JP2843314B2 - Fluorine-containing polyimide optical material - Google Patents

Fluorine-containing polyimide optical material

Info

Publication number
JP2843314B2
JP2843314B2 JP6391297A JP6391297A JP2843314B2 JP 2843314 B2 JP2843314 B2 JP 2843314B2 JP 6391297 A JP6391297 A JP 6391297A JP 6391297 A JP6391297 A JP 6391297A JP 2843314 B2 JP2843314 B2 JP 2843314B2
Authority
JP
Japan
Prior art keywords
fluorine
low
polyimide
formula
thermal expansion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP6391297A
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Japanese (ja)
Other versions
JPH09227680A (en
Inventor
松浦  徹
真樹 石沢
良紀 蓮田
史郎 西
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Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
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Priority to JP6391297A priority Critical patent/JP2843314B2/en
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Application granted granted Critical
Publication of JP2843314B2 publication Critical patent/JP2843314B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は電子部品や光部品の
ための、低誘電率及び低屈折率を有し、かつ熱膨張率の
小さい含フッ素ポリイミド光学材料に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a fluorine-containing polyimide optical material having a low dielectric constant and a low refractive index and a small coefficient of thermal expansion for electronic parts and optical parts.

【0002】[0002]

【従来の技術】ポリイミドは種々の有機ポリマーの中で
耐熱性に優れているため、宇宙、航空分野から電子通信
分野まで幅広く使われ始めている。特に最近では、単に
耐熱性に優れているだけでなく、用途に応じて種々の性
能を合せ持つことが期待されている。例えばプリント板
や、LSI用の層間絶縁膜用材料には、低熱膨張係数、
低誘電率であることが期待されている。また、光通信関
係特に光導波路のクラッド材には屈折率が小さいことが
期待され、特にシリコン基板等の低熱膨張率基板上に作
製する光部品等では低屈折率、低熱膨張率であることが
期待されている。更に、安定な物性値を保つには、吸水
率の小さなことが必要である。しかしながら、これらの
性能に充分満足のいくポリイミドは得られていない。こ
れらのポリイミドを得るためには、ポリイミドの主鎖を
できる限り剛直構造にして低熱膨張性を発現させ、更に
モノマーであるテトラカルボン酸二無水物又はジアミン
に低誘電率性、低屈折率性を発現する置換基を導入する
方法が考えられる。例えばエポキシ樹脂においては、ジ
ャーナル オブ ポリマー サイエンス(Journal ofPo
lymer Science) のパート(Part)C、ポリマー レター
ズ(Polymer Letters)、第24巻、第249頁(198
6)に示されているようにエポキシ樹脂の硬化剤に多フ
ッ素置換基を導入することにより、これまでのエポキシ
樹脂の中で最も低い誘電率を達成している。また特開昭
61−44969号公報で示されているように、屈折率
においても多フッ素置換基を導入することにより、これ
までのエポキシ樹脂の中で最も低い屈折率を達成してい
る。このようにポリイミド骨格を剛直構造にし、フッ素
置換基を導入することにより、熱膨張係数、誘電率、屈
折率の低減が期待できる。本発明の含フッ素ポリイミド
光学材料に用いる含フッ素ポリイミドの製造方法は、特
公平2−14365号(特開昭59−189122号)
公報において低吸湿かつ耐熱性を有する含フッ素ポリイ
ミドの製造方法として概括的に記載されているが、本発
明に用いる含フッ素ポリイミド、及びその熱膨張率、誘
電率、及び屈折率については全く触れられていない。ま
た、特開昭60−221427号、同61−60725
号、同61−176196号、同62−127827
号、及び同62−280257号各公報には、含フッ素
ポリイミドが低熱膨張率であるために、低熱膨張樹脂材
料、金属との複合体、モジュール用配線基板、液晶配向
性膜用組成物、及び低粘度ワニスとして適していること
が記載されているが、電子部品用絶縁材料として重要な
誘電率、及び光部品用材料として重要な屈折率について
は全く触れられていない。
2. Description of the Related Art Polyimide is one of various organic polymers having excellent heat resistance, and thus has begun to be widely used in the fields of space and aviation to the field of electronic communication. In particular, recently, it is expected that not only excellent heat resistance but also various performances may be obtained depending on applications. For example, printed boards and materials for interlayer insulating films for LSIs have low thermal expansion coefficients,
It is expected to have a low dielectric constant. In addition, it is expected that the cladding material of an optical waveguide has a low refractive index, especially for optical communication, and that the optical component and the like manufactured on a low thermal expansion substrate such as a silicon substrate have a low refractive index and a low thermal expansion coefficient. Expected. Furthermore, in order to maintain stable physical property values, it is necessary that the water absorption is small. However, polyimides which are sufficiently satisfactory in these properties have not been obtained. In order to obtain these polyimides, the main chain of the polyimide is made as rigid as possible to exhibit low thermal expansion, and furthermore, the tetracarboxylic dianhydride or diamine as a monomer has a low dielectric constant and a low refractive index. A method of introducing a substituent to be expressed can be considered. For example, in the case of epoxy resins, the Journal of Polymer Science
lymer Science), Part C, Polymer Letters, Vol. 24, p. 249 (198
As shown in 6), the introduction of a polyfluorine substituent into the curing agent of the epoxy resin achieves the lowest dielectric constant among the epoxy resins to date. In addition, as shown in JP-A-61-44969, the introduction of a polyfluorinated substituent also achieves the lowest refractive index among epoxy resins so far. By forming the polyimide skeleton into a rigid structure and introducing a fluorine substituent in this manner, a reduction in the coefficient of thermal expansion, dielectric constant, and refractive index can be expected. The method for producing a fluorinated polyimide used for the fluorinated polyimide optical material of the present invention is described in Japanese Patent Publication No. 2-14365 (JP-A-59-189122).
Although generally described as a method for producing a fluorine-containing polyimide having low moisture absorption and heat resistance in the gazette, the fluorine-containing polyimide used in the present invention, and its coefficient of thermal expansion, dielectric constant, and refractive index are completely mentioned. Not. Also, Japanese Patent Application Laid-Open Nos. Sho 60-221427 and 61-60725.
Nos. 61-176196 and 62-127827
JP-A-62-280257 discloses a low thermal expansion resin, a composite with a metal, a wiring board for a module, a composition for a liquid crystal alignment film, Although it is described that it is suitable as a low-viscosity varnish, there is no mention of a dielectric constant important as an insulating material for electronic components and a refractive index important as a material for optical components.

【0003】[0003]

【発明が解決しようとする課題】本発明の目的は、含フ
ッ素ポリイミドを光部品のための低熱膨張率及び低屈折
率を有する光学材料として提供することにある。
SUMMARY OF THE INVENTION An object of the present invention is to provide a fluorine-containing polyimide as an optical material having a low coefficient of thermal expansion and a low refractive index for an optical component.

【0004】[0004]

【課題を解決するための手段】本発明を概説すれば、本
発明は含フッ素ポリイミド光学材料に関する発明であっ
て、下記構造式(化1):
In summary, the present invention relates to a fluorine-containing polyimide optical material, and has the following structural formula (Formula 1):

【0005】[0005]

【化1】 Embedded image

【0006】で表される繰り返し単位からなることを特
徴とする。
It is characterized by comprising a repeating unit represented by

【0007】本発明者らは、含フッ素化ポリイミドの分
子構造について種々検討し、下記式(化2)に示す特定
のジアミンと、下記式(化3)に示す特定の酸二無水物
を用いたポリイミドが低誘電率及び低屈折率を有しなが
ら更に低熱膨張性を有していることを明らかにした。
The present inventors have conducted various studies on the molecular structure of a fluorinated polyimide, and used a specific diamine represented by the following formula (Formula 2) and a specific acid dianhydride represented by the following formula (Formula 3). It was revealed that the polyimide had a low dielectric constant and a low refractive index, but also had a low thermal expansion property.

【0008】[0008]

【発明の実施の形態】以下、本発明を具体的に説明す
る。本発明において低誘電率及び低屈折率を有する含フ
ッ素ポリイミド光学材料に用いる含フッ素ポリイミドは
ジアミンとして下記構造式(化2):
BEST MODE FOR CARRYING OUT THE INVENTION The present invention will be specifically described below. In the present invention, the fluorinated polyimide used for the fluorinated polyimide optical material having a low dielectric constant and a low refractive index is a diamine having the following structural formula (Formula 2):

【0009】[0009]

【化2】 Embedded image

【0010】で表される2,2′−ビス(トリフルオロ
メチル)−4,4′−ジアミノビフェニルを用い、また
テトラカルボン酸二無水物としては下記構造式(化
3):
2,2'-bis (trifluoromethyl) -4,4'-diaminobiphenyl represented by the following formula, and tetracarboxylic dianhydride is represented by the following structural formula (Formula 3):

【0011】[0011]

【化3】 Embedded image

【0012】で表されるピロメリット酸二無水物を用い
て製造できる。ここで2,2′−ビス(トリフルオロメ
チル)−4,4′−ジアミノビフェニルの製造方法は、
例えば日本化学会誌、第3号、第675〜676頁(1
972)に記載されている。これらのジアミンとテトラ
カルボン酸二無水物を反応させることによりポリアミッ
ク酸を製造する。反応条件は通常のポリアミック酸の重
合条件と同じでよく、一般的にはN−メチル−2−ピロ
リドン、N,N−ジメチルアセトアミド、N,N−ジメ
チルホルムアミドなどの極性有機溶媒中で反応させる。
次に得られたポリアミック酸のイミド化によるポリイミ
ドの合成であるが、これも通常のポリイミドの合成法が
使用できる。これらのジアミンとテトラカルボン酸二無
水物を反応させて得られる含フッ素ポリイミドは低熱膨
張性を示すためにプリント板やLSIの層間絶縁膜等の
電子部品用材料やシリコン基板等の低熱膨張率基板上に
作製される光部品用材料として非常に優れている。ま
た、これらの含フッ素ポリイミドはフッ素を含むために
低誘電率を示すことからも、電子部品用絶縁材料として
好適である。
It can be produced using pyromellitic dianhydride represented by the formula: Here, the method for producing 2,2'-bis (trifluoromethyl) -4,4'-diaminobiphenyl is as follows.
For example, The Chemical Society of Japan, No. 3, pp. 675-676 (1
972). A polyamic acid is produced by reacting these diamines with tetracarboxylic dianhydride. The reaction conditions may be the same as those for ordinary polymerization of polyamic acid, and the reaction is generally carried out in a polar organic solvent such as N-methyl-2-pyrrolidone, N, N-dimethylacetamide, N, N-dimethylformamide.
Next, a polyimide is synthesized by imidization of the obtained polyamic acid, and a usual method of synthesizing a polyimide can also be used. Fluorine-containing polyimides obtained by reacting these diamines and tetracarboxylic dianhydrides have low thermal expansion properties, so they have low thermal expansion properties and are used for electronic components such as printed boards and LSI interlayer insulating films and low thermal expansion substrates such as silicon substrates. It is very excellent as a material for optical components produced on the above. In addition, since these fluorine-containing polyimides have a low dielectric constant because of containing fluorine, they are suitable as insulating materials for electronic components.

【0013】更に本発明の含フッ素ポリイミド光学材料
に用いる含フッ素ポリイミドは、特公平2−14365
号公報の含フッ素ポリイミドの製造方法により製造した
ポリイミドの特性として記載されている優れた耐湿性と
耐熱性を有していることに加えて、電子部品用材料やシ
リコン基板等の低熱膨張率基板上に作製される光部品用
材料として要求される低熱膨張性、低誘電性、及び低屈
折率性を有し、また特開昭61−176196号、及び
同62−280257号各公報のモジュール用配線基
板、及び低粘度ワニスに用いられるポリイミドとして記
載されている体熱膨張性に加えて、低誘電性、及び低屈
折率性を有している。
Further, the fluorinated polyimide used for the fluorinated polyimide optical material of the present invention is disclosed in Japanese Patent Publication No. 2-14365.
In addition to having excellent moisture resistance and heat resistance described as characteristics of the polyimide produced by the method for producing a fluorinated polyimide disclosed in Japanese Patent Application Publication No. It has low thermal expansion, low dielectric properties, and low refractive index required as a material for optical components fabricated thereon, and is used for modules disclosed in JP-A-61-176196 and JP-A-62-280257. It has low dielectric properties and low refractive index, in addition to body thermal expansion described as polyimide used for wiring boards and low-viscosity varnishes.

【0014】また、本発明の低誘電率及び低屈折率を有
する含フッ素ポリイミド光学材料である含フッ素ポリイ
ミドは、特公平2−14365号公報に記載の含フッ素
ポリイミドの製造方法により製造できる一連の含フッ素
ポリイミドや特開昭61−176196号、及び同62
−280257号各公報に記載のモジュール用配線基
板、及び低粘度ワニスに用いられる具体的に記載された
ポリイミドとは異なり、特にフィルム成形性に優れ、機
械的強度が大きいために実用的な低熱膨張材料としても
優れている。例えば特公平2−14365号公報には、
下記の構造式(化4):
The fluorine-containing polyimide of the present invention, which is a fluorine-containing polyimide optical material having a low dielectric constant and a low refractive index, is a series of fluorine-containing polyimides that can be manufactured by the method for manufacturing a fluorine-containing polyimide described in Japanese Patent Publication No. 2-14365. Fluorine-containing polyimides and JP-A Nos. 61-176196 and 62
-280257 Unlike the specifically described polyimide used for the module wiring board described in each publication and the low-viscosity varnish, it is particularly excellent in film formability and has high mechanical strength, so that it has a practical low thermal expansion. Excellent as a material. For example, in Japanese Patent Publication No. 2-14365,
The following structural formula (Formula 4):

【0015】[0015]

【化4】 Embedded image

【0016】を有する3,3′−ビス(トリフルオロメ
チル)−4,4′−ジアミノビフェニルから製造される
含フッ素ポリイミドが、本発明の低誘電率及び低屈折率
を有する含フッ素ポリイミド低熱膨張材料に用いる含フ
ッ素ポリイミドと同様に、耐湿性、耐熱性に優れた含フ
ッ素ポリイミドとして製造できることが記載されてい
る。同様に特開昭61−176196号、同62−28
0257号各公報にも式(化4)に示す材料を用いた低
熱膨張率ポリイミドがモジュール用配線基板、及び低粘
度ワニスとして適していることが記載されている。しか
し、本発明者らが検討を行った結果、本発明の低誘電率
及び低屈折率を有する含フッ素ポリイミド光学材料に用
いる式(化2)から製造される含フッ素ポリイミドは、
上記式(化4)を用いて製造した含フッ素ポリイミドと
比較して、高い重合度と極めて優れたフィルム成形性を
示すことを明らかにした。これは本発明の低誘電率及び
低屈折率を有する含フッ素ポリイミド光学材料に用いる
含フッ素ポリイミドの原料である式(化2)が式(化
4)と比較してトリフルオロメチル基がアミノ基のメタ
位にあり、これによりジアミンと酸二無水物の反応性が
向上したためである。
The fluorine-containing polyimide produced from 3,3'-bis (trifluoromethyl) -4,4'-diaminobiphenyl having the low thermal expansion of the present invention has a low dielectric constant and a low refractive index. It describes that it can be produced as a fluorine-containing polyimide having excellent moisture resistance and heat resistance, similarly to the fluorine-containing polyimide used for the material. Similarly, JP-A-61-176196 and JP-A-62-28
No. 0257 also discloses that a polyimide having a low coefficient of thermal expansion using a material represented by the formula (Formula 4) is suitable as a module wiring board and a low-viscosity varnish. However, as a result of the study by the present inventors, the fluorine-containing polyimide produced from the formula (Formula 2) used for the fluorine-containing polyimide optical material having a low dielectric constant and a low refractive index of the present invention is
Compared with the fluorine-containing polyimide produced by using the above formula (Formula 4), it has been clarified that it exhibits a high degree of polymerization and extremely excellent film moldability. This is because the formula (2), which is a raw material of the fluorine-containing polyimide used for the fluorine-containing polyimide optical material having a low dielectric constant and a low refractive index of the present invention, has an amino group of trifluoromethyl group as compared with the formula (4). This is because the reactivity between the diamine and the acid dianhydride was improved by this.

【0017】[0017]

【実施例】以下、実施例により本発明の含フッ素ポリイ
ミド低熱膨張材料について更に具体的に説明する。イミ
ド化の確認は赤外吸収スペクトルにおけるカルボニル基
の対称及び非対称伸縮振動による特性吸収から行った。
また、下記各例中、熱膨張率は下記の条件で熱処理した
フィルムを熱機械試験機に取付けて5℃/分の昇温速度
で求めた。誘電率は1kHzでの値であり、屈折率はナ
トリウムD線の波長(589.3nm)での値(20
℃)である。熱分解温度、ガラス転移温度は窒素気流下
10℃/分の昇温速度で測定した。
EXAMPLES Hereinafter, the fluorine-containing polyimide low thermal expansion material of the present invention will be described more specifically with reference to examples. The imidation was confirmed from the characteristic absorption by symmetric and asymmetric stretching vibration of the carbonyl group in the infrared absorption spectrum.
In each of the following examples, the coefficient of thermal expansion was determined at a heating rate of 5 ° C./min by attaching a film heat-treated under the following conditions to a thermomechanical tester. The dielectric constant is a value at 1 kHz, and the refractive index is a value (20 μm) at the wavelength of sodium D line (589.3 nm).
° C). The thermal decomposition temperature and the glass transition temperature were measured at a heating rate of 10 ° C./min under a nitrogen stream.

【0018】実施例1 三角フラスコに、式(化3)で示されるピロメリット酸
二無水物4.36g(20.0mmol)と、式(化
2)で示される2,2′−ビス(トリフルオロメチル)
−4,4′−ジアミノビフェニル6.40g(20.0
mmol)、及びN,N−ジメチルアセトアミド(DM
A)100gを加えた。この混合物を窒素雰囲気下、室
温で3日間かくはんし、ポリアミック酸のDMA溶液を
得た。この溶液の粘度は約80ポアズであった。このも
のをアルミ板上にスピンコーティングし、窒素雰囲気下
で70℃で2時間、160℃で1時間、250℃で30
分、更に350℃で1時間で加熱キュアした。このアル
ミ板を10%HCl水溶液に浸し、アルミ板を溶解して
ポリイミドフィルムが得られた。この赤外吸収スペクト
ルを測定するとイミド基に特有の吸収が1740及び1
790cm-1に現れ、イミド化が完全に進行したことが
確認できた。このものの熱分解温度は610℃、ガラス
転移温度は365℃、熱膨張係数は3.3×10-6(℃
-1) 、誘電率は3.2、屈折率は1.65であった。
Example 1 In an Erlenmeyer flask, 4.36 g (20.0 mmol) of pyromellitic dianhydride represented by the formula (Chemical Formula 3) and 2,2'-bis (tri Fluoromethyl)
6.40 g of -4,4'-diaminobiphenyl (20.0
mmol) and N, N-dimethylacetamide (DM
A) 100 g were added. This mixture was stirred under a nitrogen atmosphere at room temperature for 3 days to obtain a DMA solution of polyamic acid. The viscosity of this solution was about 80 poise. This was spin-coated on an aluminum plate, and heated at 70 ° C for 2 hours, 160 ° C for 1 hour, and 250 ° C for 30 hours in a nitrogen atmosphere.
And then cured at 350 ° C. for 1 hour. This aluminum plate was immersed in a 10% HCl aqueous solution, and the aluminum plate was dissolved to obtain a polyimide film. When this infrared absorption spectrum was measured, the absorption specific to the imide group was 1740 and 1
It appeared at 790 cm -1 , confirming that the imidization had completely progressed. It has a thermal decomposition temperature of 610 ° C., a glass transition temperature of 365 ° C., and a thermal expansion coefficient of 3.3 × 10 −6 (° C.).
-1 ), the dielectric constant was 3.2, and the refractive index was 1.65.

【0019】比較例1 実施例1と同様の方法を用いて3,3′,4,4′−ビ
フェニルテトラカルボン酸二無水物と以下の構造式(化
5)で示される4,4′−ジアミノジフェニルエーテ
ル:
Comparative Example 1 Using the same method as in Example 1, 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride and 4,4'-formula represented by the following structural formula (Formula 5) Diaminodiphenyl ether:

【0020】[0020]

【化5】 Embedded image

【0021】を等モルずつ用いて市販ポリイミド(商品
名 ユーピレックス)と同等のポリイミドフィルムを得
た。このものの特性を、後記表1に他の例と共に示す。
Using an equimolar amount of each, a polyimide film equivalent to a commercially available polyimide (trade name: Upilex) was obtained. The properties of this are shown in Table 1 below together with other examples.

【0022】比較例2 実施例1と同様の方法を用いて3,3′,4,4′−ベ
ンゾフェノンテトラカルボン酸二無水物と4,4′−ジ
アミノジフェニルエーテルを等モルずつ用いてポリイミ
ドを得た。このものの特性を表1に示す。
Comparative Example 2 Using the same method as in Example 1, a polyimide was obtained by using equimolar amounts of 3,3 ', 4,4'-benzophenonetetracarboxylic dianhydride and 4,4'-diaminodiphenyl ether. Was. The characteristics of this are shown in Table 1.

【0023】比較例3 実施例1と同様の方法によりピロメリット酸二無水物
4.36g(20.0mmol)と既述の構造式(化
4)で示される3,3′−ビス(トリフルオロメチル)
−4,4′−ジアミノビフェニル6.40g(20.0
mmol)を用いてポリアミック酸のDMA溶液を得
た。このものの粘度は低く、また加熱キュア後のポリイ
ミドは機械的強度が著しく小さかった。そのため、熱膨
張率、及び誘電率の測定は不可能であった。
COMPARATIVE EXAMPLE 3 By the same method as in Example 1, 4.36 g (20.0 mmol) of pyromellitic dianhydride were added to 3,3'-bis (trifluoro) represented by the aforementioned structural formula (Formula 4). Methyl)
6.40 g of -4,4'-diaminobiphenyl (20.0
mmol) to obtain a DMA solution of polyamic acid. It had a low viscosity, and the cured polyimide had extremely low mechanical strength. Therefore, it was impossible to measure the coefficient of thermal expansion and the permittivity.

【0024】比較例4 比較例3におけるピロメリット酸二無水物を以下の構造
式(化6)で示される2,2−ビス(3,4−ジカルボ
キシフェニル)ヘキサフルオロプロパン酸二無水物:
Comparative Example 4 The pyromellitic dianhydride in Comparative Example 3 was replaced with 2,2-bis (3,4-dicarboxyphenyl) hexafluoropropanoic dianhydride represented by the following structural formula (Formula 6):

【0025】[0025]

【化6】 Embedded image

【0026】8.88g(20.0mmol)に置き換
えて、比較例3と同様に行った。ポリアミック酸のDM
A溶液の粘度は低く、また加熱キュア後のポリイミドは
機械的強度が著しく小さかった。そのため、熱膨張率、
及び誘電率の測定は不可能であった。
The same operation as in Comparative Example 3 was performed, except that 8.88 g (20.0 mmol) was used. DM of polyamic acid
Solution A had a low viscosity, and the polyimide after heat curing had extremely low mechanical strength. Therefore, the coefficient of thermal expansion,
And measurement of the dielectric constant was not possible.

【0027】[0027]

【表1】 [Table 1]

【0028】これらの結果から、本発明の含フッ素ポリ
イミド光学材料は、従来の耐熱性に優れたポリイミドや
耐湿性、及び耐熱性に優れた含フッ素ポリイミドを用い
た材料と比較して、更に低熱膨張率、低屈折率及び低誘
電率という特性を合せ持つことが明らかとなった。
From these results, the fluorinated polyimide optical material of the present invention has a lower heat resistance than conventional polyimides having excellent heat resistance and fluorinated polyimides having excellent moisture resistance and heat resistance. It has been found that they have the characteristics of expansion coefficient, low refractive index and low dielectric constant.

【0029】[0029]

【発明の効果】以上説明したように、本発明の含フッ素
ポリイミド光学材料は、従来の耐熱性に優れたポリイミ
ドや耐湿性、及び耐熱性に優れた含フッ素ポリイミドを
用いた材料と比較して、更に低熱膨張率、及び低誘電
率、低屈折率を合せ持つという利点があるため、低熱膨
張率基板上の光部品等への適用が可能である。
As described above, the fluorine-containing polyimide optical material of the present invention is compared with a conventional polyimide having excellent heat resistance and a material using fluorine-containing polyimide having excellent heat resistance and heat resistance. Further, since it has an advantage of having a low coefficient of thermal expansion, a low dielectric constant, and a low refractive index, it can be applied to optical components and the like on a substrate having a low coefficient of thermal expansion.

───────────────────────────────────────────────────── フロントページの続き (31)優先権主張番号 特願平1−116085 (32)優先日 平1(1989)5月11日 (33)優先権主張国 日本(JP) (72)発明者 西 史郎 東京都新宿区西新宿三丁目19番2号 日 本電信電話株式会社内 (56)参考文献 特開 昭62−280257(JP,A) 特開 昭62−127827(JP,A) 特開 昭61−60725(JP,A) 特開 昭60−221427(JP,A) 特開 昭59−189122(JP,A) (58)調査した分野(Int.Cl.6,DB名) C08G 73/10 G02B 1/04 CAS ONLINE──────────────────────────────────────────────────続 き Continued on the front page (31) Priority claim number Japanese Patent Application No. 1-116085 (32) Priority date Hei 1 (1989) May 11 (33) Priority claim country Japan (JP) (72) Inventor Shiro Nishi 3-19-2 Nishi Shinjuku, Shinjuku-ku, Tokyo Nihon Telegraph and Telephone Corporation 61-60725 (JP, A) JP-A-60-221427 (JP, A) JP-A-59-189122 (JP, A) (58) Fields investigated (Int. Cl. 6 , DB name) C08G 73 / 10 G02B 1/04 CAS ONLINE

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 下記構造式(化1): 【化1】 で表され繰り返し単位からなることを特徴とする含フッ
素ポリイミド光学材料。
1. The following structural formula (Formula 1): A fluorine-containing polyimide optical material comprising a repeating unit represented by the formula:
JP6391297A 1988-08-08 1997-03-04 Fluorine-containing polyimide optical material Expired - Lifetime JP2843314B2 (en)

Priority Applications (1)

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Applications Claiming Priority (9)

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JP19602288 1988-08-08
JP7049589 1989-03-24
JP8160489 1989-04-03
JP1-70495 1989-05-11
JP11608589 1989-05-11
JP63-196022 1989-05-11
JP1-116085 1989-05-11
JP1-81604 1989-05-11
JP6391297A JP2843314B2 (en) 1988-08-08 1997-03-04 Fluorine-containing polyimide optical material

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