JP3021923B2 - Rolling bearings for semiconductor manufacturing equipment - Google Patents

Rolling bearings for semiconductor manufacturing equipment

Info

Publication number
JP3021923B2
JP3021923B2 JP4040849A JP4084992A JP3021923B2 JP 3021923 B2 JP3021923 B2 JP 3021923B2 JP 4040849 A JP4040849 A JP 4040849A JP 4084992 A JP4084992 A JP 4084992A JP 3021923 B2 JP3021923 B2 JP 3021923B2
Authority
JP
Japan
Prior art keywords
rolling
semiconductor manufacturing
lubricating film
manufacturing equipment
bearing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP4040849A
Other languages
Japanese (ja)
Other versions
JPH05240258A (en
Inventor
博光 近藤
博 山田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTN Corp
Original Assignee
NTN Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NTN Corp filed Critical NTN Corp
Priority to JP4040849A priority Critical patent/JP3021923B2/en
Publication of JPH05240258A publication Critical patent/JPH05240258A/en
Application granted granted Critical
Publication of JP3021923B2 publication Critical patent/JP3021923B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、半導体製造設備に使用
される転がり軸受に関し、特に、腐食性雰囲気下での使
用に適したものに関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a rolling bearing used in semiconductor manufacturing equipment, and more particularly to a rolling bearing suitable for use in a corrosive atmosphere.

【0002】[0002]

【従来の技術】半導体製造設備に使用される軸受は、高
い清浄度が要求される密封真空下で運転されるため、そ
の潤滑には、一般に、二硫化モリブデン等の層状物質、
金、銀、鉛等の軟質金属、PTFE、ポリイミド等の高
分子材料などの固体潤滑剤が用いられている。
2. Description of the Related Art Bearings used in semiconductor manufacturing equipment are operated under a sealed vacuum where high cleanliness is required. Therefore, lubrication is generally performed by using a layered material such as molybdenum disulfide or the like.
Solid lubricants such as soft metals such as gold, silver and lead, and polymer materials such as PTFE and polyimide are used.

【0003】ところで、近年、半導体製造分野では半導
体の集積度が増すにつれて回路パターンの線幅が微細化
しており、軸受から排出される固体潤滑剤の摩耗粉がパ
ターン上に付着すると種々の弊害を引き起こす可能性が
あることから、固体潤滑剤の特性として、本来の潤滑性
・耐久性の他に、特に低発塵性を要求するようになって
きている。
In recent years, in the field of semiconductor manufacturing, the line width of circuit patterns has become finer as the degree of integration of semiconductors has increased. Because of the possibility of causing solid lubricants, solid lubricants are required to have particularly low dusting properties in addition to the inherent lubricity and durability.

【0004】このような現状に鑑み、本出願人は、転が
り軸受を構成する部品のうち少なくとも転がり摩擦また
は滑り摩擦を生ずる表面に、平均分子量が5000以下
のポリテトラフルオロエチレン(以下、簡単のため、低
分子量PTFEと略記する。)からなる潤滑皮膜を形成
した固体潤滑転がり軸受について既に出願している(特
願平3−190150号等)。従来より、軸受の固体潤
滑剤として用いられているPTFEは平均分子量が1×
105 以上、主に、1×106〜1×107のものである
が、低分子量PTFEを用いて潤滑皮膜を形成すること
により、潤滑性、耐久性、低発塵性等に優れた潤滑皮膜
を得ることができることを上記出願において示した。こ
れらの効果は、低分子量PTFEが、従来より固体潤滑
剤として用いられている高分子量のPTFEに比べて、
剪断強度が著しく小く、また、転着性に優れていること
によるものであった。さらに、本出願人は連続した島状
分布の固体潤滑皮膜を形成した半導体製造設備用転がり
軸受について出願し、この出願において、PTFEの固
体潤滑皮膜を島状分布とすることにより、軸受の低発塵
性がさらに向上することを示した。
[0004] In view of the above situation, the present applicant has proposed that at least the surface of a rolling bearing that generates rolling friction or sliding friction has a polytetrafluoroethylene having an average molecular weight of 5000 or less (hereinafter simply referred to as "polytetrafluoroethylene"). , Low molecular weight PTFE). A solid lubricated rolling bearing having a lubricating film formed thereon has already been filed (Japanese Patent Application No. 3-190150). Conventionally, PTFE used as a solid lubricant for bearings has an average molecular weight of 1 ×.
10 5 or more, mainly 1 × 10 6 to 1 × 10 7 , but by forming a lubricating film using low molecular weight PTFE, excellent lubricity, durability, low dust generation, etc. It has been shown in the above application that a lubricating film can be obtained. These effects are due to the fact that low-molecular-weight PTFE is higher than high-molecular-weight PTFE conventionally used as a solid lubricant.
This was due to the extremely low shear strength and excellent transferability. Further, the present applicant filed an application for a rolling bearing for semiconductor manufacturing equipment having a continuous island-shaped solid lubricating film formed thereon. It was shown that dustiness was further improved.

【0005】[0005]

【発明が解決しようとする課題】ところで、半導体のエ
ッチング工程やCVD(化学蒸着)皮膜処理工程では、
フッ素系や塩素系などの反応ガスを使用するため、処理
装置に組込まれた軸受がこれら腐食性を有する反応ガス
に接触する可能性がある。例えば、CVD装置において
は、軸受は反応槽に使用されることは殆どなく主にバッ
ファ槽に使用されるので、反応ガスと直接接触すること
はないが、槽間でウェーハのやりとりをする際に、反応
ガスが反応槽からバッファ槽に流入し、軸受に接触する
場合がある。したがって、このような雰囲気下で使用さ
れる軸受には、特に耐蝕性が要求される。
By the way, in a semiconductor etching process and a CVD (chemical vapor deposition) coating process,
Since a fluorine-based or chlorine-based reaction gas is used, there is a possibility that a bearing incorporated in the processing apparatus may come into contact with the corrosive reaction gas. For example, in a CVD apparatus, bearings are rarely used in a reaction tank and are mainly used in a buffer tank, so they do not come into direct contact with the reaction gas, but when exchanging wafers between the tanks, In some cases, the reaction gas flows from the reaction tank into the buffer tank and comes into contact with the bearing. Therefore, bearings used in such an atmosphere are required to have particularly high corrosion resistance.

【0006】元来、低分子量PTFE自体も化学的に安
定したものであるが、潤滑皮膜が剥離・転着を繰り返す
際に膜厚さが減少する時があり、このような場合、薄く
なった皮膜部分から腐食性ガス等が浸透して母材を侵す
ことがある。また、潤滑皮膜を島状に分布させた場合で
は、島と島との間の皮膜部分はもともと薄く、この部分
から腐食性ガス等が浸透しやすい。
Originally, low-molecular-weight PTFE itself is chemically stable. However, when the lubricating film is repeatedly peeled and transferred, the film thickness sometimes decreases. Corrosive gas and the like may penetrate the coating material and attack the base material. When the lubricating film is distributed in an island shape, the film portion between the islands is originally thin, and corrosive gas or the like easily penetrates from this portion.

【0007】そこで、本発明の目的は、半導体製造設備
用転がり軸受において、特に腐食性雰囲気下で使用する
のに適した転がり軸受を提供することにある。
An object of the present invention is to provide a rolling bearing suitable for use in a corrosive atmosphere, particularly in a rolling bearing for semiconductor manufacturing equipment.

【0008】[0008]

【課題を解決するための手段】本発明の半導体製造設備
用転がり軸受は、転がり軸受を構成する部品のうち少な
くとも転がり摩擦または滑り摩擦を生ずる表面に、平均
分子量が5000以下のポリテトラフルオロエチレンか
らなる潤滑皮膜を形成したものであって、この潤滑皮膜
の下層に、チタン系材料からなる下地層を有することを
特徴とする。
According to the rolling bearing for semiconductor manufacturing equipment of the present invention, at least the surface of the rolling bearing which generates rolling friction or sliding friction is made of polytetrafluoroethylene having an average molecular weight of 5,000 or less. A lubricating film having a base layer made of a titanium-based material below the lubricating film.

【0009】[0009]

【作用】チタン系材料は耐蝕性を有する。したがって、
潤滑皮膜の下層に形成されたチタン系材料からなる下地
層が腐食性物質から軸受母材を保護するので、母材に腐
食が生じにくくなる。
The titanium-based material has corrosion resistance. Therefore,
The base layer made of a titanium-based material formed under the lubricating film protects the bearing base material from corrosive substances, so that the base material is less likely to be corroded.

【0010】[0010]

【実施例】以下、本発明の実施例について説明する。Embodiments of the present invention will be described below.

【0011】図1は、本発明を深溝玉軸受に適用した実
施例について説明する。この軸受は、内輪1、外輪2、
内・外輪1、2間に介在する複数の転動体3、転動体3
を円周等間隔に保持する保持器4といった軸受部品で構
成される。そして、内・外輪1、2の転走面および転動
体3の表面にはそれぞれチタン系材料からなる下地層1
b、2b、3bが形成され、その上層に、平均分子量が
5000以下のPTFE(低分子量PTFE)からなる
潤滑皮膜1a、2a、3aが形成されている。下地層1
b、2b、3bは、TiあるいはTi化合物であるTi
N、TiC等を上記表面にイオンプレーティングにより
コーティングしたもので、その厚さは0.5〜1.0μ
m程度である。これらチタン系材料を用いて形成された
下地層1b、2b、3bは耐蝕性を有し、腐食性ガス等
の腐食性物質から母材を有効に保護する。尚、同図aで
は内・外輪1、2の外表面全体に下地層1b、2bが形
成されているが、同図bに示すように、下地層は少なく
とも内・外輪1、2の転走面および転動体3の表面に形
成すれば良い。この場合、これら表面以外の部分にはマ
スキングによってコーティング処理を施さないようにす
る。また、転動体3をSi34で形成することにより、
転動体3の下地層3bを不要にすることもできる。
FIG. 1 illustrates an embodiment in which the present invention is applied to a deep groove ball bearing. This bearing has inner ring 1, outer ring 2,
Plural rolling elements 3 and rolling elements 3 interposed between inner and outer rings 1 and 2
Are held by bearing parts such as a cage 4 for holding the cylinder at equal intervals. The rolling surfaces of the inner and outer rings 1 and 2 and the surface of the rolling element 3 are respectively provided on the underlayer 1 made of a titanium-based material.
b, 2b, 3b are formed, and a lubricating film 1a, 2a, 3a made of PTFE (low molecular weight PTFE) having an average molecular weight of 5000 or less is formed on the upper layer. Underlayer 1
b, 2b and 3b are Ti or Ti compound
The surface is coated with N, TiC, or the like by ion plating, and has a thickness of 0.5 to 1.0 μm.
m. The underlayers 1b, 2b, 3b formed using these titanium-based materials have corrosion resistance and effectively protect the base material from corrosive substances such as corrosive gases. In FIG. 2A, the underlayers 1b and 2b are formed on the entire outer surfaces of the inner and outer rings 1 and 2, however, as shown in FIG. It may be formed on the surface and the surface of the rolling element 3. In this case, the coating process is not applied to the portions other than the surface by masking. Further, by forming the rolling elements 3 of Si 3 N 4 ,
The underlayer 3b of the rolling element 3 can be made unnecessary.

【0012】潤滑皮膜1a、2a、3aは、低分子量P
TFE(例えば日本アチソン製ARC7)を、25cm
離れた位置から皮膜形成面にスプレーして付着させたも
ので、その平均皮膜厚さは0.6μm程度である。低分
子量PTFEの皮膜コーティング法としては上記スプレ
ー法の他、浸漬法等がある。尚、本実施例では内・外輪
1、2の転走面および転動体3の表面に潤滑皮膜を形成
するようにしたが、潤滑皮膜は少なくとも転動体3の表
面に形成すれば良い。また、同図aでは内・外輪1、2
の外表面全体に潤滑皮膜1a、2aが形成されている
が、同図bに示すように、嵌合面等の潤滑皮膜が本来不
要な部分については、マスキングによって皮膜処理を施
さない、あるいは、最終製品となる前に除去するように
すると良い。
The lubricating films 1a, 2a and 3a are made of a low molecular weight P
TFE (for example, ARC7 manufactured by Acheson Japan)
The film is sprayed and adhered to the film-forming surface from a remote position, and has an average film thickness of about 0.6 μm. Examples of the low molecular weight PTFE film coating method include a dipping method in addition to the above-mentioned spray method. In this embodiment, the lubricating film is formed on the rolling surfaces of the inner and outer races 1 and 2 and the surface of the rolling element 3, but the lubricating film may be formed on at least the surface of the rolling element 3. Also, in FIG.
The lubricating films 1a and 2a are formed on the entire outer surface of the device, but as shown in FIG. 2b, the portion of the lubricating film, such as the fitting surface, which is not originally required, is not subjected to film treatment by masking, or It is good to remove it before it becomes the final product.

【0013】以上の説明は深溝玉軸受についてのもので
あるが、本発明は軸受形式は特に問わず、広く転がり軸
受一般に適用することができる。
Although the above description has been made with respect to a deep groove ball bearing, the present invention can be widely applied to rolling bearings regardless of the bearing type.

【0014】[0014]

【発明の効果】以上説明したように、平均分子量が50
00以下のPTFEからなる潤滑皮膜の下層にチタン系
材料からなる下地層を形成することにより、この下地層
が軸受母材を腐食性物質から効果的に保護するため、軸
受に腐食が生じにくくなる。したがって、本発明の転が
り軸受は、腐食性雰囲気下で使用された場合にも耐久性
を低下させることなく、その優れた低発塵性、大気・真
空両用性、低トルク性(二硫化モリブデンのスパッタリ
ング皮膜と同程度)、耐熱性(潤滑皮膜の軟化点は32
0℃以上)等を発揮する。
As described above, the average molecular weight is 50
By forming an underlayer made of a titanium-based material under the lubricating film made of PTFE of 00 or less, the underlayer effectively protects the bearing base material from corrosive substances, so that the bearing hardly corrodes. . Therefore, the rolling bearing of the present invention has excellent low dust generation, air / vacuum compatibility, and low torque (molybdenum disulfide) without lowering its durability even when used in a corrosive atmosphere. Heat resistance (softening point of lubricating film is 32)
0 ° C. or higher).

【0015】尚、本発明の転がり軸受は、下地層を形成
しないものに比べ、同程度の低発塵性を示すが、耐久性
はやや向上する。これは、下地層表面のうねり形状によ
り実質上表面積が増加するので、潤滑皮膜の付着量およ
び付着性が向上するためである。
The rolling bearing according to the present invention exhibits the same low dust generation as that without the underlayer, but has a slightly improved durability. This is because the surface area substantially increases due to the undulating shape of the underlayer surface, so that the amount and adhesion of the lubricating film are improved.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施例に係わる深溝玉軸受を示す断面
図である。
FIG. 1 is a sectional view showing a deep groove ball bearing according to an embodiment of the present invention.

【符号の説明】 1 内輪 1a 潤滑皮膜 1b 下地層 2 外輪 2a 潤滑皮膜 2b 下地層 3 転動体 3a 潤滑皮膜 3b 下地層 4 保持器[Description of Signs] 1 Inner ring 1a Lubricating film 1b Underlayer 2 Outer ring 2a Lubricating film 2b Underlayer 3 Rolling element 3a Lubricating film 3b Underlayer 4 Cage

───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.7,DB名) F16C 33/62 F16C 33/32 F16C 33/34 ──────────────────────────────────────────────────続 き Continued on the front page (58) Field surveyed (Int.Cl. 7 , DB name) F16C 33/62 F16C 33/32 F16C 33/34

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 転がり軸受を構成する部品のうち少なく
とも転がり摩擦または滑り摩擦を生ずる表面に、平均分
子量が5000以下のポリテトラフルオロエチレンから
なる潤滑皮膜を形成したものであって、この潤滑皮膜の
下層に、チタン系材料からなる下地層を有することを特
徴とする半導体製造設備用転がり軸受。
A lubricating film made of polytetrafluoroethylene having an average molecular weight of 5,000 or less is formed on at least a surface of a rolling bearing that generates rolling friction or sliding friction. A rolling bearing for semiconductor manufacturing equipment, comprising a base layer made of a titanium-based material as a lower layer.
JP4040849A 1992-02-27 1992-02-27 Rolling bearings for semiconductor manufacturing equipment Expired - Fee Related JP3021923B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4040849A JP3021923B2 (en) 1992-02-27 1992-02-27 Rolling bearings for semiconductor manufacturing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4040849A JP3021923B2 (en) 1992-02-27 1992-02-27 Rolling bearings for semiconductor manufacturing equipment

Publications (2)

Publication Number Publication Date
JPH05240258A JPH05240258A (en) 1993-09-17
JP3021923B2 true JP3021923B2 (en) 2000-03-15

Family

ID=12592028

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4040849A Expired - Fee Related JP3021923B2 (en) 1992-02-27 1992-02-27 Rolling bearings for semiconductor manufacturing equipment

Country Status (1)

Country Link
JP (1) JP3021923B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10259003A1 (en) * 2002-12-16 2004-06-24 Myonic Gmbh Slide bearing, in particular to be used in dental tool, comprising parts permanently coated with lubricant of suitable kind

Also Published As

Publication number Publication date
JPH05240258A (en) 1993-09-17

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