JP3052801B2 - Slitting spacer - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a slitter spacer used for adjusting the interval between slitter blades in a slitter facility for shearing a coil material such as a steel plate or an Al plate to a predetermined width. And a spacer made of an Al alloy that is lightweight and has excellent dimensional stability.

[0002]

2. Description of the Related Art A slitter spacer is a cylindrical replacement part used for setting a coil cutting width to a predetermined value, and is conventionally made of steel such as bearing steel such as SUJ2 or steel for mechanical structure such as S45C. Spacers have been used. still,
In the slitter line, a wide variety of products are produced to meet the diverse requirements of customers, and the frequency of spacer replacement for changing coil cutting width is high. May be done. However, due to the heavy weight of the steel spacer, the work efficiency of the setup change is low, and there is also a problem in terms of safety. Demands for weight reduction of the spacer are increasing.

[0003] Therefore, a spacer made of synthetic resin (Japanese Utility Model Application Laid-open No.
8-93419) or a spacer using a casting material or die-casting of an Al alloy (for example, JP-A-4-29492).
No. 0, hereinafter referred to as an Al alloy cast material spacer). By using a synthetic resin or an Al alloy casting material for the base material of the spacer, the weight of the spacer can be reduced. However, in the slitter equipment, since the spacer and the slitter blade are fixed by being tightened with a force of 20 to 30 t or more from both ends, the shape of the spacer gradually increases with time in the synthetic resin spacer or the Al alloy cast material spacer. This causes a change in the dimensions of the cutting width.

Therefore, in the above-mentioned synthetic resin spacer, a plurality of metal pins are penetrated and fixed in the axial direction,
The dimensional accuracy is maintained, and in the case of the Al alloy cast material spacer as well, it is shown that it is desirable to embed a metal core having compression resistance in the axial direction. However, embedding the metal pins (or metal cores) by drilling a plurality of holes in the cylindrical spacer body not only increases the cost of the spacer, but also deforms the base material when used for a long period of time. This raises the problem that the parallelism of both end faces of the spacer is deteriorated, and the width accuracy of the spacer is at an unsatisfactory level, or that the spacer does not enter the mounting shaft. That is, the synthetic resin spacer and the Al alloy cast material spacer have a problem of poor dimensional stability.

Further, it has been pointed out that the above-mentioned synthetic resin spacer has a problem that the surface is easily damaged and the appearance is impaired. The fact that the surface is easily damaged is the same as in the case of the Al alloy cast material spacer, and a method of forming an anodized film on the surface has been proposed, but since the hardness of the anodized film is at most about Hv400, Again, there was a problem that the scratch resistance was low.

Further, in the case of a frequently exchanged spacer, a collision may occur with surrounding steel members at the time of setup change.
The requirement that no deep scratches or dents that affect the dimensions occur (hereinafter referred to as dent resistance) can also be cited as a required characteristic, but the Al alloy cast material spacer is not satisfactory in terms of dent resistance. Was.

[0007]

SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and provides a spacer for a slitter, which is a lightweight Al alloy-based spacer and has excellent dimensional stability. A second object is to provide a slitter spacer having excellent scratch resistance and dent resistance.

[0008]

The slitter spacer of the present invention, which has solved the first problem, is a cylindrical spacer made of an Al alloy as a base material and has a residual stress of ± 60 N / mm ^{2 at} room temperature. The gist of the invention is that it is made of an Al alloy within the range.

In order to solve the second problem,
If a hard film having a hardness of Hv500 or more is formed on at least both end surfaces of the slitter spacer based on an Al alloy,
In order to improve the scratch resistance and the dent resistance, the hardness (Hv) of the base material and the thickness (Tμm) of the hard film satisfy the following conditional expression. It may be configured as follows. Hv ≧ 285 / T + 50

Further, in the case of a frequently exchanged spacer, a collision may occur with surrounding steel members at the time of setup change.
One of the required characteristics is that the hard layer formed on the surface does not crack or peel due to impact (hereinafter referred to as impact resistance). If an electric Ni-P-based plating layer is formed as the hard film, a slitter spacer having excellent impact resistance can be obtained.

[0011]

BEST MODE FOR CARRYING OUT THE INVENTION The present inventors first develop a spacer having excellent dimensional stability on the assumption that an Al alloy is used as a base material in order to reduce the weight of a slitter spacer. We conducted intensive research for the purpose. As a result, in the conventional Al alloy cast material spacer, heat treatment is performed to obtain a predetermined strength, but the residual stress generated at this time is too large, and the stress is gradually increased by repeated use over a long period of time. Is released, distorting the spacer,
It was found that the dimensions had been changed. In other words, by adopting an Al alloy having a residual stress of not more than a predetermined value for the base material of the spacer, the Al alloy having a residual stress of 20 to 30 is attached to the slitter.
The present inventors have found that the dimensions can be maintained for a long period of time even when tightened with a force that exceeds t.

Accordingly the present invention, the residual stress at room temperature is, at a tensile stress (+) + 60N / mm ² or less, compressive stress (-) is at -60N / mm ² or more, i.e., ± 60
It is necessary to be within N / mm ² . If the residual stress exceeds ± 60 N / mm ² , the spacer is repeatedly used for a long period of time, whereby the stress is gradually released, giving distortion to the spacer, changing the dimensions, and deteriorating the parallelism of the spacer end face. Or the spacer cannot be mounted on the shaft.

As a specific method for reducing the residual stress, (1) raising the water temperature during quenching (for example, 60 ° C.)
(The above water or boiling water is used), (2) quenching using a solvent such as polyalkylene glycol, (3) quenching treatment by uphill quenching method, (4) 1 to 5% immediately after quenching Representatively, there are four methods of adding a permanent strain of In the above method (1), if the water temperature is made uniform, quenching unevenness hardly occurs, but strength and hardness tend to decrease. The above-described methods (2) and (3) can be expected to be effective if they are thin, but the spacers are relatively thick, about 20 to 30 mm, so that sufficient effects cannot be obtained. In the spacer to be processed, distortion tends to occur during the processing, and it takes time to process. Further, the method (3) requires special equipment and the like, and is expensive. The above method (4) is a method capable of inexpensively and stably performing the residual stress. In particular, for example, in the case of a forged material, the residual stress within ± 60 N / mm ^{2 is} obtained by applying a compression process of 3 to 4%. Can be

Therefore, in the present invention, in the heat treatment step for imparting a predetermined strength or hardness to the Al alloy spacer, the residual stress is reduced by adopting a tempering method including a step of reducing the residual stress. ± 60N / mm ²
It is recommended to control within.

Specifically, A2014-T652, A2
017-T451, A2024-T351, A4032
-T651, A6061-T652, A7050-T7
Al alloys such as 451, A7075-T652, and A7075-T73 may be used.

In the case of a cast material, if compression processing is performed, cracks tend to occur from the surface of the structure, so that the method (4) is difficult to apply, and the methods (1), (2) and (3) described above are difficult to apply. It is conceivable to reduce the residual stress by adopting any one of the above, but the strength and hardness are reduced.

Further, when the tensile strength is too low, or when there is a portion where stress concentrates in the base material, it is considered that distortion due to aging is promoted. Therefore, when a cast material and a forged material are compared with each other, it is preferable to use a forged material because stress is easily concentrated in a cast material in which tensile strength is low and soot during casting is unavoidable.

As the Al alloy used for the substrate in the present invention, a non-heat-treated Al alloy may be used.
Extruded materials such as 5053. In addition, the above-mentioned non-heat-treatable Al alloy can be subjected to annealing to reduce the residual stress.

In the case of a solid aluminum alloy material, the surface is easily scratched to impair the appearance, and some scratches may adversely affect the standard dimensions of the slitter spacer. Therefore, it is recommended to form a hard film on the surface of the substrate, and from the viewpoint of scratch resistance, it is necessary to form a hard film having an Hv of 500 or more, and preferably an Hv of 600 or more. In addition, although the present invention does not set the upper limit to the hardness of the hard film, the hardness of the slitter blade is usually about Hv 650 to 700, and from the viewpoint of not damaging the slitter blade when pressed against the slitter blade. In this case, it is desirable to keep Hv 750 or less.

The portions requiring the above-mentioned hard film are both end surfaces which have the function of adjusting the width of the spacer. Since the end surface is a reference surface on which the spacers or the slitter blade and the spacer abut, a high level of dimensional control is required, and it is desirable to prevent dimensional change due to damage. At the time of replacing the spacer, the inner peripheral surface of the spacer may come into contact with the rotating shaft, or the outer peripheral surface may collide with the surrounding steel member and be damaged, and fine powder may be generated from that portion. If the fine powder enters the slitter lubricating oil, the slitter material may be damaged, or if the fine powder adheres to the spacer end face, the dimensional accuracy may be adversely affected. Therefore, although the inner and outer peripheral surfaces of the spacer are not directly related to the width adjustment function, a hard film is also formed on the inner and outer peripheral surfaces for the purpose of preventing the generation of the fine powder and improving the appearance. It is preferable to form the same hard film as the end face of the spacer.

The hard film may be formed by a wet plating method such as an electroplating method or an electroless plating method,
Any method of a dry plating method such as a vapor deposition method or an ion plating method may be adopted, but a basic film quality such as hardness and toughness, and excellent controllability of the film quality are desirable.
It is desirable to employ hard plating which does not have a problem in terms of reduction of substrate strength and avoiding deformation due to film thickness control and low temperature treatment.

The types of hard films formed by the wet plating method include electric Ni-P plating, electroless Ni-P plating,
Examples of the hard film include electroless Ni-B plating, bright Ni plating, and Cr plating.
A ternary, quaternary or higher alloy plating to which W, Mo, Sn, Zn, etc. are added may be used.
Ceramics such as N, SiC, Si ₃ N ₄ and PTFE
Composite dispersion plating in which resin particles such as above are dispersed may be employed.

Among them, Ni-based plating is recommended from the viewpoints of film quality, processability, economy, etc., and the film quality is particularly good.
Moreover, electric Ni-P plating which is excellent in controllability of film quality is desirable. By adopting the electric Ni-P plating, it is possible to easily control the P content in the range of Hv 600 to 750, which is a preferable hardness, by controlling the P content to 0.5 to 7 wt%. When applied to the surface, cracks are less likely to occur and have excellent impact resistance.

Further, the inventors of the present invention conducted tests on combinations of hard films having various hardnesses and film thicknesses and Al alloy base materials for the occurrence of deep flaws and local dents affecting dimensions. According to the examination, the scratch resistance has a large correlation with the hardness of the hard film, but the dent resistance is not the surface hardness but the thickness of the hard film (hereinafter referred to as hard film thickness) or A.
It has been clarified that the hardness of the alloy base material (hereinafter referred to as base material hardness) is strongly affected. This is thought to be because the occurrence of scratches on the surface is almost determined by the surface hardness, whereas the occurrence of deep scratches or dents involves deformation of the base material as well as the hard film. For example, a scratch or dent having a depth of more than 30 μm does not affect the overall size if the number is small, but if the number of scratches and dents increases over a long period of use, the size and In addition to causing a problem, the appearance is also deteriorated.

Therefore, an experiment was conducted to examine the influence of the hard film thickness and the substrate hardness on the frequency of occurrence of scratches or dents having a depth of more than 30 μm.
In the case of m, the base material hardness began to increase at Hv110 or less, and tended to increase rapidly when the base material hardness was lower than Hv80. Further, when the hard film thickness was reduced, the dent so as to exceed 30 μm in depth was sharply increased, and the limit value of the substrate hardness gradually increased, and the plating film thickness of 3 μm exceeded Hv140. Therefore, when the above experimental results are arranged and examined, it is concluded that the dent resistance is good in the region as shown in FIG. 1, and an approximate expression showing the above range was obtained. It was found that it was represented by a relational expression.

That is, assuming that the substrate hardness is (Hv) and the above-mentioned hard film thickness is (Tμm), the respective values are set so as to satisfy Hv ≧ 285 / T + 50, whereby the dent resistance is excellent. Thus, a slitter spacer can be obtained.

In the present invention, the upper limit is not set for the substrate hardness or the hard film thickness. However, in view of the problem of economic deterioration due to a decrease in productivity, it is not recommended to increase the thickness unnecessarily. However, for the purpose of, for example, satisfying the requirement of dimensional accuracy, first, hard plating of a thick film exceeding 50 μm is performed, and then finishing to a predetermined dimensional accuracy by finishing is usually performed in other technical fields. The present invention does not particularly hinder the adoption of such a method.

Further, from the viewpoint of improving the adhesion of the plating layer, it is preferable to perform an anodic oxidation treatment or a zincate treatment as a pretreatment for forming the plating layer. In particular, when an anodic oxide film is formed, an anchor effect is exerted by fine holes existing in the anodic oxide film, and stable adhesion can be obtained.

Hereinafter, the present invention will be described in more detail with reference to Examples. However, the following Examples are not intended to limit the present invention. It is included in the technical scope.

[0030]

EXAMPLE 1 The slitter spacers (final dimensions: outer diameter 260 mm × inner diameter 210 mm × length 50 mm, end face parallelism: within 5 μm) shown in Table 1 were used as follows. In addition to examining the residual stress, an actual machine test was performed for 60 days, and the parallelism after use was measured to evaluate the dimensional stability. The results are shown in Table 1.

A7075-T73, A2014-T6, A
When using 4032-T6, the billet material was cut into a predetermined length after hot forging, finished to a predetermined size by machining, and quenched and tempered.

A7075-T652, A2014-
In the case of T652 and A6061-T652, basically the same steps as in the above-mentioned T73 and T6 are performed, but a residual stress removing treatment of performing 3% compression in the axial direction after quenching is performed. After finishing to predetermined dimensions, tempering was performed. The water temperature during quenching is 6 for T73 only.
Set to 6 ° C and apply forced circulation so that the water temperature becomes uniform,
The water temperature at the time of quenching in other refining treatments was normal temperature.

In the case of the extruded material A6063-T6, the billet material was extruded into a tube, cut into a predetermined length, finished to a predetermined size by machining, quenched and tempered. The water temperature during quenching was room temperature. In the case of A5083-O, the billet material was extruded into a tube, cut into a predetermined length, and after annealing, finished to a predetermined size by machining.

Cast material (AC4CH-T6) After sand casting, quenching and tempering were performed, followed by machining to finish to predetermined dimensions. The cast material was also quenched at the water temperature. Note that, in any of the above cases, the conditions relating to quenching, tempering, and annealing adopted the normal conditions of JIS according to the material.

[Method of Measuring Residual Stress] ASTM E38
Circumferential, radial, and axial residual stresses were measured by the drilling method according to No. 7, and the maximum values were shown in Table 1. [Dimensional stability] The parallelism of the slitter end face after use in an actual machine test for 60 days was measured and evaluated as follows. ： １: less than 10.0 μm △: 10.0 μm or more and less than 20.0 μm ×: 20.0 μm or more

[0036]

[Table 1]

No. Nos. 1 to 5 are examples of the present invention in which the residual stress is within ± 60 N / mm ^{2 at} room temperature, and all were excellent in dimensional stability. No. No. 6 is a conventional example in which a tempering treatment was performed on an Al cast material, and the dimensional stability was poor. Note that N
o. 7 to 9 indicate that the residual stress is ± 60 N / mm at room temperature.
^This is a comparative example in which the value exceeds ² , and the dimensional stability was very low.

Example 2 Hard films were formed on the spacers based on various Al alloys shown in Table 2 by the following plating method or anodic oxidation method, and were subjected to an actual machine test for 6 months to evaluate the scratches. The state of occurrence was examined and the scratch resistance was evaluated. The results are shown in Table 2. The plating and the anodic oxidation treatment were performed on the entire surface of the spacer after the machining, and only the end face was polished to make the parallelism on the end face 5 μm or less.

[Plating Conditions] Electrical Ni-P plating baths _{NiSO 4 · 6H 2 O 200g /} l NiCl 2 · 6H 2 O 50g / l H 3 PO 3 4~40g / l H 3 PO 4 50g / l H 3 BO 2 0.5~3g / L Saccharin 0-1.0 g / l Temperature 60 ± 5 ° C Current density 5-30 A / dm ²

2. Bright Ni plating Plating bath Add saccharin and coumarin as brighteners to Watt bath Temperature 60 ± 5 ° C pH 3.0 ± 0.5 Current density 5-15 A / dm ² 3. 3. Electroless Ni-P plating Plating bath Commercial bath (Nippon Kanigen Blue Shummer) Temperature 90 ± 3 ° C Cr plating Plating bath Sargent bath Temperature 50-70 ° C Current density 5-20 A / dm ²

As the pretreatment for plating, the substrate was degreased,
After washing with water and performing a surface activation treatment, an anodic oxidation treatment using a phosphoric acid bath or a double zincate treatment was performed. [Anodizing treatment conditions] Treatment solution 15% H ₂ SO ₄ Current density 3 A / dm ² [Evaluation method of scratch resistance] Scratches on the spacer surface and point-like pressing scratches were observed and judged as follows. ◎: almost none ○: little △: many ×: very many

[0042]

[Table 2]

No. 1 to 32 are based on an Al alloy,
This is an example of the present invention in which a hard film having an Hv of 500 or more was formed on the surface, and all were excellent in scratch resistance. No. 33,
Numeral 34 indicates a conventional example in which anodized aluminum material is subjected to anodizing treatment, and has low scratch resistance. In addition, No. Nos. 35 to 38 are comparative examples in which the hard film was not formed or the hard film thickness was too thin, and the scratch resistance was not sufficient.

Example 3 Hard films were formed on various aluminum alloy-based spacers shown in Table 3 by various plating methods in the same manner as in Example 2, and an actual machine test was conducted for 6 months. The occurrence of dents was investigated. The results are shown in Table 3. [Evaluation method of dent resistance] The dent depth was measured with a depth gauge at a dent portion having a size that can be visually confirmed, and the dent depth was 30 μm.
It was evaluated with a number exceeding m. ◎: almost none ○: little △: many ×: very many

[0045]

[Table 3]

No. Nos. 1 to 29 are examples of the present invention in which the substrate hardness and the hard film thickness satisfy the conditional expression of the present invention, and all of them were excellent in dent resistance. No. Numerals 30 and 31 are conventional examples in which anodized aluminum is subjected to anodizing treatment, and the dent resistance is low. In addition, No. Nos. 32 to 39 are Comparative Examples in which the substrate hardness and the hard film thickness did not satisfy the conditional expression of the present invention, and the dent resistance was not sufficient.

Example 4 Hard films were formed on various aluminum alloy-based spacers shown in Table 4 by various plating methods in the same manner as in Example 2, and a 6-month actual machine test was performed. An impact test was performed by the following method to evaluate the impact resistance. The results are shown in Table 4. [Method for evaluating impact resistance] Load: 1000 g, height: 500
mm, a DuPont impact test was performed to evaluate the occurrence of cracks in the plating layer of the test portion. ◎: None or almost none ○: Little △: Many ×: Very many

[0048]

[Table 4]

No. Nos. 1 to 6 were all excellent in impact resistance, but No. 1 in which electric Ni-P plating was formed as a hard film. Nos. 1 to 4 have excellent impact resistance and sufficient hardness, indicating that they are particularly preferable as examples of the present invention. In addition, No. Nos. 7 to 10 are comparative examples in which a hard film other than the electric Ni-P plating was formed, and the impact resistance was poor.

[0050]

According to the present invention, as described above, it is possible to provide a slitter spacer which is not only lightweight, but also has a small dimensional change even when used for a long period of time. In addition, the combination with the hard film formed on the surface of the Al alloy base material can provide a slitter spacer excellent in scratch resistance, dent resistance, and impact resistance.

[Brief description of the drawings]

FIG. 1 is a graph showing a region of a preferred combination of the hardness of a base material and the thickness of a hard film.

Continued on the front page (72) Inventor Wataru Urushihara 1-5-5 Takatsukadai, Nishi-ku, Kobe-shi, Hyogo Kobe Steel, Ltd. Kobe Research Institute (72) Inventor Kenji Iwai 1-8-8 Marunouchi, Chiyoda-ku, Tokyo No. 2 Kobe Steel, Ltd.Tokyo head office (72) Inventor Yoshinori Terada 4-3-1, Bingo-cho, Chuo-ku, Osaka-shi Kobe Steel, Ltd.Osaka branch office (72) Inventor Kazuhiko Yamamuro Chuo, Osaka Kobe Steel Co., Ltd. Kobe Steel Ltd. Osaka Branch Office (72) Inventor Susumu Koike 1100 Higashiyama, Umedo, Oamachi, Inaba, Mie Prefecture Kobe Steel Co., Ltd. Hidehito Okamoto 1100, Umedo, Umedo, Oyado-cho, Inabe-gun, Mie Prefecture Inside the Oyasu Plant, Kobe Steel Co., Ltd. (72) Inventor Yoshio Takada 1-8-8 Marunouchi, Chiyoda-ku, Tokyo No. Kobe Steel, Ltd., Tokyo Main Office (72) Inventor Toshiaki Ota 4-73-23 Meieki, Nakamura-ku, Nagoya-shi, Aichi Nagoya Branch, Kobe Steel, Ltd. (56) References JP-A-4-294920 ( JP, A) (58) Fields investigated (Int. Cl. ⁷ , DB name) B23D 19/06

Claims (4)

(57) [Claims] 1. A slitter spacer comprising a cylindrical spacer having an Al alloy as a base material and having a residual stress within ± 60 N / mm ^{2 at} room temperature. 2. The slitter spacer according to claim 1, wherein a hard film having a hardness of at least Hv500 is formed on at least both end faces. And wherein said base material hardness (Hv), claim 1, wherein said hard film having a thickness (Tμm) satisfies the following conditional expression or
Slitter spacers according to the other two. Hv ≧ 285 / T + 50 As claimed in claim 4, wherein the hard film, slitter spacer according to claim 1, electrical Ni-P based plating layer is formed.