JP2688327B2 - Development processing equipment - Google Patents

Development processing equipment

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Publication number
JP2688327B2
JP2688327B2 JP6183545A JP18354594A JP2688327B2 JP 2688327 B2 JP2688327 B2 JP 2688327B2 JP 6183545 A JP6183545 A JP 6183545A JP 18354594 A JP18354594 A JP 18354594A JP 2688327 B2 JP2688327 B2 JP 2688327B2
Authority
JP
Japan
Prior art keywords
processing
liquid
film
pair
supply
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP6183545A
Other languages
Japanese (ja)
Other versions
JPH0844034A (en
Inventor
良作 澤田
憲作 澤田
幸作 澤田
宗作 澤田
幹夫 松井
Original Assignee
株式会社阪神技術研究所
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式会社阪神技術研究所 filed Critical 株式会社阪神技術研究所
Priority to JP6183545A priority Critical patent/JP2688327B2/en
Priority to US08/406,055 priority patent/US5528329A/en
Priority to EP95108468A priority patent/EP0695970A1/en
Publication of JPH0844034A publication Critical patent/JPH0844034A/en
Application granted granted Critical
Publication of JP2688327B2 publication Critical patent/JP2688327B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03DAPPARATUS FOR PROCESSING EXPOSED PHOTOGRAPHIC MATERIALS; ACCESSORIES THEREFOR
    • G03D3/00Liquid processing apparatus involving immersion; Washing apparatus involving immersion
    • G03D3/08Liquid processing apparatus involving immersion; Washing apparatus involving immersion having progressive mechanical movement of exposed material
    • G03D3/13Liquid processing apparatus involving immersion; Washing apparatus involving immersion having progressive mechanical movement of exposed material for long films or prints in the shape of strips, e.g. fed by roller assembly
    • G03D3/132Liquid processing apparatus involving immersion; Washing apparatus involving immersion having progressive mechanical movement of exposed material for long films or prints in the shape of strips, e.g. fed by roller assembly fed by roller assembly

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photographic Processing Devices Using Wet Methods (AREA)
  • Photographic Developing Apparatuses (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、医療、工業および汎用
分野において、光学的またはX線等の放射線により撮影
された感光フイルムや印画紙の現像処理に用いられる現
像処理装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a development processing apparatus used for development processing of a photosensitive film or photographic paper photographed optically or by radiation such as X-ray in medical, industrial and general fields.

【0002】[0002]

【従来の技術】医療、工業および汎用分野において、光
学的またはX線等の放射線により撮影され、かつ早期に
結果が求められる感光フイルムの現像処理には、通常、
所定の処理容器に現像処理液(現像液・定着液・現像定
着液など、以下単に処理液という)を取り分けて溜め、
その中に感光フイルム(以下単にフイルムという)を浸
漬して現像した後、空中を移送して次の処理容器で定着
処理する方法が採用され、また、処理量および処理頻度
が高い場合には、移送ローラ等の搬送手段を附設した比
較的容量の大きな溶液槽などに処理液を収容し、フイル
ムを連続的に経由させて現像処理する方法が採用されて
いる。
2. Description of the Related Art In the medical, industrial and general-purpose fields, a photosensitive film which is photographed by radiation such as optical or X-ray and requires an early result is usually processed.
Store the development processing solution (development solution / fixing solution / developing / fixing solution, etc., simply referred to as processing solution) in a predetermined processing container
A photosensitive film (hereinafter simply referred to as a film) is immersed in the film to develop the film, and then the film is transferred in the air and fixed in the next processing container. Also, when the processing amount and the processing frequency are high, A method has been adopted in which a processing solution is stored in a solution tank having a relatively large capacity provided with a transporting means such as a transfer roller, and the film is continuously processed for development processing.

【0003】ところで、一般に処理液を収容する処理容
器や槽は、フイルムを装入・出させるために、大気中に
開口されているので、収容された処理液は、繰り返し使
用によって特性が低下すると共に、液面における酸化に
より時経劣化する。更にまた、移送ローラ等の処理機器
の液面まわりに付着した処理液は、乾燥固化や結晶化し
て処理フイルムの損傷因子となる。従って、これら従来
の現像処理方法では、安定した現像処理を継続するため
には、処理液の特性変化を継続的に管理して適時に補充
または交換することと、処理機器の液面まわりを頻繁に
清掃して処理液の乾燥固化物および結晶化物を除去する
ことが必要とされる。
By the way, in general, the processing container or tank for containing the processing liquid is opened to the atmosphere for loading and unloading the film, so that the characteristics of the contained processing liquid are deteriorated by repeated use. At the same time, it deteriorates with time due to oxidation on the liquid surface. Furthermore, the processing liquid attached around the liquid surface of the processing equipment such as the transfer roller is dried and solidified or crystallized to become a factor for damaging the processing film. Therefore, in these conventional development processing methods, in order to continue stable development processing, the characteristic changes of the processing liquid are continuously managed and replenished or replaced in a timely manner, and the liquid level around the processing equipment is frequently changed. It is required to remove the dried solidified substance and the crystallized substance of the processing liquid by cleaning.

【0004】しかし、それら処理液および機器の管理は
比較的煩雑であるため、実際には、処理液の補充・交換
や機器清掃の時期を失して、貴重な映像が不鮮明となっ
たり損傷したりするという問題を往々にして引き起こし
ている。また、交換時期に達した処理液は、関連諸法規
に則る中和処理等を施して廃棄する必要があり、その使
用量が多いほど、廃液処理のコストおよび手数が多くな
るので、より少量の処理液で安定した現像処理ができ、
かつ処理機器の清掃を不要または軽減でき、しかもコン
パクトな構成の現像処理装置が要望されていた。
However, since management of these processing liquids and equipment is relatively complicated, in reality, the time for replenishment / replacement of processing liquids and equipment cleaning is lost, and valuable images become unclear or damaged. It often causes the problem of In addition, the treatment liquid that has reached the time of replacement must be subjected to neutralization treatment, etc. in accordance with relevant laws and regulations, and then discarded. The larger the amount used, the more costly and troublesome the waste liquid treatment becomes. Stable development can be performed with the processing liquid of
Moreover, there has been a demand for a developing processing apparatus which can eliminate or reduce cleaning of processing equipment and has a compact structure.

【0005】本発明者らは、上記要望に対応するための
改善検討を鋭意継続しているもので、その一環として、
スリット状に形成したフイルム出入口を冠水させること
で、内部に収容した処理液の酸化による劣化を抑制する
と共に、乾燥固化や結晶化を防いでフイルムの損傷を防
止できる現像処理タンク(特許第 1773397号および第17
73398号)を開発し、更にこれに検討を加えて、水槽内
に、前後にスリット状のフイルム出入口を設けた偏平状
の液室を有する処理容器を配置し、その液室内に処理液
を送給して横方向に往復流動させることで、通過するフ
イルムに処理液を均等に接触させて現像処理する構成と
して、極少量の処理液で安定した現像処理が達成できる
と共に、煩雑な処理液の補充・交換管理や機器清掃を不
要にすることのできる現像処理装置を提案(特願平4-17
21号)した。
The inventors of the present invention have been enthusiastically working on improvement studies to meet the above-mentioned demand.
By submersing the slit-shaped film inlet and outlet, it is possible to prevent deterioration of the processing liquid stored inside due to oxidation, and to prevent drying and solidification and crystallization to prevent film damage (Patent No. 1773397) And 17th
No. 73398) was developed and further investigated, and a treatment container having a flat liquid chamber with slit-shaped film inlets and outlets in the front and back was placed in the water tank, and the treatment liquid was sent into the liquid chamber. By supplying and reciprocally flowing in the lateral direction, the processing solution is brought into uniform contact with the passing film to perform development processing, and stable development processing can be achieved with an extremely small amount of processing solution, and complicated processing solution Proposal of a development processing device that eliminates the need for replenishment / replacement management and equipment cleaning (Japanese Patent Application No. 4-17)
No. 21)

【0006】また続いて、上記先願の現像処理装置に更
に改善を加え、本願に先立って、水槽内に、小容積の液
室を有する処理容器を配置し、かつ、フイルムを移送す
る回転ローラを処理容器の一構成部とした構成のもと
で、回転ローラの摺動部をその両側端面に限定しても液
室の液封が果たせると共に、通過するフイルムに対する
処理液の接触速度(攪拌速度)を安定して高めることが
でき、よって消費動力を低く抑えることができると共
に、極少量の処理液でもってむらの無い安定した現像処
理を連続かつ迅速に達成できる現像処理装置を提案(特
願平5-143678号および該特願平5-143678号による優先権
主張に基づく特願平6-19462 号)した。
Further, subsequently, by further improving the developing processing apparatus of the above-mentioned prior application, prior to the present application, a processing container having a small volume liquid chamber is arranged in a water tank, and a rotating roller for transferring a film. Under the condition that the rotary roller is limited to the both side surfaces of the rotary roller, the liquid can be sealed in the liquid chamber and the contact speed of the processing liquid with respect to the passing film (agitation (Development speed) can be stably increased, power consumption can be suppressed to a low level, and a development processing device that can achieve stable development processing without unevenness with an extremely small amount of processing liquid continuously and quickly is proposed. Japanese Patent Application No. 5-143678 and Japanese Patent Application No. 619462 based on the priority claim by the Japanese Patent Application No. 5-143678).

【0007】この先願の現像処理装置は、その1実施例
の概要説明図である〔図8〕に示すように、2対の回転
ローラ(33),(33')を所定小間隔を隔てて配すると共に、
この2対の回転ローラ(33),(33')間の上下両側を、上下
で対シールローラ(34),(34')によって閉塞する一方、そ
れらローラの両側に対の支持端板(35),(35')を配し、2
対の回転ローラ(33),(33')と2つのシールローラ(34),
(34')と両側の支持端板(35),(35')とで画成された小容
積の液室(32a) を形成せしめてなる処理容器(32)を、そ
の両側の支持端板(35),(35')を共用化させることで、フ
イルム(F) の移送方向に3つ配列して、水槽(31)内に配
置した構成としている。
In the developing processing apparatus of this prior application, as shown in FIG. 8 which is a schematic explanatory view of the first embodiment, two pairs of rotating rollers (33) and (33 ') are arranged at a predetermined small interval. As well as
The upper and lower sides between the two pairs of rotary rollers (33) and (33 ') are closed by paired seal rollers (34) and (34') at the upper and lower sides, and a pair of support end plates (35 ), (35 ')
A pair of rotating rollers (33), (33 ') and two sealing rollers (34),
(34 ') and the supporting end plates (35), (35') on both sides define a processing container (32) formed by forming a small-volume liquid chamber (32a). By sharing (35) and (35 '), three films (F) are arranged in the transfer direction and arranged in the water tank (31).

【0008】また、各処理容器(32)は、水槽(31)内に供
給された浄水(W) 中に浸漬されると共に、その液室(32
a) は、 (a)図のA−A断面図である (b)図に示すよう
に、両側の給排液口(35a),(35a')を、液管(38)を介して
液循環ポンプ(40)に接続されて閉回路に形成され、その
液管(38)には小型の抜気槽(39)が介装されている。ま
た、各処理容器(32)の液室(32a) 内には、偏平状の液流
孔部(36a) を有するフイルム案内兼整流具(36)が配され
ている。一方、各対の回転ローラ(33),(33')は、減速機
付モータ(42)で駆動されて点Pを中心に回転する駆動平
歯車(41)によって同期回転させられる。また、その前部
にはフイルムガイド(37)が、後部には通風筒(43)がそれ
ぞれ配されており、この構成のもとで、各液室(32a) の
液封を果たしながらフイルム(F) をUの字状に移送し
て、各処理容器(32)内を通過させる。そして、この先願
の現像処理装置では、第1の処理容器(32)に現像液、第
2の処理容器(32)に定着液をそれぞれ循環送給すると共
に、第3の処理容器(32)に浄水(W) を送給し、かつ通風
筒(43)に温風を送給しながら、フイルム(F) をUの字状
に移送し、水槽(31)内の水中を経て3つの処理容器(32)
の液室(32a) 内を通過させて、現像〜定着〜水洗〜乾燥
の処理を連続的に施して現像処理する。
Further, each processing container (32) is immersed in the purified water (W) supplied into the water tank (31), and its liquid chamber (32)
(a) is a cross-sectional view taken along the line A-A in (a). As shown in (b), liquid supply / drain ports (35a), (35a ') on both sides are connected via a liquid pipe (38). The liquid pipe (38) is connected to the circulation pump (40) to form a closed circuit, and a small degassing tank (39) is interposed in the liquid pipe (38). Further, in the liquid chamber (32a) of each processing container (32), a film guide / rectifier (36) having a flat liquid flow hole (36a) is arranged. On the other hand, each pair of rotating rollers (33), (33 ') is driven by a motor (42) with a speed reducer to be synchronously rotated by a drive spur gear (41) which rotates about a point P. In addition, a film guide (37) is arranged in the front part of the film, and a ventilation tube (43) is arranged in the rear part of the film guide. F) is transferred in a U shape and passed through each processing container (32). Then, in the development processing apparatus of this prior application, the developing solution is circulated to the first processing container (32) and the fixing solution is circulated to the second processing container (32), and the third processing container (32) is supplied. While supplying purified water (W) and warm air to the ventilation tube (43), the film (F) is transferred in a U-shape, and is passed through the water in the water tank (31) to the three treatment containers. (32)
The liquid is passed through the liquid chamber (32a) to continuously undergo development-fixing-washing-drying for development.

【0009】[0009]

【発明が解決しようとする課題】しかしながら、前記先
願の現像処理装置(特願平5-143678号、平6-19462 号)
について更に詳細に検討すると、通常感度のX線フイル
ムやモノクロームフイルムに対しては、前述のような優
れた効果が得られるものの、高感度のモノクロームフイ
ルム、またはカラーフイルムを現像処理しようとした場
合、更には、普通感度の長尺フイルムをより高速で現像
処理しようとした場合、次のような問題が派生し、これ
らが解決すべき課題として残されていることが判明し
た。
However, the development processing apparatus of the above-mentioned prior application (Japanese Patent Application Nos. 5-143678 and 6-19462).
In more detail, with respect to a normal-sensitivity X-ray film or a monochrome film, although the above-described excellent effects can be obtained, when a high-sensitivity monochrome film or a color film is developed, Furthermore, it has been found that when an attempt is made to develop a long film having a normal sensitivity at a higher speed, the following problems are caused and remain as problems to be solved.

【0010】例えば、医療分野におけるX線撮影に一般
的に用いられるスクリーンフイルム(増感紙使用の普通
感度フイルム)は、現像と定着に要する時間がほぼ等し
いので、現像と定着の時間比率を1:1として連続処理
できる。一方、従来より工業分野等で一般的に用いられ
ているノンスクリーンフイルム(増感紙を使用しない高
感度フイルム)は、X線照射量を少なくして被爆量低く
抑えられることより、近年の歯科におけるX線撮影に広
く用いられるようになっているが、これら高感度フイル
ムは、銀量を高めているため現像よりも定着に要する時
間が長く、その現像と定着時間の比率は1:1.5 以上で
ある。そして従来では、これら高感度フイルムを連続処
理する場合、一般に定着時間に合わせて、現像と定着の
時間比率を1:1としているが、その処理時間を短縮す
るために、現像時間の方に合わせて連続処理しようとす
ると、例えば静止処理液中では、現像液内よりも定着液
内の経由時間を1.5 以上大きくする必要がある。
For example, a screen film (normal sensitivity film using an intensifying screen) generally used for X-ray photography in the medical field requires almost the same time for developing and fixing, so that the developing and fixing time ratio is 1 : 1 can be continuously processed. On the other hand, non-screen films (high-sensitivity films that do not use intensifying screens), which have been generally used in the industrial field, have been used in recent years because the amount of X-ray irradiation can be reduced to reduce the exposure dose. However, these high-sensitivity films require a longer time for fixing than developing due to the high silver content, and the ratio of developing time to fixing time is 1: 1.5 or more. Is. Conventionally, when continuously processing these high-sensitivity films, the time ratio of development and fixing is generally set to 1: 1 in accordance with the fixing time, but in order to shorten the processing time, it is adjusted to the development time. If continuous processing is to be carried out, for example, in the stationary processing solution, it is necessary to increase the transit time in the fixing solution by 1.5 or more than in the developing solution.

【0011】ここで、前記先願の現像処理装置では、同
じ長さの各処理容器内を同じ経由時間でフイルムを通過
させるので、高感度フイルムの移送速度を高めてより短
時間で連続処理するには、第1の処理容器の液室に循環
送給する現像液の流速よりも、第2の処理容器の液室に
循環送給する定着液の流速を高くするか、またはそれら
処理液の濃度を調整して、現像反応と定着反応の速さに
差をもたせることが必要となる。また、普通感度の長尺
フイルムについも、その移送速度を高めて、全長通過時
間(Top to End)をより短縮するには、上記と同様に、各
処理容器の液室に循環送給する処理液の流速や濃度を調
整して、現像および定着反応をより促進させることが必
要となる。しかし、処理液の流速を高めれば高めるほど
流路抵抗が顕著に上昇して、その循環送給に大きな動力
が必要となり、また処理液の流速や濃度を一定限度を超
えて高めても、該処理液とフイルム表面の薬剤との間の
反応は必ずしも比例的には促進されないので、処理液の
濃度および流速の調整にはある限界が生じ、これがた
め、高感度フイルムの現像処理では、第1の処理容器に
送給する現像液の濃度または流速を低く抑えることが必
要となり、結果として処理時間が低く律速される。ま
た、普通感度の長尺フイルムでも、同様の理由により移
送速度の増速に制約を受け、結果として処理時間をより
短縮することが難しくなる。
Here, in the developing processing apparatus of the prior application, the film is passed through the processing containers of the same length in the same transit time, so that the transfer speed of the high-sensitivity film is increased and the continuous processing is performed in a shorter time. The flow rate of the fixing solution circulated and fed to the liquid chamber of the second processing container is set higher than the flow velocity of the developer circulated and fed to the liquid chamber of the first processing container, or It is necessary to adjust the density to give a difference in the speed of the development reaction and the fixing reaction. Also, for a long film with normal sensitivity, in order to increase the transfer speed and further shorten the total length transit time (Top to End), in the same manner as above, the process of circulating feeding to the liquid chamber of each processing container is performed. It is necessary to further accelerate the development and fixing reactions by adjusting the flow rate and concentration of the liquid. However, as the flow velocity of the treatment liquid is increased, the flow path resistance is remarkably increased, and a large amount of power is required to circulate and feed the treatment liquid, and even if the flow velocity and the concentration of the treatment liquid are increased beyond a certain limit, Since the reaction between the processing solution and the chemicals on the film surface is not necessarily promoted in a proportional manner, there is a certain limit in adjusting the concentration and flow rate of the processing solution, and therefore, in the development processing of the high-sensitivity film, It is necessary to keep the concentration or flow velocity of the developing solution fed to the processing container of 1. Further, even for a long film having a normal sensitivity, the increase of the transfer speed is restricted for the same reason, and as a result, it becomes difficult to further shorten the processing time.

【0012】一方、カラーフイルムの現像処理では、例
えば、発色現像〜停止〜硬膜〜水洗〜漂白〜水洗〜定着
〜最終水洗などの一連の処理において、水洗自体が特定
処理間の必須工程として組み込まれる。これに対して上
記先願の現像処理装置では、各処理容器の液室内を通過
したフイルムが、水槽内の水中を経て、次の処理容器の
液室に移送されるので、つまり各単位処理の都度に水洗
されることになるので、モノクロームフイルムでは問題
が生じないものの、カラーフイルムでは安定した現像処
理を達成し難くなる。
On the other hand, in the development processing of color film, for example, in a series of processing such as color development-stopping-hardening-water washing-bleaching-water washing-fixing-final water washing, water washing itself is incorporated as an essential step between specific treatments. Be done. On the other hand, in the development processing apparatus of the prior application, the film that has passed through the liquid chamber of each processing container is transferred to the liquid chamber of the next processing container through the water in the water tank, that is, in each unit processing. Since it is washed with water each time, there is no problem with a monochrome film, but it is difficult to achieve a stable development process with a color film.

【0013】更にまた、前記先願の現像処理装置では、
処理されるフイルムが、各単位処理の都度に水槽内の水
中を経て移送されることより、明室で現像処理せんとし
た場合、定着完了までの間のフイルムが感光しないよう
に、その水槽の上開口部を遮光フード等で完全に覆っ
て、該水槽内の水に光が入射されることを確実に防止す
る必要があり、これが取扱の容易性およびコンパクト化
に対する1阻害要因となるので、この点も改善すべき課
題として残されている。
Furthermore, in the development processing apparatus of the prior application,
Since the film to be processed is transferred through the water in the water tank at each unit processing, if the development processing is not carried out in a bright room, the film in the water tank will not be exposed until the fixing is completed. It is necessary to completely prevent the light from entering the water in the water tank by completely covering the upper opening with a light-shielding hood or the like, and this is one obstacle to ease of handling and downsizing. This point also remains as an issue to be improved.

【0014】本発明は上記課題を解決すべくなされたも
ので、複数の小容積の処理液室を有する処理装置を水槽
内に配置した構成のもとで、処理するフイルムに対する
遮光性を容易に確保でき、かつ、連続して行う各単位処
理それぞれの処理液内経由時間を適宜に設定することが
でき、もって、普通感度の長尺フイルムを始めとし、反
応時間の異なる複数処理が必要とされる高感度フイルム
やカラーフイルム等の各種フイルムについても、少量の
処理液でもってむらの無い安定した現像処理を連続かつ
迅速に達成できる現像処理装置の提供を目的とする。
The present invention has been made to solve the above-mentioned problems, and has a structure in which a processing apparatus having a plurality of small-volume processing liquid chambers is arranged in a water tank, and easily shields the film to be processed from light. It is possible to secure the time, and it is possible to appropriately set the transit time in each processing solution for each unit processing performed continuously.Therefore, it is necessary to carry out a plurality of processings having different reaction times including a long film of ordinary sensitivity. It is an object of the present invention to provide a developing processing apparatus capable of continuously and rapidly achieving stable developing processing without unevenness with a small amount of processing liquid, even for various films such as high-sensitivity film and color film.

【0015】[0015]

【課題を解決するための手段】上記の目的を達成するた
めに、本発明の請求項1に係る現像処理装置が採用した
手段は、平行配設された1対の支持端板の間に、フイル
ムの移送方向の前後に弾性材からなる周面を有する2対
の回転ローラが端面に低摩擦部材からなるシールリング
を介して所定小間隔を隔てて配設され、これら2対の回
転ローラ間の上下両側に、前後の回転ローラそれぞれの
外周に転接する弾性材からなる周面を有するシールロー
ラが端面に低摩擦部材からなるシールリングを介して配
設され、これら2対の回転ローラと上下のシールローラ
と1対の支持端板とに囲まれ、内部に回転ローラおよび
シールローラと非接触で、かつ1対の回転ローラそれぞ
れの転接面間を指向してスリット状に開口すると共に、
1対の支持端板に設けられた給排液口に連通する偏平状
の液流孔部を有するフイルム案内兼液流増速具が配設さ
れた小容積の処理液室を有する複数の処理装置が水槽内
にUの字状に配列されてなる現像処理装置であって、前
記処理装置の処理液室を隣合う1対の回転ローラ同志の
間のそれぞれに形成させると共に、前記シールローラを
上下で1対以上の奇数対にしたことを特徴とする。
In order to achieve the above object, a developing processing apparatus according to claim 1 of the present invention is adopted.
Means are provided between the pair of supporting end plates arranged in parallel to each other.
Two pairs having a peripheral surface made of an elastic material in the front and rear of the transfer direction
Seal ring whose rotary roller is made of low friction material on the end surface
Are arranged at a predetermined small distance via the
On both the upper and lower sides between the rolling rollers,
Seal row having a peripheral surface made of an elastic material that rolls on the outer periphery
Is installed on the end face via a seal ring made of low friction material.
These two pairs of rotating rollers and upper and lower seal rollers
And a pair of support end plates, and a rotary roller and
One pair of rotating rollers, each of which is in non-contact with the seal roller
Along the rolling contact surfaces, the slit-shaped openings are opened,
Flat shape that communicates with the liquid supply / drain ports provided on the pair of support end plates
A film guide and liquid flow speed increasing device having a liquid flow hole is installed.
Inside the water tank, multiple processing units with a small volume of processing liquid chamber
In a U-shaped arrangement , the processing liquid chamber of the processing device is provided with a pair of adjacent rotating rollers.
Rutotomoni is formed in each of between, the sealing roller
It is characterized in that an odd number of one or more pairs is formed above and below.

【0016】本発明の請求項2に係る現像処理装置が採
用した手段は、請求項1記載の現像処理装置において、
上記処理装置の各対の上側の回転ローラおよびシールロ
ーラの外径を、下側の回転ローラおよびシールローラの
外径よりも小径にしたことを特徴とする
A development processing apparatus according to claim 2 of the present invention is adopted.
The means used is the development processing apparatus according to claim 1,
The upper rotating roller and the seal roller of each pair of the above processing devices.
The outer diameter of the roller
The feature is that the diameter is smaller than the outer diameter .

【0017】本発明の請求項3に係る現像処理装置が採
用した手段は、請求項1または2記載の現像処理装置に
おいて、上記複数の処理装置のうち少なくとも1つの処
理装置の処理液室に、その一方側の給排液口に連結され
た管路を介して洗浄水供給手段を接続し、他方側の給排
液口に連結された管路を介して水槽内に連通させて解放
回路を形成させ、かつその他の処理装置それぞれの処理
液室に、その両側の給排液口それぞれに連結された管路
を介して液循環ポンプを接続して閉回路を形成させると
共に、その管路または液循環ポンプに処理液の供給管路
および抜気槽を接続したことを特徴とする
A development processing apparatus according to claim 3 of the present invention is adopted.
The means used is the development processing apparatus according to claim 1.
In addition, at least one of the plurality of processing devices is processed.
It is connected to the processing liquid chamber of the processing device and to the supply / drain port on one side.
Connect the wash water supply means via
Released by communicating with the inside of the water tank via the conduit connected to the liquid port
Form circuits and process other processing devices
Pipes connected to the liquid chamber and the supply and drain ports on both sides of the liquid chamber
When a liquid circulation pump is connected via
Both supply lines or supply lines for the processing liquid to the liquid circulation pump
And a deaeration tank are connected .

【0018】本発明の請求項4に係る現像処理装置が採
用した手段は、請求項3記載の現像処理装置において、
上記液循環ポンプが、処理装置の一方側の支持端板の各
給排液口に近接した位置を占めるように水槽内に配置す
ると共に、この液循環ポンプの吐出側ポートと他方側の
支持端板の給排液口とをこの処理装置の下部または側部
を迂回する形で配設した管路を介して接続する一方、こ
の液循環ポンプの吸引側ポートと前記一方側の支持端板
の給排液口とが最短距離を経るように配した管路を介し
て接続したことを特徴とする
A development processing apparatus according to claim 4 of the present invention is adopted.
The means used is the development processing apparatus according to claim 3,
The liquid circulation pump is used for each of the supporting end plates on one side of the processing device.
Place it in the water tank so that it occupies a position close to the water supply / drainage port.
In addition, the discharge side port of this liquid circulation pump and the other side
The support end plate supply and drain ports are connected to the bottom or side of this processor.
While it is connected via a pipeline that is circumvented,
Suction side port of the liquid circulation pump and the supporting end plate on the one side
Via the conduit that is arranged so that the shortest distance from the
It is characterized by being connected by .

【0019】[0019]

【作用】請求項1現像処理装置では、1対の支持端板
の間にシールリングを介して配設された回転ローラとシ
ールローラとによって水槽内の水の進入を防ぐ処理液室
が構成され、内部に設けられた1対の支持端板に設けら
れた給排液口に連通する偏平状の液流孔部を有するフイ
ルム案内兼液流増速具により処理液量が少なくて済み、
処理液が少量であっても処理液の横方向の流速が高めら
れるので、フイルム案内兼液流増速具を通るフイルムに
処理液が効果的に接触し、むらのない安定した現像処理
機能を発揮することができ、また処理装置の各処理液室
はUの字状に配列されているので、フイルムをUの字状
に移送して連続的に処理でき、すなわちフイルムを上方
から装入および送出することができ、これにより長尺な
フイルムについても取り扱いが容易になると共に、装置
の前後方向の長さを短縮して装置全体をコンパクトにす
ることができる。
According to the developing apparatus of the present invention, a pair of supporting end plates is provided.
Between the rotating roller and the roller
Processing chamber to prevent water from entering the water tank by the roller
And is mounted on a pair of support end plates provided inside.
With a flat liquid flow hole communicating with the liquid supply / drain port
The amount of processing liquid is small due to the Rum guide and the liquid flow speed increaser,
Even if the amount of processing solution is small, the lateral flow velocity of processing solution should be increased.
As the film passes through the film guide and liquid flow speed increasing device,
Stable development process with uniform contact of processing solution
Each processing liquid chamber of the processing equipment that can exert its function
Are arranged in a U-shape, so the film is U-shaped.
Can be continuously processed by transferring it to the upper part of the film
Can be loaded and unloaded from the
The film is easy to handle and the equipment
The overall length of the device is reduced by shortening the length in the front-back direction.
Can be

【0020】そして、初段の処理液室に送込まれたフィ
ルムは水中を通ることなく最終段の処理液室に到り、こ
の最終段の処理液室を出て初めて水中をとおる構成であ
るため、特定位置を占めて隣合う複数の処理液室に同種
の処理液を送給することで、それら複数の処理液室で同
じ処理液による処理を連続して行うことができる。
た、処理装置のシールローラは、上下で1対以上の奇数
対としているので、特定位置を占めて相前後する対の回
転ローラ間におけるシールローラの配置対数を変えるこ
とで、特定の処理液室のフイルム移送方向の長さを他の
処理液室の長さよりも長くすることができる。
Then, the fission liquid sent to the processing liquid chamber of the first stage is
Rum reaches the final processing liquid chamber without passing through the water,
It is a configuration that goes through the water for the first time after exiting the processing liquid chamber at the final stage of
Therefore, the same kind of treatment liquid chambers are
By supplying the processing solution of
The treatment with the same treatment liquid can be continuously performed. Ma
In addition, the seal rollers of the processing device have an odd number of one pair or more above and below.
Because it is a pair, it occupies a specific position
Change the logarithm of the arrangement of the seal rollers between the rolling rollers.
And the length of the specific processing liquid chamber in the film transfer direction
It can be longer than the length of the processing liquid chamber.

【0021】従って、これらの組み合わせにより、連続
して行う各単位処理それぞれにおける同一処理液内の経
由時間を適宜に設定することができ、よって特定の処理
液室内での処理液の濃度や流速を一定限度を超えて高め
ることなく、フイルム移送速度を高く設定して、処理時
間の異なる複数処理が必要とされる各種フイルムを連続
かつ迅速に現像処理することができる。また、このよう
に隣合った1対の回転ローラ同志の間に処理液室が形成
されてなる現像処理装置では、初段の処理液室の入り側
でのフイルムに対する遮光を行うだけで、処理中のフイ
ルに対する遮光も完全に達成でき、よって現像処理を明
室にて行うこともできる。
Therefore, by combining these, continuous
In the same treatment solution for each unit treatment
The free time can be set appropriately, so that the specific processing
Increase the concentration and flow velocity of the processing liquid in the liquid chamber beyond a certain limit
Without changing the film transfer speed,
Consecutive various films that require multiple different processes
And development processing can be performed quickly. Also like this
A processing liquid chamber is formed between a pair of rotating rollers adjacent to each other.
In the developing processing device, the entrance side of the first processing liquid chamber
Just shield the film from
The light can be completely shielded from light, thus making the development process transparent.
It can also be done in the room.

【0022】請求項2の現像処理装置では、処理装置の
各対の上側の回転ローラおよびシールローラの外径を、
下側の回転ローラおよびシールローラの外径よりも小径
にしているので、Uの字状に配列された各ローラの配列
および同配列下でのフイルムの移送を容易かつ安定なも
のとすることができる。
According to another aspect of the development processing apparatus of the present invention,
The outer diameter of the upper rotary roller and seal roller of each pair is
Smaller diameter than outer diameter of lower rotating roller and seal roller
Since it is set, the arrangement of each roller arranged in a U shape
And easy and stable transfer of film under the same arrangement
And can be.

【0023】請求項3の現像処理装置では、上記処理装
置の少なくとも1つの処理液室を、洗浄水供給手段に接
続すると共に水槽内に連通させて解放回路に形成し、か
つ、その他の処理液室を、管路を介して液循環ポンプに
接続して閉回路に形成しているので、それら閉回路に形
成された処理液室それぞれに一定かつ少量の処理液を循
環送給して横方向に流動させ、その少量の処理液にて一
連の処理を行う一方で、解放回路に形成された処理液室
を通して水槽内に水を連続送給すると共に、該処理液室
を通過するフイルムに対し、一連の処理で必要とされる
水洗処理を行うことができる。更にまた、閉回路を形成
する管路または液循環ポンプに処理液の供給管路および
抜気槽を接続しているので、その閉回路に処理液を充填
供給および任意時点に補充できると共に、その処理液を
充填ないしは補充する際に不可避的に混入した空気を抜
気槽によって排出し、各処理液室に循環送給する処理液
中に気泡が生じて現像処理精度が低下することを防止で
きる。
According to a third aspect of the development processing apparatus, in the above processing apparatus
The at least one processing liquid chamber of the
It continues to form a release circuit by communicating with the water tank,
One, the other processing liquid chamber to the liquid circulation pump through the conduit.
Since they are connected to form a closed circuit, the
A constant and small amount of processing solution is circulated in each processing solution chamber.
Circulate and flow in the horizontal direction.
Process liquid chamber formed in open circuit while performing continuous processing
Water is continuously fed into the water tank through the
Required for a series of processing for the film passing through
Washing with water can be performed. Furthermore, a closed circuit is formed.
Supply line or processing liquid supply line and
Since the degassing tank is connected, the closed circuit is filled with the processing liquid.
It can be supplied and replenished at any time, and its processing solution
When filling or refilling, unavoidably remove the mixed air.
Processing liquid discharged by air tank and circulated to each processing liquid chamber
It is possible to prevent the development processing accuracy from decreasing due to the formation of bubbles inside.
Wear.

【0024】請求項4の現像処理装置では、上記液循環
ポンプを処理装置に近接した水槽内 に配置するので、こ
の液循環ポンプと処理装置の各処理液室とを連通する液
管の管路長を短縮し、その閉回路の流路抵抗を低く抑え
て、処理液の循環送給に要する動力を低減でき、更に、
液循環ポンプや管路の接続部から処理液が漏洩した場合
でも、その漏洩処理液を水槽内の水中に拡散させ、装置
外に流出して周辺を汚損することを確実に防止できる。
また、その液循環ポンプの吸引側ポートと各処理液室の
一方の給排液口とを接続する液管の管路長を最短として
いるので、各処理液室への処理液の送給側管路の流路抵
抗よりも排出側管路の流路抵抗を低め、これによって処
理液室内での処理液を吸引する形態で流動させ、各処理
液室の内圧上昇による処理液の漏洩を防止することがで
きる。
In the developing apparatus of claim 4, the liquid circulation
Since the pump is placed in the water tank close to the processor , this
A liquid that connects the liquid circulation pump of
Shortens the pipe length and keeps the closed circuit flow resistance low
The power required to circulate the processing liquid can be reduced, and
When the processing liquid leaks from the liquid circulation pump or the connection part of the pipeline
However, the leakage treatment liquid is diffused into the water in the water tank,
It can be surely prevented from leaking out and polluting the surrounding area.
Also, the suction side port of the liquid circulation pump and each processing liquid chamber
Minimize the pipe length of the liquid pipe that connects one of the supply and drainage ports
Therefore, the flow path resistance of the pipeline on the feed side of the processing liquid to each processing liquid chamber
The flow path resistance of the discharge side pipeline is lower than that of the
The treatment liquid in the fluid chamber is made to flow in a suction form, and each treatment is performed.
It is possible to prevent the processing liquid from leaking due to an increase in the internal pressure of the liquid chamber.
Wear.

【0025】なお、上記の処理液とは、現像液、定着
液、現像定着液、カラー発色液、停止液、硬膜液、漂白
液、安定液、後処理液等の通常の現像処理およびカラー
現像処理に用いられる溶液および洗浄用の浄水である。
The above processing solutions are the developing solution and the fixing solution.
Solution, developing and fixing solution, color developing solution, stop solution, hardening solution, bleaching
Ordinary development processing and color of liquids, stabilizers, post-processing liquids, etc.
It is a solution used for development processing and purified water for washing.

【0026】[0026]

【実施例】本発明の実施例を図面を参照して、以下に説
明する。〔図1〕は本発明の第1実施例の現像処理装置
の概要構成を示す図面であって、 (a)図は一部を切欠い
て示す正面図、 (b)図は (a)図のA−A断面図である。
また、〔図2〕は同装置の液供給系の説明図、〔図
3〕は同装置の駆動系の説明図である。
Embodiments of the present invention will be described below with reference to the drawings.
I will tell. FIG. 1 is a development processing apparatus according to the first embodiment of the present invention.
FIG. 2 (a) is a drawing showing a schematic configuration of FIG.
And (b) is a sectional view taken along line AA in (a).
Also, [Fig. 2] is an explanatory diagram of a liquid supply system of the same device, [Fig.
[3] is an explanatory diagram of a drive system of the apparatus.

【0027】〔図1〕において、(1) は水槽で、この水
槽(1) は立方形の上開口式槽で、規制水面を形成する排
水口(1a)と、この排水口(1a)側の側辺部に設けられた排
水溜(1b)とを備えてなる。また、その内底部には水温調
整器(1c)が配設されている。 (2) は処理装置で、この処
理装置(2) はフイルム(F) を移送する8対の回転ローラ
(3),(3')を、中心点Pから等距離かつ前後両側が高位と
なる円弧に沿わせ、所定小間隔を隔てて配列すると共
に、これら8対の回転ローラ(3),(3')それぞれの間の上
下両側に、相前後する2対の回転ローラ(3),(3')の外周
に接して回転する上下で対のシールローラ(4),(4')を配
して、相前後する2対の回転ローラ(3),(3')の上側同士
および下側同士間を閉塞させる一方、それらローラの両
側に対の 支持端板(5),(5')を配することで、各対の回転
ローラ(3),(3')それぞれの間に、相前後する2対の回転
ローラ(3),(3')と上下で対のシールローラ(4),(4')およ
び両側の支持端板(5),(5')によって画成されると共に、
各対の回転ローラ(3),(3')で仕切られてフイルム(F) の
移送方向に連なる小容積の処理液室(2a)を形成し、これ
によって、No.1〜No.7の7つの処理液室(2a)を、上記円
弧上に連ねて設けてなる。
In FIG . 1, (1) is a water tank.
The tank (1) is a cubic upper-opening tank, which is a drainage forming a regulated water surface.
The water outlet (1a) and the drain provided on the side of the drain outlet (1a) side.
It is equipped with a water reservoir (1b). Also, the water temperature is adjusted on the inner bottom.
A leveling device (1c) is provided. (2) is a processing device.
The processing device (2) has eight pairs of rotating rollers for transferring the film (F).
(3) and (3 ') are equidistant from the center point P and the front and rear sides are high
Along the arc of
Between the 8 pairs of rotating rollers (3), (3 ')
Outer circumference of two pairs of rotating rollers (3) and (3 '), which are on both sides of the bottom
Place paired seal rollers (4) and (4 ') that rotate in contact with the
Then, the upper side of the pair of rotating rollers (3) and (3 ') that are adjacent to each other
And both sides of the rollers while blocking the space between the
Rotating each pair by placing a pair of support end plates (5), (5 ') on the side
Two pairs of rotations between the rollers (3) and (3 ')
Roller (3), (3 ') and seal roller (4), (4') and a pair of upper and lower
And the support end plates (5) and (5 ') on both sides,
Separated by each pair of rotating rollers (3), (3 '), the film (F)
Form a small volume processing liquid chamber (2a) that is continuous in the transfer direction.
The seven processing liquid chambers (2a) of No. 1 to No. 7 are
It is provided in series on the arc.

【0028】また、この処理装置(2) の、上方に位置す
る各回転ローラ(3) とシールローラ(4) の外径は、下方
に位置する各回転ローラ(3')とシールローラ(4')の外径
よりも小径とし、これにより各ローラを同一円弧上に沿
わせて配列することを容易すると共に、その配列下での
フイルム(F) の移送を容易にしている。一方、両側の支
持端板(5),(5')には、 (b)図に示すように、各処理液室
(2a)それぞれに連通する給排液口(5a),(5a')が設けてあ
る。
Further , the processing device (2) is located above.
The outer diameter of each rotating roller (3) and seal roller (4)
Outside diameter of each rotating roller (3 ') and sealing roller (4') located at
Smaller diameter, which allows each roller to follow the same arc.
It makes it easy to arrange them together and
It facilitates the transfer of film (F). On the other hand, the branches on both sides
Hold the end plates (5) and (5 ') as shown in Fig. (B).
(2a) There are supply and drain ports (5a) and (5a ') communicating with each.
You.

【0029】また、各回転ローラ(3),(3')およびシール
ローラ(4),(4')は、金属製の中心軸上にゴム製の胴部を
焼嵌成形してなる平ローラとされ、それぞれの両端部軸
を両側の支持端板(5),(5')を貫通して側方に突出させて
該支持端板(5),(5')に回転自由に軸支されている。更
に、それらローラの胴部両端面と支持端板(5),(5')の内
面との間には、 (b)図に示すように、それらローラと同
外径であって、摩擦係数の低いテフロンシートとシリコ
ンゴム板とを積層してなる平環状のシールリング(7) が
介装され、このシールリング(7) にて各ローラと支持端
板(5),(5')間が摺動抵抗の小さい状態で液封されてい
る。また、両側の支持端板(5),(5')は、その四隅部に配
された連結ロッド(5b)にて互いに平行に連結され、これ
によって支持端板(5),(5')と各ローラとが一体に組み立
てられている。
Further , each rotating roller (3), (3 ') and a seal
The rollers (4) and (4 ') have a rubber body on the central shaft made of metal.
It is a flat roller that is shrink-fitted, and each end shaft
Through the supporting end plates (5), (5 ') on both sides and project it to the side.
The supporting end plates (5) and (5 ') are rotatably supported by the shaft. Change
On both end surfaces of the rollers and the support end plates (5) and (5 ').
As shown in Fig. (B), it is the same as those rollers.
Teflon sheet and silicone with outer diameter and low friction coefficient
The flat ring-shaped seal ring (7)
This seal ring (7) is installed between each roller and support end.
The plates (5) and (5 ') are liquid-sealed with low sliding resistance.
You. Also, the support end plates (5) and (5 ') on both sides are arranged at the four corners.
Connected in parallel with each other with the connected connecting rod (5b),
The support end plates (5) and (5 ') and each roller are
Is being used.

【0030】また、各処理液室(2a)内には、前後がスリ
ット状に開口すると共に両側の支持端板(5),(5')の給排
液口(5a),(5a')に連通する偏平状の液流孔部(6a)を有す
るフイルム案内兼液整流具(6) が、両端を支持端板(5),
(5')に連結支持されて、回転ローラ(3),(3')およびシー
ルローラ(4),(4')とは非接触に配設されている。なお
このフイルム案内兼液整流具(6) は、押出成形されたポ
リビニールクロライド樹脂製のもので、その外周面に
は、回転ローラ(3),(3')とシールローラ(4),(4')の外径
に非接触で沿う円弧状の凹部が横幅方向に形成されてい
る。
In addition, each processing liquid chamber (2a) has a front and rear slot.
The support end plates (5) and (5 ') on both sides
It has a flat liquid flow hole (6a) communicating with the liquid ports (5a) and (5a ').
The film guide and liquid rectifier (6) that supports both ends supports the end plates (5),
Connected to and supported by (5 '), rotating rollers (3), (3') and sheet
The rollers (4) and (4 ') are arranged in non-contact with each other. In addition ,
This film guide and liquid straightener (6) is a
It is made of vinyl chloride resin and is
Is the outer diameter of the rotating rollers (3), (3 ') and the seal rollers (4), (4')
A non-contact arcuate recess is formed in the width direction.
You.

【0031】一方、この処理装置(2) の最前部に位置す
る対の回転ローラ(3),(3')の直上方には、フイルム(F)
を案内する偏平状の内孔を有すると共に、その内面に黒
色のテフロンコーテングを施したフイルム案内筒(13)
が、その両側端を両側の支持端板(5),(5')に支持され、
裾広がりとした下端を最前部の対の回転ローラ(3),(3')
の外周を覆う形で近接させて、前記円弧の接線方向に配
されている。また、このフイルム案内筒(13)は、ここで
は図示を省略したフイルム挿入暗箱またはフイルムカセ
ットを取り付けるために、上端を側方に向けて方形に開
口させている。 更に、最後部に位置する対の回転ローラ
(3),(3')の上方には、前後にフイルム(F) を通過させる
スリット状のフイルム通過口を有すると共に、その内側
下部に対の水切ローラ(14),(14')を配してなる通風筒(1
5)が、両側の支持端板(5),(5')に支持されて横方向に配
されている。また、この通風筒(15)は、ここでは図示を
省略した温風送給機(20)に開口端部を接続され、その温
風送給機(20)から送給された温風を、内側下部の対の水
切ローラ(14),(14')に吹き付けると共に、上側のフイル
ム通過口から排出させることで、その対の水切ローラ(1
4),(14')外周面の水分除去を容易にし、通過するフイル
ム(F) の水切りおよび乾燥を促進させる構成とされてい
る。
On the other hand, it is located at the forefront of this processing device (2).
Just above the pair of rotating rollers (3) and (3 '), the film (F)
Has a flat inner hole that guides
Film guide tube with colored Teflon coating (13)
Is supported on both sides by supporting end plates (5), (5 ') on both sides,
A pair of rotating rollers (3), (3 ') with the bottom end widened at the front
The outer circumference of the arc should be placed close to each other and placed in the tangential direction of the arc.
Have been. Also, this film guide tube (13) is
Is a film insertion dark box or film cassette (not shown).
To attach the hood, open it in a square
I'm talking. Furthermore, a pair of rotating rollers located at the rearmost part
Pass the film (F) back and forth above (3) and (3 ').
It has a slit-shaped film passage opening and its inside
A ventilation tube (1) with a pair of draining rollers (14), (14 ') at the bottom
5) is laterally supported by supporting end plates (5) and (5 ') on both sides.
Have been. The ventilation tube (15) is not shown here.
The open end is connected to the omitted hot air feeder (20),
Use the warm air sent from the air blower (20) to remove water from a pair of water
Spraying on the cutting rollers (14), (14 ') and the upper film
The drainage roller (1
4), (14 ') A film that facilitates the removal of moisture from the outer peripheral surface and passes through.
Is designed to facilitate draining and drying
You.

【0032】そして、この処理装置(2) は、最上部のシ
ールローラ(4) が、水槽(1) の規制水面よりも僅少に低
い高さ位置となり、その水槽(1) 内に給水した浄水(W)
中に各処理液室(2a)が完全に浸漬し、かつフイルム案内
筒(13)の上端開口部および通風筒(16)が規制水面上に位
置するように配置されると共に、その7つの処理液室(2
a)の内のNo.3とNo.7を除く5つの処理液室(2a)は、 (b)
図に示すように、それぞれの両側の給排液口(5a),(5a')
がゴム製の液管(8) を介して、水槽(1) 内に配置された
遠心型の液循環ポンプ(11)の接続されて、その処理液室
(2a)と液管(8)と液循環ポンプ(11)とからなる閉回路に
形成されている。
This processing device (2) has the uppermost system.
The roller (4) is slightly lower than the regulated water level in the aquarium (1).
The clean water (W) supplied to the aquarium (1) at a high position.
Each processing solution chamber (2a) is completely immersed in it, and the film guide
The top opening of the tube (13) and the ventilation tube (16) are above the regulated water surface.
The seven processing liquid chambers (2
Five processing liquid chambers (2a) except No. 3 and No. 7 in (a) are (b)
As shown in the figure, supply and drain ports (5a), (5a ') on each side
Was placed in the aquarium (1) via the rubber liquid pipe (8)
Centrifugal type liquid circulation pump (11) is connected and its processing liquid chamber
(2a), liquid pipe (8) and liquid circulation pump (11) in a closed circuit
Is formed.

【0033】また、液循環ポンプ(11)は、処理装置(2)
の各処理液室(2a)の一側方の給排液口(5a)に近接して配
され、かつ水槽(1) の規制水面上に配置された可変速モ
ータ(12)により駆動されると共に、その吐出側ポート
は、他側方の給排液口(5a') に迂回する形で接続された
液管(8) に連結され、これによって液循環ポンプ(11)の
吸引側ポートと給排液口(5a)とを接続する液排出側の液
管(8) の管路長が最短となり、その流路抵抗が、液送給
側の液管(8) の流路抵抗よりも低くなるようにされてい
る。また、管路長の長い液送給側の液管(8) には、それ
に連なる閉回路に処理液(L) を初期充填および点滴補給
するためのゴム製の注液管(10)が分岐接続されると共
に、高位となる部位に小型の抜気槽(9) が介装されてい
る。更に、その抜気槽(9) が備える抜気管(9a)の水面上
に位置する部位には液溢流管(9b)が分岐して設けてあ
り、かつその液溢流管(9b)は、ここでは図示を省略した
透明液送管を介して、水槽(1) の排水溜(1c)に連通され
ている。一方、注液管(10)には、ここでは図示を省略し
た密封式の処理液供給器に接続されている。
Further , the liquid circulation pump (11) is a processing device (2).
Of each processing solution chamber (2a) on one side of the chamber.
And the variable speed model installed on the regulated water surface of the water tank (1).
Driven by the motor (12) and its discharge side port
Was connected to the other side supply / drain port (5a ') in a detour manner.
It is connected to the liquid line (8), which allows the liquid circulation pump (11) to
Liquid on the discharge side that connects the suction side port to the liquid supply / discharge port (5a)
The pipe length of the pipe (8) is the shortest, and the flow resistance is
It is designed to be lower than the flow path resistance of the side liquid pipe (8).
You. Also, for the liquid pipe (8) on the liquid supply side with a long pipe length,
Initially fill and drip replenishment with processing liquid (L) in a closed circuit connected to
When the rubber injection pipe (10) for
In addition, a small degassing tank (9) is installed in the high-level area.
You. Furthermore, on the water surface of the deaeration pipe (9a) provided in the deaeration tank (9).
A liquid overflow pipe (9b) is diverged at the location
The liquid overflow pipe (9b) is not shown here.
It is connected to the drainage reservoir (1c) of the water tank (1) through the transparent liquid delivery pipe.
ing. On the other hand, the injection pipe (10) is not shown here.
It is connected to the sealed processing liquid feeder.

【0034】ここで、この処理装置(2) のNo.1とNo.2お
よびNo.4からNo.6の5つの処理液室(2a)は、前記構成の
もとで、〔図2〕に示すように、それぞれ独立した閉回
路に形成されているが、No.3とNo.7の処理液室(2a)は、
一側方の支持端板(5) の給排液口(5a)に連結された液管
(8) を介して、ここでは図示を省略した浄水(W) の供給
手段に接続されると共に、他側方の支持端板(5) の給排
液口(5a') に連結された液管(8) を介して水槽(1) 内に
連通されて、解放回路に形成されており、この液供給系
のもとで、No.1とNo.2およびNo.4〜No.6の5つの処理液
室(2a)に処理液(L) を循環送給する一方、No.3とNo.7の
2つの処理液室(2a)には浄水(W) を連続送給し、これら
処理液室(2a)内を通して水槽(1) 内に水を供給する。一
方、通風筒(15)には、水槽(1) の外側に配置された温風
送給機(20)から温風を送給する
Here, No. 1 and No. 2 of this processing device (2)
And 5 processing liquid chambers (2a) of No. 4 to No. 6 are
Originally, as shown in [Fig.2],
Although it is formed in the passage, the No. 3 and No. 7 processing liquid chambers (2a) are
Liquid pipe connected to the supply / drain port (5a) of the supporting end plate (5) on one side
Supply of purified water (W) not shown here via (8)
And the other end of the support end plate (5).
Inside the water tank (1) via the liquid pipe (8) connected to the liquid port (5a ').
This liquid supply system is connected to and formed in the release circuit.
No. 1 and No. 2 and No. 4 to No. 6 treatment solutions under
While circulating the processing liquid (L) to the chamber (2a), the No. 3 and No. 7
Purified water (W) is continuously fed to the two treatment liquid chambers (2a),
Water is supplied into the water tank (1) through the treatment liquid chamber (2a). one
On the other hand, in the ventilation tube (15), warm air placed outside the water tank (1)
The warm air is sent from the feeder (20) .

【0035】翻って、(17)は駆動平歯車であって、この
駆動平歯車(17)は、処理装置(2) の支持端板(5),(5')に
軸支されて、前記P点を中心に回転自由とされている。
また、この駆動平歯車(17)は、支持端板(5),(5')上に載
設された減速機付モー タ(19)のピニオン歯車(18)に歯合
されると共に、〔図3〕に示すように、各対の回転ロー
ラ(3),(3')それぞれの一方の端部軸に取着されて互いに
歯合している平歯車(16),(16')の、上方に位置する各平
歯車(16)に歯合されており、この駆動系のもとで、1つ
の減速機付モータ(19)によって、8対の回転ローラ(3),
(3')が同期回転させられる。一方、各シールローラ(4),
(4')は、フリーローラとされ、各対の回転ローラ(3),
(3')の回転に追従して同期回転させられる。
On the other hand, (17) is a drive spur gear,
The drive spur gear (17) is attached to the supporting end plates (5) and (5 ') of the processing device (2).
It is pivotally supported and is freely rotatable around the point P.
The drive spur gear (17) is mounted on the support end plates (5) and (5 ').
Meshes with the pinion gear (18) of the set have been motor with reduction gear (19)
As shown in [Fig. 3], each pair of rotating
La (3), (3 ') attached to one end shaft of each
The spur gears (16), (16 ') that mesh with each other
It is meshed with the gear (16) and, under this drive system, one
8 pairs of rotating rollers (3),
(3 ') is rotated synchronously. Meanwhile, each seal roller (4),
(4 ') is a free roller, and each pair of rotating rollers (3),
It is rotated synchronously following the rotation of (3 ').

【0036】上記構成の本実施例の現像処理装置では、
先ず、処理装置(2) のNo.3とNo.7の2つの処理液室(2a)
に清水(W) を連続送給することで、水槽(1) 内に清水
(W) を供給し、この処理容器(2) の各処理液室(2a)を清
水(W) 中に浸漬させる。続いて、各注液管(10)を介し
て、No.1とNo.2およびNo.4〜No.6の5つの処理液室(2a)
に連なる閉回路それぞれに処理液(L) を供給充填する。
このとき、互いに隣合って連なるNo.1とNo.2の2つの処
理液室(2a)に現像液、No.4〜No.6の3つの処理液室(2a)
に定着液をそれぞれ供給する。
In the developing processing apparatus of this embodiment having the above structure,
First, the two processing liquid chambers (2a) of No.3 and No.7 of the processing equipment (2)
By continuously feeding fresh water (W) to the water tank,
(W) is supplied to clean each processing liquid chamber (2a) of this processing container (2).
Immerse in water (W). Then, through each injection pipe (10)
5 treatment liquid chambers (2a), No. 1 and No. 2 and No. 4 to No. 6
Supply and fill the processing liquid (L) into each closed circuit connected to.
At this time, two processes, No. 1 and No. 2, which are next to each other and are connected
Developer in the solution chamber (2a), and three processing solution chambers (No.4 to No.6) (2a)
Supply fixer to each.

【0037】次いで、減速機付モータ(19)を駆動して処
理装置(2) の各ローラを回転させると共に、可変速モー
タ(12)により各液循環ポンプ(11)を駆動して充填された
処理液(L) を各処理液室(2a)を通して高速で循環させ
る。そして、抜気槽(9) からの抜気状態を確認しなが
ら、注液管(10)から処理液(L) を点滴補充して、各閉回
路に混入した空気を完全に抜気した後、通風筒(15)に温
風を送りながら、前部のフイルム案内筒(13)を介してフ
イルム(F) を装入し、このフイルム(F) を8対の回転ロ
ーラ(3),(3')によりUの字状に移送して7つの処理液室
(2a)内を通過させ、これによって現像〜中間水洗〜定着
〜最終水洗〜乾燥の処理を連続的に施して現像処理す
る。
Then, the motor with reduction gear (19) is driven to process.
While rotating each roller of the processing device (2),
The liquid circulating pump (11) was driven by the
The processing solution (L) is circulated at high speed through each processing solution chamber (2a).
You. Then, check the degassing state from the degassing tank (9).
From the injection pipe (10), replenish the treatment liquid (L) with drip, and close each
After completely degassing the air mixed in the path, warm the ventilation tube (15).
While sending the wind, the film is guided through the front film guide tube (13).
Insert the film (F) and rotate the film (F) with 8 pairs of rotating rolls.
7 processing solution chambers transferred in a U shape by rollers (3) and (3 ')
Pass through the inside of (2a), thereby developing ~ intermediate washing ~ fixing
~ Final water washing ~ Drying process is continuously applied to develop
You.

【0038】ここで、本実施例の現像処理装置では、各
処理液室内で横方向に流動する処理液中を横切るように
してフイルムを通過させるので、このフイルム表面に処
理液を均等に接触させて、その表面の薬剤層との間に所
期の反応を確実に生じさせることができる。また、フイ
ルム案内兼液整流具によって、各処理液室内の処理液
通路およびフイルム通過路の形状を整えると共に内容積
を小さくしているので、フイルムの通過を安定なものと
する一方で、処理液の流動を整流および増速させて、通
過するフイルム表面に処理液を均等かつ確実に接触させ
ると共に、その接触速度(攪拌速度)を高めることがで
きる。更に、処理液の充填供給および補給に際して、各
処理液室に連なる閉回路内に不可避的に混入した空気
を、抜気槽によって抜気することで、各処理液室内を高
速で流動させる処理液中に気泡が生じることを防止で
き、これらのことにより極少量の処理液で安定した現像
処理を連続かつ迅速に達成できる。
In the developing processing apparatus of this embodiment, each
As it traverses through the processing liquid that flows laterally in the processing liquid chamber
The film is then passed through, so the surface of the film is treated.
Make sure that the fluid is in contact evenly and that there is a space between the surface and the drug layer.
It is possible to surely generate the reaction of the period. Also, Hui
The flow of processing liquid in each processing liquid chamber is controlled by the liquid guide and liquid rectifier.
Adjusts the shape of the passage and the film passage, and also the inner volume
Is small so that the passage of the film is stable.
On the other hand, the flow of the processing liquid is rectified and accelerated to
Make sure that the processing liquid is evenly and surely contacted with the film surface.
And the contact speed (stirring speed) can be increased.
Wear. Furthermore, when filling and supplying the processing liquid,
Air unavoidably mixed in the closed circuit connected to the processing liquid chamber
Is degassed by the degassing tank to increase the inside of each processing liquid chamber.
It is possible to prevent bubbles from being generated in the processing liquid that flows at high speed.
Due to these, stable development is possible with a very small amount of processing liquid.
The processing can be achieved continuously and quickly.

【0039】また、隣合って連なるNo.1とNo.2の2つの
処理液室に現像液を、No.4〜No.6の3つの処理液室に定
着液を供給するので、一定速度で移送するフイルムに対
する現像液内と定着液内の通過時間の比率を1:1.5
にする一方で、それら現像液および定着液内それぞれで
の通過距離を大きくでき、その現像よりも定着に要する
時間が1.5倍前後で長い高感度フイルムを、現像液お
よび定着液の濃度や流速を一定限度を超えて調整するこ
となく、より高速度で移送してなお、安定した現像処理
を達成できる。
In addition, two No. 1 and No. 2 adjacent to each other are connected.
The developer is stored in the processing liquid chambers, and the processing liquid chambers are set in three processing liquid chambers No. 4 to No.
Since the liquid is supplied, it is suitable for films that are transported at a constant speed.
The ratio of the passage time between the developing solution and the fixing solution is 1: 1.5.
On the other hand, in the developer and fixer respectively
The passage distance can be increased, and fixing is required rather than development.
A high-sensitivity film with a long time of around 1.5 times
And the concentration and flow velocity of the fixer can be adjusted beyond a certain limit.
Stable development processing by transferring at higher speed
Can be achieved.

【0040】また、各ローラの胴部は弾性材であるゴム
で形成しているので、相互間の液封は回転しながらでも
保たれ、支持端板との間は両端部に介装されたシールリ
ングで保たれる。また、各対の回転ローラは上下からフ
イルムを挟持して回転することで、フイルムに疵を生じ
させることなく確実に移送して各処理液室内を通過させ
る一方で、各処理液室の液封機能を保持することができ
る。また、液封を果たす各ローラの摺動部はその胴部両
端路面に限定され、しかもその摺動部には摩擦係数の低
いシールリングを介装して回転に際する摺動抵抗を低く
しているので、当該現像装置の運転に要する消費動力を
低く抑えることができる。
The body of each roller is made of rubber, which is an elastic material.
Since it is formed by, even if the liquid seal between them is rotating
It is maintained and is sealed between the support end plate and both ends.
Be kept at Also, each pair of rotating rollers is
By pinching the film and rotating it, the film is damaged.
Transfer without fail to pass through each processing liquid chamber
On the other hand, it is possible to maintain the liquid sealing function of each processing liquid chamber.
You. Also, the sliding parts of the rollers that perform liquid sealing are
Limited to the end road surface, and the sliding part has a low coefficient of friction.
The sliding resistance at the time of rotation is lowered by interposing a seal ring.
Therefore, the power consumption required to operate the developing device is
It can be kept low.

【0041】また、各処理液室は水中に浸漬させるの
で、水圧とのバランスにより、それら処理液室内からの
処理液の漏出を抑制できる。更に、液循環ポンプの吸引
側ポートと各処理液室とを接続して排出側となる液管の
管路長を最短とし、その管路抵 抗を送給側となる液管の
管路抵抗よりも低くしているので、〔図2〕中に白抜き
矢印で示すように、各処理液室内での処理液を吸引する
形態で流動させて、各処理液室の内圧の上昇による処理
液の漏洩をより確実に抑制できる。また、各ローラの回
転に随伴して処理液室内から滲み出た極微量の処理液
は、水槽内の水中に拡散して自律的に希釈されて排水溜
に流出するので、その排水溜内の排水に中和剤を添加す
ることで、法規制を満足して廃棄可能なものとすること
もできる。更に、液循環ポンプも水槽内の水中に浸漬配
置するので、各処理液室および閉回路内の処理液と大気
との接触を完全に遮断して、処理液が酸化により特性劣
化したり、該処理装置の各ローラまわりで乾燥固化およ
び結晶化して処理されるフイルムを損傷させたりするこ
とを確実に防止できる。更にまた、液循環ポンプを水槽
内の処理装置に近接して配することで、各処理液室に連
通する液管の管路長を短縮して流路抵抗を低く抑えてい
るので、処理液の循環送給に要する動力を低減できると
共に、該液循環ポンプや管路の接続部から予測外の漏洩
が生じた場合でも、その漏洩処理液を水槽内の水中に拡
散させて装置外への流出を確実に防止でき、これらのこ
とより煩雑な機器清掃も不要にすることができる。
Further , each processing liquid chamber is immersed in water.
Therefore, due to the balance with the water pressure,
Leakage of the processing liquid can be suppressed. In addition, suction of liquid circulation pump
Of the liquid pipe on the discharge side by connecting the side port and each processing liquid chamber
The pipe length is shortest, the liquid pipe comprising the pipeline resistance and feeding side
Since it is lower than the conduit resistance, it is outlined in [Fig. 2].
As indicated by the arrow, aspirate the processing liquid in each processing liquid chamber.
Flowing in the form of a liquid, processing by increasing the internal pressure of each processing liquid chamber
Liquid leakage can be suppressed more reliably. In addition, each roller
Trace amount of processing solution that oozes out from the processing solution chamber accompanying the
Is diffused in the water in the aquarium and diluted autonomously
The neutralizing agent is added to the wastewater in the drainage reservoir.
By complying with laws and regulations, it should be disposable.
Can also. Furthermore, the liquid circulation pump is also submerged in the water in the water tank.
Since it is installed, the processing liquid and the atmosphere in each processing liquid chamber and closed circuit
Completely cuts off contact with the treatment liquid, resulting in oxidation of the treatment liquid
Or to dry and solidify around each roller of the processing device.
It may damage the film being crystallized and processed.
Can be reliably prevented. Furthermore, a liquid circulation pump is installed in the water tank.
By arranging them in close proximity to the internal processing equipment, they can be connected to each processing liquid chamber.
The flow path resistance is kept low by shortening the length of the liquid pipe that passes through.
Therefore, the power required to circulate and supply the processing liquid can be reduced.
Both, unexpected leakage from the liquid circulation pump and the connection part of the pipeline
Even if a leak occurs, the leaked liquid will spread into the water in the water tank.
It is possible to prevent these from leaking out of the device.
And more complicated device cleaning can be eliminated.

【0042】また、その処理装置が多数の処理液室を有
していても、それら処理液室を画成する各ローラを、前
後が高位となる円弧に沿って配列することで、該処理装
置の長さを短くできると共に、水槽の長さも短縮でき、
装置全体をコンパクトなものとすることができる。更
に、フイルムを上方から装入・送出してUの字状に移送
できるので、長尺なフイルムについても容易に取り扱う
ことができ、また一方、各処理液室の前後にフイルムを
移送する回転ローラを備えるので、短尺のフイルムにつ
いても安定に移送して現像処理することができる。
た、この現像処理装置では、入り側のフイルム案内筒に
挿入する際のフイルムに対する遮光を行うだけで、処理
中のフイルに対する遮光も完全に達成できるので、例え
ば、そのフイルム案内筒の上端開口に、前述のフイルム
挿入暗箱ないしはフイルムカセットを取り付けること
で、明室で現像処理することができる
Further , the processing apparatus has a large number of processing liquid chambers.
Even if the rollers that define the processing liquid chambers are
By arranging along the arc that becomes higher after
The length of the tank can be shortened, and the length of the water tank can also be shortened.
The entire device can be made compact. Change
The film is loaded and sent from above and transferred in a U shape.
This makes it easy to handle long films.
On the other hand, there is a film before and after each processing chamber.
Since it has a rotating roller for transferring, it can be used for short films.
Even if it is present, it can be stably transferred and developed. Ma
Also, with this development processing device, the film guide tube on the entrance side
Simply shield the film from light when inserting it
It can completely shield light from the inside film, so
The above-mentioned film at the top opening of the film guide tube.
Inserting a dark box or film cassette
Therefore, the development process can be performed in a bright room .

【0043】次に、本実施例装置による具体的な現像処
理例を、以下に述べる。 本実施例では上記構成のもと
で、処理装置(2) は、幅、長さおよび高さがそれぞれ約
150mmの外郭形状で、その上部に配置した減速機付モー
タ(18)を含む全高さが約 250mmであって、7連に設けた
各処理液室(2a)それぞれは、内法幅が80mm、フイルム
(F) 移送方向の長さが20mmで、かつ約 3mmの間隙の液流
孔部(6a)を有するフイルム案内兼液整流具(6) を内部に
配して、その実内容積が約 5cm 3 のものとした。また各
処理液室(2a)と液循環ポンプ(11)とを接続する液管(8)
には内径 6mmのゴム管を用い、それらで形成された各閉
回路の総内容積が約 30cm 3 のものとした。一方、水槽
(1) は、幅と長さが約 200mmで、高さが約 130mmのもの
とした。また水槽(1) 内の浄水(W) の温度は約33℃に制
御するものとした。
Next, a specific developing process by the apparatus of this embodiment
A theoretical example will be described below. In this embodiment, based on the above configuration
The processor (2) has a width, a length and a height of approx.
It has a 150 mm outer shape and is equipped with a reducer motor
The total height including the switch (18) is about 250 mm, and it is installed in 7 stations.
Each processing liquid chamber (2a) has an inner width of 80 mm, film
(F) Liquid flow with a length of 20 mm in the transfer direction and a gap of about 3 mm
Inside the film guide and liquid rectifier (6) with hole (6a)
The actual internal volume was about 5 cm 3 . Also each
Liquid pipe (8) connecting the processing liquid chamber (2a) and liquid circulation pump (11)
Use a rubber tube with an inner diameter of 6 mm for each closed
The total internal volume of the circuit was about 30 cm 3 . On the other hand, the aquarium
(1) has a width and length of about 200 mm and a height of about 130 mm
And Also, the temperature of the purified water (W) in the water tank (1) is limited to about 33 ° C.
It was controlled.

【0044】そして、この現像処理装置により、最適濃
度の静止現像液中で約 30sec、同静止定着理液中で約 5
0sec以上浸漬することで、所定の現像濃度および定着抜
けが得られる歯科用の高感度X線フイルムの現像処理を
行った。 まず、初期に約 30cm 3 の量の現像液および定着
液を、No.1とNo.2およびNo.4〜No.7の処理液室に連なる
各閉回路に抜気して充満させた後、各処理液室内におけ
る流速を 500mm/secとする高速で循環させる一方、幅40
mm、長さ30mmの撮影済の上記高感度X線フイルムを、2.
0mm/sec の速度で移送して現像処理した。その結果、静
止処理液中でバッチ処理した場合の7/10、定着時間に合
わせて連続処理した場合の 1/2の処理時間でもって、む
らの無い鮮明な映像が得られた。また続いて、フイルム
1枚につき 0.3cm 3 の処理液を各閉回路に点滴補充する
方法で連続処理を行ったところ、約 500枚程度まで安定
した映像が得られた。
With this development processing device, the optimum density is obtained.
Approximately 30 sec in static developing solution and approximately 5 in same static fixing solution
By immersing it for 0 sec or more, the specified development density and fixing removal
Development process of high sensitivity X-ray film for dentistry
went. First, the amount of the developer to about 30 cm 3 initially and fixing
Connect the liquid to the No. 1 and No. 2 and No. 4 to No. 7 processing liquid chambers.
After degassing and filling each closed circuit, place it in each processing solution chamber.
While circulating at a high speed with a flow velocity of 500 mm / sec, a width of 40
mm, length of 30 mm, the above-mentioned high-sensitivity X-ray film, 2.
It was transferred at a speed of 0 mm / sec and developed. As a result,
If the fixing time is 7/10 of the batch processing in the finishing solution,
With half the processing time of continuous processing,
A clear image was obtained. And again, the film
Add 0.3 cm 3 of processing solution to each closed circuit
Stable up to about 500 sheets when continuously processed by the method
The video was done.

【0045】以上に述べたように、本実施例の現像処理
装置では、高感度フイルムについても、その都度に新液
を用いることを許容し得る程度の極少量の処理液でもっ
て、むらの無い安定した現像処理を高速で達成でき、ま
た、その装置全体をコンパクトな(具体的には、全高さ
が約250mm 、幅と長さが約200mm の外郭形状)ものとす
ることができた。
As described above, the developing process of this embodiment
In the equipment, even for high-sensitivity film, new liquid is
With a very small amount of processing liquid that is acceptable to use
Stable, uniform development can be achieved at high speed.
In addition, the entire device is compact (specifically, the total height
Is approximately 250 mm, and the width and length are approximately 200 mm).
I was able to.

【0046】なお、上記実施例の現像処理装置では、各
処理液室(2a)内にフイルム案内兼液 整流具(6) を配置し
たが、それら処理液室(2a)が、フイルム(F) の通過を許
容すると共に処理液(L) を横方向に流動させ得る範囲内
で断面積を小さくして小容積とされている限り、このフ
イルム案内兼液整流具(6) は省略することもできる
た、処理液(L) を循環送給する液循環ポンプ(11)は水槽
(1) 内に配置したが、これら液循環ポンプ(11)は、水槽
(1) 外に配置すると共に、その水槽(1) 壁を水密に貫通
させた液管(8) を介して各処理液室(2a)に接続されても
良い。また、各処理液室(2a)に連なる閉回路を形成する
液管(8) に、注液管(10)および抜気槽(9) を介装して、
その閉回路に処理液(L) を供給すると共に抜気するもの
としたが、この注液管(10)および抜気槽(9) は液循環ポ
ンプ(11)に接続されても良い。 また、各回転ローラ(3),
(3')およびシールローラ(4),(4')は、その胴部をゴムで
形成してなるものとしたが、それらローラの胴部は、相
互間の液封を果たせる弾性を有し、かつ、処理液に対し
て安定なものである限り、例えば各種の弾性合成樹脂材
等のゴム以外の弾性材で形成されても良いことは言うま
でもない。
In the developing processing apparatus of the above embodiment, each
Install the film guide and liquid rectifier (6) in the processing liquid chamber (2a).
However, the processing liquid chamber (2a) allows the film (F) to pass through.
Within the range that allows the processing liquid (L) to flow laterally while containing
As long as the cross-sectional area is reduced by
The film guide and liquid rectifier (6) can be omitted . Ma
In addition, the liquid circulation pump (11) that circulates the processing liquid (L) is a water tank.
Although it was placed in (1), these liquid circulation pumps (11) are
(1) It is placed outside and its water tank (1) penetrates the wall in a watertight manner
Even if it is connected to each processing liquid chamber (2a) via the liquid pipe (8)
good. In addition, a closed circuit that connects to each processing liquid chamber (2a) is formed.
Insert the injection pipe (10) and the degassing tank (9) into the liquid pipe (8),
Supplying processing liquid (L) to the closed circuit and degassing
However, the injection pipe (10) and deaeration tank (9) are
It may be connected to the pump (11). In addition, each rotating roller (3),
(3 ') and seal rollers (4), (4') are made of rubber on the body.
However, the body parts of these rollers are
It has elasticity that can fulfill the liquid seal between each other,
As long as it is stable and stable, for example, various elastic synthetic resin materials
Needless to say, it may be formed of an elastic material other than rubber, such as
not.

【0047】また、上記実施例の現像処理装置では、隣
合う2つの処理液室に現像液を、同3つの処理液室に定
着液を供給することで、一定速度で移送するフイルムに
対する現像液内と定着液内の通過時間の比率を1:1.5
とし、現像より定着に要する時間が長い高感度フイルム
を連続処理するものとしたが、例えば、〔図4〕に示す
ように、その液供給系の構成を変更することで、現像と
定着の反応時間がほぼ等しい通常感度のフイルムを連続
処理する現像処理装置とすることができる。
In the developing processing apparatus of the above embodiment,
The developer is set in the two processing solution chambers that match, and the developing solution is set in the three processing solution chambers.
By supplying the landing liquid, the film can be transferred at a constant speed.
The ratio of the passage time in the developing solution to the fixing solution is 1: 1.5
High-sensitivity film takes longer to fix than to develop
Is to be continuously processed. For example, as shown in FIG.
In this way, by changing the configuration of the liquid supply system,
Consecutive normal sensitivity films with almost the same fixing reaction time
It may be a development processing device for processing.

【0048】〔図4〕は、本発明の第2実施例の現像処
理装置の液供給系の説明図である。なお、本実施例の現
像処理装置は、液供給系の構成が異なる点を除き、前記
第1実施例のものと同様であるので、ここでは液供給系
のみを図示すると共に、等価な各部に同符号を付して説
明を省略し、その差異点を要約して説明する。
FIG . 4 shows the developing process of the second embodiment of the present invention.
It is explanatory drawing of the liquid supply system of a processing device. In addition, the present embodiment
The image processing apparatus is the same as the one described above except that the configuration of the liquid supply system is different.
Since it is the same as that of the first embodiment, a liquid supply system is used here.
Only the same parts are shown, and the same symbols are given to the equivalent parts.
The explanation is omitted and the differences are summarized and explained.

【0049】本実施例の現像処理装置では、〔図4〕の
(a)図に示すように、処理装置(2)のNo.1とNo.2およびN
o.4とNo.5の4つの処理液室(2a)は、第1実施例と同構
成のもとで、それぞれ独立した閉回路に形成される一
方、No.3およびNo.6とNo.7の3 つの処理液室(2a)は、第
1実施例と同構成のもとで解放回路に形成されている。
そして、この液供給系のもとで、処理装置(2) のNo.1と
No.2の2つの処理液室(2a)に現像液を、No.4とNo.5の2
つの処理液室(2a)に定着液を、それぞれ循環送給すると
共に、No.3およびNo.6とNo.7の3つの液室(2a)に浄水
(W) を送給し、かつ、通風筒(15)に温風を送りながら、
普通感度のフイルムをUの字状に移送して、7つの処理
液室内を通過させて、現像〜中間水洗〜定着〜水洗〜乾
燥の処理を連続的に施して現像処理する。
In the developing processing apparatus of this embodiment, as shown in FIG.
(a) As shown in the figure, No. 1 and No. 2 and N of the processing equipment (2)
The four processing liquid chambers (2a) of o.4 and No.5 have the same structure as in the first embodiment.
Under the control, each is formed into an independent closed circuit.
On the other hand, the three processing liquid chambers (2a) of No. 3 and No. 6 and No. 7 are
The release circuit is formed under the same configuration as that of the first embodiment.
Then, under this liquid supply system,
The developing solution is stored in the two processing solution chambers (2a) of No. 2 and 2 of No. 4 and No. 5.
When the fixing solution is circulated and sent to the two processing solution chambers (2a),
Purified water in 3 liquid chambers (2a) of No. 3 and No. 6 and No. 7
While sending (W) and sending warm air to the ventilation tube (15),
Transfers a normal-sensitivity film into a U-shape for 7 processes
After passing through the liquid chamber, development-intermediate water washing-fixing-water washing-drying
Drying treatment is continuously applied to develop.

【0050】ここで、本実施例の現像処理装置では、そ
れぞれ隣合って連なる2つの処理液室に現像液および定
着液を供給するので、一定速度で移送するフイルムに対
する現像液内と定着液内の通過時間の比率を1:1に保
ちながら、それら現像液および定着液内それぞれでの通
過距離を2倍と大きくでき、これにより現像液および定
着液の濃度や流速を一定限度を超えて調整することな
く、フイルムの移送速度を2倍に高めてなお、安定した
現像処理を達成でき、もって現像と定着の反応時間がほ
ぼ等しい通常感度のフイルム、特に長尺なフイルムにつ
いても、その移送速度を高めて、全長通過時間(Top to
End)をより短縮することができる。
Here, in the developing processing apparatus of this embodiment,
The developing solution and constant solution are placed in two processing solution chambers that are adjacent to each other.
Since the liquid is supplied, it is suitable for films that are transported at a constant speed.
Keep the ratio of the passage time between the developing solution and the fixing solution at 1: 1.
However, in each of the developer and fixer,
The excess distance can be doubled, which allows the developer and constant
Do not adjust the concentration or flow velocity of the landing liquid beyond a certain limit.
The film transfer speed has been doubled and still stable.
Development processing can be achieved, and reaction time between development and fixing is
For films with the same normal sensitivity, especially for long films
However, the transfer speed is increased and the total length transit time (Top to
End) can be further shortened.

【0051】また、本実施例では、処理装置(2) のNo.1
とNo.2およびNo.4とNo.5の4つの処理液室(2a)に対する
液供給系を、それぞれ独立した閉回路に形成したが、N
o.1とNo.2の処理液室(2a)と、No.4とNo.5の処理液室(2
a)とには、それぞれ同種の処理液を供給するので、 (b)
図に示すように、これら2連の処理液室(2a)は、互いに
連なる閉回路に形成し、共用する1の循環ポンプ(11)で
処理液を循環供給することもできる。更にまた、同 (b)
図に示すように、No.3の処理液室(2a)の給排液口(5a),
(5a')を直接的に水槽(1) 内に開口させ、このNo.3の処
理液室(2a)内での中間水洗を、その水槽(1) 内に供給さ
れている水によって行うこともできる。
Further , in this embodiment, No. 1 of the processing device (2) is used.
For four processing liquid chambers (2a) of No. 2 and No. 4 and No. 5
Although the liquid supply system was formed as an independent closed circuit,
o.1 and No.2 processing liquid chamber (2a) and No.4 and No.5 processing liquid chamber (2a)
Since the same type of treatment liquid is supplied to a) and (b),
As shown in the figure, these two processing liquid chambers (2a) are
With a single circulation pump (11) that is formed in a continuous closed circuit and shared
It is also possible to circulate and supply the processing liquid. Furthermore, the same (b)
As shown in the figure, the supply / drain port (5a) of the No. 3 processing liquid chamber (2a),
(5a ') is opened directly in the water tank (1), and the treatment of No. 3 is performed.
Intermediate washing in the liquid chamber (2a) is supplied to the water tank (1).
It can also be done with water.

【0052】なお、上記2実施例では、処理装置は7つ
の処理液室を円弧上に連ねて設け、それら7つの処理液
室に送給する処理液の組み合せにより、連続して行う各
処理での液内経過時間に差をもたせる構成としたが、こ
れは1例であって、例えば、 その処理装置の定着液を循
環送給する処理液室を適宜に増設し、現像よりも定着に
要する時間が2倍以上と長い高感度フイルムを現像処理
する等、対象フイルムの特性に合わせて処理液室の配設
数が増減されても良いことは言うまでもないまた、必
要に応じて各処理室を水平方向に連ねて設けたものとさ
れても良く、この場合には、各対の回転ローラは、チェ
ンとスプロケットからなる駆動機構、またはベルトとプ
ーリからなる駆動機構等で同期回転させれば良い。
In the above-mentioned two embodiments, there are seven processing devices.
The processing liquid chambers of are arranged in a line on an arc, and these seven processing liquids are
Each process is performed continuously depending on the combination of treatment liquids sent to the chamber.
Although it was configured to give a difference in the elapsed time in the liquid during processing,
This is only an example. For example, the fixing solution of the processing device is circulated.
The processing liquid chamber for recirculation is appropriately added to fix rather than develop.
Development processing of high-sensitivity film that takes more than twice as long
Arrangement of processing liquid chamber according to the characteristics of the target film
It goes without saying that the number may be increased or decreased . Also, must
If necessary, the processing chambers should be arranged horizontally.
In this case, each pair of rotating rollers is
Drive mechanism consisting of a sprocket and
It suffices if they are rotated synchronously by a drive mechanism composed of a pulley.

【0053】次に、本発明の第3実施例の現像処理装置
について〔図5〕により説明する〔図5〕は本実施例
の現像処理装置の概要構成を示す図面であって、 (a)図
は一部を切欠いて示す正面図、 (b)図は液供給系の説明
図である。なお、本実施例の現像処理装置は、処理装置
の処理室の配設数および液供給系の一部構成が異なる点
を除き、前記第1実施例のものと同様であるので、ここ
では等価な各部に同符号を付すと共に細部の図示を省略
し、その差異点のみを要約して説明する。
Next, the developing processing apparatus of the third embodiment of the present invention.
Will be described with reference to FIG . [FIG. 5] shows the present embodiment
FIG. 3A is a diagram showing a schematic configuration of the developing processing apparatus of FIG.
Is a front view with a part cut away, (b) is an explanation of the liquid supply system
FIG. The developing processing apparatus of this embodiment is a processing apparatus.
The number of processing chambers and the partial structure of the liquid supply system differ
Except that it is the same as that of the first embodiment,
Then, equivalent parts are given the same reference numerals and detailed illustrations are omitted.
However, only the differences will be summarized and described.

【0054】本実施例の現像処理装置では、〔図5〕の
(a)図に示すように、水槽(1) 内に配された処理装置
(2) は、9対の回転ローラ(3),(3')と、その9対の回転
ローラ(3),(3')の間それぞれを閉塞する8対のシールロ
ーラ(4),(4')とを、同一中心点Pから等距離でかつ前後
が高位となる円弧に沿って配列すると共に、それらロー
ラの両側に対の支持端板(5),(5')を配することで、No.1
〜No.8の8つの処理液室(2a)を、上記円弧上に連ねて設
けてなる。
In the developing processing apparatus of this embodiment, as shown in FIG.
(a) As shown in the figure, the treatment equipment installed in the water tank (1)
(2) is 9 pairs of rotating rollers (3), (3 ') and the 9 pairs of rotating rollers
Eight pairs of seal rollers that close off between the rollers (3) and (3 ')
And (4), (4 ') are equidistant from the same center point P
Are arranged along a high arc, and
No.1 by arranging a pair of support end plates (5), (5 ') on both sides of the la
~ 8 processing liquid chambers (2a) of No. 8 are installed in series on the above arc.
It becomes

【0055】また、 (b)図に示すように、その処理装置
(2) のNo.1〜No.3の3つの処理液室(2a)、No.5とNo.6の
2つの処理液室(2a)およびNo.8の処理液室(2a)は、第1
実施と同様構成のもとで、それぞれ独立した閉回路に形
成される一方、No.4とNo.7の処理液室(2a)は、第1実施
と同構成のもとで、解放回路に形成されている。そし
て、この液供給系のもとで、No.1〜No.3、No.5とNo.6お
よびNo.8の6つの処理液室(2a)に処理液(L) を、No.4と
No.7の処理液室(2a)に浄水(W) を送給する。
Further , as shown in FIG.
(2) No. 1 to No. 3 three processing liquid chambers (2a), No. 5 and No. 6
The two processing liquid chambers (2a) and the No. 8 processing liquid chamber (2a) are
Formed as independent closed circuits under the same configuration as the implementation.
Meanwhile, the No. 4 and No. 7 processing liquid chambers (2a) are
Under the same structure as the above, it is formed in the open circuit. Soshi
Under this liquid supply system, No. 1 to No. 3, No. 5 and No. 6
And the treatment liquid (L) into the six treatment liquid chambers (2a) of No. 8 and No. 4
The purified water (W) is sent to the No. 7 processing liquid chamber (2a).

【0056】本実施例の現像処理装置は、上記構成のも
とで、例えば、市販のコダック社製 コダカラーIIならび
に同種に属するカラーフイルムを、同コダック・フレシ
キカラー処理剤による処理方法等に準拠して、連続的に
現像処理する。 すなわち、その処理装置(2) のNo.1の処
理液室(2a)に発色現像液、No.2とNo.3の2つの処理液室
(2a)に漂白液、No.4の処理液室(2a)に浄水、No.5とNo.6
の2つの処理液室(2a)に定着液、No.7の処理液室(2a)に
浄水、No.8の処理液室(2a)に安定液をそれぞれ供給し、
かつ通風筒(15)に温風を送気しながら、上記カラーフイ
ルムをUの字状に移送して8つの処理液室内を通過させ
て、発色現像〜漂白〜中間水洗〜定着〜最終水洗〜安定
〜仮乾燥の処理を連続的に施して現像処理する。 また、
そのときの水槽(1) 内の水温は37.8±0.15℃に、通風筒
(15)への温風の温度は24〜41℃の範囲内に制御する。
The developing processing apparatus of this embodiment has the above-mentioned configuration.
With, for example, the commercially available Kodak Koda Color II and
Color film belonging to the same type as the Kodak
Continuously in accordance with the treatment method using the Kicolor treatment agent
Develop. That is, the No. 1 treatment of the processing device (2)
Color developing solution in the processing chamber (2a), two processing liquid chambers No. 2 and No. 3
Bleaching solution in (2a), treatment water chamber in No. 4 (2a) purified water, No. 5 and No. 6
Fixing liquid in the two processing liquid chambers (2a) and No.7 processing liquid chamber (2a)
Supply the stabilizing solution to the purified water and No.8 processing solution chamber (2a),
And while blowing warm air to the ventilation tube (15),
The rum is transferred in a U shape and passed through the eight processing liquid chambers.
Color development-bleaching-intermediate washing-fixing-final washing-stable
-Development processing is performed by continuously performing provisional drying processing. Also,
At that time, the water temperature in the water tank (1) was 37.8 ± 0.15 ℃
The temperature of the hot air to (15) is controlled within the range of 24 to 41 ° C.

【0057】ここで、上記コダック・フレシキカラー処
理剤による処理方法では、発色現像で 3分15秒、漂白で
6分30秒、中間洗浄で 3分15秒、定着で 6分30秒、最終
水洗で 3分15秒、安定で 1分30秒、乾燥で10分〜20分が
標準とされ、その安定処理の終了までの標準所要時間が
24分15秒とされている。 これに対応するため、本実施例
の現像処理装置では、各処理液室に送給する処理液の種
別を上記の組み合わせとすることで、一定のフイルム移
送速度において、発色現像液、漂白液、中間洗浄水、定
着液、最終洗浄水および安定液それぞれの液内通過時間
を、1:2:1:2:1:1としている。 そして、各処
理液室内において横方向に流動する処理液中を横切るよ
うにしてフイルムを通過させるので、このフイルム表面
の薬剤層と処理液とが均等に接触して各処理液室内にお
ける反応が促進される。従って、上記の標準とされた時
間よりも短縮した時間でフイルムを通過させても、つま
りフイルムの移送速度を高く設定しても、安定した現像
処理を達成することができ、かつ、各処理液室および閉
回路の容積を小さくでき、少量の処理液でもって連続か
つ迅速に現像処理することができる。また、その処理装
置が多数の処理液室を有していても、それら処理液室を
円弧上に連ねて設けることで、装置全体をコンパクトな
ものとすることができ、かつ長尺なフイルムも容易に取
り扱えると共に、短尺のフイルムも安定に移送して現像
処理することができる。
Here, the above Kodak Flexicolor processing
With the processing method using a chemical agent, color development takes 3 minutes and 15 seconds, and bleaching takes place.
6 minutes 30 seconds, intermediate cleaning 3 minutes 15 seconds, fixing 6 minutes 30 seconds, final
Washing for 3 minutes 15 seconds, stable for 1 minute 30 seconds, drying for 10 to 20 minutes
Standard and the standard time required for the end of the stabilization process
It is said to be 24 minutes and 15 seconds. In order to deal with this, this embodiment
In the development processing equipment, the type of processing liquid to be supplied to each processing liquid chamber
By using another combination of the above, a certain film transfer can be performed.
At the feeding speed, color developing solution, bleaching solution, intermediate washing water, constant
Passage time of each of landing liquid, final washing water and stabilizing liquid
Is set to 1: 2: 1: 2: 1: 1. And each place
It traverses through the laterally flowing processing liquid in the fluid chamber.
As it passes through the film, this film surface
The chemical layer of the
Reaction is accelerated. Therefore, when the above standard is adopted
Even if you pass the film in a shorter time than
Stable development even when the film transfer speed is set high
Processing can be achieved, and each processing chamber and closed
The volume of the circuit can be reduced, and it is possible to continue with a small amount of processing liquid.
It can be developed rapidly. Also, its processing equipment
Even if the equipment has many processing liquid chambers,
By arranging in series on an arc, the entire device can be made compact.
The long film can be easily taken.
It can be handled easily, and short film can be transferred stably for development.
Can be processed.

【0058】次に、本発明の第4実施例の現像処理装置
について〔図6〕および〔図7〕により説明する。 〔図
6〕は本実施例の現像処理装置の概要構成を一部を切欠
いて示す正面図である。また〔図7〕は同現像処理装置
の液供給系の説明図である。なお、本実施例の現像処理
装置は、処理装置の処理室の配設数およびその一部の配
設構成が異なる点と、駆動系および液供給系の一部構成
がことなる点を除き、基本的構成部は前記3実施例のも
のと同様であるので、ここでは等価な各部に同符号を付
すと共に細部の図示を省略し、その差異点のみを要約し
て説明する。
Next, the developing processing apparatus of the fourth embodiment of the present invention
Will be described with reference to FIGS. 6 and 7. [Figure
6] is a partial cutout of the schematic configuration of the developing processing apparatus of the present embodiment.
FIG. In addition, [Fig. 7] shows the same developing device.
FIG. 3 is an explanatory diagram of the liquid supply system of FIG. Incidentally, the development processing of this embodiment
The equipment consists of the number of processing chambers in the processing equipment and part of the arrangement.
Difference in installation configuration and partial configuration of drive system and liquid supply system
Since the basic components are the same as those in the above-mentioned third embodiment except that the points are different , the equivalent parts are denoted by the same reference numerals and detailed illustrations thereof are omitted, and only the differences are summarized. explain.

【0059】本実施例の現像処理装置では、〔図6〕に
示すように、水槽(1) 内に配された処理装置(2) は、1
2対の回転ローラ(3),(3')と、その12対の回転ローラ
(3),(3')の間それぞれを閉塞する15対のシールローラ
(4),(4')とを、同一中心点Pから等距離でかつ前後が高
位となる円弧の両端を接線方向に延ばしたUの字状線に
沿って配列すると共に、それらローラの両側に対の支持
端板(5),(5')を配することで、No.1〜No.11 の11の処
理液室(2a)を、上記Uの字状線上に連ねて設けてなる。
In the developing processing apparatus of this embodiment, as shown in FIG.
As shown, the treatment equipment (2) installed in the water tank (1)
2 pairs of rotating rollers (3), (3 ') and 12 pairs of rotating rollers
15 pairs of seal rollers that close each between (3) and (3 ')
(4) and (4 ') are equidistant from the same center point P and the front and back are high
U-shaped line that extends tangentially at both ends of the arc
Aligned along with paired supports on each side of the rollers
By arranging the end plates (5) and (5 '), the No.1 to No.11 11 processes can be performed.
The fluid chamber (2a) is provided in series on the U-shaped line.

【0060】また、その12対の回転ローラ(3),(3')の
内の、第2〜第11の10対の回転ローラ(3),(3')は、上記
Uの字状線の円弧部に沿って配列すると共に、それら10
対の回転ローラ(3),(3')の間それぞれを上下で1対のシ
ールローラ(4),(4')で閉塞させ、これによりNo.2〜No.1
0 の9つの処理液室(2a)は、同円弧部の円弧上に連ねて
設けている。また、この円弧部に沿う各ローラは、第1
実施例と同様に、上方に位置する各回転ローラ(3) とシ
ールローラ(4) の外径を、下方に位置する各回転ローラ
(3')とシールローラ(4')の外径よりも小径としている。
The 12 pairs of rotating rollers (3), (3 ')
Of the second to eleventh pairs of rotating rollers (3), (3 '),
Arrange along the arc of the U-shaped line and
Between the pair of rotating rollers (3) and (3 '), there is a pair of upper and lower rollers.
Block with roller rollers (4), (4 '), which results in No. 2 to No. 1
Nine processing liquid chambers (2a) of 0 are connected on the arc of the same arc part.
Provided. In addition, each roller along the arc portion is
Similar to the embodiment, each rotating roller (3) located above
The outer diameter of the roller (4)
The diameter is smaller than the outer diameters of (3 ') and the seal roller (4').

【0061】一方、第1と第12の対の回転ローラ(3),
(3')は、上記Uの字状線の両端の接線部に沿って配列す
ると共に、その第1の対と第2の対の回転ローラ(3),
(3')の間、および第12の対と第11の対の回転ローラ(3),
(3')の間それぞれの両側は、等径で対向する3対のシー
ルローラ(4),(4')で閉塞させ、これにより最前部と最後
部に位置するNo.1とNo.11 の処理液室(2a)を、同Uの字
状線の両端の接線上に連ねて設けている。そして、この
構成のもとで、、No.1の処理液室(2a)とNo.11 の処理液
室(2a)のフイルム移送方向の長さを、その他の処理液室
(2a)よりも、No.1の処理液室(2a)で約 2.5倍、No.11 の
処理液室(2a)で約2倍と長くしている。
On the other hand, the first and twelfth pairs of rotating rollers (3),
(3 ') is arranged along the tangents at both ends of the U-shaped line.
And the first and second pairs of rotating rollers (3),
(3 '), and the twelfth and eleventh pairs of rotating rollers (3),
Both sides of (3 ') are closed by three pairs of seal rollers (4) and (4') of equal diameter and facing each other , so that No. 1 and No. 11 located at the forefront and the last are located. The treatment liquid chamber (2a) is provided so as to be continuous with the tangent line at both ends of the U-shaped line. With this configuration, the lengths of the No. 1 processing liquid chamber (2a) and the No. 11 processing liquid chamber (2a) in the film transfer direction are set to the other processing liquid chambers.
Compared to (2a), the No. 1 processing liquid chamber (2a) is about 2.5 times longer, and the No. 11 processing liquid chamber (2a) is about 2 times longer.

【0062】また、その処理装置(2) の、円弧に沿って
配列した第2〜第11の10対の回転ローラ(3),(3')は、減
速機付モータ(19)のピニオン歯車(18)および中間に配さ
れた伝動平歯車(21)を介する歯合関係のもとで駆動され
て、前記中心点Pを中心に回転する駆動平歯車(17)によ
って同期回転させられる。一方、第1の対と第12の対の
回転ローラ(3),(3')は、伝動平歯車(21)に歯合させた左
右2つの補駆動平歯車(22)それぞれによって同期回転さ
せられ、また各シールローラ(4),(4')は、前後の対の回
転ローラ(3),(3')の回転に追従して同期回転させられ
る。
Further , along the arc of the processing device (2)
The second to eleventh pairs of rotating rollers (3) and (3 ') arranged in the array are
It is arranged in the pinion gear (18) and in the middle of the motor with speed gear (19).
Driven in meshing relationship via the driven transmission spur gear (21)
The drive spur gear (17) that rotates about the center point P.
It can be rotated synchronously. On the other hand, the first pair and the twelfth pair
The rotating rollers (3) and (3 ') are engaged with the transmission spur gear (21) on the left side.
The two auxiliary drive spur gears (22) on the right
Each seal roller (4), (4 ')
It is rotated synchronously following the rotation of the rolling rollers (3), (3 ').
You.

【0063】また、〔図7〕に示すように、その処理装
置(2) のNo.2〜No.4の3つの処理液室(2a)と、No.6とN
o.7の2つの処理液室(2a)と、No.9とNo.10 の2つの処
理液室(2a)とは、第1実施と同様構成のもとで、それぞ
れ独立した閉回路に形成され、No.5とNo.8の2つの処理
液室(2a)は、第1実施と同構成のもとで解放回路に形成
されている。一方、本実施例においては、No.1とNo.11
の処理液室(2a)は、他の処理液室(2a)よりもフイルム移
送方向の長さを長くしているので、これら処理液室(2a)
の両側の対の支持端板(5),(5')には、給排液口(5a),(5
a')を2連に設け、No.1の処理液室(2a)では、2連の閉
回路を介して処理液(L) を循環供給させ、また、No.11
の処理液室(2a)では、供給側の液管(8) を分岐させて2
連の給排液口(5a)から浄水(W) を供給することで、No.1
の処理液室(2a)内での処理液(L) の流動と、No.11 の処
理液室(2a)内での浄水(W) の流れを均等化させている。
そして、この液供給系のもとで、No.1〜No.4、No.6、N
o.7、No.9およびNo.10 の8つの処理液室(2a)に処理液
(L) を、No.5、No.8およびNo.11 の3つの処処理液室(2
a)に浄水(W) を送給する。
Further , as shown in FIG.
No. 2 to No. 4 of the equipment (2), three processing liquid chambers (2a), No. 6 and N
Two processing chambers (2a) of o.7 and two processing chambers of No.9 and No.10.
The liquid chamber (2a) has the same structure as in the first embodiment,
Is formed into an independent closed circuit, and has two processes, No. 5 and No. 8.
The liquid chamber (2a) is formed in the release circuit under the same structure as in the first embodiment.
Have been. On the other hand, in this example, No. 1 and No. 11
The processing liquid chamber (2a) of the above is more transferred to the film than the other processing liquid chamber (2a).
Since the length in the feeding direction is long, these processing liquid chambers (2a)
The pair of support end plates (5) and (5 ') on both sides of the supply and drain ports (5a) and (5
a ') are provided in two stations, and in the No. 1 processing liquid chamber (2a), two stations are closed.
Circulate the processing solution (L) through the circuit, and
In the processing liquid chamber (2a), the liquid pipe (8) on the supply side is branched to
By supplying purified water (W) from the supply / drain port (5a) of the series,
Of the processing liquid (L) in the processing liquid chamber (2a) of
The flow of purified water (W) in the liquid chamber (2a) is equalized.
And under this liquid supply system, No.1 ~ No.4, No.6, N
Treatment liquid in eight treatment liquid chambers (2a) of o.7, No.9 and No.10
(L) into three treatment liquid chambers (No. 5, No. 8 and No. 11) (2
Send purified water (W) to a).

【0064】本実施例の現像処理装置は、上記構成のも
とで、例えば、市販のコダック社製コダカラーXならび
に同種に属するカラーフイルムを、同コダック・プロセ
スC−22による処理方法等に準拠して、連続的に現像処
理する。 すなわち、その処理装置(2) のNo.1とNo.2の2
つの処理液室(2a)に発色現像液、No.3の処理液室(2a)に
停止液、No.4の処理液室(2a)に硬膜液、No.5の処理液室
(2a)に浄水、No.6とNo.7の2つの処理液室(2a)に漂白
液、No.8の処理液室(2a)に浄水、No.9とNo.10 の2つの
処理液室(2a)に定着液、No.11 の処理液室(2a)に浄水を
それぞれ供給し、かつ通風筒(15)に温風を送気しなが
ら、上記カラーフイルムをUの字状に移送して11の処理
液室内を通過させて、発色現像〜停止〜硬膜〜中間水洗
〜漂白〜中間水洗〜定着〜最終水洗〜水滴除去・仮乾燥
の処理を連続的に施して現像処理する。 また、そのとき
の水槽(1) 内の水温は 24 ± 0.3℃に、また通風筒(15)
への温風の温度は43℃以下に制御する。また、No.6およ
びNo.7の処理液室(2a)に循環送給する漂白液の流速は、
やや低く制御して過剰漂白を避ける。
The developing processing apparatus of this embodiment has the above-mentioned configuration.
And, for example, the Kodak Color X and the Kodak Co.
Color film belonging to the same type
In accordance with the processing method of C-22, etc.
Make sense. That is, No. 1 and No. 2 of the processing equipment (2)
Color developer in one processing liquid chamber (2a), in No. 3 processing liquid chamber (2a)
Stop solution, No. 4 processing solution chamber (2a) in hardening solution, No. 5 processing solution chamber
Purified water in (2a), bleaching in two treatment liquid chambers (2a) No.6 and No.7
Solution, No.8 treatment solution chamber (2a) with purified water, No. 9 and No. 10
Fixer in treatment liquid chamber (2a) and purified water in No. 11 treatment liquid chamber (2a).
Do not supply hot air to the ventilation tube (15).
, Transfer the above color film into a U shape and process 11
After passing through the liquid chamber, color development-stopping-hardening-intermediate water washing
~ Bleaching ~ Intermediate washing ~ Fixing ~ Final washing ~ Water drop removal / temporary drying
The processing is continuously performed to perform development processing. Also at that time
The water temperature in the water tank (1) is 24 ± 0.3 ℃, and the ventilation tube (15)
The temperature of warm air to be controlled to 43 ℃ or less. In addition, No. 6 and
The flow rate of the bleaching solution circulated to the No. 7 and No. 7 processing solution chambers (2a) is
Control slightly lower to avoid over bleaching.

【0065】ここで、上記コダック・プロセスC−22に
よる処理方法では、発色現像で14分、停止、硬膜および
中間水洗で各々 4分、漂白で 6分、中間水洗で 4分、定
着および最終水洗で各々 8分、水滴除去で 1分が標準と
され、その安定処理の終了までの標準所要時間が53分と
されている。 これに対応するため、本実施例の現像処理
装置では、各処理液室に送給する処理液の種別を上記の
組み合わせとすることで、一定のフイルム移送速度にお
いて、発色現像液、停止液、硬膜液、中間洗浄水、漂白
液、中間洗浄水、定着液および最終洗浄水それぞれの液
内通過時間を、 3.5:1:1:1:2:1:2:2とし
ている。 そして、各処理液室内において横方向に流動す
る処理液中を横切るようにしてフイルムを通過させるの
で、このフイルム表面の薬剤層と処理液とが均等に接触
して各処理液室内における反応が促進される。従って、
上記の標準とされた時間よりも短縮した時間でフイルム
を通過させても、つまりフイルムの移送速度を高く設定
しても、安定した現像処理を達成することができ、か
つ、各処理液室およ び閉回路の容積を小さくでき、少量
の処理液でもって連続かつ迅速に現像処理することがで
きる。また、その処理装置が多数の処理液室を有してい
ても、それら処理液室を円弧上に連ねて設けることで、
装置全体をコンパクトなものとすることができ、かつ長
尺なフイルムも容易に取り扱えると共に、短尺のフイル
ムも安定に移送して現像処理することができる。
Now, in the Kodak Process C-22,
In the processing method according to
Intermediate washing 4 minutes each, bleaching 6 minutes, intermediate washing 4 minutes, fixed
8 minutes each for landing and final washing, and 1 minute for removing water droplets as standard
The standard time required to complete the stabilization process is 53 minutes.
Have been. In order to deal with this, the development processing of the present embodiment
In the equipment, the type of processing liquid to be supplied to each processing liquid chamber is
By combining them, a constant film transfer speed can be achieved.
, Color developer, stop solution, hardening solution, intermediate washing water, bleaching
Solution, intermediate wash water, fixer and final wash water
The internal transit time is 3.5: 1: 1: 1: 2: 1: 2: 2
ing. Then, it flows laterally in each processing liquid chamber.
To pass the film across the processing solution
The chemical layer on the surface of the film and the treatment liquid contact evenly.
Then, the reaction in each processing liquid chamber is promoted. Therefore,
Film in less time than the standard time above
Even if the film passes through, that is, the film transfer speed is set high
Even if you can achieve a stable development process,
One can reduce the volume of the processing liquid chambers and the closed circuit, a small amount
With this processing solution, continuous and rapid development processing can be performed.
Wear. Further, the processing apparatus has many processing liquid chambers.
However, by arranging these processing liquid chambers in a line on an arc,
The entire device can be made compact and long
Easy to handle long film, short film
It is also possible to stably transfer the film for development processing.

【0066】なお、以上に述べた4実施例の現像処理装
置では、その現像装置の各処理液室の内の、隣合って連
なる処理液室に同種の処理液を供給すること、更には特
定の位置を占める相前後する2対の回転ローラの間に配
するシールローラの数を1対以上の奇数対で増やして特
定処理液室のフイルム移送方向の長さを長くすること、
およびそれらの組み合わせによって、連続して行う各処
理における処理液内の経由時間に差をもたせるものとし
たが、これに加えて、特定の位置を占めて相前後する2
対の回転ローラの間に配するシールローラの径を、その
他の対の回転ローラの間に配したシールローラの径とは
異なるものとすることで、特定処理液室のフイルム移送
方向の長さを変えることもでき、またこのことは、小さ
な量での調整が必要とされる場合に特に有効である。
It should be noted that the development processing apparatus of the four embodiments described above is used.
In the storage system, the processing solution chambers of the developing device are connected next to each other.
Supply the same kind of processing liquid to the other processing liquid chamber.
It is placed between two pairs of rotating rollers that occupy a fixed position
Increase the number of seal rollers to be
To increase the length of the constant processing liquid chamber in the film transfer direction,
And the combination of them,
It is assumed that there is a difference in transit time in the processing solution
However, in addition to this, they occupy a specific position and follow each other 2
The diameter of the seal roller placed between the pair of rotating rollers is
What is the diameter of the seal roller arranged between other pairs of rotating rollers?
Transfers the film in a specific processing liquid chamber by making it different.
You can also change the length of the direction, which is
It is especially effective when adjustments in large amounts are required.

【0067】また、本発明は、これら4実施例の構成に
限定されるものでなく、その要旨を逸脱しない限り、処
理装置の処理液室の配置数と、それら処理液室のフイル
ム移送方向の長さ、および各理液室に送給する処理液の
種別の組み合わせを種々に設定することで、連続して行
う各処理での液内経過時間に差をもたせ、それぞれの反
応時間に差のある一連の処理が必要とされる各種フイル
ムそれぞれの現像処理を、安定して連続かつ迅速に達成
できるものとすることができる。
Further , the present invention has the structure of these four embodiments.
The present invention is not limited to the above, and unless the gist thereof is deviated,
The number of processing liquid chambers in the processing equipment and the filters in those processing liquid chambers.
The length of the transfer direction and the amount of processing liquid to be fed to each processing chamber
By setting various combinations of types, it is possible to
The difference in the elapsed time in the liquid between each treatment
Various types of films that require a series of processes with different response times
Achieve stable, continuous, and rapid development processing for each system
It can be.

【0068】[0068]

【発明の効果】以上に述べたように、本発明の現像処理
装置は、水槽内に、複数の小容積の処理液室を有する処
理装置を配置した構成のもとで、処理するフイルムに対
する遮光性を容易に確保でき、かつ、一定の移送速度で
連続して行う各単位処理それぞれの処理液内経由時間を
適宜に設定することができ、もって、普通感度の長尺フ
イルムを始めとし、反応時間の異なる複数処理が必要と
される高感度フイルムやカラーフイルム等の各種フイル
ムについても、少量の処理液でもってむらの無い安定し
た現像処理を連続かつ迅速に達成でき、しかも、装置全
体をコンパクトにできると共に、その運転に要する消費
動力を低減でき、かつ煩雑な機器清掃も不要にできると
いう大きな効果を得ることができる。
As described above, the development processing of the present invention
The device is a process that has a plurality of small volume processing liquid chambers in the water tank.
Under the configuration in which the processing device is arranged, the film to be processed
It is possible to easily secure the light-shielding property, and at a constant transfer speed.
The transit time in the processing solution for each unit processing
It can be set appropriately, and it is
Multiple processes with different reaction times such as film are required
Various films such as high-sensitivity film and color film
Also, even with a small amount of processing liquid, it is even and stable.
It is possible to achieve continuous and rapid development processing, and
The body can be made compact and consumption required for its operation
It is possible to reduce power and eliminate the need for complicated equipment cleaning.
The great effect can be obtained.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の第1実施例の現像処理装置の概要構成
を示す図面であって、 (a)図は一部を切欠いて示す正面
図、 (b)図は (a)図のA−A断面図である。
1A and 1B are diagrams showing a schematic configuration of a developing processing apparatus according to a first embodiment of the present invention, wherein FIG. 1A is a partially cutaway front view, and FIG. 1B is a view A in FIG. FIG.

【図2】本発明の第1実施例の現像処理装置の液供給系
の説明図である。
FIG. 2 is an explanatory diagram of a liquid supply system of the developing processing apparatus according to the first embodiment of the present invention.

【図3】本発明の第1実施例の現像処理装置の駆動系の
説明図である。
FIG. 3 is an explanatory diagram of a drive system of the developing processing apparatus according to the first embodiment of the present invention.

【図4】本発明の第2実施例の現像処理装置の液供給系
の説明図である。
FIG. 4 is an explanatory diagram of a liquid supply system of a developing processing apparatus according to a second embodiment of the present invention.

【図5】本発明の第3実施例の現像処理装置の概要構成
を示す図面であって、 (a)図は一部を切欠いて示す正面
図、 (b)図は液供給系の説明図である。
5A and 5B are diagrams showing a schematic configuration of a developing processing apparatus according to a third embodiment of the present invention, in which FIG. 5A is a front view showing a part of the developing device, and FIG. 5B is an explanatory view of a liquid supply system. Is.

【図6】本発明の第4実施例の現像処理装置の概要構成
を一部を切欠いて示す正面図である。
FIG. 6 is a partially cutaway front view showing a schematic configuration of a developing processing apparatus according to a fourth embodiment of the present invention.

【図7】本発明の第4実施例の現像処理装置の液供給系
の説明図である。
FIG. 7 is an explanatory diagram of a liquid supply system of a development processing apparatus according to a fourth embodiment of the present invention.

【図8】先願の現像処理装置の1実施例の概要説明図で
ある。
FIG. 8 is a schematic explanatory diagram of an embodiment of a development processing apparatus of the prior application.

【符号の説明】[Explanation of symbols]

(1) …水槽、(2) …処理装置、(2a)…処理液室、(3),
(3')…回転ローラ、(4),(4')…シールローラ、(5),(5')
…支持端板、(5a),(5a')…給排液口、(6) …フイルム案
内兼液整流具、(6a)…液流孔部、(7) …シールリング、
(8) …液管、(9)…抜気槽、(10)…注液管、(11)…液循
環ポンプ、(12)…可変速モータ、(13)…フイルム案内
筒、(14),(14')…水切ローラ、(15)…通風筒、(16),(1
6')…平歯車、(17)…駆動歯車、(18)…ピニオン歯車、
(19)…減速機付モータ、(F) …フイルム、(L) …処理
液、(W) …浄水。
(1) ... water tank, (2) ... treatment device, (2a) ... treatment liquid chamber, (3),
(3 ') ... Rotary roller, (4), (4') ... Seal roller, (5), (5 ')
... Support end plate, (5a), (5a ') ... Supply / drain port, (6) ... Film guide and liquid rectifier, (6a) ... Liquid flow hole part, (7) ... Seal ring,
(8) ... Liquid pipe, (9) ... Degassing tank, (10) ... Liquid injection pipe, (11) ... Liquid circulation pump, (12) ... Variable speed motor, (13) ... Film guide cylinder, (14) , (14 ') ... Draining roller, (15) ... Ventilation tube, (16), (1
6 ') ... spur gear, (17) ... drive gear, (18) ... pinion gear,
(19) ... Reducer motor, (F) ... Film, (L) ... Treatment liquid, (W) ... Purified water.

フロントページの続き (56)参考文献 特開 平1−166041(JP,A) 特開 平2−124570(JP,A) 実開 平2−142842(JP,U) 特公 昭59−24409(JP,B2)Continuation of the front page (56) Reference JP-A-1-166041 (JP, A) JP-A-2-124570 (JP, A) Actually open 2-142842 (JP, U) JP-B-59-24409 (JP) , B2)

Claims (4)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 平行配設された1対の支持端板の間に、
フイルムの移送方向の前後に弾性材からなる周面を有す
る2対の回転ローラが端面に低摩擦部材からなるシール
リングを介して所定小間隔を隔てて配設され、これら2
対の回転ローラ間の上下両側に、前後の回転ローラそれ
ぞれの外周に転接する弾性材からなる周面を有するシー
ルローラが端面に低摩擦部材からなるシールリングを介
して配設され、これら2対の回転ローラと上下のシール
ローラと1対の支持端板とに囲まれ、内部に回転ローラ
およびシールローラと非接触で、かつ1対の回転ローラ
それぞれの転接面間を指向してスリット状に開口すると
共に、1対の支持端板に設けられた給排液口に連通する
偏平状の液流孔部を有するフイルム案内兼液流増速具が
配設された小容積の処理液室を有する複数の処理装置が
水槽内にUの字状に配列されてなる現像処理装置であっ
て、前記処理装置の処理液室を隣合う1対の回転ローラ
同志の間のそれぞれに形成させると共に、前記シールロ
ーラを上下で1対以上の奇数対にしたことを特徴とする
現像処理装置。
1. Between a pair of supporting end plates arranged in parallel,
It has a peripheral surface made of elastic material before and after the film transfer direction.
Two pairs of rotating rollers with end faces made of low friction material
These are arranged at a predetermined small distance via a ring.
On the upper and lower sides between the pair of rotating rollers, the front and rear rotating rollers that
A sheet having a peripheral surface made of an elastic material that rolls on the outer periphery of each
The roller has a seal ring made of low friction material on the end face.
These two pairs of rotating rollers and the upper and lower seals
Surrounded by a roller and a pair of supporting end plates, and inside the rotating roller
And a pair of rotating rollers that are not in contact with the seal roller and
If you open it in a slit shape by pointing between the rolling contact surfaces,
Both communicate with the liquid supply / drain ports provided on the pair of support end plates.
A film guide and liquid flow speed increasing device with a flat liquid flow hole
A plurality of processing devices having a small volume processing liquid chamber
A developing processing apparatus arranged in a U shape in a water tank , wherein a pair of rotating rollers adjoining a processing liquid chamber of the processing apparatus.
Rutotomoni is formed on each of between comrades, the Shiruro
The developing processing device is characterized in that the upper and lower rollers are odd pairs of one pair or more .
【請求項2】 上記処理装置の各対の上側の回転ローラ
およびシールローラの外径を、下側の回転ローラおよび
シールローラの外径よりも小径にしたことを特徴とする
請求項1記載の現像処理装置。
2. The upper rotating rollers of each pair of the processing apparatus.
And the outer diameter of the seal roller to the lower rotating roller and
Characterized by having a smaller diameter than the outer diameter of the seal roller
Claim 1 Symbol mounting of the developing apparatus.
【請求項3】 上記複数の処理装置のうち少なくとも1
つの処理装置の処理液室に、その一方側の給排液口に連
結された管路を介して洗浄水供給手段を接続し、他方側
の給排液口に連結された管路を介して水槽内に連通させ
て解放回路を形成させ、かつその他の処理装置それぞれ
の処理液室に、その両側の給排液口それぞれに連結され
た管路を介して液循環ポンプを接続して閉回路を形成さ
せると共に、その管路または液循環ポンプに処理液の供
給管路および抜気槽を接続したことを特徴とする請求項
1または2記載の現像処理装置。
3. At least one of the plurality of processing devices
Connect to the processing liquid chamber of one processing device and the supply / drain port on one side.
Connect the washing water supply means through the connected pipe, and the other side
It is connected to the inside of the water tank through a pipe connected to the water supply / drainage port of
To form a release circuit, and each of the other processing devices
Is connected to the supply and drain ports on both sides of the processing liquid chamber.
A closed circuit is formed by connecting the liquid circulation pump through a closed pipe.
And supply the processing liquid to the pipeline or liquid circulation pump.
3. The development processing apparatus according to claim 1, wherein the supply line and the deaeration tank are connected .
【請求項4】 上記液循環ポンプが、処理装置の一方側
の支持端板の各給排液口に近接した位置を占めるように
水槽内に配置すると共に、この液循環ポンプの吐出側ポ
ートと他方側の支持端板の給排液口とをこの処理装置の
下部または側 部を迂回する形で配設した管路を介して接
続する一方、この液循環ポンプの吸引側ポートと前記一
方側の支持端板の給排液口とが最短距離を経るように配
した管路を介して接続したことを特徴とする請求項3記
載の現像処理装置。
4. The liquid circulation pump is provided on one side of a processing device.
To occupy a position close to each supply / drain port of the support end plate of
It is placed in the water tank and the discharge side port of this liquid circulation pump is
Port and the liquid supply / drainage port of the support end plate on the other side of this processing device.
Contact via a conduit which is arranged in a manner that bypasses the lower or side portion
While continuing, the suction side port of this liquid circulation pump and the above-mentioned one
The support end plate on one side should be arranged so that it will pass the shortest distance from the supply / drain port.
The development processing apparatus according to claim 3, wherein the development processing apparatus is connected through the above-mentioned pipe line .
JP6183545A 1993-06-15 1994-08-04 Development processing equipment Expired - Lifetime JP2688327B2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP6183545A JP2688327B2 (en) 1994-08-04 1994-08-04 Development processing equipment
US08/406,055 US5528329A (en) 1993-06-15 1995-03-17 Photographic film processing apparatus
EP95108468A EP0695970A1 (en) 1994-08-04 1995-06-02 Photographic film processing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6183545A JP2688327B2 (en) 1994-08-04 1994-08-04 Development processing equipment

Publications (2)

Publication Number Publication Date
JPH0844034A JPH0844034A (en) 1996-02-16
JP2688327B2 true JP2688327B2 (en) 1997-12-10

Family

ID=16137692

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6183545A Expired - Lifetime JP2688327B2 (en) 1993-06-15 1994-08-04 Development processing equipment

Country Status (2)

Country Link
EP (1) EP0695970A1 (en)
JP (1) JP2688327B2 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6071020A (en) * 1996-03-07 2000-06-06 Agfa-Gevaert Apparatus for the processing of photographic sheet material
DE69726350T2 (en) * 1996-07-29 2004-05-27 Noritsu Koki Co., Ltd. Film processor insert for feeding photosensitive materials
EP0919866A1 (en) * 1997-11-25 1999-06-02 Agfa-Gevaert N.V. Apparatus and method for the processing of photographic sheet material
CN113189838B (en) * 2021-03-26 2022-06-24 杭州奥西医疗科技有限公司 Automatic developing machine for X-ray film of radiology department

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3057282A (en) * 1959-04-06 1962-10-09 Eastman Kodak Co Fluid treating device for sheet or strip materials
US4324479A (en) * 1979-11-01 1982-04-13 Sachs Emanuel M Film processing method and apparatus
JPH01166041A (en) * 1987-12-22 1989-06-29 Hanshin Gijutsu Kenkyusho:Kk Developing processing tank
JPH02142842U (en) * 1989-05-01 1990-12-04
JP2563714B2 (en) * 1992-01-08 1996-12-18 株式会社阪神技術研究所 Development processor
JP2688321B2 (en) * 1993-06-15 1997-12-10 株式会社阪神技術研究所 Development processing equipment
DE69406593T2 (en) * 1993-06-15 1998-03-12 Hanshin Technical Lab Ltd Processor for photographic films

Also Published As

Publication number Publication date
JPH0844034A (en) 1996-02-16
EP0695970A1 (en) 1996-02-07

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