JP2860187B2 - Interlock actuator - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an interlock mechanism of a photosensitive material processing apparatus for stopping the drive of an internal drive system when an opening / closing lid of an apparatus body is opened, and more particularly to an interlock mechanism for operating / releasing an interlock. It relates to a lock actuating device.

[0002]

2. Description of the Related Art In a photosensitive lithographic printing plate processing apparatus (hereinafter, referred to as "PS plate processor") for processing a photosensitive lithographic printing plate (hereinafter, referred to as "PS plate") as a photosensitive material, generally,
Processing such as development, rinsing, and desensitization processing is performed while the PS plate is transported substantially horizontally in the apparatus.

[0003] In many of such PS version processors, the internal rollers and brushes are exposed when the top lid is opened.
Daily maintenance (cleaning, inspection, etc.) is performed with this top cover opened. Normally, the upper lid is made of a lightweight, chemical-resistant or painted metal.

However, even when the upper lid is opened, the rollers,
When the brush or the like is rotated, it is very dangerous. Therefore, the PS plate processor is provided with an interlock mechanism so that a driving portion such as a roller or a brush is not driven when the upper lid is opened.

This interlock mechanism detects the open / closed state of the upper cover by a microswitch provided between the apparatus body of the PS plate processor and the upper cover. When the upper lid is opened and the contact of the micro switch is switched, the interlock is activated.

[0006]

However, there is a task that is easier to carry out while maintaining the inside of the PS plate processor while opening the upper cover while driving the drive section inside the apparatus. In addition, the microswitch provided as an interlock actuating device switches contacts depending on the presence or absence of contact with the upper lid, so that the microswitch is exposed when the upper lid is open.
For this reason, the interlock mechanism operates the microswitch with a handy tool or the like, and even an unskilled worker can easily release the operation of the interlock.

The present invention has been made in view of the above facts, and relates to an interlock operating device which can release an interlock mechanism of a photosensitive material processing apparatus only by operating a dedicated key.

[0008]

Means for Solving the Problems] interlock actuating device according to claim 1 of the present invention, the internal transportable with open lid
A interlock actuating device for performing the operation and release of the interlock mechanism of the photosensitive material processing apparatus for stopping the driving of the feed drive system, wherein in the open state of switched the closing lid contacts in response to the opening and closing of the lid and having a switch for operating an interlock, and a key-operated switch for releasing the interlock switches the contact by key operation of the private key.

According to a second aspect of the present invention, there is provided the interlock operating device according to the first aspect, wherein the interlock operating device is interlocked with a key operation of the key operation switch, and the interlock is released by the key operation. It is characterized by having a stopper for preventing the opening / closing lid from closing.

[0010]

The interlock operating device of the photosensitive material processing apparatus according to the first aspect of the present invention detects an open state of the open / close lid by a switch. As the switch, a contact type switch such as a micro switch may be used,
The use of a proximity switch, for example, a magnetic proximity switch that operates in response to a change in magnetism, etc., is more artificial than a micro switch that directly contacts one of the photosensitive material processing device and the open / close lid to switch the contact. It is preferable because it is difficult to release the interlock by a manual operation.

Further, the interlock operating device is provided with a key operation switch for releasing the operation of the interlock by operating a dedicated key. The key operation switch cannot be operated unless it is a dedicated key. By placing this dedicated key under the control of a specific administrator, the interlock mechanism of the photosensitive material processing apparatus can be released only under the control of this administrator.

The key operation switch may be any switch that can be operated by operating a dedicated key, and a proximity switch can be applied, but a normal micro switch can also be applied. Also stopped by interlock mechanism
As the transport drive system to rotate, the photosensitive material is
In addition to the rollers that transport
Includes brushes and the like that are driven to rotate.

[0013] The interlock operating device according to the second aspect of the present invention is provided with a stopper interlocked with the key operation switch. The stopper protrudes when releasing the actuation of the interlock by the key-operated switch, so that not come close lid in closed. This makes it clear that the interlock is released, and prevents the opening / closing lid from being closed while the interlock is released. Therefore, it closes the opening and closing lid while releasing the interlock
The transport drive system operates the next time the lid is opened ,
Rollers, brushes, etc. do not rotate .

[0014]

FIG. 1 shows a photosensitive lithographic printing plate processing apparatus (hereinafter referred to as a "PS plate processor 10") which is a photosensitive material processing apparatus according to the present embodiment. The PS plate processor 10 includes a photosensitive lithographic printing plate after exposure (hereinafter, referred to as “PS plate 1”).
2)) and discharged, and the image printed on the photosensitive lithographic plate is printed in the next printing step.

The PS plate processor 10 has an internal processing unit covered by a casing 22, and an insertion table 24 is mounted near the insertion slot of the PS plate 12. PS version 12
Is placed on the insertion table 24 and inserted into the casing 22 from the insertion opening.

FIG. 2 shows a schematic structure of the PS version processor 10. Processing unit 11 of PS version processor 10
Is a developing tank 14 for storing the developing solution, and an overflow tank 1 for storing the developing solution overflowing from the developing tank 14.
6. A rinse tank 18 and a finisher tank 20 for cleaning the developed PS plate 12 and protecting the plate surface are arranged in order. In addition, washing water is stored in the rinsing tank 18,
The finisher tank 20 stores a finisher liquid.

On the PS tank 12 insertion side of the developing tank 14, PS
Plate detection sensor 2 for detecting the passage of the leading and trailing ends of plate 12
6 and PS inserted into PS version processor 10
The length from the front end to the rear end of the plate 12 is detected. Further, the processing area of the PS plate 12 may be calculated by detecting the leading end, the rear end, and the width of the inserted PS plate 12 by the plate detecting sensor 26.

The developing tank 14 is formed in a substantially inverted mountain shape that is open upward and protrudes downward. A guide roller group 28 including a plurality of guide rollers forming a transport path of the PS plate 12 is provided in the developing tank 14. At a substantially central portion of the guide roller group 28, a pair of spray pipes 30 are provided with the transport path of the PS plate 12 interposed therebetween. A plurality of discharge ports are formed in the spray pipe 30 along the width direction of the transport path, a circulation pump 98 is provided at an intermediate portion, and one end is connected to the spray pipe 30 through the bottom of the developing tank 14. , A pipe 34 having the other end communicating with the developing tank 14 is provided. The developer is supplied to the spray pipe 30 by the operation of the circulation pump 98,
It is ejected toward the front and back surfaces of the S plate 12. In addition, piping 3
An electric conductivity sensor 104 for measuring the electric conductivity of the developer to be supplied to the spray pipe 30 is provided at an intermediate portion of 4, and the concentration of the developer is detected from the electric conductivity of the developer.

A brush roller 36 is rotatably provided on the downstream side of the spray pipe 30 in the developing tank 14 so as to correspond to the front and back surfaces of the PS plate 12 to be conveyed.
Is to be brushed.

In the developing tank 14, the driving force of the driving means is transmitted, and the guide roller group 28 and the brush roller 36 rotate to convey the PS plate 12 while immersing the PS plate 12 in the developing solution. No. 12 is ejected toward the plate surface, and processing with a developer is performed.

The vicinity of the bottom of the developing tank 14 and the developer inlet 10
6 is communicated with a pipe 14A so that the developer can be supplied into the developer tank 14 from the developer inlet 106. The developer inlet 106 is connected to a water replenishment tank and a developer replenishment tank (not shown) by pipes 108 and 110. A water replenishment pump 112 and a developer replenishment pump 114 are provided at the intermediate portions of these pipes 108 and 110, respectively. The undiluted developing solution replenished by the operation of the developer replenishing pump 114 is diluted to a predetermined concentration at the developing solution inlet 106 by the water replenished by the operation of the water replenishing pump 112 and supplied to the developing tank 14. It has become. The replenishment of the developing solution and water into the developing tank 14 is performed so that the value of the electric conductivity measured by the electric conductivity sensor 104 falls within a predetermined range.

The downstream end of the developing tank 14 is bent downward and directed into the overflow tank 16. Therefore, the surplus developer in the developing tank 14 overflows from the bent portion and is stored in the overflow tank 16. An overflow pipe 90 is provided in the overflow tank 16 so that the overflow of the developer stored in the overflow tank 16 is discharged to a waste liquid tank (not shown). One end of a pipe 92 is connected to the vicinity of the bottom of the overflow tank 16, and the other end is connected to the developer inlet 106. Also,
A return pump 116 is provided at an intermediate portion of the pipe 92, and the developer near the bottom of the overflow tank 16 is returned to the developing tank 14 through the developer inlet 106 by the operation of the return pump 116. .

Above the connection between the overflow tank 16 and the rinsing tank 18, there is provided a pair of conveying rollers 38 which rotate by receiving the driving force of the driving means and pinch and convey the PS plate 12. A squeeze bar 40 is provided on the outer peripheral edge of the upper roller of the transport roller pair 38, and a small-diameter roller 41 that rotates with the rotation of the transport roller pair 38 is disposed on the outer peripheral edge of the lower roller. The squeeze bar 40 and the small-diameter roller 41 are stored in the
The washing water attached to the outer peripheral edge of the developing tank is prevented from being mixed into the overflow tank 16 to dilute the developer in the overflow tank 16.

Above the rinsing tank 18, the finisher tank 2
In the vicinity of 0, the driving force of the driving means is transmitted to rotate
A transport roller pair 44 for nipping and transporting the S plate 12 is provided. A pair of spray pipes 46 are provided between the pair of transport rollers 38 and the pair of transport rollers 44 with the transport path interposed therebetween. One end of a pipe 50 provided with a circulation pump 48 at an intermediate part is connected to the spray pipe 46, and the other end of the pipe 50 is connected to the bottom of the rinse tank 18.
By the operation of the circulation pump 48, P
Rinse water for cleaning the S plate 12 is supplied, and is ejected to the front and back surfaces of the PS plate 12 from a plurality of discharge ports formed in the spray pipe 46 along the width direction of the transport path. .

An overflow pipe 94 is provided in the rinsing tank 18 so that the overflow of the washing water stored in the rinsing tank 18 is discharged to a waste liquid tank (not shown). Further, the rinsing tank 18 and the rinsing liquid inlet 118 for supplying the rinsing liquid to the rinsing tank 18 include:
They are connected by a pipe 18A. One end of a pipe 120 communicating with a water replenishment tank (not shown) is opened at an upper portion of the rinsing liquid inlet 118.
A water replenishment pump 122 is provided at an intermediate portion of the water supply pump 122.
By the operation of the water replenishing pump 122, water is replenished from the water replenishing tank to the rinsing tank 20 as a rinsing liquid.

Above the finisher tank 20, there is provided a pair of transport rollers 52 which rotate upon transmission of the driving force of the driving means and pinch and transport the PS plate 12. A pair of spray pipes 54 are provided on the upstream side of the transport roller pair 52 with the transport path of the PS plate 12 interposed therebetween. One end of a pipe 58 provided with a circulation pump 56 at an intermediate portion thereof communicates with the spray pipe 54, and the other end of the pipe 58 communicates with the spray pipe 54 by penetrating the bottom of the finisher tank 20. The finisher liquid is supplied to the spray pipe 54 by the operation of the circulation pump 56, and the finisher liquid is ejected toward the plate surface of the PS plate 12 from a plurality of discharge ports formed in the spray pipe 54 along the width direction of the transport path. You.

An overflow pipe 96 is provided in the finisher tank 20, and the overflow of the finisher liquid stored in the finisher tank 20 is discharged to a not-shown finisher liquid waste tank. The finisher tank 20 is provided with a pipe 124 that communicates with an upper part of the finisher tank 20 and a not-shown finisher liquid replenishment tank, and communicates with an upper part of the finisher tank 20 and the water replenishment tank (not shown). A pipe 126 is provided. Each pipe 12
4 and 126, a water replenishing pump 128
And a finisher liquid replenishing pump 130. The operation of the water replenishing pump 128 replenishes water to the finisher tank 20 by the operation of the finisher replenishing pump 130.

In the finisher tank 20, the stored finisher liquid is discharged from the spray pipe 54 onto the plate surface of the PS plate 12, and the PS plate 1 is discharged by the finisher liquid.
2 protects the printing plate.

After the plate surface protection processing of the PS plate 12 is performed in the finisher tank 20 by the finisher solution, the PS
The plate 12 is ejected from the PS plate processor 10. Note that P
The processed PS is connected to the outlet of the S-version processor 10.
Stocker stocking version 12 or PS version 1
A drying device or the like for drying 2 with hot air or the like can be provided.

In the PS plate processor 10, when the plate detection sensor 26 detects the insertion of the PS plate 12, the circulating pump 4
8, 56 and 98 are operated for a predetermined time so that the respective processing liquids are ejected from the respective spray pipes 30, 46 and 54. Each of the pipes 34, 50, and 58 is provided with a filter 13 to remove a residue of the photosensitive film removed from the PS plate 12 by the processing and a precipitate from the processing solution.
2 are provided. In addition, each of the pipes 34, 50, and 58 is provided with a drain 100 capable of discharging a processing liquid (a developing liquid, a rinsing liquid, and a finisher liquid) in each processing tank. The overflow tank 16 is provided with a drain 102 from which the developer in the overflow tank 16 can be discharged from the bottom.

On the other hand, as shown in FIG. 1, on the upper surface of the PS plate processor 10, an opening / closing lid 60 for opening a part of the casing 22 is provided. By opening the opening / closing lid 60, the guide roller group 28 of the processing section, the respective rollers of the transport rollers 38, 44, 52, the brush roller 36, the spray pipes 30, 46, 54 and the like are exposed.

As shown in FIGS. 3A, 3B and 4, in the casing 22, a lock portion 62 is attached to the casing 22 by a bracket 62A (shown only in FIG. 4) adjacent to the opening / closing lid 60. I have. The lock portion 62 has a cap 64 provided on the outer surface of the casing 22.
The key 68 is opened by sliding the cover 66
Can be inserted.

The lock 62 is rotated by the key 68 to be inserted being rotated in the direction of arrow A and from the state of being rotated in the direction of arrow A in the direction opposite to the direction of arrow A. Part 70
Is provided. The rotating portion 70 is provided with a stopper 72 protruding in a direction perpendicular to the insertion direction of the key 68 (vertical direction in the drawing of FIGS. 3 and 4), and in a direction flush with the stopper 72 and perpendicular to the stopper 72. A base 74 is formed, which extends and has a distal end bent downward. Also, a bracket 76 is provided adjacent to the locking portion 62.
Are arranged.

A magnet 78 is provided on the base 74, and a switch section 80 is provided on the bracket 76.
A magnetic proximity switch (hereinafter referred to as a “reed switch”) 82 that closes a contact by forming a magnetic circuit in the switch unit 80 by the magnet 78 facing the switch unit 80 is configured. The base 74 and the bracket 76 is adapted to be opposed by the rotation in the arrow A direction of the key 68 inserted into the lock portion 62 (shown in FIG. 3B).

As shown in FIG. 3A, the stopper 72
Is usually housed in the casing 22, by the rotation in the arrow A direction of the key 68 inserted into the lock portion 62, closing the opening 22A provided in the casing 22 (shown only in FIG. 4) It protrudes toward the opening side of the lid 60. As shown in FIGS. 3B and 4, in a state where the stopper 72 protrudes, when the opening / closing lid 60 is to be closed, the stopper 72 abuts on the opening / closing lid 60 and the opening / closing lid 6 is closed.
0 is in a floating state.

As shown in FIGS. 3A and 3B, reed switches 84 are provided at a plurality of positions between the opening / closing lid 60 and the casing 22. These reed switches 84 are configured by a switch portion 81 provided inside the casing 22 and a magnet 79 provided on the inner surface of the open / close lid 60 corresponding to the switch portion 81 , and the open / close state of the open / close lid 60 is detected. Is done.

As shown in FIG. 5A, the reed switches 82 and 84 constitute an interlock operating section, and are connected to an interlock control section 86 to constitute an interlock mechanism. The interlock control unit 86 includes the processing unit 1
It is connected to a drive control unit 88 for controlling a driving means for driving each roller and the brush roller 36.

When the cover 60 is closed, the lock 62
The reed switch 82 is turned off, and the reed switch 84 is turned on. By opening the opening / closing lid 60, the reed switch 84 is turned off, whereby the interlock control unit 86 outputs an interlock signal to the drive control unit 88, and the respective rollers and the brush roller 36
Is stopped, and in this state, the reed switch 82 is turned on by rotating the rotating portion 70 of the lock portion 62 by operating the key 68. When the reed switch 82 is turned on, the interlock control section 86 outputs an interlock release signal to the drive control section 88. A lock (not shown) is provided between the opening / closing lid 60 and the casing 22, so that the opening / closing lid 60 cannot be opened unless the lock is released.

Next, the operation of this embodiment will be described. First, the developing process of the PS plate 12 by the PS plate processor 10 will be described.

When the power switch of the PS plate processor 10 is turned on, the temperature of the processing liquid in each processing tank of the PS plate processor 10 rises to a predetermined temperature, and each of the transport rollers and the brush roller 36 is driven to print an image. The PS plate 12 is ready for development processing. After this, PS version 12
Is placed on the insertion table 24 and inserted into the PS plate processor 10 from the insertion opening. In the PS version processor 10,
PS plate 12 is pulled by the guide roller group 28 which is driven by the drive means, is further guided developer in the developing tank 14. Insertion of the PS plate 12 is detected by the plate detecting sensor 26, the circulating pump 4 8,5
6 , 98 are activated.

In the developing tank 14, the PS plate 12 is immersed in the developing solution, and the developing solution is sprayed from the spray pipe 30, so that the unnecessary photosensitive layer swells and dissolves. Furthermore, P
The S plate 12 is discharged from the developing tank 14 after an unnecessary photosensitive layer swollen or dissolved is removed by a brush roller 36.

The PS plate 12 discharged from the developing tank 14 is
In the rinsing tank 18, washing water is sprayed from the spray pipe 46 to wash the plate surface while being sequentially nipped and conveyed by the conveying roller pairs 38, 44 and 52, and the finisher tank is sprayed with the finisher liquid from the spray pipe 54 in the finisher tank. The plate is protected. The PS plate 12 whose surface is protected by the finisher tank 20 and whose development processing has been completed is discharged from the casing 22 and then subjected to natural drying or drying processing by a drying device.
The developer discharged from the spray pipe 30 is collected in the developing tank 14, the water discharged from the spray pipe 46 is collected in the rinse tank 18, and collected in the finisher tank 20 discharged from the spray pipe 54. Are circulated by the operation of the circulation pumps 48, 56, 98.

Next, each processing tank in the PS plate processor 10 (developing tank 14, rinsing tank 18, finisher tank 20)
A mechanism for replenishing the processing solution to the processing solution will be described.

The concentration of the developing solution in the developing tank 14 is detected from the electric conductivity measured by the electric conductivity sensor 104 provided in the pipe 34 for supplying the developing solution to the spray pipe 30. When it is detected from the value of the electric conductivity that the concentration of the developing solution in the developing tank 14 is out of the predetermined range, the water replenishing pump 112 and the developing solution replenishing pump 116 are operated. As a result, water and the undiluted developing solution are supplied to the developing solution inlet 106, and the undiluted developing solution is diluted to a predetermined concentration by the water at the developing solution inlet 106 and replenished to the developing tank 14.

In the PS plate processor 10, the water replenishing pump 112 is operated periodically to supply water to the developing tank 14 in order to prevent the concentration of the developing solution in the developing tank 14 from changing due to evaporation or the like. I try to replenish.

The rinse tank 18 is replenished with water by a water replenishing pump 122, and the finisher tank 20 is replenished with a predetermined ratio of water and unfinished replenisher replenisher by a water replenishing pump 128 and a finisher replenishing pump 130. It has become. These water refill pumps 122,
The 128 and the finisher liquid replenishment pump 130 operate each time the length of the PS plate 12 detected by the plate detection sensor 26 reaches a predetermined amount. That is, the PS version processor 10
The water is supplied to the rinsing tank 18 and the finisher replenishing solution and the water are supplied to the finisher tank 20 in accordance with the processing amount.

In the PS version processor 10, a fixed size P
When the S plate 12 is developed, the plate detection sensor 26 detects the PS
Each time the insertion of the plate 12 is detected, the water replenishing pumps 122, 1
The 28 finisher liquid replenishment pump 130 is operated. Thereby, water is supplied to the rinsing tank 18 and finisher liquid and water are supplied to the finisher tank 20 at a predetermined ratio.

When the developing solution or water is replenished to the developing tank 14, the level of the developing solution in the developing tank 14 rises and overflows to the overflow tank 16. Further, when the liquid level of the developer in the overflow tank 16 rises due to the replenishment of the developer, the surface portion of the developer in the overflow tank 16 is discharged from the overflow pipe 90.

When the level of the water in the rinsing tank 18 rises due to the water supplied to the rinsing tank 18, the surface layer of the water is discharged from the overflow pipe 94. In the finisher tank 20, the replenishment of the finisher liquid and the water causes the liquid level of the finisher liquid in the finisher tank 20 to rise, and the surface portion to be discharged from the overflow pipe 96.

By these processing liquid replenishment mechanisms, each processing liquid in the PS plate processor 10 maintains an optimal state for performing the development processing of the PS plate 12, and even if each processing liquid is replenished, The level of the processing liquid in each processing tank is kept constant.

Next, the interlock mechanism of the PS plate processor 10 will be described. When the power switch of the PS plate processor 10 is turned on, each roller of the processing unit and the brush roller 36 are driven. When the lid 60 is opened in this state, the reed switch 84 is turned off, so that the interlock mechanism operates and the driving of each roller and the brush roller 36 is stopped.

In this state, even if each roller and the brush roller 36 are exposed by opening the opening / closing lid 60, they are safe because they are not driven. The reed switch 84 for operating the interlock mechanism includes a switch portion 81 inside the casing 22 and a magnet 79 connected to the open / close lid 60.
, The position cannot be easily confirmed from the outside. Since the switch section 81 is operated by the magnet 79, it cannot be easily operated with a handy tool.

When it is desired to drive each roller and the brush roller 36 with the opening / closing lid 60 opened for maintenance of the processing unit 11 of the PS plate processor 10, the key 68 is used.
Can be done by

The key 68 is inserted into the lock portion 62 by sliding the cover 66 of the cap 64, and the key 68 is rotated. As a result, the stopper 72 is
From the opening 22A of the opening / closing lid 60. Thereby, the switch section 80 of the reed switch 82 and the magnet 7
8 and the reed switch 82 is turned on, so that the interlock is released. By releasing the interlock, each roller and the brush roller 36 are driven.

When the opening and closing cover 60 is closed in a state where each roller and the brush roller 36 are driven, that is, in a state where the interlock is released, the stopper 72 is moved to the opening and closing cover 60.
, The opening / closing lid 60 is in a floating state and cannot be completely closed. As a result, it is possible to confirm that the interlock has been released, to close the door in the state where the interlock has been released, and to open and close the lid 60 without knowing that the interlock has been released. Can avoid the dangerous situation of opening.

When the interlock is operated, the key 6
8 is rotated in the direction opposite to the arrow A direction,
Can be pulled out from the lock portion 62. The rotation of the key 68 causes the magnet 78 facing the switch unit 80 to separate from the switch unit 80, turning off the reed switch 82 and interlocking. The stopper 72 is provided in the opening 22.
A is housed in the casing 22 from A, and the opening / closing lid 60 can be completely closed.

Key 68 for releasing this interlock
By controlling by a specific key manager, an inexperienced worker can be prevented from working alone in a dangerous state in which the interlock is released. Further, since it is not necessary to forcibly operate the reed switch 84 with a handy tool or the like to release the interlock, there is no danger of damaging the PS plate processor 10.

As shown in FIG. 5B, the reed switch 82 can be easily added to a conventional interlock mechanism. That is, when the switch 84 performs the interlock by opening the contact, the switch 8
4, a switch 82 may be provided in parallel. Thus, the interlock is released by the switch 82 closing the contact while the switch 84 opens the contact (the open / close door 60 is opened).

In this embodiment, the interlock is activated by turning off the reed switch 84 and the interlock is released by turning on the reed switch 82. However, the on / off of the reed switches 82 and 84 is not limited to this. The interlock may be operated by opening the opening / closing lid 60 and releasing the interlock by the interlock releasing operation of the key 68. The magnetic proximity switch is not limited to the reed switch. For example, a magnetic sensor may be provided in the switch unit 80, and the magnetic sensor may operate by detecting a magnetic amount of a magnet or the like.

In this embodiment, the reed switch 84 is provided between the casing 22 and the opening / closing lid 60 as the first switch. However, the present invention is not limited to the magnetic type and may be constituted by another switch, for example, a proximity switch. Is also good. For example, a high-frequency oscillation type, a capacitance type, a photoelectric type, or the like can be applied.

As the second switch, another proximity switch is used.
Although a switch can be applied,
The contact by direct contact with a micro switch, etc.
Possible to apply a micro switch that switches pointsIn
It is integrated with the lock portion 62 and
It may open and close contact points.

Further, the stopper 72 may be electrically projected and housed. For example, it may be driven by a solenoid or the like to project and be housed. In this case, when the interlock is released by inserting the key 68 , the solenoid is driven to project the stopper 72 from the inside of the casing 22 to the opening of the opening / closing lid 60, so that the structure is housed when the interlock is operated. Is also good.

In this embodiment, the developing tank 14, the overflow tank 16, the rinsing tank 18, and the finisher tank 20 are used.
Has been described, but the number of tanks is not limited to this. For example, two tanks are provided, and an overflow tank is provided between these tanks. It may be something. Further, the mechanism for circulating the processing liquid in each processing tank and replenishing the processing liquid to each processing tank is not limited to the mechanism applied to the present embodiment. Further, the interlock mechanism is not limited to the photosensitive lithographic printing plate processing apparatus, but may be a transport drive of another photosensitive material processing apparatus.
It is also possible to apply the present invention as an interlock operating device of an interlock mechanism for stopping a dynamic system .

[0064]

As described above, in the interlock operating device according to the present invention, the interlock can be released by the dedicated key. The key operation switch may be operated by the dedicated key, and the key manager managing the dedicated key may release the interlock. This makes it possible to release the interlock of the photosensitive material processing apparatus in a safe state.

[Brief description of the drawings]

FIG. 1 is a perspective view showing a PS version processor according to an embodiment.

FIG. 2 is a schematic configuration diagram of a PS version processor according to the embodiment.

FIG. 3A is a perspective view of a main part of a lock showing a state where an opening / closing lid is closed, and FIG. 3B is a perspective view of a main part of a lock showing a state where an interlock is released.

FIG. 4 is a sectional view of a principal part taken along line 4-4 in FIG. 3B.

FIGS. 5A and 5B are schematic block diagrams illustrating an interlock mechanism according to the present embodiment.

[Explanation of symbols]

 Reference Signs List 10 PS plate processor (photosensitive material processing device) 12 PS plate (photosensitive material) 60 Opening / closing lid 68 Key (dedicated key) 72 Stopper 82 Reed switch (key operation switch) 84 Reed switch (proximity switch) 86 Interlock control unit 88 Drive Control unit

Claims (2)

(57) [Claims] 1. An interlock actuating device for activating / releasing an interlock mechanism of a photosensitive material processing apparatus for stopping driving of an internal transport drive system in a state where an opening / closing lid is opened. a switch for actuating the interlock in the open state of switched the open <br/> closed contacts depending, a key-operated switch for releasing the interlock switches the contact by the key operation of the dedicated key, the An interlock actuating device comprising: 2. The interlock according to claim 1, further comprising a stopper that interlocks with a key operation of said key operation switch and prevents closing of said opening / closing lid when said interlock is released by said key operation. Actuator.