JP2744836B2 - Method for manufacturing reflecting mirror for synchrotron radiation - Google Patents

Description

Description: TECHNICAL FIELD The present invention relates to a method for manufacturing a reflecting mirror for synchrotron radiation.

[Conventional technology]

In recent years, applied research on synchrotron radiation (SOR) has made rapid progress. Its application fields are semiconductor manufacturing,
Extensive in medicine, chemistry and physics. Also SO
The increase in the size and energy of the R device has also become remarkable. As a result, the demands on the reflection mirror for SOR are becoming more and more severe. For example, reflection mirrors are required to have high dimensional accuracy.

Conventionally, reflection mirrors for this application have been made of carbon base material, SiC
S on the entire surface of heat-resistant ceramic substrate such as substrate by CVD method
After coating the iC film, the reflective surface is optically polished,
Further, it is manufactured by depositing a metal film on the reflection surface.

[Problems to be solved by the invention]

However, if a conventional manufacturing method is used to obtain a reflecting mirror having high dimensional accuracy, there is a problem that a long time is required for processing. This is for the following reasons.

That is, conventionally, the entire surface of the base material is coated with the SiC film by the CVD method. In this case, 2 at the edge of the substrate
Since the SiC film grows from the direction, the SiC film rises and is formed. For this reason, six-surface grinding is required, and Si
Since the thickness variation of the C film is large, it takes a long time for the polishing process to obtain high dimensional accuracy.

The present invention has been made to solve the above-described problem, and has as its object to provide a method capable of shortening the processing time of a reflecting mirror for synchrotron radiation.

[Means for Solving the Problems] In the method for manufacturing a reflecting mirror for synchrotron radiation according to the present invention, a carbon mask material is formed on a surface other than a reflection surface of a heat-resistant ceramic base material, and then a CVD method is performed. It is characterized in that a SiC film is coated, its reflection surface is optically polished, and a metal film is deposited on the reflection surface.

In the present invention, a carbon substrate, a SiC substrate, or the like can be used as the thermal ceramic substrate. However, SiC
The substrate is preferable because the difference in thermal expansion coefficient between the substrate and the SiC film is small.

In the present invention, examples of the mask material formed on a surface other than the surface serving as the reflection surface of the substrate include those having a shape fitted to the heat-resistant ceramic substrate and covering the surfaces other than the reflection surface. SiC on the surface of the carbon mask material used in the present invention
The growth rate of the film is 1/3 or less as compared with the growth rate of the SiC film on the surface of the ceramic substrate such as the SiC substrate.

In the present invention, examples of the metal film include a film in which Pt or Au is formed on a Cr underlayer. Also, in order to reflect X-rays of a specific wavelength, instead of Pt or Au, N
A multilayer film in which heavy elements such as i, Co, Cu, Fe, Re, Zn, W, Mn, Ta, and Au and light elements such as Be, Mg, Sn, Sb, V, and Te may be used. . Note that the Cr underlayer is not necessarily provided.

(Operation)

According to the method of the present invention, unlike the conventional method, the SiC film is not formed by being raised at the ridge of the base material, so that the time of the polishing step can be reduced.

〔Example〕

 Hereinafter, embodiments of the present invention will be described with reference to the drawings.

First, as shown in Fig. 1, length 12cm, width 10cm, thickness
A mask material 4 made of carbon was fitted to a substrate 1 made of 2.5 cm of SiC to cover a surface other than a surface to be a reflection surface. The surface of the substrate 1 was coated with a SiC film 2 by a CVD method. As a result, a SiC film 2 having a thickness of about 100 μm was grown on the surface serving as the reflection surface. Further, since there is a gap between the base material 1 and the mask material 4, a thin SiC film also grew on the side surface of the base material 1. Substrate 1
The SiC film on the side surface had a thickness of about 10 μm on the reflection surface side, gradually became thinner downward, and the SiC film hardly grew on the back surface side.

The SiC film 2 formed on the surface to be the reflection surface of the substrate 1 was optically polished (one surface grinding). The time required for the optical polishing was about 6 hours, which was about 1/7 of the conventional case (six-surface grinding). Optical polishing of the SiC film 2 was sufficient by one-side grinding.

Next, as shown in FIG. 2, a 0.1 μm-thick metal film 3 made of a Cr underlayer and Pt was formed on the surface of the reflective SiC film 2 by an ion plating method to produce a reflection mirror. .

〔The invention's effect〕

As described above in detail, by using the method of the present invention, a reflecting mirror for synchrotron radiation with high dimensional accuracy can be manufactured in a short processing time, and its industrial value is great.

[Brief description of the drawings]

1 and 2 are sectional views showing a method of manufacturing a reflecting mirror for synchrotron radiation according to an embodiment of the present invention in the order of steps. 1 ... substrate, 2 ... SiC film, 3 ... metal film, 4 ... mask material.

Continued on the front page (72) Inventor Teruo Sugai 1-26-1 Nishi Shinjuku, Shinjuku-ku, Tokyo Toshiba Ceramics Co., Ltd. (72) Inventor Shiro Hotate 1-26-1-2 Nishi Shinjuku, Shinjuku-ku, Tokyo Toshiba Inside Ceramics Co., Ltd. (56) References JP-A-62-113104 (JP, A)

Claims (1)

(57) [Claims] 1. A method of forming a mask material made of carbon on a surface of a heat-resistant ceramic substrate other than a surface serving as a reflection surface, and forming the mask material by CVD.
A method for manufacturing a reflecting mirror for synchrotron radiation, comprising coating an iC film, optically polishing the reflecting surface thereof, and depositing a metal film on the reflecting surface.