を
含む組成物を貯留する組成物溜に空セルを漬けることに
よって注入するので、空セル内に組成物などの材料を気
泡を残すことなく簡単に迅速に均一に注入でき、すぐれ
た均一の品質の素子を低いコストで作製できる。
According to the present invention, weirs are provided at both ends of the side where the inlet is provided so as to prevent the composition from flowing from the injection side to the opposite side, particularly to the outlet, and the seal is formed. The opening may be provided at four corners (corners) of the substrate, or the opening may be provided at least at one or more places where there is no seal material at each of two sides perpendicular to the injection direction, or a dotted line polymer Since the empty cell is injected into the composition reservoir that stores the composition containing the liquid crystal material formed of the resin, the material such as the composition can be easily and quickly and uniformly injected into the empty cell without leaving air bubbles. , An element of excellent uniform quality can be manufactured at low cost.

【0026】また前記構成の製造方法によれば、堰部を
注入部と垂直方向の2辺に対して注入側より上方に位置
させて設け、空セルを液晶材料を含む組成物溜に漬ける
ことによって空セルに注入するので、空セル内に組成物
などの材料を気泡を残すことなく簡単にさらに迅速に均
一に注入でき、すぐれた均一の品質の素子を低いコスト
で作製できる。
According to the manufacturing method having the above-described structure, the weir portion is provided above the injection side with respect to two sides perpendicular to the injection portion, and the empty cell is immersed in a composition reservoir containing a liquid crystal material. Thus, a material such as a composition can be easily and quickly and uniformly injected into the empty cell without leaving air bubbles, and an element of excellent uniform quality can be manufactured at low cost.

【0027】また前記構成の液晶表示素子によれば、堰
部が注入部と垂直方向の2辺に対して注入側より上方に
位置して設けられ、液晶材料を含む組成物溜に漬けられ
て液晶材料が空セルに注入されてなるので、気泡残りム
ラのない、すぐれた、均一の品質の低コストの素子を得
ることができる。
Further, according to the liquid crystal display device having the above-described structure, the weir is provided above the injection side with respect to two sides perpendicular to the injection part and is immersed in a composition reservoir containing a liquid crystal material. Since the liquid crystal material is injected into the empty cells, it is possible to obtain an excellent, uniform quality, low-cost element free of air bubbles.

【0028】前記組成物溜に赤外線センサーもしくは温
感センサーもしくは光学センサーを装備し、前記組成物
溜の液面の高さを空セル内に注入されて行く高さに常に
位置するように空セルの浸漬位置を制御し、堰部を排出
口側に近い排出口の設けられている辺と垂直方向のシー
ル端部に設けて組成物を注入するので、気泡残りなく均
一に注入でき、均一な品質の素子を簡単に低コストで作
製できる。
The composition reservoir is equipped with an infrared sensor, a thermal sensor, or an optical sensor, and the empty cell is set so that the liquid level of the composition reservoir is always positioned at the level where the liquid is poured into the empty cell. The immersion position is controlled, and the dam is provided at the seal end in the direction perpendicular to the side provided with the discharge port close to the discharge port, and the composition is injected. A high quality device can be easily manufactured at low cost.

【0029】また前記製造方法の構成において、基板の
電極の端子部及び基板外表面を保護した後、組成物を注
入するので、電極に接触不良を起こさせることなく、気
泡残りなく均一に注入でき、均一な高品質の素子を簡単
に低コストで作製できる。
In the structure of the manufacturing method, since the composition is injected after protecting the terminal portion of the electrode of the substrate and the outer surface of the substrate, the electrode can be injected uniformly without causing contact failure and without remaining bubbles. A uniform high-quality device can be easily manufactured at low cost.

【0030】また前記製造方法の構成において、空セル
の1角の開口を注入口とし、その1角に対して隣合う角
部の2つに対し、高分子樹脂材料からなる堰部を設け、
注入側を該堰部より下に配し、液晶材料を含む組成物溜
に漬けて注入するので、注入速度を速くでき、気泡残り
なく均一に注入でき、均一な品質の素子を簡単に低コス
トで作製できる。
[0030] In the structure of the manufacturing method, an opening at one corner of the empty cell is used as an injection port, and dams made of a polymer resin material are provided at two corners adjacent to the one corner,
Since the injection side is arranged below the weir and is immersed in the composition reservoir containing the liquid crystal material for injection, the injection speed can be increased, the air can be injected without bubbles, and the device of uniform quality can be easily manufactured at low cost. It can be manufactured with.

【0031】また前記表示素子の構成において、前記空
セルの1角の開口に注入口が形成され、その1角に対し
て隣合う角部の2つに対し、高分子樹脂材料からなる堰
部が設けられ、液晶材料を含む組成物が空セル内に注入
されてなるので、気泡残りやムラのない、均一の高品質
の低コストの素子を得ることができる。
In the structure of the display element, an injection port is formed at one corner of the empty cell, and two corners adjacent to the corner are provided with a weir portion made of a polymer resin material. Is provided, and the composition containing the liquid crystal material is injected into the empty cell, so that a uniform, high-quality, low-cost device free of bubbles and unevenness can be obtained.

【0032】本発明の製造方法は、少なくとも一方が透
明な一対の電極付基板の少なくとも一方の電極側基板表
面に形状記憶効果を有する熱可塑性ポリマー層を形成
し、組成物の注入されて行く方向に、前記熱可塑性ポリ
マー層にラビングを施し、一軸延伸を施し、基板間に注
入口より組成物を注入して素子を形成し、注入が完了し
た後、素子から組成物が漏れないように、封口樹脂で封
口し、前記熱可塑性ポリマーのガラス転移温度(Tg
点)以上に素子を一定時間加熱し、前記熱可塑性ポリマ
ーの一軸延伸を解き、非延伸状態とした後、温度降下さ
せることにより作製するので、注入速度を速くでき、気
泡残りなく均一に注入でき、高分子液晶の保持率を向上
でき、低電圧駆動が可能な電圧保持特性にすぐれた、均
一な品質の素子を簡単に低コストで作製できる。
According to the production method of the present invention, a thermoplastic polymer layer having a shape memory effect is formed on at least one electrode-side substrate surface of at least one of a pair of electrodes-attached substrates, and a direction in which the composition is injected. On, rubbing the thermoplastic polymer layer, subjected to uniaxial stretching, to form a device by injecting the composition from the injection port between the substrates, after the injection is completed, so that the composition does not leak from the device, Sealing with a sealing resin, the glass transition temperature (Tg) of the thermoplastic polymer
Point) As described above, the device is heated for a certain period of time, the uniaxial stretching of the thermoplastic polymer is released, and the thermoplastic polymer is made to be in a non-stretched state, and then the temperature is lowered. Therefore, the injection speed can be increased, and uniform injection can be performed without bubbles. It is possible to easily and inexpensively manufacture a device of uniform quality, which can improve the retention ratio of the polymer liquid crystal and has excellent voltage holding characteristics capable of driving at a low voltage.

【0033】本発明の表示素子は、少なくとも一方が透
明な一対の電極付基板の少なくとも一方の電極側基板表
面に形状記憶効果を有する熱可塑性ポリマー層が形成さ
れ、該熱可塑性ポリマー層は一軸延伸されており、その
表面には組成物の注入されて行く方向にラビングが施さ
れたものであり、基板間に組成物が注入され、注入口が
封口樹脂で封口され、その後前記熱可塑性ポリマーはガ
ラス転移温度(Tg点)以上に一定時間加熱され、一軸
延伸が解かれて非延伸状態となっている。このように、
形状記憶効果を有する熱可塑性ポリマー層が基板表面に
形成されることによって、組成物等の材料の注入もスピ
ーディーに、気泡残りなく均一に注入でき、高分子分散
型液晶の保持率が向上でき、駆動電圧も低下した、均一
な品質の素子を簡単に低コストで得ることができる。
In the display element of the present invention, a thermoplastic polymer layer having a shape memory effect is formed on at least one electrode-side substrate surface of at least one of a pair of electrodes-attached substrates, and the thermoplastic polymer layer is uniaxially stretched. The surface has been subjected to rubbing in the direction in which the composition is injected, the composition is injected between the substrates, the injection port is sealed with a sealing resin, then the thermoplastic polymer is It is heated to a glass transition temperature (Tg point) or higher for a certain period of time, and is uniaxially stretched to be in a non-stretched state. in this way,
By forming a thermoplastic polymer layer having a shape memory effect on the substrate surface, material such as a composition can be quickly and uniformly injected without bubbles, and the retention of a polymer-dispersed liquid crystal can be improved. An element of uniform quality with reduced driving voltage can be easily obtained at low cost.

【0034】また前記表示素子の構成において、前記形
状記憶効果を有する熱可塑性ポリマーのガラス転移温度
(Tg点)が素子の使用環境温度よりも高いので、組成
物等の材料の注入もスピーディーに、気泡残りなく均一
に行うことができ、さらに高分子分散型液晶の保持率が
向上でき、駆動電圧が低下した、均一な品質の素子を簡
単に低コストで得ることができる。
In the structure of the display device, since the glass transition temperature (Tg point) of the thermoplastic polymer having the shape memory effect is higher than the ambient temperature of use of the device, the injection of materials such as a composition can be performed quickly. It can be performed uniformly without leaving bubbles, the retention rate of the polymer dispersed liquid crystal can be improved, and a device of uniform quality with reduced driving voltage can be easily obtained at low cost.

【0035】また前記表示素子の構成において、少なく
とも一方が透明な一対の電極付基板の少なくとも一方の
電極側基板上にガラス転移温度(Tg点)または軟化点
が素子の使用環境温度以下のポリマーが塗膜形成されて
いる。このように熱可塑性ポリマーの使用により、組成
物等の材料の注入もスピーディーに、気泡残りなく均一
に行うことができ、さらに高分子分散型液晶の保持率が
向上でき、駆動電圧が低下した、均一な品質の素子を簡
単に低コストで得ることができる。
In the structure of the display element, a polymer having a glass transition temperature (Tg point) or a softening point equal to or lower than the use environment temperature of the element is formed on at least one electrode side substrate of at least one of the pair of transparent electrodes. A coating is formed. As described above, by using the thermoplastic polymer, the injection of the material such as the composition can be performed speedily and uniformly without leaving any bubbles, the retention of the polymer-dispersed liquid crystal can be improved, and the driving voltage has been reduced. An element of uniform quality can be easily obtained at low cost.

【0036】また前記表示素子の構成において、前記形
状記憶効果を有する熱可塑性ポリマーがポリウレタンで
あるので、熱可塑性ポリマーの使用により、組成物等の
材料の注入もスピーディーに、気泡残りなく均一に行う
ことができ、さらに熱可塑性ポリマー層が基板表面に形
成されることによって、高分子分散型液晶の保持率が向
上でき、駆動電圧が低下した電圧保持特性にすぐれた、
均一な品質の素子を簡単に低コストで得ることができ
る。
In the structure of the display element, since the thermoplastic polymer having the shape memory effect is polyurethane, the use of the thermoplastic polymer allows the material such as the composition to be quickly and uniformly injected without bubbles. In addition, by forming a thermoplastic polymer layer on the substrate surface, the retention of the polymer-dispersed liquid crystal can be improved, and the driving voltage is excellent in voltage holding characteristics,
An element of uniform quality can be easily obtained at low cost.

【0037】また前記表示素子の構成において、前記パ
ネル基板が前記電極付基板の少なくとも一方の電極側基
板上にガラス転移温度(Tg点)または軟化点が素子の
使用環境温度以下のポリマーが塗膜形成され、該熱可塑
性ポリマーのガラス転移温度(Tg点)以上に素子が一
定時間加熱され、前記熱可塑性ポリマーの一軸延伸が解
かれ、非延伸状態とされているので、組成物等の材料の
注入もスピーディーに、気泡残りなく均一に行うことが
でき、さらに熱可塑性ポリマー層が基板表面に形成され
ることによって、高分子分散型液晶の持率が向上でき駆
動電圧が低くされた、均一な品質の素子を簡単に低コス
トで得ることができる。
In the above display device, a polymer having a glass transition temperature (Tg point) or a softening point equal to or lower than a use environment temperature of the element is coated on at least one electrode side substrate of the panel substrate. The device is heated for a certain period of time at a temperature equal to or higher than the glass transition temperature (Tg point) of the thermoplastic polymer, and the uniaxial stretching of the thermoplastic polymer is released to be in a non-stretched state. Injection can be performed quickly and uniformly without leaving any bubbles, and by forming a thermoplastic polymer layer on the substrate surface, the retention of polymer-dispersed liquid crystal can be improved and the driving voltage is reduced. A quality device can be easily obtained at low cost.

【0038】また前記表示素子の構成において、前記空
セルに注入される組成物が液晶材料と高分子材料との混
合物より成るので、組成物等の材料の注入もスピーディ
ーに、気泡残りなく均一に注入されたものが得られ、さ
らに熱可塑性ポリマー層が基板表面に形成されることに
よって、高分子分散型液晶の保持率が向上できるうえ、
駆動電圧の低下された、均一な品質の素子を簡単に低コ
ストで得ることができる。
In the structure of the display element, since the composition to be injected into the empty cell is a mixture of a liquid crystal material and a polymer material, the injection of the material such as the composition can be performed quickly and uniformly without leaving any bubbles. The injected one is obtained, and the thermoplastic polymer layer is further formed on the substrate surface, so that the retention of the polymer-dispersed liquid crystal can be improved,
A device of uniform quality with reduced driving voltage can be easily obtained at low cost.

【0039】また前記製造方法の構成において、前記組
成物の注入に際して、注入する組成物及び基板を一定温
度に加温してから注入するので、高分子分散型液晶の持
率が向上でき、電圧保持特性にすぐれ、注入速度を速く
でき、気泡残りなく均一に注入でき、均一な品質の素子
を簡単に低コストで作製することができる。
In the structure of the manufacturing method, the composition and the substrate to be injected are heated after being heated to a certain temperature when the composition is injected. Excellent retention characteristics, high injection speed, uniform injection with no air bubbles remaining, and uniform quality of the element can be easily manufactured at low cost.

【0040】また前記製造方法の構成において、前記注
入が常圧下で行われるので、高分子分散型液晶の保持率
が向上でき、電圧保持特性にすぐれ、注入速度を速くで
き、気泡残りなく均一に注入でき、均一な品質の素子を
簡単に低コストで作製することができる。
In addition, in the structure of the manufacturing method, since the injection is performed under normal pressure, the retention of the polymer-dispersed liquid crystal can be improved, the voltage holding characteristics can be improved, the injection speed can be increased, and the uniformity can be obtained without bubbles. It can be implanted and a device of uniform quality can be easily manufactured at low cost.

【0041】上述のように、本発明の液晶表示素子及び
その製造方法によれば、気泡混入や注入ムラ等がない、
均一なパネルを作製できる。しかも簡単に、常圧のまま
液晶と重合性材料などを含む組成物とを注入ができるた
め、コストも今までより大幅にダウンすることが可能と
なる。また、本発明の熱可塑性ポリマーの使用により、
組成物等の材料の注入もスピーディーに安全にできる。
As described above, according to the liquid crystal display device and the method of manufacturing the same of the present invention, there are no bubbles and uneven injection.
A uniform panel can be manufactured. In addition, since the liquid crystal and the composition containing a polymerizable material and the like can be easily injected under normal pressure, the cost can be significantly reduced. Also, by using the thermoplastic polymer of the present invention,
Injection of a material such as a composition can be performed quickly and safely.

【0042】また本発明の液晶表示素子によれば、特
に、高分子分散型液晶の保持率向上及び駆動電圧の低電
圧化が可能となる。また本発明の液晶表示素子の製造方
法は、特に、高分子分散型液晶の作製に有効なものであ
り、少なくとも液晶と光重合性材料を含む組成物を混合
し、相溶させた混合物を簡単に注入でき、光により高分
子材料と液晶に分離する光重合相分離法を使って作製す
ることができる(尚、熱重合性材料を用いて、相分離さ
せることも可能である)。光重合性組成物は、プレポリ
マーやモノマーなどの重合性有機化合物と光開始剤から
成っており、組成物調整のため高分子化合物や無機系充
填剤や有機系添加物を混合してもよく、更に、熱重合開
始剤を混合しても良い。プレポリマーやモノマーとして
はビニル基を有する化合物が適しておりなかでも、アク
リル系化合物が好ましい。例えば、t−ブチルアクリレ
ート、2−エチルヘキシルアクリレート、2−メトキシ
エチルアクリレート、2−フェノキシエチルアクリレー
ト、シクロヘキシルアクリレート、トリメトキシプロパ
ントリアクリレート、ネオペンチルグリコールジアクリ
レート、1、6−ヘキサンジオールジアクリレート、ト
リメチロールプロパントリアクリレートなどのモノマー
や、商品名:MANDA、TC−110,HX−22
0,HX−620などの日本化薬製多官能アクリレート
や、ポリエステルアクリレート、エポキシアクリレー
ト、ポリウレタンアクリレート、ポリエーテルアクリレ
ートなどの市販のプレポリマーが単独もしくは組み合わ
せて使用できる。光開始剤としては、ベンゾインメチル
エーテルベンゾインイソプロピルエーテル、ベンゾイン
イソブチルエーテル、ベンゾフェノン、ベンジリデンメ
チルケタール、2、2−ジエトキシアセトフェノン、2
−ヒドロキシ−2−メチル−1−フェニルプロパン−1
−オンなどが適している。また、上記のラジカル重合性
組成物以外にも、カチオン重合性エポキシ樹脂組成物を
用いることも可能である。本発明に用いられる液晶材料
は、電圧によってダイレクタ方位を制御できる誘電率異
方性を有し、且つ屈折率異方性を有しておれば良く、組
成系および異方性の正負は問わない。また、前記液晶材
料中に色素のような添加物を混合することが可能であ
る。
According to the liquid crystal display device of the present invention, it is possible to improve the retention of the polymer dispersed liquid crystal and to lower the driving voltage. The method for producing a liquid crystal display device of the present invention is particularly effective for producing a polymer-dispersed liquid crystal. At least a composition containing a liquid crystal and a composition containing a photopolymerizable material is mixed, and a mixture obtained by dissolving the mixture is simply obtained. And a photopolymerizable phase separation method in which light is separated into a polymer material and a liquid crystal by light (the phase can be separated using a thermopolymerizable material). The photopolymerizable composition is composed of a polymerizable organic compound such as a prepolymer or a monomer and a photoinitiator, and may be mixed with a polymer compound, an inorganic filler, or an organic additive for adjusting the composition. Further, a thermal polymerization initiator may be mixed. As the prepolymer and the monomer, a compound having a vinyl group is suitable, and an acrylic compound is preferable. For example, t-butyl acrylate, 2-ethylhexyl acrylate, 2-methoxyethyl acrylate, 2-phenoxyethyl acrylate, cyclohexyl acrylate, trimethoxypropane triacrylate, neopentyl glycol diacrylate, 1,6-hexanediol diacrylate, trimethylol Monomers such as propane triacrylate and trade names: MANDA, TC-110, HX-22
Nippon Kayaku polyfunctional acrylates such as O.HX-620 and commercially available prepolymers such as polyester acrylate, epoxy acrylate, polyurethane acrylate and polyether acrylate can be used alone or in combination. Examples of the photoinitiator include benzoin methyl ether, benzoin isopropyl ether, benzoin isobutyl ether, benzophenone, benzylidenemethyl ketal, 2,2-diethoxyacetophenone,
-Hydroxy-2-methyl-1-phenylpropane-1
-ON is suitable. In addition to the radically polymerizable composition, a cationically polymerizable epoxy resin composition can be used. The liquid crystal material used in the present invention has a dielectric anisotropy capable of controlling a director direction by a voltage and has a refractive index anisotropy. . Further, it is possible to mix an additive such as a dye into the liquid crystal material.

【0043】[0043]

【実施例】以下、本発明の具体例について説明する。但
し、本発明はこれらの実施例に限定されるものではな
い。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Specific examples of the present invention will be described below. However, the present invention is not limited to these examples.

【0044】(実施例1) モノマーとして2-エチルヘキシルアクリレート(ナカラ
イテスク(株)製)17.6wt%、プレポリマーとしてビス
コート#3700(大阪有機化学工業(株)製)1.93wt%光
硬化開始剤としてDarocur1173(メルク社製)0.07wt%
からなる光重合性材料と、液晶としてTL205[N-I p
oint=87℃,ne=1.744,no=1.527](メルク・ジャパン
(株)製)80.4wt%を混合して組成物とした。
Example 1 17.6 wt% of 2-ethylhexyl acrylate (manufactured by Nacalai Tesque, Inc.) as a monomer and 1.93 wt% of Biscoat # 3700 (manufactured by Osaka Organic Chemical Industry) as a prepolymer As a photocuring initiator Darocur1173 (Merck) 0.07wt%
TL205 [NI p
oint = 87 ° C., ne = 1.744, no = 1.527] (manufactured by Merck Japan K.K.) was mixed to obtain a composition.

【0045】図1に示すように、一対の電極付基板3,
4の電極面を対向させ、基板間に13.0μmのスペーサー
を介して、四隅(角)に対し、シール部の無いシールパ
ターンで、エポキシ系シール材、ストラクトボンド(三
井東圧(株)製)により貼り合わせ、空セルを形成し
た。
As shown in FIG. 1, a pair of substrates with electrodes 3,
The electrode surfaces of No. 4 are opposed to each other, and an epoxy-based sealing material and struct bond (manufactured by Mitsui Toatsu Co., Ltd.) are provided at the four corners (corners) with a seal pattern at the four corners (corners) via a spacer of 13.0 μm between the substrates. To form an empty cell.

【0046】空セル形成について具体的に説明すると、
図1のように大小、大きさの異なる矩形の基板1枚ずつ
を対向させる。大基板3側の大きさは59mm×70mmであ
り、小基板4側の大きさは、49mm×65mmのものを使用し
た。小基板4の短軸側(短辺)基板端4b,4cよりそ
れぞれ1.5mmで、長軸側(長辺)基板端4a、4aから
0.5mmの位置から長軸方向のシール部1aをそれぞれ形
成した。短軸側のシールも同様にして、小基板4の長軸
側(長辺)基板端4aより1.5mmで、短軸側基板端4
b,4cから0.5mmの位置から短軸方向のシール部1b
を形成した。シール幅は0.4mmとした。このシール部1
a,1bを形成した基板を90℃で10分加熱し、続い
て、基板同士を貼り合わせ、真空パック機により押さえ
つけた後、150℃で2時間加熱した。これによって空セ
ルを得た。11はシール開口部である。
The concrete description of the empty cell formation is as follows.
As shown in FIG. 1, rectangular substrates having different sizes and sizes are opposed to each other. The size on the large substrate 3 side was 59 mm × 70 mm, and the size on the small substrate 4 side was 49 mm × 65 mm. 1.5 mm from the short-axis side (short side) substrate ends 4b and 4c of the small substrate 4, respectively, from the long-axis side (long side) substrate ends 4a and 4a.
A long axis direction seal portion 1a was formed from a position of 0.5 mm. Similarly, the short axis side seal is 1.5 mm from the long axis side (long side) substrate end 4a of the small substrate 4 and the short axis side substrate end 4a.
b, 4c, the seal portion 1b in the short axis direction from the position of 0.5 mm
Was formed. The seal width was 0.4 mm. This seal part 1
The substrate on which a and 1b were formed was heated at 90 ° C. for 10 minutes. Subsequently, the substrates were bonded to each other, pressed by a vacuum packing machine, and then heated at 150 ° C. for 2 hours. This resulted in an empty cell. 11 is a seal opening.

【0047】この空セルに対し、図1の様に、小基板4
の注入側(A)の短手端(短辺)部4bにおいて、大基
板3上に基板端3bまで、ロックタイト352A(日本ロッ
クタイト(株)製)を小基板3高さより若干高く、線幅
1mm程度に形成し、紫外線(350nm)55mW/cm2 ,90秒照射
して硬化して堰部2、2を形成した。
With respect to this empty cell, as shown in FIG.
In the short end (short side) portion 4b on the injection side (A), Loctite 352A (manufactured by Nippon Loctite Co., Ltd.) is slightly higher than the height of the small substrate 3 up to the substrate end 3b on the large substrate 3;
It was formed to a thickness of about 1 mm, and was cured by irradiating it with ultraviolet light (350 nm) at 55 mW / cm 2 for 90 seconds to form dams 2 and 2.

【0048】続いて、上記堰部2、2間で囲まれた注入
部(組成物供給部)5に、組成物6を注入が終わるまで
供給し、貯留した。この注入の時、基板及び組成物の温
度は25℃に保った。
Subsequently, the composition 6 was supplied and stored in an injection section (composition supply section) 5 surrounded by the weir sections 2 and 2 until the injection was completed. During this implantation, the temperature of the substrate and the composition was kept at 25 ° C.

【0049】組成物をパネル全体に注入し後、25℃に
保たれた環境下で、紫外線(30mW/cm2,3分間)照射し、
素子を得た。こうして、得られた素子は全体に均一な
(面内輝度も均一)パネルで、ムラ無く、気泡残りも無
いものであった。
After injecting the composition into the entire panel, the composition was irradiated with ultraviolet rays (30 mW / cm 2 for 3 minutes) in an environment maintained at 25 ° C.
An element was obtained. The device thus obtained was a uniform panel (with uniform in-plane luminance) as a whole, without unevenness, and without bubbles.

【0050】また、堰部2、2は、ロックタイト352Aに
限らず、他のUV硬化性樹脂でも、熱硬化性樹脂でも同
結果を得た。シール材も、ストラクトボンドに限るもの
でなく、他の樹脂でも同様の結果を得た。
The dams 2 and 2 were not limited to Loctite 352A, and the same results were obtained with other UV-curable resins and thermosetting resins. The sealing material is not limited to struct bond, and similar results were obtained with other resins.

【0051】基板3、4の大きさも、上記に限るもので
はなく、大基板3側の大きさが100mm×150mmよりなり、
小基板4側の大きさが90mm×145mmのものを使用しても
同様に、ムラ無く、気泡残りの無い素子を得る事ができ
た。
The sizes of the substrates 3 and 4 are not limited to the above, and the size of the large substrate 3 is 100 mm × 150 mm.
Similarly, even when a device having a size of 90 mm × 145 mm on the side of the small substrate 4 was used, an element having no unevenness and having no remaining bubbles could be obtained.

【0052】(比較例1) 実施例1のように、四隅(角)をカットしたシールパタ
ーンでなく、真空注入を試みると、組成物が揮発した。
また、堰部及び四隅カットのシールパターンを設けな
く、常圧注入を試みると、注入側と反対側に組成物が回
り込み、排出口を閉じてしまい、気泡の残ってしまうも
のも得られてしまう歩留まりの悪い結果となってしまっ
た。
(Comparative Example 1) As in Example 1, the composition volatilized when vacuum injection was attempted instead of a seal pattern in which the four corners (corners) were cut.
Also, if normal pressure injection is attempted without providing a weir portion and a four-corner cut seal pattern, the composition wraps around to the side opposite to the injection side, closes the discharge port, and may leave air bubbles. Yield was bad.

【0053】(実施例2) 図2に示すように、実施例1とほぼ同様のシールパター
ン1a,1a,1b,1cと、堰部2、2を形成した。
空セルは、実施例1と同様、具体的には図2のように大
小、大きさの異なる基板1枚ずつを対向させて形成し
た。
Example 2 As shown in FIG. 2, substantially the same seal patterns 1a, 1a, 1b, and 1c as in Example 1 and dams 2 and 2 were formed.
The empty cells were formed in the same manner as in Example 1, specifically, as shown in FIG.

【0054】大基板3側の大きさは、59mm×70mmよりな
り、小基板4側の大きさは、49mm×65mmのものを使用し
た。小基板4の短軸側基板端4b,4cより2.5mmで、
大基板3の長軸側基板端4aから0.5mmの位置から長軸
方向のシール部1a,1aを形成した。短軸側のシール
も同様に、小基板4の長軸側基板端4bより2.5mmで、
短軸側基板端4aから0.5mmの位置から短軸方向のシー
ル部1b,1cをそれぞれ形成した。四隅(角)部のシ
ールは長軸短軸シール端から1mm離れた位置(開口部1m
m)から図2のようにシール部1d,1d,1d,1d
を形成して行った。シール幅は0.4mmとした。このシー
ル材を形成した基板3、4を90℃で10分加熱し、続
いて、基板同士を貼り合わせ、真空パック機により押さ
えつけた後、150℃で2時間加熱した。これによって、
空セルを得た。
The size on the large substrate 3 side was 59 mm × 70 mm, and the size on the small substrate 4 side was 49 mm × 65 mm. 2.5 mm from the short-side substrate ends 4b and 4c of the small substrate 4,
The seal portions 1a, 1a in the long axis direction were formed from the position 0.5 mm from the long axis side substrate end 4a of the large substrate 3. Similarly, the short axis side seal is 2.5 mm from the long axis side substrate end 4b of the small substrate 4,
Seal portions 1b and 1c in the short axis direction were formed from a position 0.5 mm from the short axis side substrate end 4a. The seals at the four corners (corners) are 1 mm away from the long and short axis seal ends (opening 1 m
m) to seal portions 1d, 1d, 1d, 1d as shown in FIG.
Was formed. The seal width was 0.4 mm. The substrates 3 and 4 on which the sealing material was formed were heated at 90 ° C. for 10 minutes. Subsequently, the substrates were bonded to each other, pressed by a vacuum packing machine, and then heated at 150 ° C. for 2 hours. by this,
I got an empty cell.

【0055】堰部2、2も実施例1と同様に形成した。
実施例1と同様の注入方法により、高分子分散型液晶を
作製した。この実施例の結果、実施例1と同様に、均一
なパネル(素子)を得る事ができた。また、このシール
パターンの方が空セル状態でのパネルセル厚さの均一性
は実施例1の場合よりも良く、干渉縞はほとんどなかっ
た。また、基板大きさ、堰部の位置等も実施例1記載の
様に、上記したものに限るものではなく、大基板側の大
きさが100mm×150mmよりなり、小基板側の大きさが90mm
×145mmのものを使用しても同様に、ムラ無く、気泡残
りの無い素子を得る事ができた。
The dams 2 and 2 were formed in the same manner as in Example 1.
By the same injection method as in Example 1, a polymer-dispersed liquid crystal was produced. As a result of this example, a uniform panel (element) was obtained as in Example 1. In addition, the uniformity of the panel cell thickness in the empty cell state was better in this seal pattern than in Example 1, and there was almost no interference fringe. The size of the substrate, the position of the weir, and the like are not limited to those described above as described in Example 1. The size of the large substrate is 100 mm × 150 mm, and the size of the small substrate is 90 mm.
Similarly, an element having no unevenness and having no air bubbles was able to be obtained even when the element having a size of 145 mm was used.

【0056】(実施例3) 図3のように、シールパターンを実施例2と同様に形成
し、堰部も図3のように設け、実施例2と同様に作製し
た。空セルは、実施例1と同様、具体的には、図3のよ
うに大小、大きさの異なる基板3、4をそれぞれ1枚ず
つを対向させて形成した。
Example 3 As shown in FIG. 3, a seal pattern was formed in the same manner as in Example 2, and a dam was provided as in FIG. The empty cell was formed in the same manner as in the first embodiment, specifically, as shown in FIG. 3, substrates 3 and 4 having different sizes and sizes were opposed to each other.

【0057】大基板3側の大きさは、59mm×70mmよりな
り、小基板4側の大きさは、49mm×65mmのものを使用し
た。小基板4の短軸側基板端4b、4cよりそれぞれ1.
5mmで、長軸側基板端4aから0.5mmの位置から長軸方向
のシール部1aを形成した。短軸側のシールも同様に、
小基板4の長軸側基板端4aより1.5mmで、短軸側基板
端4b,4cからそれぞれ0.5mmの位置から短軸方向の
シール部1b、1cをそれぞれ形成した。また四隅
(角)部において、小基板4の短軸長軸基板端4a,4
bから0.5mmの位置において直径0.5mmのドット状シール
1e,1e,1e,1eを図3のように形成した。シー
ル幅は0.4mmとした。このシール材を形成した基板を9
0℃,10分加熱し、続いて、基板3,4同士を貼り合
わせ、真空パック機により押さえつけた後、150℃で2
時間加熱した。これによって、空セルを得た。
The size on the large substrate 3 side was 59 mm × 70 mm, and the size on the small substrate 4 side was 49 mm × 65 mm. From the short-axis-side substrate ends 4b and 4c of the small substrate 4, 1.
The seal portion 1a in the long axis direction was formed at a position of 0.5 mm from the long axis side substrate end 4a at 5 mm. Similarly for the short shaft side seal,
Seal portions 1b and 1c in the short-axis direction were formed at positions 1.5 mm from the long-side substrate end 4a of the small substrate 4 and 0.5 mm from the short-axis side substrate ends 4b and 4c, respectively. Further, at the four corners (corners), the short-axis / long-axis substrate ends 4a, 4
A dot-shaped seal 1e, 1e, 1e, 1e having a diameter of 0.5 mm was formed at a position 0.5 mm from b as shown in FIG. The seal width was 0.4 mm. The substrate on which the sealing material is formed is 9
After heating at 0 ° C. for 10 minutes, the substrates 3 and 4 were bonded together and pressed by a vacuum packing machine.
Heated for hours. Thus, an empty cell was obtained.

【0058】堰部2,2は、図3のように小基板端から
大基板端に対し、実施例1と同様の方法で形成した。こ
の実施例の結果、実施例2よりも、若干、注入速度が速
く注入が完了し、均一なパネルを得る事ができた。ま
た、基板の大きさも、上記に限るものではなく、大基板
3側の大きさが100mm×150mmよりなり、小基板4側の大
きさが90mm×145mmのものを使用しても同様に、ムラ無
く、気泡残りの無い素子を得る事ができた。
As shown in FIG. 3, the dams 2 and 2 were formed from the edge of the small substrate to the edge of the large substrate in the same manner as in Example 1. As a result of this example, the injection speed was slightly higher than in Example 2, the injection was completed, and a uniform panel could be obtained. Also, the size of the substrate is not limited to the above, and the size of the large substrate 3 side is 100 mm × 150 mm and the size of the small substrate 4 side is 90 mm × 145 mm. An element having no bubbles and no air bubbles was able to be obtained.

【0059】(実施例4) 実施例1と同様に、シールパターンを図4の様に四隅に
シール無しとし、さらに、それぞれ短辺側にシール開口
部を1カ所ずつ設け、堰部も図4の様に設け、実施例1
と同様な作製を行った。空セルは、実施例1と同様、具
体的に、図4のように大小、大きさの異なる基板1枚ず
つを対向させて形成した。
(Example 4) As in Example 1, the seal pattern has no seals at the four corners as shown in FIG. 4, and further, one seal opening is provided on each short side, and the weir is also shown in FIG. Example 1
The same production was performed. As in Example 1, the empty cells were formed specifically by facing substrates having different sizes and sizes one by one as shown in FIG.

【0060】大基板3側の大きさは、59mm×70mmよりな
り、小基板4側の大きさは、49mm×65mmのものを使用し
た。小基板4の短軸側基板端4bより1.5mmで、長軸側
基板端4aから0.5mmの位置から長軸方向のシール部1
aを形成した。短軸側のシール1b,1cも同様に、小
基板4の長軸側基板端4aより1.5mmで、短軸側基板端
4b、4cから0.5mmの位置から短軸方向のシール部1
b,1cを形成した。短軸シール1b,1cの中央にお
いて、1mmの開口部11を図4のように設けた。シール
幅は0.4mmとした。このシール材を形成した基板を90
℃で10分加熱し、続いて、基板同士を貼り合わせ、真
空パック機により押さえつけた後、150℃で2時間加熱
した。これによって、空セルを得た。
The size on the large substrate 3 side was 59 mm × 70 mm, and the size on the small substrate 4 side was 49 mm × 65 mm. From the position of 1.5 mm from the short-side substrate end 4 b of the small substrate 4 and 0.5 mm from the long-axis substrate end 4 a, the sealing portion 1 in the long-axis direction
a was formed. Similarly, the short-axis-side seals 1b and 1c are 1.5 mm from the long-axis substrate end 4a of the small substrate 4 and 0.5 mm from the short-axis substrate ends 4b and 4c.
b, 1c were formed. At the center of the short shaft seals 1b and 1c, a 1 mm opening 11 was provided as shown in FIG. The seal width was 0.4 mm. The substrate on which the sealing material is formed is 90
After heating at 10 ° C. for 10 minutes, the substrates were stuck together and pressed by a vacuum packing machine, and then heated at 150 ° C. for 2 hours. Thus, an empty cell was obtained.

【0061】堰部2、2も実施例1と同様に形成した。
実施例1と同様の注入方法により、高分子分散型液晶を
作製した。その結果、実施例3よりも更に、注入速度が
速く注入が完了し、均一なパネルを得る事ができた。
The dams 2 and 2 were formed in the same manner as in Example 1.
By the same injection method as in Example 1, a polymer-dispersed liquid crystal was produced. As a result, the injection speed was higher than in Example 3, and the injection was completed, whereby a uniform panel could be obtained.

【0062】(実施例5) 実施例4と同様に、シールパターンを図5の様に四隅に
シール無しとし、短軸側1b,1cにそれぞれシール開
口部11、11、11を3カ所ずつ1mm開口させて設
け、堰部2、2も図5の様に設け、実施例1と同様に作
製した。
(Example 5) As in Example 4, the seal pattern has no seals at the four corners as shown in FIG. 5, and three seal openings 11, 11 and 11 are provided on the short-axis sides 1b and 1c at 1 mm each. The dams 2 and 2 were also provided as shown in FIG.

【0063】この実施例の結果、実施例4よりも更に、
注入速度が速く注入が完了し、均一なパネルを得る事が
できた。また基板大きさも実施例1の場合と同様に、上
記に限るものではなく、大基板側の大きさが300mm×350
mmよりなり、小基板側の大きさが290mm×345mmのものを
使用しても同様に、ムラ無く、気泡残りの無い素子を得
る事ができた。
As a result of this embodiment, the embodiment 4
The injection speed was high, the injection was completed, and a uniform panel could be obtained. Also, the size of the substrate is not limited to the above as in the case of the first embodiment, and the size on the large substrate side is 300 mm × 350 mm.
In the same manner, even when a small substrate having a size of 290 mm × 345 mm on the small substrate side was used, it was possible to obtain an element without unevenness and without bubbles.

【0064】(実施例6) 実施例5に対し、短軸と長軸を反対にした条件、図6の
様にシールパターンを長軸側1a,1aにそれぞれシ−
ル開口部11、11、11を3カ所ずつ1mm開口させて
設け、堰部2、2も長軸(辺)の両端に短辺の端縁を延
ばした線に沿う状態で同様に設け、実施例5と同様な作
製を行った。
(Embodiment 6) In contrast to Embodiment 5, the condition that the short axis and the long axis are reversed, as shown in FIG. 6, the seal patterns are sealed on the long axis sides 1a and 1a, respectively.
The openings 11, 11, 11 are provided in three places with openings of 1 mm, and the weirs 2, 2 are also provided at both ends of the long axis (side) along the line extending the short side edge in the same manner. The same fabrication as in Example 5 was performed.

【0065】この実施例の結果、実施例5よりも更に、
注入速度が速く注入が完了し、均一なパネルを得る事が
できた。また、基板大きさも実施例1記載の様に、上記
に限るものではなく、大基板3側の大きさが300mm×350
mmよりなり、小基板4側の大きさが290mm×345mmのもの
を使用しても同様に、実施例5よりも速く注入が完了
し、ムラ無く、気泡残りの無い素子を得る事ができた。
As a result of this embodiment, the fifth embodiment is more improved than the fifth embodiment.
The injection speed was high, the injection was completed, and a uniform panel could be obtained. The size of the substrate is not limited to the above as described in the first embodiment, and the size of the large substrate 3 is 300 mm × 350 mm.
In the same manner, even when a substrate having a size of 290 mm × 345 mm on the small substrate 4 side was used, the injection was completed faster than in Example 5, and an element having no unevenness and having no remaining bubbles could be obtained. .

【0066】(実施例7) シールパターンを図7の様にし、堰部2、2も図7のよ
うに設け、実施例5と同様な作製を行った。その結果、
実施例6と同程度の注入速度で注入ができ、均一なパネ
ルを得る事ができた。また、シール部1a,1b,1c
もムラなく作製することができた。実施例6と同様、大
基板側の大きさが300mm×350mmよりなり、小基板側の大
きさが290mm×345mmのものを使用しても同様に、実施例
6と同程度に速く注入が完了し、ムラ無く、気泡残りの
無い素子を得る事ができた。
(Example 7) A seal pattern was provided as shown in FIG. 7, and dams 2 and 2 were also provided as shown in FIG. as a result,
Injection was possible at the same injection speed as in Example 6, and a uniform panel was obtained. Further, the sealing portions 1a, 1b, 1c
Was also able to be manufactured without unevenness. As in the case of the sixth embodiment, the injection is completed as quickly as in the sixth embodiment in the same manner as in the sixth embodiment even when the size of the large substrate is 300 mm × 350 mm and the size of the small substrate is 290 mm × 345 mm. In addition, an element having no unevenness and having no remaining bubbles could be obtained.

【0067】(実施例8) 実施例1における堰部2、2の位置を注入側小基板4端
から7mm離れた位置において長軸と垂直方向に図8の様
に小基板端4bから大基板端3aに延ばして設けた。注
入方法も、実施例1と異なり、組成物溜7に対し、組成
物6液面が堰部2、2より下の位置となるように空セル
10を設置する事によって行った。この時、空セル10
及び、組成物溜7の組成物6の温度は25℃に保たれて
いた。その結果、実施例1と同様、ムラ無く、気泡残り
の無い均一な素子を得た。また、実施例1の時よりも、
若干速く注入が完了した。
(Embodiment 8) The position of the weir portions 2 and 2 in the embodiment 1 is set at a position 7 mm away from the end of the injection-side small substrate 4 and perpendicular to the long axis from the small substrate end 4b as shown in FIG. It was provided to extend to the end 3a. The injection method was also different from that in Example 1 in that the empty cell 10 was placed in the composition reservoir 7 such that the liquid level of the composition 6 was below the weirs 2 and 2. At this time, empty cell 10
The temperature of the composition 6 in the composition reservoir 7 was kept at 25 ° C. As a result, as in Example 1, a uniform element without unevenness and without bubbles was obtained. Also, as compared with the first embodiment,
The injection was completed slightly faster.

【0068】(実施例9) 実施例8と同様に、実施例2における堰部2、2の位置
を注入側小基板端4aから7mm離れた位置において長軸
と垂直方向に図9の様に小基板端4aから大基板端3a
に延ばして設けた。注入方法も同様に、実施例2と異な
り、組成物溜7に対し、組成物液面が堰部2、2より下
の位置となるように空セル10を設置する事によって行
った。この時、空セル10及び、組成物溜7の組成物6
の温度は25℃に保たれていた。この実施例の結果、実
施例2と同様、ムラ無く、気泡残りの無い均一な素子を
得た。また、実施例2の時よりも、若干速く注入が完了
した。
(Embodiment 9) As in Embodiment 8, the position of the weirs 2 and 2 in Embodiment 2 is perpendicular to the long axis at a position 7 mm away from the injection-side small substrate end 4a as shown in FIG. Small board edge 4a to large board edge 3a
And extended. Similarly, the injection method was different from that in Example 2 in that the empty cell 10 was placed in the composition reservoir 7 so that the liquid level of the composition was lower than the weirs 2 and 2. At this time, the empty cell 10 and the composition 6 in the composition reservoir 7
Was kept at 25 ° C. As a result of this example, as in Example 2, a uniform element without unevenness and without air bubbles was obtained. The injection was completed slightly faster than in Example 2.

【0069】(実施例10) 実施例8と同様に、実施例3における堰部2、2の位置
を注入側小基板端4bから7mm離れた位置において長軸
と垂直方向に図10の様に小基板端から大基板端に設け
た。注入方法も実施例8または9と同様に、実施例3と
異なり、組成物溜7に対し、組成物液面が堰部2,2よ
り下の位置となるように空セル10を設置する事によっ
て行った。この時、空セル10及び組成物溜7の組成物
の温度は25℃に保たれていた。本実施例の結果、実施
例3と同様、ムラ無く、気泡残りの無い均一な素子を得
た。また、実施例3の時よりも、若干速く注入が完了し
た。
(Embodiment 10) As in Embodiment 8, the position of the weir portions 2 and 2 in Embodiment 3 is perpendicular to the long axis at a position 7 mm away from the injection-side small substrate end 4b as shown in FIG. It was provided from the edge of the small substrate to the edge of the large substrate. The injection method is different from that of Example 3 in the same manner as in Example 8 or 9, and the empty cell 10 is set in the composition reservoir 7 so that the liquid level of the composition is lower than the weirs 2 and 2. Made by. At this time, the temperature of the composition in the empty cell 10 and the composition reservoir 7 was kept at 25 ° C. As a result of this example, a uniform element without unevenness and without bubbles was obtained as in Example 3. In addition, the injection was completed slightly faster than in Example 3.

【0070】(実施例11) 実施例8と同様に、実施例4における堰部2、2の位置
を注入側小基板端4bから7mm離れた位置において長軸
と垂直方向に図11の様に小基板端4aから大基板端3
aに延ばして設けた。注入方法も実施例8または9また
は10と同様に、実施例4と異なり、組成物溜7に対
し、組成物液面が堰部2、2より下の位置となるように
空セル10を設置する事によって行った。この時、空セ
ル10及び、組成物溜7の組成物6の温度は25℃に保
たれていた。本実施例の結果、実施例4と同様、ムラ無
く、気泡残りの無い均一な素子を得た。また、実施例4
の時よりも、若干速く注入が完了した。
(Embodiment 11) As in Embodiment 8, the position of the weir portions 2 and 2 in Embodiment 4 is perpendicular to the long axis at a position 7 mm away from the injection-side small substrate end 4b as shown in FIG. Small board edge 4a to large board edge 3
a. The injection method is different from that of Example 4 in the same manner as in Example 8 or 9 or 10, and the empty cell 10 is set in the composition reservoir 7 so that the liquid level of the composition is lower than the weirs 2 and 2. I went by doing. At this time, the temperature of the empty cell 10 and the composition 6 in the composition reservoir 7 was kept at 25 ° C. As a result of the present example, a uniform element without unevenness and without bubbles was obtained as in Example 4. Example 4
The injection was completed slightly faster than at the time.

【0071】(実施例12) 実施例8と同様に、実施例5における堰部2、2の位置
を注入側小基板端4bから7mm離れた位置において長軸
と垂直方向に図12の様に小基板端4aから大基板端3
aに延ばして設けた。注入方法も実施例8または9また
は10または11と同様に、実施例5と異なり、組成物
溜に対し、組成物液面が堰部2、2より下の位置となる
ように空セル10を設置する事によって行った。この
時、空セル10及び、組成物溜7の組成物6の温度は2
5℃に保たれていた。本実施例の結果、実施例5と同
様、ムラ無く、気泡残りの無い均一な素子を得た。ま
た、実施例5の時よりも、若干速く注入が完了した。そ
して堰部2を設けなくても、図12に示すようなシール
パターンを有し、実施例12に示すような注入方法によ
れば、同様な均一な素子を得ることが可能であることを
確認できた。
(Embodiment 12) As in Embodiment 8, the position of the weirs 2 and 2 in Embodiment 5 is perpendicular to the long axis at a position 7 mm away from the injection-side small substrate end 4b as shown in FIG. Small board edge 4a to large board edge 3
a. The injection method is also the same as in Example 8 or 9 or 10 or 11, and unlike Example 5, the empty cell 10 is placed in the composition reservoir such that the liquid level of the composition is below the weirs 2 and 2. It was done by installing. At this time, the temperature of the empty cell 10 and the composition 6 in the composition reservoir 7 is 2
It was kept at 5 ° C. As a result of this example, a uniform element without unevenness and without bubbles was obtained as in Example 5. Also, the injection was completed slightly faster than in Example 5. Even without providing the dam portion 2, it was confirmed that a similar uniform element could be obtained by the injection method as shown in Example 12 having the seal pattern as shown in FIG. did it.

【0072】(実施例13) 実施例6における堰部2、2の位置を注入側小基板端4
bから10mm離れた位置において短軸と垂直方向に図13
の様に小基板端4aから大基板端3aに延ばして設け
た。注入方法も、実施例6と異なり、組成物溜6に対
し、組成物液面が堰部2、2より下の位置となるように
空セル10を設置する事によって行った。この時、空セ
ル10及び、組成物溜7の組成物6の温度は25℃に保
たれていた。本実施例の結果、実施例6と同様、ムラ無
く、気泡残りの無い均一な素子を得た。また、実施例6
の時よりも、若干速く注入が完了した。
(Embodiment 13) The positions of the dams 2 and 2 in the embodiment 6 are changed to the injection-side small substrate end 4.
13 at a position 10 mm away from b.
And extended from the small substrate end 4a to the large substrate end 3a. The injection method was also different from that in Example 6 in that the empty cell 10 was placed in the composition reservoir 6 such that the liquid level of the composition was below the weirs 2 and 2. At this time, the temperature of the empty cell 10 and the composition 6 in the composition reservoir 7 was kept at 25 ° C. As a result of this example, a uniform element without unevenness and without bubbles was obtained as in Example 6. Example 6
The injection was completed slightly faster than at the time.

【0073】(実施例14) 実施例1における堰部2、2の位置を図14の様に対角
方向に小基板端4aから大基板端3aに延ばして設け
た。注入方法も、堰部の無い1角を組成物溜7に漬け、
組成物液面は注入側角において、小基板角が3mm液面下
に有るように空セル10を設置する事によって行った。
この時、空セル10及び、組成物溜7の組成物6の温度
は25℃に保たれていた。その結果、実施例1と同様、
ムラ無く、気泡残りの無い均一な素子を得た。
Example 14 The positions of the dams 2 and 2 in Example 1 were provided diagonally from the small substrate end 4a to the large substrate end 3a as shown in FIG. As for the injection method, one corner without a weir is immersed in the composition reservoir 7,
The liquid level of the composition was determined by placing the empty cell 10 so that the small substrate angle was 3 mm below the liquid level at the injection side angle.
At this time, the temperature of the empty cell 10 and the composition 6 in the composition reservoir 7 was kept at 25 ° C. As a result, similar to the first embodiment,
A uniform element without unevenness and without bubbles was obtained.

【0074】(実施例15) 実施例2における堰部2、2の位置を図15の様に対角
方向に小基板端の角から大基板端3a,3aに延ばして
設けた。注入方法も、堰部2、2の無い1角を組成物溜
7に漬け、組成物液面は注入側角において、小基板角が
3mm液面下に有るように空セル10を設置する事によっ
て行った。この時、空セル10及び、組成物溜7の組成
物6の温度は25℃に保たれていた。本実施例の結果、
実施例2と同様、ムラ無く、気泡残りの無い均一な素子
を得た。
(Embodiment 15) The positions of the weir portions 2 and 2 in Embodiment 2 are provided diagonally from the corners of the small substrate ends to the large substrate ends 3a and 3a as shown in FIG. As for the injection method, one corner without the weirs 2 and 2 is immersed in the composition reservoir 7, and the liquid surface of the composition has a small substrate angle at the injection side corner.
This was performed by setting the empty cell 10 so as to be below the liquid level of 3 mm. At this time, the temperature of the empty cell 10 and the composition 6 in the composition reservoir 7 was kept at 25 ° C. As a result of this example,
In the same manner as in Example 2, a uniform element without unevenness and without bubbles was obtained.

【0075】(実施例16) 実施例3における堰部2、の2位置を図16の様に対角
方向に小基板端4aから大基板端3aにのばして設け
た。注入方法も、堰部2、2の無い1角を組成物溜7に
漬け、組成物液面は注入側角において、小基板角が3mm
液面下に有るように空セル10を設置する事によって行
った。この時、空セル及び、組成物溜7の組成物6の温
度は25℃に保たれていた。本実施例の結果、実施例3
と同様、ムラ無く、気泡残りの無い均一な素子を得た。
(Example 16) The two positions of the weir portions 2 in Example 3 were provided diagonally from the small substrate end 4a to the large substrate end 3a as shown in FIG. The pouring method is also such that one corner without the weirs 2 and 2 is immersed in the composition reservoir 7, and the liquid surface of the composition is at the pouring side angle and the small substrate angle is 3 mm.
This was performed by placing an empty cell 10 below the liquid level. At this time, the temperature of the empty cell and the composition 6 in the composition reservoir 7 was kept at 25 ° C. As a result of this example, Example 3
In the same manner as in the above, a uniform element having no unevenness and no air bubbles was obtained.

【0076】(実施例17) 実施例1における堰部2、2の位置を図17の様に変え
た。注入側と反対側の長軸シール端より2mm下の位置に
対し、垂直方向に、小基板端4aから大基板端3aに延
ばして堰部2、2を設けた。空セルは、実施例1と同
様、具体的に、図4のように大小、大きさの異なる基板
1枚ずつを対向させて形成した。注入方法も、最初、小
基板下端(注入側(A))4bより2mm上に組成物液面
があり、セル内進行の組成物高さが小基板下端(注入
側)4bより4mmの位置に来たところで、組成物溜7の
液面と進行組成高さの距離が2mmの間隔を保つように、
赤外線センサー8により、空セルの組成物溜7に漬ける
深さを制御した。この時、空セルの電極端子部は、マス
キングテープ(N-380)(日東電工(株)製)により保護し
た。また、パネル10及び、組成物溜7の組成物の温度
は25℃に保った。結果、実施例1と同様、ムラ無く、
気泡残りの無い均一な素子を得た。注入も、一定速度
で、注入方向に均一に入った。輝度計で測定してもほと
んどムラは検値されなかった。また、電極端子部の保護
は上に示したものに限らず、マスキングテープ スコッ
チ202(住友スリーエム(株)製)を用いても、スト
リップマスク #503□ーSH((株)アサヒ化学研究所
製)を用いても、同様の結果となり良かった。
Example 17 The positions of the dams 2 and 2 in Example 1 were changed as shown in FIG. Weir portions 2 and 2 were provided extending from the small substrate end 4a to the large substrate end 3a in the vertical direction at a position 2 mm below the long axis seal end on the side opposite to the injection side. As in Example 1, the empty cells were formed specifically by facing substrates having different sizes and sizes one by one as shown in FIG. In the injection method, the liquid level of the composition is initially 2 mm above the lower end of the small substrate (injection side (A)) 4b, and the height of the composition in the cell is 4 mm from the lower end of the small substrate (injection side) 4b. When it came, the distance between the liquid surface of the composition reservoir 7 and the height of the proceeding composition was maintained at an interval of 2 mm,
The depth of the empty cell immersed in the composition reservoir 7 was controlled by the infrared sensor 8. At this time, the electrode terminals of the empty cells were protected by masking tape (N-380) (manufactured by Nitto Denko Corporation). The temperature of the panel 10 and the composition in the composition reservoir 7 were kept at 25 ° C. As a result, as in Example 1, there was no unevenness.
A uniform element free of air bubbles was obtained. The injection also entered the injection direction uniformly at a constant rate. Almost no unevenness was detected even when measured with a luminance meter. In addition, the protection of the electrode terminal portion is not limited to the above, and a mask 503-SH (manufactured by Asahi Chemical Laboratory Co., Ltd.) can be used even by using a masking tape Scotch 202 (manufactured by Sumitomo 3M Limited). ) Was used, and the same result was obtained.

【0077】(実施例18) 実施例2〜5に関しても、実施例17と同様に変えて検
討した結果、同様な結果を得た。ムラ無く、気泡残りの
無い均一な素子を得た。特に、実施例5に対する本検討
では、基板大きさも実施例1記載の様に、上記に限るも
のではなく、大基板側の大きさが300mm×350mmよりな
り、小基板側の大きさが290mm×345mmのものを使用して
も同様に、注入が完了し、ムラ無く、気泡残りの無い素
子を得る事ができた。
(Embodiment 18) As for Embodiments 2 to 5, the same results were obtained as a result of a study conducted in the same manner as in Embodiment 17. A uniform element without unevenness and without bubbles was obtained. In particular, in the present study for the fifth embodiment, the substrate size is not limited to the above as described in the first embodiment. The size on the large substrate side is 300 mm × 350 mm, and the size on the small substrate side is 290 mm × Injection was completed in the same manner using a 345 mm device, and an element without unevenness and without bubbles was obtained.

【0078】(実施例19) 実施例6に対し、実施例17と同様に図18のように注
入した。その結果、ムラ無く、気泡残りの無い均一な素
子を得た。また、この場合も、大基板側の大きさが300m
m×350mmよりなり、小基板側の大きさが290mm×345mmの
ものを使用しても同様に、注入が完了し、ムラ無く、気
泡残りの無い素子を得る事ができた。
(Example 19) Injection was applied to Example 6, as in Example 17, as shown in FIG. As a result, a uniform element having no unevenness and having no remaining bubbles was obtained. Also in this case, the size on the large substrate side is 300m.
In the same manner, even when a device having a size of mx 350 mm and a size of the small substrate side of 290 mm 345 mm was used, the injection was completed, and an element having no unevenness and having no remaining bubbles could be obtained.

【0079】(実施例20) 基板表面に対し、形状記憶効果を有する熱可塑性ポリマ
ーを用いる。熱可塑性ポリマーとしては今回、特開平2
−116102号公報に提案されているポリウレタンを
使用する。このウレタン系ポリマーの構造式の一例を下
記式(化1)に示す。
Example 20 A thermoplastic polymer having a shape memory effect is used on the surface of a substrate. This time, as a thermoplastic polymer,
The polyurethane proposed in JP-A-116102 is used. An example of the structural formula of the urethane polymer is shown in the following formula (Formula 1).

【化1】 ポリウレタンは部分結晶化されており、ガラス転移点
(Tg)以上になると分子鎖のミクロブラウン運動によ
りゴム弾性状態になる。この状態で外力を受けた場合、
分子鎖は外力の方向に容易に配向し、形状も変化する。
この状態でTg以下の温度に冷却した場合、分子鎖のミ
クロブラウン運動が凍結されてプラスチック状態とな
り、変形が固定され、形状が記憶されることになる。そ
の後、Tg以上の再加熱により分子鎖のミクロブラウン
運動が開始され、分子鎖の配向は解かれ、元の形に復元
する事になる。上記機能を有するポリウレタンを塗膜形
成し、ラビングを施す。ラビングにより外力を受け、ラ
ビング方向に分子鎖が一軸延伸される。次に、ポリウレ
タンのTg以上の温度に基板を再加熱することにより、
ポリウレタンの分子鎖の配向が解かれ、ポリウレタンは
非延伸状態になる。これによって、液晶分子の配向を容
易に制御できる。実施例1〜19に示されている大小基
板は次のものを用いた。固形分濃度6重量%のポリウレ
タン溶液(例えば、MS5500(Tg点:55℃):三菱重工業
(株)製)を凸版印刷により大小両基板の電極面側に転
写し、80℃で1時間焼成してポリウレタン層(配向膜)
を形成した。ポリウレタン層の膜厚80nm程度であった。
次に、ポリウレタン層表面をレーヨンクロスにより、組
成物の注入進行方向(1方向)にラビングした。これに
よって得られた基板を使用した。高分子分散型液晶の作
製も、実施例1〜19とは異なり、以下のように行っ
た。また、注入時間は大変速く、実施例1〜19に対
し、それぞれ、1/3注入時間を短縮することができ
た。注入後、パネル周辺を高分子樹脂で封口する。今
回、素子内には紫外線があたらないようにマスクをし、
UV樹脂をパネル周辺に施し、組成物を封口した。(例
えば、ロックタイト352A(日本ロックタイト(株)製)をU
V(350nm)55mW/cm2,90秒照射により硬化する。)その
後、マスクをした状態で、パネルを60℃,1時間加熱し
た。一度ラビングによりポリウレタン配向膜に付与され
た一軸延伸効果がTg以上の加熱により完全に失われ、
非延伸状態となるように変化した。また、60℃,1時間加
熱する事によって、一部に残っていたパネル内ムラが完
全に解消された。続いて、25℃にまで毎秒15℃の速度
で冷却した。パネル温度25℃になった後、マスクをはず
して、紫外線照射して高分子分散型液晶を得た。その結
果、ムラ無く、気泡残りの無い均一な素子を得た。ま
た、注入速度も速く、電圧保持特性も実施例1〜19に
示される素子よりも良いものを得ることができた。
Embedded image Polyurethane is partially crystallized, and when it exceeds the glass transition point (Tg), becomes a rubber elastic state due to micro Brownian motion of molecular chains. If external force is applied in this state,
The molecular chains are easily oriented in the direction of the external force, and the shape changes.
When cooled to a temperature of Tg or less in this state, the micro-brown motion of the molecular chains is frozen and becomes a plastic state, the deformation is fixed, and the shape is memorized. After that, the re-heating of Tg or more starts micro-Brownian motion of the molecular chain, the orientation of the molecular chain is released, and the original shape is restored. A polyurethane film having the above function is formed as a coating film and rubbed. An external force is applied by rubbing, and the molecular chain is uniaxially stretched in the rubbing direction. Next, by reheating the substrate to a temperature equal to or higher than the Tg of the polyurethane,
The orientation of the molecular chains of the polyurethane is released, and the polyurethane is in a non-stretched state. Thereby, the alignment of the liquid crystal molecules can be easily controlled. The following large and small substrates shown in Examples 1 to 19 were used. A polyurethane solution having a solid content of 6% by weight (for example, MS5500 (Tg point: 55 ° C.): manufactured by Mitsubishi Heavy Industries, Ltd.) is transferred to the electrode surfaces of both large and small substrates by letterpress printing and baked at 80 ° C. for 1 hour. Polyurethane layer (alignment film)
Was formed. The thickness of the polyurethane layer was about 80 nm.
Next, the surface of the polyurethane layer was rubbed with a rayon cloth in the direction in which the composition was injected (one direction). The substrate thus obtained was used. The production of the polymer-dispersed liquid crystal was also performed in the following manner, different from Examples 1 to 19. Further, the injection time was very fast, and the injection time was reduced by 1/3 compared to Examples 1 to 19, respectively. After the injection, the periphery of the panel is sealed with a polymer resin. This time, we masked the device so that it would not be exposed to ultraviolet light,
UV resin was applied around the panel to seal the composition. (For example, Loctite 352A (Nippon Loctite Co., Ltd.)
V (350 nm) 55 mW / cm 2 , cured by irradiation for 90 seconds. Then, the panel was heated at 60 ° C. for 1 hour with the mask applied. The uniaxial stretching effect given to the polyurethane alignment film by rubbing once is completely lost by heating above Tg,
It changed so that it might be in a non-stretched state. Further, by heating at 60 ° C. for 1 hour, the unevenness in the panel which remained in part was completely eliminated. Subsequently, it was cooled at a rate of 15 ° C./sec to 25 ° C. After the panel temperature reached 25 ° C., the mask was removed, and ultraviolet irradiation was performed to obtain a polymer-dispersed liquid crystal. As a result, a uniform element having no unevenness and having no remaining bubbles was obtained. In addition, the injection speed was high, and a device having better voltage holding characteristics than the devices shown in Examples 1 to 19 could be obtained.

【0080】(実施例21) 実施例20のポリウレタン溶液をTg点が素子の使用環
境温度付近のものを使用する(例えば、MS3500
(Tg点:35℃):三菱重工業(株)製)。実施例2
0と同様に行い、実施例20におけるラビング効果を喪
失させる60℃加熱を40℃加熱とした。他は同条件と
して、高分子分散型液晶の素子を得た。結果、同様に、
ムラ無く、気泡残りの無い均一な素子を得た。また、注
入速度も速く、電圧保持特性も良く、駆動電圧も低いも
のを得る事ができた。
(Example 21) The polyurethane solution of Example 20 having a Tg point near the use environment temperature of the device was used (for example, MS3500).
(Tg point: 35 ° C.): manufactured by Mitsubishi Heavy Industries, Ltd.). Example 2
The heating was performed in the same manner as in Example 0, and the heating at 60 ° C. for losing the rubbing effect in Example 20 was performed at 40 ° C. The other conditions were the same and a polymer dispersed liquid crystal device was obtained. As a result,
A uniform element without unevenness and without bubbles was obtained. In addition, the injection speed was high, the voltage holding characteristics were good, and the driving voltage was low.

【0081】(実施例22) 実施例1〜21における組成物を以下のように変えた。
モノマーとして2-エチルヘキシルアクリレート(ナカラ
イテスク(株)製)3.0wt%、2-ヒドロキシエチル
アクリレート(ナカライテスク(株)製)9.0wt
%、ネオペンチルグリコールジアクリレートである KAY
ARAD MANDA(日本化薬(株)製)2.48wt%、オリ
ゴマーとしてEO変性ビスフェノールAジアクリレート
であるKAYARAD R-551(日本化薬(株)製)5.36w
t%、光硬化開始剤としてベンジルジメチルケタールで
あるイルガキュア 651(日本チバガイギー(株)製)
0.16wt%から成る光重合性材料と、液晶として塩
素系液晶TL205[N-I point=87℃, ne=1.744,no=
1.527](メルク・ジャパン(株)製)80.0wt%を
混合して組成物とした。その結果、実施例1〜21と同
様に、ムラ無く、気泡残りの無い均一な素子を得た。
Example 22 The compositions in Examples 1 to 21 were changed as follows.
3.0 wt% of 2-ethylhexyl acrylate (manufactured by Nacalai Tesque, Inc.) and 9.0 wt. Of 2-hydroxyethyl acrylate (manufactured by Nacalai Tesque, Inc.) as monomers
%, Neopentyl glycol diacrylate KAY
ARAD MANDA (manufactured by Nippon Kayaku Co., Ltd.) 2.48 wt%, KAYARAD R-551 (manufactured by Nippon Kayaku Co., Ltd.) 5.36 w which is an EO-modified bisphenol A diacrylate as an oligomer
tg, Irgacure 651 which is benzyl dimethyl ketal as a photo-curing initiator (manufactured by Nippon Ciba Geigy Co., Ltd.)
0.16 wt% of a photopolymerizable material and a chlorine-based liquid crystal TL205 [NI point = 87 ° C., ne = 1.744, no =
1.527] (Merck Japan K.K.) to obtain a composition. As a result, as in Examples 1 to 21, a uniform element without unevenness and without bubbles was obtained.

【0082】(実施例23) 実施例22における組成物を以下のように変えた。プレ
ポリマー材料として2-エチルヘキシルアクリレート(ナ
カライテスク(株)製)17.55wt%、アクリル酸
4−ヒドロキシブチルであるアクリエステル4HBA
(三菱レイヨン(株)製)0.44wt%、メタクリル
酸2−サクシノロイルオキシエチルであるアクリエステ
ルSA(三菱レイヨン(株)製)0.20wt%,KAYAR
AD TPGDA(日本化薬(株)製)1.11wt%、光硬化
開始剤として2ーヒドロキシー2−メチル−1−フェニ
ルプロパン−1−オンであるダロキュア−1173(メルク
社製)0.20wt%から成る光重合性材料と、液晶と
してTL205[N-I point=87℃, ne=1.744,no=1.52
7](メルク・ジャパン(株)製)80.5wt%を混合
して組成物とした。この結果、実施例22と同様にムラ
無く、気泡残りの無い均一な素子を得た。
Example 23 The composition in Example 22 was changed as follows. 17.55 wt% of 2-ethylhexyl acrylate (manufactured by Nacalai Tesque, Inc.) as a prepolymer material, and an acrylic ester 4HBA which is 4-hydroxybutyl acrylate
0.44 wt% (manufactured by Mitsubishi Rayon Co., Ltd.), 0.20 wt% of acrylate ester SA (manufactured by Mitsubishi Rayon Co., Ltd.) which is 2-succinoloyloxyethyl methacrylate
AD TPGDA (manufactured by Nippon Kayaku Co., Ltd.) from 1.11 wt%, and 0.20 wt% of Darocure-1173 (manufactured by Merck) which is 2-hydroxy-2-methyl-1-phenylpropan-1-one as a photocuring initiator. TL205 [NI point = 87 ° C., ne = 1.744, no = 1.52]
7] (Merck Japan K.K.) 80.5 wt% was mixed to obtain a composition. As a result, as in Example 22, a uniform device without unevenness and with no remaining bubbles was obtained.

【0083】なお、以上に示される実施例1〜23にお
ける組成物等材料はこれに限定されるものではなく、他
の材料でも多く実施されるものである。実施例1〜23
において紫外線強度は示している強度のみに限定される
ものではなく、3〜160mW/cm2において、本発明の特徴を
有するものが得られることが確認できた。また、素子の
セル厚は13.0μmに限定されるものではない。また、以
上の実施例では、高分子分散型液晶の場合を示している
が、高分子分散型液晶に限定されるものではなく、他の
液晶表示素子及びその製造に関しても応用でき、ムラの
無い均一な液晶表示素子を得ることができる。
The materials such as the compositions in Examples 1 to 23 shown above are not limited to those described above, and many other materials can be used. Examples 1 to 23
It was confirmed that the ultraviolet light intensity was not limited to the indicated intensity, and that the characteristic of the present invention could be obtained at 3 to 160 mW / cm 2 . Further, the cell thickness of the device is not limited to 13.0 μm. Further, in the above embodiments, the case of the polymer-dispersed liquid crystal is shown. However, the present invention is not limited to the polymer-dispersed liquid crystal, and can be applied to other liquid crystal display elements and the production thereof, so that there is no unevenness. A uniform liquid crystal display element can be obtained.

【0084】[0084]

【発明の効果】本発明の液晶表示素子及びその製造方法
によれば、常圧においても、組成物等の材料を気泡混入
や注入ムラが無く簡単にパネルに注入でき、均一なパネ
ルの供給が可能である。また今までのような減圧操作等
圧力変動を利用しない為、組成物への影響もなく、注入
ができる。特に、高分子分散型液晶のような、組成物と
して、少なくとも、液晶材料と高分子樹脂材料の混合物
を注入する場合、モノマーの揮発等の問題より、圧力変
動による作製が難しく、気泡混入や注入ムラが起き易か
ったが、本発明の製造方法により、この問題を解消する
事ができる。また、本発明の形状記憶効果を有する熱可
塑性ポリマーの使用により、組成物等の材料の注入もス
ピーディーに、問題なく行うことができる。さらに形状
記憶効果を有する熱可塑性ポリマー層が基板表面に形成
されることによって、保持率向上もはかれる。製造方法
によれば、常圧においても、組成物等の材料を気泡混入
や注入ムラが無く簡単にパネルに注入でき、均一なパネ
ルの供給が可能である。また今までのような減圧操作等
圧力変動を利用しない為、組成物への影響もなく、注入
ができる。特に、高分子分散型液晶のような、組成物と
して、少なくとも、液晶材料と高分子樹脂材料の混合物
を注入する場合、モノマーの揮発等の問題より、圧力変
動による作製が難しく、気泡混入や注入ムラが起き易か
ったが、本発明の製造方法により、この問題を解消する
事ができる。また、本発明の形状記憶効果を有する熱可
塑性ポリマーの使用により、組成物等の材料の注入もス
ピーディーに、問題なく行うことができる。さらに形状
記憶効果を有する熱可塑性ポリマー層が基板表面に形成
されることによって、保持率向上もはかれる。
According to the liquid crystal display device and the method of manufacturing the same of the present invention, even at normal pressure, a material such as a composition can be easily injected into a panel without air bubbles and uneven injection, and uniform panel supply can be achieved. It is possible. In addition, since pressure fluctuation such as pressure reduction operation as in the past is not used, injection can be performed without affecting the composition. In particular, when injecting at least a mixture of a liquid crystal material and a polymer resin material as a composition, such as a polymer-dispersed liquid crystal, it is difficult to produce the composition by pressure fluctuation due to problems such as volatilization of the monomer. Although unevenness was likely to occur, this problem can be solved by the manufacturing method of the present invention. Further, by using the thermoplastic polymer having a shape memory effect of the present invention, the injection of the material such as the composition can be performed speedily and without any problem. More shape
By forming a thermoplastic polymer layer having a memory effect on the substrate surface, the retention can be improved. According to the manufacturing method, even at normal pressure, a material such as a composition can be easily injected into a panel without bubbles and uneven injection, and a uniform panel can be supplied. In addition, since pressure fluctuation such as pressure reduction operation as in the past is not used, injection can be performed without affecting the composition. In particular, when injecting at least a mixture of a liquid crystal material and a polymer resin material as a composition, such as a polymer-dispersed liquid crystal, it is difficult to produce the composition by pressure fluctuation due to problems such as volatilization of the monomer. Although unevenness was likely to occur, this problem can be solved by the manufacturing method of the present invention. Further, by using the thermoplastic polymer having a shape memory effect of the present invention, the injection of the material such as the composition can be performed speedily and without any problem. More shape
By forming a thermoplastic polymer layer having a memory effect on the substrate surface, the retention can be improved.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の表示素子の第1の実施例の組成物注入
前の空セルを示す概略平面図である。
FIG. 1 is a schematic plan view showing an empty cell before injecting a composition according to a first embodiment of the display element of the present invention.

【図2】本発明の表示素子の第2の実施例の組成物注入
前の空セルを示す概略平面図である。
FIG. 2 is a schematic plan view showing an empty cell before injecting a composition according to a second embodiment of the display element of the present invention.

【図3】本発明の表示素子の第3の実施例の組成物注入
前の空セルを示す概略平面図である。
FIG. 3 is a schematic plan view showing an empty cell before injecting a composition according to a third embodiment of the display element of the present invention.

【図4】本発明の表示素子の第4の実施例の組成物注入
前の空セルを示す概略平面図である。
FIG. 4 is a schematic plan view showing an empty cell before injecting a composition according to a fourth embodiment of the display element of the present invention.

【図5】本発明の表示素子の第5の実施例の組成物注入
前の空セルを示す概略平面図である。
FIG. 5 is a schematic plan view showing an empty cell before injecting a composition according to a fifth embodiment of the display element of the present invention.

【図6】本発明の表示素子の第6の実施例の組成物注入
前の空セルを示す概略平面図である。
FIG. 6 is a schematic plan view showing an empty cell before injecting a composition according to a sixth embodiment of the display element of the present invention.

【図7】本発明の表示素子の第7の実施例の組成物注入
前の空セルを示す概略平面図である。
FIG. 7 is a schematic plan view showing an empty cell before injecting a composition according to a seventh embodiment of the display element of the present invention.

【図8】本発明の表示素子の製造方法の第1の実施例を
説明する組成物注入時の素子作製略図である。
FIG. 8 is a schematic view of device production at the time of injecting a composition for explaining a first embodiment of the method for producing a display device of the present invention.

【図9】本発明の表示素子の製造方法の第2の実施例を
説明する組成物注入時の素子作製略図である。
FIG. 9 is a schematic view of device production at the time of injecting a composition for explaining a second embodiment of the method for producing a display device of the present invention.

【図10】本発明の表示素子の製造方法の第3の実施例
を説明する組成物注入時の素子作製略図である。
FIG. 10 is a schematic view of device production at the time of injecting a composition for explaining a third embodiment of the method for producing a display device of the present invention.

【図11】本発明の表示素子の製造方法の第4の実施例
を説明する組成物注入時の素子作製略図である。
FIG. 11 is a schematic view of device production at the time of injecting a composition for explaining a fourth embodiment of the method for producing a display device of the present invention.

【図12】本発明の表示素子の製造方法の第5の実施例
を説明する組成物注入時の素子作製略図である。
FIG. 12 is a schematic diagram of device production at the time of injecting a composition for explaining a fifth embodiment of the method for producing a display device of the present invention.

【図13】本発明の表示素子の製造方法の第6の実施例
を説明する組成物注入時の素子作製略図である。
FIG. 13 is a schematic diagram of device production at the time of injecting a composition for explaining a sixth embodiment of the method for producing a display device of the present invention.

【図14】本発明の表示素子の製造方法の第7の実施例
を説明する組成物注入時の素子作製略図である。
FIG. 14 is a schematic diagram of device production at the time of injecting a composition for explaining a seventh embodiment of the method for producing a display device of the present invention.

【図15】本発明の表示素子の製造方法の第8の実施例
を説明する組成物注入時の素子作製略図である。
FIG. 15 is a schematic view of device production at the time of injecting a composition for explaining an eighth embodiment of the method for producing a display device of the present invention.

【図16】本発明の表示素子の製造方法の第9の実施例
を説明する組成物注入時の素子作製略図である。
FIG. 16 is a schematic diagram of device production at the time of injecting a composition for explaining a ninth embodiment of the method for producing a display device of the present invention.

【図17】本発明の表示素子の製造方法の第10の実施
例を説明する組成物注入時の素子作製略図である。
FIG. 17 is a schematic view of element production at the time of injecting a composition for explaining a tenth example of the method for producing a display element of the present invention.

【図18】本発明の表示素子の製造方法の第11の実施
例を説明する組成物注入時の素子作製略図である。
FIG. 18 is a schematic view of device production at the time of injecting a composition for explaining an eleventh embodiment of the method for producing a display device of the present invention.

【符号の説明】[Explanation of symbols]

1a,1b,1c,1d,1e,1f シール部 2 堰部(ストッパー) 3 大基板 4 小基板 5 組成物供給部 6 組成物 7 組成物溜 8 センサー 10 空セル 1a, 1b, 1c, 1d, 1e, 1f Seal part 2 Weir part (stopper) 3 Large substrate 4 Small substrate 5 Composition supply part 6 Composition 7 Composition reservoir 8 Sensor 10 Empty cell

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 平4−67124(JP,A) 特開 平4−371926(JP,A) 特開 平5−5893(JP,A) 特開 平5−11260(JP,A) 特開 平5−45662(JP,A) 特開 平5−232484(JP,A) 特開 平5−11234(JP,A) (58)調査した分野(Int.Cl.7,DB名) G02F 1/1339 505 G02F 1/1341 ────────────────────────────────────────────────── ─── Continuation of the front page (56) References JP-A-4-67124 (JP, A) JP-A-4-371926 (JP, A) JP-A-5-5893 (JP, A) JP-A-5-593 11260 (JP, A) JP-A-5-45662 (JP, A) JP-A-5-232484 (JP, A) JP-A-5-11234 (JP, A) (58) Fields investigated (Int. 7 , DB name) G02F 1/1339 505 G02F 1/1341

Claims (22)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】少なくとも一方が透明である一対の電極付
基板を、前記基板の電極側を対向させてシール材料の樹
脂材料でシール部において貼り合わせ、基板間に形成さ
れる空セル内に高分子分散液晶を存在させた液晶表示素
子であって、 前記液晶表示素子の表示面が矩形であり、前記基板の各
辺の端部に沿って形成されたシール部にシール材料のな
い2個以上の開口を設けるとともに、 前記一対の電極付基板は面積が広い大基板と狭い小基板
とからなり、前記大基板上に、前記小基板の端から前記
大基板の端まで前記小基板の高さよりも高い堰部を2か
所設け、前記2か所の堰部の間または前記2か所の堰部
より下面を高分子形成材料と液晶とを含む組成物の注入
口としたことを特徴とする液晶表示素子。
1. A pair of electrode-attached substrates, at least one of which is transparent, is bonded at a sealing portion with a resin material of a sealing material with the electrode side of the substrates facing each other, and a high cell is formed in empty cells formed between the substrates. A liquid crystal display element in which a molecule-dispersed liquid crystal is present, wherein a display surface of the liquid crystal display element is rectangular, and two or more liquid crystal elements have no seal material in a seal portion formed along an edge of each side of the substrate. And the pair of electrodes-containing substrates is composed of a large substrate having a large area and a small substrate having a small area. On the large substrate, the height of the small substrate is measured from the edge of the small substrate to the edge of the large substrate. And two lower weirs are provided, and between the two weirs or below the two weirs are inlets for a composition containing a polymer-forming material and a liquid crystal. Liquid crystal display element.
【請求項2】 前記開口が基板の4つの角部に形成され
ている請求項1記載の液晶表示素子。
2. The liquid crystal display device according to claim 1 , wherein the openings are formed at four corners of the substrate.
【請求項3】 前記シール部が注入方向に垂直な2辺に
おいて、それぞれ少なくとも、1カ所以上シール材料の
無い部分により開口が形成されている請求項1記載の
液晶表示素子。
3. The liquid crystal display device according to claim 1 , wherein an opening is formed in at least one portion where no sealing material is present at two or more sides of the sealing portion perpendicular to the injection direction.
【請求項4】 前記シール部が、点線状に樹脂で形成さ
れ、開口が形成されている請求項1または記載の液
晶表示素子。
Wherein said seal portion is formed by tree fat in dotted, the liquid crystal display device according to claim 1 or 2 opening is formed.
【請求項5】 記空セルが前記注入口の設けられてい
る辺の両端に組成物が注入側から反対側に回り込まない
ように堰部が設けられてる請求項1〜4のいずれかに
記載の液晶表示素子。
5. A method according to claim 1-4 before Kisora cells that have weir portions so as not written Ri times on the opposite side is provided from the composition across the injection side edge provided with said injection port The liquid crystal display device according to any one of the above.
【請求項6】 堰部が注入部と垂直方向の2辺に対して
注入側より上方に位置して設けられている請求項5に
載の液晶表示素子。
6. A dam injection unit and the vertical direction of the liquid crystal display device in claim 5 is provided from the injection side is located above the serial <br/> mounting against two sides.
【請求項7】 空セルの1角の開口に注入口が形成さ
れ、その1角に対して隣合う角部の2つに対し、樹脂材
料からなる堰部が設けられている請求項1〜4のいずれ
かに記載の液晶表示素子。
7. Inlet to the opening of one corner of the empty cells are formed, with respect to two of the corners adjacent to that one corner, claim weir portion consisting tree fat material is provided 1 Any of ~ 4
The liquid crystal display element of crab described.
【請求項8】 少なくとも一方が透明な一対の電極付基
板の少なくとも一方の電極側基板上にガラス転移温度
(Tg点)または軟化点が素子の使用環境温度以下の
状記憶効果を有する熱可塑性ポリマーが塗膜形成されて
いる請求項1〜4のいずれかに記載の液晶表示素子。
8. at least one of a pair of transparent glass transition temperature (Tg point) on at least one electrode side substrate of the substrate with electrode or the ambient temperature following the form of the softening point element
The liquid crystal display device according to any one of claims 1 to 4, wherein a thermoplastic polymer having a shape memory effect is coated.
【請求項9】 前記基板が前記電極付基板の少なくとも
一方の電極側基板上にガラス転移温度(Tg点)または
軟化点が素子の使用環境温度以下の形状記憶効果を有す
る熱可塑性ポリマーが塗膜形成され、前記熱可塑性ポリ
マーのガラス転移温度(Tg点)以上に素子が一定時間
加熱され、前記熱可塑性ポリマーの一軸延伸が解かれ、
非延伸状態とされている請求項1〜4のいずれかに記載
の液晶表示素子。
9. The substrate has a shape memory effect in which a glass transition temperature (Tg point) or a softening point is lower than or equal to a use environment temperature of an element on at least one electrode-side substrate of the electrode-attached substrate.
That the thermoplastic polymer is a coating film formed, the heat glass transition temperature (Tg point) of the thermoplastic polymer or the element is heated a predetermined time, uniaxial stretching of the thermoplastic polymer is released,
The liquid crystal display device according to any one of claims 1 to 4, which is in a non-stretched state.
【請求項10】 少なくとも一方が透明な一対の電極付
基板の少なくとも一方の電極側基板表面に形状記憶効果
を有する熱可塑性ポリマー層が形成され、前記 熱可塑性ポリマー層は一軸延伸され、その表面には
組成物の注入されて行く方向にラビングが施されたもの
であり、 基板間に組成物が注入され、注入口が封口樹脂で封口さ
れ、その後前記熱可塑性ポリマーはガラス転移温度(T
g点)以上に一定時間加熱され、一軸延伸が解かれて非
延伸状態となっていることを特徴とする液晶表示素子。
10. at least one thermoplastic polymer layer having a shape memory effect in the at least one electrode side substrate surface of the substrate with a pair of transparent electrodes are formed, the thermoplastic polymer layer is uniaxially stretched, on the surface Is rubbed in the direction in which the composition is injected, the composition is injected between the substrates, the injection port is sealed with a sealing resin, and then the thermoplastic polymer has a glass transition temperature (T
(g point) A liquid crystal display element which is heated for a certain period of time or longer, and is unstretched by uniaxial stretching.
【請求項11】 前記形状記憶効果を有する熱可塑性ポ
リマーのガラス転移温度(Tg点)が素子の使用環境温
度よりも高い請求項10に記載の液晶表示素子。
11. The liquid crystal display device according to claim 10, wherein a glass transition temperature (Tg point) of the thermoplastic polymer having the shape memory effect is higher than an ambient temperature of use of the device.
【請求項12】 前記形状記憶効果を有する熱可塑性ポ
リマーがポリウレタンである請求項8〜11のいずれか
記載の液晶表示素子。
12. The thermoplastic resin according to claim 8, wherein the thermoplastic polymer having a shape memory effect is polyurethane .
The liquid crystal display device according to.
【請求項13】 前記空セルに注入される組成物が液晶
材料と高分子材料との混合物より成る請求項10に記載
の液晶表示素子。
13. The liquid crystal display device according to claim 10, wherein the composition injected into the empty cell comprises a mixture of a liquid crystal material and a polymer material.
【請求項14】少なくとも一方が透明である一対の電極
付基板の電極側を対向させてシール材料の樹脂材料で基
板間に空隙を形成して貼り合わせ、シール材料のない部
分で注入口及び排出口の開口を設けて空セルを形成し、
前記基板間に形成される空セル内に高分子形成材料と液
晶とを含む組成物を注入して液晶表示素子を製造する方
法であって、 前記一対の電極付基板は面積が相対的に広い大基板と相
対的に狭い小基板とを用い、前記大基板上に、前記小基
板の端から前記大基板の端まで前記小基板の高さよりも
高い堰部を2か所設け、前記2か所の堰部の間または前
記2か所の堰部より下面を注入口とし、 前記注入口から高分子形成材料と液晶とを含む組成物を
前記基板間の空隙に常圧で注入することを特徴とする液
晶表示素子の製造方法
14. A pair of electrode-attached substrates, at least one of which is transparent, facing each other with the electrodes facing each other, forming a gap between the substrates with a resin material of a sealing material, and bonding them together. Providing an outlet opening to form an empty cell,
A method of manufacturing a liquid crystal display device by injecting a composition containing a polymer-forming material and liquid crystal into an empty cell formed between the substrates, wherein the pair of electrode-attached substrates has a relatively large area. Using a large substrate and a relatively small substrate, providing two dams on the large substrate from the edge of the small substrate to the edge of the large substrate at a height higher than the height of the small substrate ; Using the inlet between the two weirs or the lower surface of the two weirs as an inlet, and injecting a composition containing a polymer-forming material and a liquid crystal from the inlet into the space between the substrates at normal pressure. A method for manufacturing a liquid crystal display element , comprising:
【請求項15】少なくとも一方が透明である一対の電極
付基板の電極側を対向させてシール材料の樹脂材料で基
板間に空隙を設けて貼り合わせるとともに、少なくとも
注入口、排出口の開口を設けて空セルを形成し、前記基
板間に形成される空セル内に高分子形成材料と液晶とを
含む組成物を注入して液晶表示素子を製造する方法であ
って、 前記シール部に基板の4つの角部において、開口を設け
て形成するか、注入方向に垂直な2辺において、それぞ
れ少なくとも1カ所以上シール材料の無い部分により開
口を設けるか、または点線状にシール部を樹脂で形成
し、 前記一対の電極付基板は面積が相対的に広い大基板と相
対的に狭い小基板とを用い、前記大基板上に、前記小基
板の端から前記大基板の端まで前記小基板の高さよりも
高い堰部を2か所設け、前記2か所の堰部の間または前
記2か所の堰部より下面を注入口とし、 前記注入口から高分子形成材料と液晶とを含む組成物を
前記基板間の空隙に常圧で注入することを特徴とする液
晶表示素子の製造方法
15. A pair of electrode-attached substrates, at least one of which is transparent, facing each other with electrodes facing each other, providing a gap between the substrates with a sealing resin material, and providing at least an inlet and an outlet. A liquid crystal display element by injecting a composition containing a polymer-forming material and a liquid crystal into the empty cells formed between the substrates, wherein the sealing portion comprises a substrate. Either four corners are provided with openings, or two sides perpendicular to the injection direction are provided with openings at least at one or more locations where there is no seal material, or a seal is formed of resin in a dotted line. The pair of substrates with electrodes use a large substrate having a relatively large area and a small substrate having a relatively small area. On the large substrate, the height of the small substrate extends from the edge of the small substrate to the edge of the large substrate. high weir than of Are provided at two locations, and between the two weirs or the lower surface from the two weirs are used as an inlet, and a composition containing a polymer-forming material and a liquid crystal is supplied from the inlet to the substrate. A method for producing a liquid crystal display element , characterized by injecting into a gap at normal pressure.
【請求項16】 前記堰部を注入部と垂直方向の2辺に
対して注入側より上方に位置させて設け、空セルを液晶
材料を含む組成物に漬けることによって空セルに注入
する請求項14または15に記載の液晶表示素子の製造
方法。
16. The method according to claim 16, wherein the weir is provided above the injection side with respect to two sides in a direction perpendicular to the injection part, and the empty cell is immersed in a liquid composition containing a liquid crystal material to be injected into the empty cell. Item 16. The method for manufacturing a liquid crystal display device according to item 14 or 15 .
【請求項17】 前記組成物液面を検知する赤外線セン
サー、温感センサーもしくは光学センサーを装備し、前
記組成物液面の高さを空セル内に注入されて行く高さに
常に位置するように空セルの浸漬位置を制御し、堰部を
排出口側に近い排出口の設けられている辺と垂直方向の
シール端部に設けて組成物を注入する請求項14、15
または16に記載の液晶表示素子の製造方法。
17. An infrared sensor , a thermal sensor or an optical sensor for detecting the liquid level of the composition, wherein the level of the liquid level of the composition is always positioned at a level at which the composition is poured into the empty cell. to control the immersion position of the empty cell, injecting the composition is provided in the seal end of the side and vertical provided the dam portion of the discharge port near the outlet side claims 14 and 15
17. A method for manufacturing a liquid crystal display device according to item 16 .
【請求項18】 前記基板の電極の端子部及び基板外表
面を保護した後、組成物を注入する請求項14または1
5に記載の液晶表示素子の製造方法。
18. The composition according to claim 14 , wherein after protecting the terminal portions of the electrodes of the substrate and the outer surface of the substrate, the composition is injected.
6. The method for manufacturing a liquid crystal display element according to 5 .
【請求項19】 空パネルの1角の開口部を注入口と
し、その1角に対して隣合う角部の2つに対し、高分子
樹脂材料からなる堰部を設け、注入側を前記堰部より下
に配し、液晶材料を含む組成物に漬けて注入する請
求項15、16または17に記載の液晶表示素子の製造
方法。
19. and the opening of one corner of the empty panel inlet, to two of the corners adjacent to that one corner is provided with a weir portion made of a polymeric resin material, said injection side weir It was placed below the section, a method of manufacturing a liquid crystal display device according to claim 15, 16 or 17 to inject immersed in liquid composition containing a liquid crystal material.
【請求項20】 少なくとも一方が透明な一対の電極付
基板の少なくとも一方の電極側基板表面に形状記憶効果
を有する熱可塑性ポリマー層を形成し、組成物の注入さ
れて行く方向に、前記熱可塑性ポリマー層にラビングを
施し、前記ポリマー層には、一軸延伸を施し、基板間に
注入口より組成物を注入して素子を形成し、注入が完了
した後、素子から組成物が漏れないように、封口樹脂で
封口し、前記熱可塑性ポリマーのガラス転移温度(Tg
点)以上に素子を一定時間加熱し、前記熱可塑性ポリマ
ーの一軸延伸を解き、非延伸状態と成った後、温度降下
させることにより作製することを特徴とする液晶表示素
子の製造方法。
20. A thermoplastic polymer layer having a shape memory effect is formed on at least one electrode-side substrate surface of at least one of a pair of electrode-attached substrates, and the thermoplastic polymer layer is formed in a direction in which a composition is injected. rubbing the polymer layer, the polymer layer is subjected to a uniaxial stretching, to form a device by injecting a composition from the inlet between the substrates, after injection has been completed, such that the composition from the device does not leak And sealing with a sealing resin, and the glass transition temperature (Tg) of the thermoplastic polymer.
Point) A method for producing a liquid crystal display element, comprising heating the element for a certain period of time to release uniaxial stretching of the thermoplastic polymer to a non-stretched state and then lowering the temperature.
【請求項21】 前記液晶組成物の注入に際して、注入
する組成物及び基板を一定温度に加温してから注入する
請求項14〜20のいずれかに記載の液晶表示素子の製
造方法。
21. The method of manufacturing a liquid crystal display device according to claim 14, wherein, at the time of injecting the liquid crystal composition, the composition and the substrate to be injected are heated to a certain temperature and then injected.
【請求項22】 前記注入常圧下で行請求項20に
記載の液晶表示素子の製造方法。
22. A method for manufacturing a liquid crystal display device of <br/> according to the injection intends line under normal pressure to claim 20.
JP06234581A 1994-09-29 1994-09-29 Liquid crystal display device and method of manufacturing the same Expired - Fee Related JP3105747B2 (en)

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EP0867750A3 (en) * 1997-03-28 2000-05-03 Denso Corporation Liquid crystal cell and method of manufacturing the same
JPH11295746A (en) 1998-02-16 1999-10-29 Sharp Corp Manufacture of liquid crystal element, liquid crystal filling device, and liquid crystal filling system
US6844910B2 (en) 1999-12-28 2005-01-18 Semiconductor Energy Laboratory Co., Ltd. Liquid crystal display device and manufacturing method thereof
JP2001249344A (en) * 1999-12-28 2001-09-14 Semiconductor Energy Lab Co Ltd Liquid crystal display device and its manufacturing method
JP2005156704A (en) 2003-11-21 2005-06-16 Seiko Epson Corp Method for manufacturing liquid crystal device, liquid crystal device, and electronic equipment
WO2008111258A1 (en) * 2007-03-12 2008-09-18 Sharp Kabushiki Kaisha Device and method for manufacturing liquid crystal display panel
FR2964473B1 (en) 2010-09-03 2012-08-17 Saint Gobain VARIABLE DIFFUSION MULTIPLE GLAZING BY LIQUID CRYSTALS, ITS MANUFACTURING PROCESS
FR2985327B1 (en) 2011-12-29 2013-12-20 Saint Gobain VARIABLE DIFFUSION MULTIPLE GLAZING BY LIQUID CRYSTALS, ITS MANUFACTURING PROCESS
CN111290180B (en) * 2020-02-27 2022-10-11 亚世光电股份有限公司 Technological method for producing large-size LCD in perfusion mode

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