JP2826729B2 - Method for forming irregularities and transfer sheet used in the method - Google Patents

Method for forming irregularities and transfer sheet used in the method

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Publication number
JP2826729B2
JP2826729B2 JP62332781A JP33278187A JP2826729B2 JP 2826729 B2 JP2826729 B2 JP 2826729B2 JP 62332781 A JP62332781 A JP 62332781A JP 33278187 A JP33278187 A JP 33278187A JP 2826729 B2 JP2826729 B2 JP 2826729B2
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JP
Japan
Prior art keywords
substrate
pattern
ultraviolet
forming
concavo
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JP62332781A
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Japanese (ja)
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JPH01171998A (en
Inventor
逸雄 板倉
宏 田中
英夫 後藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
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Dai Nippon Printing Co Ltd
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Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は凹凸模様の形成方法及び該方法に使用される
転写シートに関する。 〔従来の技術及び発明が解決しようとする問題点〕 従来、平滑な表面に設けた絵柄に立体感を持たせるた
めに、模様自体に厚みを持たせることが行われている
が、模様に厚みを持たせるためには特殊な印刷方法を必
要とする上、シャープな盛り上がりを形成することが困
難であり、美麗な立体模様を容易に形成できないという
問題があった。 〔問題点を解決するための手段〕 本発明は上記従来技術の欠点を解決するためになされ
たもので、シャープな立体模様を容易に形成することの
できる凹凸模様の形成方法及び該方法に使用される転写
シートを提供することを目的とする。 即ち本発明は、 (1)下記(a)〜(f)の工程を順に行うことを特徴
とする凹凸模様の形成方法。 (a)表面が硬化した電離放射線硬化性樹脂に対して剥
離性を有する電離放射線透過性剥離基材及び凹凸模様形
成用基材を用意し、電離放射線透過性剥離基材の表裏い
ずれかの面或いは凹凸模様形成用基材の表面に電離放射
線を吸収する物質を含有するインキを用いて電離放射線
遮蔽性柄模様を設ける工程。 (b)上記柄模様の設けられた剥離基材或いは凹凸模様
形成用基材或いは剥離基材と凹凸模様形成用基材の両方
の、剥離基材と凹凸模様形成用基材とが対向する面に電
離放射線硬化性樹脂層を一面コートする工程。 (c)凹凸模様形成用基材と剥離基材とを、電離放射線
硬化性樹脂層を介して重ね合わせる工程。 (d)電離放射線を剥離基材側又は凹凸模様形成用基材
側から照射して柄模様のない部分に相当する電離放射線
硬化性樹脂層を硬化させる工程。 (e)剥離基材を剥がして電離放射線硬化性樹脂層の未
硬化の樹脂の一部を剥離基材、又は柄模様に付着させて
剥離基材とともに除去する工程。 (f)被転写基材の凹凸面上に溶剤を塗布した後、ブラ
シ或いは綿のバフィングローラーを使用してバフ研磨を
行って、残った未硬化の電離放射線硬化性樹脂層を、除
去する工程。 (2)下記(a)〜(f)の工程を順に行うことを特徴
とする凹凸模様の形成方法。 (a)表面が硬化した紫外線硬化性樹脂に対して剥離性
を有する紫外線透過性剥離基材及び凹凸模様形成用基材
を用意し、紫外線透過性剥離基材の表裏いずれかの面或
いは凹凸模様形成用基材の表面に、ベンゾフェノール
系、サリチレート系、ベンゾトリアゾール系又はアクリ
ロニトリル系の紫外線吸収剤、金属錯塩系又はヒンダー
ドアミン系のクエンチャーのいずれかから選ばれた紫外
線を吸収する物質を含有するインキを用いて柄模様を設
ける工程。 (b)上記柄模様の設けられた剥離基材或いは凹凸模様
形成用基材或いは剥離基材と凹凸模様形成用基材の両方
の、剥離基材と凹凸模様形成用基材とが対向する面に紫
外線硬化性樹脂層を一面コートする工程。 (c)凹凸模様形成用基材と剥離基材とを、紫外線硬化
性樹脂層を介して重ね合わせる工程。 (d)紫外線を剥離基材側又は凹凸模様形成用基材側か
ら照射して柄模様のない部分に相当する紫外線硬化性樹
脂層を硬化させる工程。 (e)剥離基材を剥がして紫外線硬化性樹脂層の未硬化
の樹脂の一部を剥離基材、又は柄模様に付着させて剥離
基材とともに除去する工程。 (3)剥離基材を剥離した後、更に電離放射線を照射し
て被転写基材上に残った未硬化の紫外線硬化性樹脂を硬
化させる特許請求の範囲第2項記載の凹凸模様の形成方
法。 (4)凹凸表面に、必要に応じて表面保護層を形成する
特許請求の範囲第2項又は第3項に記載の凹凸模様の形
成方法。 (5)表面が剥離性を有する紫外線透過性剥離基材の表
裏いずれかの面に、ベンゾフェノール系、サリチレート
系、ベンゾトリアゾール系又はアクリロニトリル系の紫
外線吸収剤、金属錯塩系又はヒンダードアミン系のクエ
ンチャーのいずれかから選ばれた紫外線を吸収する物質
を含有するインキを用いて形成された、転写されない柄
模様を設けてなることを特徴とする以下の工程の凹凸模
様の形成方法に使用する転写シート。 下記(a)〜(e)の工程を順に行うことを特徴とする
凹凸模様の形成方法。 (a)表面が硬化した紫外線硬化性樹脂に対して剥離性
を有する紫外線透過性剥離基材及び凹凸模様形成用基材
を用意し、紫外線透過性剥離基材の表裏いずれかの面或
いは凹凸模様形成用基材の表面に、ベンゾフェノール
系、サリチレート系、ベンゾトリアゾール系又はアクリ
ロニトリル系の紫外線吸収剤、金属錯塩系又はヒンダー
ドアミン系のクエンチャーのいずれかから選ばれた紫外
線を吸収する物質を含有するインキを用いて柄模様を設
ける工程。 (b)上記柄模様の設けられた剥離基材或いは凹凸模様
形成用基材或いは剥離基材と凹凸模様形成用基材の両方
の、剥離基材と凹凸模様形成用基材とが対向する面に紫
外線硬化性樹脂層を一面コートする工程。 (c)凹凸模様形成用基材と剥離基材とを、紫外線硬化
性樹脂層を介して重ね合わせる工程。 (d)紫外線を剥離基材側又は凹凸模様形成用基材側か
ら照射して柄模様のない部分に相当する紫外線硬化性樹
脂を硬化させる工程。 (e)剥離基材を剥がして紫外線硬化性樹脂層の未硬化
の樹脂の一部を剥離基材、又は柄模様に付着させて剥離
基材とともに除去する工程。 を要旨とするものである。 〔作用〕 本発明によれば、紫外線を吸収する物質を含有するイ
ンキを用いて形成された柄模様のある部分では、被転写
基材上の電離放射線硬化性樹脂が硬化せずに剥離基材の
剥離によって除去され、柄模様のない部分では電離放射
線硬化性樹脂が硬化して残り、この結果、凹凸模様形成
用基材上にシャープな凹凸模様が形成される。 〔実施例〕 以下、本発明の実施例を図面に基き説明する。 第1図には本発明方法に使用される本発明転写シート
1の一実施例が示されており、該シート1の表面に柄模
様3が設けられて構成されている。剥離基材2は電離放
射線透過性を有するシート又はフィルムよりなり、例え
ばポリエステル、ポリアミド(ナイロン等)、ポリプロ
ピレン、フッ素系樹脂のシート又はフィルム等が挙げら
れるが、紫外線透過性に影響のある顔料等を含まないも
のが好ましい。電離放射線が電子線の場合には、電子線
の透過性が高いのであまり制約がなく、上記したシート
又はフィルムは原則的に使用でき、更に紙等も使用でき
る。 剥離基材2の少なくとも電離放射線硬化性樹脂層と接
する側の表面は剥離性である必要があり、素材自体が剥
離性を有さない場合には剥離性の樹脂もしくは組成物を
塗布する等して表面剥離性として使用する。剥離基材2
の厚みは5〜200μm、特に25〜100μmが好ましい。 柄模様3は剥離基材上面側より電離放射線を照射した
際に電離放射線を遮蔽するためのもので、柄模様3を設
ける位置は第1図に示すように剥離基材2の下面側で
も、また特に図示しないが剥離基材2の上面側でもよ
く、剥離基材2に必要に応じて他の層を設けた場合に
は、剥離基材の上に設けられた層の上に設けてもよい。 柄模様3を形成する材料としては、紫外線を吸収する
物質、例えばベンゾフェノール系、サリチレート系、ベ
ンゾトリアゾール系、アクリロニトリル系等の紫外線吸
収剤、光吸収性の顔料、カーボンブラックまたは無機物
とともにクェンチャー(例えば金属錯塩系もしくはヒン
ダードアミン系等)を含有するインキ等が挙げられる。 柄模様3を形成するインキは上記の紫外線を吸収する
物質を1〜20重量%含むことが好ましい。該物質が1重
量%未満では電離放射線の吸収が満足に行えなず、その
結果得られる凹凸模様に目的とするシャープさが得られ
ない虞があり、又、20重量%を超えると基材2に対する
接着力が弱くなる虞がある。 柄模様3はこれらのインキを用いて通常の印刷法によ
り形成することができる。 上記転写シート1を第2図に示すように別に準備した
電離放射線硬化性樹脂層4を塗布して設けた凹凸模様形
成用基材5の電離放射線硬化性樹脂層4側に重ね合わて
密着させる(第3図)が、剥離基材2を枠に張って用い
ると、剥離基材2の繰り返し使用が可能となり好まし
い。 電離放射線硬化性樹脂層4は、剥離基材2と凹凸模様
形成用基材5との対向面に塗布して形成され、凹凸模様
形成用基材5に塗布して設ける場合の他、剥離基材2側
に塗布して設けても、凹凸模様形成用基材5と剥離基材
2の両方に塗布して設けてもよい。 凹凸模様形成用基材5としては、どのようなものでも
よいが、例えばステンレス鋼、鋼、アルミニウム、も
しくは銅等の金属の板または成形品、ガラス、大理
石、陶磁器、石膏ボード、石綿セメント板、珪酸カルシ
ウム板、GRC(ガラス繊維強化セメント)等の無機質の
板または成形品、ポリエステル、メラミン、ポリ塩化
ビニル、ジアリルフタレート等の有機ポリマーの板、成
形品、あるいはこれらのシート、フィルム、木、合
板、パーチクルボード等の木質の板または成形品、等が
例示される。 これら凹凸模様形成用基材5には目止め処理やプライ
マー処理等の下地処理、接着性向上のための処理等を行
ってもよい。 凹凸模様形成用基材5には必要により着色模様層6を
設けておくことができる。着色模様6のパターンは柄模
様3のパターンと同調するパターンに設けてもよいが、
必ずしも両者が同調するように形成する必要はない。着
色模様層6は通常のインキ、塗料等を用いて公知の印刷
法によって形成することができるが、着色模様自体を転
写したり着色模様を設けたシートを貼着したりして形成
することもできる。 着色模様層6は、通常凹凸模様形成用基材5の電離放
射線硬化性樹脂層4を設ける側(上面側)に設けるが、
凹凸模様形成用基材5が透明な材質よりなる場合には、
該基材5の下面側に設けることもできる。着色模様層6
は必要によって設ければよく、必ずしも設ける必要はな
い。また着色模様層6のかわりにベタに着色した着色層
を設けてもよく、更に電離放射線硬化性樹脂層4自体を
着色してもよい。電離放射線硬化性樹脂層4を着色する
場合、着色剤は電離放射線の透過を妨げないものを用い
ることが好ましい。ベタに着色した着色層を設けたり電
離放射線硬化性樹脂層4自体を着色した場合には、凹凸
模様の形成によって該模様と同調した色の濃淡模様の表
出が容易となる。 電離放射線硬化性樹脂層4は、構造中にラジカル重合
性の二重結合を有するポリマー、オリゴマー、モノマー
等を主成分とし、光重合開始剤や増感剤、そのほか必要
に応じて非反応性のポリマー、有機溶剤、ワックスその
他の添加剤を含有するもので、種々のグレードのものが
市場から容易に入手でき、本発明方法に使用できる。 電離放射線硬化性樹脂層4はグラビアコート、ロール
コート、フローコートもしくはスプレーコート等の公知
の方法により形成することができる。電離放射線硬化性
樹脂層4の厚さは3μm〜1mm、特に30〜200μmが好ま
しい。 剥離基材2と凹凸模様形成用基材5とを電離放射線硬
化性樹脂層4を介して重ね合わせて両者を密着させた
後、剥離基材2側より電離放射線7を照射する。 電離放射線7の代表的なものは紫外線と電子線である
が、その他のものも利用できる。 電離放射線7の照射により、柄模様3のない部分では
電離放射線硬化性樹脂層4は硬化し、また柄模様3のあ
る部分では電離放射線硬化性樹脂層4は未硬化のままに
置かれる。 電離放射線7の照射後に剥離基材2を剥離すると、電
離放射線硬化性樹脂層4の未硬化部分では、未硬化の電
離放射線硬化性樹脂が剥離基材2に付着して基材の剥離
とともに付着した分が除去され、結果として少量の未硬
化の電離放射線硬化性樹脂が残存した凹部8と、硬化し
た電離放射線硬化性樹脂よりなる凸部9とが形成され
る。剥離基材2を剥離後、更に電離放射線を照射して凹
部8に残留する未硬化の電離放射線硬化性樹脂を硬化せ
しめてもよいが、第5図に示すように凹部8に残留する
未硬化の電離放射線硬化性樹脂を除去した凹部を形成し
てもよい。 凹部8に残留する未硬化の電離放射線硬化性樹脂を除
去するには、種々の物理的除去法、化学的除去法がある
が、残留した未硬化部分の有機溶媒に対する溶解性が高
いことを利用して適宜な溶剤を使用し、未硬化の電離放
射線硬化性樹脂を溶解除去する化学的除去法を採用する
ことが好ましい。 溶解除去するための溶剤としては酢酸エチル、酢酸−
n−ブチル等のエステル類、メチルエチルケトン、メチ
ルイソブチルケトン、シクロヘキサノン等のケトン類、
エタノール、イソプロパノール、n−ブタノール等のア
ルコール類等があり、使用した電離放射線硬化性樹脂の
種類に合わせて選択して使用する。これらの溶剤による
溶解除去は、かけ流しや浸漬のみによっても行えるが、
より好ましい方法として、形成された凹凸面上に溶剤を
塗布した後、ブラシあるいは綿のバフィングローラーを
使用してバフ研磨する方法がある。 このようにして本発明方法により凹凸模様が形成され
るが、凹凸模様表面の保護のために更に保護層を設ける
こともできる。保護層は前記と同様の電離放射線硬化性
樹脂により形成することもできるが、熱硬化性樹脂によ
り形成してもよい。 上記実施例では剥離性基材側に電離放射線遮蔽性模様
を設けて電離放射線を剥離基材側より照射する場合につ
いて説明したが、本発明方法ではこれに限定されず、第
6図に示す如く凹凸模様形成用基材5側に柄模様3を設
けることもできる。この様な場合は第7図に示す如く剥
離基材2を電離放射線硬化性樹脂層4表面に密着させ、
電離放射線7を照射し、剥離基材2を剥離すると柄模様
3の部分から電離放射線硬化性樹脂層4が剥離される場
合がある。この様な方法では未硬化の電離放射線硬化性
樹脂が残留することが少なく、後処理を行わなくても優
れた凹凸形状が得られる利点がある。 凹凸模様形成用基材が電離放射線透過性を有する場
合、基材側から電離放射線を照射することもできる。 以下、具体的な実施例を挙げて本発明を更に詳細に説
明する。 実施例1 珪酸カルシウム板の表面をアルカリ止めシーラー処理
し、処理面に紫外線硬化性塗料〔日本ペイント(株)
製〕を厚みが100μmとなるようにフローコートした。 別にポリエステルフィルム〔東レ(株)製〕を基材シ
ートとし、ベンゾフェノン系紫外線吸収剤を含む紫外線
遮蔽インキを用いて模様部の版深60μmのグラビア版を
用いて抽象柄を印刷して転写シートとした。 上記で得られた転写シートを上記フローコート面に印
刷面が接するようにして重ね、転写シートの基材シート
側から出力80W/cmのオゾンレス型紫外線ランプを5灯設
置した照射装置中を20m/分の速度で通過させながら照射
し、照射後、転写シートの基材シートを剥離した。 剥離により、転写シートの紫外線遮蔽インキで印刷し
た模様部に相当する部分では紫外線硬化性塗料の大部分
が基材シートに付着して除去され、その他の部分では硬
化した紫外線硬化性樹脂が残って凹凸模様が形成され、
シャープな凹凸に応じた優れた外観の化粧珪酸カルシウ
ム板を得た。 この後、更に凹凸模様面に紫外線硬化性塗料をスプレ
ーコートにより厚みが5μmになるように塗布し、前記
したのと同じ紫外線照射装置を用いて照射して硬化させ
た。 実施例2 珪酸カルシウム板の表面をアルカリ止めシーラー処理
し、紫外線吸収剤を5重量%含むシルクインキでシルク
印刷した後処理面に紫外線硬化性塗料〔日本ペイント
(株)製〕を厚みが100μmになるようにフローコート
した。 別にポリエステルフィルム〔東レ(株)製〕を基材シ
ートとし、着色パールインキ〔諸星インキ(株)製〕を
用い、乾燥後の厚みが3μmになるようにグラビア印刷
方式にてベタ印刷して転写シートとした。 上記で得られた転写シートを上記フローコート面に印
刷面が接するようにして重ね、転写シートの基材シート
側から出力80W/cmのオゾンレス型紫外線ランプを5灯設
置した照射装置中を20m/分の速度で通過させながら照射
し、照射後、転写シートの基材シートを剥離した。 剥離により、基材にシルクインキで印刷した模様部に
相当する部分では紫外線硬化性塗料の大部分が基材シー
トに付着して除去され、その他の部分では着色パールイ
ンキで印刷された層を伴った硬化した紫外線硬化性樹脂
が残って着色凹凸模様が形成され、凹凸に応じた着色さ
れた優れた外観の化粧珪酸カルシウム板を得た。 この後、更に凹凸模様面に紫外線硬化性塗料をスプレ
ーコートにより厚みが5μmになるように塗布し、前記
したのと同じ紫外線照射装置を用いて照射して硬化させ
た。 〔発明の効果〕 以上説明したように、本発明方法によれば、凹凸模様
面を形成したい種々の材料に美麗な立体模様を容易に形
成することが可能となる。 また、本発明転写シートはこの様な本発明方法を実行
するに際し極めて便利に利用できるものである。
The present invention relates to a method for forming a concavo-convex pattern and a transfer sheet used in the method. [Problems to be Solved by Conventional Techniques and the Invention] Conventionally, in order to give a three-dimensional effect to a pattern provided on a smooth surface, it is performed to give the pattern itself a thickness. In addition to this, a special printing method is required in order to provide a sharp pattern, and it is difficult to form a sharp bulge, and there is a problem that a beautiful three-dimensional pattern cannot be easily formed. [Means for Solving the Problems] The present invention has been made in order to solve the above-mentioned drawbacks of the prior art, and a method for forming a concavo-convex pattern capable of easily forming a sharp three-dimensional pattern and a method for using the method. It is an object to provide a transfer sheet to be formed. That is, the present invention provides: (1) a method for forming a concavo-convex pattern, which comprises sequentially performing the following steps (a) to (f). (A) An ionizing radiation-transmissive release substrate and a substrate for forming a concavo-convex pattern having releasability from an ionizing radiation-curable resin having a cured surface are prepared, and either the front or back surface of the ionizing radiation-transmissive release substrate is prepared. Alternatively, a step of providing an ionizing radiation shielding pattern using an ink containing a substance that absorbs ionizing radiation on the surface of the substrate for forming an uneven pattern. (B) The surface on which the peeling substrate and the substrate for forming a concavo-convex pattern facing each other are provided with the above-mentioned pattern pattern. Coating the entire surface with an ionizing radiation-curable resin layer. (C) a step of laminating the substrate for forming a concavo-convex pattern and the release substrate via an ionizing radiation-curable resin layer. (D) a step of irradiating ionizing radiation from the side of the peeling substrate or the side of the substrate for forming a concavo-convex pattern to cure the ionizing radiation-curable resin layer corresponding to a portion having no pattern. (E) a step of peeling off the release base material and attaching a part of the uncured resin of the ionizing radiation-curable resin layer to the release base material or the pattern to remove the resin together with the release base material; (F) A step of applying a solvent onto the uneven surface of the transfer-receiving substrate, and then performing buff polishing using a brush or a cotton buffing roller to remove the remaining uncured ionizing radiation-curable resin layer. . (2) A method for forming a concavo-convex pattern, wherein the following steps (a) to (f) are sequentially performed. (A) An ultraviolet-transmissive release substrate and a substrate for forming a concavo-convex pattern having a releasability from an ultraviolet-curable resin having a cured surface are prepared, and either the front or back surface or the concavo-convex pattern of the ultraviolet-transmissive release substrate is prepared. The surface of the forming substrate contains a substance that absorbs ultraviolet light selected from benzophenol-based, salicylate-based, benzotriazole-based or acrylonitrile-based ultraviolet absorbers, and metal complex salt-based or hindered amine-based quencher. A step of providing a pattern using ink. (B) The surface on which the peeling substrate and the substrate for forming a concavo-convex pattern facing each other are provided with the above-mentioned pattern pattern. Coating the entire surface with an ultraviolet curable resin layer. (C) a step of laminating the substrate for forming a concavo-convex pattern and the release substrate via an ultraviolet-curable resin layer. (D) a step of irradiating ultraviolet rays from the side of the peeling substrate or the side of the substrate for forming a concavo-convex pattern to cure the ultraviolet-curable resin layer corresponding to a portion having no pattern. (E) a step of peeling off the release base material and attaching a part of the uncured resin of the ultraviolet-curable resin layer to the release base material or the pattern to remove the resin together with the release base material; (3) The method for forming an uneven pattern according to claim 2, wherein after the release substrate is released, the uncured ultraviolet-curable resin remaining on the transfer substrate is cured by further irradiating ionizing radiation. . (4) The method of forming an uneven pattern according to claim 2 or 3, wherein a surface protective layer is formed on the uneven surface as necessary. (5) A benzophenol-based, salicylate-based, benzotriazole-based or acrylonitrile-based ultraviolet absorber, a metal complex salt-based or a hindered amine-based quencher is provided on either one of the front and back surfaces of the ultraviolet-transmissive release substrate having a peelable surface. The transfer sheet used in the method of forming a concavo-convex pattern in the following step, characterized by providing a pattern that is not transferred, formed using an ink containing a substance that absorbs ultraviolet light selected from any of . A method for forming a concavo-convex pattern, which comprises sequentially performing the following steps (a) to (e). (A) An ultraviolet-transmissive release substrate and a substrate for forming a concavo-convex pattern having a releasability from an ultraviolet-curable resin having a cured surface are prepared, and either the front or back surface or the concavo-convex pattern of the ultraviolet-transmissive release substrate is prepared. The surface of the forming substrate contains a substance that absorbs ultraviolet light selected from benzophenol-based, salicylate-based, benzotriazole-based or acrylonitrile-based ultraviolet absorbers, and metal complex salt-based or hindered amine-based quencher. A step of providing a pattern using ink. (B) The surface on which the peeling substrate and the substrate for forming a concavo-convex pattern facing each other are provided with the above-mentioned pattern pattern. Coating the entire surface with an ultraviolet curable resin layer. (C) a step of laminating the substrate for forming a concavo-convex pattern and the release substrate via an ultraviolet-curable resin layer. (D) a step of irradiating ultraviolet rays from the side of the peeling substrate or the side of the substrate for forming a concavo-convex pattern to cure the ultraviolet-curable resin corresponding to a portion having no pattern. (E) a step of peeling off the release base material and attaching a part of the uncured resin of the ultraviolet-curable resin layer to the release base material or the pattern to remove the resin together with the release base material; It is the gist. [Function] According to the present invention, in a portion having a pattern formed using an ink containing a substance that absorbs ultraviolet light, the ionizing radiation-curable resin on the transfer-receiving substrate is not cured and the release substrate is not cured. The ionizing radiation-curable resin is hardened and left in portions where there is no pattern, and as a result, a sharp uneven pattern is formed on the uneven pattern forming substrate. Embodiment An embodiment of the present invention will be described below with reference to the drawings. FIG. 1 shows an embodiment of the transfer sheet 1 of the present invention used in the method of the present invention. The transfer sheet 1 has a pattern 3 provided on the surface thereof. The release substrate 2 is made of a sheet or a film having an ionizing radiation transmitting property, such as a sheet or a film of polyester, polyamide (eg, nylon), polypropylene, or a fluororesin. Are preferred. When the ionizing radiation is an electron beam, there is no particular limitation because the electron beam has high transparency, and the above-mentioned sheet or film can be used in principle, and paper and the like can be used. At least the surface of the release substrate 2 on the side in contact with the ionizing radiation-curable resin layer needs to be releasable, and if the material itself does not have releasability, it is necessary to apply a releasable resin or composition. And used as a surface peeling property. Release substrate 2
Has a thickness of preferably 5 to 200 μm, particularly preferably 25 to 100 μm. The pattern 3 is used to shield ionizing radiation when irradiating ionizing radiation from the upper surface of the release substrate, and the pattern 3 is provided at the lower surface of the release substrate 2 as shown in FIG. Although not particularly shown, it may be on the upper surface side of the release substrate 2, and if another layer is provided on the release substrate 2 as needed, it may be provided on a layer provided on the release substrate 2. Good. As a material for forming the pattern 3, a quencher (for example, a benzophenol-based, salicylate-based, benzotriazole-based, acrylonitrile-based, or other ultraviolet absorber, a light-absorbing pigment, carbon black, or an inorganic substance) may be used. And a metal complex salt-based or hindered amine-based ink. It is preferable that the ink forming the pattern 3 contains 1 to 20% by weight of the above substance that absorbs ultraviolet rays. If the content of the substance is less than 1% by weight, absorption of ionizing radiation cannot be performed satisfactorily, and the resulting sharp pattern may not have the intended sharpness. There is a possibility that the adhesive force to the adhesive may be weakened. The pattern 3 can be formed by a normal printing method using these inks. As shown in FIG. 2, the transfer sheet 1 is overlaid and adhered to the side of the ionizing radiation-curable resin layer 4 of the base material 5 for forming a concavo-convex pattern provided by applying the ionizing radiation-curable resin layer 4 separately prepared as shown in FIG. (FIG. 3), it is preferable to use the release substrate 2 stretched over a frame, because the release substrate 2 can be used repeatedly. The ionizing radiation-curable resin layer 4 is formed by being applied to the opposite surface between the release substrate 2 and the substrate 5 for forming an uneven pattern. The coating may be provided on the side of the material 2 or may be provided on both the substrate 5 for forming an uneven pattern and the release substrate 2. As the uneven pattern forming base material 5, any material may be used, for example, a metal plate or molded product such as stainless steel, steel, aluminum, or copper, glass, marble, ceramic, gypsum board, asbestos cement plate, Calcium silicate plate, inorganic plate or molded product such as GRC (glass fiber reinforced cement), organic polymer plate or molded product such as polyester, melamine, polyvinyl chloride, diallyl phthalate, or sheet, film, wood or plywood of these , A wooden board or a molded product such as a particle board, and the like. The base material 5 for forming a concavo-convex pattern may be subjected to a base treatment such as a filling treatment or a primer treatment, a treatment for improving adhesiveness, or the like. A colored pattern layer 6 can be provided on the uneven pattern forming substrate 5 as necessary. The pattern of the colored pattern 6 may be provided in a pattern synchronized with the pattern of the pattern 3,
It is not always necessary to form them so that they are synchronized. The colored pattern layer 6 can be formed by a known printing method using ordinary ink, paint, or the like. Alternatively, the colored pattern layer 6 may be formed by transferring the colored pattern itself or attaching a sheet provided with the colored pattern. it can. The colored pattern layer 6 is usually provided on the side (upper surface side) of the substrate 5 for forming an uneven pattern, on which the ionizing radiation-curable resin layer 4 is provided.
When the base material 5 for forming an uneven pattern is made of a transparent material,
It can also be provided on the lower surface side of the substrate 5. Coloring pattern layer 6
May be provided as needed, and is not necessarily provided. A solid colored layer may be provided instead of the colored pattern layer 6, and the ionizing radiation-curable resin layer 4 itself may be colored. When coloring the ionizing radiation-curable resin layer 4, it is preferable to use a coloring agent that does not hinder the transmission of ionizing radiation. When a solid colored layer is provided or the ionizing radiation-curable resin layer 4 itself is colored, the formation of a concavo-convex pattern facilitates the expression of a shade pattern of a color synchronized with the pattern. The ionizing radiation-curable resin layer 4 is mainly composed of a polymer, an oligomer, a monomer, or the like having a radical polymerizable double bond in the structure, and includes a photopolymerization initiator, a sensitizer, and other non-reactive Various grades containing polymers, organic solvents, waxes and other additives are readily available from the market and can be used in the method of the present invention. The ionizing radiation-curable resin layer 4 can be formed by a known method such as gravure coating, roll coating, flow coating or spray coating. The thickness of the ionizing radiation curable resin layer 4 is preferably 3 μm to 1 mm, particularly preferably 30 μm to 200 μm. After the peeling substrate 2 and the uneven pattern forming substrate 5 are overlapped with each other via the ionizing radiation-curable resin layer 4 to bring them into close contact with each other, ionizing radiation 7 is irradiated from the peeling substrate 2 side. Typical examples of the ionizing radiation 7 are ultraviolet rays and electron beams, but other types can be used. Due to the irradiation of the ionizing radiation 7, the ionizing radiation-curable resin layer 4 is cured in a portion where the pattern 3 is not provided, and the ionizing radiation-curable resin layer 4 is left uncured in a portion where the pattern 3 is present. When the release substrate 2 is peeled off after irradiation with the ionizing radiation 7, the uncured ionizing radiation-curable resin adheres to the release substrate 2 at the uncured portion of the ionizing radiation-curable resin layer 4 and adheres together with the peeling of the substrate. As a result, a concave portion 8 in which a small amount of uncured ionizing radiation-curable resin remains and a convex portion 9 made of cured ionizing radiation-curable resin are formed. After the release substrate 2 is peeled off, the uncured ionizing radiation-curable resin remaining in the recesses 8 may be cured by further irradiating ionizing radiation, but as shown in FIG. A concave portion from which the ionizing radiation-curable resin is removed may be formed. There are various physical removal methods and chemical removal methods for removing the uncured ionizing radiation-curable resin remaining in the concave portion 8, but the fact that the remaining uncured portion has high solubility in an organic solvent is used. It is preferable to employ a chemical removal method for dissolving and removing the uncured ionizing radiation-curable resin using an appropriate solvent. Ethyl acetate, acetic acid-
Esters such as n-butyl, methyl ethyl ketone, methyl isobutyl ketone, ketones such as cyclohexanone,
There are alcohols such as ethanol, isopropanol and n-butanol, etc., which are selected and used according to the type of ionizing radiation-curable resin used. Dissolution removal with these solvents can be performed only by pouring or immersion,
As a more preferable method, there is a method in which a solvent is applied on the formed uneven surface and buffing is performed using a brush or a cotton buffing roller. In this way, a concavo-convex pattern is formed by the method of the present invention, and a protective layer may be further provided for protecting the surface of the concavo-convex pattern. The protective layer can be formed of the same ionizing radiation curable resin as described above, or may be formed of a thermosetting resin. In the above embodiment, the case where the ionizing radiation is irradiated from the release substrate side by providing the ionizing radiation shielding pattern on the release substrate side, but the method of the present invention is not limited to this, and as shown in FIG. The pattern 3 can also be provided on the side of the substrate 5 for forming an uneven pattern. In such a case, the release substrate 2 is brought into close contact with the surface of the ionizing radiation-curable resin layer 4 as shown in FIG.
When the release substrate 2 is peeled off by irradiation with the ionizing radiation 7, the ionizing radiation-curable resin layer 4 may be peeled off from the pattern 3. Such a method has an advantage that an uncured ionizing radiation-curable resin is less likely to remain and an excellent uneven shape can be obtained without performing post-treatment. When the substrate for forming a concavo-convex pattern has ionizing radiation transparency, ionizing radiation can be applied from the substrate side. Hereinafter, the present invention will be described in more detail with reference to specific examples. Example 1 The surface of a calcium silicate plate was treated with an alkali stopper sealer, and the treated surface was cured with an ultraviolet curable paint [Nippon Paint Co., Ltd.]
Was coated by flow coating to a thickness of 100 μm. Separately, a polyester film (manufactured by Toray Industries, Inc.) was used as a base sheet, and an abstract pattern was printed using a 60 μm deep gravure plate using a UV shielding ink containing a benzophenone-based UV absorber to form a transfer sheet. did. The transfer sheet obtained above was overlaid so that the printing surface was in contact with the flow coat surface, and 20 m / cm in an irradiation device provided with five ozoneless ultraviolet lamps having an output of 80 W / cm from the base sheet side of the transfer sheet. Irradiation was performed while passing at a speed of 1 minute. After the irradiation, the base sheet of the transfer sheet was peeled off. By peeling, most of the UV curable paint adheres to the substrate sheet and is removed in the portion corresponding to the pattern portion printed with the UV shielding ink on the transfer sheet, and the cured UV curable resin remains in other portions. An uneven pattern is formed,
A decorative calcium silicate plate having an excellent appearance corresponding to sharp irregularities was obtained. Thereafter, an ultraviolet curable paint was further applied to the uneven pattern surface by spray coating so as to have a thickness of 5 μm, and was cured by irradiation using the same ultraviolet irradiation device as described above. Example 2 The surface of a calcium silicate plate was treated with an alkali stopper sealer, and silk-printed with a silk ink containing 5% by weight of an ultraviolet absorber. Flow coating was performed. Separately, a polyester film (manufactured by Toray Industries, Inc.) is used as a base sheet, and a colored pearl ink (manufactured by Morohoshi Ink Co., Ltd.) is used, and the solid printed by gravure printing is transferred so that the thickness after drying becomes 3 μm. Sheet. The transfer sheet obtained above was overlaid so that the printing surface was in contact with the flow coat surface, and 20 m / cm in an irradiation device provided with five ozoneless ultraviolet lamps having an output of 80 W / cm from the base sheet side of the transfer sheet. Irradiation was performed while passing at a speed of 1 minute. After the irradiation, the base sheet of the transfer sheet was peeled off. By peeling, most of the UV-curable paint adheres to the base sheet and is removed at the part corresponding to the pattern part printed with silk ink on the base material, and the other part is accompanied by a layer printed with colored pearl ink The cured ultraviolet-curable resin remained to form a colored uneven pattern, and a decorative calcium silicate plate having an excellent appearance colored according to the unevenness was obtained. Thereafter, an ultraviolet curable paint was further applied to the uneven pattern surface by spray coating so as to have a thickness of 5 μm, and was cured by irradiation using the same ultraviolet irradiation device as described above. [Effects of the Invention] As described above, according to the method of the present invention, a beautiful three-dimensional pattern can be easily formed on various materials on which an uneven surface is to be formed. Further, the transfer sheet of the present invention can be used extremely conveniently in carrying out such a method of the present invention.

【図面の簡単な説明】 図面は本発明方法の実施例を示すもので、第1図〜第4
図は本発明方法の各工程を示す縦断面図、第5図は本発
明方法によって得られる凹凸模様を有するシートの一例
を示す縦断面図、第6図〜第8図は本発明方法の他の実
施例の各工程を示す縦断面図である。 1……転写シート 2……剥離基材 3……柄模様 4……電離放射線硬化性樹脂層 5……凹凸模様形成用基材 7……電離放射線 8……凹部 9……凸部
BRIEF DESCRIPTION OF THE DRAWINGS The drawings show an embodiment of the method of the present invention, and FIGS.
Fig. 5 is a longitudinal sectional view showing each step of the method of the present invention, Fig. 5 is a longitudinal sectional view showing an example of a sheet having an uneven pattern obtained by the method of the present invention, and Figs. It is a longitudinal cross-sectional view which shows each process of Example of this. DESCRIPTION OF SYMBOLS 1 ... Transfer sheet 2 ... Peeling base material 3 ... Pattern pattern 4 ... Ionizing radiation curable resin layer 5 ... Substrate 7 for forming a concavo-convex pattern ...... Ionizing radiation 8 ... Concave part 9 ... Convex part

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭57−29420(JP,A) 特開 昭58−148766(JP,A) 特開 昭61−37499(JP,A) 特公 昭51−24287(JP,B2)   ────────────────────────────────────────────────── ─── Continuation of front page       (56) References JP-A-57-29420 (JP, A)                 JP-A-58-148766 (JP, A)                 JP-A-61-37499 (JP, A)                 Tokiko Sho 51-24287 (JP, B2)

Claims (1)

(57)【特許請求の範囲】 1.下記(a)〜(f)の工程を順に行うことを特徴と
する凹凸模様の形成方法。 (a)表面が硬化した電離放射線硬化性樹脂に対して剥
離性を有する電離放射線透過性剥離基材及び凹凸模様形
成用基材を用意し、電離放射線透過性剥離基材の表裏い
ずれかの面或いは凹凸模様形成用基材の表面に電離放射
線を吸収する物質を含有するインキを用いて電離放射線
遮蔽性柄模様を設ける工程。 (b)上記柄模様の設けられた剥離基材或いは凹凸模様
形成用基材或いは剥離基材と凹凸模様形成用基材の両方
の、剥離基材と凹凸模様形成用基材とが対向する面に電
離放射線硬化性樹脂層を一面コートする工程。 (c)凹凸模様形成用基材と剥離基材とを、電離放射線
硬化性樹脂層を介して重ね合わせる工程。 (d)電離放射線を剥離基材側又は凹凸模様形成用基材
側から照射して柄模様のない部分に相当する電離放射線
硬化性樹脂層を硬化させる工程。 (e)剥離基材を剥がして電離放射線硬化性樹脂層の未
硬化の樹脂の一部を剥離基材、又は柄模様に付着させて
剥離基材とともに除去する工程。 (f)被転写基材の凹凸面上に溶剤を塗布した後、ブラ
シ或いは綿のバフィングローラーを使用してバフ研磨を
行って、残った未硬化の電離放射線硬化性樹脂層を、除
去する工程。 2.下記(a)〜(e)の工程を順に行うことを特徴と
する凹凸模様の形成方法。 (a)表面が硬化した紫外線硬化性樹脂に対して剥離性
を有する紫外線透過性剥離基材及び凹凸模様形成用基材
を用意し、紫外線透過性剥離基材の表裏いずれかの面或
いは凹凸模様形成用基材の表面に、ベンゾフェノール
系、サリチレート系、ベンゾトリアゾール系又はアクリ
ロニトリル系の紫外線吸収剤、金属錯塩系又はヒンダー
ドアミン系のクエンチャーのいずれかから選ばれた紫外
線を吸収する物質を含有するインキを用いて柄模様を設
ける工程。 (b)上記柄模様の設けられた剥離基材或いは凹凸模様
形成用基材或いは剥離基材と凹凸模様形成用基材の両方
の、剥離基材と凹凸模様形成用基材とが対向する面に紫
外線硬化性樹脂層を一面コートする工程。 (c)凹凸模様形成用基材と剥離基材とを、紫外線硬化
性樹脂層を介して重ね合わせる工程。 (d)紫外線を剥離基材側又は凹凸模様形成用基材側か
ら照射して柄模様のない部分に相当する紫外線硬化性樹
脂層を硬化させる工程。 (e)剥離基材を剥がして紫外線硬化性樹脂層の未硬化
の樹脂の一部を剥離基材、又は柄模様に付着させて剥離
基材とともに除去する工程。 3.剥離基材を剥離した後、更に電離放射線を照射して
被転写基材上に残った未硬化の紫外線硬化性樹脂を硬化
させる特許請求の範囲第2項記載の凹凸模様の形成方
法。 4.凹凸表面に、必要に応じて表面保護層を形成する特
許請求の範囲第2項又は第3項に記載の凹凸模様の形成
方法。 5.表面が剥離性を有する紫外線透過性剥離基材の表裏
いずれかの面に、ベンゾフェノール系、サリチレート
系、ベンゾトリアゾール系又はアクリロニトリル系の紫
外線吸収剤、金属錯塩系又はヒンダードアミン系のクエ
ンチャーのいずれかから選ばれた紫外線を吸収する物質
を含有するインキを用いて形成された、転写されない柄
模様を設けてなることを特徴とする以下の工程の凹凸模
様の形成方法に使用する転写シート。 下記(a)〜(e)の工程を順に行うことを特徴とする
凹凸模様の形成方法。 (a)表面が硬化した紫外線硬化性樹脂に対して剥離性
を有する紫外線透過性剥離基材及び凹凸模様形成用基材
を用意し、紫外線透過性剥離基材の表裏いずれかの面或
いは凹凸模様形成用基材の表面に、ベンゾフェノール
系、サリチレート系、ベンゾトリアゾール系又はアクリ
ロニトリル系の紫外線吸収剤、金属錯塩系又はヒンダー
ドアミン系のクエンチャーのいずれかから選ばれた紫外
線を吸収する物質を含有するインキを用いて柄模様を設
ける工程。 (b)上記柄模様の設けられた剥離基材或いは凹凸模様
形成用基材或いは剥離基材と凹凸模様形成用基材の両方
の、剥離基材と凹凸模様形成用基材とが対向する面に紫
外線硬化性樹脂層を一面コートする工程。 (c)凹凸模様形成用基材と剥離基材とを、紫外線硬化
性樹脂層を介して重ね合わせる工程。 (d)紫外線を剥離基材側又は凹凸模様形成用基材側か
ら照射して柄模様のない部分に相当する紫外線硬化性樹
脂層を硬化させる工程。 (e)剥離基材を剥がして紫外線硬化性樹脂層の未硬化
の樹脂の一部を剥離基材、又は柄模様に付着させて剥離
基材とともに除去する工程。
(57) [Claims] A method for forming a concavo-convex pattern, which comprises sequentially performing the following steps (a) to (f). (A) An ionizing radiation-transmissive release substrate and a substrate for forming a concavo-convex pattern having releasability from an ionizing radiation-curable resin having a cured surface are prepared, and either the front or back surface of the ionizing radiation-transmissive release substrate Alternatively, a step of providing an ionizing radiation shielding pattern using an ink containing a substance that absorbs ionizing radiation on the surface of the substrate for forming an uneven pattern. (B) The surface on which the peeling substrate and the substrate for forming a concavo-convex pattern facing each other are provided with the above-mentioned pattern pattern. Coating the entire surface with an ionizing radiation-curable resin layer. (C) a step of laminating the substrate for forming a concavo-convex pattern and the release substrate via an ionizing radiation-curable resin layer. (D) a step of irradiating ionizing radiation from the side of the peeling substrate or the side of the substrate for forming a concavo-convex pattern to cure the ionizing radiation-curable resin layer corresponding to a portion having no pattern. (E) a step of peeling off the release base material and attaching a part of the uncured resin of the ionizing radiation-curable resin layer to the release base material or the pattern to remove the resin together with the release base material; (F) A step of applying a solvent onto the uneven surface of the transfer-receiving substrate, and then performing buff polishing using a brush or a cotton buffing roller to remove the remaining uncured ionizing radiation-curable resin layer. . 2. A method for forming a concavo-convex pattern, which comprises sequentially performing the following steps (a) to (e). (A) An ultraviolet-transmissive release substrate and a substrate for forming a concavo-convex pattern having a releasability from an ultraviolet-curable resin having a cured surface are prepared, and either the front or back surface or the concavo-convex pattern of the ultraviolet-transmissive release substrate is prepared. The surface of the forming substrate contains a substance that absorbs ultraviolet light selected from benzophenol-based, salicylate-based, benzotriazole-based or acrylonitrile-based ultraviolet absorbers, and metal complex salt-based or hindered amine-based quencher. A step of providing a pattern using ink. (B) The surface on which the peeling substrate and the substrate for forming a concavo-convex pattern facing each other are provided with the above-mentioned pattern pattern. Coating the entire surface with an ultraviolet curable resin layer. (C) a step of laminating the substrate for forming a concavo-convex pattern and the release substrate via an ultraviolet-curable resin layer. (D) a step of irradiating ultraviolet rays from the side of the peeling substrate or the side of the substrate for forming a concavo-convex pattern to cure the ultraviolet-curable resin layer corresponding to a portion having no pattern. (E) a step of peeling off the release base material and attaching a part of the uncured resin of the ultraviolet-curable resin layer to the release base material or the pattern to remove the resin together with the release base material; 3. 3. The method according to claim 2, wherein the uncured ultraviolet-curable resin remaining on the transfer-receiving substrate is cured by further irradiating ionizing radiation after peeling the release-backing substrate. 4. 4. The method for forming an uneven pattern according to claim 2, wherein a surface protective layer is formed on the uneven surface as required. 5. Either a benzophenol-based, salicylate-based, benzotriazole-based or acrylonitrile-based ultraviolet absorber, a metal complex salt-based or a hindered amine-based quencher on one of the front and back surfaces of the ultraviolet-transmissive release substrate having a peelable surface. A transfer sheet for use in a method for forming a concavo-convex pattern in the following step, characterized by providing an untransferred pattern formed using an ink containing a substance that absorbs ultraviolet light selected from the group consisting of: A method for forming a concavo-convex pattern, which comprises sequentially performing the following steps (a) to (e). (A) An ultraviolet-transmissive release substrate and a substrate for forming a concavo-convex pattern having a releasability from an ultraviolet-curable resin having a cured surface are prepared, and either the front or back surface or the concavo-convex pattern of the ultraviolet-transmissive release substrate is prepared. The surface of the forming substrate contains a substance that absorbs ultraviolet light selected from benzophenol-based, salicylate-based, benzotriazole-based or acrylonitrile-based ultraviolet absorbers, and metal complex salt-based or hindered amine-based quencher. A step of providing a pattern using ink. (B) The surface on which the peeling substrate and the substrate for forming a concavo-convex pattern facing each other are provided with the above-mentioned pattern pattern. Coating the entire surface with an ultraviolet curable resin layer. (C) a step of laminating the substrate for forming a concavo-convex pattern and the release substrate via an ultraviolet-curable resin layer. (D) a step of irradiating ultraviolet rays from the side of the peeling substrate or the side of the substrate for forming a concavo-convex pattern to cure the ultraviolet-curable resin layer corresponding to a portion having no pattern. (E) a step of peeling off the release base material and attaching a part of the uncured resin of the ultraviolet-curable resin layer to the release base material or the pattern to remove the resin together with the release base material;
JP62332781A 1987-12-28 1987-12-28 Method for forming irregularities and transfer sheet used in the method Expired - Lifetime JP2826729B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62332781A JP2826729B2 (en) 1987-12-28 1987-12-28 Method for forming irregularities and transfer sheet used in the method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62332781A JP2826729B2 (en) 1987-12-28 1987-12-28 Method for forming irregularities and transfer sheet used in the method

Publications (2)

Publication Number Publication Date
JPH01171998A JPH01171998A (en) 1989-07-06
JP2826729B2 true JP2826729B2 (en) 1998-11-18

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ID=18258753

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Link
JP (1) JP2826729B2 (en)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5729420A (en) * 1980-07-29 1982-02-17 Bando Chem Ind Ltd Forming method of pattern embossed on sheet surface
JPS58148766A (en) * 1982-02-28 1983-09-03 松下電工株式会社 Manufacture of decorative board
JPS6137466A (en) * 1984-07-30 1986-02-22 Toobi:Kk Decorative shrinkable film fitting

Also Published As

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