JP2945298B2 - Manufacturing method of aluminum alloy foil for electrolytic capacitor cathode - Google Patents

Manufacturing method of aluminum alloy foil for electrolytic capacitor cathode

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Publication number
JP2945298B2
JP2945298B2 JP6419495A JP6419495A JP2945298B2 JP 2945298 B2 JP2945298 B2 JP 2945298B2 JP 6419495 A JP6419495 A JP 6419495A JP 6419495 A JP6419495 A JP 6419495A JP 2945298 B2 JP2945298 B2 JP 2945298B2
Authority
JP
Japan
Prior art keywords
foil
etching
less
temperature
aluminum alloy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP6419495A
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Japanese (ja)
Other versions
JPH08260117A (en
Inventor
英幹 松本
睦子 藤川
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Furukawa Electric Co Ltd
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Furukawa Electric Co Ltd
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Priority to JP6419495A priority Critical patent/JP2945298B2/en
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Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、エッチング性に優れた
電解コンデンサ陰極用アルミニウム合金箔地の製造方法
に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing an aluminum alloy foil for an electrolytic capacitor cathode having excellent etching properties.

【0002】[0002]

【従来の技術】電解コンデンサの極板には、軽量且つ小
型化が可能なアルミニウム箔が多用されている。一般
に、電解コンデンサの静電容量を高めるには、陽極用ア
ルミニウム合金箔の静電容量だけでなく、陰極用アルミ
ニウム合金箔の静電容量も増大させる必要がある。前記
合金箔の静電容量を増大させるには、箔を電気化学的、
または化学的にエッチングして表面を粗面化し、表面積
を増大させて行われる。また陰極用箔は、陽極用箔と比
較して厚さの薄い箔が使用される場合が殆どであるた
め、高強度であることが要求される。
2. Description of the Related Art Aluminum plates which are lightweight and can be miniaturized are frequently used for electrode plates of electrolytic capacitors. Generally, in order to increase the capacitance of an electrolytic capacitor, it is necessary to increase not only the capacitance of an aluminum alloy foil for an anode but also the capacitance of an aluminum alloy foil for a cathode. To increase the capacitance of the alloy foil, the foil must be electrochemically
Alternatively, the surface is roughened by chemical etching to increase the surface area. In most cases, the foil for the cathode is required to have high strength because a foil having a smaller thickness than the foil for the anode is used.

【0003】前記陰極用アルミニウム合金箔は、例え
ば、アルミニウム溶湯を半連続鋳造法によって鋳塊と
し、この鋳塊を熱間圧延および冷間圧延によって厚さ
0.3〜0.6mmの箔地とし、さらに10から100 μm程度の厚
さに箔圧延して製造される。前記鋳塊を熱間圧延前に均
質化熱処理すること、冷間圧延途中で必要に応じて中間
焼鈍すること、エッチング処理前に箔を焼鈍して歪みを
取ること等が通常行われている。また前記箔は、エッチ
ングが少ないと十分に粗面化せず、エッチングが過ぎる
とエッチングむらが生じて、いずれの場合も静電容量の
低下をきたす。またエッチングが過度になると、強度も
低下するようになる。このため、エッチング量は適正に
コントロールする必要がある。
[0003] The aluminum alloy foil for a cathode is, for example, formed into an ingot by semi-continuous casting of molten aluminum, and the ingot is formed into a thickness by hot rolling and cold rolling.
It is manufactured by foil rolling to a thickness of 0.3 to 0.6 mm, and further, foil rolling to a thickness of about 10 to 100 μm. Usually, the ingot is subjected to a homogenizing heat treatment before hot rolling, intermediate annealing is performed as needed during cold rolling, and a foil is annealed to remove distortion before etching. In addition, if the etching is small, the foil is not sufficiently roughened. If the etching is excessive, uneven etching occurs, and in any case, the capacitance is reduced. When the etching is excessive, the strength also decreases. For this reason, it is necessary to appropriately control the etching amount.

【0004】[0004]

【発明が解決しようとする課題】しかし、エッチング量
をいくら適正にコントロールしてもエッチングむらが生
じて静電容量等の特性に十分高い値が得られないという
問題があった。本発明者等は、溶解鋳造段階以降の製造
条件について種々検討を加えた結果、均質化熱処理から
熱間圧延開始までのスラブの熱的保持条件を限定するこ
とによりエッチングむらを低減できることを知見し、更
に研究を重ねて本発明を完成するに至った。本発明の目
的は、エッチングが均一になされ、優れた特性の陰極が
得られる、電解コンデンサ陰極用アルミニウム合金箔地
の製造方法を提供することにある。
However, even if the amount of etching is properly controlled, there is a problem that uneven etching occurs and a sufficiently high value such as a capacitance cannot be obtained. The present inventors have conducted various studies on the manufacturing conditions after the melting and casting stage, and found that it is possible to reduce etching unevenness by limiting the slab thermal holding conditions from the homogenization heat treatment to the start of hot rolling. The present inventors have further studied and completed the present invention. An object of the present invention is to provide a method for producing an aluminum alloy foil for an electrolytic capacitor cathode, in which etching is performed uniformly and a cathode having excellent characteristics is obtained.

【0005】[0005]

【課題を解決するための手段】本発明は、アルミニウム
の純度が98.5wt%以上、99.9wt%未満であり、Feを0.
15wt%以下、Siを0.15wt%以下、Cuを0.01〜0.6 wt
%含有し、残部が不可避的不純物からなるアルミニウム
合金鋳塊を 580℃以上の温度で4時間未満の均質化熱処
理を施した後、 420〜570 ℃の温度まで冷却し、該温度
に30分以上12時間以下保持し、その後前記温度で熱間圧
延を開始して常法にしたがって熱間圧延と冷間圧延を順
次施すことを特徴とする電解コンデンサ陰極用アルミニ
ウム合金箔地の製造方法である。
According to the present invention, the purity of aluminum is not less than 98.5% by weight and less than 99.9% by weight, and the content of Fe is not less than 0.9% by weight.
15 wt% or less, Si 0.15 wt% or less, Cu 0.01 to 0.6 wt
% Ingot, the remainder of which is made of inevitable impurities, is subjected to a homogenizing heat treatment at a temperature of 580 ° C or higher for less than 4 hours, and then cooled to a temperature of 420 to 570 ° C. A method for producing an aluminum alloy foil for a cathode of an electrolytic capacitor, comprising: holding for 12 hours or less, thereafter starting hot rolling at the above temperature, and sequentially performing hot rolling and cold rolling according to a conventional method.

【0006】[0006]

【作用】本発明において、アルミニウム合金鋳塊のアル
ミニウムの純度を98.5wt%以上、99.9wt%未満に限定し
た理由は、純度が99.9wt%以上では、陰極用としての箔
の強度が不足し、純度が98.5wt%未満では、エッチング
液との反応が非常に激しくなり、エッチングが過度に進
んで、正常な粗面が得られなくなるためである。
In the present invention, the reason for limiting the aluminum purity of the aluminum alloy ingot to 98.5 wt% or more and less than 99.9 wt% is that if the purity is 99.9 wt% or more, the strength of the foil for the cathode is insufficient, If the purity is less than 98.5 wt%, the reaction with the etching solution becomes extremely vigorous, and the etching proceeds excessively, so that a normal rough surface cannot be obtained.

【0007】Fe、Siはアルミニウム地金中に不可避
的に含有される元素であり、これら元素の大半は、アル
ミニウム合金溶湯を半連続鋳造した際に、5μm程度の
粗大な金属間化合物として鋳塊中に晶出する。この晶出
物は箔にまで残存して、箔のエッチング性を害するもの
である。本発明では、これら粗大な晶出物は、 580℃以
上の温度での均質化熱処理により、約1μm程度に分断
され、またはマトリックス中に固溶する。その結果、エ
ッチングが均一になされる。本発明において、Feおよ
びSiをそれぞれ0.15wt%以下に限定した理由は、いず
れが0.15wt%を超えても、均質化熱処理の際に金属間化
合物を微細に分断或いは固溶することが十分行われなく
なってエッチングむらが生じるためである。
[0007] Fe and Si are elements inevitably contained in aluminum ingots, and most of these elements are cast into ingots as coarse intermetallic compounds of about 5 μm when semi-continuous casting of molten aluminum alloy. Crystallizes in. This crystallized substance remains on the foil and impairs the etching property of the foil. In the present invention, these coarse precipitates are divided into about 1 μm by a homogenizing heat treatment at a temperature of 580 ° C. or higher, or form a solid solution in the matrix. As a result, the etching is performed uniformly. In the present invention, the reason why each of Fe and Si is limited to 0.15 wt% or less is that even if any of them exceeds 0.15 wt%, it is sufficient to finely separate or dissolve the intermetallic compound during the homogenization heat treatment. This is due to the fact that etching is uneven due to loss of etching.

【0008】Cuは箔の強度を高める効果がある。Cu
の含有量が0.01wt%未満ではその効果が十分に得られ
ず、 0.6wt%を超えるとエッチング液との反応が非常に
激しくなって、箔全面が急速に溶解する異常溶解が起
き、その結果、静電容量および強度がともに低下する。
従ってCuの含有量は0.01から0.6 wt%に限定する。
[0008] Cu has the effect of increasing the strength of the foil. Cu
If the content is less than 0.01 wt%, the effect cannot be obtained sufficiently. If it exceeds 0.6 wt%, the reaction with the etching solution becomes extremely violent, and the entire surface of the foil rapidly dissolves, resulting in abnormal dissolution. , The capacitance and the strength both decrease.
Therefore, the content of Cu is limited to 0.01 to 0.6 wt%.

【0009】本発明では、 580℃以上の温度で4時間未
満の均質化熱処理を行う。均質化熱処理温度を 580℃以
上に限定した理由は、 580℃未満の温度では、粗大な晶
出物を約1μm程度に分断し、再固溶させることが十分
行われなくなるからである。均質化熱処理は高温で行う
程、粗大な晶出物の分断および再固溶が短時間で完了し
て生産性が向上する。従って均質化熱処理は 580℃以
上、より好ましくは 600℃以上の温度で行うのが良い。
In the present invention, the homogenizing heat treatment is performed at a temperature of 580 ° C. or more for less than 4 hours. The reason for limiting the temperature of the homogenizing heat treatment to 580 ° C. or higher is that if the temperature is lower than 580 ° C., it is not sufficient to divide the coarse crystallized product into about 1 μm and re-dissolve it. As the homogenization heat treatment is performed at a higher temperature, the separation and re-dissolution of coarse crystallized substances are completed in a shorter time, and the productivity is improved. Therefore, the homogenization heat treatment is preferably performed at a temperature of 580 ° C or more, more preferably 600 ° C or more.

【0010】前記の 580℃以上での均質化熱処理の処理
時間は4時間未満とする。均質化熱処理時間が4時間以
上になると、鋳造時に形成した粗大な金属間化合物は分
断および再固溶するが、一方新たな金属間化合物が生
成、析出してしまい、エッチングの際に箔の異常溶解を
引き起こす。従って均質化熱処理時間は4時間未満に限
定され、より好ましくは1〜3時間で行うのが良い。前
記の新たに析出する金属間化合物は、Siと他の元素と
の化合物であると考えられる。なお、 580℃以上での保
持時間4時間未満は、 580℃以上での保持のトータル時
間を意味する。
The treatment time of the above-mentioned homogenization heat treatment at 580 ° C. or more is set to less than 4 hours. If the homogenization heat treatment time is more than 4 hours, the coarse intermetallic compound formed during casting will break up and re-dissolve, but new intermetallic compounds will be generated and deposited, and abnormalities in the foil during etching will occur. Causes dissolution. Therefore, the homogenization heat treatment time is limited to less than 4 hours, and more preferably 1 to 3 hours. The newly precipitated intermetallic compound is considered to be a compound of Si and another element. The retention time of less than 4 hours at 580 ° C. or more means the total time of retention at 580 ° C. or more.

【0011】そしてこのように均質化熱処理を施した
後、 420〜570 ℃の温度まで冷却する。前記の均質化熱
処理後直ちに熱間圧延を行った場合、均質化熱処理で固
溶させた金属元素の一部は、熱間圧延時に 0.1μm以下
の極めて微細な金属間化合物として多数析出してしま
い、そのため異常溶解が発生し静電容量の低下を招く。
均質化熱処理後 420〜570 ℃の温度まで冷却した場合、
均質化熱処理で固溶させた金属元素は析出するが、この
析出は固溶し切れずに残った金属間化合物を粗大化させ
る形で生じるため、エッチング性に大きな影響を及ぼさ
ない。この処理によって固溶元素量が減少し、熱間圧延
時に 0.1μm以下の微細な化合物が多数析出することを
抑制できる。より好ましくは 560℃以下 420℃の温度ま
で冷却して保持を行うのが良い。一方、均質化熱処理後
の冷却温度が 420℃未満のように低すぎると、固溶させ
た金属元素は 0.1μm以下の微細な化合物として多数析
出するようになり、異常溶解の原因となる。さらに熱間
圧延時の変形抵抗の増大等による加工性の低下を招くこ
とから、冷却温度の下限は 420℃以上とすることが好ま
しい。他方、 570℃を超えると高温で析出する新たな金
属間化合物の析出を抑制することができない。また固溶
量を十分に下げ熱間圧延時に微細な化合物が多数析出す
ることを抑制するためには、 420〜570 ℃に冷却後30分
以上12時間以下の保持を行うことが好ましい。またこの
保持時間は、前記金属間化合物の析出の他に、エネルギ
ーコストの関係からも30分以上12時間以下とすることが
好ましい。
After the homogenizing heat treatment is performed, the temperature is cooled to a temperature of 420 to 570 ° C. When hot rolling is performed immediately after the homogenizing heat treatment, a part of the metal element dissolved in the homogenizing heat treatment precipitates as an extremely fine intermetallic compound of 0.1 μm or less during the hot rolling. As a result, abnormal melting occurs and the capacitance is reduced.
When cooled to a temperature of 420 to 570 ° C after the homogenization heat treatment,
The metal element dissolved by the homogenization heat treatment precipitates, but the precipitation occurs in the form of coarsening the intermetallic compound remaining without being completely dissolved, and thus does not significantly affect the etching property. By this treatment, the amount of solid solution elements is reduced, and the precipitation of many fine compounds of 0.1 μm or less during hot rolling can be suppressed. More preferably, the temperature is maintained at a temperature of from 560 ° C. to 420 ° C. On the other hand, if the cooling temperature after the homogenization heat treatment is too low, such as less than 420 ° C., a large number of dissolved metal elements will precipitate as fine compounds of 0.1 μm or less, which causes abnormal dissolution. Further, the lower limit of the cooling temperature is preferably set to 420 ° C. or more, since the workability is lowered due to an increase in deformation resistance during hot rolling. On the other hand, when the temperature exceeds 570 ° C., the precipitation of new intermetallic compounds that precipitate at high temperatures cannot be suppressed. In addition, in order to sufficiently reduce the amount of solid solution and suppress the precipitation of a large number of fine compounds during hot rolling, it is preferable to maintain the temperature for 30 minutes to 12 hours after cooling to 420 to 570 ° C. The holding time is preferably 30 minutes or more and 12 hours or less from the viewpoint of energy cost in addition to the precipitation of the intermetallic compound.

【0012】鋳塊は、前記均質化熱処理および 420〜57
0 ℃の温度への冷却保持の後、この温度(420〜570 ℃)
で熱間圧延を開始し常法にしたがって熱間圧延および冷
間圧延を順次施して、箔地に加工される。冷間圧延で
は、必要に応じ中間焼鈍を施す。前記箔地は常法にした
がって箔圧延される。得られた箔は、必要に応じ焼鈍し
て歪みを除去したのち、エッチング処理と陽極酸化処理
が順次施されて陰極に加工される。以上の製造方法によ
って、得られる箔はエッチングが均一になされ、エッチ
ング後の強度の低下も小さい。
[0012] The ingot is subjected to the homogenizing heat treatment and 420-57.
After cooling to a temperature of 0 ° C, this temperature (420-570 ° C)
, Hot rolling and cold rolling are sequentially performed according to a conventional method, and the foil is processed. In cold rolling, intermediate annealing is performed as needed. The foil is rolled in a conventional manner. The obtained foil is annealed, if necessary, to remove distortion, and then subjected to an etching treatment and an anodic oxidation treatment in order to be processed into a cathode. According to the above-described manufacturing method, the obtained foil is etched uniformly, and the strength after etching is hardly reduced.

【0013】[0013]

【実施例】以下に本発明を実施例により詳細に説明す
る。 (実施例1)表1に示す組成のアルミニウム合金を半連
続鋳造法によりスラブ(厚さ200mmの板状鋳塊)に鋳造
した。得られたスラブを表2に示すごとく種々条件にて
均質化熱処理を施したのち冷却保持し、次いで保持温度
で熱間圧延を開始して厚さ6mmの板材に常法により熱間
圧延した。次にこの熱間圧延材を冷間圧延して厚さ0.4
mmの箔地とし、この箔地を箔圧延して厚さ0.04mmの箔に
加工した。前記冷間圧延では、材種により適宜中間焼鈍
を入れた。得られた各々の箔にエッチング処理を施し、
エッチングむらおよび引張強さを調査した。エッチング
処理は箔を55℃のエッチング液に浸漬し、この箔に60H
zの交流を8A/dm2の電流密度で3分間通電して行っ
た。その結果を表3に示す。
The present invention will be described below in detail with reference to examples. (Example 1) An aluminum alloy having the composition shown in Table 1 was cast into a slab (a plate-like ingot having a thickness of 200 mm) by a semi-continuous casting method. The obtained slab was subjected to a homogenizing heat treatment under various conditions as shown in Table 2, and then cooled and held. Then, hot rolling was started at the holding temperature and hot rolled into a 6 mm-thick sheet material by an ordinary method. Next, this hot-rolled material is cold-rolled to a thickness of 0.4
mm foil, and the foil was rolled into a foil having a thickness of 0.04 mm. In the cold rolling, intermediate annealing was appropriately performed depending on the grade. Performing an etching process on each of the obtained foils,
The etching unevenness and tensile strength were investigated. For the etching treatment, the foil was immersed in an etching solution at 55 ° C.
An AC current of z was conducted at a current density of 8 A / dm 2 for 3 minutes. Table 3 shows the results.

【0014】[0014]

【表1】 [Table 1]

【0015】[0015]

【表2】 [Table 2]

【0016】[0016]

【表3】 [Table 3]

【0017】表1〜表3から明らかなように、本発明方
法品(No.1〜5)は、いずれも、引張強さがエッチング前
後の両方において高かった。エッチングむらも全く発生
しなかった。No.3は冷間圧延途中で中間焼鈍を入れたも
のであるが、特性上の差は特には認められなかった。こ
れに対し、比較例品のNo.6、7 は箔の引張強さがエッチ
ング前後とも低かった。これは、前者はアルミニウムの
純度が 99.95wt%と高かったため、後者はCuの含有量
が0.01wt%未満と低かったためである。No.8はエッチン
グ後の引張強さが低下した。これはCuの含有量が 0.6
wt%を超えたため、エッチングの際に箔がエッチング液
と非常に激しく反応し、異常溶解したためである。No.9
はエッチングむらが発生し、エッチング後の引張強さも
著しく低下した。これは、アルミニウムの純度が98.5wt
%以下と低いため、箔がエッチング液と非常に激しく反
応し、エッチング量が過度となり、正常な粗面が得られ
なかったためである。冷間圧延途中の中間焼鈍の影響
は、特には認められなかった。
As is apparent from Tables 1 to 3, all of the products of the present invention (Nos. 1 to 5) had high tensile strengths both before and after etching. No etching unevenness occurred at all. No. 3 was subjected to intermediate annealing during cold rolling, but no particular difference in properties was observed. On the other hand, in Comparative Examples Nos. 6 and 7, the tensile strength of the foil was low both before and after etching. This is because the former had a high purity of aluminum of 99.95 wt%, and the latter had a low Cu content of less than 0.01 wt%. In No. 8, the tensile strength after etching decreased. This is because the Cu content is 0.6
The reason for this is that, when the content exceeds wt%, the foil reacts very violently with the etching solution during the etching and is abnormally dissolved. No.9
In the sample, unevenness of etching occurred, and the tensile strength after etching was significantly reduced. This is because the purity of aluminum is 98.5wt
% Or less, the foil reacted very violently with the etching solution, the amount of etching became excessive, and a normal rough surface could not be obtained. The effect of intermediate annealing during cold rolling was not particularly observed.

【0018】(実施例2)表1に示した No.Bの合金
を、実施例1と同様の方法および条件にて厚さ0.04mmの
箔に加工した。製造にあたり、表4に示すごとくスラブ
の均質化熱処理等の条件は種々に変化させた。得られた
箔を実施例1と同じ方法によりエッチングし、エッチン
グ前後の箔の引張強さとエッチングむらを調査した。エ
ッチング後の箔に陽極酸化処理を施して陰極とし、静電
容量を測定した。静電容量は、LCRメーターを用いて
測定した。陽極酸化処理は、60℃に加温した5%アジピ
ン酸アンモニウム溶液に浸漬し10Vの電圧を付与して行
った。その結果を表5に示す。
Example 2 An alloy of No. B shown in Table 1 was processed into a 0.04 mm thick foil in the same manner and under the same conditions as in Example 1. In the production, as shown in Table 4, various conditions such as heat treatment for homogenizing the slab were changed. The obtained foil was etched by the same method as in Example 1, and the tensile strength and etching unevenness of the foil before and after etching were examined. The foil after the etching was subjected to anodizing treatment to form a cathode, and the capacitance was measured. The capacitance was measured using an LCR meter. The anodizing treatment was performed by immersing in a 5% ammonium adipate solution heated to 60 ° C. and applying a voltage of 10 V. Table 5 shows the results.

【0019】[0019]

【表4】 [Table 4]

【0020】[0020]

【表5】 [Table 5]

【0021】表4および表5より明らかなように、本発
明方法品(No.10〜12) は、いずれも箔の引張強さが高
く、エッチングむらも発生せず、静電容量も高かった。
No.11は冷間圧延の途中で焼鈍を入れたものであるが、
焼鈍を入れなかったものとの間に特性上の差異は特には
認められなかった。他方、比較例品のNo.15 は均質化熱
処理温度が低かったため、鋳塊中の粗大晶出物の多くが
箔に残存した。その結果エッチングむらが発生し、エッ
チング後の引張強さも著しく低下した。エッチングむら
が生じたため、静電容量も大幅に低下した。No.16 とN
o.17 は、均質化熱処理から熱間圧延開始までにスラブ
が 580℃以上の温度に保持された時間が長かったため、
固溶元素が、新たな金属間化合物として析出し、この析
出物がそのまま箔にまで持ち来たされて、エッチングの
際、箔に異常溶解が起きた。そのため、静電容量および
引張強さが低下した。
As is clear from Tables 4 and 5, all of the products of the present invention (Nos. 10 to 12) had a high tensile strength of the foil, no uneven etching, and a high capacitance. .
No. 11 is annealed during cold rolling,
No particular difference in properties was observed between those not subjected to annealing. On the other hand, since the homogenizing heat treatment temperature of Comparative Example No. 15 was low, most of the coarse crystals in the ingot remained on the foil. As a result, etching unevenness occurred, and the tensile strength after etching was significantly reduced. Due to uneven etching, the capacitance was also significantly reduced. No.16 and N
In o.17, the time during which the slab was kept at a temperature of 580 ° C or higher from the homogenization heat treatment to the start of hot rolling was long,
The solid solution element was precipitated as a new intermetallic compound, and this precipitate was brought to the foil as it was, and abnormal etching occurred in the foil during etching. As a result, the capacitance and the tensile strength decreased.

【0022】[0022]

【発明の効果】以上述べたように、本発明では、所定組
成のアルミニウム合金鋳塊を、高温、短時間の所定条件
で均質化熱処理し、均質化熱処理後所定温度以下に冷却
保持して熱間圧延するので、得られる箔地は、粗大晶出
物や析出物が存在せず、従ってこの箔地を箔圧延して得
られる箔はエッチング性が良好で且つ強度が高く、これ
を陰極に用いた電解コンデンサは静電容量等が高く性能
に優れたものとなる。
As described above, according to the present invention, an aluminum alloy ingot having a predetermined composition is subjected to a homogenizing heat treatment at a high temperature for a short period of time under a predetermined condition, and after the homogenizing heat treatment, the aluminum alloy ingot is cooled to a predetermined temperature or less and then heated. Since the foil is rolled, the obtained foil is free of coarse crystals and precipitates.Therefore, the foil obtained by foil rolling this foil has good etching properties and high strength. The electrolytic capacitor used has a high capacitance and the like and is excellent in performance.

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 アルミニウムの純度が98.5wt%以上、9
9.9wt%未満であり、Feを0.15wt%以下、Siを0.15w
t%以下、Cuを0.01〜0.6 wt%含有し、残部が不可避
的不純物からなるアルミニウム合金鋳塊を 580℃以上の
温度で4時間未満の均質化熱処理を施した後、 420〜57
0 ℃の温度まで冷却し、該温度に30分以上12時間以下保
持し、その後前記温度で熱間圧延を開始して常法にした
がって熱間圧延と冷間圧延を順次施すことを特徴とする
電解コンデンサ陰極用アルミニウム合金箔地の製造方
法。
1. The method according to claim 1, wherein the purity of the aluminum is 98.5 wt% or more.
Less than 9.9wt%, Fe is 0.15wt% or less, Si is 0.15w
t% or less, containing 0.01 to 0.6 wt% of Cu and the balance being an unavoidable impurity, after subjecting an aluminum alloy ingot to a homogenizing heat treatment at a temperature of 580 ° C or more for less than 4 hours,
Cooling to a temperature of 0 ° C., holding at that temperature for 30 minutes or more and 12 hours or less, then starting hot rolling at the above temperature and sequentially performing hot rolling and cold rolling according to a conventional method. Manufacturing method of aluminum alloy foil for electrolytic capacitor cathode.
JP6419495A 1995-03-23 1995-03-23 Manufacturing method of aluminum alloy foil for electrolytic capacitor cathode Expired - Fee Related JP2945298B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6419495A JP2945298B2 (en) 1995-03-23 1995-03-23 Manufacturing method of aluminum alloy foil for electrolytic capacitor cathode

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6419495A JP2945298B2 (en) 1995-03-23 1995-03-23 Manufacturing method of aluminum alloy foil for electrolytic capacitor cathode

Publications (2)

Publication Number Publication Date
JPH08260117A JPH08260117A (en) 1996-10-08
JP2945298B2 true JP2945298B2 (en) 1999-09-06

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Country Link
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4767410B2 (en) * 2000-05-22 2011-09-07 日本製箔株式会社 Method for producing aluminum hard foil for electrolytic capacitor cathode
CN102471835B (en) * 2009-07-07 2014-03-19 东洋铝株式会社 Perforated aluminum foil
US9331339B2 (en) 2009-09-30 2016-05-03 Toyo Aluminium Kabushiki Kaisha Perforated aluminium foil and manufacturing method thereof
JP5498750B2 (en) * 2009-09-30 2014-05-21 東洋アルミニウム株式会社 Aluminum through foil and method for producing the same
JP5663184B2 (en) * 2010-03-30 2015-02-04 東洋アルミニウム株式会社 Aluminum through foil and method for producing the same
KR20130143075A (en) * 2010-12-20 2013-12-30 후루카와 스카이 가부시키가이샤 Aluminum alloy foil for electrode current collectors and manufacturing method thereof
CN103060619A (en) * 2011-10-21 2013-04-24 湖南晟通科技集团有限公司 Aluminum alloy and method for cast rolling double-zero aluminum foil by using same
CN103468996B (en) * 2013-08-12 2016-05-18 安徽盛达前亮铝业有限公司 A kind of production technology of high heat conduction aluminum alloy profile

Also Published As

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