JP2901407B2 - Mask resistance direction recognition method - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of recognizing a direction of a mask resistor, and more particularly to a method of recognizing a direction of a mask resistor requiring arrangement in the same direction.

[0002]

2. Description of the Related Art A conventional method of recognizing the direction of a mask resistor will be described below with reference to FIGS.

FIG. 5 is a flowchart for explaining the direction of a mask resistor for explaining an example of the related art. As shown in FIG. 5, in recognizing the direction of a conventional mask resistor, first, in step 501, information attached to contact aluminum at both ends of an arbitrary resistance path is read from the mask resistor database 21 and stored in a predetermined memory. . Next, in step 502, coordinates are extracted from the accessory information of the contact aluminum stored in a predetermined memory, and a line segment vector is obtained by calculation from the coordinates extracted in step 503. Next, in step 504, it is determined whether or not the X component of the line segment vector is 0. If the X component is 0, the direction of the resistance is recognized as the vertical direction in step 511, and the process ends. On the other hand, if the X component is not 0, it is determined in step 505 whether or not the Y component of the line segment vector is 0. If the Y component is 0, the direction of the resistance is recognized as the horizontal direction in step 510 and the processing is terminated. I do. Conversely, if the Y component is 0
If not, the gradient is calculated from the line segment vector in step 506. If the gradient is positive, the flow proceeds to step 509 to recognize the direction of the resistance as diagonally right. Is recognized as the diagonally left direction, and the processing ends.

FIG. 6 is a conceptual diagram of a mask resistor based on the direction recognition flow in FIG. As shown in FIG. 6, the mask resistor generates a line segment vector 62 by connecting the contact aluminum coordinates 61 and 63 as accessory information of the contact aluminum 64 and 66 disposed at both ends of the resistance path 65 with a line segment.

FIG. 7 is a conceptual diagram of a mask resistor expressing the line vector in FIG. As shown in FIG. 7, the above-described line segment vector 62 is expressed by expressing the contact aluminum coordinates 61 as A (X1, Y1) of coordinates 71 and expressing the contact aluminum coordinates 63 as B (X2, Y2) of coordinates 73. , The line segment vector 62 represents the line segment 72 (1)

[0006]

[0007] The fact that the arrangement of the mask resistor is in the horizontal direction is recognized by the following equation (2) using the fact that the amount of movement in the vertical direction is 0,

[0008]

The fact that the arrangement of the mask resistor is in the vertical direction is based on the fact that the amount of movement in the horizontal direction is 0, and the following (3)
Recognize by expression.

[0010]

FIG. 8 is a conceptual diagram expressing a line vector of a bent mask resistor similarly to FIG. As shown in FIG. 8, in the case of a mask resistor having a bent shape, it is recognized from a line segment vestle 82 determined by the contact aluminum coordinates 81 and 83 that the inclination is positive, and it is recognized that the inclination is in the left diagonal direction. We recognize that the slope is negative.

[0012]

In the above-described conventional method of recognizing the direction of a mask resistor, a line segment vector is obtained from contact aluminum coordinates in order to recognize whether the mask resistor is in a horizontal direction or a vertical direction. An operation must be performed, and a computer processing time for the operation is required. Further, when the mask resistor is formed in a bent shape, the line segment vector becomes oblique, and it is necessary to calculate the inclination of a straight line which is a component of the direction as inclination = (Y2-Y1) / (X2-X2). is there.

It is an object of the present invention to provide a method of recognizing a direction of a mask resistor, which can shorten a computer processing time for such an operation and facilitate recognition of an oblique direction.

[0014]

According to the present invention, there is provided a method for recognizing a direction of a mask resistor, comprising recognizing a direction of the mask resistor from a mask resistor database storing resistance data on a layout for each resistor. a first step of storing in a predetermined memory reads accessory information of the two con Tankuto aluminum arranged at both ends of the resistance track of any resistance from the resistance database, the first step
A second step of adding recognition characters meaning up, down, left, and right to four sides of a rectangle, which is auxiliary information of the contact aluminum stored in a predetermined memory, and
4 sides of the rectangle which is the attached information of the contact aluminum
To the top, bottom, left and right added in the second step
Of the literary characters , added to the sides in contact with both ends of the resistance path
A third step of extracting the recognized recognition character ;
Create a character string by combining the recognized characters extracted in the step
And a sentence created in the fourth step.
A fifth step of recognizing a character string as the direction of the arbitrary resistance.
Tsu configured to include a flop.

[0015]

Next, embodiments of the present invention will be described with reference to the drawings. FIG. 1 is a flowchart for recognizing the direction of a mask resistor for explaining an embodiment of the present invention. As shown in FIG. 1, in the present embodiment, in recognizing the direction of the mask resistor, first, in step 101, the accessory information of the contact aluminum at both ends of an arbitrary resistor is read from the mask resistor database 11 and stored in a predetermined memory. To be stored. next,
In step 102, any symbol meaning up, down, left, or right is added to the accessory information of the side of the contact aluminum stored in the predetermined memory. Next, in step 103, an arbitrary symbol added to the side that is in contact with the resistance path is extracted based on the attached information of the side of the contact aluminum stored in a predetermined memory. Further, the symbols on the two sides at both ends of the resistance path extracted in step 104 are combined, and thereafter, in step 105, the character string represented by the combined symbol is recognized as the direction of the mask resistor, thereby terminating the direction recognition. In this embodiment, alphabetic characters are used as character strings. However, alphanumeric characters and other symbols can similarly recognize the direction of the mask resistor.

FIG. 2 is a conceptual diagram of a mask resistor based on the direction recognition flow in FIG. As shown in FIG. 2, this is an example in which the mask resistor path 22 is formed in a bent shape, and English characters A to D are used as symbols added to the four sides of the square forming the contact aluminum 21 and 23. . In the symbols 25 to 29 and 210 to 212 arbitrarily added to the mask resistors, 25 and 29 represent contact aluminum 21,
23 is a symbol A indicating the upper side, and 26 and 210 are symbols B indicating the left sides of the contact aluminum 21 and 23, respectively. Similarly, 27 and 211 are symbols C indicating the lower sides of the contact aluminum 21 and 23, respectively, and 28 and 212 are symbols D indicating the right side of the contact aluminum 21 and 23, respectively. Here, when D of 28 indicating the right side of the contact aluminum 21 and C of 211 indicating the lower side of the contact aluminum 23 are combined, the DC of 213 indicating the direction of the mask resistor 22 is changed. Can occur. At this time, the origin coordinates of the mask are determined based on a reference for adding the upper side, left side, lower side, and right side of all contact aluminum on the mask in the same direction and a reference for determining which one of the contact aluminum 21 and 23 is used as a starting point for combining symbols. 2
4 is used.

FIG. 3 is a flow chart for recognizing the direction of a mask resistor for explaining another embodiment of the present invention. As shown in FIG. 3, in this embodiment, first, in step 301, information attached to contact aluminum at both ends of an arbitrary resistor is read from the mask resistor database 31 and stored in a predetermined memory. Next, in step 302, an arbitrary symbol meaning up, down, left, or right is added to the accessory information of the side of the contact aluminum stored in the predetermined memory. Next, in step 303, it is determined whether or not there are two or more sides in contact with the resistance path of the contact aluminum stored in the predetermined memory. If there are two or more sides, in step 304, the contact aluminum is thickened. To determine the side that contacts the resistance path. Next, upon completion of steps 303 and 304, an arbitrary symbol added to the side in contact with the resistance path in step 305 is extracted. Further, the symbols on the two sides at both ends of the resistance path extracted in step 306 are combined, and thereafter, in step 307, the character string represented by the combined symbol is recognized as the direction of the mask resistor, thereby terminating the direction recognition.

FIG. 4 is a conceptual diagram of a mask resistor based on the direction recognition flow in FIG. As shown in FIG. 4, this mask resistor is formed by forming the shape of the resistance path 42 in a solid shape, and forming a square four-sided contact aluminum 41, 43.
This is an example in which English characters A to D are used as symbols arbitrarily added to sides. Symbols 45 to 4 arbitrarily added to such mask resistors
In 9, 410 to 412, 45 and 49 are symbols A indicating the upper side of the contact aluminum, respectively, and 46 and 41.
0 is a symbol B indicating the left side of the contact aluminum 41, 43, respectively. Similarly, 47 and 411 are symbols C indicating the lower sides of the contact aluminum 41 and 43, respectively.
And 412 are symbols D indicating the right side of the contact aluminum 41 and 43, respectively. Here, contact aluminum 41,
Since all four sides of 43 are included in the outer frame of the resistor, the contact aluminum 41 is thickened up to the dotted frame 414 and the contact aluminum 43 is thickened up to the dotted frame 415, so that the resistor 42 The side to be in contact with is determined.
By combining D of 8 and B of 410, which is a symbol indicating the left side of the contact aluminum 43, DB of 413, which is a symbol indicating the direction of the mask resistor 42, can be generated. At this time, the top and left sides of all contact aluminum on the mask
The origin coordinate 44 of the mask is used as a reference for adding the lower side and the right side in the same direction and for determining which of the contact aluminum 41 and 43 is used as a starting point for combining symbols.

[0019]

As described above, the method of recognizing the direction of the mask resistor according to the present invention does not require any operation, and thus has the effect of reducing the computer processing time. Also, in the oblique direction recognition of the mask resistor having the bent shape, 16 types (4 sides × 4 sides) can be recognized.

[Brief description of the drawings]

FIG. 1 is a flowchart for recognizing a direction of a mask resistor for explaining an embodiment of the present invention.

FIG. 2 is a conceptual diagram of a mask resistance based on a direction recognition flow in FIG.

FIG. 3 is a flowchart for recognizing a direction of a mask resistor for explaining another embodiment of the present invention.

FIG. 4 is a conceptual diagram of a mask resistor based on the direction recognition flow in FIG.

FIG. 5 is a flowchart for recognizing a direction of a mask resistor for explaining an example of the related art.

6 is a conceptual diagram of a mask resistor based on the direction recognition flow in FIG.

FIG. 7 is a conceptual diagram of a mask resistor expressing a line segment vector in FIG. 6;

FIG. 8 is a conceptual diagram expressing a line vector of a mask resistor bent as in FIG. 7;

[Explanation of symbols]

11, 41, 51 Mask resistance database 21, 23, 41, 43 Contact aluminum 22, 42 Resistance path 24, 44 Coordinate of origin of mask 25-29, 210-212, 45-49, 410-4
12 Arbitrary symbols added to the side of Contact Amuri

Claims (1)

(57) [Claims] 1. A method of recognizing a direction of a mask resistor from a mask resistor database storing resistance data on a layout for each resistor, wherein the mask resistor database is arranged at both ends of a resistance path of an arbitrary resistor from the mask resistor database. a first step of storing in a predetermined memory reads two of the additional information con Tankuto aluminum was, the first step
A second step of adding recognition characters meaning up, down, left, and right to four sides of a rectangle, which is auxiliary information of the contact aluminum stored in a predetermined memory, and
4 sides of the rectangle which is the attached information of the contact aluminum
To the top, bottom, left and right added in the second step
Of the literary characters , added to the sides in contact with both ends of the resistance path
A third step of extracting the recognized recognition character ;
Create a character string by combining the recognized characters extracted in the step
And a sentence created in the fourth step.
A fifth step of recognizing a character string as the direction of the arbitrary resistance.
Direction recognition method of the mask resistance, characterized in that it comprises a-up.