JP2983117B2 - Manufacturing method of thin film solar cell - Google Patents

Manufacturing method of thin film solar cell

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Publication number
JP2983117B2
JP2983117B2 JP4337686A JP33768692A JP2983117B2 JP 2983117 B2 JP2983117 B2 JP 2983117B2 JP 4337686 A JP4337686 A JP 4337686A JP 33768692 A JP33768692 A JP 33768692A JP 2983117 B2 JP2983117 B2 JP 2983117B2
Authority
JP
Japan
Prior art keywords
film
group
substrate
solar cell
thin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP4337686A
Other languages
Japanese (ja)
Other versions
JPH06188444A (en
Inventor
広喜 佐藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Fuji Electric Corporate Research and Development Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Corporate Research and Development Ltd filed Critical Fuji Electric Corporate Research and Development Ltd
Priority to JP4337686A priority Critical patent/JP2983117B2/en
Publication of JPH06188444A publication Critical patent/JPH06188444A/en
Application granted granted Critical
Publication of JP2983117B2 publication Critical patent/JP2983117B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/541CuInSe2 material PV cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、太陽光などの光エネル
ギーをカルコパイライト型三元系半導体化合物薄膜を用
いた接合により電気エネルギーに変換する薄膜太陽電池
の製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a thin-film solar cell for converting light energy such as sunlight into electric energy by bonding using a chalcopyrite-type ternary semiconductor compound thin film.

【0002】[0002]

【従来の技術】I−III −VI2 族カルコパイライト型三
元化合物薄膜、特にCuInSe2 、CuInS 2 、AgInSe2 、Ag
InS2 は、光学ギャップが1.0〜1.8eVの範囲にあり、
光電変換素子としての利用が期待される。近年、これら
の材料の薄膜形成技術の進展により、薄膜太陽電池素子
材料として一層注目されている。以下この種の太陽電池
でのカルコパイライト型三元系化合物薄膜を形成する方
法について、CuInSe2 を例にとり従来技術について説明
する。
2. Description of the Related Art I-III-VITwoTribe chalcopyrite type 3
Original compound thin film, especially CuInSeTwo, CuInS Two, AgInSeTwo, Ag
InSTwoHas an optical gap in the range of 1.0 to 1.8 eV,
It is expected to be used as a photoelectric conversion element. In recent years, these
Of thin film solar cell devices
It is gaining more attention as a material. Below this kind of solar cell
For forming chalcopyrite-type ternary compound thin film at low temperature
About the method, CuInSeTwoThe conventional technology is explained with an example
I do.

【0003】CuInSe2 薄膜の成膜方法としては、三元同
時蒸着法、セレン化法などが知られているが、セレン化
法は、基板上にCu/In積層膜を室温で形成した後、基板
温度400 〜550 ℃でArで希釈されたSe中、例えば3〜15
%H2 Seを含有するガス中にて数時間処理することによ
り粒径が約3μm程度に大きいCuInSe2 薄膜を形成する
方法である。VI族元素がSの場合は、S雰囲気中で処理
する。
[0003] As a method for forming a CuInSe 2 thin film, a ternary simultaneous vapor deposition method, a selenization method, and the like are known. In the selenization method, a Cu / In laminated film is formed on a substrate at room temperature. In Se diluted with Ar at a substrate temperature of 400 to 550 ° C., for example, 3 to 15
This is a method of forming a CuInSe 2 thin film having a large particle size of about 3 μm by treating in a gas containing% H 2 Se for several hours. When the group VI element is S, the treatment is performed in an S atmosphere.

【0004】[0004]

【発明が解決しようとする課題】上記のようなセレン化
法の工程のH2 Se中で処理する際、基板の表面上にSeガ
スが侵入し、昇温過程で基板表面にSe化合物、例えば基
板表面のMo電極層上にMoSe2 が生成される。このSe化合
物は高抵抗であり、製造された太陽電池の形状因子( F
F) を低下させてしまう。また、Cu/In積層膜中にSeが
入り反応するため体積膨張が起こり、基板/CuInSe2
膜界面の付着力が弱くなり大面積化など工業化には問題
があった。
During the treatment in the H 2 Se in the above-mentioned selenization method, Se gas infiltrates on the surface of the substrate, and a Se compound such as a Se compound MoSe 2 is generated on the Mo electrode layer on the substrate surface. This Se compound has high resistance, and the form factor (F
F). In addition, Se enters the Cu / In laminated film and reacts to cause a volume expansion, and the adhesive force at the interface between the substrate and the CuInSe 2 thin film is weakened.

【0005】次に、Cu−In−Se混合膜を上記同様にH2
Se中で処理すると基板/CuInSe2 薄膜界面の問題は発生
しないが、昇温過程で膜中のSeと反応を始めるため比較
的低温でCuInSe2 薄膜が形成されてしまい、粒径が約1
μm程度までより成長せず、製造される太陽電池の効率
が低かった。本発明の目的は、基板表面上のVI族元素化
合物の形成なく成膜される粒径の大きいカルコパイライ
ト型化合物薄膜を有する薄膜太陽電池の製造方法を提供
することにある。
[0005] Next, a Cu-In-Se mixed film is formed in the same manner as above using H 2
When treated in Se, the problem of the substrate / CuInSe 2 thin film interface does not occur, but the CuInSe 2 thin film is formed at a relatively low temperature because it starts to react with Se in the film in the process of raising the temperature, and the grain size is about 1 μm.
It did not grow up to about μm, and the efficiency of the manufactured solar cell was low. An object of the present invention is to provide a method for manufacturing a thin-film solar cell having a chalcopyrite-type compound thin film having a large particle diameter formed without forming a group VI element compound on a substrate surface.

【0006】[0006]

【課題を解決するための手段】上記の目的を達成するた
めに、本発明によれば、I−III−VI族カルコパイ
ライト型三元化合物薄膜を基板上に有する薄膜太陽電池
の製造方法において、周期表I族元素、III族元素、
およびVI族元素を含む初期膜を基板上の電極上に形成
した後、VI族元素雰囲気中での処理を行うことなく引
き続いてI族元素とIII族元素との混合膜を形成し、
次いで、VI族元素雰囲気中で処理することにより、積
層された初期膜と混合膜とを一体化されたI−III−
VI族薄膜と成すこととする。初期膜中に含まれるVI
族元素の量はI族元素の量とIII族元素の量の和以下
であることが有効である。また、初期膜が各元素の積層
膜であっても混合膜であってもよい。さらに、初期膜成
膜時の基板温度が400℃以下であることが有効であ
る。
According to the present invention, there is provided a method of manufacturing a thin-film solar cell having a group I-III-VI chalcopyrite-type ternary compound thin film on a substrate according to the present invention. Periodic table group I element, group III element,
And forming an initial film containing a Group VI element on an electrode on the substrate, and subsequently forming a mixed film of a Group I element and a Group III element without performing a treatment in a Group VI element atmosphere;
Next, by treating in a group VI element atmosphere, the laminated initial film and the mixed film are integrated into an I-III-
It is to be formed with a group VI thin film. VI contained in the initial film
It is effective that the amount of the group element is equal to or less than the sum of the amount of the group I element and the amount of the group III element. Further, the initial film may be a laminated film or a mixed film of each element. Further, it is effective that the substrate temperature during the initial film formation is 400 ° C. or less.

【0007】[0007]

【作用】初期膜の基板近傍にVI族元素を含ませておくこ
とにより、侵入する気体状のVI族元素による基板近傍で
の体積膨張が防止され、また昇温過程で基板近傍に早期
にI−III −VI2 族化合物が形成されるため、基板表面
のVI族化合物の生成が抑制される。そして、初期膜形成
の際の基板温度を400 ℃以下に抑えることが、基板近傍
の体積膨張、化合物生成の抑制効果を増す。また、III
族元素が基板付近にのみにあるため、形成される膜表面
では気体VI族元素との反応により高い基板温度でI−II
I −VI族化合物が形成され、粒径を大きく成長させるこ
とができる。
By including a Group VI element near the substrate in the initial film, volume expansion near the substrate due to invading gaseous Group VI element is prevented, and I Since the -III-VI group 2 compound is formed, the formation of the group VI compound on the substrate surface is suppressed. Then, suppressing the substrate temperature to 400 ° C. or less during the formation of the initial film increases the effect of suppressing volume expansion near the substrate and generation of compounds. Also III
Since the group III elements are present only in the vicinity of the substrate, the surface of the formed film reacts with the gaseous group VI elements at a high substrate temperature to obtain I-II.
A group I-VI compound is formed, and the particle size can be increased.

【0008】[0008]

【実施例】以下、CuInSe2 薄膜太陽電池製造の際の本発
明の実施例について述べる。図1(a) 〜(d) は、本発明
の一実施例のCuInSe2 薄膜太陽電池の製造プロセスを示
すものであり、ガラス基板1〔同図(a) 〕上にMo、Crな
どをスパッタ法により約1μm程度の厚さの下部電極2
を形成した後〔同図(b) 〕、三元同時蒸着法により基板
温度200 ℃にてCu−In−Se混合膜3を形成する。この
際、例えばCu/In=0.95としてSe/ (Cu+In) =1以下
となるように制御する。また、Cu−In−Se膜3は基板近
傍のみにし、例えば全体で0.2μm程度の厚さのCu膜に
対応するCuを蒸発させ、0.465 μm程度の厚さのIn膜に
対応するInを蒸発させる場合、厚さ0.1μm以下に対応
するCuを蒸発させた時点でSe蒸発源のシャッタを閉じ、
その後Cu−In混合膜4を形成する〔同図(c) 〕。次い
で、Seを含む雰囲気、例えばArで希釈されたH2 Seを3
〜15%程度含むガス中で、基板温度400 ℃程度で約1時
間処理すると、H2 Seから熱分解したSeとの反応により
CuInSe2 薄膜5が形成される〔同図(d) 〕。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, embodiments of the present invention in producing a CuInSe 2 thin film solar cell will be described. 1 (a) to 1 (d) show a manufacturing process of a CuInSe 2 thin film solar cell according to one embodiment of the present invention, in which Mo, Cr, etc. are sputtered on a glass substrate 1 [FIG. 1 (a)]. Lower electrode 2 having a thickness of about 1 μm
[FIG. 2B], a Cu—In—Se mixed film 3 is formed at a substrate temperature of 200 ° C. by a ternary simultaneous vapor deposition method. At this time, for example, control is performed so that Se / (Cu + In) = 1 or less with Cu / In = 0.95. Further, the Cu-In-Se film 3 is formed only in the vicinity of the substrate. For example, Cu corresponding to a Cu film having a thickness of about 0.2 μm is evaporated, and In corresponding to an In film having a thickness of about 0.465 μm is formed. When evaporating, the shutter of the Se evaporation source is closed when Cu corresponding to a thickness of 0.1 μm or less is evaporated,
Thereafter, a Cu-In mixed film 4 is formed [FIG. Then, an atmosphere containing Se, for example, H 2 Se diluted with Ar
When treated in a gas containing about 15% at a substrate temperature of about 400 ° C. for about 1 hour, it reacts with Se thermally decomposed from H 2 Se.
A CuInSe 2 thin film 5 is formed [FIG.

【0009】この方法により形成されたCuInSe2 薄膜5
は基板1上の下部電極2との界面の付着力も良好であ
り、粒径が約3μmと従来方法のCu−In−Se混合膜より
得たCuInSe2 薄膜の約1μmよりも大きく良好な膜が得
られた。また、図2の線21、22に本方法と基板近傍にSe
を含有させない従来法とにより得られたCuInSe2 薄膜5
を用いて試作した太陽電池の開放電圧VOCおよび変換効
率Effを示す。本方法のCuInSe2 薄膜を用いた太陽電池
は開放電圧が高く変換効率も12%以上と良好な特性を示
した。
[0009] CuInSe 2 thin film 5 formed by this method
Is a film having good adhesion at the interface with the lower electrode 2 on the substrate 1 and a particle size of about 3 μm, which is larger than about 1 μm of the CuInSe 2 thin film obtained from the conventional Cu—In—Se mixed film. was gotten. In addition, lines 21 and 22 in FIG.
CuInSe 2 thin film 5 obtained by the conventional method containing no Cu
5 shows the open-circuit voltage V OC and the conversion efficiency E ff of the solar cell prototyped using FIG. The solar cell using the CuInSe 2 thin film of this method showed good characteristics with high open-circuit voltage and high conversion efficiency of 12% or more.

【0010】また、別な方法としてCu/In積層膜につい
ても、Cu形成時にSeを同時に形成し、Cuの膜厚の約1/
2程度でSeの供給をとめた後Cuを規定膜厚形成、その後
Inを形成してもよい。図2の線23、24は、このようにし
て得たCuInSe2 薄膜を用いた太陽電池と、単にCu/In積
層膜をセレン化した従来方法によって得たCuInSe2 薄膜
を用いた太陽電池の開放電圧、変換効率を比較して示
す。なお、AgInSe2 をセレン化法で、CuInS2 、AgInS
2 を硫化法で成膜する場合も、同様な効果をあげること
ができる。
[0010] As another method, for a Cu / In laminated film, Se is simultaneously formed at the time of Cu formation, and about 1/100 of the film thickness of Cu.
After stopping the supply of Se in about 2, Cu is formed to a specified thickness, and then
In may be formed. Line 23, 24 in FIG. 2, a solar cell using the CuInSe 2 thin film thus obtained, simply open the solar cell using the CuInSe 2 thin film obtained by the conventional method selenide a Cu / In stacked film The voltage and the conversion efficiency are shown in comparison. In addition, AgInSe 2 is made of CuInS 2 , AgInS
The same effect can be obtained when the film 2 is formed by a sulfuration method.

【0011】[0011]

【発明の効果】VI族元素を基板付近にのみ含むI−III
元素積層膜および混合膜をSeを含む雰囲気中で熱処理す
ることにより、基板近傍での体積膨張を防ぐことがで
き、また昇温過程で基板近傍のみI−III −VI2 族化合
物が早期に形成されるためVI族元素化合物の生成を抑制
することができる。また、VI族元素は基板付近にのみあ
るため、膜表面は気体VI族元素、例えばH2 Seから熱分
解したSeとの反応により粒径を大きく成長させることが
でき、太陽電池の効率を大きく改善できる。
[Effect of the Invention] I-III containing a group VI element only near the substrate
By heat-treating the element laminated film and the mixed film in an atmosphere containing Se, volume expansion near the substrate can be prevented, and the I-III-VI group 2 compound is early formed only in the vicinity of the substrate during the temperature rise process. Therefore, generation of the group VI element compound can be suppressed. In addition, since the group VI element is present only in the vicinity of the substrate, the film surface can be grown to a large particle size by a reaction with a gaseous group VI element, for example, Se thermally decomposed from H 2 Se, thereby increasing the efficiency of the solar cell. Can be improved.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の一実施例におけるCuInSe2 成膜工程を
(a) ないし(d) の順に示す断面図
FIG. 1 illustrates a CuInSe 2 film forming process according to an embodiment of the present invention.
Sectional views shown in the order of (a) to (d)

【図2】本発明の実施例および従来法により成膜された
CuInSe2 薄膜を有する太陽電池の特性の比較線図
FIG. 2 shows an example of the present invention and a film formed by a conventional method.
CuInSe comparison diagram of characteristics of the solar cell with two films

【符号の説明】[Explanation of symbols]

1 ガラス基板 2 下部電極 3 Cu−In−Se混合膜 4 Cu−In混合膜 5 CuInSe2 DESCRIPTION OF SYMBOLS 1 Glass substrate 2 Lower electrode 3 Cu-In-Se mixed film 4 Cu-In mixed film 5 CuInSe 2 film

Claims (5)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】I−III−VI族カルコパイライト型三
元化合物薄膜を基板上に有する薄膜太陽電池の製造方法
において、周期表I族元素、III族元素、およびVI
族元素を含む初期膜を基板上の電極上に形成した後、V
I族元素雰囲気中での処理を行うことなく引き続いてI
族元素とIII族元素との混合膜を形成し、次いで、V
I族元素雰囲気中で処理することにより、積層された初
期膜と混合膜とを一体化されたI−III−VI族薄膜
と成すことを特徴とする薄膜太陽電池の製造方法。
1. A method for manufacturing a thin-film solar cell having a group I-III-VI chalcopyrite-type ternary compound thin film on a substrate, comprising a group I element, a group III element, and a group VI of the periodic table.
After forming an initial film containing a group III element on the electrode on the substrate, V
Without performing treatment in a Group I element atmosphere,
Forming a mixed film of a group III element and a group III element;
A method for producing a thin-film solar cell, comprising: forming a laminated initial film and a mixed film into an integrated group I-III-VI thin film by treating in a group I element atmosphere.
【請求項2】初期膜中に含まれるVI族元素の量はI族
元素の量とIII族元素の量の和以下である請求項1記
載の薄膜太陽電池の製造方法。
2. The method according to claim 1, wherein the amount of the group VI element contained in the initial film is equal to or less than the sum of the amount of the group I element and the amount of the group III element.
【請求項3】初期膜が各元素の積層膜である請求項1あ
るいは2記載の薄膜太陽電池の製造方法。
3. The method according to claim 1, wherein the initial film is a laminated film of each element.
【請求項4】初期膜が各元素の混合膜である請求項1あ
るいは2記載の薄膜太陽電池の製造方法。
4. The method according to claim 1, wherein the initial film is a mixed film of each element.
【請求項5】初期膜成膜時の基板温度が400℃以下で
ある請求項1ないし4のいずれかに記載の薄膜太陽電池
の製造方法。
5. The method according to claim 1, wherein the substrate temperature at the time of forming the initial film is 400 ° C. or lower.
JP4337686A 1992-12-18 1992-12-18 Manufacturing method of thin film solar cell Expired - Fee Related JP2983117B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4337686A JP2983117B2 (en) 1992-12-18 1992-12-18 Manufacturing method of thin film solar cell

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4337686A JP2983117B2 (en) 1992-12-18 1992-12-18 Manufacturing method of thin film solar cell

Publications (2)

Publication Number Publication Date
JPH06188444A JPH06188444A (en) 1994-07-08
JP2983117B2 true JP2983117B2 (en) 1999-11-29

Family

ID=18311015

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4337686A Expired - Fee Related JP2983117B2 (en) 1992-12-18 1992-12-18 Manufacturing method of thin film solar cell

Country Status (1)

Country Link
JP (1) JP2983117B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4620105B2 (en) 2007-11-30 2011-01-26 昭和シェル石油株式会社 Method for manufacturing light absorption layer of CIS thin film solar cell

Also Published As

Publication number Publication date
JPH06188444A (en) 1994-07-08

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