JP2901078B2 - Electropolishing method for probe tip of probe card - Google Patents

Electropolishing method for probe tip of probe card

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Publication number
JP2901078B2
JP2901078B2 JP18718089A JP18718089A JP2901078B2 JP 2901078 B2 JP2901078 B2 JP 2901078B2 JP 18718089 A JP18718089 A JP 18718089A JP 18718089 A JP18718089 A JP 18718089A JP 2901078 B2 JP2901078 B2 JP 2901078B2
Authority
JP
Japan
Prior art keywords
electrolytic solution
probe
probe card
liquid
tip
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP18718089A
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Japanese (ja)
Other versions
JPH0350845A (en
Inventor
知 山下
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
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Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Priority to JP18718089A priority Critical patent/JP2901078B2/en
Publication of JPH0350845A publication Critical patent/JPH0350845A/en
Application granted granted Critical
Publication of JP2901078B2 publication Critical patent/JP2901078B2/en
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  • Tests Of Electronic Circuits (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Description

【発明の詳細な説明】 [発明の目的] (産業上の利用分野) 本発明は、プローブカードの針先電解研磨方法に関す
る。
DETAILED DESCRIPTION OF THE INVENTION [Purpose of the Invention] (Industrial application field) The present invention relates to a method for electropolishing a probe tip of a probe card.

(従来の技術) 一般に、半導体デバイスは、精密写真転写技術等を用
いて半導体ウエハ上に多数形成され、この後各半導体デ
バイスに切断されるが、プローブカードはこのような半
導体ウエハの状態における各半導体デバイスの検査に用
いられる。
(Prior Art) In general, a large number of semiconductor devices are formed on a semiconductor wafer by using a precision photographic transfer technique or the like, and then cut into individual semiconductor devices. Used for inspection of semiconductor devices.

すなわち、プローブカードは、例えば樹脂製基板等に
半導体デバイスの電極パッドに対応した多数の探針を固
定し、これらの探針と基板端部に設けた接触端子とを基
板面に設けた導体パターンによって電気的に接続した構
造とされている。そして、例えばこのプローブカードに
対して半導体ウエハをX−Y−Z方向に駆動し、半導体
ウエハ面に形成された半導体デバイスの電極パッドをプ
ローブカードの探針の先端に接触させるプローブ装置お
よび、プローブカードを介して半導体デバイスに所定の
信号を供給し、半導体デバイスからの出力信号を測定す
るテスタによって半導体デバイスの検査を行う。
That is, a probe card is a conductor pattern in which, for example, a large number of probes corresponding to electrode pads of a semiconductor device are fixed to a resin substrate or the like, and these probes and contact terminals provided at an end of the substrate are provided on the substrate surface. The structure is electrically connected. And a probe device for driving the semiconductor wafer in the XYZ directions with respect to the probe card, for example, and bringing the electrode pads of the semiconductor devices formed on the semiconductor wafer surface into contact with the tips of the probes of the probe card. A predetermined signal is supplied to the semiconductor device via the card, and the semiconductor device is inspected by a tester that measures an output signal from the semiconductor device.

ところで、上述したようなプローブカードの製造工程
においては、例えばタングステン等から構成された探針
を基板に対して固定する工程等の一連の工程が終了した
後、最終工程として、針先表面の状態を良好に改善する
ため、針先の研磨を行う工程がある。
By the way, in the probe card manufacturing process as described above, after a series of processes such as a process of fixing a probe made of tungsten or the like to a substrate is completed, as a final process, the state of the tip surface There is a step of polishing the tip of the needle in order to improve the satisfactorily.

このような研磨方法として、従来から電解研磨による
方法が用いられている。このような電解研磨による従来
の方法では、例えば第3図に示すように、容器1内の電
解液2(例えば0.5〜1NのKOH水溶液)に上部からプロー
ブカード3の探針4先端部を浸漬し、図示しない電源か
ら各探針4と電解液2内に設けた電極5との間に直流電
圧を印加し通電して、電解液2内に浸漬した探針4先端
部の電解研磨を行う。
As such a polishing method, a method using electrolytic polishing has been conventionally used. In the conventional method using such electrolytic polishing, for example, as shown in FIG. 3, the tip of the probe 4 of the probe card 3 is immersed from above into an electrolytic solution 2 (for example, a 0.5 to 1 N KOH aqueous solution) in a container 1. Then, a DC voltage is applied from a power supply (not shown) between each probe 4 and the electrode 5 provided in the electrolytic solution 2 to energize, and the tip of the probe 4 immersed in the electrolytic solution 2 is electrolytically polished. .

(発明が解決しようとする課題) しかしながら、第3図に示した従来のプローブカード
の針先電解研磨方法では、半導体デバイスの電極パッド
に対応するため近接して多数設けられた探針4の間を、
毛細管現象により電解液2が上昇し、この電解液2が、
例えば樹脂等からなる基板6、探針4を支持するために
基板6下面に設けられた支持リング7等の不所望部位に
付着し、これらの部材あるいはこれらの部材等を固定す
るための接着剤を変質させ、また、探針の先端以外の部
位や、探針を基板に固定する半田部分まで電解してしま
うという問題がある。
(Problems to be Solved by the Invention) However, in the conventional probe-tip electropolishing method of the probe card shown in FIG. 3, a plurality of probes 4 are provided close to each other so as to correspond to the electrode pads of the semiconductor device. To
The electrolytic solution 2 rises due to capillary action, and this electrolytic solution 2
For example, it adheres to an undesired portion such as a substrate 6 made of resin or the like and a support ring 7 provided on the lower surface of the substrate 6 for supporting the probe 4, and an adhesive for fixing these members or these members. In addition, there is a problem that a portion other than the tip of the probe and a solder portion for fixing the probe to the substrate are electrolyzed.

本発明は、かかる従来の事情に対処してなされたもの
で、電解液の不所望部位への付着を防止することのでき
るプローブカードの針先電解研磨方法を提供しようとす
るものである。
SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and has as its object to provide a method for electrolytically polishing a probe card tip which can prevent an electrolytic solution from adhering to an undesired portion.

[発明の構成] (課題を解決するための手段) すなわち本発明は、プローブカードの針先の所望部位
を、所定の電解液に浸漬して通電し、電解研磨するにあ
たり、 前記電解液と、この電解液と分離した液層を形成し、
かつ、毛管現象による界面からの液体の移動が生じない
程度に表面張力が前記電解液と近い不活性液体とを容器
内に収容して界面を有する複数の液層を形成し、前記不
活性液体からなる液層中から、前記プローブカードの針
先の所望部位のみを前記電解液からなる液層中に浸漬し
て電解研磨することを特徴とする。
[Structure of the Invention] (Means for Solving the Problems) That is, according to the present invention, when immersing a desired portion of a probe tip of a probe card in a predetermined electrolytic solution, energizing, and performing electrolytic polishing, the electrolytic solution Form a liquid layer separated from this electrolyte solution,
A plurality of liquid layers having an interface are formed by accommodating an inert liquid whose surface tension is close to the electrolytic solution in a container to such an extent that the liquid does not move from the interface due to capillary action, and the inert liquid is formed. The method is characterized in that only a desired portion of the probe card tip from the liquid layer made of is immersed in the liquid layer made of the electrolytic solution and electropolished.

請求項2の発明は、プローブカードの針先の所望部位
を、所定の電解液に浸漬して通電し、電解研磨するにあ
たり、 前記電解液と、この電解液と分離した液層を形成し、
かつ、前記電解液より比重の大きい不活性液体とを容器
内に収容して、前記不活性液体が下層となるよう界面を
有する複数の液層を形成し、前記不活性液体からなる液
層中から、前記プローブカードの針先の所望部位のみを
前記電解液からなる液層中に上向きに浸漬して電解研磨
することを特徴とする。
In the invention of claim 2, a desired portion of the probe tip of the probe card is immersed in a predetermined electrolytic solution, energized, and when performing electrolytic polishing, forming the electrolytic solution and a liquid layer separated from the electrolytic solution,
And, an inert liquid having a larger specific gravity than the electrolytic solution is accommodated in a container to form a plurality of liquid layers having an interface such that the inert liquid is a lower layer. Therefore, only the desired portion of the probe tip of the probe card is immersed upward in the liquid layer made of the electrolytic solution and is subjected to electrolytic polishing.

請求項3の発明は、請求項1又は2記載のプローブカ
ードの針先電解研磨方法において、 プローブカードの各針と電源との間に抵抗器を介挿し
てこれらの針に一度に通電することを特徴とする。
According to a third aspect of the present invention, in the method for electrolytically polishing the probe tip of the probe card according to the first or second aspect, a resistor is interposed between each needle of the probe card and a power source to energize these needles at once. It is characterized by.

(作用) 上記構成の本発明のプローブカードの針先電解研磨方
法では、電解液と、この電解液と分離した液層を形成す
る不活性液体とを容器内に収容して界面を有する複数の
液層を形成し、不活性液体からなる液層中から、プロー
ブカードの針先の所望部位のみを電解液からなる液層中
に浸漬して電解研磨する。
(Effect) In the probe tip electropolishing method of the present invention having the above-described structure, a plurality of electrolytes and an inert liquid that forms a liquid layer separated from the electrolyte are contained in a container and have a plurality of interfaces. A liquid layer is formed, and only a desired portion of the probe card tip is immersed in the liquid layer composed of the inert liquid in the liquid layer composed of the inert liquid and electrolytically polished.

したがって、電解液の不所望部位への付着を防止する
ことができ、例えば基板、支持リング、接着剤、半田等
が電解液により変質することを防止することができる。
Therefore, it is possible to prevent the electrolytic solution from adhering to an undesired portion, and it is possible to prevent the substrate, the support ring, the adhesive, the solder, and the like from being deteriorated by the electrolytic solution.

(実施例) 以下、本発明方法の実施例を図面を参照して説明す
る。
(Example) Hereinafter, an example of the method of the present invention will be described with reference to the drawings.

第1の実施例では、電極5を設けた容器1内の下部
に、例えば0.5〜1.0N程度のKOH水溶液からなる電解液2
を収容し、この電解液2の上部に、この電解液2と分離
した液層を形成する不活性液体として、例えば電解液2
と反応および混合しにくく、電解液2より比重の軽いシ
リコンオイル10を収容する。すると、これらの電解液2
の層とシリコンオイル10の層との間には界面11が形成さ
れる。
In the first embodiment, an electrolytic solution 2 made of, for example, a KOH aqueous solution of about 0.5 to 1.0 N is provided in a lower part of a container 1 provided with an electrode 5.
And an inert liquid that forms a liquid layer separated from the electrolytic solution 2 above the electrolytic solution 2, for example, the electrolytic solution 2
And a silicone oil 10 that is less likely to react and mix with the electrolyte solution 2 and has a lower specific gravity than the electrolyte solution 2. Then, these electrolytes 2
An interface 11 is formed between this layer and the silicon oil layer.

そして、上部のシリコンオイル10の層内に、探針4が
下側になるようプローブカード3を浸漬し、このシリコ
ンオイル10の層内から界面11を通してプローブカード3
の探針4先端部を所望長さだけ電解液2の層内に浸漬す
る。この状態で、図示しない電源から電極5が陰極、探
針4が陽極となるように直流電圧を印加し、電極5と探
針4との間に所定時間通電し、電解液2中に浸漬した探
針4先端部を電解研磨する。
Then, the probe card 3 is immersed in the upper layer of the silicon oil 10 so that the probe 4 is on the lower side, and the probe card 3 is passed through the interface 11 from within the layer of the silicon oil 10.
Is immersed in the layer of the electrolyte 2 by a desired length. In this state, a DC voltage was applied from a power supply (not shown) so that the electrode 5 became a cathode and the probe 4 became an anode, a current was passed between the electrode 5 and the probe 4 for a predetermined time, and the electrode 5 was immersed in the electrolytic solution 2. The tip of the probe 4 is electrolytically polished.

なお、上記通電は、各探針4と電源との間に切り換ス
イッチ等を介挿し、この切り換スイッチにより通電する
探針4を選択できるようにして1本ずつ通電して電解研
磨を行っても、多数の探針4に一度に通電して同時に電
解研磨を行ってもよい。但し、多数の探針4に一度に通
電する場合は、各探針4の状態によって電気抵抗が異な
り流れる電流が異なるため探針4によって研磨状態にば
ら付きが生じる恐れがあるので、各探針4と電源との間
に適当な値の抵抗器を介挿しておくことが好ましい。
The power supply is performed by interposing a switch or the like between each probe 4 and a power source, and by selecting the probes 4 to be supplied with the power by the switch, power is supplied one by one to perform electrolytic polishing. Alternatively, a large number of probes 4 may be energized at one time to perform electropolishing at the same time. However, when a large number of probes 4 are energized at one time, the electric resistance varies depending on the state of each probe 4 and the flowing current differs. It is preferable to insert a resistor having an appropriate value between the power supply 4 and the power supply.

上記構成の第1の実施例によれば、近接して設けられ
た多数の探針4の間を伝わって、毛細管現象により電解
液2が移動し、この電解液2が、例えば樹脂等からなる
基板6、探針4を支持するために基板6下面に設けられ
た支持リング7等の不所望部位に付着することを防止す
ることができ、これらの部材あるいはこれらの部材等を
固定する接着剤が変質してしまったり、探針の先端以外
の部位や、探針を基板に固定する半田部分が電解してし
まうことを防止することができる。
According to the first embodiment having the above structure, the electrolytic solution 2 moves between a large number of probes 4 provided in close proximity and moves by capillary action, and the electrolytic solution 2 is made of, for example, resin. It can be prevented from adhering to an undesired portion such as a support ring 7 provided on the lower surface of the substrate 6 for supporting the substrate 6 and the probe 4, and these members or an adhesive for fixing these members and the like can be prevented. Can be prevented from being deteriorated, and electrolysis of a portion other than the tip of the probe and a solder portion for fixing the probe to the substrate can be prevented.

第2図は、第2の実施例方法を示すもので、容器1内
の下部に、電解液2(0.5〜1.0N程度のKOH水溶液)と分
離した液層を形成する不活性液体として、例えば電解液
2と反応および混合しにくく、電解液2より比重の大き
いフレオン20が収容されている。すなわち、容器1内の
下部にフレオン20の層が形成されており、その上部に電
解液2の層が形成されこれらの間には界面21が形成され
ている。
FIG. 2 shows the method of the second embodiment. For example, as an inert liquid forming a liquid layer separated from an electrolytic solution 2 (a KOH aqueous solution of about 0.5 to 1.0 N) in a lower part of a container 1, for example, A freon 20 having a higher specific gravity than the electrolytic solution 2 is contained therein. That is, a layer of Freon 20 is formed at the lower part in the container 1, a layer of the electrolytic solution 2 is formed at the upper part, and an interface 21 is formed between them.

そして、下部のフレオン20の層内に、探針4が上向き
になるようプローブカード3を浸漬し、このフレオン20
の層内から界面21を通してプローブカード3の探針4先
端部を所望長さだけ電解液2の層内に浸漬する。この状
態で、前述の第1の実施例と同様にして、図示しない電
源から電極5と探針4との間に直流電圧を印加して所定
時間通電し、電解液2中に浸漬した探針4先端部を電解
研磨する。
Then, the probe card 3 is immersed in the lower layer of the freon 20 so that the probe 4 faces upward.
The tip of the probe 4 of the probe card 3 is immersed into the layer of the electrolyte 2 by a desired length through the interface 21 from within the layer. In this state, a DC voltage is applied between the electrode 5 and the probe 4 from a power source (not shown), a current is supplied for a predetermined time, and the probe immersed in the electrolytic solution 2 in the same manner as in the first embodiment. 4 Electrolytic polishing of the tip.

上記第2の実施例でも、前述の第1の実施例と同様な
効果を得ることができる。また、電解研磨に伴って電解
液2中の探針4先端部において気体が発生し、この気体
が探針4先端部に気泡として付着するが、探針4が上を
向くよう配置されているので、これらの気泡を容易に除
去することができ、気泡によって電気的な抵抗が増大
し、通電状態が変化して研磨状態が不安定になることを
防止することができる。
In the second embodiment as well, the same effects as in the first embodiment can be obtained. Further, a gas is generated at the tip of the probe 4 in the electrolytic solution 2 with the electrolytic polishing, and this gas adheres as a bubble to the tip of the probe 4, but is arranged so that the probe 4 faces upward. Therefore, these air bubbles can be easily removed, and it is possible to prevent the electric resistance from increasing due to the air bubbles, and prevent the polishing state from becoming unstable due to a change in the energized state.

なお、これらの第1および第2の実施例では、電解液
2としてKOH水溶液を用い、不活性液体としてシリコン
オイル10およびフレオン20を使用した場合について説明
したが、他の電解液および不活性液体を用いることも当
然可能である。また、このような電解液および不活性液
体を選択する場合は、電解液と不活性液体との間で表面
張力が著しく異なると、毛細管現象による界面からの液
体の移動が生じるので、表面張力が近い電解液と不活性
液体との組合せを選択することが好ましい。
In the first and second embodiments, the case where a KOH aqueous solution is used as the electrolytic solution 2 and the silicone oil 10 and the Freon 20 are used as the inert liquid has been described. Of course, it is also possible to use. In addition, when such an electrolytic solution and an inert liquid are selected, if the surface tension of the electrolytic solution and the inert liquid is significantly different, the liquid moves from the interface due to the capillary phenomenon, so that the surface tension is reduced. It is preferable to select a combination of a close electrolyte and an inert liquid.

[発明の効果] 以上説明したように、本発明のプローブカードの針先
電解研磨方法によれば、電解液の不所望部位への付着を
防止することができ、例えばプローブカードの基板、支
持リング、接着剤、半田等が電解液により変質すること
を防止することができる。
[Effects of the Invention] As described above, according to the probe tip electropolishing method of the present invention, it is possible to prevent the electrolytic solution from adhering to an undesired portion. , Adhesives, solder, and the like can be prevented from being deteriorated by the electrolytic solution.

【図面の簡単な説明】[Brief description of the drawings]

第1図は本発明の第1の実施例のプローブカードの針先
電解研磨方法を説明するための図、第2図は本発明の第
2の実施例のプローブカードの針先電解研磨方法を説明
するための図、第3図は従来のプローブカードの針先電
解研磨方法を説明するための図である。 1……容器、2……電解液(KOH水溶液)、3……プロ
ーブカード、4……探針、5……電極、6……基板、7
……支持リング、10……シリコンオイル、11……界面、
20……フレオン、21……界面。
FIG. 1 is a view for explaining a method for electropolishing a probe tip of a probe card according to a first embodiment of the present invention, and FIG. 2 is a diagram showing a method for electropolishing a needle tip of a probe card according to a second embodiment of the present invention. FIG. 3 is a diagram for explaining a conventional method of electropolishing a probe tip of a probe card. DESCRIPTION OF SYMBOLS 1 ... Container, 2 ... Electrolyte solution (KOH aqueous solution), 3 ... Probe card, 4 ... Probe, 5 ... Electrode, 6 ... Substrate, 7
…… Support ring, 10… Silicon oil, 11… Interface,
20 ... Freon, 21 ... Interface.

───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.6,DB名) H01L 21/66 G01R 31/28 ──────────────────────────────────────────────────続 き Continued on front page (58) Field surveyed (Int.Cl. 6 , DB name) H01L 21/66 G01R 31/28

Claims (3)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】プローブカードの針先の所望部位を、所定
の電解液に浸漬して通電し、電解研磨するにあたり、 前記電解液と、この電解液と分離した液層を形成し、か
つ、毛管現象による界面からの液体の移動が生じない程
度に表面張力が前記電解液と近い不活性液体とを容器内
に収容して界面を有する複数の液層を形成し、前記不活
性液体からなる液層中から、前記プローブカードの針先
の所望部位のみを前記電解液からなる液層中に浸漬して
電解研磨することを特徴とするプローブカードの針先電
解研磨方法。
1. A method for immersing a desired portion of a probe tip of a probe card in a predetermined electrolytic solution and energizing the same to form an electrolytic solution and a liquid layer separated from the electrolytic solution when performing electrolytic polishing, and A plurality of liquid layers having an interface are formed by accommodating an inert liquid whose surface tension is close to the electrolytic solution in a container to such an extent that the liquid does not move from the interface due to the capillary action, and is formed of the inert liquid. A method for electropolishing a probe card tip, characterized in that only a desired portion of the probe card tip from the liquid layer is immersed in a liquid layer made of the electrolytic solution and electropolished.
【請求項2】プローブカードの針先の所望部位を、所定
の電解液に浸漬して通電し、電解研磨するにあたり、 前記電解液と、この電解液と分離した液層を形成し、か
つ、前記電解液より比重の大きい不活性液体とを容器内
に収容して、前記不活性液体が下層となるよう界面を有
する複数の液層を形成し、前記不活性液体からなる液層
中から、前記プローブカードの針先の所望部位のみを前
記電解液からなる液層中に上向きに浸漬して電解研磨す
ることを特徴とするプローブカードの針先電解研磨方
法。
2. A method for immersing a desired portion of a probe tip of a probe card in a predetermined electrolytic solution and energizing the same to form an electrolytic solution and a liquid layer separated from the electrolytic solution when performing electrolytic polishing, and An inert liquid having a larger specific gravity than the electrolytic solution is accommodated in a container to form a plurality of liquid layers having an interface such that the inert liquid is a lower layer, from a liquid layer made of the inert liquid, A method for electropolishing a needle of a probe card, characterized in that only a desired portion of the needle of the probe card is immersed upward in a liquid layer made of the electrolytic solution and electropolished.
【請求項3】請求項1又は2記載のプローブカードの針
先電解研磨方法において、 プローブカードの各針と電源との間に抵抗器を介挿して
これらの針に一度に通電することを特徴とするプローブ
カードの針先電解研磨方法。
3. The method according to claim 1, wherein a resistor is interposed between each needle of the probe card and a power source to energize these needles at one time. Electropolishing method of the probe tip of the probe card.
JP18718089A 1989-07-19 1989-07-19 Electropolishing method for probe tip of probe card Expired - Lifetime JP2901078B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18718089A JP2901078B2 (en) 1989-07-19 1989-07-19 Electropolishing method for probe tip of probe card

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18718089A JP2901078B2 (en) 1989-07-19 1989-07-19 Electropolishing method for probe tip of probe card

Publications (2)

Publication Number Publication Date
JPH0350845A JPH0350845A (en) 1991-03-05
JP2901078B2 true JP2901078B2 (en) 1999-06-02

Family

ID=16201507

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18718089A Expired - Lifetime JP2901078B2 (en) 1989-07-19 1989-07-19 Electropolishing method for probe tip of probe card

Country Status (1)

Country Link
JP (1) JP2901078B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11230989A (en) 1997-12-10 1999-08-27 Mitsubishi Electric Corp Method and apparatus for cleaning probe pin for probe card and cleaning liquid therefor

Also Published As

Publication number Publication date
JPH0350845A (en) 1991-03-05

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