JP3093427B2 - Low reflection sheet - Google Patents
Low reflection sheetInfo
- Publication number
- JP3093427B2 JP3093427B2 JP04105428A JP10542892A JP3093427B2 JP 3093427 B2 JP3093427 B2 JP 3093427B2 JP 04105428 A JP04105428 A JP 04105428A JP 10542892 A JP10542892 A JP 10542892A JP 3093427 B2 JP3093427 B2 JP 3093427B2
- Authority
- JP
- Japan
- Prior art keywords
- sheet
- base sheet
- light
- thin film
- film layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Surface Treatment Of Optical Elements (AREA)
- Laminated Bodies (AREA)
Description
【０００１】[0001]
【産業上の利用分野】この発明は、ＣＲＴやプラズマデ
ィスプレイパネルなどのディスプレイやメーター表示機
器などの表示部の前面にフィルターとして配置された
り、額縁として利用される低反射シートに関するもので
あり、シート後方に配した文字や画像などの表示を透視
しやすくするとともに作業者自身やその背景の映り込み
を少なくして表示の視認性を良好にするものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a low-reflection sheet which is disposed as a filter on the front of a display such as a CRT or a plasma display panel or a display section such as a meter display device, or is used as a frame. It is intended to make it easier to see through the display of characters, images, and the like arranged at the rear, and to reduce the reflection of the worker himself and its background, thereby improving the visibility of the display.
【０００２】[0002]
【従来の技術】従来の低反射シートは、透光性基体シー
トの表面に微細な凹凸を形成してマット状や艶消し状と
することによって、反射光を散乱させ作業者自身やその
背景の像をぼかすようにしたものがある。2. Description of the Related Art A conventional low-reflection sheet is formed by forming fine irregularities on the surface of a light-transmitting base sheet to form a mat or mat, thereby scattering reflected light and causing the worker himself or his background to be scattered. Some have blurred images.
【０００３】あるいは、透光性基体シートの表面に透光
性基体シートの屈折率より低い屈折率を有する化合物か
らなる透明薄膜層を形成し、光の干渉を利用して反射光
を減少させるものがある。Alternatively, a transparent thin film layer made of a compound having a refractive index lower than the refractive index of the light-transmitting substrate sheet is formed on the surface of the light-transmitting substrate sheet, and the reflected light is reduced by utilizing light interference. There is.
【０００４】[0004]
【発明が解決しようとする課題】しかし、前者の透光性
基体シートの表面に微細な凹凸を形成したものは、透明
性基体シート表面への入射光全てを散乱させるので、作
業者の目にとどく反射光が減少し作業者自身や背景の映
り込みを少なくすることはできる。しかし透光性基体シ
ート後方からの透過光も散乱させてしまうので、シート
後方に配した文字や画像などの表示が暗くなったりぼや
けたりして透視しにくい。However, the former light-transmissive base sheet having fine irregularities formed on the surface thereof scatters all the light incident on the surface of the transparent base sheet. The reflected light is greatly reduced, and the reflection of the worker himself and the background can be reduced. However, since the transmitted light from behind the translucent base sheet is also scattered, the display of characters and images arranged behind the sheet becomes dark or blurred, making it difficult to see through.
【０００５】一方、後者の透光性基体シートの表面に透
明薄膜層を形成したものは、基体シート後方に配した文
字や画像などの表示を十分に透視でき、しかも透明性基
体シート面に垂直な入射光の反射光を減少させ、作業者
自身の像が作業者の目に入らないようにすることはでき
る。しかし、作業者から離れた背景の像が作業者の目に
入ってしまう。これは透光性基体シート面に垂直以外の
角度で入射してくる入射光の反射光を減少させる効果が
薄いからである。On the other hand, the latter, in which a transparent thin film layer is formed on the surface of a light-transmitting substrate sheet, allows the characters, images, and the like arranged behind the substrate sheet to be sufficiently seen through, and furthermore, is perpendicular to the transparent substrate sheet surface. It is possible to reduce the reflected light of the incident light so that the worker's own image does not enter the worker's eyes. However, a background image far from the worker enters the eyes of the worker. This is because the effect of reducing the reflected light of the incident light that enters the light-transmitting substrate sheet surface at an angle other than perpendicular is small.
【０００６】[0006]
【課題を解決するための手段】この発明は、以上の課題
を解決するために、透光性基体シートの少なくとも一方
の面に微細な凹凸が形成され、その凹凸上に透光性基体
シートの屈折率より低い屈折率を有するフッソ系化合物
からなる膜厚が５００〜５０００Åの範囲にある透明薄
膜層が形成されているように構成した。According to the present invention, in order to solve the above problems, fine irregularities are formed on at least one surface of a translucent base sheet, and the translucent base sheet is formed on the irregularities. The structure was such that a transparent thin film layer made of a fluorine compound having a refractive index lower than the refractive index and having a thickness in the range of 500 to 5000 ° was formed.
【０００７】[0007]
【０００８】[0008]
【実施例】図１はこの発明の低反射シートの一実施例を
示す断面図である。図２、図３はこの発明の低反射シー
トの他の実施例を示す断面図である。FIG. 1 is a sectional view showing one embodiment of the low reflection sheet of the present invention. 2 and 3 are sectional views showing another embodiment of the low reflection sheet of the present invention.
【０００９】透光性基体シート１は、ＡＳ樹脂、アクリ
ル系樹脂、ポリカーボネイト、ポリ塩化ビニルなどの透
明な有機材料からなるシートや、ガラスなどの透明な無
機材料からなるシートがある。The translucent base sheet 1 includes a sheet made of a transparent organic material such as AS resin, acrylic resin, polycarbonate and polyvinyl chloride, and a sheet made of a transparent inorganic material such as glass.
【００１０】微細な凹凸２が、透光性基体シート１の少
なくとも一方の面に形成されている。透光性基体シート
１に微細な凹凸２を形成する方法には、スタンピング法
やキャスティング法等がある。他には、ヘアライン加工
やサンドブラスト加工、プレス加工などにより透光性基
体シート１表面に直接凹凸２形成する方法でもよい。あ
るいは、エッチング剤を用いて透光性基体シート１表面
に化学的に凹凸２を形成してもよい。あるいは、印刷法
やラミネート法によって微細な凹凸２を有する凹凸層４
を平滑な透光性基体シート１表面に形成してもよい（図
３参照）。The fine irregularities 2 are formed on at least one surface of the translucent base sheet 1. As a method of forming the fine irregularities 2 on the translucent base sheet 1, there are a stamping method, a casting method, and the like. Alternatively, a method of forming the irregularities 2 directly on the surface of the translucent base sheet 1 by a hairline process, a sandblast process, a press process, or the like may be used. Alternatively, the irregularities 2 may be formed chemically on the surface of the translucent base sheet 1 using an etching agent. Alternatively, an uneven layer 4 having fine unevenness 2 by a printing method or a laminating method.
May be formed on the surface of the smooth translucent base sheet 1 (see FIG. 3).
【００１１】透明薄膜層３が、微細な凹凸２表面が形成
された透光性基体シート１に形成されている。透明薄膜
層３は、透光性基体シート１の表面に形成され、透光性
基体シート１の屈折率よりも低い屈折率を有し透明性に
すぐれる化合物からなる。透明薄膜層３は、透光性基体
シート１の片面だけに形成されてもよいし、両面に形成
されてもよい（図２参照）。形成方法としては、ディッ
ピング法、スピンコーティング法、転写法、真空法など
がある。A transparent thin film layer 3 is formed on a translucent base sheet 1 on which fine irregularities 2 are formed. The transparent thin film layer 3 is formed on the surface of the translucent base sheet 1 and is made of a compound having a refractive index lower than that of the translucent base sheet 1 and having excellent transparency. The transparent thin film layer 3 may be formed on only one surface of the translucent base sheet 1, or may be formed on both surfaces (see FIG. 2). Examples of the forming method include a dipping method, a spin coating method, a transfer method, and a vacuum method.
【００１２】透明薄膜層３は透光性基体シート１に微細
な凹凸２に沿わして透明薄膜層３表面も凹凸となるよう
に形成してもよい（図１参照）。あるいは透光性基体シ
ート１に微細な凹凸２を埋めて表面を平滑にしてもよい
（図２参照）。The transparent thin film layer 3 may be formed on the transparent base sheet 1 so that the surface of the transparent thin film layer 3 becomes uneven along the fine irregularities 2 (see FIG. 1). Alternatively, fine irregularities 2 may be embedded in the translucent base sheet 1 to smooth the surface (see FIG. 2).
【００１３】透光性基体シート１の屈折率よりも低い屈
折率を有し透明性にすぐれるフッソ系化合物としては、
有機あるいは無機のフッ素系化合物がある。有機フッソ
系化合物としては、アモルファスパーフロロポリマーな
どがある。無機フッ素系化合物としては、フッ化マグネ
シウムなどがある。The fluorine-based compound having a refractive index lower than that of the translucent base sheet 1 and having excellent transparency is as follows.
There are organic or inorganic fluorine compounds. Examples of the organic fluorinated compound include an amorphous perfluoropolymer. Examples of the inorganic fluorine compound include magnesium fluoride.
【００１４】透明薄膜層３の膜厚は、透明薄膜層３を構
成する化合物の屈折率により変える必要があり以下の式
に従う膜厚を設定するとよい。 n×d＝λ／４ あるいは n×d＝３λ／４ （ただし、nは化合物の屈折率、dは化合物の膜厚、λは
低反射中心波長をそれぞれ示す。）The thickness of the transparent thin film layer 3 needs to be changed according to the refractive index of the compound constituting the transparent thin film layer 3, and the thickness may be set according to the following equation. n × d = λ / 4 or n × d = 3λ / 4 (where n is the refractive index of the compound, d is the film thickness of the compound, and λ is the low reflection center wavelength, respectively)
【００１５】実例１ ポリカーボネイトからなる透光性基体シート（縦200×
横200×厚さ2mm）の片面がスタンピング法によって凹凸
表面とされ、この透光性基体シートの両面に屈折率が1.
34のフッ素系化合物（旭硝子株式会社製サイトップ）か
らなる透明薄膜層が乾燥膜厚1026Åになるようにディッ
プコートされている。この低反射シートは、作業者自身
やその背後の像が直接目に入ることが防止されると共
に、反射光が減少し、透過光量が増加したため背後に配
置した文字、画像が明るく見やすくなった。Example 1 A translucent base sheet made of polycarbonate (length 200 ×
One side (width 200 mm × thickness 2 mm) is made uneven by a stamping method, and both sides of this translucent base sheet have a refractive index of 1.
A transparent thin film layer made of 34 fluorine compounds (Cytop manufactured by Asahi Glass Co., Ltd.) is dip-coated so as to have a dry film thickness of 1026 mm. With this low reflection sheet, the worker himself and the image behind it were prevented from directly entering the eyes, and the reflected light was reduced and the amount of transmitted light was increased, so that the characters and images placed behind became bright and easy to see.
【００１６】実例２ メタアクリル樹脂からなる透光性基体シート（縦200×
横200×厚さ2mm）の両面がキャスティング法によって凹
凸表面とされ、この透光性基体シートの両面に屈折率が
1.31のフッ素化合物（デュポン社製TEFLON AF）からな
る透明薄膜層が乾燥膜厚1049Åになるようにディップコ
ートされている。この低反射シートは、透明薄膜層のな
いものに比べて波長550nmの光に対して、反射率が0.6％
に減少した。Example 2 A translucent base sheet made of methacrylic resin (length 200 ×
Both sides (200 mm wide x 2 mm thick) are made uneven by the casting method.
A transparent thin film layer made of a fluorine compound of 1.31 (TEFLON AF manufactured by DuPont) is dip-coated to a dry film thickness of 1049 mm. This low-reflection sheet has a reflectance of 0.6% for light with a wavelength of 550 nm compared to a sheet without a transparent thin film layer.
Decreased to.
【００１７】[0017]
【発明の効果】この発明の低反射シートは、透光性基体
シートの微細な凹凸上に透光性基体シートより屈折率が
低いフッソ系化合物からなる膜厚が５００〜５０００Å
の範囲にある透明薄膜層を形成しているので、透明性基
体シート面に垂直な入射光および垂直以外の角度で入射
してくる入射光についての反射光を減少させることがで
きる。したがって、作業者自身やその背景の像の映り込
みが少なくなり表示の視認性が良好になる。The low-reflection sheet of the present invention has a thickness of 500 to 5000 ° made of a fluorine-based compound having a lower refractive index than that of the light-transmitting substrate sheet on the fine irregularities of the light-transmitting substrate sheet.
Since the transparent thin film layer in the range described above is formed, it is possible to reduce reflected light with respect to incident light perpendicular to the surface of the transparent base sheet and incident light incident at an angle other than perpendicular. Therefore, the reflection of the image of the worker himself or the background thereof is reduced, and the visibility of the display is improved.
【００１８】しかも、凹凸上にフッソ系化合物からなる
膜厚が５００〜５０００Åの範囲にある透明薄膜層を有
しているので、透光性基体シート後方からの透過光の散
乱を緩和し透光性基体シートの全透過光量を増加させ
る。したがって、シート後方に配した文字や画像などの
表示を明るく透視することができる。In addition, a fluorine compound is formed on the unevenness.
Since the transparent thin film layer has a thickness in the range of 500 to 5000 °, scattering of transmitted light from the back of the translucent base sheet is reduced, and the total amount of transmitted light of the translucent base sheet is increased. Therefore, the display of characters, images, and the like arranged behind the seat can be seen brightly.
【図面の簡単な説明】[Brief description of the drawings]
【図１】 この発明の低反射シートの一実施例を示す断
面図である。FIG. 1 is a sectional view showing one embodiment of a low reflection sheet of the present invention.
【図２】 この発明の低反射シートの他の実施例を示す
断面図である。FIG. 2 is a sectional view showing another embodiment of the low reflection sheet of the present invention.
【図３】 この発明の低反射シートの他の実施例を示す
断面図である。FIG. 3 is a sectional view showing another embodiment of the low reflection sheet of the present invention.
１ 透光性基体シート ２ 凹凸 ３ 透明薄膜層 ４ 凹凸層 DESCRIPTION OF SYMBOLS 1 Transparent base sheet 2 Irregularity 3 Transparent thin film layer 4 Irregularity layer
Claims (1)
に微細な凹凸が形成され、その凹凸上に透光性基体シー
トの屈折率より低い屈折率を有するフッソ系化合物から
なる膜厚が５００〜５０００Åの範囲にある透明薄膜層
が形成されていることを特徴とする低反射シート。1. A light-transmitting substrate sheet having fine irregularities formed on at least one surface thereof, and a film made of a fluorine-based compound having a refractive index lower than the refractive index of the light-transmitting substrate sheet on the irregularities. A low-reflection sheet comprising a transparent thin film layer having a thickness in the range of 5000 ° .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP04105428A JP3093427B2 (en) | 1992-03-30 | 1992-03-30 | Low reflection sheet |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP04105428A JP3093427B2 (en) | 1992-03-30 | 1992-03-30 | Low reflection sheet |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH05278157A JPH05278157A (en) | 1993-10-26 |
| JP3093427B2 true JP3093427B2 (en) | 2000-10-03 |
Family
ID=14407335
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP04105428A Expired - Lifetime JP3093427B2 (en) | 1992-03-30 | 1992-03-30 | Low reflection sheet |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3093427B2 (en) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07333404A (en) * | 1994-02-15 | 1995-12-22 | Dainippon Printing Co Ltd | Optical functional membrane, optical functional film, antidazzle antireflection film, its production, polarizing plate and liquid crystal display device |
| WO1997000168A1 (en) * | 1995-06-14 | 1997-01-03 | Mitsubishi Rayon Co., Ltd. | Resin sheet, method and apparatus for producing the same, surface light source, and laminated body |
| JP2002207104A (en) * | 2000-10-17 | 2002-07-26 | Nissha Printing Co Ltd | Antireflection member, method for producing the same and antireflection transfer material |
| JP2005165252A (en) * | 2003-11-14 | 2005-06-23 | Sony Corp | Optical functionality diffusion board, reflection screen and its manufacturing method |
| JP4553237B2 (en) * | 2004-06-07 | 2010-09-29 | 日東電工株式会社 | Anti-glare antireflection film, optical element and image display device |
| JP4988282B2 (en) * | 2006-09-22 | 2012-08-01 | キヤノン電子株式会社 | Optical filter |
| US8665520B2 (en) | 2006-08-30 | 2014-03-04 | Canon Denshi Kabushiki Kaisha | Neutral density optical filter and image pickup apparatus |
| JP2009088503A (en) * | 2007-09-14 | 2009-04-23 | Mitsubishi Chemicals Corp | Laminated cover substrate for solar cell, solar cell and method for manufacturing the laminated cover substrate for solar cell |
| JP4859985B2 (en) * | 2007-11-27 | 2012-01-25 | パナソニック株式会社 | Plasma display panel |
| CN103176637B (en) * | 2011-12-26 | 2016-06-08 | 群康科技(深圳)有限公司 | The manufacture method of display panel and decoration frame thereof and the touch control display system of application |
| WO2019017072A1 (en) * | 2017-07-21 | 2019-01-24 | Ａｇｃ株式会社 | Front panel for display device |
-
1992
- 1992-03-30 JP JP04105428A patent/JP3093427B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH05278157A (en) | 1993-10-26 |
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| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20000711 |