JP2849655B2 - Manufacturing method of optical isolator - Google Patents

Manufacturing method of optical isolator

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Publication number
JP2849655B2
JP2849655B2 JP4365790A JP4365790A JP2849655B2 JP 2849655 B2 JP2849655 B2 JP 2849655B2 JP 4365790 A JP4365790 A JP 4365790A JP 4365790 A JP4365790 A JP 4365790A JP 2849655 B2 JP2849655 B2 JP 2849655B2
Authority
JP
Japan
Prior art keywords
optical element
optical
adhesive
cutting
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP4365790A
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Japanese (ja)
Other versions
JPH03243911A (en
Inventor
孝幸 鈴木
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TOOKIN KK
Original Assignee
TOOKIN KK
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Priority to JP4365790A priority Critical patent/JP2849655B2/en
Publication of JPH03243911A publication Critical patent/JPH03243911A/en
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Publication of JP2849655B2 publication Critical patent/JP2849655B2/en
Anticipated expiration legal-status Critical
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Description

【発明の詳細な説明】 イ.発明の目的 〔産業上の利用分野〕 本発明は、半導体レーザの戻り光による雑音防止のた
めに使用される光アイソレータの製造方法に関するもの
で、特に、主要構成素子である光学素子の洗浄方法に関
するものである。
DETAILED DESCRIPTION OF THE INVENTION BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing an optical isolator used for preventing noise due to return light of a semiconductor laser, and particularly to a method for cleaning an optical element which is a main component. Things.

〔従来の技術〕[Conventional technology]

従来、光アイソレータの製造方法としては、ファラデ
ー回転子であるガーネットの光軸方向両面に、偏光子
(ルチル板)、検光子(ルチル板)を、それらの光学軸
の間の角度をファラデー回転角度に合わせた上で熱硬化
型光学用接着剤で固定し、それを切断機を用いて1.7mm
×1.7mm程度の小さい素子に切断後、偏光子、検光子各
々の光学面及びその側面を、溶剤(アセトン、エチルア
ルコールなど)を湿らせた綿棒等で、実体顕微鏡で観察
しながら1個1個丁寧に払拭して洗浄し、切断による欠
け屑や接着剤の切断層、あるいはきずなどの外観検査を
行った上で、良品はマグネット等の磁界発生素子の磁場
方向と光の入射方向が同一となるように、磁場発生素子
と光学素子を配列調整後、光学素子と磁界発生素子を熱
硬化型接着剤で固定し、特性測定を行い、更に最終工程
として偏光子、検光子各々の光学面のきず、汚れ、ある
いは接着層への異物の混入などを実体顕微鏡などで観察
した上で使用されていた。しかし、上述した従来の方法
では、切断直後の光学素子の洗浄作業を溶剤を湿らせた
綿棒等を用いた手作業で行っていたため、切断時に発生
した光学面稜線部のチッピング部分に滞留している光学
材料や接着剤の切断屑が綿棒によって光学面に巻き上げ
られ、きずや汚れが発生し、入射光を散乱させるため、
光アイソレータとしての性能を低下させ使用出来ず、歩
留りを低下させるという欠点があった。又、1個1個実
体顕微鏡で観察しながら清浄にするため作業性も非常に
悪かった。
Conventionally, as a method of manufacturing an optical isolator, a polarizer (rutile plate) and an analyzer (rutile plate) are provided on both sides in the optical axis direction of a garnet, which is a Faraday rotator, and the angle between these optical axes is determined by the Faraday rotation angle. And fix it with thermosetting optical adhesive, then use a cutting machine
After cutting into small elements of about × 1.7 mm, the optical surfaces and side surfaces of each of the polarizer and the analyzer are observed with a stereoscopic microscope using a cotton swab moistened with a solvent (acetone, ethyl alcohol, etc.). After gently wiping and cleaning, and after inspecting the appearance of chips, cut layers of adhesive, or flaws due to cutting, good products have the same magnetic field direction as the magnetic field direction of the magnetic field generating element such as a magnet. After adjusting the arrangement of the magnetic field generating element and the optical element, the optical element and the magnetic field generating element are fixed with a thermosetting adhesive, the characteristics are measured, and the optical surfaces of the polarizer and the analyzer are further provided as a final step. It has been used after observing a flaw, dirt, or contamination of a foreign substance into the adhesive layer by a stereoscopic microscope or the like. However, in the above-described conventional method, the cleaning operation of the optical element immediately after cutting is performed manually by using a cotton swab or the like moistened with a solvent, so that the optical element stays at the chipping portion of the optical surface ridge line portion generated at the time of cutting. The cutting waste of the optical material and adhesive is wound up on the optical surface by a cotton swab, causing scratches and dirt, and scattering the incident light.
There is a drawback that the performance as an optical isolator is reduced and the optical isolator cannot be used, and the yield is reduced. In addition, the workability was very poor because each sample was cleaned while being observed with a stereoscopic microscope.

一方、光学素子の洗浄を超音波洗浄によって切断上が
りのままで行うと、接着部の接着剤に純水、溶剤が浸透
し、偏光子や検光子とガーネットがばらばらに分解した
り、接着層に汚れが発生したりして接着層の劣化が著し
く、光アイソレータとしての信頼性を低下させていた。
On the other hand, if the optical element is cleaned as it is after cutting by ultrasonic cleaning, pure water and solvent will permeate the adhesive at the bonding part, and the polarizer, analyzer and garnet will be disassembled separately, The adhesion layer is significantly deteriorated due to the generation of stains, and the reliability as an optical isolator has been reduced.

〔発明が解決しようとする課題〕[Problems to be solved by the invention]

本発明は、前述の欠点を除去するために提案されたも
ので、切断後の素子の清浄作業におけるきずや汚れの発
生を抑制し歩留りを向上させ、又、作業性の良い光アイ
ソレータの製造方法を提供しようとするものである。
The present invention has been proposed in order to eliminate the above-mentioned drawbacks, and it is intended to suppress the generation of scratches and dirt in the cleaning operation of the element after cutting, to improve the yield, and to provide a method of manufacturing an optical isolator with good workability. It is intended to provide.

ロ.発明の構成 〔課題を解決するための手段〕 本発明は、前記課題を解決するため、チッピング部等
に滞留する切断屑を強力に洗い出す方法として超音波洗
浄法を用い、且つ既に光学的に組み合せた接着層を劣化
させない様、切断された各光学素子の接着層の露出部周
辺を樹脂層(例えば熱硬化型の樹脂層など)により保護
した上で行う光学素子の洗浄方法により洗浄された光学
素子を用いて光アイソレータを製造する方法である。
B. Configuration of the Invention [Means for Solving the Problems] In order to solve the above-mentioned problems, the present invention uses an ultrasonic cleaning method as a method for strongly washing out cutting debris staying in a chipping portion and the like, and has already been optically combined. In order to prevent the adhesive layer from deteriorating, the exposed portion of the adhesive layer of each cut optical element is protected by a resin layer (for example, a thermosetting resin layer), and then the optical element is cleaned by an optical element cleaning method. This is a method for manufacturing an optical isolator using an element.

即ち本発明は、光の偏波面を45度回転させるファラデ
ー回転子の両面に、偏光子と検光子を熱硬化型光学用接
着剤を用いて接着固定後、前記接着体を所望の大きさの
素子に切断して光学素子とし、該光学素子の周りに光の
入射方向と同一方向に磁場がかかるように、磁界発生素
子を配置固定して成る光アイソレータの製造工程におい
て、上記光学素子として、ファラデー回転子、偏光子及
び検光子の接着体を切断した直後の光学素子の側面接着
部分を樹脂層で覆い保護した上で、超音波洗浄法によっ
て洗浄した光学素子を用いることを特徴とした光アイソ
レータの製造方法である。
That is, the present invention is to fix the polarizer and the analyzer on both sides of the Faraday rotator that rotates the polarization plane of light by 45 degrees using a thermosetting optical adhesive, and then bond the adhesive to a desired size. In the manufacturing process of an optical isolator in which a magnetic field generating element is arranged and fixed so that a magnetic field is applied around the optical element in the same direction as the incident direction of light, the optical element A light characterized by using an optical element cleaned by an ultrasonic cleaning method after covering the side surface adhesive portion of the optical element immediately after cutting the bonded body of the Faraday rotator, the polarizer and the analyzer with a resin layer and protecting it. This is a method for manufacturing an isolator.

〔作用〕[Action]

光アイソレータ素子を接着している熱硬化型光学用接
着剤の接着層を劣化させないよう、接着層周辺を樹脂で
保護層を設けて、超音波の洗浄力により洗浄することに
より自動化出来、且つきずの発生を押さえた高い歩留り
の清浄作業が行える。
In order not to deteriorate the adhesive layer of the thermosetting optical adhesive to which the optical isolator element is adhered, a protective layer is provided around the adhesive layer with a resin, and can be automated by cleaning with an ultrasonic cleaning power, and the flaw can be obtained. Cleaning work with a high yield can be performed while suppressing the occurrence of cracks.

〔実施例〕〔Example〕

以下、本発明を図面を参照しながら詳細に説明する。 Hereinafter, the present invention will be described in detail with reference to the drawings.

第1図は、本発明の実施例の光アイソレータの主な製
造工程を示した図、第2図は、本発明の実施例に用いる
光学素子用のファラデー回転子、偏光子及び検光子の接
着の製造過程を説明する説明図、第3図は、第2図に示
す光学素子用接着体の光学軸合わせを説明する説明図、
第4図は、光学素子用の接着体の切断状態を示す外観斜
視図、第5図は、切断直後の光学素子を示す外観斜視
図、第6図は、第5図の切断直後の光学素子の接着層を
覆うように樹脂層で保護した光学素子の斜視図、第7図
は、洗浄された光学素子に磁界素子としてのマグネット
の組付けを説明する説明図である。
FIG. 1 is a view showing main manufacturing steps of an optical isolator according to an embodiment of the present invention, and FIG. 2 is an adhesion of a Faraday rotator, a polarizer and an analyzer for an optical element used in the embodiment of the present invention. FIG. 3 is an explanatory view for explaining the manufacturing process of FIG. 3, and FIG. 3 is an explanatory view for explaining the optical axis alignment of the optical element bonding body shown in FIG.
FIG. 4 is an external perspective view showing a cut state of the adhesive for an optical element, FIG. 5 is an external perspective view showing the optical element immediately after cutting, and FIG. 6 is an optical element immediately after cutting in FIG. FIG. 7 is a perspective view of an optical element protected by a resin layer so as to cover the adhesive layer of FIG. 7, and FIG. 7 is an explanatory diagram for explaining the assembly of a magnet as a magnetic field element to the cleaned optical element.

本実施例に示す光アイソレータは、接着・固定貼り合
わせ、光学軸合わせ、光学素子切断、接着層保護、超音
波洗浄、マグネット装着・固定の第1図に示す主な工程
により製造する。
The optical isolator shown in this embodiment is manufactured by the main steps shown in FIG. 1 of bonding and fixing, bonding of optical axes, cutting of an optical element, protection of an adhesive layer, ultrasonic cleaning, and mounting and fixing of a magnet.

始めに第2図に示すように、光の偏光面を45度回転さ
せる1.31μm用ファラデー回転子2(Bi置換Gd鉄ガーネ
ット:11×11×0.35mm)と偏光子1を、接着面を十分に
清浄にした上で、熱硬化型光学用接着剤で65℃×12Hr接
着硬化し、同様に検光子3をファラデー回転子2の偏光
子接着面の反対側に65℃×17minで接着半硬化させ、そ
の後、第3図に示すように接着体10の両側の偏光子11と
検光子12の外側に軸合わせ用マグネット4をセッティン
グして、ファラデー回転子2のファラデー回転角と検光
子12の光学軸が一致するように配置し、レーザダイオー
ド(LD)光源5を検光子12側より入射して、ITVカメラ
6に映る像を見ながら偏光子11を僅かに回転させ光学軸
合わせを行い、その後65℃×12Hrで接着剤を硬化させ接
着体10を固定し作成した。その後、紫外線硬化型テープ
により接着体10を切断治具に貼り付け、切断機により第
4図に示すように約1.7mm×約1.7mmの大きさの光学素子
8に切断し、紫外線硬化型テープの裏側より紫外線を4
分間照射して第5図に示すような光学素子8をピンセッ
トで1個1個取り出し、素子の側面接着層露出部分を熱
硬化型接着剤の樹脂層で第6図に示すように光学素子10
の中央部のファラデー回転子2の回りを樹脂層9で保護
し、65℃×12Hrで接着剤を硬化させた。更に、発振周波
数45KHz、高周波出力80Wの超音波洗浄器で3分間20℃の
エチルアルコールを用いて超音波洗浄を行い、切断時に
生じたルチル稜線部のチッピング部分の切断屑等の塵芥
を除去したところ、清浄作業によるきずの発生はほとん
ど見られず、又、側面接着層部分の接着剤も薄く残って
おり、接着層へのエチルアルコールの浸透も見受けられ
なかった。その後、第7図に示すように、光学素子10の
中央部にマグネット71を接着固定し特性測定を行い、最
終検査をしたところ、アイソレーション35.7dB、挿入損
失0.35dB(at25.5℃)で通常の特性が得られ、外観的に
も良品のものを作製出来た。上述の方法で、10ロット作
製した結果、きずによる不良率が5%、その他の不良率
が5%で平均歩留り90%と高い歩留りが得られ、又、切
断直後の素子の洗浄作業もロット毎に行えたため、1個
当たりの作業時間も大幅に短縮され、約10秒/個と能率
も大きく向上した。
First, as shown in FIG. 2, the Faraday rotator 2 for 1.31 μm (Bi-substituted Gd iron garnet: 11 × 11 × 0.35 mm), which rotates the polarization plane of light by 45 degrees, and the polarizer 1 are sufficiently bonded. And then cured with a thermosetting optical adhesive at 65 ° C for 12 hours. Similarly, the analyzer 3 was semi-cured at 65 ° C for 17 minutes on the opposite side of the Faraday rotator 2 to the polarizer bonding surface. Then, as shown in FIG. 3, the magnets 4 for axial alignment are set outside the polarizer 11 and the analyzer 12 on both sides of the adhesive body 10, and the Faraday rotation angle of the Faraday rotator 2 and the The optical axis is aligned, the laser diode (LD) light source 5 is incident from the analyzer 12 side, and the polarizer 11 is slightly rotated while watching the image reflected on the ITV camera 6 to perform the optical axis alignment. Thereafter, the adhesive was cured at 65 ° C. × 12 hours to fix the adhesive body 10 to prepare it. Then, the adhesive 10 is attached to the cutting jig with an ultraviolet curing tape, and cut into optical elements 8 each having a size of about 1.7 mm × about 1.7 mm as shown in FIG. 4 UV rays from behind
Then, the optical element 8 as shown in FIG. 5 is taken out one by one with tweezers, and the exposed portion of the side adhesive layer of the element is made of a thermosetting adhesive resin layer as shown in FIG.
Was protected around the Faraday rotator 2 by a resin layer 9 and the adhesive was cured at 65 ° C. × 12 hours. Further, ultrasonic cleaning was performed for 3 minutes using ethyl alcohol at 20 ° C. for 3 minutes in an ultrasonic cleaning device having an oscillation frequency of 45 KHz and a high frequency output of 80 W to remove dust such as cutting debris from the chipping portion of the rutile ridge line generated during cutting. However, scars were hardly generated by the cleaning operation, the adhesive on the side adhesive layer remained thinly, and no permeation of ethyl alcohol into the adhesive layer was observed. Thereafter, as shown in FIG. 7, a magnet 71 was bonded and fixed to the center of the optical element 10 to measure the characteristics, and a final inspection was performed. As a result, the isolation was 35.7 dB and the insertion loss was 0.35 dB (at 25.5 ° C.). Normal characteristics were obtained, and a good product was also produced in appearance. As a result of manufacturing 10 lots by the above-described method, a high yield of 90% with an average yield of 5% was obtained with a defect rate of 5% and other defect rates of 5%. The work time per unit was greatly reduced, and the efficiency was greatly improved to about 10 seconds / unit.

(比較例) 切断直後の光学素子8の清浄作業に超音波洗浄を用い
ず、1個1個綿棒とエチルアルコールで洗浄し、その他
は、実施例と同様に10ロット製造したところ、きずによ
る不良率が50%、その他の不良率が5%で平均歩留りが
45%と低い歩留りになり、又、切断後のクリーニング作
業時間も1個当たり約3分と非常に作業性、能率が悪か
った。
(Comparative Example) The cleaning of the optical element 8 immediately after cutting was not performed using ultrasonic cleaning, but was performed using a cotton swab and ethyl alcohol one by one. Rate is 50%, other defective rate is 5% and average yield is
The yield was as low as 45%, and the cleaning work time after cutting was about 3 minutes per piece, which was extremely poor in workability and efficiency.

(比較例2) 切断直後の光学素子8の接着層を切断上がりのままの
状態で実施例と同じ条件の超音波洗浄により光学素子を
清浄にして組み立てたところ全体の90%は接着部より剥
離したり、接着部の汚れにより使用することができなか
った。又、残りの10%の良品についても信頼性が低く、
実用できない状態であった。
(Comparative Example 2) When the optical element 8 immediately after cutting was assembled by cleaning the optical element by ultrasonic cleaning under the same conditions as in the example with the adhesive layer of the optical element 8 kept cut, 90% of the whole was peeled off from the adhesive part And could not be used due to dirt on the bonded part. Also, the reliability of the remaining 10% of non-defective products is low,
It was in a state where it could not be used.

ハ.発明の効果 〔発明の効果〕 以上述べたように本発明によれば、光アイソレータの
製造方法において、切断後の素子の清浄作業を、接着層
を熱硬化型樹脂で保護した上で超音波洗浄することによ
り、接着剤を劣化させず、しかも精密に行えるためきず
の発生がほとんどなく歩留りが大幅に向上し、又、短時
間での作業が可能となり、能率も大きく向上し、コスト
ダウンにもつながった。
C. Effects of the Invention As described above, according to the present invention, in the method for manufacturing an optical isolator, cleaning of the element after cutting is performed by ultrasonic cleaning after protecting the adhesive layer with a thermosetting resin. By doing so, the adhesive is not degraded, and it can be performed precisely, so there is almost no scratching, yield is greatly improved, work in a short time is possible, efficiency is greatly improved, and cost reduction is also achieved. connected.

【図面の簡単な説明】[Brief description of the drawings]

第1図は、本発明の実施例の光アイソレータの主な製造
工程を示した図。 第2図は、本発明の実施例に用いる光学素子用の接着体
の製造過程を説明する説明図。 第3図は、第2図に示す光学素子用接着体の光学軸合わ
せを説明する説明図。 第4図は、光学素子用の接着体の切断状態を示す外観斜
視図。 第5図は、切断直後の光学素子を示す外観斜視図。 第6図は、第5図の切断直後の光学素子の接着層を覆う
ように樹脂層で保護した光学素子の斜視図。 第7図は、洗浄された光学素子に磁界素子としてのマグ
ネットの組付けを説明する説明図。 1……偏光子、2……ファラデー回転子、3……検光
子、4……軸合わせ用マグネット、5……レーザダイオ
ード(LD)光源、6……ITVカメラ、7,71……マグネッ
ト、8……光学素子、9……樹脂層、10……接着体、11
(接着された)偏光子、12……(接着された)検光子。
FIG. 1 is a view showing main manufacturing steps of an optical isolator according to an embodiment of the present invention. FIG. 2 is an explanatory view for explaining a manufacturing process of an adhesive for an optical element used in an embodiment of the present invention. FIG. 3 is an explanatory view for explaining optical axis alignment of the optical element bonding body shown in FIG. 2; FIG. 4 is an external perspective view showing a cut state of an adhesive for an optical element. FIG. 5 is an external perspective view showing the optical element immediately after cutting. FIG. 6 is a perspective view of the optical element protected with a resin layer so as to cover the adhesive layer of the optical element immediately after cutting in FIG. FIG. 7 is an explanatory view for explaining assembly of a magnet as a magnetic field element to the cleaned optical element. 1 ... polarizer, 2 ... Faraday rotator, 3 ... analyzer, 4 ... magnet for alignment, 5 ... laser diode (LD) light source, 6 ... ITV camera, 7,71 ... magnet, 8 ... optical element, 9 ... resin layer, 10 ... adhesive, 11
Polarizers (glued), 12 ... analyzers (glued).

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】光の偏波面を45度回転させるファラデー回
転子の両面に、偏光子と検光子を熱硬化型光学用接着剤
を用いて接着固定後、前記接着体を所望の大きさの素子
に切断して光学素子とし、該光学素子の周りに光の入射
方向と同一方向に磁場がかかるように、磁界発生素子を
配置固定して成る光アイソレータの製造工程において、
上記光学素子として、ファラデー回転子、偏光子及び検
光子の接着体を切断した直後の光学素子の側面接着部分
を樹脂層で覆い保護した上で、超音波洗浄法によって洗
浄した光学素子を用いることを特徴とした光アイソレー
タの製造方法。
1. A thermosetting optical adhesive is used to bond and fix a polarizer and an analyzer to both sides of a Faraday rotator for rotating the plane of polarization of light by 45 degrees. In the manufacturing process of an optical isolator in which a magnetic field generating element is arranged and fixed so that a magnetic field is applied in the same direction as the incident direction of light around the optical element by cutting the element into an optical element,
As the above-mentioned optical element, an optical element cleaned by an ultrasonic cleaning method after covering and protecting the side surface adhesive portion of the optical element immediately after cutting the bonded body of the Faraday rotator, the polarizer and the analyzer with a resin layer is used. The manufacturing method of the optical isolator characterized by the above.
JP4365790A 1990-02-22 1990-02-22 Manufacturing method of optical isolator Expired - Fee Related JP2849655B2 (en)

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US5808793A (en) * 1996-01-17 1998-09-15 Hewlett-Packard Company Low-cost compact optical isolators
US6043933A (en) * 1997-11-21 2000-03-28 Hewlett-Packard Company Split optical element and a low cost fabrication approach

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