JP2681245B2 - Insulator cleaning device - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cleaning device for insulators which is elongated in the vertical direction, and more particularly to a cleaning device for cleaning in a live state.

[0002]

2. Description of the Related Art Insulators installed for insulation between an electric line and the ground, when the surface is contaminated by contaminants such as salt,
The withstand voltage may decrease and cause flashover, which may interfere with power transmission and distribution. For this reason, the insulator is cleaned, and in addition to stopping the power transmission for cleaning, the insulator is also cleaned under the live line condition without stopping the power transmission. Various types of insulator cleaning devices under this hot-line condition are known, and any insulator cleaning device cannot avoid a decrease in withstand voltage during cleaning. It is necessary to increase the withstand voltage (hereinafter referred to as the wash withstand voltage) of the device as much as possible so that flashover does not occur during the wash. That is, it is necessary to sufficiently wash away the contaminants attached to the insulator while maintaining the voltage higher than the withstand voltage in the fog so as not to be lower than the withstand voltage. In such an insulator cleaning apparatus, the cleaning water is poured toward the axial center of the insulator to be cleaned so that the cleaning water is evenly distributed.

[0003]

Here, in the case of an insulator arranged laterally in a long direction such as a tension insulator, the cleaning withstand voltage does not drop so much that cleaning under a hot line condition is relatively easy. Is. However, when cleaning insulators such as station post insulators and porcelain tubes that are installed in a long lengthwise direction, the cleaning water that has become highly conductive by washing the contaminants and cleaning the contaminants does not clean the insulator surface. It becomes the falling water that flows down, and it is inevitable that the cleaning withstand voltage will drop significantly due to this falling water. On the other hand, in order to reduce the conductivity of the falling water, it may be possible to increase the amount of water injected to keep the concentration of pollutants low, but this will make the falling water connect between the shades. When it flows down, the cleaning withstand voltage is significantly reduced. For this reason, the types of cleaning equipment that can be cleaned under hot line conditions are limited, and only the insulators with a high cleaning withstand voltage design, such as widening the space between the caps of the insulators themselves, can be cleaned under live condition. The fact is that they were washed in.

As described above, in the conventional cleaning device, not only is there a restriction on the type of cleaning device that can be cleaned under a hot line, but there is also a restriction on the insulator that can be cleaned. In addition, in the insulator designed to have higher cleaning withstand voltage, the gap between the shades is widened or a drainage shade is interposed, which causes the insulator to become large and complicated. Furthermore, in order to avoid the risk of flashover during cleaning, there has been a demand for the development of an insulator cleaning device that does not cause a significant decrease in cleaning withstand voltage. In order to solve these problems, the present invention aims to provide an insulator cleaning apparatus having a high cleaning withstand voltage.

[0005]

Therefore, according to the present invention, in an insulator cleaning apparatus in which a nozzle opening for injecting cleaning water is provided in an insulator to be cleaned which is installed in a longitudinal direction in a longitudinal direction, the insulator cleaning apparatus is viewed in plan. A nozzle port for pouring water toward the body surface portion of the insulator, which is at an angle position of 10 to 30 ° from the central axis point, is arranged with respect to the line connecting the central axis point of the insulator to be cleaned to the nozzle port. There is.

[0006]

First, the principle of the present invention will be schematically explained with reference to FIG. 1. Now, with respect to the body of the insulator having a radius r, it is separated from the point (center axis point) O on the center axis by m. It is assumed that the water flow is injected by the force F at a point P (which forms an angle θ from the center; hereinafter, θ is referred to as a “water injection point angle”). Then
Due to the component force f1 (= F · sin θ) of the force F in the circumferential direction,
A part of the water flow goes around the surface to the rear side and falls as falling water. Further, although not shown, a part of the water flow is blown off on the surface of the insulator to become water splashes.

In the conventional insulator cleaning apparatus, as shown by an arrow A in FIG. 1, the insulator is disposed toward the central axis O of the insulator to be cleaned.
Water was poured so that the wash water was evenly distributed. Therefore, the energy of the injected water flow is lost when it collides with the insulator to be cleaned, and most of the cleaning water becomes falling water,
This causes the surface of the insulator to be cleaned to flow down, resulting in a significant decrease in cleaning withstand voltage.

On the other hand, when water is poured at an oblique position so as to form an angle θ with respect to the line connecting the central axis of the insulator to be cleaned and the nozzle port, the amount of water scattered increases as the angle θ increases, and Decrease. This reduces the amount of falling water that lowers the wash withstand voltage and increases the wash withstand voltage. It should be noted that if the water injection angle is too large, the amount of falling water decreases, but the cleaning water does not reach the entire surface of the insulator and the cleaning ability decreases, so the water injection point angle is preferably 10 to 30 °.

Further, the number and arrangement of the injection nozzle device are selected depending on the size of the body diameter of the insulator to be cleaned, but in the case of a small insulator to be cleaned, water is injected from two directions on the opposite side (180 °). In addition, for a large insulator to be cleaned, three directions (120
(Every 90 degrees) or four directions (90 degrees) so that the surface of the insulator to be cleaned is sufficiently cleaned.

The nozzle base water pressure may be a water pressure sufficient to inject the rod-shaped cleaning water into each part of the insulator to be cleaned,
It can be appropriately selected from the height of the insulator to be cleaned and the position of water injection. Further, the higher the nozzle base water pressure is, the higher the cleaning withstand voltage tends to be. Therefore, for the insulator to be cleaned having a shape in which the absolute value of the cleaning withstand voltage is insufficient, the nozzle base water pressure is increased to 30 kgf / cm2 or the like. Is desirable.

[0011]

As described above, according to the present invention, an angle of 10 to 30 ° from the center axis point of the line connecting the center axis point of the insulator to be cleaned with the nozzle port in plan view. Since the nozzle port for pouring water toward the body surface part of the insulator at the position is arranged, it can be used as a cleaning device with a high withstand voltage for cleaning. The effect of being able to perform live-line cleaning is achieved even for insulators with a low cleaning withstand voltage that could not be cleaned with.

[0012]

DESCRIPTION OF THE PREFERRED EMBODIMENTS An example in which the present invention is applied to a so-called nozzle fixing type insulator cleaning device and a sliding type insulator cleaning device will be described below.

<Nozzle-fixed Insulator Cleaning Device> An example of application to a nozzle-fixed insulator cleaning device will be described with reference to FIGS. 2 to 7. As shown in FIG. 2, a pedestal 1 installed in a substation is shown. An insulator 2 is erected on the top of the insulator 2, and an electric wire 3 is supported and erected on the head of the insulator 2. Further, the injection nozzle devices 4 and 4 are disposed laterally of the insulator 2 at two symmetrical positions. This one jet nozzle device is provided with a plurality of nozzle ports in the vertical direction, and the cleaning water is jetted simultaneously from the plurality of nozzle ports at a predetermined interval, and the other jet nozzle device 4 similarly jets the wash water. It is a device that simultaneously injects water. It should be noted that water is injected so that the water injection point from one injection nozzle device 4 and that of the other are alternated, and all the injection nozzle devices 4 inject the insulator 2 at predetermined intervals (hereinafter, referred to as "water injection point intervals"). It is supposed to be filled with water. In this nozzle fixed type cleaning device, the cleaning withstand voltage is relatively low, and only the insulator designed in consideration of the cleaning withstand voltage is cleaned under the hot line condition.
In this type of cleaning device, the following tests were carried out on the cleaned insulator A and the cleaned insulator B. In addition, in this test, each interval at which cleaning water from a plurality of nozzle openings is poured in the longitudinal direction of the insulator to be cleaned is also related to the amount of dropped water, and this effect was also tested.

(Arrangement of insulator to be cleaned and jet nozzle device)
The insulator to be cleaned A is a station post insulator having a rated voltage of 230 kV, an effective length of 1700 mm, a surface leakage distance of 4800 mm, an average diameter of 220 mm, and the dimensions of each part shown in FIG. 3 are a: 50 mm, b: 40 mm, c. :
It was 10 mm, d: 67 mm, and e: 27 mm. This insulator to be cleaned A is erected on the pedestal 2 and the jet nozzle devices 4 and 4 are installed at left and right symmetrical positions horizontally separated by 1500 mm from the bottom of the insulator, and water is injected from the left and right jet nozzle devices 4 and 4. Was adjusted so that the water injection point from one side was in the middle of the water injection point of the other (see Fig. 2).

The insulator B to be cleaned is an insulator tube having a rated voltage of 230 kV, an effective length of 2400 mm, and a surface leakage distance of 780.
0 mm, average diameter 450 mm, and as dimensions of each part shown in FIG. 3, a: 42.5 mm, b: 32.5 mm,
It was c: 10 mm, d: 65 mm, and e: 38 mm.
The insulator 2 to be cleaned is erected on a pedestal, and spray nozzle devices are installed at three locations at 120 ° intervals at circumferential positions 2100 mm apart horizontally from the lowermost part of the insulator. The water injection from each side was adjusted so that the injection point was in the middle of the injection point from the other side.

(Interval between water injection points and cleaning withstand voltage) In order to obtain the relationship between the interval between water injection points and the cleaning withstand voltage, water was poured onto a clean insulator A to be cleaned. The injection nozzle device was adjusted so that the water injection point intervals were 10, 20, 30, 40, 50, and 60 cm, and the nozzle base water pressure was 30 kgf / cm 2 for the test. The results shown in Fig. 4 were obtained, and as a result, the ratio of the amount of falling water decreased as the water injection point spacing became wider, but 40 cm
It was found that the water drop ratio decreased slightly when the value exceeded. The water injection point interval recommended from the past is 50c.
In the case of m, a falling water amount ratio of about 50% is shown.

The water injection point interval and the cleaning withstand voltage ratio are shown in FIG.
The relationship shown in is obtained. According to FIG. 5, the cleaning withstand voltage with the water injection point interval of 10 cm was used as a reference, and the cleaning withstand voltage increased as the interval was widened, and the result was obtained when the maximum was 30 cm and decreased with the increase. In addition, if the water injection point interval recommended from the past is 50 cm, 10
It is lower than the case of cm, and the water injection point interval is 48 cm and 1
The cleaning withstand voltage in the case of 0 cm was almost equal.

(Relationship between salt adhesion density and cleaning withstand voltage) The test was carried out for the insulators A and B to be cleaned with a water injection point interval of 25 cm, a nozzle base water pressure of 30 kgf / cm 2,
It was carried out under the condition that the water injection angle was 0 °. The total amount of water injected was 32 × 10 3 cm 3 / min for the insulator to be cleaned A and 50 × 10 3 cm 3 / min for the insulator to be cleaned 2. As a result, the results of Example 1 and Example 2 in FIG. 6 or 7 were obtained.

As Comparative Examples 1 and 2, for the insulators A and B to be cleaned, the water injection interval of 50 cm, the nozzle base water pressure of 30 kgf / cm 2, and the water injection angle of 0 °, which have been conventionally recommended, are used in Examples 1 and 1. The test was conducted in the same manner as in 2. In addition, the total amount of water injection is 16 × 10 3 cm 3 / in Comparative Example 1.
min, and in Comparative Example 2 it was 25 × 10 3 cm 3 / min. The results are also shown in FIGS. 6 and 7. From Example 1 and Example 2, it was found that the cleaning withstand voltage was about 20 kV higher than that of Comparative Example 1 and Comparative Example 2 at each soil density.

(Relationship between Water Injection Point Angle and Cleaning Withstanding Voltage) With respect to a clean insulator A to be cleaned, the water injection point angle was changed to 0 to 50 ° to determine the change in the amount of dropped water. At this time, water injection interval 25c
m, and the nozzle original water pressure was 30 kgf / cm 2. As a result, the result shown in FIG. 8 was obtained. From this result, it was found that the larger the water injection point angle, the smaller the drop water ratio. Further, when the cleaning dielectric strength A of this cleaned insulator A was tested at two water injection point angles of 0 ° and 10 °, the cleaning withstand voltage was 360 kV at the water injection point angle of 0 °. It becomes 440kV at 10 °,
The cleaning withstand voltage increased significantly.

Next, the relationship between the salt deposition density and the cleaning withstand voltage was tested on the insulators A and 2 to be cleaned, and the results shown in Examples 3 and 4 of FIGS. 6 and 7 were obtained. Was given. This test was conducted under the same conditions as in Comparative Example 1 or Comparative Example 2 except that the water injection angle was 10 °. As a result, the cleaning withstand voltage was increased by about 30 kV as compared with the comparative example in which the water injection point angle was 0 °.

(Relationship between Nozzle Base Water Pressure and Cleaning Withstanding Voltage) Next, in order to obtain the relationship between nozzle base water pressure and cleaning withstanding voltage,
Tests were carried out on two nozzle pressures of 10 kgf / cm @ 2 (Examples 5 and 6) and 30 kgf / cm @ 2 (Examples 7 and 8). In all other conditions, the water injection point interval was 25 cm and the water injection point angle was 10 °. As a result, as shown in FIGS. 6 and 7 in Examples 5 and 7 and Examples 6 and 8, 30 kgf /
It was found that the cleaning withstand voltage of cm2 was slightly higher than the nozzle original water pressure of 10 kgf / cm2. Also, in Examples 5 and 6 where the nozzle base water pressure is 10 kgf / cm2, the cleaning withstand voltage is about 35 to 50 kV as compared with Comparative Examples 1 and 2.
Higher results were obtained.

From the test results described above, in the insulator cleaning device of the nozzle fixed type, the water injection point interval is 20 cm to 40 c.
By setting m, the cleaning withstand voltage becomes high, especially 30
It becomes the highest in cm. The reason for this is that if the water injection interval becomes too narrow, the amount of water injected to the entire insulator increases, and at the same time, the water injected from the other jet nozzle device facing the other surface collides with the surface of the insulator to be cleaned, and the proportion of the scattered water decreases. It is thought that the water withstand voltage increases and the cleaning withstand voltage decreases. On the other hand, if the water injection interval becomes excessively wide, the falling water containing contaminants due to water injection from one nozzle port will not be immediately blown off by the water injection below it, but will stay for a long time near the insulator, so cleaning It seems that the withstand voltage becomes low. Due to the contradictory relationship between the two, it is considered that the water injection interval of 30 cm has the highest cleaning withstand voltage.

<Sliding Nozzle Insulator Cleaning Device> An example in which the present invention is applied to a so-called sliding nozzle insulator cleaning device will be described with reference to FIGS. 9 and 10. This insulator cleaning device for a sliding nozzle is an insulator cleaning device that sprays cleaning water from one nozzle port and sequentially moves the water injection point from one end to the other end. Compared to the fixed nozzle type described above, this insulator cleaning device only needs to spray cleaning water from one nozzle port, and since the amount of water injection is small and the equipment cost is low, it can be used in the lateral direction like a tension insulator. Widely used for insulators that are long.

However, when this insulator cleaning device is applied to an insulator to be cleaned arranged in a longitudinal direction, water containing washed contaminants is removed from the insulator to be cleaned in the process of sequentially moving from the lower portion to the upper portion. It will run down the surface. Therefore, the upper part of the water injection point is in a dry state, and the lower part is in a wet state in which falling water containing pollutants flows, resulting in an extreme imbalance in the shared voltage and a significant decrease in cleaning withstand voltage.
It was difficult to apply this kind of insulator cleaning device to an insulator arranged long in the longitudinal direction.

FIG. 9 is a schematic view of this insulator cleaning apparatus. An insulator 2a made of a station post insulator is erected on an upper part of a frame 1a provided in a substation.
An electric wire 3a is supported and erected on the head of a. And
Injection nozzle devices 4a, 4a are provided at two locations on the side of the insulator 2a.
Are arranged in symmetrical positions. Piping for supplying cleaning water from a water supply source (not shown) is provided in both of the injection nozzle devices 4a, and the cleaning water is synchronously supplied from the injection nozzle devices 4a and 4a by a pump or a control valve provided in the middle of the pipes. It is possible to inject. The nozzle device 4a is provided with a rotation driving means such as an electric motor (not shown), and an injection nozzle driven and controlled by a rotation control means for controlling the rotation amount and the rotation speed at the tip thereof. And
In this embodiment, the jet nozzle is provided with a main nozzle port for jetting the main washing water A and a sub nozzle port for jetting the sub washing water B at an angle of about 10 ° downward from the jet axis of the main nozzle port. When the cleaning water is supplied under pressure, the cleaning water that has become a double jet water stream is jetted from both nozzle openings.

With respect to the insulator cleaning device having this structure,
Comparative example 1 using a conventional injection nozzle with only a main nozzle opening
2, 13 and the insulator cleaning test of Examples 11 to 14 using the injection nozzle provided with the sub-nozzle port of the present invention, the relationship between the salt attachment density and the cleaning withstand voltage was determined. In the test, as shown in FIG. 9, three station post insulators having a rated voltage of 275 kV were spliced together, and one having an effective length of 2974 mm was used as a cleaned insulator. Further, since it has been conventionally said that the provision of a water drainage shade is effective in increasing the cleaning withstand voltage, a test was also conducted on a water drainage shade having a diameter of 365 mm at the joint portion of the insulator to be washed.

The position of the injection nozzle in the test is 2300 mm in the horizontal direction and 12 in the upper direction from the lower end surface of the insulator to be cleaned.
The injection nozzle was set so as to be placed at a position separated by 35 mm, and water was injected at the nozzle base water pressure of 5 kgf / cm 2. As the injection nozzle, a nozzle having a diameter of 2 mm for both the main nozzle opening and the sub-nozzle opening was adopted (excluding Comparative Example 13), and about 10
The sub-cleaning water sprayed from the sub-nozzle port spraying downward at an angle of ∘ was injected 400 mm below the injection point of the main cleaning water. The relationship between the salt attachment density and the stain withstand voltage of the insulator to be cleaned is shown in FIG. 10 as Comparative Example 11. The value of this pollution withstand voltage characteristic is based on the Electric Cooperative Research vol.35.
No. 3, p. 103, FIG. 50. Generally, the condition that the cleaning withstand voltage exceeds this stain withstand voltage is a condition for cleaning in a live state.

Comparative Example 12 is a test on an insulator to be cleaned which is not provided with a drainage cap, without providing a sub nozzle port.
It is the result of a test conducted on an insulator to be cleaned having a salt deposition density of 0.03 mg / cm 2 by an injection nozzle having only a main nozzle port having a diameter of 2.0 mm. This cleaning withstand voltage was very low at 220 kV, which was lower than the stain withstand voltage of Comparative Example 11. Comparative Example 13 is a result of a test performed on an insulator to be cleaned having a salt adhesion density of 0.02 mg / cm 2 with a drainage cap attached. In Comparative Example 13, the diameter of the main nozzle opening was 3.2 mm. Due to the effect of the drainage cap, the cleaning withstand voltage was 260 kV, and although there was an effect of about 40 kV, it was still lower than the stain withstand voltage.

Example 11 is a test for an insulator to be cleaned which is not provided with a drainage cap, and the above-mentioned injection nozzle is attached to the insulator.
The test was conducted at a salt adhesion density of 0.03, 0.11 mg / cm 2. It was observed that a considerable amount of water dropped from the main nozzle port was scattered by the water injection from the sub nozzle port. The cleaning withstand voltage was 275 and 260 kV, respectively, and 0.11 mg, which had a high degree of stain, exceeded the stain withstand voltage. Example 12 is the same as Example 11 except that a drainage cap was attached.
The cleaning withstand voltage was 31
It was 5,290 kV, both of which were much higher than the pollution withstand voltage, and it was found that the combined use of the drainage cap was very effective.

In the thirteenth and fourteenth embodiments, in order to know the influence of the pouring point position on the insulator to be cleaned with respect to the line connecting the central axis of the insulator to be cleaned and the nozzle opening position with respect to the horizontal plane,
Further, the tests of Examples 13 and 14 were conducted with the water injection point angle of 10 °. Example 13 is a test on an insulator to be cleaned which is not provided with a drainage cap, and has a salt adhesion density of 0.0
The test was carried out at 3, 0.11 mg / cm 2. As a result,
The cleaning withstand voltage was 300 and 290 kV, respectively, both of which exceeded the stain withstand voltage. Example 14 was carried out in the same manner as in Example 13 except that a drainage cap was attached, and the cleaning withstand voltages were 340 and 320 kV, respectively, which were far higher than the pollution withstand voltage.

In this insulator cleaning device for sliding nozzles, the main cleaning water A sprayed from the main nozzle port is poured into the insulator to be cleaned, and the contaminants at the water injection point are washed away. The main cleaning water A containing the contaminants and having high conductivity becomes falling water that flows down near the surface of the insulator to be cleaned. However, as the main nozzle port moves, the sub nozzle port also follows and moves, and the sub cleaning water B sprayed from this sub nozzle port collides with the falling water by the main cleaning water A, and A part of is scattered from the insulator surface. For this reason, most of the falling water containing the contaminants scatters from the surface of the insulator to be cleaned and does not flow down below. For this reason, it is considered that a large reduction in the cleaning withstand voltage is prevented. Although part of the sub-cleaning water B also becomes falling water, this falling water contains only low-concentration contaminants, and the decrease in the shared voltage due to this is slight.
As a result, the imbalance of the withstand voltage is alleviated, and the withstand voltage of cleaning is expected to increase.

[Brief description of the drawings]

FIG. 1 is an explanatory diagram illustrating a relationship between falling water and scattered water depending on a water injection angle.

FIG. 2 is a schematic view of a nozzle fixing type insulator cleaning device.

FIG. 3 is a schematic view of a test insulator in the same device.

FIG. 4 is a graph showing a relationship between a water injection point interval and a falling water amount ratio by the same device.

FIG. 5 is a graph showing a relationship between a water injection point interval and a cleaning withstand voltage ratio by the same apparatus.

FIG. 6 is a graph showing a relationship between a salt attachment density and cleaning withstand voltage by cleaning from two directions by the same apparatus.

FIG. 7 is a graph showing a relationship between a salt attachment density and a cleaning withstand voltage by cleaning from three directions by the same apparatus.

FIG. 8 is a graph showing a relationship between a water injection angle and a falling water amount ratio by the device.

FIG. 9 is a schematic view of a sliding nozzle type insulator cleaning device.

FIG. 10 is a graph showing a relationship between a salt attachment density and a withstand voltage by the same device.

[Explanation of symbols]

 1 ... Stand 2 ... Insulator 3 ... Electric wire 4 ... Injection nozzle device

Claims (1)

(57) [Claims] 1. An insulator to be cleaned, which is installed in a longitudinally elongated manner,
In an insulator cleaning device provided with a nozzle port for injecting cleaning water, in a plan view, with respect to a line connecting the central axis point of the insulator to be cleaned to the nozzle port, 10 to 30 ° from the central axis point An insulator cleaning device having a nozzle port for pouring water toward the body surface portion of the insulator at an angular position.