JP3011550B2 - Corrugated line - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an improvement in a pulse waveform shaping line used in a pulse circuit, and more particularly to a particle beam forming line.
It is used for a pulse circuit of a power supply unit used for generating a system or a free electron laser.

[0002]

2. Description of the Related Art Waveform shaping lines used in these pulse circuits have, for example, an impedance of 1 to several kΩ and a voltage of 10 kΩ.
It is used to form an extremely steep rectangular wave, such as up to 1000 kV and a pulse width of several ns to several μs.
Such a waveform is usually formed by a waveform shaping line formed of a coaxial cylinder or a parallel flat plate in a high-voltage field, and a PFN circuit (pulse-for-pulse) combining a capacitor and a coil in a low-voltage field.
Mining Network) or the like or has been used.

FIG. 3 shows a conventional example of a corrugated line using a parallel plate. In FIG. 3, reference numeral 2 denotes a high-voltage pulse power supply that supplies a pulse-shaped charge to the waveform shaping line 1 when the switch 3 is closed. The waveform forming line 1 includes a low-voltage electrode 4 and a high-voltage electrode 5 and is fixed in a container 9 (not shown) in an electrically insulated manner, between which a liquid dielectric 6 is filled. eggplant dance Z _1.

[0004] The connection to the power supply section is made between the low voltage side of the pulse power supply 2 and the low voltage electrode 4, and the output side of the switch 3 and the high voltage electrode 5.
And are electrically connected. Then the high voltage electrode 5 and the low voltage electrode 4, a switch 7 and Inpi - in the load 8 is a dance Z _2, constitutes a closed circuit.

The operation will now be described. When the switch 3 is closed and a charge is supplied from the pulse power source 2 to the waveform shaping line 1 having the impedance Z1, a dielectric 6 is formed in the space between the high-voltage electrode 5 and the low-voltage electrode 4. Is charged to charge the electrostatic capacity. Then, the charging s pressure closes the switch 7 in the vicinity of reaching the maximum value Inpi - supplies charges to the load 8 dance Z _2.

[0006] The voltage applied to the load 8 is usually Z ₁ = Z
_{Since the} impedance is adjusted to be 2, a rectangular wave having a voltage that is 1/2 of the voltage charged in the waveform shaping line 1 is given, and the pulse width of the rectangular wave is Is proportional to the length of. This can be expressed as follows.

[0007]

(Equation 1)

Therefore, when a rectangular wave having a long pulse width is required, a method of selecting a dielectric 6 having a large relative dielectric constant or increasing the length of the waveform shaping line 1 is used to set the impedance. Means that the low-voltage electrode 4
It was designed by appropriately selecting the spatial distance between the high voltage electrode 5 and the high voltage electrode 5.

[0009]

As described above, according to the concept of the waveform shaping line of the prior art, when it is desired to change the impedance according to the value of the load or to finely adjust the impedance, a large structure is required. Low-voltage electrode 4 and high-voltage electrode 5 configured
It is necessary to adjust the spatial distance between them and to change the dielectric, and the work is troublesome. Even if the dielectric is changed, it is not possible to select an arbitrary relative permittivity.

[0010] Also, the load is electron beam - beam or ion beam - diode for beam generation - When or a cathode electrode, in the conduction time, Inpi - also examples dance Z ₂ is gradually changed with time, therefore In addition, the waveform shaping line is not limited to a rectangular wave voltage having a good flatness, but also has a demand for a forward-going or backward-going rectangular wave voltage (giving a voltage waveform a gradient) for a certain load, and satisfies these requirements. This has been practically difficult in such high voltage fields.

[0011]

SUMMARY OF THE INVENTION According to the present invention, a wave-shaped line is divided and apparently replaced with a plurality of lumped-constant circuits. varied by adding a dielectric constant different from the second dielectric, and selecting the values to an appropriate value, Inpi - was adopted a method of determining the dance Z _2. As a result, the above-mentioned problem could be solved. Also, such a construction means is P
It also provides a new approach to the FN circuit configuration.

[0012]

FIG. 1 shows an embodiment of a wave-shaped line constituted by parallel plate electrodes. Components having the same functions as those in FIG. 3 are denoted by the same reference numerals, and description thereof will be omitted. The plurality of (n) divided second dielectrics 10 are formed of a solid, and are each fixed by a driving mechanism 11. The drive mechanism 11 is connected to the container 9 by a method (not shown).
In FIG. 1, the second dielectric 10 can be inserted or pulled deep into the space between the low-voltage electrode 4 and the high-voltage electrode 5 by being driven up / down in FIG. It has become.

Next, the adjustment of the impedance will be described. It is effective that the difference between the relative dielectric constants of the dielectric 6 and the second dielectric 10 is as large as possible. Therefore, pure water (εS ≒ 80) is used for the dielectric 6, and nylon, Teflon, Duracon, etc. (εS = 2 to 2) are used for the second dielectric.
In many cases, 4) the solid insulator is used. Here, a calculation formula of the capacitance ΔC determined between the low-voltage electrode 4 and the high-voltage electrode 5 at each of the positions where the n divided second dielectrics 10 are located is shown.

[0014]

(Equation 2)

That is, when a dielectric having a large ε is used for the dielectric 6 and a dielectric having a small ε is used for the second dielectric 10, the second dielectric 10 is composed of two dielectrics due to its area effect due to its insertion and extraction. The combined capacity changes. If a dielectric material having a large difference is used, the area occupied by the large dielectric material is substantially determined. Therefore, if the second dielectric 10 of n months is actuated by a drive mechanism 11 changes the capacitance, Inpi by: - Dance △ Z ₁ is changed.

[0016]

(Equation 3)

That is, since the inductance ΔL is a value determined by the structure without being related to the second dielectric 10, the impedance ΔL is easily changed by the change of the capacitance.
Z ₁ can be changed. FIG. 1 shows an example in which the second dielectric body 10 is moved up and down by the driving function 11, but fine adjustment is possible because the second dielectric body 10 is moved by a screw type. The value of ₁ can also be changed continuously. Therefore, the impedance Z ₂ of the load 8
In order to make the impedance match, it is only necessary to precisely adjust the n second dielectrics 10 so that all of them satisfy 合 う Z ₁ = Z ₂ .

The above description is shown by an equivalent circuit in FIG.
Since this is a PFN circuit that is often seen, the description of its operation is omitted. By such means, it is possible to change the impedance of the load 8 and to cope with different loads with a rectangular wave voltage having excellent flatness. As another use method, it is possible to respond not only to a rectangular wave having a flat voltage waveform but also to a rising (back-down) or rear-up (front-down) rectangular wave request.

[0019] It can have a sequentially changing over the subsequent stage from the previous stage to the insertion depth of the n second dielectric 10 of the aforementioned, Inpi - changes with respect to the subsequent stage from the previous stage to dance △ Z ₁ (gradient)
May be provided in stages. Impedance Z _{2 of} load 8
The impedance of the former stage is higher than that of
If the dance is made smaller, the rectangular wave voltage rises later, and if it is reversed, it falls later. That is, the rectangular wave voltage waveform can have a gradient. These are also n second
This can be achieved by individually adjusting the driving mechanism 11 of the dielectric 10 to a predetermined value. Similarly, a rectangular wave voltage having an arbitrary waveform can be obtained by adjusting the insertion depth of each of the n second dielectrics 10 arbitrarily.

As described above, in this embodiment, the waveform-shaped line constituted by one set of the low-voltage electrode 4 and the high-voltage electrode 5 has been described.
Using a plurality of sets of the waveform forming lines 1 in parallel,
Although there are examples of trying to cope with a small load of dance, the method of the present invention works effectively for them. or,
When the container 9 is made of metal, the same operation can be performed even if one of the low-voltage electrode 4 and the high-voltage electrode 5 also serves as the container 9.

As the dielectric used for impedance adjustment, a material having excellent withstand voltage characteristics for short pulses is required. For that purpose, pure water, oil, gas, solid insulating material for electricity, etc. can be used. Considering a waveform-shaped line, this embodiment shows an example in which pure water having a large ε is used for the dielectric 6 and a solid insulator having a smaller ε is used for the second dielectric 10 than the former. In addition, if various measures are taken, the reverse combination configuration can be established.

[0022]

According to the present invention, in the conventional high-voltage rectangular wave generator, the waveform on the rectangular wave pulse generating side can be changed without significantly changing the concept of the waveform shaping line technology with respect to the impedance of the load that is difficult to determine. Make up the molded track
The second dielectric that is operated by the driving mechanism to
It is possible to easily achieve impedance matching by changing the amount , and the industrial and practical value is great.

[Brief description of the drawings]

FIG. 1 is a partially cutaway perspective view of an embodiment of a waveform shaping line according to the present invention.

FIG. 2 is an equivalent circuit diagram of FIG.

FIG. 3 is a partially cutaway perspective view of an example of a conventional waveform shaping line.

[Explanation of symbols]

 Reference Signs List 1 waveform forming line 2 pulse power supply 3 switch 4 low voltage power supply 5 high voltage power supply 6 dielectric 7 switch 8 load 9 container 10 second dielectric 11 drive function

──────────────────────────────────────────────────続 き Continued on front page (58) Field surveyed (Int.Cl. ⁷ , DB name) H03K 3/53 H01G 5/013

Claims (2)

(57) [Claims] A high-voltage electrode and a low-voltage electrode are arranged facing each other at a predetermined interval in a container filled with a dielectric material in a waveform-shaped line receiving a charge from a pulse power supply to form a rectangular wave voltage. , said dielectric insert a second dielectric divided into a plurality of different dielectric constant between its two electrodes, the
2. Providing a drive mechanism for driving the dielectric up / down
Changes the capacitance between the high and low voltage electrodes.
A waveform shaping line characterized by comprising a PFN circuit for causing a wave to be formed. 2. A waveform shaping line according to claim 1, wherein the gradient of the rectangular voltage waveform is adjusted by the driving mechanism of the second dielectric.