JP2874581B2 - Circuit board manufacturing method - Google Patents

Circuit board manufacturing method

Info

Publication number
JP2874581B2
JP2874581B2 JP7027088A JP2708895A JP2874581B2 JP 2874581 B2 JP2874581 B2 JP 2874581B2 JP 7027088 A JP7027088 A JP 7027088A JP 2708895 A JP2708895 A JP 2708895A JP 2874581 B2 JP2874581 B2 JP 2874581B2
Authority
JP
Japan
Prior art keywords
prepreg sheet
circuit board
polymer film
manufacturing
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP7027088A
Other languages
Japanese (ja)
Other versions
JPH08222851A (en
Inventor
敏昭 竹中
貞雄 三田村
邦雄 岸本
利浩 西井
眞治 中村
環生 小島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP7027088A priority Critical patent/JP2874581B2/en
Publication of JPH08222851A publication Critical patent/JPH08222851A/en
Application granted granted Critical
Publication of JP2874581B2 publication Critical patent/JP2874581B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、高分子フィルムをプリ
プレグシートの両面に接着して導電ペースト充填時のマ
スクとして用いる回路基板の製造方法におけるプリプレ
グシートと高分子フィルムの剥離方法に関するものであ
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for peeling a prepreg sheet and a polymer film in a method of manufacturing a circuit board used as a mask when a conductive film is filled by bonding a polymer film to both surfaces of the prepreg sheet. .

【0002】[0002]

【従来の技術】近年、電子機器の小型化、高密度化に伴
い、産業用にとどまらず民生用の分野においても回路基
板の高密度化が強く要望されるようになってきた。
2. Description of the Related Art In recent years, as electronic devices have become smaller and higher in density, there has been a strong demand for higher density of circuit boards not only for industrial use but also for consumer use.

【0003】回路基板では高密度化を妨げる要因となっ
ていたメッキスルホールにかわって導電ペーストによる
インナービアホール接続による回路基板の製造方法が提
案されている(例えば特開平6−268345号公
報)。
A method of manufacturing a circuit board by connecting an inner via hole with a conductive paste instead of the plated through hole, which has been a factor hindering the increase in the density of the circuit board, has been proposed (for example, JP-A-6-268345).

【0004】この回路基板の製造方法は、両面に離型性
を有する高分子フィルム(以下離型性フィルムと称す
る)を備えた被圧縮性の多孔質のプリプレグシートに貫
通孔をあけその穴に導体ペーストを充填し、離型性フィ
ルムを剥離した後、プリプレグシートの両面に金属箔を
張り付けて加熱圧接することで基板の両面を電気接続
し、さらに金属箔をエッチングによってパターニングし
て回路形成するものである。
In this method of manufacturing a circuit board, a through hole is formed in a compressible porous prepreg sheet provided with a polymer film having releasability on both sides (hereinafter referred to as a releasable film). After the conductive paste is filled and the release film is peeled off, a metal foil is attached to both sides of the prepreg sheet and heated and pressed to electrically connect both sides of the substrate, and the metal foil is further patterned by etching to form a circuit. Things.

【0005】以下従来の回路基板の製造方法について図
面を参照しながら説明する。図7(a)〜(f)は従来
の回路基板の製造工程を示す工程断面図である。まず、
図7(a)に示すように、両面に厚さ12μmのPET
(ポリエチレンテレフタレート)などの高分子フィルム
の片面にシリコーン系の離型層を形成した離型性フィル
ム12を備えた、寸法が□500mm、厚さt1mmの多
孔質のプリプレグシート11が準備される。多孔質のプ
リプレグシート11としては、例えば芳香族ポリアミド
繊維の不織布に熱硬化性エポキシ樹脂を含浸させた複合
材が用いられる。
Hereinafter, a conventional method for manufacturing a circuit board will be described with reference to the drawings. 7A to 7F are process cross-sectional views showing a conventional process for manufacturing a circuit board. First,
As shown in FIG. 7A, a PET having a thickness of 12 μm is formed on both surfaces.
A porous prepreg sheet 11 having a size of 500 mm and a thickness of t1 mm, comprising a release film 12 having a silicone release layer formed on one surface of a polymer film such as (polyethylene terephthalate) is prepared. As the porous prepreg sheet 11, for example, a composite material in which a non-woven fabric of aromatic polyamide fibers is impregnated with a thermosetting epoxy resin is used.

【0006】次に図7(b)に示すように、プリプレグ
シート11の所定の箇所にレーザー加工法などを利用し
て貫通孔13が形成される。
Next, as shown in FIG. 7 (b), through holes 13 are formed in predetermined portions of the prepreg sheet 11 by using a laser processing method or the like.

【0007】次にプリプレグシート11を印刷機(図示
せず)のテーブル上に設置し、導電性ペースト14が離
型性フィルム12の上から印刷され、貫通孔13に充填
される。この時、上面の離型性フィルム12は印刷マス
クとプリプレグシート11の汚染防止の役割を果たして
いる。
Next, the prepreg sheet 11 is set on a table of a printing machine (not shown), and a conductive paste 14 is printed from above the release film 12 and filled in the through holes 13. At this time, the release film 12 on the upper surface plays a role of preventing contamination of the print mask and the prepreg sheet 11.

【0008】次に図7(d)に示すように、プリプレグ
シート11の両面の離型性シート12が室温にて2m/
minの速度で剥離される。そして、図7(e)に示す
ように、プリプレグシート11の両面に銅箔などの金属
箔15を張りつけて、この状態で加熱加圧することによ
って、図7(f)に示すように、プリプレグシート11
と金属箔15とが接着されるとともに、プリプレグシー
ト11が厚さt2mmまで圧縮(t1>t2)して両面の金属
箔15が導電ペースト14によって電気的に接続する。
この時、プリプレグシート11の一構成成分であるエポ
キシ樹脂および導電ペースト14は硬化する。
Next, as shown in FIG. 7D, the release sheets 12 on both sides of the prepreg sheet 11 are 2 m / m at room temperature.
peeled off at a speed of min. Then, as shown in FIG. 7 (e), a metal foil 15 such as a copper foil is adhered to both surfaces of the prepreg sheet 11, and heated and pressurized in this state, as shown in FIG. 7 (f). 11
The prepreg sheet 11 is compressed to a thickness t2 mm (t1> t2), and the metal foils 15 on both sides are electrically connected by the conductive paste 14.
At this time, the epoxy resin and the conductive paste 14, which are one component of the prepreg sheet 11, are hardened.

【0009】その後両面の金属箔15を選択的にエッチ
ングして回路パターン(図示せず)を形成することで両
面の回路基板が得られる。
Thereafter, the metal foil 15 on both sides is selectively etched to form a circuit pattern (not shown), thereby obtaining a circuit board on both sides.

【0010】以上述べたように、回路基板の製方法造の
中でプリプレグシートの両面に接着された離型性フィル
ムはレーザー加工等で貫通孔を形成し、導体ペースト印
刷時のマスクとして使用した後剥離されることから、レ
ーザー加工時や導電ペースト印刷時に剥離しない接着力
と、導体ペースト充填後に容易に剥離できる剥離性が重
要となる。
As described above, in the method of manufacturing a circuit board, the release film adhered to both surfaces of the prepreg sheet was formed with a through hole by laser processing or the like, and used as a mask when printing a conductor paste. Since peeling is performed later, adhesive strength that does not peel during laser processing or conductive paste printing, and peelability that can be easily peeled after filling with the conductive paste are important.

【0011】[0011]

【発明が解決しようとする課題】しかしながら上記の従
来の構成では、離型性フィルムをプリプレグシートに接
着した直後剥離性に問題がないものであっても離型層や
プリプレグシート中の樹脂成分のばらつきによって1〜
2週間程度の放置によって接着強度が増大し、剥離時に
離型性フィルムの破断不良が発生する。
However, in the above-mentioned conventional structure, even if the release property is not problematic immediately after the release film is bonded to the prepreg sheet, the resin component in the release layer or the prepreg sheet is not affected. Depending on the variation
When left for about two weeks, the adhesive strength increases, and the peeling failure of the release film occurs at the time of peeling.

【0012】例えば、離型性フィルムをプリプレグシー
トに接着した直後剥離強度(180度剥離、剥離速度2
m/min)が1.5g/30mm幅のものが2週間後
では30g/30mm幅となるものでは、剥離時に全数
が離型性フィルムの破断が発生する。
For example, immediately after the release film is bonded to the prepreg sheet, the peel strength (180 ° peeling, peeling speed 2
(m / min) of 1.5 g / 30 mm width, after 2 weeks, of 30 g / 30 mm width, the release film breaks in all cases when peeled.

【0013】また、離型層やプリプレグシート中の樹脂
成分のばらつきによって接着直後の接着強度がばらつき
導電ペースト印刷時に離型性フィルムが剥がれたり、剥
離時に離型性フィルムの破断不良が発生するという問題
があった。
[0013] Further, the adhesive strength immediately after bonding varies due to the variation of the resin component in the release layer or the prepreg sheet, and the release film is peeled at the time of printing of the conductive paste, and the release failure of the release film occurs at the time of peeling. There was a problem.

【0014】導電ペースト印刷時の離型性フィルム剥が
れは、剥離強度が0.5g前後で発生し、導電ペースト
によるプリプレグシートの汚染不良となる。
The peeling of the release film during printing of the conductive paste occurs when the peel strength is around 0.5 g, resulting in poor contamination of the prepreg sheet by the conductive paste.

【0015】本発明は上記従来の課題を解決するもの
で、導電ペースト印刷時のマスクとなる高分子フィルム
とプリプレグシートとの接着性と剥離性を安定化し、高
品質の回路基板を実現するための回路基板の製造方法を
提供することを目的とするものである。
The present invention has been made to solve the above-mentioned conventional problems and is intended to stabilize the adhesiveness and peelability between a polymer film and a prepreg sheet, which are used as a mask when printing a conductive paste, and to realize a high-quality circuit board. It is an object of the present invention to provide a method for manufacturing a circuit board as described above.

【0016】[0016]

【課題を解決するための手段】上記目的を達成するため
に、本発明の回路基板の製造方法は、離型層を有する離
型性フィルムを接着した熱硬化性エポキシ樹脂を含む
リプレグシートに貫通孔をあけ、貫通孔に導体ペースト
を充填した後プリプレグシートを40℃〜90℃の加
熱温度で加熱しながら離型性フィルムを剥離する、ある
いは離型層のない高分子フィルムを接着した熱硬化性エ
ポキシ樹脂を含むプリプレグシートに貫通孔をあけ、貫
通孔に導体ペーストを充填した後プリプレグシートを
0℃〜90℃の加熱温度で加熱しながら高分子フィル
ムを剥離した後、プリプレグシートの両面に金属箔を加
熱圧接することで基板の両面を電気接続し、さらにエッ
チングによって回路形成するものである。
In order to achieve the above object, a method of manufacturing a circuit board according to the present invention is directed to a method for producing a circuit board comprising a thermosetting epoxy resin to which a release film having a release layer is adhered. > After making a through hole in the repreg sheet and filling the through hole with the conductive paste , the prepreg sheet is heated to 40 ° C to 90 ° C.
The release film is peeled off while being heated at the hot temperature , or a thermosetting resin bonded to a polymer film without a release layer.
Drilled holes in the prepreg sheet containing the epoxy resin, transmural
After filling the through-hole with the conductive paste , the prepreg sheet is heated at a heating temperature of 50 ° C. to 90 ° C., and then the polymer film is peeled off. Are electrically connected, and a circuit is formed by etching.

【0017】[0017]

【作用】上記のように構成された本発明によれば、離型
性フィルムの剥離時にプリプレグシートを40℃〜90
℃の加熱温度で加熱することで離型性フィルムとプリプ
レグシートとの接着強度が低下して離型性フィルムが破
断することなく安定した剥離ができる。
According to the present invention constructed as described above, the prepreg sheet is kept at 40 ° C. to 90 ° when the release film is peeled off.
By heating at a heating temperature of ° C., the adhesive strength between the release film and the prepreg sheet is reduced, and stable release can be performed without breaking the release film.

【0018】さらに、離型層のない高分子フィルムを使
用することで、プリプレグシートとの接着強度が増大し
接着性が安定することで導電ペースト印刷時に高分子フ
ィルムの剥がれがなくなるとともに、離型層のない高分
子フィルムでもプリプレグシート中の熱硬化性樹脂のプ
リプレグ状態での溶融開始温度以上に加熱することで固
形の熱硬化性樹脂が軟化、溶融し、接着強度が低下して
高分子フィルムが破断することなく安定した剥離ができ
る。
Furthermore, by using a polymer film without a release layer, the adhesive strength to the prepreg sheet is increased and the adhesiveness is stabilized, so that the polymer film does not peel off during printing of the conductive paste, and Even if the polymer film has no layer, the solid thermosetting resin is softened and melted by heating the thermosetting resin in the prepreg sheet to a temperature higher than the melting start temperature in the prepreg state, and the adhesive strength is reduced, resulting in a decrease in the polymer film. Can be stably peeled without breaking.

【0019】[0019]

【実施例】以下本発明の実施例における回路基板の製造
方法について説明する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS A method for manufacturing a circuit board according to an embodiment of the present invention will be described below.

【0020】(第1実施例)図1(a)〜(f)は本発
明の第一の実施例の回路基板の製造工程を示す工程断面
図である。
(First Embodiment) FIGS. 1A to 1F are sectional views showing the steps of manufacturing a circuit board according to a first embodiment of the present invention.

【0021】まず、図1(a)に示すように、両面に厚
さ12μmのPET(ポリエチレンテレフタレート)な
どの高分子フィルムに膜厚が100オングストローム程
度のシリコーン系の離型層を形成した離型性フィルム2
を接着した、寸法が□500mm、厚さt1mmの多孔
質の芳香族ポリアミド繊維の不織布に熱硬化性エポキシ
樹脂を含浸させたプリプレグシート1を準備する。
First, as shown in FIG. 1 (a), a release mold having a thickness of about 100 angstroms and a silicone release layer formed on a polymer film such as PET (polyethylene terephthalate) having a thickness of 12 μm on both sides. Film 2
A prepreg sheet 1 is prepared by impregnating a thermosetting epoxy resin into a non-woven fabric of a porous aromatic polyamide fiber having a size of □ 500 mm and a thickness of t1 mm.

【0022】プラスチックフィルムにはPET以外に、
PI(ポリイミド)、PEN(ポリエチレンナフタレー
ト)、PPS(ポリフェニレンサルファイト)、PP
(ポリプロピレン)、PPO(ポリフェニレンオキサイ
ド)などを用いても良い。前記プリプレグシート1に
は、ガラス繊維に熱硬化性エポキシ樹脂を含浸させた複
合材を用いてもよい。
In addition to PET for plastic films,
PI (polyimide), PEN (polyethylene naphthalate), PPS (polyphenylene sulphite), PP
(Polypropylene), PPO (polyphenylene oxide) or the like may be used. The prepreg sheet 1 may use a composite material in which glass fiber is impregnated with a thermosetting epoxy resin.

【0023】次に図1(b)に示すように、プリプレグ
シート1の所定の箇所にレーザー加工法などを利用して
貫通孔3を形成する。
Next, as shown in FIG. 1B, a through hole 3 is formed in a predetermined portion of the prepreg sheet 1 by using a laser processing method or the like.

【0024】次に前記プリプレグシート1を印刷機(図
示せず)のテーブル上に設置し、直接導電性ペースト4
を離型性フィルム2の上から印刷する。この時、上面の
離型性フィルム2は印刷マスクとプリプレグシートの汚
染防止の役割を果たしている。
Next, the prepreg sheet 1 is placed on a table of a printing machine (not shown),
Is printed on the release film 2. At this time, the release film 2 on the upper surface plays a role of preventing contamination of the print mask and the prepreg sheet.

【0025】次に図1(d)に示すように、プリプレグ
シート1を温風6で約50℃〜60℃に加熱しながら両
面の離型性フィルム2を約2m/minの速度で剥離す
る。ここでは加熱手段に温風方式を用いたが、赤外線加
熱法やロール加熱方式などを用いてもよい。
Next, as shown in FIG. 1D, the release film 2 on both sides is peeled off at a speed of about 2 m / min while the prepreg sheet 1 is heated to about 50 ° C. to 60 ° C. with hot air 6. . Here, a warm air method is used as the heating means, but an infrared heating method, a roll heating method, or the like may be used.

【0026】そして、図1(e)に示すように、プリプ
レグシート1の両面に厚さ35μmの銅箔などの金属箔
5が張りつけられ、この状態で加熱加圧することによっ
て、図1(f)に示すように、プリプレグシート1と金
属箔5とが接着されるとともに、プリプレグシート1が
厚さt2mmまで圧縮(t1>t2)して両面の金属箔5が
導電ペースト4によって電気的に接続される。この時、
プリプレグシート1の一構成成分であるエポキシ樹脂お
よび導電ペースト4は硬化する。
Then, as shown in FIG. 1 (e), a metal foil 5 such as a copper foil having a thickness of 35 μm is adhered to both surfaces of the prepreg sheet 1 and is heated and pressed in this state to thereby obtain the structure shown in FIG. As shown in FIG. 5, the prepreg sheet 1 and the metal foil 5 are bonded together, and the prepreg sheet 1 is compressed to a thickness t2 mm (t1> t2), and the metal foils 5 on both sides are electrically connected by the conductive paste 4. You. At this time,
The epoxy resin and the conductive paste 4 which are one component of the prepreg sheet 1 are cured.

【0027】そして両面の金属箔5を選択的にエッチン
グして回路パターン(図示せず)を形成することで両面
の回路基板が得られる。
By selectively etching the metal foils 5 on both sides to form a circuit pattern (not shown), a circuit board on both sides is obtained.

【0028】図2に離型性フィルム剥離時の加熱温度と
剥離強度のグラフを示す。剥離強度の測定は温度制御が
可能なプレートに幅30mm、長さ約100mmの測定
物を両面テープで固定して、温度を変更しながら2m/
minの速度で180度剥離を行った。JIS規格では
金属箔5等の剥離強度の測定速度は60mm/minが
用いられているが、実施例の剥離速度で測定した。
FIG. 2 is a graph showing the relationship between the heating temperature and the peel strength when the release film is peeled off. The measurement of the peel strength was performed by fixing a measurement object having a width of 30 mm and a length of about 100 mm to a temperature-controllable plate with a double-sided tape, and changing the temperature to 2 m / m.
180 degree peeling was performed at a speed of min. According to the JIS standard, the measurement speed of the peel strength of the metal foil 5 and the like is 60 mm / min, but the measurement was performed at the peel speed of the example.

【0029】測定には離型性フィルム2をプリプレグシ
ート1に接着した直後の常温での剥離強度が約1.5g
/30mm幅が、2週間後に約30g/30mm幅に増
大し剥離時に離型性フィルムが破断したサンプルを用い
た。
For the measurement, the peel strength at room temperature immediately after the release film 2 was bonded to the prepreg sheet 1 was about 1.5 g.
A sample whose / 30 mm width increased to about 30 g / 30 mm width after 2 weeks and the release film was broken at the time of peeling was used.

【0030】剥離強度は温度に比例して低下し加熱温度
が50℃から60℃の範囲で最低(剥離強度は約1.5
g/30mm幅)となり60℃を超えると、再度剥離強
度が増大し90℃で最大(剥離強度は約250g/30
mm幅)となるが、離型性フィルム2の破断はない。
The peel strength decreases in proportion to the temperature, and is lowest when the heating temperature is in the range of 50 ° C. to 60 ° C. (the peel strength is about 1.5
g / 30 mm width) and exceeds 60 ° C., the peel strength increases again and reaches a maximum at 90 ° C. (the peel strength is about 250 g / 30 g).
mm width), but the release film 2 is not broken.

【0031】90℃以上になる樹脂成分が溶融しはじ
め、樹脂自身の強度が低下するためと剥離強度は再度低
下する。実施例の加熱条件では100枚のサンプルにつ
いて剥離を行ったが、離型性フィルム2の破断不良は皆
無であった。
The peeling strength decreases again because the resin component at 90 ° C. or higher begins to melt and the strength of the resin itself decreases. Under the heating conditions of the example, peeling was performed on 100 samples, but there was no breaking failure of the release film 2.

【0032】以上説明したように40℃以上で離型性フ
ィルム2が破断することなく剥離できることを確認した
が、90℃を超えると剥離時に離型性フィルム2への樹
脂の付着量の増加や樹脂成分の糸引き現象が発生するた
め、90℃以下での加熱が望ましく、加熱によってプリ
プレグシート1中のエポシキ樹脂の硬化が後の回路基板
の製造工程で問題とならないレベルで設定すればよい。
As described above, it was confirmed that the release film 2 can be peeled at 40 ° C. or higher without breaking. However, if the temperature exceeds 90 ° C., an increase in the amount of resin adhered to the release film 2 at the time of peeling or Since the stringing phenomenon of the resin component occurs, heating at a temperature of 90 ° C. or less is desirable, and the heating may be set at a level at which the curing of the epoxy resin in the prepreg sheet 1 does not cause a problem in a subsequent circuit board manufacturing process.

【0033】また、加熱時間はプリプレグシート1が所
望の温度に達すれば良く(実施例のでは数秒で所望温度
に達した)、加熱温度と同様プリプレグシート1中のエ
ポシキ樹脂の硬化が後の回路基板の製造工程で問題とな
らないレベルで設定すればよい。
The heating time may be such that the prepreg sheet 1 reaches the desired temperature (in the embodiment, the desired temperature is reached in a few seconds). Similarly to the heating temperature, the curing of the epoxy resin in the prepreg sheet 1 is performed in a subsequent circuit. It may be set at a level that does not cause a problem in the substrate manufacturing process.

【0034】(第2実施例)図3(a)〜(f)は本発
明の第二の実施例の回路基板の製造工程を示す工程断面
図である。
(Second Embodiment) FIGS. 3A to 3F are cross-sectional views showing the steps of manufacturing a circuit board according to a second embodiment of the present invention.

【0035】まず、図3(a)に示すように、両面に離
型層のない厚さ12μmのPET(ポリエチレンテレフ
タレート)などの高分子フィルム7を接着した寸法が□
500mm、厚さt1のプリプレグシート1を準備す
る。高分子フィルムにはPET以外に、PI(ポリイミ
ド)、PEN(ポリエチレンナフタレート)、PPS
(ポリフェニレンサルファイト)、PP(ポリプロピレ
ン)、PPO(ポリフェニレノキサイド)などを用いて
も良い。
First, as shown in FIG. 3 (a), the size of a polymer film 7 such as PET (polyethylene terephthalate) having a thickness of 12 μm without a release layer on both sides is □
A prepreg sheet 1 having a thickness of 500 mm and a thickness t1 is prepared. For polymer films, besides PET, PI (polyimide), PEN (polyethylene naphthalate), PPS
(Polyphenylene sulfite), PP (polypropylene), PPO (polyphenylenoxide) and the like may be used.

【0036】プリプレグシート1としては、例えばガラ
ス繊維の織布に熱硬化性エポキシ樹脂を含浸させた複合
材が用いられる。プリプレグシート1には図5に示すよ
うに2角に切り欠き8を設けている。高分子フィルム7
を接着した状態の切り欠き9部はA方向からみたときの
拡大側面図に示すように、両面の高分子フィルム7のみ
が接触(図6(a))あるいは非接触(図6(b))の
状態で存在している。
As the prepreg sheet 1, for example, a composite material in which a woven glass fiber fabric is impregnated with a thermosetting epoxy resin is used. The prepreg sheet 1 is provided with two notches 8 as shown in FIG. Polymer film 7
As shown in an enlarged side view when viewed from the direction A, only the polymer film 7 on both sides is in contact (FIG. 6 (a)) or non-contact (FIG. 6 (b)). It exists in the state of.

【0037】次に図3(b)に示すように、プリプレグ
シート1の所定の箇所にレーザー加工法などを利用して
貫通孔3を形成する。
Next, as shown in FIG. 3B, through holes 3 are formed at predetermined locations of the prepreg sheet 1 by using a laser processing method or the like.

【0038】次にプリプレグシート1を印刷機(図示せ
ず)のテーブル上に設置し、直接導電性ペースト4を高
分子フィルム7の上から印刷する。この時、上面の高分
子フィルム7は印刷マスクとプリプレグシート1の汚染
防止の役割を果たしている。
Next, the prepreg sheet 1 is set on a table of a printing machine (not shown), and the conductive paste 4 is printed directly on the polymer film 7. At this time, the polymer film 7 on the upper surface plays a role of preventing contamination of the print mask and the prepreg sheet 1.

【0039】次に図3(d)に示すように、プリプレグ
シート1を温風6で約55℃〜65℃に加熱しながら両
面の高分子フィルム7を約2m/minの速度で剥離す
る。剥離はプリプレグシート1の2角の切り欠き9部の
高分子フィルム7からスタートすれば容易にできる。
Next, as shown in FIG. 3D, the polymer film 7 on both sides is peeled off at a speed of about 2 m / min while the prepreg sheet 1 is heated to about 55 ° C. to 65 ° C. with warm air 6. Peeling can be easily performed by starting from the polymer film 7 at 9 parts of the two notches of the prepreg sheet 1.

【0040】そして、図3(e)に示すように、プリプ
レグシート1の両面に厚さ35μmの銅箔などの金属箔
5を張りつけて、この状態で加熱加圧することによっ
て、図3(f)に示すように、プリプレグシート1と金
属箔5とが接着するとともに、プリプレグシート1が厚
さt2mmまで圧縮(t1>t2)して両面の金属箔5が導
電ペースト4によって電気的に接続する。この時、プリ
プレグシート1の一構成成分であるエポキシ樹脂および
導電ペースト4は硬化する。
Then, as shown in FIG. 3 (e), a metal foil 5 such as a copper foil having a thickness of 35 μm is adhered to both surfaces of the prepreg sheet 1 and heated and pressed in this state, thereby obtaining the structure shown in FIG. 3 (f). As shown in (2), the prepreg sheet 1 and the metal foil 5 are bonded together, and the prepreg sheet 1 is compressed to a thickness t2 mm (t1> t2), and the metal foils 5 on both surfaces are electrically connected by the conductive paste 4. At this time, the epoxy resin and the conductive paste 4 which are one component of the prepreg sheet 1 are cured.

【0041】そして両面の金属箔5を選択的にエッチン
グして回路パターン(図示せず)を形成することで両面
の回路基板が得られる。
The metal foil 5 on both sides is selectively etched to form a circuit pattern (not shown), whereby a circuit board on both sides is obtained.

【0042】図4に剥離時の加熱温度と剥離強度のグラ
フを示す。剥離強度の測定は温度制御が可能なプレート
に幅30mm、長さ約100mmの測定物を両面テープ
で固定して、温度を変更しながら2m/minの速度で
180度剥離を行った。
FIG. 4 is a graph showing the relationship between the heating temperature during peeling and the peel strength. The peel strength was measured by fixing a measurement object having a width of 30 mm and a length of about 100 mm to a temperature-controllable plate with a double-sided tape, and performing 180 ° peeling at a speed of 2 m / min while changing the temperature.

【0043】20℃の室温での剥離強度は、高分子フィ
ルム7が破断して測定不能の強度を示した。実施例では
100枚のサンプルの導電ペースト4印刷を行ったが高
分子フィルム7の剥がれや導電ペースト4によるプリプ
レグシート3汚染不良は皆無であった。
The peel strength at room temperature of 20 ° C. was unmeasurable because the polymer film 7 was broken. In the example, 100 samples of the conductive paste 4 were printed, but there was no peeling of the polymer film 7 and no contamination of the prepreg sheet 3 by the conductive paste 4.

【0044】加熱時の剥離強度は、加熱温度が50℃以
下では100g/30mm幅以上を示し、剥離時に高分
子フィルム7の破断が発生したが、55℃で急激に剥離
強度が低下(剥離強度は約8g/30mm幅)して高分
子フィルム7の破断が無くなった。55℃以降、剥離強
度が増大し90℃で最大となっている。最大時の剥離強
度は約300g/30mm幅となっているが高分子フィ
ルム7の破断はない。
The peel strength at the time of heating was 100 g / 30 mm or more at a heating temperature of 50 ° C. or less, and the polymer film 7 was broken at the time of peeling, but the peel strength was sharply reduced at 55 ° C. (peel strength). (Approximately 8 g / 30 mm width), and the breakage of the polymer film 7 was eliminated. After 55 ° C., the peel strength increased and reached a maximum at 90 ° C. Although the peel strength at the maximum was about 300 g / 30 mm width, the polymer film 7 was not broken.

【0045】90℃以上になると樹脂成分が溶融しはじ
め樹脂自身の強度が低下するため剥離強度は再度低下す
るが高分子フィルム7の破断は発生はない。55℃以降
の剥離強度の変化は離型性フィルム2を用いた場合とほ
ぼ同じ傾向にある。
When the temperature exceeds 90 ° C., the resin component begins to melt and the strength of the resin itself decreases, so that the peel strength decreases again, but the polymer film 7 does not break. The change in the peel strength after 55 ° C. has almost the same tendency as that when the release film 2 is used.

【0046】実施例に用いたプリプレグシート1中の熱
硬化性エポシキ樹脂の溶融開始温度は、昇温速度8℃/
min時の粘度特性を測定した結果、50℃近傍にある
ことから加熱温度が樹脂成分の溶融開始温度を超えれば
高分子フィルム7の破断がない安定な剥離性が得られる
ことを分かったが、90℃を超えると剥離時に高分子フ
ィルム7への樹脂の付着量の増加や樹脂成分の糸引き現
象が発生するため90℃以下での加熱が望ましい。
The melting start temperature of the thermosetting epoxy resin in the prepreg sheet 1 used in the example was 8 ° C. /
As a result of measuring the viscosity characteristics at the time of min, it was found that since the heating temperature was close to 50 ° C., if the heating temperature exceeded the melting start temperature of the resin component, stable release properties without breaking of the polymer film 7 could be obtained. If the temperature exceeds 90 ° C., heating at 90 ° C. or lower is desirable because an increase in the amount of resin adhered to the polymer film 7 at the time of peeling and a stringing phenomenon of the resin component occur.

【0047】また、加熱時間も離型性フィルム2を用い
た時と同様にプリプレグシート1が設定温度に達すれば
良く、加熱によってプリプレグシート1中のエポシキ樹
脂の硬化が問題の無いレベルで設定すればよい。
Also, the heating time may be such that the prepreg sheet 1 reaches the set temperature in the same manner as when the release film 2 is used, and the curing of the epoxy resin in the prepreg sheet 1 by heating is set at a level at which there is no problem. I just need.

【0048】実施例の剥離条件では100枚のサンプル
の剥離を行ったが、高分子フィルム7の破断不良は皆無
であった。
Under the peeling conditions of the example, 100 samples were peeled, but there was no breakage failure of the polymer film 7.

【0049】なお、第1実施例で高分子フィルムの離型
層の膜厚を100オングストローム程度として説明した
が、離型層の膜厚が薄くなり接着力が離型層のない高分
子フィルムに近づき低温域で高分子フィルムの破断不良
が発生した時は、離型層のない高分子フィルムと同様に
加熱温度をプリプレグシート中の熱硬化性樹脂のプリプ
レグ状態での溶融開始温度以上に設定すればよい。
In the first embodiment, the thickness of the release layer of the polymer film has been described as being about 100 Å. When the failure of the polymer film breaks down in the approaching low temperature range, the heating temperature should be set to be equal to or higher than the melting start temperature of the thermosetting resin in the prepreg sheet in the prepreg state as in the case of the polymer film without the release layer. I just need.

【0050】また、第1、第2の実施例では剥離速度を
2m/minとした時の結果を説明したが、発明者は剥
離速度が20m/minまで確認しており、その結果で
は、剥離速度が速くなるに従い剥離強度の最低値温度や
最大値温度が数度高温側にシフトするため剥離速度に応
じて若干の温度調整をしてやればよいことが分かってい
る。
In the first and second embodiments, the results when the peeling speed is 2 m / min have been described. However, the inventor has confirmed that the peeling speed is up to 20 m / min. As the speed increases, the minimum temperature or the maximum temperature of the peel strength shifts by several degrees to the high temperature side, so it is known that a slight temperature adjustment may be performed according to the peel speed.

【0051】また、第1実施例で芳香族ポリアミド繊維
の不織布と熱硬化性樹脂との複合材、第2実施例でガラ
ス繊維の織布と熱硬化性樹脂との複合材からなるプリプ
レグシートを用いたが、芳香族ポリアミド繊維の織布と
熱硬化性樹脂との複合材、ガラス繊維の不織布と熱硬化
性樹脂との複合材からなるプリプレグシートを用いても
同様の結果を得ている。
In the first embodiment, a prepreg sheet composed of a nonwoven fabric of aromatic polyamide fiber and a thermosetting resin is used. In the second embodiment, a prepreg sheet composed of a composite material of a woven fabric of glass fiber and a thermosetting resin is used. Similar results were obtained by using a prepreg sheet made of a composite material of a woven aromatic fiber fabric and a thermosetting resin and a composite material of a nonwoven glass fiber fabric and a thermosetting resin.

【0052】また、第1、第2の実施例では所定形状に
加工したプリプレグシートについて述べたが連続状のプ
リプレグシートについても適用できることは言うまでも
ない。
In the first and second embodiments, the prepreg sheet processed into a predetermined shape has been described. However, it is needless to say that the present invention can be applied to a continuous prepreg sheet.

【0053】また、第1、第2の実施例では両面の回路
基板について述べたが、高分子フィルムをプリプレグシ
ートの両面に接着して導電ペースト充填時のマスクとし
て用いる多層の回路基板についても適用できることは言
うまでもない。
Although the first and second embodiments have been described with respect to a double-sided circuit board, the present invention is also applicable to a multilayer circuit board which is used as a mask when filling a conductive paste by bonding a polymer film to both sides of a prepreg sheet. It goes without saying that you can do it.

【0054】[0054]

【発明の効果】以上述べたように、本発明の回路基板の
製造方法は、両面に離型層を有した離型性フィルムを接
着したプリプレグシートに貫通孔をあけその穴に導体ペ
ーストを充填した後、プリプレグシートを加熱しながら
離型性フィルムを剥離することで、長期間保管したプリ
プレグシートでも離型性フィルムとの剥離強度が低下し
て離型性フイルムの破断がなく安定した剥離ができる。
As described above, according to the method for manufacturing a circuit board of the present invention, a through-hole is formed in a prepreg sheet having a release film having a release layer on both sides bonded thereto, and the hole is filled with a conductive paste. After peeling off the release film while heating the prepreg sheet, the peel strength with the release film decreases even with the prepreg sheet stored for a long time, and stable release without breakage of the release film is achieved. it can.

【0055】また、離型層のない高分子フィルムを使用
することでプリプレグシートとの接着時の接着強度が大
幅に増大して導電ペースト充填時の高分子フィルムが剥
がれや導電ペーストによるプリプレグシートの汚染不良
がなくなるとともに、離型層のない高分子フィルムでも
プリプレグシート中の熱硬化性のエポシキ樹脂のプリプ
レグ状態での溶融開始温度以上に加熱しながら剥離する
ことで高分子フィルムの破断のない安定な剥離性が得ら
れ、高品質の回路基板を実現できる。
Further, by using a polymer film having no release layer, the adhesive strength at the time of bonding with the prepreg sheet is greatly increased, and the polymer film is peeled off at the time of filling the conductive paste or the prepreg sheet is not covered with the conductive paste. Eliminates contamination failure and stabilizes polymer film without breakage even when polymer film without release layer is peeled off while heating above the melting start temperature of thermosetting epoxy resin in prepreg sheet in prepreg state High releasability and a high quality circuit board can be realized.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の回路基板の製造方法の第1の実施例を
示す工程断面図
FIG. 1 is a process sectional view showing a first embodiment of a method of manufacturing a circuit board of the present invention.

【図2】同実施例におけるプリブレグシートと離型性フ
ィルムの加熱温度と剥離強度を示す図
FIG. 2 is a diagram showing a heating temperature and a peel strength of a pre-breg sheet and a release film in the same example.

【図3】本発明の回路基板の製造方法の第2の実施例を
示す工程断面図
FIG. 3 is a process sectional view showing a second embodiment of the method for manufacturing a circuit board of the present invention.

【図4】同実施例におけるプリブレグシートと離型層の
ない高分子フィルムの加熱温度と剥離強度を示す図
FIG. 4 is a diagram showing the heating temperature and the peel strength of a pre-breg sheet and a polymer film without a release layer in the same example.

【図5】図3に示す実施例における2角に切り欠きを設
けたプリプレグシートの平面図
FIG. 5 is a plan view of a prepreg sheet provided with cutouts at two corners in the embodiment shown in FIG. 3;

【図6】図5に示すプリプレグシートのA方向からの切
り欠き部拡大側面図
FIG. 6 is an enlarged side view of a cutaway portion of the prepreg sheet shown in FIG. 5 from a direction A.

【図7】従来の回路基板の製造方法を示す工程断面図FIG. 7 is a process sectional view showing a conventional circuit board manufacturing method.

【符号の説明】[Explanation of symbols]

1、11 プリプレグシート 2、12 離型性フィルム 3、13 貫通孔 4、14 導電ペースト 5、15 金属箔 6 温風 7 高分子フィルム 8 切り欠き DESCRIPTION OF SYMBOLS 1, 11 Prepreg sheet 2, 12 Release film 3, 13 Through hole 4, 14 Conductive paste 5, 15 Metal foil 6 Hot air 7 Polymer film 8 Notch

───────────────────────────────────────────────────── フロントページの続き (72)発明者 西井 利浩 大阪府門真市大字門真1006番地 松下電 器産業株式会社内 (72)発明者 中村 眞治 大阪府門真市大字門真1006番地 松下電 器産業株式会社内 (72)発明者 小島 環生 大阪府門真市大字門真1006番地 松下電 器産業株式会社内 (56)参考文献 特開 平6−268345(JP,A) 特開 平4−40260(JP,A) 特開 平3−149231(JP,A) 実開 平1−116111(JP,U) (58)調査した分野(Int.Cl.6,DB名) H05K 3/40 H05K 1/03 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Toshihiro Nishi 1006 Kadoma Kadoma, Kadoma, Osaka Prefecture Inside Matsushita Electric Industrial Co., Ltd. (72) Inventor, Tamaki Kojima 1006, Kazuma, Kadoma, Osaka Pref. Matsushita Electric Industrial Co., Ltd. (56) References JP-A-6-268345 (JP, A) JP-A-4-40260 (JP, A) JP-A-3-149231 (JP, A) JP-A-1-116111 (JP, U) (58) Fields investigated (Int. Cl. 6 , DB name) H05K 3/40 H05K 1/03

Claims (6)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 高分子フィルムに離型層を形成した離型
性フィルムを両面に備えた熱硬化性エポキシ樹脂を含む
プリプレグシートに貫通孔をあけ、前記貫通孔に導体ペ
ーストを充填し、前記離型性フィルムを剥離した後、前
記プリプレグシートの両面に金属箔を加熱圧接すること
で基板の両面を電気接続し、さらにエッチングによって
回路形成する回路基板の製造方法であって、 前記離型性フィルム剥離時に前記プリプレグシートを
0℃〜90℃の加熱温度で加熱しながら前記離型性フィ
ルムを剥離する回路基板の製造方法。
1. A through hole is made in a prepreg sheet containing a thermosetting epoxy resin provided on both sides with a release film having a release layer formed on a polymer film, and a conductive paste is applied to the through hole. After filling and releasing the release film, a method for manufacturing a circuit board, wherein both sides of the substrate are electrically connected by heating and pressing metal foils on both sides of the prepreg sheet, and a circuit is further formed by etching, 4 the prepreg sheet during the release film peeling
A method for manufacturing a circuit board, wherein the release film is peeled off while heating at a heating temperature of 0 ° C to 90 ° C.
【請求項2】 離型性フィルムの代わりに離型層のない
高分子フィルムを用い、前記高分子フィルム剥離時にプ
リプレグシートを50℃〜90℃の加熱温度で加熱しな
がら前記高分子フィルムを剥離する請求項1記載の回路
基板の製造方法。
2. A using a polymer film without parting layer instead of releasing film, peeling off the polymer film while the prepreg sheet was heated at a heating temperature of 50 ° C. to 90 ° C. during the polymer film peeling The method for manufacturing a circuit board according to claim 1.
【請求項3】 プリプレグシートが芳香族ポリアミドを
主材料とする織布もしくは不織布と熱硬化性エポキシ
脂との複合材である請求項1記載の回路基板の製造方
法。
3. The method for producing a circuit board according to claim 1, wherein the prepreg sheet is a composite material of a woven or nonwoven fabric mainly composed of an aromatic polyamide and a thermosetting epoxy resin.
【請求項4】 プリプレグシートがガラス材料からなる
織布もしくは不織布と熱硬化性エポキシ樹脂との複合材
である請求項1記載の回路基板の製造方法。
4. The method for manufacturing a circuit board according to claim 1, wherein the prepreg sheet is a composite material of a woven or nonwoven fabric made of a glass material and a thermosetting epoxy resin.
【請求項5】 プリプレグシートの外周の一部を除去
両面のプラスチックフィルムの接触あるいは非接触
部を少なくとも1箇所以上設けた請求項1記載の回路基
板の製造方法。
5. The method for manufacturing a circuit board according to claim 1, wherein a part of the outer periphery of the prepreg sheet is removed , and at least one contact or non-contact portion between the plastic films on both surfaces is provided.
【請求項6】 高分子フィルムがポリエチレンテレフタ
レート、ポリイミド、ポリフェニレンサルファイド、ポ
リエチレンナフタレート、ポリプロピレン、ポリフェニ
レンオキサイドである請求項1または記載の回路基板
の製造方法。
6. A polymer film of polyethylene terephthalate, polyimide, polyphenylene sulfide, polyethylene naphthalate, polypropylene, according to claim 1 or 2 circuit substrate manufacturing method according polyphenylene oxide.
JP7027088A 1995-02-15 1995-02-15 Circuit board manufacturing method Expired - Fee Related JP2874581B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7027088A JP2874581B2 (en) 1995-02-15 1995-02-15 Circuit board manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7027088A JP2874581B2 (en) 1995-02-15 1995-02-15 Circuit board manufacturing method

Publications (2)

Publication Number Publication Date
JPH08222851A JPH08222851A (en) 1996-08-30
JP2874581B2 true JP2874581B2 (en) 1999-03-24

Family

ID=12211330

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7027088A Expired - Fee Related JP2874581B2 (en) 1995-02-15 1995-02-15 Circuit board manufacturing method

Country Status (1)

Country Link
JP (1) JP2874581B2 (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3914606B2 (en) * 1997-04-25 2007-05-16 松下電器産業株式会社 Adhesive layer manufacturing device, double-sided substrate manufacturing device and multilayer substrate manufacturing device
JP2006152261A (en) * 2004-10-25 2006-06-15 Hitachi Chem Co Ltd Composite, prepreg, metal foil-clad laminated plate, and multilayer printed wiring board and manufacturing method thereof
JP2006299189A (en) * 2005-04-25 2006-11-02 Hitachi Chem Co Ltd Prepreg sheet, metal foil-clad laminate, circuit board, and method for manufacturing circuit board
JP2006306977A (en) * 2005-04-27 2006-11-09 Hitachi Chem Co Ltd Composite, prepreg, metal foil-clad laminated board, printed-wiring board, multilayer printed-wiring board and manufacturing method thereof
WO2006118059A1 (en) 2005-04-27 2006-11-09 Hitachi Chemical Company, Ltd. Composite, prepreg, laminated plate clad with metal foil, material for connecting circuit board, and multilayer printed wiring board and method for manufacture thereof
JP2006307067A (en) * 2005-04-28 2006-11-09 Hitachi Chem Co Ltd Composite, prepreg, metal-clad laminated board, printed-wiring board and its manufacturing method
JP2006348225A (en) * 2005-06-17 2006-12-28 Hitachi Chem Co Ltd Composite, prepreg, metallic foil clad laminate and printed wiring substrate using the same, and method for manufacturing printed wiring substrate
JP2007123375A (en) * 2005-10-26 2007-05-17 Matsushita Electric Ind Co Ltd Conductive paste composition, printed wiring board using the same, and manufacturing method therefor
JP2009076699A (en) * 2007-09-20 2009-04-09 Fujikura Ltd Method of manufacturing multilayer printed wiring board

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03191595A (en) * 1989-12-20 1991-08-21 Risho Kogyo Co Ltd Manufacture of one-sided metal-clad laminated board for multilayer circuit board use
JPH03225997A (en) * 1990-01-31 1991-10-04 Sumitomo Electric Ind Ltd Manufacture of flexible printed wiring board
JP2601128B2 (en) * 1992-05-06 1997-04-16 松下電器産業株式会社 Method of manufacturing circuit forming substrate and circuit forming substrate

Also Published As

Publication number Publication date
JPH08222851A (en) 1996-08-30

Similar Documents

Publication Publication Date Title
US6459046B1 (en) Printed circuit board and method for producing the same
US7155820B2 (en) Method for manufacturing printed circuit board
US6664127B2 (en) Method of manufacturing multi-layer printed wiring board
US6807729B2 (en) Method of manufacturing metal foil
JP2874581B2 (en) Circuit board manufacturing method
TWI241876B (en) Circuit forming substrate, method of manufacturing the substrate, and material of the substrate
JP4348815B2 (en) Method for manufacturing printed wiring board
US6694612B1 (en) Mask film having a non-parting portion
EP1408726B1 (en) Method of manufacturing a printed wiring board
JP4147723B2 (en) Printed wiring board
JPH06252555A (en) Multilayered wiring board
JPH05283862A (en) Manufacture of laminated printed board
JP2002151813A (en) Printing wiring board and its manufacturing method
JP3780535B2 (en) Method for manufacturing printed wiring board
JPH1117295A (en) Manufacture of prepreg for circuit board and prepreg for circuit board and manufacture of circuit board using the same device
JP2004087957A (en) Printed wiring board with built-in component, and method for manufacturing the same
JP5198302B2 (en) Wiring board manufacturing method
JP2002026521A (en) Manufacturing method of multilayer printed-wiring board
JP2002144432A (en) Method for adhering plastic film
JPS637693A (en) Manufacture of printed circuit board with resistance circuit
JPH057094A (en) Manufacture of shielding plate for multilayer printed wiring board
JP2002094233A (en) Method for manufacturing circuit board
JP4876691B2 (en) Manufacturing method of paste-filled prepreg and manufacturing method of circuit board
JPH057095A (en) Manufacture of shielding plate for multilayer printed wiring board
JPH1168309A (en) Manufacture of laminated board with built-in inner circuit

Legal Events

Date Code Title Description
FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20080114

Year of fee payment: 9

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090114

Year of fee payment: 10

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090114

Year of fee payment: 10

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100114

Year of fee payment: 11

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110114

Year of fee payment: 12

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110114

Year of fee payment: 12

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120114

Year of fee payment: 13

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130114

Year of fee payment: 14

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130114

Year of fee payment: 14

LAPS Cancellation because of no payment of annual fees