JP2953850B2 - Semiconductor substrate crack detector - Google Patents

Semiconductor substrate crack detector

Info

Publication number
JP2953850B2
JP2953850B2 JP3118292A JP3118292A JP2953850B2 JP 2953850 B2 JP2953850 B2 JP 2953850B2 JP 3118292 A JP3118292 A JP 3118292A JP 3118292 A JP3118292 A JP 3118292A JP 2953850 B2 JP2953850 B2 JP 2953850B2
Authority
JP
Japan
Prior art keywords
semiconductor substrate
circuit
chip
wafer
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP3118292A
Other languages
Japanese (ja)
Other versions
JPH05235130A (en
Inventor
清也 湯上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Kyushu Ltd
Original Assignee
NEC Kyushu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Kyushu Ltd filed Critical NEC Kyushu Ltd
Priority to JP3118292A priority Critical patent/JP2953850B2/en
Publication of JPH05235130A publication Critical patent/JPH05235130A/en
Application granted granted Critical
Publication of JP2953850B2 publication Critical patent/JP2953850B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は半導体基板(以下、ウェ
ハーという)の割れ検出器に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a crack detector for a semiconductor substrate (hereinafter referred to as "wafer").

【0002】[0002]

【従来の技術】従来のウェハーの割れ検知は製造装置内
で処理終了後回収したウェハーの枚数を数えて処理枚数
通りあるかどうかで判断していた。
2. Description of the Related Art Conventionally, the detection of cracks in a wafer has been performed by counting the number of wafers collected after the processing in the manufacturing apparatus and judging whether the number of processed wafers is equal to the number of processed wafers.

【0003】[0003]

【発明が解決しようとする課題】この従来の割れ検知方
法では、ウェハーの枚数を数えるまで割れたかどうかわ
からず、又ウェハーが一部欠けた状態だった場合に見す
ごして、次の工程へ送られるという問題があった。
In this conventional crack detection method, it is not known whether the wafer has broken until the number of wafers is counted, and if the wafer is partially missing, it is sent to the next step. There was a problem that was.

【0004】[0004]

【課題を解決するための手段】本発明のウェハー割れ検
出器は、投光器と受光器の間の光経路をウェハーのカケ
ラが通過することにより該受光器のレベル変化を起こす
光学式センサーと、前記光学式センサーのレベル変化を
入力してウェハーのカケラの大きさによる判別値を得る
判別回路と、前記判別回路からのパルス信号を計測する
カウンター回路と、前記カウンター回路からの計測値と
設定回路において設定された設定値とを比較して一致し
たら割れ検出の信号を出力する制御回路とを有して製造
装置で発生するウェハーのカケラの通過とカケラ以外の
通過とを判別することを可能にしたことを特徴とする。
According to the present invention, there is provided a wafer crack detector, comprising: an optical sensor for causing a level change of a light receiving device when a chip of a wafer passes through an optical path between a light emitting device and a light receiving device; In the discriminating circuit which receives the level change of the optical sensor and obtains a discriminating value based on the size of the chip of the wafer, a counter circuit which measures the pulse signal from the discriminating circuit, produced have a control circuit that outputs a signal of the detected cracks After match by comparing the set value
Passage of wafers generated by the equipment and non-
It is characterized in that it is possible to determine the passage .

【0005】すなわち本発明では、光学式センサーの投
光器と受光器の間をウェハーのカケラが通過すると受光
器の入力レベルが変化する。その入力レベルの変化を判
別回路でとらえ、カウンター回路へ出力する。カウンタ
ー回路はその出力をカウントし制御回路へカウンター値
として出力する。制御回路はプリセットされた設定値と
カウンター値を比較し一致したらウェハー割れ検出の信
号を出力する。
That is, according to the present invention, the input level of the light-receiving device changes when the chip of the wafer passes between the light-emitting device and the light-receiving device of the optical sensor. The change in the input level is detected by the discriminating circuit and output to the counter circuit. The counter circuit counts the output and outputs it to the control circuit as a counter value. The control circuit compares the preset set value with the counter value, and outputs a signal for detecting a wafer crack when they match.

【0006】[0006]

【実施例】次に本発明について図面を参照して説明す
る。図1は本発明の構成図である。投光器1からでた光
Aが受光器2に入っている。その光2の経路をウェハー
のカケラが横ぎると、受光器2の入力レベルが下がる。
その変化を判別回路3が判定し、パルスとしてカウンタ
ー回路4に出力する。カウンター回路4はカウントした
値を制御回路5に出力する。制御回路5は設定回路6か
ら設定された値とカウンター値を比較し一致したら割れ
検出の信号をだす。又制御回路5は一定時間内にカウン
ター値が設定値と一致しなければ自動的にカウンター回
路4へリセット信号を出しカウンター値をクリアーす
る。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, the present invention will be described with reference to the drawings. FIG. 1 is a configuration diagram of the present invention. Light A emitted from the light projector 1 enters the light receiver 2. When the chip of the wafer crosses the path of the light 2, the input level of the light receiver 2 decreases.
The change is determined by the determination circuit 3 and output to the counter circuit 4 as a pulse. The counter circuit 4 outputs the counted value to the control circuit 5. The control circuit 5 compares the value set by the setting circuit 6 with the counter value, and outputs a crack detection signal when they match. If the counter value does not match the set value within a predetermined time, the control circuit 5 automatically sends a reset signal to the counter circuit 4 to clear the counter value.

【0007】[0007]

【発明の効果】以上説明したように本発明は、ウェハー
のカケラを検出するようにしたので、割れが発生した時
点で製造装置へウェハー割れの信号を送ることができ
る。製造装置はその信号を受けて適切な対応をとること
ができる。又、カケラで判別するので、ウェハーの一分
が欠けた状態でも検出することができる。
As described above, according to the present invention, a chip of a wafer is detected, so that a signal of a wafer crack can be sent to a manufacturing apparatus when a crack occurs. The manufacturing apparatus can take an appropriate response in response to the signal. Further, since the discrimination is made by the chip, it can be detected even in a state where one part of the wafer is missing.

【0008】本発明の判別回路3の判別値はウェハーの
カケラの大きさにより任意に設定できる。製造装置で発
生するウェハーのカケラの大きさにあわせて設定し、制
御回路5への設定値は、ウェハーのカケラ以外の物が通
過することがある場合にそなえて、あらかじめ設定して
おく。ウェハーのカケラは一秒以内に数10〜数100
の値で通過していく為、製造装置の機構部の通過等の外
乱を設定しておくことで除くことができる。
The discrimination value of the discrimination circuit 3 of the present invention can be arbitrarily set according to the size of the wafer chip. The value is set in accordance with the size of the chip of the wafer generated in the manufacturing apparatus, and the set value to the control circuit 5 is set in advance in case an object other than the chip of the wafer may pass. Wafer fragmentation is several tens to several hundreds within one second
, It can be eliminated by setting a disturbance such as passing through a mechanism of the manufacturing apparatus.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の一実施例の構成図である。FIG. 1 is a configuration diagram of an embodiment of the present invention.

【符号の説明】[Explanation of symbols]

1 投光器 2 受光器 3 判別回路 4 カウンター回路 5 制御回路 6 設定器 A 光の流れ DESCRIPTION OF SYMBOLS 1 Emitter 2 Receiver 3 Discrimination circuit 4 Counter circuit 5 Control circuit 6 Setting device A Light flow

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 投光器と受光器の間の光経路を半導体基
板のカケラが通過することにより該受光器のレベル変化
を起こす光学式センサーと、前記光学式センサーのレベ
ル変化を入力して半導体基板のカケラの大きさによる判
別値を得る判別回路と、前記判別回路からのパルス信号
を計測するカウンター回路と、前記カウンター回路から
の計測値と設定回路において設定された設定値とを比較
して一致したら割れ検出の信号を出力する制御回路とを
して製造装置で発生する半導体基板のカケラの通過と
カケラ以外の通過とを判別することを可能にしたことを
特徴とする半導体基板割れ検出器。
1. An optical sensor for causing a level change of a light receiving device when a chip of a semiconductor substrate passes through an optical path between a light emitting device and a light receiving device, and a semiconductor substrate receiving a level change of the optical sensor. A discriminating circuit that obtains a discriminant value according to the size of the chip, a counter circuit that measures a pulse signal from the discriminating circuit, and compares the measured value from the counter circuit with the set value set in the setting circuit to match. and passing the piece of semiconductor substrate that occur in closed to production equipment and a control circuit for cracking outputs a signal of detection After
A semiconductor substrate crack detector characterized in that it is possible to discriminate between passages other than broken pieces.
JP3118292A 1992-02-19 1992-02-19 Semiconductor substrate crack detector Expired - Fee Related JP2953850B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3118292A JP2953850B2 (en) 1992-02-19 1992-02-19 Semiconductor substrate crack detector

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3118292A JP2953850B2 (en) 1992-02-19 1992-02-19 Semiconductor substrate crack detector

Publications (2)

Publication Number Publication Date
JPH05235130A JPH05235130A (en) 1993-09-10
JP2953850B2 true JP2953850B2 (en) 1999-09-27

Family

ID=12324306

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3118292A Expired - Fee Related JP2953850B2 (en) 1992-02-19 1992-02-19 Semiconductor substrate crack detector

Country Status (1)

Country Link
JP (1) JP2953850B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3425664A1 (en) 2017-07-07 2019-01-09 Nxp B.V. Integrated circuit with a seal ring

Also Published As

Publication number Publication date
JPH05235130A (en) 1993-09-10

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Effective date: 19990615

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