JP3075782B2 - Flat cable manufacturing method - Google Patents

Flat cable manufacturing method

Info

Publication number
JP3075782B2
JP3075782B2 JP03199494A JP19949491A JP3075782B2 JP 3075782 B2 JP3075782 B2 JP 3075782B2 JP 03199494 A JP03199494 A JP 03199494A JP 19949491 A JP19949491 A JP 19949491A JP 3075782 B2 JP3075782 B2 JP 3075782B2
Authority
JP
Japan
Prior art keywords
flat cable
polyamic acid
film
acid film
imidization
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP03199494A
Other languages
Japanese (ja)
Other versions
JPH0547244A (en
Inventor
義之 山森
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co Ltd filed Critical Sumitomo Bakelite Co Ltd
Priority to JP03199494A priority Critical patent/JP3075782B2/en
Publication of JPH0547244A publication Critical patent/JPH0547244A/en
Application granted granted Critical
Publication of JP3075782B2 publication Critical patent/JP3075782B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0393Flexible materials
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings
    • H05K3/281Applying non-metallic protective coatings by means of a preformed insulating foil

Landscapes

  • Insulated Conductors (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、接着剤層を持たないフ
ラットケーブルの製造方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a flat cable having no adhesive layer.

【0002】[0002]

【従来の技術】従来のフラットケーブルは、複数の導体
を所定間隔に配置し塩化ビニールやポリエチレンテレフ
タレート(PET)などの熱可塑性樹脂を押し出し被覆
するか絶縁テープで挟着焼成するなどして得られる。こ
のようなフラットケーブルは安価で生産性に優れるもの
の、自動車のエンジンまわりやオイル浸漬部に使用する
ためには耐熱性や耐薬品性が充分であるとはいえない。
係る問題点を解決するために四フッ化エチレン(PTF
E)によるフラットケーブルなども実用化されている
が、耐熱性や支持性といった面で充分とはいえず、この
様な要求を満足する素材は実用化されていなかった。
2. Description of the Related Art A conventional flat cable is obtained by arranging a plurality of conductors at predetermined intervals and extruding and coating a thermoplastic resin such as vinyl chloride or polyethylene terephthalate (PET) or sandwiching and firing with an insulating tape. . Although such a flat cable is inexpensive and excellent in productivity, it cannot be said that heat resistance and chemical resistance are sufficient for use around an engine of an automobile or an oil-immersed portion.
In order to solve such problems, tetrafluoroethylene (PTF)
Although the flat cable according to E) has been put to practical use, it cannot be said that it is sufficient in terms of heat resistance and supportability, and a material satisfying such requirements has not been put to practical use.

【0003】[0003]

【発明が解決しようとする課題】本発明の目的とすると
ころは、ポリイミドの本来持っている耐アルカリ性、耐
溶剤性、耐熱性、電気特性をそのまま生かした、接着剤
層のないポリイミドフラットケーブルの製造方法を提供
するものである。
SUMMARY OF THE INVENTION An object of the present invention is to provide a polyimide flat cable without an adhesive layer, which makes use of the inherent alkali resistance, solvent resistance, heat resistance, and electrical characteristics of polyimide. It is intended to provide a manufacturing method.

【0004】[0004]

【課題を解決するための手段】本発明は、ポリイミドの
接着剤層のない2層フレキシブル印刷回路用基板上に導
体線を複数対並列配置したパターンを形成し、この配線
上に離型フィルム上に形成されたポリアミック酸フィル
ムのアミック酸フィルム面を合わせて加熱・圧着後、加
熱・乾燥イミド化することを特徴とするフラットケーブ
ルの製造方法である。
SUMMARY OF THE INVENTION According to the present invention, a pattern in which a plurality of pairs of conductor wires are arranged in parallel on a two-layer flexible printed circuit board without a polyimide adhesive layer is formed. A flat cable manufacturing method characterized by heating and pressing the polyamic acid film surfaces of the polyamic acid film formed as described above, and then heating and drying imidization.

【0005】即ち、離型フィルム上にポリアミック酸溶
液を塗布し、タックフリー状態になるまで乾燥し、ポリ
アミック酸フィルムを形成する。その後、このフィルム
同士をアミック酸フィルム面を合わせて、並列配置した
複数対の平角導体を間に挟み、加熱・圧着する。このと
き、必要に応じて、離型フィルムを剥離したポリアミッ
ク酸フィルムを所定の枚数間に挿入して、より厚いポリ
アミック酸フィルムを得ることができる。また圧着後、
片側の離型フィルムを剥がし、同様のことを繰返してさ
らに厚いものを得ることもできる。必要に応じ、その離
型フィルムのついたポリアミック酸フィルムを通常の方
法、例えば、打ち抜き、切断、アルカリエッチング、レ
ーザー等によって離型フィルムと共に或はポリアミック
酸フィルムのみを開孔させて孔加工を行い、開孔部を有
するフラットケーブルとすることもできる。孔加工が終
了した後、離型フィルムを剥離し、充分に加熱・乾燥さ
せることによりイミド化を行う。
That is, a polyamic acid solution is applied on a release film and dried until a tack-free state is obtained, thereby forming a polyamic acid film. Thereafter, the films are heated and pressed together with the amic acid film surfaces aligned, sandwiching a plurality of pairs of rectangular conductors arranged in parallel. At this time, if necessary, the polyamic acid film from which the release film has been peeled can be inserted between a predetermined number of sheets to obtain a thicker polyamic acid film. After crimping,
The release film on one side can be peeled off, and the same can be repeated to obtain a thicker film. If necessary, the polyamic acid film with the release film is subjected to hole processing by opening the polyamic acid film together with the release film or only the polyamic acid film by a usual method, for example, punching, cutting, alkali etching, laser or the like. And a flat cable having an opening. After the hole processing is completed, the release film is peeled off, and imidization is performed by sufficiently heating and drying.

【0006】或はポリイミドの2層フレキシブル印刷回
路用基板にエッチングなど通常の方法により導体線が複
数対並列配置したパターンを形成し、この配線上に離型
フィルム上に形成されたポリアミック酸フィルムのアミ
ック酸フィルム面を重ね合わせて加熱・圧着後、加熱・
乾燥イミド化することによりフラットケーブルとするこ
ともできる。
Alternatively, a pattern in which a plurality of pairs of conductor wires are arranged in parallel on a polyimide two-layer flexible printed circuit board by an ordinary method such as etching is formed, and a polyamic acid film formed on a release film is formed on the wiring. After heating and pressing the amic acid film surface on top of each other,
A flat cable can be obtained by dry imidization.

【0007】本発明において、ポリアミック酸溶液を乾
燥させ、半硬化状態のポリアミック酸フィルムを形成さ
せる条件としては、80〜200℃、5〜30分が適当である。
これより温度が低く時間が短い場合、導体箔と加熱圧着
する際、流動性が大きく、開孔部でのにじみ、しみ出し
が大きく、フィルム厚のバラツキも大きくなり、イミド
化後の寸法変化が大きくなる。またこれより温度が高く
時間が長い場合、導体箔と加熱・圧着する際、流動性が
小さすぎ、導体箔とのピ−ル強度が低下し、ボイドの発
生が多くなる。アミック酸1枚の塗布厚みとしては、イ
ミド化後の厚みが50μm以下が適当である。これより厚
い場合は、イミド化に伴う収縮による応力が離型フィル
ムの支持力を上回り、乾燥中に大きなカールを生じさせ
る。またフィルム層が厚いため溶剤の蒸発速度が遅く、
生産性が著しく低下する。ポリアミック酸フィルム同士
を導体箔に加熱・圧着する条件としては、プレス形式の
場合は70〜200℃、5〜100kg/cm2、5〜30分、ロ−ル式
ラミネ−タの場合は70〜200℃、1〜50kg/cm、0.1〜10m
/分の条件が適当であり、特に温度としてはポリアミッ
ク酸フィルムの乾燥温度より10〜30℃低い温度で実施す
ることが揮発物の発生もなく望ましい。
In the present invention, the conditions for drying the polyamic acid solution to form a semi-cured polyamic acid film are preferably 80 to 200 ° C. and 5 to 30 minutes.
If the temperature is lower and the time is shorter than this, when heat-pressing with the conductor foil, the fluidity is large, the bleeding at the opening, the seepage is large, the variation in the film thickness is large, and the dimensional change after imidization is large. growing. If the temperature is higher and the time is longer than this, the fluidity is too small when heating and pressing with the conductor foil, the peel strength with the conductor foil is reduced, and the occurrence of voids increases. It is appropriate that the thickness of one amic acid be 50 μm or less after imidization. If the thickness is larger than this, the stress due to the shrinkage due to imidization exceeds the supporting force of the release film, and a large curl is generated during drying. In addition, the evaporation rate of the solvent is slow because the film layer is thick,
Productivity drops significantly. The conditions for heating and pressure bonding the polyamic acid films to the conductor foil are as follows: 70 to 200 ° C for press type, 5 to 100 kg / cm 2 for 5 to 30 minutes, and 70 to 200 for roll type laminator. 200 ℃, 1-50kg / cm, 0.1-10m
/ Min is appropriate, and the temperature is preferably 10 to 30 ° C. lower than the drying temperature of the polyamic acid film without generation of volatiles.

【0008】本発明におけるポリアミック酸は、通常ジ
アミンと酸無水物とを反応させることにより得られる。
ジアミンとしては、フェニレンジアミン、ジアミノジフ
ェニルメタン、ジアミノジフェニルスルホン、ジアミノ
ジフェニルエ−テルなどを、酸無水物としては、トリメ
リット酸無水物、ピロメリット酸二無水物、ビフェニル
テトラカルボン酸二無水物、ベンゾフェノンテトラカル
ボン酸二無水物などを使用することができ、それぞれ1
種又は2種以上を適宜組み合わせて用いることができ
る。ポリアミック酸フィルムの状態におけるイミド化率
は10〜50%、望むべくは20〜40%が好ましい。
The polyamic acid of the present invention is usually obtained by reacting a diamine with an acid anhydride.
Examples of the diamine include phenylenediamine, diaminodiphenylmethane, diaminodiphenylsulfone, and diaminodiphenyl ether.Examples of the acid anhydride include trimellitic anhydride, pyromellitic dianhydride, biphenyltetracarboxylic dianhydride, and benzophenone. For example, tetracarboxylic dianhydride can be used.
Species or a combination of two or more can be used as appropriate. The imidation ratio in the state of the polyamic acid film is preferably from 10 to 50%, and more preferably from 20 to 40%.

【0009】離型フィルムとして用いることのできる材
料としては、ポリプロピレン、ポリエステル、ポリエ−
テルサルフォン、ポリイミド、ポリエチレン等のプラス
チックフィルムがあげられる。
Materials that can be used as the release film include polypropylene, polyester, and polyester.
Plastic films such as tersulfone, polyimide, and polyethylene can be given.

【0010】導体層として用いることのできる材料とし
ては、銅、アルミニウム、コンスタンタン、ニッケル等
の金属箔が挙げられる。
Materials that can be used for the conductor layer include metal foils such as copper, aluminum, constantan, and nickel.

【0011】[0011]

【作用】本発明によれば、離型フィルム上に半硬化させ
たポリアミック酸フィルムを形成させ、さらに並列配置
した複数対の平角導体を間に挟みこのフィルム同士をア
ミック酸フィルム面を合わせて加熱・圧着後、加熱・乾
燥イミド化するか、或はポリイミドの2層フレキシブル
印刷回路用基板にエッチングなど通常の方法により導体
線が複数対並列配置したパターンを形成し、この配線上
に離型フィルム上に形成されたポリアミック酸フィルム
のアミック酸フィルム面を重ね合わせて加熱・圧着後、
加熱・乾燥イミド化することにより、容易に、生産性・
収率よく、ポリイミドの本来持っている耐アルカリ性、
耐溶剤性、耐熱性、電気特性をそのまま生かした、接着
剤層のないポリイミドフラットケーブルを得ることがで
きる。
According to the present invention, a semi-cured polyamic acid film is formed on a release film, and a plurality of pairs of rectangular conductors arranged in parallel are interposed therebetween.・ After crimping, heat-dry imidization, or form a pattern in which a plurality of pairs of conductor wires are arranged in parallel by a normal method such as etching on a polyimide two-layer flexible printed circuit board, and release film on this wiring After heating and pressing the amic acid film surface of the polyamic acid film formed on top,
By heating and drying imidization, productivity and
Good yield, the inherent alkali resistance of polyimide,
It is possible to obtain a polyimide flat cable having no adhesive layer, utilizing the solvent resistance, heat resistance, and electric characteristics as they are.

【0012】[0012]

【実施例】温度計、撹拌装置、還流コンデンサ−及び乾
燥窒素ガス吹込み口を備えた4つ口セパラブルフラスコ
に、精製した無水のパラフェニレンジアミン108gと4,
4'-ジアミノジフェニルエ−テル200gをとり、これに無
水のN-メチル-2-ピロリドン90重量%とトルエン10重量
%の混合溶剤を、全仕込原料中の固形分割合が20重量%
になるだけの量を加えて溶解した。乾燥窒素ガスは反応
の準備段階より生成物取り出しまでの全工程にわたり流
しておいた。次いで、精製した無水の3,3',4,4'-ビフェ
ニルテトラカルボン酸二無水物294gとピロメリット酸
二無水物218gを撹拌しながら少量ずつ添加するが、発
熱反応であるため、外部水槽に約15℃の冷水を循環させ
てこれを冷却した。添加後、内部温度を20℃に設定し、
5時間撹拌し、反応を終了してポリアミック酸溶液を得
た。
EXAMPLE In a four-neck separable flask equipped with a thermometer, a stirrer, a reflux condenser and a dry nitrogen gas inlet, 108 g of purified anhydrous paraphenylenediamine was added.
200 g of 4'-diaminodiphenyl ether was taken, and a mixed solvent of 90% by weight of anhydrous N-methyl-2-pyrrolidone and 10% by weight of toluene was added thereto.
Was added and dissolved. Dry nitrogen gas was allowed to flow throughout the entire process from the preparation of the reaction to the removal of the product. Next, 294 g of purified anhydrous 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride and 218 g of pyromellitic dianhydride are added little by little with stirring, but the reaction is exothermic. This was cooled by circulating cold water at about 15 ° C. After the addition, set the internal temperature to 20 ° C,
After stirring for 5 hours, the reaction was completed to obtain a polyamic acid solution.

【0013】市販の銅箔上に、このポリアミック酸溶液
をスピンナ−でイミド化後の厚みが50μmになるように
塗布し、乾燥・イミド化して、2層フレキシブル印刷回
路用基板を得た。次いで並列配線パターン加工を施し、
2層フレキシブル印刷回路板とし、導体層側へ前述の銅
箔の代りにポリエステルフィルムを用いて110℃、15
分乾燥して得た離型フィルムの付いたポリアミック酸フ
ィルムのアミック酸フィルムの面を合わせ加熱・圧着
を、90℃、10kg/cm、1m/分の条件でロ−ル式ラミネ
−タ−を使用して行った後、離型フィルムを剥し380℃
で1時間加熱を行い、イミド化を完結した。得られたフ
ラットケーブルの特性は、優れた耐熱性(半田耐熱、36
0℃・1分)、耐薬品性を有していた。
This polyamic acid solution was applied on a commercially available copper foil so as to have a thickness of 50 μm after imidization by a spinner, dried and imidized to obtain a two-layer flexible printed circuit board. Next, parallel wiring pattern processing is performed,
Use a two-layer flexible printed circuit board, and use a polyester film instead of the above-mentioned copper foil on the conductor layer side at 110 ° C and 15 ° C.
The surface of the amic acid film of the polyamic acid film with the release film obtained by drying for minutes is heated and pressed, and a roll laminator is applied at 90 ° C., 10 kg / cm, 1 m / min. After using, peel off the release film 380 ℃
For 1 hour to complete the imidization. The characteristics of the obtained flat cable are excellent in heat resistance (solder heat resistance, 36
0 ° C. for 1 minute) and had chemical resistance.

【0014】[0014]

【発明の効果】本発明によれば、接着剤層を持たないポ
リイミド層のみからなるフラットケーブルを得ることが
でき、さらに、連続シートを用いた連続工程にも容易に
適用できるなど、工業的なフラットケーブルの製造方法
として好適なものである。
According to the present invention, a flat cable consisting of only a polyimide layer having no adhesive layer can be obtained, and it can be easily applied to a continuous process using a continuous sheet. This is suitable as a method for manufacturing a flat cable.

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 ポリイミドの接着剤層のない2層フレキ
シブル印刷回路用基板上に導体線を複数対並列配置した
パターンを形成し、この配線上に離型フィルム上に形成
されたポリアミック酸フィルムのアミック酸フィルム面
を合わせて加熱・圧着後、加熱・乾燥イミド化すること
を特徴とするフラットケーブルの製造方法。
1. A pattern in which a plurality of conductor wires are arranged in parallel on a two-layer flexible printed circuit board without a polyimide adhesive layer, and a polyamic acid film formed on a release film is formed on the wiring. A method for producing a flat cable, which comprises heating and pressing the amic acid film surfaces together, followed by heating and drying imidization.
JP03199494A 1991-08-08 1991-08-08 Flat cable manufacturing method Expired - Fee Related JP3075782B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP03199494A JP3075782B2 (en) 1991-08-08 1991-08-08 Flat cable manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP03199494A JP3075782B2 (en) 1991-08-08 1991-08-08 Flat cable manufacturing method

Publications (2)

Publication Number Publication Date
JPH0547244A JPH0547244A (en) 1993-02-26
JP3075782B2 true JP3075782B2 (en) 2000-08-14

Family

ID=16408752

Family Applications (1)

Application Number Title Priority Date Filing Date
JP03199494A Expired - Fee Related JP3075782B2 (en) 1991-08-08 1991-08-08 Flat cable manufacturing method

Country Status (1)

Country Link
JP (1) JP3075782B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008282713A (en) * 2007-05-11 2008-11-20 Fujikura Ltd Flat wiring member

Also Published As

Publication number Publication date
JPH0547244A (en) 1993-02-26

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