JP2921269B2 - Shadow mask manufacturing method - Google Patents

Shadow mask manufacturing method

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Publication number
JP2921269B2
JP2921269B2 JP17763892A JP17763892A JP2921269B2 JP 2921269 B2 JP2921269 B2 JP 2921269B2 JP 17763892 A JP17763892 A JP 17763892A JP 17763892 A JP17763892 A JP 17763892A JP 2921269 B2 JP2921269 B2 JP 2921269B2
Authority
JP
Japan
Prior art keywords
shadow mask
nickel
thickness
substrate
iron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP17763892A
Other languages
Japanese (ja)
Other versions
JPH05345994A (en
Inventor
修一 小笠原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Metal Mining Co Ltd
Original Assignee
Sumitomo Metal Mining Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Metal Mining Co Ltd filed Critical Sumitomo Metal Mining Co Ltd
Priority to JP17763892A priority Critical patent/JP2921269B2/en
Publication of JPH05345994A publication Critical patent/JPH05345994A/en
Application granted granted Critical
Publication of JP2921269B2 publication Critical patent/JP2921269B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は電気めっき法によるシャ
ドウマスク製造方法に関する。より詳しくは、電気めっ
き法によるシャドウマスクの機械的特性の改良方法に関
する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a shadow mask by electroplating. More specifically, the present invention relates to a method for improving mechanical properties of a shadow mask by electroplating.

【0002】[0002]

【従来の技術】シャドウマスク型カラー受像管に組み込
まれるシャドウマスクとしては、円形の電子ビーム通過
孔部の穿設されたものや矩形の電子ビーム通過孔部の穿
設されたもの等がある。シャドウマスク型カラー受像管
としては、一般家庭用、モニター用、ディスプレー用、
等があり、家庭用のシャドウマスクの孔のピッチは60
0〜700μm程度であるが、高品位カラーテレビの場
合は300μm以下が要求されている。
2. Description of the Related Art As a shadow mask to be incorporated in a shadow mask type color picture tube, there are a mask having a circular electron beam passage hole and a mask having a rectangular electron beam passage hole. As shadow mask type color picture tubes, for general household use, for monitors, for displays,
The pitch of the holes in the household shadow mask is 60
It is about 0 to 700 μm, but in the case of a high-definition color television, 300 μm or less is required.

【0003】またシャドウマスクの孔の断面形状は蛍光
面を大きく開孔し、電子ビーム側は小孔でその断面はナ
イフエッジ状になっていれば孔の側壁に電子ビームが当
たって生じる不要な散乱電子を防ぎ、カラー受像管のコ
ントラストと色純度の低下を防止できるので都合が良
い。特に画面の隅部は電子ビームがシャドウマスクに対
して斜めに入射するため大孔側と小孔側をずらして電子
ビームが当たる側の壁側テーパーを大きく逃がす必要が
あり、前述したような断面形状が必要である。
If the cross-sectional shape of the hole of the shadow mask is such that the fluorescent screen is largely opened, the electron beam side is a small hole, and if the cross section has a knife-edge shape, unnecessary portions generated by hitting the side wall of the hole with the electron beam are unnecessary. This is convenient because scattered electrons can be prevented and a decrease in contrast and color purity of the color picture tube can be prevented. In particular, since the electron beam is obliquely incident on the shadow mask at the corner of the screen, it is necessary to shift the large hole side and the small hole side to largely escape the taper on the wall side where the electron beam hits. Shape is required.

【0004】シャドウマスクの製造方法としては、従来
エッチング法が知られているが寸法安定性や歩留りに問
題があった。そのため、特開昭50−15745号、特
開昭51−128648号等に電鋳法を用いたシャドウ
マスクの製造方法が開示されている。それによると、特
開昭50−15745号では上面側が小孔となるように
傾斜した周壁を持つ不導体の多数の凸部と、底が金属導
体からなる凹部とを形成した電鋳基体に、電着物に延性
を与える鉄電解浴を用いて鉄電鋳を行い、これによって
得られた前記基体の凸部を孔とする電鋳品を基体から剥
離させる方法である。また特開昭51−128648号
では所望の平面形状に対しネガティブな平面形状の不導
体部を有する導体基板を用い電鋳により電鋳品を作成す
る方法において、所望の形状より電着物の板面方向への
成長量(サイドスプリージング)だけ不導体部を大きく
した基板に、厚さ10〜90μmの範囲に鉄電着を行
い、これを基板より剥離した後、250〜700℃で加
熱する方法である。これらの方法で寸法精度は改良され
た。
As a method of manufacturing a shadow mask, an etching method is conventionally known, but it has problems in dimensional stability and yield. Therefore, Japanese Patent Application Laid-Open Nos. 50-15745 and 51-128648 disclose methods of manufacturing a shadow mask using an electroforming method. According to this, in Japanese Patent Application Laid-Open No. 50-15745, an electroformed substrate having a large number of non-conductive convex portions having a peripheral wall inclined so that the upper surface side is formed as small holes and a concave portion formed of a metal conductor at the bottom, This is a method in which iron electroforming is performed using an iron electrolytic bath that imparts ductility to the electrodeposit, and the resulting electroformed product having the convex portions of the substrate as holes is separated from the substrate. JP-A-51-128648 discloses a method for producing an electroformed product by electroforming using a conductive substrate having a non-conductive portion having a negative planar shape with respect to a desired planar shape. A method in which iron is electrodeposited in a thickness range of 10 to 90 μm on a substrate in which a nonconductor portion is increased by an amount of growth in the direction (side splicing), separated from the substrate, and then heated at 250 to 700 ° C. It is. The dimensional accuracy was improved by these methods.

【0005】しかしながら上記方法はいずれも鉄電鋳で
シャドウマスクを形成し、更に得られたシャドウマスク
は黒色化処理の際にスチーム等で500〜700℃に加
熱されるので、全体として軟化してしまい、その機械的
強度が低下する問題が生じる。特に、ハイビジョン等の
ように解像度を高めるファインピッチの開孔穿設のため
にシャドウマスクを更に薄くした場合、またはフラット
タイプの蛍光面に対応する曲率半径大のシャドウマスク
を製造する場合は、全体としてシャドウマスクの強度は
非常に低下する。そのためスピーカーなどの発する振動
によってシャドウマスク、つまりは開孔位置が変化して
結局は画像に色ずれが発生するという問題が生じる。こ
の問題を解決するために特開昭60−30038号のよ
うに電鋳法で得られるシャドウマスクが軟鋼、鉄−ニッ
ケル系合金、鉄−ニッケル−コバルト系合金の単独層、
あるいは軟鋼の層と鉄−ニッケル系合金の層の複合層で
あることが特徴である。
However, in each of the above methods, the shadow mask is formed by iron electroforming, and the obtained shadow mask is heated to 500 to 700 ° C. by steam or the like during the blackening treatment, so that the shadow mask is softened as a whole. As a result, there is a problem that the mechanical strength is reduced. In particular, when the shadow mask is further thinned for fine-pitch perforations to increase the resolution, such as in a high-definition television, or when manufacturing a shadow mask with a large radius of curvature corresponding to a flat type phosphor screen, As a result, the strength of the shadow mask is greatly reduced. For this reason, there is a problem that the vibration generated by the speaker or the like changes the shadow mask, that is, the position of the aperture, and eventually causes a color shift in the image. To solve this problem, a shadow mask obtained by electroforming as disclosed in JP-A-60-30038 is a single layer of mild steel, iron-nickel alloy, iron-nickel-cobalt alloy,
Alternatively, it is characterized in that it is a composite layer of a mild steel layer and an iron-nickel alloy layer.

【0006】[0006]

【発明が解決しようとする課題】しかしながら上記方法
では電鋳によって合金層を形成する必要があり、電流密
度、被めっき物の形状による電気力線の集中度の違い等
により所望の組成の合金層を均一に得ることが困難であ
る。更にこのような場合にはシャドウマスクの機械的強
度が異なり震動によってばらつきが生じ色ずれの原因と
なる。また黒色化処理での加熱によって合金組成の違い
に基づく色調の違いが生じたり、応力の発生により変形
したりする恐れがある。さらにめっき液の管理も複雑で
ある。本発明の目的は、上記欠点を解消し、寸法精度を
満足し、均一な機械的強度および黒色被膜を得る事がで
き、黒色化処理の際に変形を生じないシャドウマスク製
造方法を提供することである。
However, in the above-mentioned method, it is necessary to form an alloy layer by electroforming. Is difficult to obtain uniformly. Further, in such a case, the mechanical strength of the shadow mask is different, and a fluctuation occurs due to vibration, which causes a color shift. In addition, there is a possibility that a difference in color tone based on a difference in alloy composition may be caused by heating in the blackening process, or deformation may occur due to generation of stress. Furthermore, the management of the plating solution is complicated. An object of the present invention is to provide a method of manufacturing a shadow mask which can solve the above-mentioned disadvantages, satisfy dimensional accuracy, obtain a uniform mechanical strength and a black coating, and does not cause deformation during blackening treatment. It is.

【0007】[0007]

【課題を解決するための手段】上記目的を達成するため
本発明は、金属体と絶縁体で形成された基板の絶縁体を
パターニングすることにより露出した金属面に電気ニッ
ケルめっきを施し、形成されたニッケル被膜を該基板か
ら剥離させ、剥離した該ニッケル被膜の表裏面に電気鉄
めっき被膜を形成するシャドウマスクの製造方法を特徴
とするものである。
SUMMARY OF THE INVENTION In order to achieve the above object, the present invention provides a method for forming a substrate, comprising a metal body and an insulator, by subjecting the exposed metal surface to electro-nickel plating by patterning the insulator. The method is characterized in that the nickel coating is peeled from the substrate, and an electric iron plating film is formed on the front and back surfaces of the peeled nickel coating.

【0008】更に上記電気鉄めっき被膜の厚さが0.1
〜10μmとする点に特徴がある。
Further, the thickness of the electric iron plating film is 0.1
It is characterized in that it is set to 10 μm.

【0009】[0009]

【作用】シャドウマスクの機械的強度を向上させるには
充分な抗張力を有する金属の層があれば良く、電気ニッ
ケルめっき被膜は通常40kg/mm2 以上であり好適
な材料である。又電気ニッケルめっき方法はワット浴を
用いる常用の方法で差し支えない。
In order to improve the mechanical strength of the shadow mask, a metal layer having a sufficient tensile strength is sufficient. The electro-nickel plating film is usually 40 kg / mm 2 or more, which is a suitable material. The electro-nickel plating method may be a conventional method using a watt bath.

【0010】該電気鉄めっき被膜の厚みは0.1μm〜
10μmでなければならず、0.1μm未満であると機
械的強度が不十分であり黒色化処理の際に剥離が生じ
る。また、10μmを越えるとニッケル被膜の持つ高い
抗張力を充分に活用できないのみならず、鉄被膜を電気
めっき法で形成するので寸法精度が悪化する恐れがあ
る。
The thickness of the electric iron plating film is 0.1 μm or more.
It must be 10 μm, and if it is less than 0.1 μm, the mechanical strength is insufficient and peeling occurs during the blackening treatment. If the thickness exceeds 10 μm, not only the high tensile strength of the nickel film cannot be fully utilized, but also the dimensional accuracy may be deteriorated because the iron film is formed by electroplating.

【0011】該金属板は耐めっき浴性があれば特に差し
支えない。また本発明で行う絶縁体のパターニングは、
絶縁体として樹脂を用いフォトエッチング法でパターニ
ングしても良いし、あるいは直接フォトレジストを用い
マスクを介してパターニングしても良い。該電気鉄めっ
き法は特に限定されず塩化鉄と塩化カルシウムを基本組
成とした液を使用すれば良い。
The metal plate has no particular problem as long as it has plating bath resistance. Further, the patterning of the insulator performed in the present invention,
Patterning may be performed by a photoetching method using a resin as an insulator, or patterning may be performed directly through a mask using a photoresist. The electric iron plating method is not particularly limited, and a liquid having a basic composition of iron chloride and calcium chloride may be used.

【0012】[0012]

【実施例】【Example】

[実施例1〜2,比較例1〜2]東レ・デュポン社製ポ
リイミド樹脂「Kapton 300 H」の片面に無電解めっき法
により厚さ1.0μmのニッケルめっき被膜を形成し、
更に電気めっき法により厚さ100μmのニッケルめっ
き被膜を形成した。得られた基板のポリイミド樹脂表面
に富士薬品工業製ネガ型フォトレジスト「FSR-S 」を厚
さ10μmに均一に塗布し乾燥後、幅180μm、間隔
70μmのスリット状のマスクを設置し、露光後現像し
乾燥した。その後露出したポリイミド樹脂部をヒドラジ
ン一水和物を用い50℃で8分間溶解除去を行い、FS
R−Sの剥離を行った。以上の処理によって厚さ100
μmのニッケル層上にニッケル接地面において幅220
μm、間隔30μm、ポリイミド樹脂表面において幅7
0μm、間隔180μmのテーパーのついたスリット状
にパターニングされた厚さ75μmのポリイミド樹脂層
を持つシャドウマスクの母材を作製した。得られた母材
を亜セレン酸に25℃で2分間浸漬し、ニッケル表面を
不導体化処理した。その後ニッケル層上に以下に示す条
件と表1に示す所定の時間電気ニッケルめっきを行っ
た。
[Examples 1-2 and Comparative Examples 1-2] A nickel plating film having a thickness of 1.0 μm was formed on one surface of a polyimide resin “Kapton 300 H” manufactured by Toray DuPont by an electroless plating method.
Further, a nickel plating film having a thickness of 100 μm was formed by an electroplating method. On the polyimide resin surface of the obtained substrate, a negative photoresist "FSR-S" manufactured by Fuji Pharmaceutical Co., Ltd. was uniformly applied to a thickness of 10 μm and dried, and then a slit-shaped mask having a width of 180 μm and an interval of 70 μm was provided. Developed and dried. Thereafter, the exposed polyimide resin portion was dissolved and removed at 50 ° C. for 8 minutes using hydrazine monohydrate, and FS
RS was peeled off. The thickness 100
220 μm wide at the nickel ground plane on a nickel layer of μm
μm, spacing 30 μm, width 7 on polyimide resin surface
A base material of a shadow mask having a 75 μm thick polyimide resin layer patterned into a tapered slit having a thickness of 0 μm and an interval of 180 μm was prepared. The obtained base material was immersed in selenous acid at 25 ° C. for 2 minutes to make the nickel surface nonconductive. Thereafter, nickel electroplating was performed on the nickel layer under the following conditions and for a predetermined time shown in Table 1.

【0013】(液組成) スルファミン酸ニッケル:400g/リットル 塩化ニッケル :20g/リットル ほう酸 :40g/リットル ドデシル硫酸ナトリウム:0.5g/リットル (めっき条件) 温度 :50℃ 陰極電流密度 :3A/dm2 pH :4 その後母材に極めて弱い応力をかけることによりシャド
ウマスクが母材のニッケル層との界面から剥離した。以
上の処理後電気ニッケルめっき被膜表面に以下に示す条
件と表1に示す所定の時間電気鉄めっきを行った。
(Liquid composition) Nickel sulfamate: 400 g / L Nickel chloride: 20 g / L Boric acid: 40 g / L Sodium dodecyl sulfate: 0.5 g / L (Plating conditions) Temperature: 50 ° C. Cathode current density: 3 A / dm 2 pH: 4 Then, a very weak stress was applied to the base material, whereby the shadow mask was separated from the interface with the nickel layer of the base material. After the above treatment, the surface of the electro-nickel plating film was subjected to electro-iron plating for the conditions shown below and for a predetermined time shown in Table 1.

【0014】(液組成) 塩化第一鉄 :400g/リットル 塩化カルシウム :150g/リットル (めっき条件) 温度 :90℃ 陰極電流密度 :2Adm2 pH :1(Liquid composition) Ferrous chloride: 400 g / L Calcium chloride: 150 g / L (Plating conditions) Temperature: 90 ° C. Cathode current density: 2 Adm 2 pH: 1

【0015】その後、得られたシャドウマスクを水蒸気
および一酸化炭素の混合ガス雰囲気下で450℃、30
分間熱処理を施しシャドウマスク表面に四三酸化鉄被膜
を形成することにより黒色化処理を行った。得られたシ
ャドウマスクの寸法、外観、および抗張力を表1に示
す。表1より得られたシャドウマスクの寸法精度および
外観に問題なく、かつ従来シャドウマスクに要求されて
いる40kg/mm2 以上の抗張力が得られる条件は、
電気鉄めっき被膜の厚みが0.1μm以上10μm以下
の場合であることがわかる。
After that, the obtained shadow mask is heated at 450 ° C. and 30 ° C. in a mixed gas atmosphere of water vapor and carbon monoxide.
A blackening treatment was performed by applying a heat treatment for a minute to form a triiron tetroxide coating on the shadow mask surface. Table 1 shows the dimensions, appearance, and tensile strength of the obtained shadow mask. The conditions under which there is no problem in the dimensional accuracy and appearance of the shadow mask obtained from Table 1 and the tensile strength of 40 kg / mm 2 or more conventionally required for the shadow mask are obtained.
It can be seen that this is the case where the thickness of the electric iron plating film is 0.1 μm or more and 10 μm or less.

【0016】本実施例において母材からシャドウマスク
を剥離後さらに母材に対して電気めっきを行い、シャド
ウマスクを剥離し、黒色化処理を施す工程を繰り返すこ
とにより、上記形状と同等のシャドウマスクを精度良く
安定して得ることができた。
In this embodiment, after the shadow mask is peeled off from the base material, electroplating is further performed on the base material, the shadow mask is peeled off, and the steps of blackening are repeated, whereby a shadow mask having the same shape as the above shape is obtained. Was accurately and stably obtained.

【0017】[0017]

【表1】 [Table 1]

【0018】[0018]

【発明の効果】本発明により、微細なシャドウマスクを
寸法精度良く製造でき、均一な機械的強度を有し黒色化
処理で変形せず、経済性にも優れるなどその効果は大で
ある。
According to the present invention, a fine shadow mask can be manufactured with high dimensional accuracy, has a uniform mechanical strength, is not deformed by the blackening treatment, and has excellent economic efficiency.

───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.6,DB名) C25D 1/08 311 C25D 5/26 C25D 7/00 H01J 9/14 ──────────────────────────────────────────────────続 き Continued on the front page (58) Fields surveyed (Int. Cl. 6 , DB name) C25D 1/08 311 C25D 5/26 C25D 7/00 H01J 9/14

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 金属体と絶縁体で形成された基板の絶縁
体をパターニングすることにより露出した金属面に電気
ニッケルめっきを施し、形成されたニッケル被膜を該基
板から剥離させ、剥離した該ニッケル被膜の表裏面に電
気鉄めっき被膜を形成することを特徴とするシャドウマ
スクの製造方法。
An electric metal plating is applied to an exposed metal surface by patterning an insulator of a substrate formed of a metal body and an insulator, and the formed nickel film is peeled off from the substrate. A method for producing a shadow mask, comprising forming an electric iron plating film on the front and back surfaces of the film.
【請求項2】 上記電気鉄めっき被膜の厚さが0.1〜
10μmとすることを特徴とする請求項1記載のシャド
ウマスクの製造方法。
2. The thickness of the electric iron plating film is 0.1 to
2. The method for manufacturing a shadow mask according to claim 1, wherein the thickness is 10 [mu] m.
JP17763892A 1992-06-12 1992-06-12 Shadow mask manufacturing method Expired - Lifetime JP2921269B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17763892A JP2921269B2 (en) 1992-06-12 1992-06-12 Shadow mask manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17763892A JP2921269B2 (en) 1992-06-12 1992-06-12 Shadow mask manufacturing method

Publications (2)

Publication Number Publication Date
JPH05345994A JPH05345994A (en) 1993-12-27
JP2921269B2 true JP2921269B2 (en) 1999-07-19

Family

ID=16034496

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17763892A Expired - Lifetime JP2921269B2 (en) 1992-06-12 1992-06-12 Shadow mask manufacturing method

Country Status (1)

Country Link
JP (1) JP2921269B2 (en)

Also Published As

Publication number Publication date
JPH05345994A (en) 1993-12-27

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