JP2733544B2 - Conductive thin film inspection method - Google Patents
Conductive thin film inspection methodInfo
- Publication number
- JP2733544B2 JP2733544B2 JP14033290A JP14033290A JP2733544B2 JP 2733544 B2 JP2733544 B2 JP 2733544B2 JP 14033290 A JP14033290 A JP 14033290A JP 14033290 A JP14033290 A JP 14033290A JP 2733544 B2 JP2733544 B2 JP 2733544B2
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- conductive thin
- eddy current
- detection coil
- inspection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- Investigating Or Analyzing Materials By The Use Of Magnetic Means (AREA)
- Testing Of Optical Devices Or Fibers (AREA)
Description
【発明の詳細な説明】 ［産業上の利用分野］ 本発明は、例えばハーメチック被覆光ファイバ心線の
如き被検査物の導電性薄膜の検査をする導電性薄膜検査
方法に関するものである。Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a conductive thin film inspection method for inspecting a conductive thin film of an inspection object such as a hermetic coated optical fiber core.
［従来の技術］ 一般に光ファイバ心線は、石英製の光ファイバ母材か
ら紡糸された光ファイバの表面にプラスチック被覆を設
けることにより製造されている。このようなプラスチッ
ク被覆を有する光ファイバ心線は、空気中の水素や水分
を光ファイバが吸収して光信号の伝送損失が時間の経過
と共に増加する性質がある。これは、プラスチック被覆
は水素分子や水分子に対する気密性が低いことと、石英
からなる光ファイバをこれら水素分子や水分子が透過す
る性質があるためである。2. Description of the Related Art Generally, an optical fiber core is manufactured by providing a plastic coating on the surface of an optical fiber spun from a quartz optical fiber preform. An optical fiber core having such a plastic coating has a property that the optical fiber absorbs hydrogen or moisture in the air and the transmission loss of an optical signal increases with time. This is because the plastic coating has low airtightness against hydrogen molecules and water molecules, and has the property of transmitting these hydrogen molecules and water molecules through an optical fiber made of quartz.
このような光ファイバ心線の欠点を解消するために、
光ファイバの表面にアモルファスカーボン等の無機物質
よりなるハーメチック被覆を設けて、水素分子や水分子
の透過を防ぐ構造のハーメチック被覆光ファイバ心線が
提案されている。このようなハーメチック被覆光ファイ
バ心線は、光ファイバ母材から紡糸した直後の光ファイ
バを反応炉に通し、該反応炉内で熱CVD法により光ファ
イバの表面にハーメチック被覆を設け、次に該ハーメチ
ック被覆の表面にウレタン樹脂の如きプラスチック被覆
を設けることにより行なっている。In order to eliminate such disadvantages of optical fiber cores,
A hermetic-coated optical fiber core having a structure in which a hermetic coating made of an inorganic substance such as amorphous carbon is provided on the surface of an optical fiber to prevent the transmission of hydrogen molecules and water molecules has been proposed. Such a hermetic coated optical fiber core wire is passed through an optical fiber immediately after being spun from an optical fiber preform, through a reaction furnace, and provided with a hermetic coating on the surface of the optical fiber by a thermal CVD method in the reaction furnace. This is done by providing a plastic coating such as a urethane resin on the surface of the hermetic coating.
かかる構造のハーメチック被覆光ファイバ心線は、前
述した特徴のため水素や水分による伝送損失の増加がな
く、また機械的強度も大きいという特徴を有している。The hermetic coated optical fiber core having such a structure does not increase transmission loss due to hydrogen or moisture and has high mechanical strength due to the above-described characteristics.
このようなハーメチック被覆光ファイバ心線は、ハー
メチック被覆の成膜を光ファイバの長手方向に亘って均
一に安定して行なう必要がある。１箇所でも成膜欠陥が
存在すると、そこから水素分子や水分子が侵入し、伝送
損失の増加を招くことになる。In such a hermetic-coated optical fiber core wire, it is necessary to uniformly and stably form a film of the hermetic coating over the longitudinal direction of the optical fiber. If there is a film formation defect even at one location, hydrogen molecules and water molecules penetrate therefrom, resulting in an increase in transmission loss.
そこで、ハーメチック被覆が光ファイバの表面にほぼ
均一に設けられているということを保証する必要があ
る。Therefore, it is necessary to guarantee that the hermetic coating is provided substantially uniformly on the surface of the optical fiber.
アモルファスカーボンよりなるハーメチック被覆は、
７〜15kΩ/cmの電気抵抗があるが、表面をプラスチック
被覆で覆われているため接触法により測定を行なうこと
はできない。Hermetic coating made of amorphous carbon
Although it has an electric resistance of 7 to 15 kΩ / cm, it cannot be measured by the contact method because its surface is covered with a plastic coating.
そこで従来は、プラスチック被覆を施す前、或いはプ
ラスチック被覆を除去した後の一定長さのハーメチック
被覆光ファイバの抵抗値を、テスターを用いてオフライ
ンで測定していた。Therefore, conventionally, the resistance value of a hermetic coated optical fiber having a certain length before or after removing the plastic coating has been measured off-line using a tester.
しかしながら、テスターでの測定では、破壊試験のた
め測定に用いたサンプルの抵抗値はわかるが、製品その
ものの抵抗値を知ることができない問題点があった。ま
た、テスターによる方法では、製品の長手方向の抵抗値
の変化を知ることができないため、製品の全長を保証で
きず、品質管理上も問題であった。However, in the measurement using a tester, there is a problem that the resistance value of the sample used for the measurement for the destructive test is known, but the resistance value of the product itself cannot be known. Further, in the method using a tester, the change in the resistance value in the longitudinal direction of the product cannot be known, so that the total length of the product cannot be guaranteed, and there is a problem in quality control.
これを避けるため、インラインで、しかもプラスチッ
ク被覆の上から非接触で測定を行なうことができる導電
性薄膜検査方法として渦電流検査法が検討されている。In order to avoid this, an eddy current inspection method has been studied as a conductive thin film inspection method capable of performing measurement in-line and in a non-contact manner over a plastic coating.
この渦電流検査法は、導体を交番磁界中におくと、該
導体内に磁界を打ち消す方向の渦電流が流れ、この渦電
流の大きさや分布が導体の形状，導電率，透磁率，内部
欠陥により変化し、その渦電流により発生する磁界が相
互誘導により検出コイルの複素インピーダンスを変化さ
せるので、この複素インピーダンスの変化を検出コイル
の両端での電圧値の大きさや位相の変化として検出する
ことにより、被検査物である導体の状態を知る方法であ
る。In this eddy current inspection method, when a conductor is placed in an alternating magnetic field, an eddy current flows in the conductor in a direction to cancel the magnetic field, and the size and distribution of the eddy current are determined by the shape, conductivity, permeability, and internal defects of the conductor. And the magnetic field generated by the eddy current changes the complex impedance of the detection coil due to mutual induction.By detecting this change in the complex impedance as a change in the magnitude or phase of the voltage value at both ends of the detection coil, This is a method of knowing the state of a conductor as an inspection object.
［発明が解決しようとする課題］ しかしながら、このような渦電流検査法を用いて走行
中の被検査物の導電性薄膜の検査をしようとすると、被
検査物と検出コイルとの相対的間隔がランダムに微妙に
動いたり、温度ドリフト等で、第５図に示すように測定
値が安定せず、測定が実施できない問題点があった。な
お、第５図において、Ｘ軸は複素インピーダンスの実数
部の値を示し、Ｙ軸は虚数部の値を示している。[Problems to be Solved by the Invention] However, if an attempt is made to inspect a conductive thin film of a running test object using such an eddy current test method, the relative distance between the test object and the detection coil is increased. As shown in FIG. 5, there was a problem that the measured value was not stable due to a slight movement at random or a temperature drift and the measurement could not be performed. In FIG. 5, the X-axis shows the value of the real part of the complex impedance, and the Y-axis shows the value of the imaginary part.
本発明の目的は、被検査物が検出コイルに対して相対
的に動いても、或いは温度ドリフトが生じても、支障な
く測定が行える渦電流検出法による導電性薄膜検査方法
を提供することにある。An object of the present invention is to provide a method for inspecting a conductive thin film by an eddy current detection method that can perform measurement without any trouble even when an object to be inspected moves relatively to a detection coil or a temperature drift occurs. is there.
［課題を解決するための手段］ 上記の目的を達成するための本発明の手段を説明する
と、本発明は被検査物の表面に被覆されている導電性薄
膜の状態を渦電流検査法で検査する導電性薄膜検査方法
において、渦電流検出センサの検出コイルと前記被検査
物の検査部位との位置関係が相対的に接近・離間する状
態となるように少なくとも一方を一方向に変位させ、前
記導電性薄膜の検査部位の渦電流による前記検出コイル
の複素インピーダンス変化に基づく該複素インピーダン
スの位相角の変化から前記導電性薄膜の状態を検査する
ことを特徴とする。[Means for Solving the Problems] The means of the present invention for achieving the above object will be described. The present invention examines the state of a conductive thin film coated on the surface of an inspection object by an eddy current inspection method. In the conductive thin film inspection method, at least one is displaced in one direction so that a positional relationship between a detection coil of the eddy current detection sensor and an inspection portion of the inspection object relatively approaches / separates, The state of the conductive thin film is inspected from a change in a phase angle of the complex impedance based on a change in the complex impedance of the detection coil due to an eddy current at an inspection site of the conductive thin film.
［作用］ このように渦電流検出センサの検出コイルと被検査物
の検査部位との位置関係を接近・離間する状態となるよ
うに一方向に変位させると、離間状態では検出コイルの
複素インピーダンスが零になり、接近させると該複素イ
ンピーダンスが大きくなり、位置関係の変化により複素
インピーダンスベクトルは第２図に示すように一定の位
相角θで変化することになる。この位相角θは、導電性
薄膜の抵抗値が一定であれば一定の位相角となり、抵抗
値が変れば位相角θも変化する。従って、位相角θを測
定することにより、導電性薄膜の抵抗値の変化、即ち該
導電性薄膜の状態を検査できることになる。[Operation] When the positional relationship between the detection coil of the eddy current detection sensor and the inspection site of the inspection object is displaced in one direction so as to approach or separate from each other, the complex impedance of the detection coil in the separation state is increased. It becomes zero, and when approached, the complex impedance increases, and the complex impedance vector changes at a constant phase angle θ as shown in FIG. 2 due to a change in the positional relationship. The phase angle θ becomes a constant phase angle when the resistance value of the conductive thin film is constant, and the phase angle θ changes when the resistance value changes. Therefore, by measuring the phase angle θ, the change in the resistance value of the conductive thin film, that is, the state of the conductive thin film can be inspected.
［実施例］ 以下、本発明の実施例を図面を参照して詳細に説明す
る。Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.
第１図は、本発明に係る導電性薄膜検査方法を実施す
る導電性薄膜検査装置の第１実施例を示したものであ
る。図示のように、被検査物であるハーメチック被覆光
ファイバ心線の如き線条体１は、第1,第２のガイドロー
ル2,3でガイドされて走行されるようになっている。こ
れら第1,第２のガイドロール2,3は、架台４上の各スタ
ンド5,6に回転自在に支持されている。第２のガイドロ
ール３は加振機７により一方向即ち上下に振動され、こ
れにより線条体１が上下に振動されるようになってい
る。また、第1,第２のガイドロール2,3間の架台４上に
は、線条体１に接近する位置にプローブ型の渦電流検出
センサ８が配置されている。該渦電流検出センサ８は、
コア９の外周に検出コイル10が同軸状に配置され、樹脂
11で一体にモールドされた構造になっている。該渦電流
検出センサ８には、コード12を介して送受信器13が接続
されている。送受信器13には、その出力を記録するレコ
ーダ14が接続されている。FIG. 1 shows a first embodiment of a conductive thin film inspection apparatus for performing a conductive thin film inspection method according to the present invention. As shown in the drawing, a wire 1 such as a hermetic coated optical fiber core, which is an object to be inspected, is guided and traveled by first and second guide rolls 2 and 3. These first and second guide rolls 2 and 3 are rotatably supported by stands 5 and 6 on a gantry 4. The second guide roll 3 is vibrated in one direction, that is, up and down by a vibrator 7, whereby the striated body 1 is vibrated up and down. A probe type eddy current detection sensor 8 is disposed on the base 4 between the first and second guide rolls 2 and 3 at a position near the striatum 1. The eddy current detection sensor 8 includes:
A detection coil 10 is coaxially arranged on the outer periphery of the core 9 and is made of resin.
It has a structure molded integrally with 11. A transceiver 13 is connected to the eddy current detection sensor 8 via a cord 12. A recorder 14 for recording the output is connected to the transceiver 13.
具体例 検出コイルの内径 1.6mm 検出コイルの線径 0.05mm 検出コイルのターン数 100〜150 検出コイルの長さ ８〜10mm 検出コイルに流す 電流の周波数 １〜3MHz 加振機の振動数 150Hz 次に、上記の如き装置を用いた導電性薄膜検査方法に
ついて説明する。本実施例では、走行中の線条体１を加
振機７により渦電流検出センサ８に対して接近・離間す
る状態となるように一方向に強制的に振動させる。この
ようにすると、線条体１を渦電流検出センサ８から離間
させた状態では検出コイル10の複素インピーダンスが零
になり、接近させた状態では該複素インピーダンスが大
きくなる。このような検出コイル10の複素インピーダン
ス変化を送受信器13で検出し、レコーダ14に記録させ
る。Specific example Inner diameter of detection coil 1.6mm Diameter of detection coil 0.05mm Number of turns of detection coil 100 to 150 Length of detection coil 8 to 10mm Frequency of current flowing through detection coil 1 to 3MHz Frequency of vibration exciter 150Hz A method for inspecting a conductive thin film using the above-described apparatus will be described. In the present embodiment, the running linear body 1 is forcibly vibrated in one direction by the vibrator 7 so as to approach or separate from the eddy current detection sensor 8. By doing so, the complex impedance of the detection coil 10 becomes zero when the striatum 1 is separated from the eddy current detection sensor 8, and the complex impedance increases when the striatum 1 is brought close to the eddy current detection sensor 8. Such a change in the complex impedance of the detection coil 10 is detected by the transmitter / receiver 13 and recorded by the recorder 14.
レコーダ14で記録された複素インピーダンスベクトル
は、第２図に示すように線条体１と検出コイル10との強
制的な一方向の位置関係の変化により一定の位相角θで
変化することになる。この位相角θは、線条体１の導電
性薄膜の抵抗値が一定であれば一定の位相角θとなり、
抵抗値が変れば第３図に示すように位相角θも変化す
る。従って、位相角θを測定することにより、抵抗値の
変化、即ち導電性薄膜の状態を検査することができる。The complex impedance vector recorded by the recorder 14 changes at a constant phase angle θ due to a forcible change in the one-way positional relationship between the striatum 1 and the detection coil 10 as shown in FIG. . This phase angle θ becomes a constant phase angle θ if the resistance value of the conductive thin film of the striatum 1 is constant,
If the resistance value changes, the phase angle θ also changes as shown in FIG. Therefore, by measuring the phase angle θ, it is possible to inspect the change in the resistance value, that is, the state of the conductive thin film.
なお、温度ドリフト等で複素インピーダンスベクトル
がＸ−Ｙ座標の０点を通らないときには、Ｘ−Ｙ座標を
移動させてその０点を通るようにすればよい。When the complex impedance vector does not pass through the zero point of the XY coordinate due to temperature drift or the like, the XY coordinate may be moved so as to pass through the zero point.
第４図は、本発明に係る導電性薄膜検査方法を実施す
る装置の第２実施例を示したものである。なお、第１図
と対応する部分には、同一符号をつけて示している。本
実施例の渦電流検出センサ８は、水平向きの検出コイル
10の外周が樹脂11で一体にモールドされ、かつ該検出コ
イル10の孔に沿って貫通孔15が水平に設けられ、該貫通
孔15を線条体１が貫通するようになっている。その他の
構成は、第１実施例と同様に構成されている。FIG. 4 shows a second embodiment of the apparatus for performing the conductive thin film inspection method according to the present invention. Parts corresponding to those in FIG. 1 are denoted by the same reference numerals. The eddy current detection sensor 8 of the present embodiment has a detection coil oriented in the horizontal direction.
The outer periphery of 10 is integrally molded with resin 11, and a through hole 15 is provided horizontally along the hole of the detection coil 10, so that the striated body 1 passes through the through hole 15. Other configurations are the same as those of the first embodiment.
このようにしても、第１実施例とほぼ同様にして検査
をすることができる。Even in this case, the inspection can be performed in substantially the same manner as in the first embodiment.
第６図は、本発明に係る導電性薄膜検査方法を実施す
る装置の第３実施例を示したものである。なお、第１図
と対応する部分には、同一符号をつけて示している。FIG. 6 shows a third embodiment of the apparatus for performing the conductive thin film inspection method according to the present invention. Parts corresponding to those in FIG. 1 are denoted by the same reference numerals.
本実施例では、渦電流検出センサ８に加振機７を取付
け、この渦電流検出センサ８の方を線条体１に対して接
近・離間する方向に振動させるようにしたものである。In the present embodiment, a vibration exciter 7 is attached to the eddy current detection sensor 8, and the eddy current detection sensor 8 is caused to vibrate in a direction approaching / separating from the striatum 1.
このようにしても第１実施例とほぼ同様の効果を得る
ことができる。Even in this case, substantially the same effects as in the first embodiment can be obtained.
具体例 検出コイルの内径 1.6mm 検出コイルの線径 0.05mm 検出コイルのターン数 180 検出コイルの長さ 10mm 検出コイルに流す 電流の周波数 2MHz 加振機の振動数 60〜100Hz アモルファスカーボンよりなるハーメチック被覆を施
した光ファイバとして抵抗値が1cm当り次の値を示すサ
ンプルa,b,c,dを用いて実験したところ、次のような結
果が得られた。Specific example Detection coil inner diameter 1.6 mm Detection coil wire diameter 0.05 mm Number of turns of detection coil 180 Length of detection coil 10 mm Frequency of current flowing through detection coil 2 MHz Frequency of shaker 60 to 100 Hz Hermetic coating made of amorphous carbon An experiment was performed using samples a, b, c, and d having the following values per 1 cm as the optical fiber subjected to the test, and the following results were obtained.
サンプルa: 4.6KΩ/cm サンプルb: 7.0KΩ/cm サンプルc: 9.3KΩ/cm サンプルd:18.5KΩ/cm この場合、サンプルａのハーメチック被覆の膜厚は厚
く、サンプルb,c,dと徐々に膜厚が薄くなり、サンプル
ｄが最も膜厚が薄い。Sample a: 4.6KΩ / cm Sample b: 7.0KΩ / cm Sample c: 9.3KΩ / cm Sample d: 18.5KΩ / cm The thickness of the sample d is the thinnest.
このようなサンプルａ〜ｄに対して本発明の検査方法
で検査をしたところ、第７図に示すような結果が得られ
た。When such samples a to d were inspected by the inspection method of the present invention, the results shown in FIG. 7 were obtained.
この場合、各サンプルの複素インピーダンスベクトル
の位相角θａ〜θｄは θａ＝21゜ θｂ＝19゜ θｃ＝13゜ θｄ＝ 6゜ であった。In this case, the phase angle theta a through? D of the complex impedance vector of each sample was theta a = 21 ° theta b = 19 DEG theta c = 13 ° theta d = 6 °.
上記各実施例では、被検査物が走行している場合につ
いて示したが、該被検査物が走行していない場合でも本
発明の方法により導電性薄膜の検査ができることは勿論
である。In each of the above embodiments, the case where the object to be inspected is running is shown. However, it is needless to say that the conductive thin film can be inspected by the method of the present invention even when the object to be inspected is not running.
また、被検査物は線条体に限定されるものではなく、
板状等その形状に拘らず本発明の検査は実施できるもの
である。In addition, the inspected object is not limited to the striatum,
The inspection of the present invention can be carried out irrespective of its shape such as a plate shape.
更に、被検査物と渦電流検出センサとはいずれか一方
を動かすのではなく、双方を同じ方向上でそれぞれ同じ
向き或いは逆向きに動かしてもよい。Further, instead of moving either the inspection object or the eddy current detection sensor, both of them may be moved in the same direction in the same direction or in the opposite direction.
［発明の効果］ 以上説明したように本発明に係る導電性薄膜検査方法
では、渦電流検出センサの検出コイルと被検査物の検査
部位との位置関係を接近・離間する状態となるように一
方向に変位させるので、離間状態では検出コイルの複素
インピーダンスが零になり、接近させると該複素インピ
ーダンスが大きくなり、位置関係の変化により複素イン
ピーダンスベクトルは一定の位相角θで変化することに
なる。この位相角θは、導電性薄膜の抵抗値が一定であ
れば一定の位相角となり、抵抗値が変れば位相角θも変
化する。従って、位相角θを測定することにより、導電
性薄膜の状態を検査することができる。[Effects of the Invention] As described above, in the conductive thin film inspection method according to the present invention, the positional relationship between the detection coil of the eddy current detection sensor and the inspection site of the inspection object is set so as to approach or separate. In the separated state, the complex impedance of the detection coil becomes zero, and when approaching, the complex impedance increases, and the complex impedance vector changes at a constant phase angle θ due to a change in the positional relationship. The phase angle θ becomes a constant phase angle when the resistance value of the conductive thin film is constant, and the phase angle θ changes when the resistance value changes. Therefore, the state of the conductive thin film can be inspected by measuring the phase angle θ.
第１図は本発明の方法を実施する装置の第１実施例を示
す一部縦断側面図、第２図は本発明の方法による測定結
果を示す複素インピーダンスベクトル図、第３図は被検
査物表面の薄膜の抵抗値を変えたときのベクトル変化を
示す複素インピーダンスベクトル図、第４図は本発明の
方法を実施する装置の第２実施例を示す一部縦断側面
図、第５図は通常の渦電流検出法による同一抵抗値の場
合の測定値の変化を示す複素インピーダンスベクトル
図、第６図は本発明の方法を実施する装置の第３実施例
を示す一部縦断側面図、第７図は本発明の方法による抵
抗値が既知の各サンプルの測定結果を示す複素インピー
ダンスベクトル図である。 １……線条体（被検査物）、2,3……ガイドロール、７
……加振機、８……渦電流検出センサ、９……コア、10
……検出コイル、11……樹脂、12……コード、13……送
受信器、14……レコーダ。FIG. 1 is a partially longitudinal side view showing a first embodiment of an apparatus for carrying out the method of the present invention, FIG. 2 is a complex impedance vector diagram showing measurement results by the method of the present invention, and FIG. A complex impedance vector diagram showing a vector change when the resistance value of the thin film on the surface is changed, FIG. 4 is a partially longitudinal side view showing a second embodiment of an apparatus for implementing the method of the present invention, and FIG. FIG. 6 is a complex impedance vector diagram showing a change in measured value in the case of the same resistance value by the eddy current detection method of FIG. 6, FIG. 6 is a partially longitudinal side view showing a third embodiment of the apparatus for implementing the method of the present invention, The figure is a complex impedance vector diagram showing a measurement result of each sample having a known resistance value according to the method of the present invention. 1 ... striatum (inspection object), 2, 3 ... guide roll, 7
... vibrator, 8 ... eddy current detection sensor, 9 ... core, 10
…… Detection coil, 11… Resin, 12 …… Code, 13… Transceiver, 14… Recorder.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 日比野 俊 東京都豊島区東池袋３―21―18 日本渦 電流株式会社内 (56)参考文献 特開 平１−318976（ＪＰ，Ａ) 特開 昭61−96401（ＪＰ，Ａ) 特開 昭58−35455（ＪＰ，Ａ) 実開 昭63−113957（ＪＰ，Ｕ) 特公 昭58−24739（ＪＰ，Ｂ２) ──────────────────────────────────────────────────続 き Continuation of front page (72) Inventor Shun Hibino 3-21-18 Higashiikebukuro, Toshima-ku, Tokyo Inside Japan Eddy Current Corporation (56) References JP-A 1-318976 (JP, A) JP-A Sho 61 JP-A-58-35455 (JP, A) JP-A-63-113957 (JP, U) JP-B-58-24739 (JP, B2)
Claims (1)
膜の状態を渦電流検査法で検査する導電性薄膜検査方法
において、渦電流検出センサの検出コイルと前記被検査
物の検査部位との位置関係が相対的に接近・離間する状
態となるように少なくとも一方を一方向に変位させ、前
記導電性薄膜の検査部位の渦電流による前記検出コイル
の複素インピーダンス変化に基づく該複素インピーダン
スの位相角の変化から前記導電性薄膜の状態を検査する
ことを特徴とする導電性薄膜検査方法。1. A conductive thin film inspection method for inspecting a state of a conductive thin film coated on a surface of an inspection object by an eddy current inspection method, wherein a detection coil of an eddy current detection sensor and an inspection portion of the inspection object are provided. At least one of them is displaced in one direction so that the relative position of the complex impedance is relatively close to / separated from that of the conductive thin film. A method for inspecting a conductive thin film, comprising: inspecting a state of the conductive thin film from a change in a phase angle.
Priority Applications (10)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14033290A JP2733544B2 (en) | 1990-05-30 | 1990-05-30 | Conductive thin film inspection method |
| CA002043347A CA2043347A1 (en) | 1990-05-30 | 1991-05-28 | Method and system for inspection of electroconductive film using eddy current and process and system for production of optical fibres using method and system |
| DE69131059T DE69131059T2 (en) | 1990-05-30 | 1991-05-29 | Method and device for examining an electrically conductive film with eddy currents and their use for the production of optical glass fibers |
| AT91108787T ATE178406T1 (en) | 1990-05-30 | 1991-05-29 | METHOD AND DEVICE FOR EXAMINING AN ELECTRICALLY CONDUCTIVE FILM WITH EDDY CURRENTS AND THEIR APPLICATION TO THE PRODUCTION OF OPTICAL GLASS FIBERS |
| EP91108787A EP0459441B1 (en) | 1990-05-30 | 1991-05-29 | Method and system for inspection of electroconductive film using eddy current and process and system for production of optical fibers using method and system |
| KR1019910008830A KR910020449A (en) | 1990-05-30 | 1991-05-29 | Conductive film inspection method and inspection system |
| US07/707,744 US5262726A (en) | 1990-05-30 | 1991-05-30 | Method and system for inspection of electroconductive film using eddy current |
| US08/120,442 US5548213A (en) | 1990-05-30 | 1993-09-14 | Method and system for forming and inspecting an electroconductive film on optical fibers and substrates using eddy current to measure electrical resistance |
| KR1019940034867A KR950006458B1 (en) | 1990-05-30 | 1994-12-17 | Method and system for production of optical fiber |
| US08/558,224 US5672193A (en) | 1990-05-30 | 1995-11-17 | Production apparatus for producing an optical fiber cable |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14033290A JP2733544B2 (en) | 1990-05-30 | 1990-05-30 | Conductive thin film inspection method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0432761A JPH0432761A (en) | 1992-02-04 |
| JP2733544B2 true JP2733544B2 (en) | 1998-03-30 |
Family
ID=15266364
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14033290A Expired - Fee Related JP2733544B2 (en) | 1990-05-30 | 1990-05-30 | Conductive thin film inspection method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2733544B2 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4451111B2 (en) * | 2003-10-20 | 2010-04-14 | 株式会社荏原製作所 | Eddy current sensor |
| US7239133B1 (en) * | 2006-01-19 | 2007-07-03 | General Electric Company | Methods and systems for controlling the temperature stability of an inductor |
| JP5094320B2 (en) * | 2007-10-11 | 2012-12-12 | 株式会社荏原製作所 | Polishing monitoring method, polishing apparatus, and monitoring apparatus |
-
1990
- 1990-05-30 JP JP14033290A patent/JP2733544B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0432761A (en) | 1992-02-04 |
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