JP3095889U - Electropolishing equipment - Google Patents
Electropolishing equipmentInfo
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- JP3095889U JP3095889U JP2003000666U JP2003000666U JP3095889U JP 3095889 U JP3095889 U JP 3095889U JP 2003000666 U JP2003000666 U JP 2003000666U JP 2003000666 U JP2003000666 U JP 2003000666U JP 3095889 U JP3095889 U JP 3095889U
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- polished
- contact
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- columnar
- electrolytic
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Abstract
(57)【要約】
【課題】 大型円筒管であっても部分的に順次電解研磨
を行うことができる電解研磨装置を提供する。
【解決手段】 この電解研磨装置１０は、円筒状の被研
磨体１００を浸漬させる電解槽１２と、電解槽１２内の
電解溶液１４内に浸漬された被研磨体１００における浸
漬領域１０２内であって、被研磨体１００の筒内に設置
された電極体１６とを備え、電極体１６は、電解研磨時
に回転する被研磨体１００の内面１０４に、電極体１６
を構成する絶縁性接触体３０が接触しながら、被研磨体
１００の浸漬領域１０２内に移動するように形成され
た、電解研磨装置である。
(57) [PROBLEMS] To provide an electropolishing apparatus capable of performing electropolishing partially sequentially even in a large cylindrical tube. An electropolishing apparatus includes an electrolytic bath for immersing a cylindrical object to be polished, and an immersion area in the object to be immersed in an electrolytic solution in the electrolytic bath. And an electrode body 16 installed in a cylinder of the object to be polished 100. The electrode body 16 is provided on the inner surface 104 of the object to be polished 100 rotating during electrolytic polishing.
Is an electropolishing apparatus formed so as to move into the immersion area 102 of the object to be polished 100 while the insulative contact body 30 constituting the object is in contact.
Description
【０００１】[0001]
この考案は、電解研磨装置に関し、特に、小型のステンレス鋼からなる大型円 筒管の内面を電解研磨するに適する電解研磨装置に関する。 The present invention relates to an electropolishing apparatus, and particularly to a large circle made of small stainless steel. The present invention relates to an electrolytic polishing device suitable for electrolytically polishing the inner surface of a cylindrical tube.
【０００２】[0002]
従来、大型の円筒管の内面を電解研磨するのにあたり、大型円筒管の全体を浸 漬する電解溶液を溜めることができる大型槽を準備し、電解研磨を行っていた。 Conventionally, when electrolytically polishing the inner surface of a large cylindrical tube, the entire large cylindrical tube is immersed. A large tank capable of storing the electrolytic solution to be dipped was prepared and electrolytic polishing was performed.
【０００３】[0003]
しかしながら、この従来の大型円筒管をすべて電解溶液に浸す大型槽を用いれ ば、電解溶液が大量の液量となり、電解溶液の出し入れに多くの時間がとられ、 また、大型円筒管の全内面を一度に電解研磨するためには、大量の電流を大型円 筒管に流さなければならず、そのために必要な電気量は、大容量となり、また、 電解研磨のための整流器や給配電トランスも、大容量の電気量に対応するものに しなければならず、技術的にも、コスト的にも、大変な問題がある。 However, it is not possible to use a large tank in which this conventional large cylindrical tube is immersed in the electrolytic solution. For example, the electrolytic solution becomes a large volume, and it takes a lot of time to put in and take out the electrolytic solution. In addition, in order to electropolish the entire inner surface of a large cylindrical tube at once, a large amount of current is applied to the large circular tube. The amount of electricity required for this to flow into the tube is large, and Rectifiers and power distribution transformers for electrolytic polishing are also compatible with large amounts of electricity. There is a serious problem in terms of technology and cost.
【０００４】 それゆえに、この考案の主たる目的は、大型円筒管であっても部分的に順次電 解研磨を行うことができる電解研磨装置を提供することである。[0004] Therefore, the main purpose of this invention is to partially energize even a large cylindrical tube. An object of the present invention is to provide an electrolytic polishing apparatus that can perform depolishing.
【０００５】[0005]
この考案の請求項１にかかる電解研磨装置は、円筒状の被研磨体を浸漬させる 電解槽と、電解槽内の電解溶液内に浸漬された被研磨体における浸漬領域内であ って、被研磨体の筒内に設置された電極体とを備え、電極体は、電解研磨時に回 転する被研磨体の内面に、電極体を構成する絶縁性接触体が接触しながら、被研 磨体の浸漬領域内に移動するように形成された、電解研磨装置である。 この考案の請求項２にかかる電解研磨装置は、電極体は、被研磨体の内表面と 接触する接触体が、滑り性のよい絶縁材料で形成されている、請求項１に記載の 電解研磨装置である。 この考案の請求項３にかかる電解研磨装置は、電極体は、被研磨体の内表面と 接触する接触体が、塩化ビニル樹脂および／または４フッ化エチレンを重合して なる合成樹脂で形成されている、請求項１または２に記載の電解研磨装置である 。 この考案の請求項４にかかる電解研磨装置は、電極体は、被研磨体の内表面と 接触する絶縁性接触体たる接触柱状体と、柱状体の上面に固定された導電性電極 柱状体とを備え、電極柱状体は、電解溶液内に浸漬されるように、接触柱状体に 適宜な間隔をおいて複数本固定され、接触柱状体が電解研磨時に回転する被研磨 体の内面に接触しながら、電極体が浸漬領域内に移動するように構成された、請 求項１ないし３のいずれかに記載の電解研磨装置である。 この考案の請求項５にかかる電解研磨装置は、接触柱状体は、少なくとも２本 の柱状体からなり、且つ、電極柱状体は、長尺板からなり、該電極柱状体は、適 宜な間隔をおいて形成された接触柱状体の上面に、接触柱状体の長手方向と交差 する方向において、適宜な間隔をおいて複数本架設された、請求項４に記載の電 解研磨装置である。 この考案の請求項６にかかる電解研磨装置は、接触柱状体は、塩化ビニル樹脂 および／または４フッ化エチレンを重合してなる合成樹脂で形成されている、請 求項４または５に記載の電解研磨装置である。 この考案の請求項７にかかる電解研磨装置は、電極柱状体は、銅板からなる、 請求項４ないし６のいずれかに記載の電解研磨装置である。 この考案の請求項８にかかる電解研磨装置は、電極柱状体は、複数の電極柱状 体を結ぶ線分が円筒状被研磨体の水平な弦と略平行になるように、接触柱状体に 固定され、且つ、被研磨体とは接触しないで、被研磨体内において、複数の電極 柱状体を結ぶ線分が常時は水平になるように載置された、請求項４ないし７のい ずれかに記載の電解研磨装置である。 この考案の請求項９にかかる電解研磨装置は、電極体は、陰極である、請求項 １ないし８のいずれかに記載の電解研磨装置である。 この考案の請求項１０にかかる電解研磨装置は、更に、被研磨体を回転させる 回転装置を備える、請求項１ないし９のいずれかに記載の電解研磨装置である。 この考案の請求項１１にかかる電解研磨装置は、回転装置は、研磨体の外表面 と接し、被研磨体を回転させることができるように、適宜な間隔をおいて配置さ れた左右一対のローラおよびローラを含み、被研磨体が、該ローラの回転により 、正転あるいは逆転することをできるように構成されている、請求項１０に記載 の電解研磨装置である。 この考案の請求項１２にかかる電解研磨装置は、電解溶液は、粘性のある組成 の液からなる、請求項１ないし９のいずれかに記載の電解研磨装置である。 この考案の請求項１３にかかる電解研磨装置は、電解溶液は、リン酸を主体と し、水、エチレングリコール、クロム酸を含む強酸性の液からなる、請求項１な いし１０のいずれかに記載の電解研磨装置である。 The electrolytic polishing apparatus according to claim 1 of the present invention immerses a cylindrical object to be polished. In the electrolytic bath and in the immersion area of the object to be polished immersed in the electrolytic solution in the electrolytic bath. Therefore, the electrode body is provided inside the cylinder of the object to be polished, and the electrode body is rotated during electrolytic polishing. While the insulative contact body that constitutes the electrode body is in contact with the inner surface of the rotating polishing target object, The electropolishing device is formed so as to move into the immersion area of the polishing body. In the electropolishing apparatus according to claim 2 of the present invention, the electrode body is formed on the inner surface of the body to be polished. The contact body that comes into contact is formed of an insulating material having good slipperiness, according to claim 1. It is an electrolytic polishing apparatus. In the electropolishing apparatus according to claim 3 of the present invention, the electrode body is formed on the inner surface of the body to be polished. The contacting body contacts the vinyl chloride resin and / or polymerizes tetrafluoroethylene. The electropolishing apparatus according to claim 1 or 2, which is formed of a synthetic resin of . In the electropolishing apparatus according to claim 4 of the present invention, the electrode body is formed on the inner surface of the body to be polished. A contact columnar body, which is an insulative contacting body, and a conductive electrode fixed on the top surface of the columnar body. The columnar body is provided with a contact columnar body so that the electrode columnar body is immersed in the electrolytic solution. Plural pieces are fixed at appropriate intervals and the contact columns rotate during electrolytic polishing. The electrode body is configured to move into the immersion area while contacting the inner surface of the body. The electropolishing apparatus according to any one of claims 1 to 3. The electrolytic polishing apparatus according to claim 5 of the present invention has at least two contact columns. And the electrode columnar body is a long plate. On the upper surface of the contact pillars formed at appropriate intervals, intersect with the longitudinal direction of the contact pillars. The plurality of electric wires according to claim 4, which are erected at appropriate intervals in the direction of It is a descaling device. In the electrolytic polishing apparatus according to claim 6 of the present invention, the contact columnar body is made of vinyl chloride resin. And / or a synthetic resin formed by polymerizing tetrafluoroethylene. The electrolytic polishing apparatus according to claim 4 or 5. In the electrolytic polishing apparatus according to claim 7 of the present invention, the electrode columnar body is made of a copper plate, The electropolishing apparatus according to any one of claims 4 to 6. In the electrolytic polishing apparatus according to claim 8 of the present invention, the electrode columnar body comprises a plurality of electrode columnar bodies. Place the contact columnar body so that the line segment connecting the bodies is approximately parallel to the horizontal chord of the cylindrical object to be polished. A plurality of electrodes are fixed in the body to be polished without contacting the body to be polished. The line segment connecting the columns is placed so that it is always horizontal. It is the electrolytic polishing apparatus described in some cases. In the electrolytic polishing apparatus according to claim 9 of the present invention, the electrode body is a cathode. The electropolishing apparatus according to any one of 1 to 8. The electrolytic polishing apparatus according to claim 10 of the present invention further rotates the object to be polished. The electropolishing apparatus according to claim 1, further comprising a rotating device. In the electrolytic polishing apparatus according to claim 11 of the present invention, the rotating device is the outer surface of the polishing body. Contact with the workpiece and place them at appropriate intervals so that the workpiece can be rotated. Including a pair of right and left rollers and a roller, 11. The structure according to claim 10, which is configured to be capable of rotating in the normal direction or the reverse direction. This is an electrolytic polishing apparatus. In the electrolytic polishing apparatus according to claim 12 of the present invention, the electrolytic solution has a viscous composition. The electrolytic polishing apparatus according to any one of claims 1 to 9, wherein the electrolytic polishing apparatus comprises the above liquid. In the electropolishing apparatus according to claim 13 of the present invention, the electrolytic solution is mainly phosphoric acid. And a strongly acidic liquid containing water, ethylene glycol, and chromic acid. The electropolishing apparatus according to any one of item 10.
【０００６】 〔考案の作用・効果〕 この考案によれば、円筒状の被研磨体をゆっくり回転させながら、被研磨体の 内面に設置された電極体によって電解研磨を行うが、電解研磨時に回転する被研 磨体の内面において電極体が該内面と接触しながら回転方向とは逆方向にずれ落 ち、もとの位置近くに戻り、電解研磨を行うことができる。そして、被研磨体を 回転させながら、電解研磨を繰り返し行うが、そのとき、電極体は静止した状態 の位置とほぼ変わらぬ位置を保ち続けることができ、部分的に電解研磨を繰り返 すことにより、一周回転すると、被研磨体の内面全面が電解研磨されることにな り、電極体の回転移動による電解研磨の境界面に、電解研磨されなかったり、電 解研磨されすぎたりといった、電解ムラが起こることがない。 請求項２、３及び６の考案によれば、電極体は、それを構成する接触体が滑り 性のよい絶縁材料（塩化ビニル樹脂および／または４フッ化エチレンを重合して なる合成樹脂）で形成されているので、大型円筒管を回転させながら電解研磨す るとき、大型円筒状の被研磨体の回転方向とは逆方向にずれ落ち、元の位置近く に戻り、静止した状態の位置とほぼ変わらぬ位置を保ち続けることができ、電解 研磨された部分と電解研磨されていない部分との境界面が、電解研磨されなかっ たり、電解研磨されすぎたりするといった、電解ムラの発生を防ぐことができる 。 請求項４、５及び７の考案によれば、電極柱状体は、電解溶液内に浸漬される ように、接触柱状体に、適宜な間隔を置いて複数本固定されているので、電解溶 液が電極柱状体に満遍なく行き渡り、電解ムラを起こすことなく電解研磨をする ことができる。また、電解溶液内において、電極体が浮くことがなく、電解溶液 内に浸漬され、電解研磨を行うことができる。 請求項８の考案によれば、円筒状被研磨体が電解研磨されるとき、電解研磨溶 液内に常時水平に電極柱状体を載置させることができ、電極柱状体を常に電解溶 液内に浸漬させた状態で電解研磨を行うことができるので、電解ムラが起こらな い。 請求項１０及び１１の考案によれば、円筒状の被研磨体をゆっくり回転させな がら、被研磨体の内面に設置された電極体によって電解研磨を行うが、電解研磨 時に回転する被研磨体の内面において電極体が該内面と接触しながら回転方向と は逆方向にずれ落ち、もとの位置近くに戻り、電解研磨を行うことができる。そ して、回転装置によって被研磨体を回転させながら、電解研磨を繰り返し行うが 、そのとき、電極体は静止した状態の位置とほぼ変わらぬ位置を保ち続けること ができ、部分的に電解研磨を繰り返すことにより、一周回転すると、被研磨体の 内面全面が電解研磨されることになり、円筒体の回転移動による電解研磨の境界 面に、電解研磨されなかったり、電解研磨されすぎたりといった、電解ムラが起 こることがない。 請求項１２及び１３の考案によれば、電解溶液が、粘性のある組成の液（リン 酸を主体とし、水、エチレングリコール、クロム酸を含む強酸性の液）からなる ので、電極体を構成する接触体は、円筒状の被研磨体の内面における滑り性がよ り一層よくなり、円筒状被研磨体の回転時において、被研磨体の回転方向とは逆 方向にずれ落ち、元の位置近くに戻ることが容易となる。したがって、電解ムラ が起こることなく、電解研磨を行うことができる。[0006] [Function and effect of device] According to this invention, while slowly rotating the cylindrical object to be polished, Electropolishing is performed by the electrode body installed on the inner surface, but it is rotated during electrolytic polishing. While the electrode body is in contact with the inner surface of the polishing body, it falls in the direction opposite to the rotating direction. After that, the electrolytic polishing can be performed by returning to the original position. Then, the object to be polished Electropolishing is repeated while rotating, but the electrode body remains stationary. Can be maintained at a position that is almost the same as the position of, and electrolytic polishing is partially repeated. As a result, the entire inner surface of the object to be polished is electrolytically polished when it is rotated once. On the boundary surface of electropolishing due to the rotational movement of the electrode body, Electrolytic unevenness such as excessive depolishing does not occur. According to the inventions of claims 2, 3 and 6, in the electrode body, the contact body constituting the electrode body slides. Insulating material with good properties (by polymerizing vinyl chloride resin and / or tetrafluoroethylene Since it is made of synthetic resin, it is electrolytically polished while rotating a large cylindrical tube. When rotating, the large cylindrical object slips in the direction opposite to the direction of rotation, near the original position. , You can continue to maintain a position that is almost the same as the position of the stationary state, The interface between the polished and non-electropolished areas is not electropolished It is possible to prevent the occurrence of electrolytic unevenness, such as that . According to the invention of claims 4, 5 and 7, the electrode columnar body is immersed in the electrolytic solution. As described above, a plurality of contact columns are fixed at appropriate intervals, so Liquid is evenly distributed over the electrode columnar body, and electrolytic polishing is performed without causing electrolytic unevenness. be able to. In addition, the electrode body does not float in the electrolytic solution, It can be dipped in and electropolished. According to the invention of claim 8, when the cylindrical object is electrolytically polished, the electrolytic polishing solution is used. The electrode columnar body can be placed horizontally in the liquid at all times, and the electrode columnar body is always electrolyzed. Electrolytic polishing can be performed while it is immersed in the liquid, so uneven electrolysis does not occur. Yes. According to the invention of claims 10 and 11, the cylindrical object to be polished is not slowly rotated. However, electropolishing is performed by the electrode body installed on the inner surface of the object to be polished. When the electrode body contacts the inner surface of the object to be rotated, Moves in the opposite direction, returns to near the original position, and electrolytic polishing can be performed. So Then, while the object to be polished is rotated by the rotating device, electrolytic polishing is repeatedly performed. , At that time, the electrode body should keep the position which is almost the same as the rest position. Can be made, and by repeating electrolytic polishing partially, one rotation makes it possible to The entire inner surface will be electropolished, and the boundary of electropolishing due to the rotational movement of the cylindrical body Surface is not electrolytically polished or is too electrolytically polished. It won't come up. According to the twelfth and thirteenth inventions, the electrolytic solution is a liquid (phosphorus) having a viscous composition. It is composed mainly of acid, and consists of a highly acidic liquid containing water, ethylene glycol, and chromic acid. Therefore, the contact body that constitutes the electrode body has good slidability on the inner surface of the cylindrical object to be polished. When rotating the cylindrical object to be polished, the direction opposite to the rotating direction of the object to be polished is reversed. It becomes easy to slip in the direction and return to the original position. Therefore, the electrolytic unevenness Can be carried out without causing
【０００７】 この考案の上述の目的，その他の目的，特徴および利点は、図面を参照して行 う以下の考案の実施の形態の詳細な説明から一層明らかとなろう。[0007] The above and other objects, features and advantages of the present invention will be described with reference to the drawings. It will be more apparent from the following detailed description of the embodiments of the invention.
【０００８】[0008]
図１は、この考案の一実施の形態である電解研磨装置の断面図解図である。 この電解研磨装置１０は、たとえば、マンホール型または上ブタ型タンクの胴 部１１２に用いられるステンレス製大型円筒管を電解研磨する装置である。 このステンレス製大型円筒管とは、ＳＵＳ３０４、３１６、３１６Ｌ等のステ ンレス鋼からなる円筒管で、直径が２０００ｍｍ乃至４０００ｍｍで、その長さ が４０００ｍｍ乃至８０００ｍｍで、板厚が５乃至１０ｍｍのものであり、タン ク容量は２０ｍ3〜６０ｍ3である。 ステンレス製大型円筒管は、図４に示すように、胴部１１２を構成するもので 、胴部１１２の両端に固着される鏡部１１４は、胴部１１２と同様に、胴部１１ ２とは別に電解研磨した後、銅部１１２の両端に鏡部１１４を溶接にて一体化さ れるものである。 特に、この電解研磨装置１０によって電解研磨される被研磨体１００は、ステ ンレス製大型円筒管の内部を電解研磨する装置である。FIG. 1 is a sectional schematic view of an electrolytic polishing apparatus according to an embodiment of the present invention. The electropolishing apparatus 10 is an apparatus for electropolishing a large stainless steel cylindrical tube used for a body portion 112 of a manhole type or upper lid type tank, for example. This large-sized stainless steel cylindrical tube is a cylindrical tube made of stainless steel such as SUS304, 316, 316L, having a diameter of 2000 mm to 4000 mm, a length of 4000 mm to 8000 mm, and a plate thickness of 5 to 10 mm. , tank capacity is 20m 3 ~60m 3. As shown in FIG. 4, the large stainless steel cylindrical tube constitutes the body portion 112, and the mirror portions 114 fixed to both ends of the body portion 112 are similar to the body portion 112 and different from the body portion 112. After electropolishing separately, mirror portions 114 are welded and integrated with both ends of the copper portion 112. In particular, the object 100 to be electropolished by this electropolishing apparatus 10 is an apparatus for electropolishing the inside of a large stainless steel cylindrical tube.
【０００９】 この電解研磨装置１０は、円筒状の被研磨体１００を浸漬させる電解槽１２と 、前記電解槽１２内に溜められた電解溶液１４内に浸漬された被研磨体１００に おける浸漬領域１０２内において、被研磨体１００の内面１０４に通電されない 接触体のみが接触して設置され、電解研磨時に回転する被研磨体１００の内面１ ０４に該接触体のみが接触しながら浸漬領域１０２内において移動するように形 成された電極体１６と、被研磨体１００を回転させる回転装置１８とを備えてい る。[0009] The electrolytic polishing apparatus 10 includes an electrolytic bath 12 in which a cylindrical object 100 to be polished is immersed. , The object to be polished 100 immersed in the electrolytic solution 14 stored in the electrolytic bath 12 The inner surface 104 of the object to be polished 100 is not energized in the immersion area 102 in the The inner surface 1 of the object 100 to be polished, which is placed in contact with only the contact member and rotates during electrolytic polishing 04 so as to move only in the contacting body in the immersion area 102. The electrode body 16 formed and a rotating device 18 for rotating the object 100 to be polished are provided. It
【００１０】 この電解研磨装置１０は、被研磨体１００が入る平面四角の立方体状電解槽１ ２を備えている。そして、電解研磨装置１０は、被研磨体１００に電圧を加える ための直流の電源である蓄電池、あるいはセレン整流器，ベルトロー等の電源２ ０を備えている。 電源２０は、被研磨体１００および電極体１６と電気的に接続されている。[0010] This electropolishing apparatus 10 is a cubic electrolytic bath 1 having a square shape in a plane in which an object 100 to be polished is placed. Equipped with 2. Then, the electrolytic polishing apparatus 10 applies a voltage to the object 100 to be polished. Storage battery which is a direct current power source for power supply, or power source 2 such as selenium rectifier and belt low It has 0. The power source 20 is electrically connected to the object to be polished 100 and the electrode body 16.
【００１１】 電解溶液１４は、たとえば、強酸性のリン酸を主体とする溶液で、水、エチレ ングリコール、クロム酸等を加えた、粘性のある溶液である。[0011] The electrolytic solution 14 is, for example, a solution mainly composed of strongly acidic phosphoric acid, and is composed of water, ethyl It is a viscous solution containing glycol, chromic acid, etc.
【００１２】 電極体１６は、被研磨体１００の内面１０４と接触する接触体たる接触柱状体 ３０を備え、前記接触柱状体３０の上面に、断面方形状の金属製電極柱状体３２ を備えている。[0012] The electrode body 16 is a contact columnar body that is a contact body that contacts the inner surface 104 of the object 100 to be polished. And the metal electrode columnar body 32 having a rectangular cross section on the upper surface of the contact columnar body 30. Is equipped with.
【００１３】 前記電極柱状体３２は、電解溶液１４内に浸漬されるように、接触柱状体３０ の上面に適宜な間隔を置いて複数本固定されている。 前記電極柱状体３２は、適宜な幅を有する銅板からなり、電源２０と電気的に 接続される。この電極柱状体３２は、被研磨体１００の長さと略同じ長さの銅製 ブスパーをもって構成されている。[0013] The electrode columnar body 32 is so contacted with the contact columnar body 30 as to be immersed in the electrolytic solution 14. A plurality of sheets are fixed on the upper surface of the sheet at appropriate intervals. The electrode columnar body 32 is made of a copper plate having an appropriate width and electrically connected to the power source 20. Connected. The electrode columnar body 32 is made of copper and has a length substantially the same as the length of the object 100 to be polished. It is made up of buspers.
【００１４】 接触柱状体３０は、断面方形状あるいは断面Ｕ字型で、その下面が被研磨体１ ００の内面１０４に沿って滑ることができるように形成され、被研磨体１００の 弦１０６に近似した間隔をもって、２本の接触柱状体３０が形成されている。 接触柱状体３０は、塩化ビニル樹脂あるいは４フッ化エチレンを重合してなる 合成樹脂材からなり、強酸性の電解溶液１４に耐え且つ被研磨体１００の内面１ ０４の表面をよく滑る滑り性を備える、絶縁性を有する材料からなる。[0014] The contact columnar body 30 has a rectangular cross section or a U-shaped cross section, and the lower surface of the contact columnar body 30 has a surface to be polished 1 00 is formed so that it can slide along the inner surface 104 of Two contact columnar bodies 30 are formed at intervals close to the strings 106. The contact columnar body 30 is formed by polymerizing vinyl chloride resin or tetrafluoroethylene. The inner surface 1 of the object to be polished 100, which is made of a synthetic resin material and can withstand the strongly acidic electrolytic solution 14 04 is made of an insulating material having a slippery property of sliding well on the surface.
【００１５】 電極柱状体３２は、適宜な間隔をおいて形成された接触柱状体３０の表面に横 一列に適宜な間隔をあけて、ボルト等の固着具によって固定されている。そして 、電極柱状体３２は、複数の電極柱状体３２を結ぶ線分Ｘ−Ｘが、被研磨体１０ ０の水平な弦１０６と略平行になるように、接触柱状体３０に固定されている。[0015] The electrode columnar bodies 32 are formed on the surface of the contact columnar bodies 30 formed at appropriate intervals. They are fixed in a row with fasteners such as bolts at appropriate intervals. And In the electrode columnar body 32, the line segment XX connecting the plurality of electrode columnar bodies 32 is defined as the workpiece 10. It is fixed to the contact columnar body 30 so as to be substantially parallel to the horizontal chord 106 of 0.
【００１６】 この電極体１６は、電解溶液１４中に沈められ、被研磨体１００が浸漬された 電解溶液１４の液面から数ｃｍ下の電解溶液１４中に位置するように被研磨体１ ００の空間内に設置する。 そして、被研磨体１００の電解溶液１４に浸漬された部分（浸漬領域１０２） が、電解研磨される部分である。 電極体１６は、浸漬領域１０２内に浸漬された複数の電極柱状体３２を結ぶ線 分Ｘ−Ｘが、被研磨体１００の水平な弦１０６と略平行になるように、被研磨体 １００の内面１０４に載置される。[0016] The electrode body 16 was submerged in the electrolytic solution 14 and the body 100 to be polished was immersed. The object to be polished 1 is positioned so as to be located in the electrolytic solution 14 several cm below the surface of the electrolytic solution 14. It is installed in the space of 00. Then, the portion of the object to be polished 100 immersed in the electrolytic solution 14 (immersion area 102) Is the part to be electropolished. The electrode body 16 is a line connecting a plurality of electrode columnar bodies 32 immersed in the immersion area 102. The object to be polished is set so that the minute X-X is substantially parallel to the horizontal string 106 of the object to be polished 100. Mounted on the inner surface 104 of 100.
【００１７】 回転装置１８は、被研磨体１００の外表面と接し、被研磨体１００を回転させ ることができるように、適宜な間隔をおいて配置された左右一対のローラ４０お よびローラ４２を含む。被研磨体１００は、このローラ４０，４２の回転により 、正転あるいは逆転することができるように構成されている。[0017] The rotating device 18 contacts the outer surface of the object 100 to be polished and rotates the object 100 to be polished. And a pair of left and right rollers 40 arranged at appropriate intervals so that And rollers 42. The object 100 to be polished is rotated by the rollers 40 and 42. , Is configured to be able to rotate in the forward or reverse direction.
【００１８】 この電解研磨装置１０において電解研磨するにあたっては、電解研磨装置１０ の電解溶液１４中に被研磨体１００を浸漬し、該被研磨体１００を両極とし、該 被研磨体１００の内面１０４に浸漬された電極体１６を陰極として、電源２０よ り直流電流を通電すると、被研磨体１００の電解溶液１４の液中に沈んだ部分が ＋（プラス）となり、電極体１６の電極柱状体３２が−（マイナス）となって、 電解研磨が始まる。[0018] When electrolytically polishing the electrolytic polishing apparatus 10, the electrolytic polishing apparatus 10 is used. The object 100 to be polished is immersed in the electrolytic solution 14 of 1. With the electrode body 16 immersed in the inner surface 104 of the object to be polished 100 as a cathode, the power source 20 When a direct current is applied, the portion of the object 100 to be polished that is submerged in the electrolytic solution 14 + (Plus), the electrode columnar body 32 of the electrode body 16 becomes- (minus), Electropolishing begins.
【００１９】 そして、被研磨体１００の電解溶液１４中に浸漬された内面１０４が、求めら れる品質になるまで電解研磨がなされると、回転装置１８のモータを回転させて ターンローラー４０，４２の回転により、被研磨体１００を回転させる。 このとき、電解研磨された部分、すなわち被研磨体１００の内面１０４の凹凸 部分の凸部が優先的に研磨される。そして、研磨された部分は平滑化が進んでい るので、電極体１６の接触柱状体３０と、被研磨体１００の研磨された内面１０ ４とは、より滑り性がよくなる。 そのために、電極体１６は、被研磨体１００の回転に伴い、回転のし始めは、 若干上方に被研磨体１００と共に移動するが、接触柱状体３０の滑り性と電解溶 液１４の粘性と相まって、被研磨体１００の回転方向とは逆方向にずれ落ち、元 の位置、すなわち、被研磨体１００の浸漬領域１０２内の電解溶液１４中に位置 することになる。 この作業を繰り返し、被研磨体１００の電解研磨を行う。[0019] Then, the inner surface 104 of the workpiece 100 immersed in the electrolytic solution 14 is When the electropolishing is performed until the quality reaches The object 100 to be polished is rotated by the rotation of the turn rollers 40 and 42. At this time, the electrolytically polished portion, that is, the unevenness of the inner surface 104 of the object 100 to be polished The convex portion of the portion is preferentially polished. And the smoothed part is not smoothed Therefore, the contact columnar body 30 of the electrode body 16 and the polished inner surface 10 of the workpiece 100 are polished. The value of 4 is more slippery. Therefore, the electrode body 16 starts to rotate as the body 100 to be polished rotates. Although it moves slightly upward together with the object to be polished 100, the sliding property and electrolytic dissolution of the contact columnar body 30 Combined with the viscosity of the liquid 14, it slips off in the direction opposite to the rotation direction of the object 100 to be polished, Position, that is, in the electrolytic solution 14 in the immersion area 102 of the object 100 to be polished. Will be done. By repeating this operation, the object 100 to be polished is electrolytically polished.
【００２０】 この電極体１６によれば、被研磨体１００の回転が正転あるいは逆転のいずれ においても、同様に電極体１６は、静止の位置、すなわち、被研磨体１００の電 解研磨される浸漬領域１０２内に滑り落ちて、正規の位置に位置することができ るので、電解溶液１４中に浸漬された被研磨体１００の浸漬領域１０２は、所定 の品質になるまで電解研磨がなされる。[0020] According to the electrode body 16, the rotation of the object to be polished 100 is either normal rotation or reverse rotation. In the same manner, the electrode body 16 is placed in a stationary position, that is, the electrode 100 of the object to be polished 100 is charged. It can slide into the submerged immersion area 102 and be placed in its normal position. Therefore, the immersion area 102 of the object 100 to be polished immersed in the electrolytic solution 14 has a predetermined size. Electrolytic polishing is performed until the quality reaches.
【００２１】 この電解研磨装置１０によれば、求める品質になるまで、静止した位置で電解 研磨するのではなく、ゆっくりと被研磨体１００を回転し続けることによって電 解研磨を連続して繰り返し行うことができる。したがって、被研磨体１００と電 解溶液１４との接触部分と非接触部分との境界がなくなり、また、製品の被研磨 体１００の陽極部と、電極体１６の陰極部の極間距離は常に一定に保たれるので 、電解研磨がムラなく仕上がる。 このように、被研磨体１００の全体が、求める品質になるまで電解研磨を続け ることにより、ムラがない均一な電解研磨ができる。[0021] According to this electropolishing apparatus 10, electrolysis is performed in a stationary position until the desired quality is achieved. Instead of polishing, slowly rotating the object to be polished 100 causes electric power to flow. Depolishing can be continuously and repeatedly performed. Therefore, the workpiece 100 and the There is no boundary between the contact portion with the solution 14 and the non-contact portion, and the product is polished. Since the distance between the anode part of the body 100 and the cathode part of the electrode body 16 is always kept constant, , The electrolytic polishing is finished evenly. In this way, the electropolishing is continued until the entire object 100 to be polished reaches the required quality. By doing so, uniform electrolytic polishing without unevenness can be performed.
【図１】この考案の一実施の形態である電解研磨装置の
断面図解図である。FIG. 1 is a schematic sectional view of an electropolishing apparatus according to an embodiment of the present invention.
【図２】図１図示電解研磨装置の作動状態を示す図解図
である。2 is an illustrative view showing an operating state of the electrolytic polishing apparatus shown in FIG. 1. FIG.
【図３】電極体の図解図である。FIG. 3 is an illustrative view of an electrode body.
【図４】被研磨体の図解図である。FIG. 4 is an illustrative view of an object to be polished.
１０ 電解研磨装置 １２ 電解槽 １４ 電解溶液 １６ 電極体 １８ 回転装置 ２０ 電源 ３０ 接触柱状体 ３２ 電極柱状体 ４０ ローラ ４２ ローラ １００ 被研磨体 １０２ 浸漬領域 １０４ 内面 １０６ 弦 １１０ タンク １１２ 胴部 １１４ 鏡部 10 Electrolytic polishing device 12 Electrolyzer 14 Electrolytic solution 16 electrode body 18 rotator 20 power supplies 30 Contact column 32 electrode columnar body 40 roller 42 Laura 100 Object to be polished 102 immersion area 104 Inside 106 strings 110 tank 112 torso 114 Mirror
Claims (13)
と、 前記電解槽内の電解溶液内に浸漬された被研磨体におけ
る浸漬領域内であって、被研磨体の筒内に設置された電
極体とを備え、 前記電極体は、電解研磨時に回転する被研磨体の内面
に、電極体を構成する絶縁性接触体が接触しながら、被
研磨体の浸漬領域内に移動するように形成された、電解
研磨装置。1. An electrolytic bath for immersing a cylindrical object to be polished, and an electrolyzer installed in a cylinder of the object to be polished in an immersion area of the object to be polished immersed in an electrolytic solution in the electrolytic cell. And an electrode body, wherein the electrode body is moved to an immersion area of the body to be polished while an insulating contact body constituting the electrode body is in contact with the inner surface of the body to be polished that rotates during electrolytic polishing The formed electropolishing apparatus.
する接触体が、滑り性のよい絶縁材料で形成されてい
る、請求項１に記載の電解研磨装置。2. The electrolytic polishing apparatus according to claim 1, wherein a contact body of the electrode body, which is in contact with the inner surface of the object to be polished, is made of an insulating material having a good slipperiness.
する接触体が、塩化ビニル樹脂および／または４フッ化
エチレンを重合してなる合成樹脂で形成されている、請
求項１または２に記載の電解研磨装置。3. The electrode body according to claim 1, wherein the contact body that comes into contact with the inner surface of the object to be polished is formed of a synthetic resin obtained by polymerizing vinyl chloride resin and / or ethylene tetrafluoride. 2. The electrolytic polishing apparatus according to item 2.
する絶縁性接触体たる接触柱状体と、 前記柱状体の上面に固定された導電性電極柱状体とを備
え、 前記電極柱状体は、電解溶液内に浸漬されるように、接
触柱状体に適宜な間隔をおいて複数本固定され、 前記接触柱状体が電解研磨時に回転する被研磨体の内面
に接触しながら、電極体が浸漬領域内に移動するように
構成された、請求項１ないし３のいずれかに記載の電解
研磨装置。4. The electrode body comprises a contact columnar body which is an insulative contact body that comes into contact with the inner surface of the object to be polished, and a conductive electrode columnar body fixed to the upper surface of the columnar body. A plurality of bodies are fixed to the contact columnar body at appropriate intervals so as to be immersed in the electrolytic solution, and the contact columnar body makes contact with the inner surface of the object to be polished that rotates during the electrolytic polishing, The electropolishing device according to claim 1, wherein the electropolishing device is configured to move into the immersion area.
状体からなり、且つ、前記電極柱状体は、長尺板からな
り、 該電極柱状体は、適宜な間隔をおいて形成された接触柱
状体の上面に、前記接触柱状体の長手方向と交差する方
向において、適宜な間隔をおいて複数本架設された、請
求項４に記載の電解研磨装置。5. The contact columnar body is composed of at least two columnar bodies, and the electrode columnar body is a long plate. The electrode columnar bodies are contact members formed at appropriate intervals. The electropolishing apparatus according to claim 4, wherein a plurality of the columnar bodies are provided on the upper surface of the columnar body at appropriate intervals in a direction intersecting the longitudinal direction of the contact columnar body.
び／または４フッ化エチレンを重合してなる合成樹脂で
形成されている、請求項４または５に記載の電解研磨装
置。6. The electrolytic polishing apparatus according to claim 4, wherein the contact columnar body is formed of a synthetic resin obtained by polymerizing vinyl chloride resin and / or tetrafluoroethylene.
項４ないし６のいずれかに記載の電解研磨装置。7. The electrolytic polishing apparatus according to claim 4, wherein the electrode columnar body is made of a copper plate.
結ぶ線分が円筒状被研磨体の水平な弦と略平行になるよ
うに、接触柱状体に固定され、且つ、被研磨体とは接触
しないで、被研磨体内において、複数の電極柱状体を結
ぶ線分が常時は水平になるように載置された、請求項４
ないし７のいずれかに記載の電解研磨装置。8. The electrode columnar body is fixed to the contact columnar body such that a line segment connecting the plurality of electrode columnar bodies is substantially parallel to a horizontal chord of the cylindrical body to be polished, and the body to be polished. 5. The line segment connecting a plurality of electrode columnar bodies is placed in the body to be polished so as not to come into contact with and to be always horizontal.
8. The electrolytic polishing apparatus according to any one of items 1 to 7.
いし８のいずれかに記載の電解研磨装置。9. The electrolytic polishing apparatus according to claim 1, wherein the electrode body is a cathode.
を備える、請求項１ないし９のいずれかに記載の電解研
磨装置。10. The electrolytic polishing apparatus according to claim 1, further comprising a rotating device that rotates the object to be polished.
被研磨体を回転させることができるように、適宜な間隔
をおいて配置された左右一対のローラおよびローラを含
み、被研磨体が、該ローラの回転により、正転あるいは
逆転することをできるように構成されている、請求項１
０に記載の電解研磨装置。11. The rotating device contacts the outer surface of the polishing body,
It includes a pair of left and right rollers and rollers arranged at appropriate intervals so that the object to be polished can be rotated, and the object to be polished can be rotated normally or reversely by the rotation of the rollers. 1 is configured.
The electropolishing apparatus according to item 0.
からなる、請求項１ないし９のいずれかに記載の電解研
磨装置。12. The electrolytic polishing apparatus according to claim 1, wherein the electrolytic solution is a liquid having a viscous composition.
水、エチレングリコール、クロム酸を含む強酸性の液か
らなる、請求項１ないし１０のいずれかに記載の電解研
磨装置。13. The electrolytic solution is mainly composed of phosphoric acid,
The electropolishing apparatus according to claim 1, comprising a strongly acidic liquid containing water, ethylene glycol, and chromic acid.
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| Application Number | Priority Date | Filing Date | Title |
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| JP2003000666U JP3095889U (en) | 2003-02-13 | 2003-02-13 | Electropolishing equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003000666U JP3095889U (en) | 2003-02-13 | 2003-02-13 | Electropolishing equipment |
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| Publication Number | Publication Date |
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| JP3095889U true JP3095889U (en) | 2003-08-22 |
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ID=43249790
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| JP2003000666U Expired - Fee Related JP3095889U (en) | 2003-02-13 | 2003-02-13 | Electropolishing equipment |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007533845A (en) * | 2003-11-12 | 2007-11-22 | クック・インコーポレイテッド | Electropolishing apparatus and method for medical implants |
| JP2013044019A (en) * | 2011-08-24 | 2013-03-04 | Kaneka Corp | Electrolytic polishing device |
| KR20220053143A (en) * | 2020-10-22 | 2022-04-29 | 전승언 | Composition of electrolytic polishing liquid |
| CN114921842A (en) * | 2022-03-24 | 2022-08-19 | 南京航空航天大学 | Device and method for plasma electrolytic polishing of inner wall of large rotary part |
| CN118461115A (en) * | 2024-07-10 | 2024-08-09 | 常州容导精密装备有限公司 | Electrolysis polishing equipment and method for inner wall of cylinder with special-shaped structure |
-
2003
- 2003-02-13 JP JP2003000666U patent/JP3095889U/en not_active Expired - Fee Related
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007533845A (en) * | 2003-11-12 | 2007-11-22 | クック・インコーポレイテッド | Electropolishing apparatus and method for medical implants |
| JP2013044019A (en) * | 2011-08-24 | 2013-03-04 | Kaneka Corp | Electrolytic polishing device |
| KR20220053143A (en) * | 2020-10-22 | 2022-04-29 | 전승언 | Composition of electrolytic polishing liquid |
| KR102522045B1 (en) | 2020-10-22 | 2023-04-14 | 전승언 | Composition of electrolytic polishing liquid |
| CN114921842A (en) * | 2022-03-24 | 2022-08-19 | 南京航空航天大学 | Device and method for plasma electrolytic polishing of inner wall of large rotary part |
| CN114921842B (en) * | 2022-03-24 | 2023-09-29 | 南京航空航天大学 | Device and method for polishing inner wall of large rotary part through plasma electrolysis |
| CN118461115A (en) * | 2024-07-10 | 2024-08-09 | 常州容导精密装备有限公司 | Electrolysis polishing equipment and method for inner wall of cylinder with special-shaped structure |
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