JP2993163B2 - Data creation method for pattern exposure equipment - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention is used in a method of forming data for a pattern exposure apparatus for forming a pattern of a semiconductor integrated circuit on a semiconductor substrate or the like, and particularly relates to a method of generating bit map type pattern data.

[0002]

2. Description of the Related Art First, a semiconductor memory to which the present invention is applied will be described. (See Japanese Patent Publication No. 1-27518). This semiconductor memory arranges a plurality of memory cell columns formed by connecting a plurality of memory cells in series, a first decoder for selecting a specific word line according to an address input, and a second decoder for selecting a specific bit line Decoder. Here, a drain region or a source region of a transistor provided in each memory cell column and selectively connecting each memory cell column to one bit line is constituted by one diffusion region, and the corresponding diffusion region is a common contact hole. Through the bit line. The contact hole is referred to as a selector, the entire selector is referred to as a selector unit, and the original ROM or RAM portion is referred to as a memory unit. A semiconductor memory having the above characteristics is hereinafter referred to as a vertically stacked memory.

In this vertically stacked memory, the memory section and the selector section have the same shape, and although the pitch between the memory section and the selector section is the same as that between the memory sections, as shown in FIG. In addition, the memory unit 31 and the selector unit 32 were separately output to the bitmap file 30 of the data for the pattern exposure apparatus. This is the "on" and "off" for the selector unit and the "on"
This is because the "on" and "off" information of the memory units having different "off" cannot be the same.

[0004] Also, unlike a memory unit having different "ON" and "OFF" for each product, the selector unit has the same method as the memory unit even though the arrangement shape of "ON" and "OFF" is determined. Was creating a bitmap file.
(See Japanese Patent Application No. 63-258667 and JP-A-2-105259).

[0005]

In this conventional method for creating data for a pattern exposure apparatus, the selector unit has the same structure as the memory unit, which has regularity in appearance of a figure despite having regularity in appearance of a figure. A bitmap file was created from "on" and "off" information. For this reason, there was a disadvantage that the time required to create the bitmap file was increased.

An object of the present invention is to provide a method for creating data for a pattern exposure apparatus which can reduce the time required to create a bitmap file.

[0007]

According to the present invention, there is provided a method of forming exposure data for a pattern exposure apparatus for forming a pattern of a semiconductor integrated circuit on a semiconductor substrate or a mask, wherein a memory for arranging the same data repeatedly in basic cell units. A bit data file indicating whether or not there is data for the memory unit, for memory data having a unit and a selector unit for performing a specific arrangement in the same basic cell unit as the memory unit; Inputting a selector card in which information defining the arrangement of the selector section is written, calculating the exposure start position after the selector addition and the number of repetitions, determining a bitmap, and creating and outputting a selector-added bitmap file It is characterized by.

[0008]

The bitmap file for the memory unit and information defining the specific arrangement of the selector unit (for example, the selector generation direction (H), the bit length (T) specifying how many bits the selector is added, and A selector card in which the designation (Q) of the addition position of the selector (each parameter) is written is input, the exposure start position when the selector is added and the number of repetitions are calculated according to a predetermined algorithm, and the bit map is determined. Create and output a selector-added bitmap file.

Therefore, it is not necessary to create a separate bitmap file for the selector section, and it is possible to shorten the time required to create the bitmap file.

[0010]

Embodiments of the present invention will be described below with reference to the drawings.

First, the bitmap file will be described. FIG. 2 is an explanatory diagram showing the configuration of the bitmap file used in the present invention. The bitmap file 10 includes the basic figure shapes (X ₁ , Y ₁ ), (X ₂ , Y ₂ ), the exposure start position (S _X , S _Y ), the repetition pitch (P _X , P _Y ), the number of repetitions ( R _X , R _Y ) and a bitmap section. The bitmap section sets "1" or "0" as to whether or not to output the basic figure to be repeated.
When a basic figure is output in a file expressed by the bits of "1", bit "1"("ON") is used. When not output, bit "0"("OFF") is used.

Next, the selector card will be described.
FIG. 3 is an explanatory diagram showing the configuration of the selector card used in the present invention. As shown in FIG. 3, the selector card 20 has a selector generation direction H (X or Y), a bit length T specifying how many bits a selector is added, and a specification Q @ head (BIGIN) of a selector addition position. Or, specify each parameter at the end (END).

Since the bitmap file is an array, when the order (address) of the array is taken into consideration, it is specified whether a selector is added at the beginning of the array or at the end of the array.

Next, the shape (fixed) of the third selector to be added will be described. The number of selectors to be added is always 2 bits in the selector generation direction H, and an even number (length differs depending on the size of the bitmap file) is generated in the direction J perpendicular to the selector generation direction H.
The repetition pitch is the same as the input bitmap file. FIG. 4A is a diagram of a bit image, which is represented by ■ (bit “1” (“ON”)) and □ (bit “0” (“OFF”)). FIG. 4B shows the bit representation.

FIG. 1 is a flowchart showing an algorithm according to one embodiment of the present invention. A selector-added bitmap file to which the bits of the selector section are added based on the above-described bitmap file 10 and the information of the selector card 20 and the shape of the selector is created.

First, in step 1, the input selector card 20 is interpreted. Each parameter of the selector generation direction H, the bit length T of how many bits a selector is added, and the selector addition position Q are read.

Next, in step 2, a bitmap file is read. Repeating basic figure shapes (X ₁ , Y ₁ ),
(X ₂ , Y ₂ ), exposure start position (S _X , S _Y ), repetition pitch (P _X , P _Y ), number of repetitions (R _X , R
_Y ) Read each parameter. The bitmap section is array-developed in the order of bits. At this time, based on the selector generation direction H and the designated bit length T, an array is created with a length of T in the H direction.

Next, in step 3, the exposure start position after the selector is added and the number of repetitions are calculated. i) When the additional position Q of the selector is at the head, the exposure start position in the H direction S _H ← S _H ← 2 · P _H The exposure start position in the J direction S _J ← S _J (no change) The number of repetitions in the H direction R _H ← R _H +2 Number of repetitions in the J direction R _J ← R _J (no change) ii) When the additional position Q of the selector is the last, the exposure start position in the H direction _SH ← _SH (no change) Start of the exposure in the J direction Position S _J ← S _J (no change) Number of repetitions in H direction R _H ← R _H +2 Number of repetitions in J direction R _J ← R _J (no change)

Next, in step 4, the bit map portion is determined. When the bitmap portion is expanded into a k × 1 array, each array element is represented by M _k1 . Selector generation direction H
When = X, the array in the X direction is represented by M _T1 . i) When the addition position Q of the selector is at the beginning, when T is odd for M _T1 : After adding bit “10”, one column is output from M _T1 . When T is even for M _T1 : After adding bit “01”, one column is output from M _T1 . ii) When the adding position Q of the selector is the last, when the M _T1 T is odd: output from the M _T1 1 column adds bits "10". When the M _T1 T is even: output from the M _T1 1 column adds bits "01". When the selector generation direction H = Y, i) When the addition position Q of the selector is the head, the bit “10
.. Are output for k lengths, and then the bits "0101..." Are output for k lengths. Then outputs bit in the order of the array than M _11. i) When the adding position Q of the selector is the last, then after outputting the bits in the order of the array than M _11, the bit "1010 ..."
Are output for k lengths, and the bits “0101...” Are output for k lengths.

Finally, in step 5, a selector-added bitmap file is output according to the format.

A selector-added bitmap file can be created by the above algorithm.

Next, a specific application example of this embodiment will be described.

Now, as shown in FIG.
20a shall be specified. In step 1, each parameter is read. That is, a selector is added every 4 bits in the selector generation direction X. In addition, it reads that the addition position of the selector is the head (BEGIN).

Next, in step 2, an input bitmap file 10a as shown in FIG. 6 is read. At this time, the origin is conventionally defined as the upper left, the right as the positive direction of X, and the lower direction as the positive direction of Y.
Repetition basic figure shapes (0, 0), (3, 2), exposure start position (10, 4), repetition pitch (4,
4) Read the parameters of the number of repetitions (4, 6). The bitmap section is developed in a 4 × 6 array in bit order.

Next, in step 3, the exposure start position and the number of repetitions are calculated. Since the additional position of the selector is the top, the exposure start position in the X direction S _X ← 10−2 = 4 = 2 The exposure start position in the Y direction S _Y ← 4 (no change) The number of repetitions in the X direction R _X ← 4 + 2 = 6 Number of repetitions in Y direction R _Y ← 6 (no change)

Therefore, the exposure start position of the output is (2,
4) and the number of repetitions is (6, 6).

Next, in step 4, the bit map portion is determined. In this case, since the position where the selector is added is the head, the bits are determined as follows. FIG. 8 illustrates this bit image. After adding M1 ₁ : 10, add 1001 ⇒ 101001 M2 ₁ : 01, add 1101 ⇒ 011101 M3 ₁ : 10, add 1110 ⇒ 101110, add M4 ₁ : 01, and add 0110 ⇒ 010110 M5 ₁ : 10. After 0101 ⇒ 100101 M6 ₁ : After adding 011, 0111 ⇒ 010111

Finally, in step 5, a selector-added bitmap file 10b shown in FIG. 7 is created and output.

[0029]

As described above, according to the present invention, the automatic generation of the selector section completely eliminates the trouble of creating a bitmap file from the "on" and "off" information conventionally performed for the selector section. There is an effect that becomes unnecessary.

Further, since the selector section can be formed into one array including the memory section in the bitmap file, the file size of the output bitmap file is reduced. This is because there is no need to define a basic figure, an exposure start position, a repetition pitch, and the number of repetitions of the output bitmap file. Although this effect varies depending on the arrangement method, the amount of the bitmap file is reduced by about 10% as a measured value.

Therefore, according to the present invention, it is possible to obtain a method of creating data for a parameter exposure apparatus, which can greatly create a bitmap file creation time, and the effect is great.

[Brief description of the drawings]

FIG. 1 is a flowchart showing an algorithm according to an embodiment of the present invention.

FIG. 2 is an explanatory diagram showing the configuration of the bitmap file.

FIG. 3 is a diagram showing a configuration of the selector card.

FIG. 4 is an explanatory diagram of the shape and bit representation of the selector section.

FIG. 5 is a diagram showing an input selector card in the embodiment.

FIG. 6 is a diagram showing an input bitmap file in the embodiment.

FIG. 7 is a view showing an output selector-added bitmap file in the embodiment.

FIG. 8 is an explanatory diagram showing a bit map section of the embodiment.

FIG. 9 is an explanatory diagram showing a configuration of a bitmap file of a conventional example.

[Explanation of symbols]

 1-5 Step 10, 30 Bitmap file 10a Input bitmap file 10b Bitmap file with selector 20, 20a Selector card 31 Memory 32 Selector

Claims (1)

(57) [Claims] 1. An exposure data creating method for a pattern exposure apparatus for forming a pattern of a semiconductor integrated circuit on a semiconductor substrate or a mask, comprising: a memory unit for arranging the same data repeatedly in basic cell units; A bit data file indicating information as to whether or not there is data for the memory unit, and information defining an array of the selector unit, for memory data having a selector unit that performs a specific arrangement in units of basic cells. Inputting a selector card in which is written, calculating the exposure start position and the number of repetitions after adding a selector, determining a bitmap, and creating and outputting a selector-added bitmap file. Data creation method.