JP2875275B2 - Information recording medium - Google Patents

Information recording medium

Info

Publication number
JP2875275B2
JP2875275B2 JP1056189A JP5618989A JP2875275B2 JP 2875275 B2 JP2875275 B2 JP 2875275B2 JP 1056189 A JP1056189 A JP 1056189A JP 5618989 A JP5618989 A JP 5618989A JP 2875275 B2 JP2875275 B2 JP 2875275B2
Authority
JP
Japan
Prior art keywords
recording
recording medium
information recording
resin
improvement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP1056189A
Other languages
Japanese (ja)
Other versions
JPH02235788A (en
Inventor
由紀雄 井手
真人 針谷
勝幸 山田
博子 岩崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ricoh Co Ltd
Original Assignee
Ricoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ricoh Co Ltd filed Critical Ricoh Co Ltd
Priority to JP1056189A priority Critical patent/JP2875275B2/en
Priority to US07/485,991 priority patent/US5100700A/en
Publication of JPH02235788A publication Critical patent/JPH02235788A/en
Application granted granted Critical
Publication of JP2875275B2 publication Critical patent/JP2875275B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Thermal Transfer Or Thermal Recording In General (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は情報記録媒体、特に相変化型情報記録媒体で
あって、光ビームを照射することにより記録層材料に相
変化を生じさせ、情報の記録、再生を行い、かつ書き換
えができる情報記録媒体に関するものであり、光メモリ
ー関連機器に応用される。
Description: TECHNICAL FIELD The present invention relates to an information recording medium, in particular, a phase change type information recording medium, which irradiates a light beam to cause a phase change in a recording layer material, and The present invention relates to an information recording medium that can record, reproduce, and rewrite information, and is applied to optical memory related devices.

[従来の技術] 電磁波特にレーザービームの照射により情報の記録、
再生および消去可能な光メモリー媒体の一つとして、結
晶−非晶質相間或いは結晶−結晶相間の転移を利用す
る、いわゆる相変化型記録媒体が良く知られている。特
に光磁気メモリーでは困難な単一ビームによるオーバー
ライトが可能であり、ドライブ側の光学系も単純である
ために最近その研究開発が活発になっている。
[Prior art] Recording of information by irradiation of electromagnetic waves, particularly laser beams,
As one of the rewritable and erasable optical memory media, a so-called phase change type recording medium utilizing a transition between a crystal and an amorphous phase or between a crystal and a crystal phase is well known. In particular, overwriting with a single beam, which is difficult with a magneto-optical memory, is possible, and the optical system on the drive side is simple.

その代表的な材料例として、USP3.530.441に開示され
ているようにGe−Te、Ge−Te−Sb、Ge−Te−S、Ge−Se
−S、Ge−Se−Sb、Ge一As−Se、In−Te、Se−Te、Se−
As等いわゆるカルコゲン系合金材料が挙げられる。又、
安定性、高速結晶化等の向上を目的にGe−Te系にAu(特
開昭62−219692)、Sn及びAu(特開昭61−270190)、Pd
(特開昭62−19490)等を添加した材料の提案や、記録
/消去の繰返し性能向上を目的にGe−Te−Se−Sbの組成
比を特定した材料(特開昭62−73438)の提案等もなさ
れている。
Typical examples of the material include Ge-Te, Ge-Te-Sb, Ge-Te-S, Ge-Se as disclosed in US Pat. No. 3,530,441.
-S, Ge-Se-Sb, Ge-As-Se, In-Te, Se-Te, Se-
So-called chalcogen-based alloy materials such as As are mentioned. or,
Au (Japanese Patent Application Laid-open No. Sho 62-219692), Sn and Au (Japanese Patent Application Laid-Open No. Sho 61-270190), Pd
(JP-A-62-19490) and a material (JP-A-62-73438) in which the composition ratio of Ge-Te-Se-Sb is specified for the purpose of improving the recording / erasing repeatability. Suggestions have been made.

しかし、そのいずれもが相変化型書換え可能光メモリ
ー媒体として要求される諸特性のすべてを満足し得るも
のとはいえない。特に記録感度、消去感度の向上、オー
バーライト時の消し残りによる消去比低下の防止、並び
に記録部、未記録部の長寿命化が解決すべき最重要課題
となっている。
However, none of them can satisfy all of the properties required for a phase-change rewritable optical memory medium. In particular, improvement of recording sensitivity and erasing sensitivity, prevention of a decrease in erasing ratio due to unerased portion at the time of overwriting, and extension of life of a recorded portion and an unrecorded portion are the most important issues to be solved.

[発明が解決しようとする課題] 本発明は上記従来技術の問題を解決し、下記の課題を
解決しようとするものである。
[Problems to be Solved by the Invention] The present invention is to solve the above-mentioned problems of the prior art and to solve the following problems.

1)消去速度(結晶化速度)の向上、 2)記録部(非晶質部)の長寿命化、 3)信頼性(耐酸化性、耐食性)の向上、 4)記録膜の物理的強度の向上、 [課題を解決するための手段] 一般に相変化型の光情報記録媒体の消去速度と記録部
の寿命は晶質非晶質の転移の際の活性化エネルギーEa
と頻度因子νとで特徴づけることができる。
1) Improvement of erasing speed (crystallization speed), 2) Prolongation of life of recording portion (amorphous portion), 3) Improvement of reliability (oxidation resistance, corrosion resistance), 4) Improvement of physical strength of recording film [Means for Solving the Problems] Generally, the erasing speed and the life of the recording portion of a phase-change type optical information recording medium are determined by the activation energy Ea at the time of transition of crystalline amorphous.
And the frequency factor ν.

このEaとνは結晶化の反応速度定数kとアレニウスの
式で表わされる関係がある。すなわち、 である。
Ea and ν have a relationship represented by the reaction rate constant k of crystallization and Arrhenius equation. That is, It is.

非晶質部を記録部、品質部を未記録部として用いる場
合、結晶化転移点Tcより高温でkを大きくすることが消
去速度の向上につながり、室温で小さくすることが記録
部の寿命を延ばすことにつながる。kに対するEaとνは
以下の様に求められる。
When the amorphous portion is used as a recorded portion and the quality portion is used as an unrecorded portion, increasing k at a temperature higher than the crystallization transition point Tc leads to an improvement in the erasing speed, and decreasing at room temperature decreases the life of the recorded portion. It leads to extension. Ea and ν for k are obtained as follows.

すなわち、高温においてはνが、低温においてはEaと
νがkに対し大きく寄与する。従って、消去速度の向上
と記録部の長寿命化という目的を達成するためにはν、
Eaともに大きい値となる様な記録材が求められる。
That is, ν at a high temperature and Ea and ν at a low temperature greatly contribute to k. Therefore, in order to achieve the purpose of improving the erasing speed and extending the life of the recording section, ν,
A recording material that has a large value for both Ea is required.

本発明では記録材に酸素を混入させることで上記目的
を達成する、すぐれた光情報記録媒体を得た。すなわ
ち、本発明の構成は、基板上に設けられた記録層中に、
主成分として下記一般式で示される化合物を含有するこ
とを特徴とする情報記録媒体、 一般式、(XoYpZq1-xOx ただし、 Xは周期表第Ib族元素から選ばれた1種、 Yは同じく、第Vb族元素から選ばれた1種、 Zは同じく第VIb族元素から選ばれた1種、 0.15≦o≦0.35 0.15≦p≦0.35 0.40≦q≦0.60 o+p+q=1 0.05≦x≦0.20である。
In the present invention, an excellent optical information recording medium that achieves the above object by mixing oxygen into a recording material has been obtained. That is, the configuration of the present invention includes, in a recording layer provided on a substrate,
An information recording medium characterized by containing a compound represented by the following general formula as a main component, general formula, (X o Y p Z q ) 1-x O x , wherein X is selected from Group Ib elements of the periodic table Y is also one selected from group Vb elements, Z is also one selected from group VIb elements, 0.15 ≦ o ≦ 0.35 0.15 ≦ p ≦ 0.35 0.40 ≦ q ≦ 0.60 o + p + q = 1 0.05 ≦ x ≦ 0.20.

上記各成分のうちXの量oが0.15未満であるとEaとν
が小さくなり、結晶化速度の低下とともに記録部(非晶
質部)の寿命も低下する。
If the amount o of X in each of the above components is less than 0.15, Ea and ν
And the life of the recording portion (amorphous portion) also decreases as the crystallization speed decreases.

これが0.35を越えると、Eaが大きくなりすぎて高速結
晶化を妨げる。
If it exceeds 0.35, Ea becomes too large to prevent high-speed crystallization.

Yの量pが0.15未満であると結晶化速度の低下をきた
し、これが0.35を越えると記録時のコントラストが低下
する Zの量qが0.40未満であると記録時のコントラストが
低下し、これが0.60を越えると記録部(非晶質部)の寿
命が低下する。
If the amount p of Y is less than 0.15, the crystallization rate is reduced, and if it exceeds 0.35, the contrast at the time of recording is reduced. If the amount q of Z is less than 0.40, the contrast at the time of recording is reduced. Exceeding the range shortens the life of the recording portion (amorphous portion).

酸素の含有量は5%未満では頼著な効果が認められ
ず、一方20%を超えると相転移前後のコントラスト(反
射率変化)が低下する。そこで酸素の含有量は5〜20%
とするのが良い。
If the oxygen content is less than 5%, a remarkable effect is not recognized, while if it exceeds 20%, the contrast (reflectance change) before and after the phase transition decreases. So the oxygen content is 5-20%
Good to be.

本発明で用いられる基板は通常ガラス、セラミックス
あるいは樹脂であり、樹脂基板が成型性、コスト等の点
で好適である。樹脂の代表例としてはポリカーボネート
樹脂、アクリル樹脂、エポキシ樹脂、ポリスチレン樹
脂、アクリロニトリル−スチレン共重合体樹脂、ポリエ
チレン樹脂、ポリプロピレン樹脂、シリコン系樹脂、フ
ッ素系樹脂、ABS樹脂、ウレタン樹脂等が挙げられる
が、加工性、光学特性等の点でポリカーボネート樹脂、
アクリル系樹脂が好ましい。また、基板の形状としては
ディスク状、カード状あるいはシート状であっても良
い。
The substrate used in the present invention is usually glass, ceramic or resin, and a resin substrate is suitable in terms of moldability, cost, and the like. Representative examples of the resin include polycarbonate resin, acrylic resin, epoxy resin, polystyrene resin, acrylonitrile-styrene copolymer resin, polyethylene resin, polypropylene resin, silicone resin, fluorine resin, ABS resin, urethane resin and the like. Polycarbonate resin in terms of workability, optical properties, etc.,
Acrylic resins are preferred. Further, the shape of the substrate may be a disk shape, a card shape or a sheet shape.

また、必要に応じて耐熱保護層、表面保護層、反射
層、接着層等の補助層を設けても良い。
If necessary, auxiliary layers such as a heat-resistant protective layer, a surface protective layer, a reflective layer, and an adhesive layer may be provided.

本発明で用いられる記録層材料の代表例としては、 (Ago Sbp Teq1-xOx、 (Ago Bip Teq1-xOx、 (Ago Sbp Seq1-xOx、 (Cuo Sbp Teq1-xOx、 (Ago Sbp Sq1-xOx、 (Ago Bip Seq1-xOx、 (Ago Bip Sq1-xOx、 (Cuo Sbp Seq1-xOx、 (Cuo Sbp Sq1-xOx、 (Cuo Bip Seq1-xOx、 (Cuo Bip Sq1-xOx、 (Ago Asp Teq1-xOx、 (Ago Asp Seq1-xOx、 (Ago Asp Sq1-xOx、 等が挙げられる。Representative examples of the recording layer material used in the present invention, (Ag o Sb p Te q ) 1-x O x, (Ag o Bi p Te q) 1-x O x, (Ag o Sb p Se q) 1-x O x, (Cu o Sb p Te q) 1-x O x, (Ag o Sb p S q) 1-x O x, (Ag o Bi p Se q) 1-x O x, (Ag o Bi p S q) 1- x O x, (Cu o Sb p Se q) 1-x O x, (Cu o Sb p S q) 1-x O x, (Cu o Bi p Se q) 1- x O x, (Cu o Bi p S q) 1-x O x, (Ag o As p Te q) 1-x O x, (Ag o As p Se q) 1-x O x, (Ag o As p S q ) 1-x O x , and the like.

耐熱性保護層の材料としては、SiO、SiO2、ZnO、Sn
O2、Al2O3、TiO2、In2O3、MgO、ZrO2等の金属酸化物、S
i3N4、AlN、TiN、BN、ZrN等の窒化物、SiC、TaC、B
4C、WC、TiC、ZrC等の炭化物やダイヤモンド状カーボ
ン或いはそれらの混合物が挙げられる。また、必要に応
じて不純物を含んでいてもよい。このような耐熱性保護
層は各種気相成膜法、例えば、真空蒸着法、スパッタ
法、プラズマCVD法、光CVD法、イオンプレーティング
法、電子ビーム蒸着法等によって形成できる。
Materials for the heat-resistant protective layer include SiO, SiO 2 , ZnO, and Sn.
Metal oxides such as O 2 , Al 2 O 3 , TiO 2 , In 2 O 3 , MgO, ZrO 2 , S
i 3 N 4 , nitride such as AlN, TiN, BN, ZrN, SiC, TaC, B
4 C, WC, TiC, a mixture of carbide and diamond-like carbon, or their like ZrC and the like. Further, it may contain impurities as needed. Such a heat-resistant protective layer can be formed by various vapor deposition methods, for example, a vacuum evaporation method, a sputtering method, a plasma CVD method, a photo CVD method, an ion plating method, an electron beam evaporation method and the like.

耐熱性保護層の膜厚としては200〜5000Å、好適には5
00〜3000Åとするのが良い。200Åより薄くなると耐熱
性保護層としての機能を果たさなくなり、逆に5000Åよ
り厚くなると、感度低下を来たしたり、界面剥離を生じ
易くなる。また、必要に応じて保護層を多層化すること
もできる。
The thickness of the heat-resistant protective layer is 200 to 5000 mm, preferably 5
It is good to be 00-3000Å. When the thickness is less than 200 mm, the layer does not function as a heat-resistant protective layer. On the other hand, when the thickness is more than 5000 mm, the sensitivity is lowered and the interface is apt to be peeled off. In addition, the protective layer can be multi-layered as necessary.

記録層の成膜法としては真空蒸着法、電子ビーム蒸着
法、スパッタ法、CVD法、イオンプレーティング法等の
各種気相成膜法が利用できる。
Various vapor-phase film formation methods such as a vacuum evaporation method, an electron beam evaporation method, a sputtering method, a CVD method, and an ion plating method can be used as a film formation method of the recording layer.

また、上記相変化材料単層のみならず、多層膜あるい
は超微粒子状の相変化物質を耐熱性マトリックス中に分
散せしめたようなものであっても良い。
Further, not only the above-described single layer of the phase change material, but also a multi-layered or ultra-fine phase change material may be dispersed in a heat resistant matrix.

後者のような記録膜の作製法としては、前記気相成膜
法以外にゾル−ゲル法のような湿式プロセスも適用可能
である。
As a method for producing the latter recording film, a wet process such as a sol-gel method can be applied in addition to the vapor phase film forming method.

前記記録層の膜厚としては200〜10000Å、好適には50
0〜3000Å、最適には700〜2000Åである。
The thickness of the recording layer is 200 to 10,000 Å, preferably 50
0-3000Å, optimally 700-2000Å.

以下、実施例によって本発明を具体的に説明する。 Hereinafter, the present invention will be described specifically with reference to examples.

[実施例] スパッタ用ターゲットとしてAgSbTe2三元合金ターゲ
ットを準備し、下記(表−1)に示す条件にて、ガラス
基板上に記録層を製膜し、オージェ電子分光による膜中
組成分析、示差走査熱量計(DSC)による結晶化温度(T
c)、結晶化活性化エネルギー(Ea)及び頻度因子
(ν)の評価を行った。
[Example] An AgSbTe 2 ternary alloy target was prepared as a sputtering target, a recording layer was formed on a glass substrate under the conditions shown in (Table 1) below, and the composition in the film was analyzed by Auger electron spectroscopy. Crystallization temperature by differential scanning calorimeter (DSC) (T
c), crystallization activation energy (Ea) and frequency factor (ν) were evaluated.

また、熱処理(200℃、10分)前後の波長800nmにおけ
る反射率の差(ΔR%)を分光光度計により測定した。
その結果を下記(表−2)に示す。
Further, the difference (ΔR%) in reflectance at a wavelength of 800 nm before and after the heat treatment (200 ° C., 10 minutes) was measured by a spectrophotometer.
The results are shown below (Table 2).

A〜Eの5個の試料を60℃、90%RHの環境下に500時
間放置した後の反射率変化はAを除きB〜Eのサンプル
はすべて3%以下であった。又、サンプルEは熱処理前
後の反射率変化(コントラスト)が小さい。
After the five samples A to E were allowed to stand for 500 hours in an environment of 60 ° C. and 90% RH, the reflectance changes of all the samples B to E except for A were 3% or less. Sample E has a small change in reflectance (contrast) before and after the heat treatment.

また、酸素を添加した試料は試料Aに比べ傷つきにく
くなっており明らかに膜の物理的強度の向上が認められ
た。
In addition, the sample to which oxygen was added was less susceptible to damage than the sample A, and the physical strength of the film was clearly improved.

[発明の効果] 以上説明したように、本発明の光情報記録媒体により
次のような改善ができる。
[Effects of the Invention] As described above, the following improvements can be made by the optical information recording medium of the present invention.

1)頻度因子の増大に伴う消去速度の向上、 2)活性化エネルギーの増大に伴う記録部の寿命の向
上、 3)耐酸化性、耐食性の向上、 4)物理的強度の向上。
1) Improvement of the erasing speed with an increase in the frequency factor, 2) Improvement of the life of the recording section with an increase of the activation energy, 3) Improvement of oxidation resistance and corrosion resistance, 4) Improvement of physical strength.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 岩崎 博子 東京都大田区中馬込1丁目3番6号 株 式会社リコー内 (56)参考文献 特開 昭61−2594(JP,A) 特開 昭63−160882(JP,A) (58)調査した分野(Int.Cl.6,DB名) B41M 5/26 ──────────────────────────────────────────────────続 き Continuation of the front page (72) Inventor Hiroko Iwasaki 1-3-6 Nakamagome, Ota-ku, Tokyo Inside Ricoh Co., Ltd. (56) References JP-A-61-2594 (JP, A) JP-A Sho 63-160882 (JP, A) (58) Field surveyed (Int. Cl. 6 , DB name) B41M 5/26

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】基板上に設けられた記録層中に、主成分と
して下記一般式で示される化合物を含有することを特徴
とする情報記録媒体、 一般式、(XoYpZq1-xOx ただし、 Xは周期表第Ib族元素から選ばれた1種、 Yは同じく、第Vb族元素から選ばれた1種、 Zは同じく第VIb族元素から選ばれた1種、 0.15≦o≦0.35 0.15≦p≦0.35 0.40≦q≦0.60 o+p+q=1 0.05≦x≦0.20である。
1. An information recording medium comprising a compound represented by the following general formula as a main component in a recording layer provided on a substrate, a general formula: (X o Y p Z q ) 1 -x O x However, X is one selected from the periodic table group Ib element, Y is also, one selected from the group Vb element, one Z is which also selected from the VIb group element, 0.15 ≦ o ≦ 0.35 0.15 ≦ p ≦ 0.35 0.40 ≦ q ≦ 0.60 o + p + q = 1 0.05 ≦ x ≦ 0.20.
JP1056189A 1989-03-10 1989-03-10 Information recording medium Expired - Fee Related JP2875275B2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP1056189A JP2875275B2 (en) 1989-03-10 1989-03-10 Information recording medium
US07/485,991 US5100700A (en) 1989-03-10 1990-02-27 Information recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1056189A JP2875275B2 (en) 1989-03-10 1989-03-10 Information recording medium

Publications (2)

Publication Number Publication Date
JPH02235788A JPH02235788A (en) 1990-09-18
JP2875275B2 true JP2875275B2 (en) 1999-03-31

Family

ID=13020163

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1056189A Expired - Fee Related JP2875275B2 (en) 1989-03-10 1989-03-10 Information recording medium

Country Status (1)

Country Link
JP (1) JP2875275B2 (en)

Also Published As

Publication number Publication date
JPH02235788A (en) 1990-09-18

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