JP2759291B2 - Photosensitive material processing equipment - Google Patents

Description

Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a technique for preventing meandering of a photosensitive material in a photosensitive material processing apparatus.

[Conventional technology]

In a photosensitive material processing apparatus that performs development processing, fixing processing, washing or stabilization processing while transporting the photosensitive material on the sheet,
Each processing tank is provided with a rack for transporting the photosensitive material in the processing solution.

The photosensitive material moves from the outside of the liquid to the outside of the liquid by moving up and down in the photosensitive material processing apparatus, and moves out of the liquid again. Because the drive transmission in the U-turn part is not performed continuously,
In some cases, the photosensitive material cannot be properly transported, and the photosensitive material cannot be given an appropriate tension.Therefore, the crossover between the racks has an abnormally large deflection, and as a result, the photosensitive material is pressed against the fixed guide. As a result, the next conveyance may not be possible due to the frictional resistance.

[Problems to be solved by the invention]

SUMMARY OF THE INVENTION An object of the present invention is to provide a photosensitive material processing apparatus which can eliminate the above-mentioned drawbacks of the prior art and obtain a stable photosensitive material transport.

[Means for solving the problem]

The purpose of this is to provide an independent drive mechanism for each rack in the photosensitive material processing apparatus, detect the amount of film deflection at the crossover section between each rack, and drive the next rack in accordance with the amount of film deflection. This is achieved by a photosensitive material processing apparatus characterized in that the speed increase is made at least higher at the outlet side rack than at the inlet side rack.

〔Example〕

Analysis of the drawbacks of the prior art revealed that the transport direction of the photosensitive material was significantly changed at the crossover portion between the racks, and that the leading edge of the photosensitive material, which should be transported at a constant speed, was stagnant.

In the crossover portion, when the transfer of the conveyance is performed from one rack to the next rack, the leading end of the photosensitive material, which has moved along a substantially circular locus, immediately enters the nip portion of the pair of rollers on the receiving side. However, if the movement direction changes, such as moving to the nip after hitting the roller surface, it will exceed the scheduled transit time, and the photosensitive material will bend in a way that absorbs the delay. is there.

When the amount of deflection is detected and the transport speed of the next rack is increased, the initially formed deflection is gradually absorbed by the speed difference. Thus, in order to increase the speed of the next rack, it is necessary to drive each rack separately.
Although there is a drawback that it becomes complicated, the advantage of obtaining stable processing as a result is great, so this method is adopted. Next, if only the next stage speed increase is performed, the photosensitive material may be scratched due to the idle rotation of the conveying roller due to the aggressive speed difference. , The speed increase rate of the next rack is changed. That is, when it is detected that the deflection is abnormally large, the speed increase rate of the next rack is increased. Further, the next rack is controlled in the same manner as described above, so that the speed increase rate is controlled over all the racks until the deflection is absorbed.

Next, an embodiment will be described with reference to the drawings. FIG. 1 is a side sectional view of a photosensitive material processing apparatus. The photosensitive material enters from the upper left entrance 6 and enters the developing tank 1.

A first rack 4 is provided in the development processing tank 1, and the photosensitive material is transported downward between a plurality of transport rollers indicated by 4a.
U-turn at the bottom and transported upward, out of the processing solution,
The crossover section 5 is reached. The crossover section 5 includes a pair of feed rollers 10 of the first rack 4, a pair of receiving rollers 8 of the second rack 7, and a fixed guide 9. The fixed guide 9 prevents the photosensitive material from escaping, and does not approach the photosensitive material amount passage. Therefore, it is permissible that the photosensitive material bends in this portion, but if the flexure becomes abnormally large, the photosensitive material is in a position where it is pressed against the fixed guide 9. FIG. 2 is an exploded perspective view of the rack.

FIG. 2 shows a rack provided with a motor 25 as an example of independently driving each rack. FIG. 3 schematically shows a crossover portion regarding the detection of the amount of deflection.

The deflection amount detection sensor 50 is, for example, a photoelectric sensor,
A light emitting section and a light receiving section are paired, and a signal is output when the deflection of the photosensitive material increases along the optical path.

This signal is processed by the control unit 40 and the motor
Instruct 25 to increase the rotation speed.

〔The invention's effect〕

With this configuration, even if a large deflection occurs in the photosensitive material in the crossover portion, the deflection is gradually absorbed and reduced, and stable conveyance can be automatically performed.

[Brief description of the drawings]

 FIG. 1 is a sectional view of a photosensitive material processing apparatus. FIG. 2 is an exploded perspective view of a rack. FIG. 3 is a schematic diagram of a crossover unit. DESCRIPTION OF SYMBOLS 1 ... Development processing tank, 2 ... Fixing processing tank 3 ... Stable or rinsing processing tank 4 ... 1st rack, 5 ... Crossover part 6 ... Inlet, 7 ... 2nd tank 8 ... Receiving roller pair 9: Fixed guide, 10: Feeding roller pair 25: Drive motor, 40: Control unit 50: Deflection amount sensor

Continuation of the front page (72) Inventor Yoji Yamamichi 1 Sakuramachi, Hino-shi, Tokyo Examiner in Konica Corporation Toshihiko Fujita (56) References JP-A-1-195448 (JP, A) JP-A-62- 255344 (JP, A)

Claims (1)

(57) [Claims] In a photosensitive material processing apparatus, an independent driving mechanism is provided for each rack, a film deflection amount at a crossover portion between the racks is detected, and a next stage rack is driven in accordance with the film deflection amount. A photosensitive material processing apparatus, wherein the speed increase rate of at least the outlet side rack is higher than that of the inlet side rack.